CN107490934A - A kind of composition of UV negative graph photosensitives liquid - Google Patents
A kind of composition of UV negative graph photosensitives liquid Download PDFInfo
- Publication number
- CN107490934A CN107490934A CN201710908397.8A CN201710908397A CN107490934A CN 107490934 A CN107490934 A CN 107490934A CN 201710908397 A CN201710908397 A CN 201710908397A CN 107490934 A CN107490934 A CN 107490934A
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- China
- Prior art keywords
- acrylate
- methyl
- component
- composition
- photosensitives
- Prior art date
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- 239000007788 liquid Substances 0.000 title claims abstract description 35
- 239000000203 mixture Substances 0.000 title claims abstract description 23
- 239000000975 dye Substances 0.000 claims abstract description 16
- 239000000049 pigment Substances 0.000 claims abstract description 16
- 125000001841 imino group Chemical group [H]N=* 0.000 claims abstract description 12
- 239000004840 adhesive resin Substances 0.000 claims abstract description 10
- 229920006223 adhesive resin Polymers 0.000 claims abstract description 10
- 150000001875 compounds Chemical class 0.000 claims abstract description 8
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 38
- -1 Phenoxyethyl (methyl) acrylate Chemical compound 0.000 claims description 17
- 150000002148 esters Chemical class 0.000 claims description 17
- 239000002253 acid Substances 0.000 claims description 16
- 239000000178 monomer Substances 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 8
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 7
- 229920001577 copolymer Polymers 0.000 claims description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N alpha-methacrylic acid Natural products CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 150000002460 imidazoles Chemical class 0.000 claims description 5
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 claims description 5
- 239000004094 surface-active agent Substances 0.000 claims description 5
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 claims description 4
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 claims description 4
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 claims description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 4
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 4
- 239000002202 Polyethylene glycol Substances 0.000 claims description 3
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- 239000003381 stabilizer Substances 0.000 claims description 3
- IRHICGGRMJVIOW-UHFFFAOYSA-N 2-(2,4,6-trioxo-1,3,5-triazinan-1-yl)ethyl prop-2-enoate Chemical class C=CC(=O)OCCN1C(=O)NC(=O)NC1=O IRHICGGRMJVIOW-UHFFFAOYSA-N 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 2
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- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 claims description 2
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- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 claims description 2
- 150000004056 anthraquinones Chemical class 0.000 claims description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 2
- 239000012965 benzophenone Substances 0.000 claims description 2
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
- DJOWTWWHMWQATC-KYHIUUMWSA-N Karpoxanthin Natural products CC(=C/C=C/C=C(C)/C=C/C=C(C)/C=C/C1(O)C(C)(C)CC(O)CC1(C)O)C=CC=C(/C)C=CC2=C(C)CC(O)CC2(C)C DJOWTWWHMWQATC-KYHIUUMWSA-N 0.000 claims 1
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- JLFNLZLINWHATN-UHFFFAOYSA-N pentaethylene glycol Chemical compound OCCOCCOCCOCCOCCO JLFNLZLINWHATN-UHFFFAOYSA-N 0.000 claims 1
- 229920000647 polyepoxide Polymers 0.000 claims 1
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- 239000000853 adhesive Substances 0.000 abstract description 7
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- 239000002585 base Substances 0.000 description 21
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- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 9
- SOGAXMICEFXMKE-UHFFFAOYSA-N alpha-Methyl-n-butyl acrylate Natural products CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- VUVZASHBYYMLRC-UHFFFAOYSA-N heptane-2,3-diol Chemical compound CCCCC(O)C(C)O VUVZASHBYYMLRC-UHFFFAOYSA-N 0.000 description 6
- QMMOXUPEWRXHJS-UHFFFAOYSA-N pent-2-ene Chemical group CCC=CC QMMOXUPEWRXHJS-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- HKRZVBZNEKKEAS-UHFFFAOYSA-L copper;2,4,5-trichlorophenolate;3,4,5-trichlorophenolate Chemical compound [Cu+2].[O-]C1=CC(Cl)=C(Cl)C(Cl)=C1.[O-]C1=CC(Cl)=C(Cl)C=C1Cl HKRZVBZNEKKEAS-UHFFFAOYSA-L 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical group NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000004202 carbamide Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VQGWOOIHSXNRPW-UHFFFAOYSA-N n-butyl-2-methylprop-2-enamide Chemical compound CCCCNC(=O)C(C)=C VQGWOOIHSXNRPW-UHFFFAOYSA-N 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 241001614291 Anoplistes Species 0.000 description 2
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- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
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- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
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- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
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- OUOHOJDXEPUCDT-UHFFFAOYSA-N (2-ethylphenyl) prop-2-enoate Chemical compound CCC1=CC=CC=C1OC(=O)C=C OUOHOJDXEPUCDT-UHFFFAOYSA-N 0.000 description 1
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- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- FPVGTPBMTFTMRT-NSKUCRDLSA-L fast yellow Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C(N)=CC=C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 FPVGTPBMTFTMRT-NSKUCRDLSA-L 0.000 description 1
- 235000019233 fast yellow AB Nutrition 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- OHLHOLGYGRKZMU-UHFFFAOYSA-N n-benzylprop-2-enamide Chemical class C=CC(=O)NCC1=CC=CC=C1 OHLHOLGYGRKZMU-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical class CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 208000007578 phototoxic dermatitis Diseases 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 235000012752 quinoline yellow Nutrition 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- JEVGKYBUANQAKG-UHFFFAOYSA-N victoria blue R Chemical compound [Cl-].C12=CC=CC=C2C(=[NH+]CC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JEVGKYBUANQAKG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
Abstract
The present invention relates to composition of UV negative graph photosensitive liquid and preparation method thereof, including following components and content：Component A：Compound with polymerism unsaturated group, 5 60wt%；Component B：With the dyestuff or pigment that absorbing wavelength is light within laser emission wavelength ± 50nm, 0.01 20wt%；Component C：Adhesive resin with sulfoamido or active imino group, 20 70wt%；Component D：Photoepolymerizationinitiater initiater, 0.5 21wt%.Above-mentioned each component is well mixed and produces product.Compared with prior art, not only sensitivity is fast for UV negative graph photosensitives liquid of the present invention, and adhesive force is strong, and ink-water balance, development latitude is big, and press resistance rate is high, and particularly the ink of resistance to UV prints.
Description
Technical field
The present invention relates to a kind of photosensitive liquid, and in particular to the composition of UV negative graph photosensitive liquid.
Background technology
Since desktop publishing (DTP) comes out, printing industry is seeking new plate-making mode always, so that computer
High speed can reach more preferable embodiment.A solution is CTP technologies, and it no longer needs developing, being fixed for the film
Handling process is rinsed, directly the digital graphical information that computer disposal obtains is copied to above printing plate.One of this technology
Obvious deficiency is that the plate used is expensive, allows many to want to hang back using the user of this technology.CTcP technologies are a kind of
Both the advantages of having inherited CTP, and can are continuing with the technology of tradition offset printing plate.Invincible print skill (BasysPrint) company of Germany
It is relatively early to propose CTcP concept in the world and develop the producer of CTcP platemaking machine.Early in the international printing fairs of Drupa1995
On, invincible print skill (BasysPrint) company of Germany is just proposed the UV-Setter platemaking machine having begun to take shape, and illustrates using UV
The new technology that light source is exposed to traditional PS offset printing forme.In the international printing fairs of Drupa2000, the invincible print skill of Germany
(BasysPrint) company is formally proposed the UV-Setter series platemaking machine directly made a plate using traditional PS version, since then
CTcP has climbed up the stage of printing history as the plate making a having an epoch-marking significance technology.
CTcP is Computer to conventional plate english abbreviation, refers to be counted in traditional PS version
Calculation machine is directly made a plate, and it is a kind of form of CTP techniques.The technology is using 360~450nm ultraviolet light source to traditional PS version
Carry out digit explosure.
Due to the appearance and development of CTCP technologies, traditional positive image CTCP technologies are greatly developed, and CTCP markets constantly expand, but
The resistance to print that exposes of traditional CT CP positive image galleys simultaneously, the particularly pressrun for the ink of resistance to UV are and cloudy into a development bottleneck
Figure UV type CTCP versions obtain market concern.
The content of the invention
It is an object of the present invention to overcome the above-mentioned drawbacks of the prior art and provide a kind of sensitivity is fast, attachment
Power is strong, and ink-water balance, development latitude is big, and press resistance rate is high, particularly the group of the UV negative graph photosensitive liquid of the ink of resistance to UV printing
Compound.
The purpose of the present invention can be achieved through the following technical solutions：A kind of composition of UV negative graph photosensitives liquid, including
Solvent and solid content, it is characterised in that including following components and content：
Component A：Compound with polymerism unsaturated group, 5-60wt%；
Component B：With the dyestuff or pigment that absorbing wavelength is light within laser emission wavelength ± 50nm, 0.01-20wt%；
Component C：Adhesive resin with sulfoamido or active imino group, 20-70wt%；
Component D：Photoepolymerizationinitiater initiater, 0.5-21wt%.
Percent by weight used herein, calculated with photosensitive liquid solid content weight.
Described component A is that have more than at least one in 1 molecule, the alkene of the addition polymerizable of preferably more than 2
The monomer or oligomer of keyed unsaturated group, and boiling point is more than 100 DEG C of material under normal pressure.
Monomer as described component A or oligomer include polyethyleneglycol (methyl) acrylate [below by methyl
Acrylate and acrylate are collectively referred to as (methyl) acrylate], polypropylene glycol list (methyl) acrylate, Phenoxyethyl
Simple function (methyl) acrylate of (methyl) acrylate etc.；Polyethylene glycol two (methyl) acrylate, (first of polypropylene glycol two
Base) acrylate, trimethylolpropane tris (methyl) acrylate, neopentyl glycol two (methyl) acrylate, pentaerythrite three
(methyl) acrylate, pentaerythrite four (methyl) acrylate, dipentaerythritol six (methyl) acrylate, hexylene glycol two
(methyl) acrylate, three (acryloyl-oxyethyl) isocyanuric acid esters, (methyl) propylene of polyalcohol alkylene oxide adduct
Acid esters, (methyl) acrylate of polyhydric phenols alkylene oxide adduct, urethane acrylate class, polyester acrylic esters, by ring
Multifunctional (methyl) acrylate such as Epoxy Acrylates obtained from oxygen tree fat and (methyl) acrylic acid addition；Isocyanuric acid
Allyl alcohol or cyanurate allyl ester.
Component A has the content of the compound of polymerism unsaturated group, equivalent to the solid content of negative photosensitive composition,
Preferably 5-60wt% scope.When (component A) there is the content of the compound of polymerism unsaturated group to be less than 5wt%, Gu
Change it is insufficient, when (component A) have polymerism unsaturated group compound content more than 60wt% when, resulting minus sense
The photosensitive layer of photosensitiveness lithographic plate is tacky.In addition, there is polymerism unsaturated group more than can be used together as needed in 2
Compound is collectively as component A.
Described component B be laser emission wavelength ± 20nnm wave-length coverage in have absorb maximum dyestuff or
Pigment, its dosage are 0.05-5wt%.Photosensitive liquid contain can absorbing wavelength be laser emission wavelength ± 50nm light dyestuff
Or pigment.As long as can absorbing wavelength be laser emission wavelength ± 50nm light dyestuff or pigment, for above-mentioned dyestuff or
Pigment is not particularly limited.It is preferred that there is the dyestuff or face for absorbing maximum in laser emission wavelength ± 50nm wave-length coverage
Material, more preferably there is the dyestuff or pigment for absorbing maximum in laser emission wavelength ± 20nnm wave-length coverage, and also more
It is preferred that there is the dyestuff or pigment that absorb maximum with laser emission wavelength identical wavelength.
The indigo plant or ultra-violet (UV) band laser explosure for the light that described component B passes through transmitting 350 to 450nm are particularly suitable, and
And as dyestuff corresponding with laser or pigment, preferably weld or pigment.
The example of weld includes yellow acid dye.The instantiation of weld is included in Senryo Binran
The acid dyes described in group with C.I. Indian yellows.Its particularly preferred example includes C.I. Indian yellows 17, C.I. Indian yellows
19, C.I. acid yellow 23s, C.I quinoline yellows 8 etc..
The example of yellow uitramarine includes NOVOPERM YELLOW H2G, SEIKAFAST YELLOW 2200, SEIKAFAST
YELLOW 2300, HOSTACOPY Y501, YELLOW MASTER BATCH, PV FAST HG, NOVOPERM YELLOW P-
HG, and NOVOPERM YELLOW M2R.
By using above-mentioned dyestuff or pigment, acquisition prevents from filling in negative image area because of the reflected light of laser or scattering light
The effect of site (dot), and a kind of photopolymerization type photosensitive lithographic plate master can be obtained, the photopolymerization photosenpsitive lithographic printing is former
Version is suitable to the AM silk-screen printings or FM silk-screen printings of fine definition or more, and particularly in the case of using FM screens,
It is excellent in terms of the uniformity of site in half tone region.
Weight based on photosensitive liquid, the amount of the dyestuff or pigment that add photosensitive liquid are preferably equal to or greater than 0.01wt%, more
Preferably equal to or greater than 0.05wt%.Moreover, for the consideration for keeping sensitivity preferred scope, the dyestuff of addition or the amount of pigment
Preferably equal to or smaller than 10wt%, more preferably equal to or less than 5wt%.
As long as there is sulfoamido (- SO2HN2) or active imino group (- SO2NH-, or-CON-X-CO-), it is possible to use
The adhesive resin used all the time in the mild-natured lithographic printing plate of negative graph photosensitive.As with sulfoamido or active imino group
Adhesive resin.Described component C is the homopolymer formed with the monomer of sulfoamido or active imino group, or will tool
Have a monomer of sulfoamido or active imino group, and can be copolymerized therewith other monomers copolymerization obtained from copolymer.
It is to include acrylic ester unit, methacrylate list as above-mentioned copolymer, preferably acrylic acid series copolymer
The copolymer of any one in member, acrylamide unit or methacryl amine unit is (below by acrylate and methyl-prop
Olefin(e) acid ester is generally designated as (methyl) acrylate, and acrylamide and Methacrylamide are generally designated as into (methyl) acryloyl
Amine).
Instantiation can enumerate the homopolymer being copolymerized with following unit cell, such as：Methyl acrylate, 2,2- dimethyl hydroxyls
Propyl acrylate, glycidyl acrylate, methoxyethyl benzyl ester, allyl methacrylate, methacrylic acid
Pentyl ester, hexyl methacrylate, 2-Propenoic acid, 2-methyl-, octyl ester, methacrylic acid 5- hydroxyls pentyl ester, 2,2- dimethyl -3- hydroxypropyl first
Base acrylate, trimethylolpropane monomethacrylates, pentaerythrite monomethacrylates, methacrylic acid phenyl
Ester, methyl methacrylate phenylester, N methacrylamide, N- ethyl acrylamides, N- benzylacrylamides, N, N- dimethyl
Acrylamide, N, N- acrylamides, N, N- diethyl ethyl acrylamide, N- butyl methyls acrylamide, the tertiary fourths of N-
Butylmethacrylamide, ethoxy ethyl vinyl ether, chloroethyl vinyl ether, 1- methyl -2,2- dimethylpropyl vinyl bases
Ether, tetrachloro furfuryl group vinyl ethers, vinyltoluene base ether, vinyl chloride phenyl ether, vinyl cyclohexyl carboxylic esters, benzoic acid second
Alkene ester, chlorobenzoic acid vinyl acetate, N- methylmaleimidos, N-2,6- diethyl, phenyl maleimide, in addition, also N-
Vinyl pyrrolidone, N- vinylpyridines, acrylonitrile, methacrylonitrile etc..
There is the adhesive of sulfoamido or active imino group from (C) in alkali solubility, the present invention, preferably with phenol
Property hydroxyl.Such adhesive resin, such as can be by by (methyl) acrylate compounds or (first with sulfoamido
Base) acrylamide compound, or (methyl) acrylate compounds of active imino group or (methyl) acrylamide chemical combination
Thing, and (methyl) acrylate compounds with phenolic hydroxyl group or (methyl) acrylamide compound are copolymerized to obtain.
In addition, adhesive resin has any occasion of sulfoamido or phenolic hydroxyl group, it is more excellent from solvent resistance
The angle of change is set out, and further preferably with adhesive resin as urea bond (- NH-CO-NH-) conducts, example can be lifted following
The copolymer of monomer and (methyl) acrylate compounds, such as：1- (N '-(4- hydroxy phenyls) 1,3- urylenes) methacrylic acid
Ester, 1- (N '-(3- hydroxy phenyls) 1,3- urylenes) methacrylate, 1- (N '-(2- hydroxy phenyls) 1,3- urylenes) first
Base acrylate, 1- (N ' (3- hydroxy-4-methyls phenyl) 1,3- urylenes) methacrylate, 1- (N '-(2- hydroxy-5-methyls
Base phenyl) 1,3- urylenes) methacrylate, 1- (N '-(5- hydroxynaphenyls) 1,3- urylenes) methacrylate, 1-
(N '-(2- hydroxyl -5- phenyls) 1,3- urylenes) methacrylate, 2- (N '-(4- hydroxy phenyls) 1,3- urylenes)
Ethyl propylene acid esters, 2- (N '-(3- hydroxy phenyls) 1,3- urylenes) ethyl propylene acid esters, 2- (N '-(2- hydroxy phenyls) 1,3-
Urylene) ethyl propylene acid esters, 2- (N '-(3- hydroxy-4-methyls phenyl) 1,3- urylenes) ethyl propylene acid esters, 2- (N '-
(2- hydroxy-5-methyl bases phenyl) 1,3- urylenes) ethyl propylene acid esters, 2- (N '-(5- hydroxynaphenyls) 1,3- urylenes) ethyl
Acrylate, 2- (N '-(2- hydroxyl -5- phenyls) 1,3=urylenes) ethyl propylene acid esters, 4- (N '-(4- hydroxy phenyls)
1,3- urylenes) butyl propyleneglycol acid esters, 4- (N '-(3- hydroxy phenyls) 1,3- urylenes) butyl propyleneglycol acid esters, 4- (N '-(2- hydroxyls
Base phenyl) 1,3 urylenes) butyl propyleneglycol acid esters, 4- (N '-(3- hydroxy-4-methyls phenyl) 1,3- urylenes) butylacrylic acid
(N '-(5- hydroxynaphenyls) 1,3- is sub- by ester, 4- (N '-(2- hydroxy-5-methyl bases phenyl) 1,3- urylenes) butyl propyleneglycol acid esters, 4-
Urea groups) butyl propyleneglycol acid esters, the propylene of 4- (N '-(2- hydroxyl -5- phenyls) 1,3- urylenes) butyl propyleneglycol acid esters etc
Acid ester derivant；1- (N '-(4- hydroxy phenyls) 1,3- urylenes) methylmethacylate, 1- (N '-(3- hydroxy phenyls) 1,
3- urylenes) methylmethacylate, 1- (N '-(2- hydroxy phenyls) 1,3- urylenes) methylmethacylate, 1-
(N '-(3- hydroxy-4-methyls phenyl) 1,3- urylenes) methylmethacylate, 1- (N '-(2- hydroxy-5-methyl bases phenyl)
1,3- urylenes) methylmethacylate, 1- (N '-(5- hydroxynaphenyls) 1,3- urylenes) methylmethacylate, 1-
(N '-(2- hydroxyl -5- phenyls) 1,3- urylenes) methylmethacylate, 2- (N '-(4- hydroxy phenyls) 1,3- Asias urea
Base) ethylmethyl acrylate, 2- (N '-(3- hydroxy phenyls) 1,3- urylenes) ethylmethyl acrylate, 2- (N '-(2- hydroxyls
Base phenyl) 1,3- urylenes) ethylphenyl acrylate, 2- (N '-(3- hydroxy-4-methyls phenyl) 1,3- urylenes) ethyl first
Base acrylate, 2- (N '-(2- hydroxy-5-methyl bases phenyl) 1,3 urylenes) ethylmethyl acrylate, 2- (N '-(5- hydroxyls
Naphthyl) 1,3- urylenes) ethylmethyl acrylate, 2- (N '-(2- hydroxyl -5- phenyls) 1,3- urylenes) ethyl-methyl
Acrylate, 4- (N '-(4- hydroxy phenyls) 1,3- urylenes) butyl methyl acrylate, 4- (N '-(3- hydroxy phenyls) 1,3-
Urylene) butyl methyl acrylate, 4- (N '-(2- hydroxy phenyls) 1,3- urylenes) butyl methyl acrylate, 4- (N '-
(3- hydroxy-4-phenyls) 1,3- urylenes) butyl methyl acrylate, 4- (N '-(2- hydroxy-5-methyl bases phenyl) 1,3- Asias urea
Base) butyl methyl acrylate, 4- (N '-(5- hydroxynaphenyls) 1,3- urylenes) butyl methyl acrylate, 4- (N '-(2- hydroxyls
Base -5- phenyls) 1,3- urylenes) butyl methyl acrylate etc methacrylate derivative etc..
Described component C molecular weight, preferable weight-average molecular weight are more than 2000, and number-average molecular weight is more than 1000.Enter
One step preferable weight-average molecular weight is 3000-500000 scope, and number-average molecular weight is 2000-400000 scope.With sulphur
The content of the adhesive resin of amide groups or active imino group, relative to the solid content of negative graph photosensitive liquid composition, preferably 20-
70wt% scope, when the content of adhesive resin is less than 20wt%, solidification deficiency, the solidification of gained negative planographic printing plate
Deterioration of efficiency.
Described component D can select from the poly- initiator of known light.It is preferred that the use of absorbing wavelength is 400nm's or so
The poly- initiator of light, including benzyl, benzyl acyl group ether, anthraquinone, acridine, azophenlyene, benzophenone or six aryl united imidazoles.
The present invention uses up poly- initiator, particularly preferred six aryl united imidazole.Instantiation has：2,4,5,2’,
4 ', 5 ' hexaphenyl imidazoles, 2,2 '-bis- (2- chlorphenyls) -4,5,4 ', 5 '-tetraphenyl bisglyoxaline, 2,2 '-(2- bromophenyls) -4,5,
4 ', 5 '-tetraphenyl bisglyoxaline, 2,2 '-bis- (2,4- dichlorophenyls) -4,4 ', 5,5 '-tetraphenyl bisglyoxaline, 2,2 '-bis- (2- chlorine
Phenyl) -4,5,4 ', 5 '-four (3- methoxyphenyls) bisglyoxalines, 2,5,2 ', 5 '-four (2- chlorphenyls) -4,4 '-bis- (3,4- bis-
Methoxyphenyl) the U.S. imidazoles of connection, 2,2 '-bis- (2,6- dichlorophenyls) -4,5,4 ', 5 '-tetraphenyl bisglyoxaline, 2,2 '-bis- (2- nitre
Base phenyl) -4,5,4 ', 5 '-tetraphenyl bisglyoxaline, 2,2 '-di-o-tolyl -4,5,4 ' 5 '-tetraphenyl bisglyoxaline, 2,2 '-bis-
(2- ethoxyl phenenyls) -4,5,4 ', 5 '-tetraphenyl bisglyoxaline and 2,2 '-bis- (2,6- dichlorophenyls) -4,5,4 ', 5 '-tetraphenyl
Bisglyoxaline.
Six aryl united imidazoles can be used by it in the form of mixture of two or more.Can also will be following
Photoepolymerizationinitiater initiater is used together with six aryl united imidazoles, such as 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, N- benzene
Base glycine etc..
A kind of preparation method of the composition of UV negative graph photosensitives liquid, it is characterised in that by component A, component B, component C and group
D is divided to mix at normal temperatures, then addition solvent is well mixed produces product.
Colouring agent, surfactant, stabilizer, polymerization inhibitor or plasticizer are also added with described composition.
As colouring agent, such as crystal violet, Victoria blue, ethyl violet, phthalocyanine blue, phthalocyanine green etc..
As surfactant, such as fluorine system class surfactant, silicone surfactant etc..
As plasticizer, such as diethyl phthalate, dibutyl phthalate, tributyl phosphate etc..
As stabilizer, such as phosphoric acid, phosphorous acid, oxalic acid, malic acid, benzene sulfonic acid etc..
As polymerization inhibitor, such as paracresol, 1,2,3,-thrihydroxy-benzene, tert-butyl catechol etc..
The addition of these various additives, according to the different and different of its purpose, but preferably generally photosensitive liquid combines
0-30 weight % scopes of the solid content of thing.
The solvent that the present invention uses is the common solvent of photosensitive liquid, including methyl ethyl ketone, propylene glycol monomethyl ether etc..Solid
The mass percent that thing is blended in solid content in the photosensitive liquid that solvent obtains is 5-10%.
Compared with prior art, UV negative graph photosensitives liquid of the present invention and preparation method thereof.Not only sensitivity is fast for it, adhesive force
By force, ink-water balance, development latitude is big, and press resistance rate is high, and particularly the ink of resistance to UV prints.
Embodiment
Embodiments of the invention are elaborated below, the present embodiment is carried out lower premised on technical solution of the present invention
Implement, give detailed embodiment and specific operating process, but protection scope of the present invention is not limited to following implementation
Example.
Embodiment 1-2
Component used in the preparation of UV negative graph photosensitives liquid is as follows：
The allyl methacrylate of adhesive C 1：2- (N- (2- hydroxyl -5- aminosulfonylphenyls) 1.3- urylenes) ethyl
Methacrylate bipolymer
The allyl methacrylate of adhesive C 2：Tolysulfonyl butylmethacrylamide：2- (N- (4- hydroxy phenyls)
1.3- urylenes) ethylmethyl acrylate terpolymer
Wherein, adhesive C 1 synthesizes by the following method：
In the 300ml three-necked flasks with condenser and agitator, 2- (N- (2- hydroxyl -5- sulfamoyl benzene is added
Base) 1,3- urylenes) 13.00 grams of 7.00 grams of ethylmethyl acrylate and allyl methacrylate, and 180 grams of DMF are together
Stirring and dissolving, temperature are heated to 40 DEG C, add AIBN0.6 grams, continue to be warming up to 80 DEG C, 6 hours are incubated, then reaction solution
It is poured into 1L water, obtains yellow polymer C1, be washed with water, filter, dries, it is final to obtain finished product C1.
Adhesive C 2 synthesizes by the following method：
In the 300ml three-necked flasks with condenser and agitator, tolysulfonyl butylmethacrylamide 3.5 is added
Gram, 13.0 grams of 3.5 grams of 2- (N- (4- hydroxy phenyls) 1.3- urylenes) ethylmethyl acrylate and allyl methacrylate,
180 grams of DMF stirring and dissolvings together, be heated to 40 DEG C, add AIBN0.6 grams, continue to be warming up to 80 DEG C, be incubated 6 hours, then
Reactant is poured into 1L water, is obtained yellow polymer C2, is washed with water, and is filtered, and is dried, final to obtain finished product C2.
Component and dosage in the composition according to the form below (1) of the UV negative graph photosensitive liquid of embodiment 1 and embodiment 2 are mixed
It is made：
The gained photosensitive liquid of embodiment 1 in table (1) and the gained photosensitive liquid B of embodiment 2 are respectively coated on aluminum support,
Then dried 120 seconds at 120 DEG C, obtain the mild-natured lithographic printing plate of negative graph photosensitive (A) and the mild-natured lithographic printing plate of negative graph photosensitive (B), this
When dry coating amount be 2.0g/m2。
By obtained negative planographic printing plate (A) and (B), using section's thunder UV exposure machines in 40mj/m2, exposed with 900rpm
Light, 1%--99% halftone dot images processed.Negative image galley after exposure is developed for 20 seconds by automatic processing machine with 25 DEG C.It is used aobvious
Shadow liquid is magnificent light PVD.Image is obtained after development, site retains completely, clearly.
Embodiment 3-5
Component and dosage in the composition according to the form below (2) of the UV negative graph photosensitive liquid of embodiment 3- embodiments 5 are mixed
It is made：
After each embodiment component mixes in table (2), it is added to solvent：In methyl ethyl ketone, solid content contains in solvent
To measure as 5-10wt%, be well mixed, obtained photosensitive liquid is respectively coated on aluminum support, is then dried 120 seconds at 120 DEG C,
The mild-natured lithographic printing plate of negative graph photosensitive is obtained, using section's thunder UV exposure machines in 40mj/m2, exposed with 900rpm, 1%--99% nets processed
Dot image.Negative image galley after exposure is developed for 20 seconds by automatic processing machine with 25 DEG C.Developer solution used is magnificent light PVD.It is aobvious
Movie queen obtains image
The performance of photosensitive liquid composition is as shown in table 3 below obtained by the various embodiments described above：
Claims (9)
1. a kind of composition of UV negative graph photosensitives liquid, including solvent and solid content, it is characterised in that described solid content include with
Lower component and content：
Component A：Compound with polymerism unsaturated group, 5-60wt%；
Component B：With the dyestuff or pigment that absorbing wavelength is light within laser emission wavelength ± 50nm, 0.01-20wt%；
Component C：Adhesive resin with sulfoamido or active imino group, 20-70wt%；
Component D：Photoepolymerizationinitiater initiater, 0.5-21wt%.
2. the composition of UV negative graph photosensitives liquid according to claim 1, it is characterised in that described component A is at 1 point
There is the monomer or oligomer of the ethylenic unsaturated group of addition polymerizable more than at least one, and boiling point is under normal pressure in son
More than 100 DEG C of material.
3. the composition of UV negative graph photosensitives liquid according to claim 1 or 2, it is characterised in that described component A includes poly-
Ethylene glycol list (methyl) acrylate [methacrylate and acrylate are collectively referred to as (methyl) acrylate below], poly- third
Simple function (methyl) acrylate of glycol list (methyl) acrylate, Phenoxyethyl (methyl) acrylate etc.；Poly- second two
Alcohol two (methyl) acrylate, polypropylene glycol two (methyl) acrylate, trimethylolpropane tris (methyl) acrylate, new penta
Glycol two (methyl) acrylate, pentaerythrite three (methyl) acrylate, pentaerythrite four (methyl) acrylate, two seasons penta
It is tetrol six (methyl) acrylate, hexylene glycol two (methyl) acrylate, three (acryloyl-oxyethyl) isocyanuric acid esters, polynary
(methyl) acrylate of alcohol alkylene oxide adduct, (methyl) acrylate of polyhydric phenols alkylene oxide adduct, urethane third
Olefin(e) acid esters, polyester acrylic esters, by Epoxy Acrylates etc. obtained from epoxy resin and (methyl) acrylic acid addition
Multifunctional (methyl) acrylate；Isocyanuric acid allyl alcohol or cyanurate allyl ester.
4. the composition of UV negative graph photosensitives liquid according to claim 1, it is characterised in that described component B is in laser
There is the dyestuff or pigment for absorbing maximum, its dosage is 0.05-5wt% in launch wavelength ± 20nnm wave-length coverage.
5. the composition of the UV negative graph photosensitive liquid according to claim 1 or 4, it is characterised in that described component B is yellow
Dyestuff or pigment.
6. the composition of UV negative graph photosensitives liquid according to claim 1, it is characterised in that described component C is with sulphur
The homopolymer that the monomer of amide groups or active imino group is formed, or by the monomer with sulfoamido or active imino group, and
Copolymer obtained from other monomers copolymerization that can be copolymerized therewith.
7. the composition of UV negative graph photosensitives liquid according to claim 1, it is characterised in that described component C's divides equally again
Son amount is more than 2000, and number-average molecular weight is more than 1000.
8. the composition of UV negative graph photosensitives liquid according to claim 1, it is characterised in that described component D includes benzyl,
Benzyl acyl group ether, anthraquinone, acridine, azophenlyene, benzophenone or six aryl united imidazoles.
9. the composition of UV negative graph photosensitives liquid according to claim 1, it is characterised in that also added in described composition
There are colouring agent, surfactant, stabilizer, polymerization inhibitor or plasticizer.
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| CN111826022A (en) * | 2020-07-11 | 2020-10-27 | 张家港科思创感光新材料有限公司 | UV (ultraviolet) photocuring high-corrosion-resistance and high-sensitivity liquid photosensitive ink and preparation method thereof |
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