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CN107473434B - Fluid treatment device and preparation method thereof - Google Patents

Fluid treatment device and preparation method thereof Download PDF

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Publication number
CN107473434B
CN107473434B CN201610399542.XA CN201610399542A CN107473434B CN 107473434 B CN107473434 B CN 107473434B CN 201610399542 A CN201610399542 A CN 201610399542A CN 107473434 B CN107473434 B CN 107473434B
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fluid
substrate
nanowire
treatment device
area
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CN107473434A (en
Inventor
杨国勇
史建伟
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Suzhou Suro Film Nano Tech Co ltd
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Suzhou Suro Film Nano Tech Co ltd
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Priority to CN201610399542.XA priority Critical patent/CN107473434B/en
Priority to PCT/CN2017/086780 priority patent/WO2017211215A1/en
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00Multistage treatment of water, waste water or sewage
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/001Processes for the treatment of water whereby the filtration technique is of importance
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/002Construction details of the apparatus
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00General aspects of water treatment
    • C02F2301/08Multistage treatments, e.g. repetition of the same process step under different conditions
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00Specific treatment goals
    • C02F2303/04Disinfection
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00Use of specific compounds during water treatment
    • C02F2305/10Photocatalysts

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  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

A fluid treatment device and a method of making the same. The fluid treatment device includes: a substrate having a first fluid channel with fluid inlets distributed in a first region of a first surface of the substrate; a fluid blocking portion having a second surface disposed opposite the first surface; the first surface and the second surface are respectively provided with a plurality of nanowire-shaped bodies, one end of each nanowire-shaped body is fixedly arranged in the second area of the first surface, the other end of each nanowire-shaped body is fixedly connected with the second surface, a certain distance is reserved between every two adjacent nanowire-shaped bodies, and the second area of the first surface is adjacent to the first area, so that the nanowire-shaped bodies, the fluid blocking parts and the matrix are matched to form a second fluid channel, and fluid to be treated can only enter the first fluid channel through the second fluid channel. The fluid treatment device has the characteristics of large flux, small flow resistance, capability of efficiently removing micro/nano particles in fluid, reusability, long service life and the like, and is suitable for large-scale mass production.

Description

Fluid treatment device and preparation method thereof
Technical Field
The application relates to a device for purifying fluid containing particulate matters and a preparation method thereof.
Background
In daily life and work, there is a wide need for removing particles from fluids to clean the fluids. For example, dust, fine particles, etc. in low quality air should be removed to ensure health of human body. For example, for water and oil (edible oil, gasoline, diesel oil, etc.), particulate matters in the water and oil should be removed to realize purification of the water and the oil. For example, in the field of biological medicine, it is necessary to remove or screen cells, viruses, bacteria, and the like in blood and body fluids.
Most of the conventional fluid treatment devices (such as masks, air purifiers and the like) have the defects of low flux, large volume, short service life and the like, and have low effect of removing fine particles in the fluid.
In recent years, with the development of micro-nano processing technology, researchers have proposed some fluid processing apparatuses based on porous films, that is, by etching (corroding) numerous holes on the scale of micro-or nano-scale on the film, so that the apparatus can be applied to removing particles, especially micro-particles, in the fluid, and the size of the fluid can be precisely controlled. However, the device has contradiction between flux and mechanical strength, and has large flux, and often has fragile mechanical structure, large mechanical strength and small flux. This is because the processing technology is limited, and the smaller the hole is, the thinner the film thickness is required, which further deteriorates the mechanical support performance of the porous film, and the porous film cannot be adapted to a severe environment, and has a very limited service life, so that the porous film has not been put into practical use until now.
Still other researchers have now implemented fluid handling devices (see fig. 1) that include lateral flow channels with apertures controlled to a few nanometers using sacrificial layer technology, thus facilitating removal of fine particles from the fluid, but with too little flux.
Disclosure of Invention
The primary object of the present application is to provide an improved fluid treatment device and a method for preparing the same, which overcome the shortcomings of the prior art.
In order to achieve the above object, the present application adopts the technical scheme that:
embodiments of the present application provide a fluid treatment device, comprising:
a substrate having a first fluid channel, the first fluid channel having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid channel being distributed within a first region of a first surface of the substrate;
a fluid barrier having a second surface disposed opposite the first surface of the substrate for preventing fluid to be treated from directly entering the fluid inlet of the first fluid passage;
the device comprises a substrate, a plurality of vertical nanowire bodies distributed in a second area of the first surface of the substrate and spaced from each other, wherein the second area of the first surface of the substrate is arranged around the first area, two ends of each nanowire body are fixedly connected with the first surface of the substrate and the second surface of the fluid barrier respectively, and the distance between adjacent nanowire bodies is larger than 0 and smaller than the particle size of selected particles mixed in the fluid to be treated, so that the plurality of nanowire bodies, the fluid barrier and the substrate cooperate to form a second fluid channel, and the fluid to be treated can only enter the first fluid channel through the second fluid channel.
Embodiments of the present application also provide a method of making a fluid treatment device, comprising:
providing a substrate having a first surface and a third surface opposite the first surface;
growing a plurality of vertical nanowires spaced apart from one another on a first surface of the substrate, wherein a distance between adjacent nanowires is greater than 0 but less than a particle size of selected particles intermixed within a fluid to be treated;
a fluid blocking part which is provided with a second surface arranged opposite to the first surface of the substrate is arranged on the first surface of the substrate, and at least a plurality of nano linear bodies distributed in a second area of the first surface of the substrate are fixedly connected with the second surface of the fluid blocking part;
and processing the third surface of the substrate to form a first fluid channel penetrating the substrate, wherein the fluid inlet of the first fluid channel is distributed in a first area of the first surface of the substrate, a second area of the first surface of the substrate is arranged around the first area, so that a plurality of nanowire bodies distributed in the second area of the first surface of the substrate, the fluid blocking part and the substrate cooperate to form a second fluid channel, and the fluid to be processed can only enter the first fluid channel through the second fluid channel.
Compared with the prior art, the fluid treatment device provided by the application has the characteristics of large flux, small flow resistance, capability of efficiently removing micro/nano particles in fluid, capability of adopting a thicker substrate, high mechanical strength, capability of being cleaned and used repeatedly, long service life, simple and controllable preparation process and suitability for large-scale mass preparation.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings that are required to be used in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments described in the present application, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a cross-sectional view of a prior art fluid treatment device including a transverse flow channel;
FIG. 2 is a cross-sectional view of a fluid treatment device according to a first embodiment of the present application;
FIGS. 3 a-3 e are transverse cross-sectional views of nanowires in a fluid-handling device in accordance with certain exemplary embodiments of the present application;
FIGS. 4 a-4 c are schematic illustrations of nanowire arrangements in a fluid treatment device according to exemplary embodiments of the present application;
FIGS. 5 a-5 c are top views of various fluid treatment devices according to a first embodiment of the present application;
FIG. 6 is a cross-sectional view of a fluid treatment device according to a second embodiment of the present application;
FIG. 7 is a cross-sectional view of a fluid treatment device according to a third embodiment of the present application;
FIG. 8 is a cross-sectional view of a fluid treatment device according to a fourth embodiment of the present application;
FIG. 9 is a cross-sectional view of a fluid treatment device according to a fifth embodiment of the present application;
FIG. 10 is a process flow diagram of a fluid treatment device according to an exemplary embodiment of the present application.
Detailed Description
In view of the shortcomings in the prior art, the inventor of the present application has long studied and put forward a great deal of practice. The technical scheme, the implementation process, the principle and the like are further explained as follows.
One aspect of an embodiment of the present application provides a fluid treatment device including:
a substrate having a first fluid channel, the first fluid channel having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid channel being distributed within a first region of a first surface of the substrate;
a fluid barrier having a second surface disposed opposite the first surface of the substrate for preventing fluid to be treated from directly entering the fluid inlet of the first fluid passage;
the device comprises a substrate, a plurality of vertical nanowire bodies distributed in a second area of the first surface of the substrate and spaced from each other, wherein the second area of the first surface of the substrate is arranged around the first area, two ends of each nanowire body are fixedly connected with the first surface of the substrate and the second surface of the fluid barrier respectively, and the distance between adjacent nanowire bodies is larger than 0 and smaller than the particle size of selected particles mixed in the fluid to be treated, so that the plurality of nanowire bodies, the fluid barrier and the substrate cooperate to form a second fluid channel, and the fluid to be treated can only enter the first fluid channel through the second fluid channel.
Wherein the substrate may be of various forms, such as rectangular, lamellar, polyhedral, hemispherical, spherical or other irregular forms. Thus, the "first surface" may be any non-specifically suitable planar or curved surface on the substrate.
The first fluid passage may be any form of through-hole, the fluid inlet of which is distributed over a first surface of the substrate, and the fluid outlet of which may be distributed over another surface of the substrate than the first surface (e.g. the other surface may be adjacent to, opposite to, or in the first surface) (in which case, of course, the first surface should have a fluid barrier mechanism so that the fluid to be treated does not flow directly over the first surface to the fluid outlet).
The fluid blocking portion may be in various forms, for example, may be in a sheet shape, a thin shell shape, a rectangular body shape, a polyhedral shape, or the like, so long as it is capable of preventing the fluid to be treated from entering the fluid inlet of the first fluid channel from the fluid channel other than the second fluid channel formed by the cooperation between the plurality of nanowire bodies, the fluid blocking portion, and the substrate. The fluid barrier may be provided in various forms, for example, it may be integrally spaced from the base, may be partially connected to the base, or may be integrally formed with the base in some cases.
Wherein the plurality of nanowire bodies refers to two or more nanowire bodies. The nanowire may be in various forms, for example, it may be a linear, columnar, tubular, tapered, or other regular or irregular structure disposed vertically (herein, vertical refers mainly to a direction perpendicular or substantially perpendicular to the first surface of the substrate), and its transverse cross-sectional structure (herein, transverse refers mainly to a direction parallel to the first surface of the substrate) may also be a regular or irregular shape, for example, may be a polygon (triangle, quadrangle, or other), a circle, an ellipse, a star, or the like (see fig. 3 a-3 e).
Wherein the plurality of nanowires may be regularly or irregularly, uniformly or non-uniformly distributed on the first surface of the substrate (see fig. 4 a-4 c).
The fluid inlet of the first fluid channel has a regular or irregular shape, such as a polygon (rectangle, diamond or other), a circle or ellipse, etc., which can be simply adjusted according to the requirements of practical applications.
The fluid to be treated may be in a gaseous or liquid phase, such as air, water, oil, or in some cases, a collection of particulate matter in a fluid form, or a molten state of some matter, etc.
The term "particles" is used herein to refer mainly to solid phase particles, but in some cases may also be droplets or the like that are not compatible with the fluid (particularly liquid phase fluid).
Wherein a second region of the first surface of the substrate is disposed around the first region. In particular, a plurality of nanowire-shaped bodies distributed in the second region are arranged around the fluid inlet of the first fluid channel. By the arrangement, gaps among the plurality of nanowire-shaped bodies distributed in the second area can be used as components of the second fluid channel, so that larger fluid flux is obtained.
In some preferred embodiments, a plurality of nanowire-shaped bodies are also disposed at intervals in a third region of the first surface of the substrate, the third region being disposed around the second region. The top parts of the plurality of nanowire bodies distributed in the third area can be connected with the fluid blocking part or not connected with the fluid blocking part, and particularly when the top parts of the nanowire bodies are not connected with the fluid blocking part, gaps among the top parts of the nanowire bodies can also form a fluid channel, so that the contact surface between the fluid treatment device and fluid is further increased, and the fluid flux is improved.
Further, the nanowire-shaped bodies distributed in the third region may be the same as or different from the nanowire-shaped bodies distributed in the second region. It is particularly preferred that the distance between adjacent nanowire-shaped bodies distributed on the first surface of the substrate, whether distributed in the third region or the second region, is larger than 0 but smaller than the particle size of selected particles intermixed in the fluid to be treated.
Preferably, the first region and the second region of the first surface of the substrate are distributed in an orthographic projection of the fluid barrier on the first surface of the substrate.
Preferably, the nanowire is a linear or columnar protrusion, and the aspect ratio of the nanowire is 4: 1-200000: 1, and the ratio of the distance between adjacent nanowires to the length of the nanowires is 1: 4-1: 200000. by adopting the nanowire bodies with the structure and the distribution form, a plurality of nanowire bodies can be densely arranged (the proportion of the nanowire bodies per se in a unit area is small), so that tiny particles in fluid can be treated, and meanwhile, a larger fluid flux (the pores among the nanowire bodies are larger than the volume of the nanowire bodies per se) is provided for the fluid treatment device.
Particularly preferably, the diameter of the nanowire is 1nm to 50 μm, the length is 50nm to 200 μm, and the distance between adjacent nanowire is 1nm to 50 μm, so that the fluid treatment device formed by the construction can treat particles with the particle size as small as nanometer in the fluid, and the higher fluid treatment flux can be maintained.
Furthermore, the plurality of nanowire-shaped bodies distributed in the third area of the first surface of the substrate are distributed to form an array structure with super-hydrophobic or super-oleophobic performance. Thus, the fluid treatment device can be endowed with functions such as self-cleaning.
Of course, the nanowire may be provided with a coating layer formed of a suitable low surface energy substance known in the art on a part or the entire surface of the nanowire, or may be formed directly with a hydrophobic material, thereby providing the nanowire with superhydrophobic properties, self-cleaning properties, and the like.
In some more specific embodiments, the first fluid passage may have a pore size of 1 μm to 1mm.
In some more specific embodiments, the substrate has a thickness of 1 μm or more.
The material of the substrate may be selected from metal, nonmetal, organic material, inorganic material, etc., such as silicon wafer, polymer, ceramic, etc., but is not limited thereto.
In some preferred embodiments, the nanowire may be selected from any one or a combination of two or more of carbon nanotubes, silicon nanowires, silver nanowires, gold nanowires, zinc oxide nanowires, gallium nitride nanowires, and the like, but is not limited thereto.
In some embodiments, the nanowire may be formed of a photocatalytic material or a material having an antibacterial and bactericidal function, or the nanowire may be coated with a photocatalytic material or a material having an antibacterial and bactericidal function. For example, nanowires having photocatalytic properties such as zinc oxide nanowires and gallium nitride nanowires can be used as the nanowire, and organic substances in the fluid can be degraded by light-assisted irradiation. For example, the nanowires may employ Ag nanowires, au nanowires, etc., to kill bacteria, viruses, microorganisms in the fluid.
In some more specific embodiments, the fluid barrier has a thickness of 0.5 μm to 200 μm.
In some preferred embodiments, the fluid treatment device may further comprise at least one support body, one end of which is fixedly connected to the base body, and the other end of which is fixedly connected to the fluid barrier. By means of the support body, firm and stable matching between the fluid blocking part and the matrix can be achieved, the nanowire shape distributed between the fluid blocking part and the matrix can be effectively protected, and the problems that the nanowire shape is collapsed, damaged and the like caused by the fact that the fluid blocking part and/or the matrix is extruded after being subjected to external force are avoided.
The support may be in various forms, such as a column (a cylinder, a polygon prism, etc.), a step, a frustum, etc., and is not limited thereto, and the folding resistance thereof should be greater than any of the nanowire-shaped bodies. And the support body may be formed by processing between the fluid blocking portion and the base body, or may be formed by processing integrally with the base body or the fluid blocking portion.
Further, the number of the supporting bodies may be more than two, and the more than two supporting bodies are symmetrically distributed around the fluid inlet of the first fluid channel.
In some preferred embodiments, the fluid inlet of the first fluid channel may further be provided with one or more support beams, where the support beams are fixedly connected to the fluid blocking portion, so as to form a support for the fluid blocking portion, and further improve the structural strength of the fluid processing device.
Further, the support beam may be a plurality of support beams, which may be arranged in parallel on the fluid inlet of the first fluid passage.
In some preferred embodiments, the nanowire-shaped body is further provided with a functional material layer on the surface, and the material of the functional material layer includes, but is not limited to, photocatalytic materials, antibacterial materials, and the like. For example, the typical photocatalytic material may be titanium dioxide, etc., and when the fluid treatment device containing the functional material is used for treating the fluid, if ultraviolet irradiation is used for assisting, the photocatalytic degradation can be further carried out on some organic pollutants in the fluid, etc., so as to realize multiple purification of the fluid. For another example, a more typical antimicrobial material may be a noble metal such as Au, ag, etc., whereby bacteria, viruses, etc. in the fluid may be killed simultaneously during the treatment of the fluid.
Further, at least part of at least some of the components of the fluid treatment device are transparent structures to facilitate light penetration. For example, some or all of the fluid barrier, matrix, nanowire may be made of a transparent material.
Another aspect of the embodiments of the present application provides a method for manufacturing a fluid treatment device, including:
providing a substrate having a first surface and a third surface opposite the first surface;
growing a plurality of vertical nanowires spaced apart from one another on a first surface of the substrate, wherein a distance between adjacent nanowires is greater than 0 but less than a particle size of selected particles intermixed within a fluid to be treated;
a fluid blocking part which is provided with a second surface arranged opposite to the first surface of the substrate is arranged on the first surface of the substrate, and at least a plurality of nano linear bodies distributed in a second area of the first surface of the substrate are fixedly connected with the second surface of the fluid blocking part;
and processing the third surface of the substrate to form a first fluid channel penetrating the substrate, wherein the fluid inlet of the first fluid channel is distributed in a first area of the first surface of the substrate, a second area of the first surface of the substrate is arranged around the first area, so that a plurality of nanowire bodies distributed in the second area of the first surface of the substrate, the fluid blocking part and the substrate cooperate to form a second fluid channel, and the fluid to be processed can only enter the first fluid channel through the second fluid channel.
In some more specific embodiments, the method of making is characterized by comprising:
forming a plurality of nanowire-shaped bodies which are spaced from each other on the first surface of the substrate;
coating soluble or corrodible organic matters and/or inorganic matters on the first surface of the substrate, and filling gaps among the plurality of nanowire bodies with the organic matters and/or inorganic matters to form a sacrificial layer;
setting a first photoresist mask on the sacrificial layer, etching the sacrificial layer to expose at least the tops of the plurality of nanowire-shaped bodies distributed in a second area of the first surface of the substrate, and removing the first photoresist mask;
providing a second mask on the first surface of the substrate, exposing the region corresponding to the fluid barrier on the first surface of the substrate, depositing to form the fluid barrier, and removing the second mask;
a patterned third photoresist mask is arranged on the third surface of the substrate, the third surface of the substrate is etched until the sacrificial material filled between the adjacent nanowire bodies is exposed, thereby forming a slot on the third surface of the substrate, the position of the slot corresponds to the first area of the first surface of the substrate, the second area of the first surface of the substrate is arranged around the first area,
and removing the third photoresist mask and the sacrificial material filled between the plurality of nanowire bodies to form the first fluid channel on the substrate.
The technical solution of the present application will be further described below with reference to the accompanying drawings and several embodiments. It should be noted that the structures of the fluid treatment device and the related devices are shown in the drawings simply and schematically, and thus the dimensions, size ratios, etc. of the components therein are not precisely drawn.
Referring to fig. 2 and fig. 5 a-5 b, in a first embodiment of the present application, a fluid treatment device includes a substrate 101, where the substrate 101 has a first surface 101a, a first area 1011 (an area surrounded by a dashed line in the drawing) of the substrate 101 is distributed with a plurality of through holes 104 serving as fluid channels, the first surface is provided with an array formed by a plurality of vertical nanowires and/or nanotubes (abbreviated as nanowires/tubes) 103, top portions of the plurality of nanowires/tubes 103 distributed in the through holes 104 in a second area 1012 surrounding the first area 1011 are further connected with a fluid blocking portion 102, the fluid blocking portion 102 is disposed above a fluid inlet of the through holes 104, so that a fluid to be treated cannot bypass the nanowire/tube array and directly enter the through holes 104, and the fluid blocking portion 102 has a second surface 102b opposite to the first surface 101 a. While a plurality of vertical nanowires/tubes 103 may also be densely distributed within the remaining region 1013 of the first surface 101a (which may be designated as a third region). In fig. 2, the arrows with broken lines show the direction of travel of the fluid.
The nano wires/tubes can be densely arranged on the first surface of the matrix due to the fact that the nano wires/tubes have larger height-diameter ratio (or length-diameter ratio), particles with different particle size ranges in fluid can be removed through adjusting the distance between the nano wires/tubes, and meanwhile, the resistance of the nano wires/tubes to the fluid can be controlled to be very low due to the fact that the diameter of the nano wires/tubes is very small, and large fluid flux is formed, and the nano wires/tubes are far superior to the existing porous membrane, a fluid treatment device based on transverse flow channels and the like.
If the above-mentioned nanowire/tube array is designed to a certain extent by referring to the known solutions in the industry, the nanowire/tube array can also be formed into a superhydrophobic structure and a superoleophobic structure, so that not only particles in fluid can be removed, but also the blocked particles can not be accumulated in a functional area (nanowire/tube array surface) of the fluid treatment device through self-cleaning action, thereby avoiding the failure of the fluid treatment device after long-term use.
The substrate 101 may have a larger thickness, so that the substrate may form a better support for the nanowire/tube array, and may further enhance the mechanical strength of the fluid processing device, so that the fluid processing device may be pressure-resistant, bending-resistant, collision-resistant, impact-resistant, and further may be applied in various environments without damage, for example, may be applied in processing high-pressure and high-speed fluids, which is not achieved by the existing porous membrane.
The fluid blocking part can be sheet-shaped, and the thickness and the like of the fluid blocking part can be adjusted according to practical application requirements.
The material selection ranges of the parts (101, 102, 103, 104) of the fluid treatment device are various, and the materials can be inorganic materials or organic materials, such as metals, nonmetallic inorganic materials, plastics, ceramics, semiconductors, glass, polymers and the like. When inorganic materials are selected for use in these parts, the fluid treatment device also has temperature change resistance and can treat high-temperature and low-temperature fluids.
The fluid treatment device adopting the design can be cleaned (ultrasonically) and used for multiple times, and still has good fluid treatment capability.
When the fluid is treated by the fluid treatment device, the fluid containing impurity particles enters the array of the nano wires/tubes 103, wherein particles (or some liquid drops incompatible with the fluid, such as water drops in air or water drops in oil) with particle diameters larger than a certain value are blocked outside the array of the nano wires/tubes, and then the fluid reaches the inlet of the through holes 104 through gaps among the nano wires/tubes and then enters the through holes 104, so that the purification of the fluid and/or the enrichment recovery of the required particles (liquid drops) are realized.
Referring again to FIG. 2, in some embodiments of the first embodiment, the nanowire/tube may have a diameter of 1nm to 50 μm and a length (height) h 1 May be 50nm to 200 μm and the distance between adjacent nanowires/tubes may be 1nm to 50 μm. The aperture w of the through hole 104 may be 1 μm to 1mm. Thickness h of the substrate 2 May be 1 μm or more. Thickness h of the fluid barrier 3 May be 0.5 μm to 200. Mu.m.
Referring again to fig. 3 a-3 e, the transverse cross-sectional structure of the nanowires/tubes may be regular or irregular, such as polygonal (triangular, quadrilateral or otherwise), circular, elliptical, star-shaped, etc.
Referring again to fig. 4 a-4 c, the nanowires/tubes described above may be regularly or irregularly, uniformly or non-uniformly distributed on the first surface of the substrate. In some more specific applications, the average spacing between adjacent nanowires/tubes is in the range of 1nm to 50 μm.
In addition, referring to fig. 5 a-5 c, in the first embodiment, the shapes (particularly the shapes of the transverse cross-sections) of the through holes 104 and the fluid barriers 102 may be varied, for example, circular, square, rectangular or other shapes.
Referring to fig. 6, preferably, in a second embodiment of the present application, a fluid treatment device includes a substrate 201, where the substrate 201 has a first surface 2011 and a third surface (not shown) opposite to the first surface, and a plurality of through holes 204 serving as fluid channels are distributed on the substrate 201, an array of a plurality of vertical nanowires/tubes 203 is disposed on the first surface, a fluid blocking portion 202 is further connected to the top of the plurality of nanowires/tubes 203 distributed around the through holes 204, and the fluid blocking portion 202 is disposed above a fluid inlet of the through holes 204, so that a fluid to be treated cannot bypass the nanowire/tube array and directly enter the through holes 204. And, more than one supporting body 205, for example, four supporting bodies 205, are symmetrically or asymmetrically distributed around the through hole 204, and the supporting of the fluid blocking portion 202 can be further increased by the supporting bodies 205, so that a more firm and stable fit between the fluid blocking portion and the matrix is realized, and the nanowire/tube array distributed between the fluid blocking portion and the matrix can be effectively protected, so that the problems of collapse, damage and the like of the nanowire/tube 203 caused by extrusion of the nanowire/tube array after the fluid blocking portion and/or the matrix are subjected to external force are avoided.
The support body may be in various forms, for example, may have a rectangular, trapezoidal, stepped longitudinal section (the longitudinal direction herein may be understood as a direction perpendicular to the first surface of the base body), etc., and is not limited thereto. In some embodiments of this second embodiment, the support may be a boss or the like protruding upward from an edge portion of the through hole 204, and an upper end thereof is connected to the fluid blocking portion 202.
The number, diameter, distribution density and the like of the supporting bodies can be adjusted according to actual needs, but the space occupying the first surface of the matrix is as small as possible, so that the large influence on the fluid flux of the nanowire/tube is avoided.
The structures, arrangement forms, materials, etc. of the substrate, nanowire/tube array, fluid barrier, through-hole, etc. used in the second embodiment may be the same as or similar to those described above, and thus will not be repeated here.
Referring to fig. 7, preferably, in a third embodiment of the present application, a fluid treatment device includes a substrate 301, where the substrate 301 has a first surface 3011 and a third surface (not shown) opposite to the first surface, and a plurality of through holes 304 serving as fluid channels are distributed on the substrate 301, an array of a plurality of vertical nanowires/tubes 303 is disposed on the first surface, and a fluid blocking portion 302 is further connected to the top of the plurality of nanowires/tubes 303 distributed around the through holes 304, and the fluid blocking portion 302 is disposed above a fluid inlet of the through holes 304, so that a fluid to be treated cannot bypass the nanowire/tube array and directly enter the through holes 304. And, more than one supporting beam 305, for example, symmetrically or asymmetrically arranged, is further erected on the through hole 304, and the supporting beam 305 can further increase the support to the fluid blocking portion 302, so as to realize a more firm and stable fit between the fluid blocking portion and the matrix, and can effectively form protection for the nanowire/tube array distributed between the fluid blocking portion and the matrix, thereby avoiding the problems of collapse, damage and the like of the nanowire/tube 303 caused by the extrusion of the nanowire/tube array after the fluid blocking portion and/or the matrix are subjected to external force.
The support beam may be in various forms, for example, may be in an arch shape, etc., and is not limited thereto. And further the support beam may also be fitted with other supports, such as those described in the second embodiment.
The number, the size, the distribution density and the like of the supporting beams can be adjusted according to actual needs, but the fluid inlets of the through holes are shielded as little as possible, so that the large influence on the fluid flux of the fluid treatment device is avoided.
The structures, arrangement forms, materials, etc. of the substrate, nanowire/tube array, fluid barrier, through hole, etc. used in the third embodiment may be the same as or similar to those described above, and thus will not be repeated here.
Referring to fig. 8, in a fourth embodiment of the present application, a fluid treatment device preferably includes a substrate 401, where the substrate 401 has a first surface 4011 and a third surface 4012 opposite to the first surface, a plurality of through holes 404 serving as fluid channels are distributed on the substrate 401, an array formed by a plurality of vertical nano-pillars 403 is disposed on the first surface, top portions of the plurality of nano-pillars 403 distributed around the through holes 304 are further connected to a fluid blocking portion 402, and the fluid blocking portion 402 is disposed above a fluid inlet of the through holes 404, so that a fluid to be treated cannot bypass the aforementioned nano-pillar array and directly enter the through holes 304. A photocatalytic material layer 405 is further provided on the surface of the nano-pillars 403 and the first surface of the substrate 401. When the fluid is treated by the fluid treatment device comprising the photocatalytic material layer 405, if ultraviolet irradiation is used, some organic pollutants in the fluid can be subjected to photocatalytic degradation, so that multiple purification of the fluid can be realized.
Wherein, in order to facilitate the penetration of light, part or all of the fluid barrier, the matrix and the nanowire may be made of transparent materials. In some embodiments of the present example, the fluid barrier may be integrally formed of a transparent material, such as light injection.
Among them, the photocatalytic material may be titanium dioxide or the like, but is not limited thereto.
Wherein, to form the photocatalytic material layer 405, a person skilled in the art may use various ways known in the art, such as coating (spin coating, spray coating, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, atomic layer deposition, etc.), sputtering, etc., and is not limited thereto.
Wherein the thickness of the photocatalytic material layer 405 may be controlled to be on the order of nanometers to minimize its effect on the fluid flux of the fluid treatment device.
The structures, arrangement forms, materials, etc. of the substrate, nanowire/tube array, fluid barrier, through-hole, etc. used in the fourth embodiment may be the same as or similar to those described above, and thus will not be described here again.
Referring to fig. 9, preferably, in a fifth embodiment of the present application, a fluid treatment device includes a substrate 501, where the substrate 501 has a first surface 5011 and a third surface 5012 opposite to the first surface, a plurality of through holes 504 serving as fluid channels are distributed on the substrate 501, an array of a plurality of vertical nano pillars 503 is disposed on the first surface, top portions of the plurality of nano pillars 503 distributed around the through holes 504 are further connected to a fluid blocking portion 502, and the fluid blocking portion 502 is disposed above a fluid inlet of the through holes 504, so that a fluid to be treated cannot bypass the aforementioned nano pillar array and directly enter the through holes 504. An antibacterial material layer 505 is further provided on the surface of the nano-pillars 503 and the first surface of the substrate 501. When the fluid is treated by the fluid treatment device comprising the antibacterial material layer 505, bacteria, viruses and the like in the fluid can be killed synchronously in the treatment process of the fluid, so that multiple purification of the fluid can be realized.
Among them, a more typical antibacterial material may be a noble metal such as Au, ag, etc., but is not limited thereto.
Wherein, to form the antibacterial material layer 505, those skilled in the art can use various methods known in the art, such as coating (spin coating, spray coating, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, atomic layer deposition, etc.), sputtering, etc., and are not limited thereto.
Wherein the thickness of the antimicrobial material layer 505 may be controlled at the nanometer level to minimize its effect on the fluid flux of the fluid treatment device.
The structures, arrangement forms, materials, etc. of the substrate, nanowire/tube array, fluid barrier, through-hole, etc. used in the fifth embodiment may be the same as or similar to those described above, and thus will not be repeated here.
The fluid treatment device of the present application may be prepared by physical and chemical methods, for example, chemical growth methods, physical processing methods, and the like, and in particular, MEMS (micro electro mechanical system, microelectromechanical Systems) methods, and the like.
For example, referring to fig. 10, in a sixth embodiment of the present application, a process for preparing a fluid treatment device may include the steps of:
s1: growing a plurality of vertical nanowires/tubes disposed in spaced relation to each other on a first surface of a substrate (e.g., a silicon wafer);
s2: coating a soluble or corrodible organic matter and/or inorganic matter on the first surface of the substrate, and filling gaps among the vertical nanowires/tubes with the organic matter and/or inorganic matter to form a sacrificial layer;
s3: setting photoresist on the sacrificial layer and performing photoetching;
s4: etching the sacrificial layer to expose the tops of the plurality of vertical nanowires distributed in the second area of the first surface of the substrate, and then removing the photoresist;
s5: providing a photoresist mask on a first surface of the substrate, and exposing a region on the first surface of the substrate corresponding to the fluid barrier;
s6: depositing a fluid barrier in the exposed region corresponding to the fluid barrier;
s7: stripping to remove the photoresist;
s8: providing a patterned etching mask on a third surface of the substrate opposite the first surface;
s9: etching the third surface of the substrate until the sacrificial material filled between the adjacent vertical nanowires is exposed, so that a slot is formed on the third surface of the substrate, the position of the slot corresponds to a first area of the first surface of the substrate, and a second area of the first surface of the substrate is arranged around the first area;
s10: and removing the etching mask and the sacrificial material filled between the vertical nanowires to obtain the fluid treatment device.
The manner in which the vertical nanowires/tubes are grown in the foregoing steps may be selected from a variety of manners known in the art, such as MOCVD, PECVD, electrochemical deposition, and the like.
The etching method adopted in the foregoing steps may be photolithography, mechanical etching, dry etching, wet etching, or the like.
For example, the method of forming a patterned (nanopatterned) photoresist mask in the foregoing steps includes: photolithography, nanosphere masking, nano (metal) particle masking, and the like, and are not limited thereto.
For example, the substrate may be etched in the foregoing steps by means known in the art, such as RIE, ICP, wet etching, electrochemical etching, and the like.
For example, in the foregoing step, the filled soluble organic matter may be a photoresist or the like or a corrodible inorganic matter such as metal, siO 2 SiN, etc.
Obviously, the preparation process of the fluid treatment device is simple and controllable, and is suitable for mass production.
It should be understood that the above embodiments are merely for illustrating the technical concept and features of the present application, and are intended to enable those skilled in the art to understand the content of the present application and implement the same according to the content of the present application, not to limit the protection scope of the present application. All equivalent changes or modifications made in accordance with the spirit of the present application are intended to be included within the scope of the present application.

Claims (16)

1. A fluid treatment device, comprising:
a substrate having a first fluid channel, the first fluid channel having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid channel being distributed within a first region of a first surface of the substrate;
the fluid blocking part is provided with a second surface which is opposite to the first surface of the matrix and is used for preventing the fluid to be treated from directly entering the fluid inlet of the first fluid channel, and more than one supporting beam is erected on the fluid inlet of the first fluid channel and is fixedly connected with the fluid blocking part;
a plurality of vertical nanowire bodies distributed in a second area of the first surface of the substrate and spaced from each other, wherein the second area of the first surface of the substrate is arranged around the first area, the first area and the second area of the first surface of the substrate are distributed in the orthographic projection of the fluid barrier on the first surface of the substrate, two ends of each nanowire body are fixedly connected with the first surface of the substrate and the second surface of the fluid barrier respectively, wherein the distance between adjacent nanowire bodies is larger than 0 but smaller than the particle size of selected particles mixed in the fluid to be treated, so that a second fluid channel is formed by the plurality of nanowire bodies, the fluid barrier and the substrate in a matched manner, and the fluid to be treated can enter the first fluid channel only through the second fluid channel;
the at least one support body is fixedly connected with the base body at one end and the fluid blocking part at the other end;
wherein the aspect ratio of the nanowire is 4: 1-200000: 1, the ratio of the distance between adjacent nanowire bodies to the length of the nanowire body is 1: 4-1: 200000;
a plurality of vertical nanowire-shaped bodies which are arranged at intervals are also distributed in a third area of the first surface of the matrix, and the third area of the first surface of the matrix is arranged around the second area.
2. The fluid treatment device of claim 1, wherein: and a plurality of vertical nanowire bodies distributed in a third area of the first surface of the matrix are distributed to form an array structure with super-hydrophobic or super-oleophobic performance.
3. The fluid treatment device according to any one of claims 1-2, wherein: the nanowire is grown in situ on the first surface of the substrate.
4. The fluid treatment device according to any one of claims 1-2, wherein: the nanowire is selected from any one of nanowires, nanopillars and nanotubes.
5. The fluid treatment device of claim 1, wherein: the plurality of nanowire bodies are uniformly distributed or non-uniformly distributed on the first surface of the matrix.
6. The fluid treatment device of claim 1, wherein: the fluid inlet of the first fluid channel has a regular or irregular shape, the regular shape being polygonal, circular or elliptical.
7. The fluid treatment device of claim 1, wherein: the diameter of the nanowire is 1 nm-50 mu m, the length of the nanowire is 50 nm-200 mu m, and the distance between adjacent nanowire is 1 nm-50 mu m.
8. The fluid treatment device of claim 1, wherein: the nanowire is selected from any one of a carbon nanotube, a silicon nanowire, a silver nanowire, a gold nanowire, a zinc oxide nanowire and a gallium nitride nanowire.
9. The fluid treatment device of claim 1, wherein: the fluid treatment device comprises more than two supporting bodies which are symmetrically distributed around the fluid inlet of the first fluid channel.
10. The fluid treatment device of claim 1, wherein: the aperture of the first fluid channel is 1 mu m-1 mm.
11. The fluid treatment device of claim 1, wherein: the thickness of the matrix is more than 1 mu m.
12. The fluid treatment device of claim 1, wherein: the thickness of the fluid blocking portion is 0.5 mu m-200 mu m.
13. The fluid treatment device of claim 1, wherein: the surface of the nanowire is also provided with a functional material layer, and the material of the functional material layer is selected from photocatalytic materials or antibacterial materials.
14. The fluid treatment device of claim 1, wherein: at least part of at least some of the components in the fluid treatment device are transparent structures.
15. A method of manufacturing a fluid treatment device according to any one of claims 1 to 14, comprising:
providing a substrate having a first surface and a third surface opposite the first surface;
growing a plurality of vertical nanowires spaced apart from one another on a first surface of the substrate, wherein a distance between adjacent nanowires is greater than 0 but less than a particle size of selected particles intermixed within a fluid to be treated;
a fluid blocking part which is provided with a second surface arranged opposite to the first surface of the substrate is arranged on the first surface of the substrate, and at least a plurality of nano linear bodies distributed in a second area of the first surface of the substrate are fixedly connected with the second surface of the fluid blocking part;
and processing the third surface of the substrate to form a first fluid channel penetrating the substrate, wherein the fluid inlet of the first fluid channel is distributed in a first area of the first surface of the substrate, a second area of the first surface of the substrate is arranged around the first area, so that a plurality of nanowire bodies distributed in the second area of the first surface of the substrate, the fluid blocking part and the substrate cooperate to form a second fluid channel, and the fluid to be processed can only enter the first fluid channel through the second fluid channel.
16. The method of manufacturing as claimed in claim 15, comprising:
forming a plurality of nanowire-shaped bodies which are spaced from each other on the first surface of the substrate;
coating soluble or corrodible organic matters and/or inorganic matters on the first surface of the substrate, and filling gaps among the plurality of nanowire bodies with the organic matters and/or inorganic matters to form a sacrificial layer;
setting a first photoresist mask on the sacrificial layer, etching the sacrificial layer to expose at least the tops of the plurality of nanowire-shaped bodies distributed in a second area of the first surface of the substrate, and removing the first photoresist mask;
providing a second mask on the first surface of the substrate, exposing the region corresponding to the fluid barrier on the first surface of the substrate, depositing to form the fluid barrier, and removing the second mask;
a patterned third photoresist mask is arranged on the third surface of the substrate, the third surface of the substrate is etched until the sacrificial material filled between the adjacent nanowire bodies is exposed, thereby forming a slot on the third surface of the substrate, the position of the slot corresponds to the first area of the first surface of the substrate, the second area of the first surface of the substrate is arranged around the first area,
and removing the third photoresist mask and the sacrificial material filled between the plurality of nanowire bodies to form the first fluid channel on the substrate.
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