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CN107275347B - An array substrate, its preparation method and display panel - Google Patents

An array substrate, its preparation method and display panel Download PDF

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CN107275347B
CN107275347B CN201710525619.8A CN201710525619A CN107275347B CN 107275347 B CN107275347 B CN 107275347B CN 201710525619 A CN201710525619 A CN 201710525619A CN 107275347 B CN107275347 B CN 107275347B
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orthographic projection
substrate
electrode
base substrate
gate
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CN107275347A (en
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韦东梅
何小祥
童振霄
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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Chengdu BOE Optoelectronics Technology Co Ltd
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    • GPHYSICS
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    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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    • G02F1/136209Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
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    • H10D86/451Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by the compositions or shapes of the interlayer dielectrics
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    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • G02F1/134372Electrodes characterised by their geometrical arrangement for fringe field switching [FFS] where the common electrode is not patterned

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Abstract

本发明公开了一种阵列基板、其制备方法及显示面板,该阵列基板包括:依次位于衬底基板上的栅极、有源层、源极和漏极;还包括:挡光层;所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠;有源层在衬底基板上的正投影位于挡光层与栅极在衬底基板上的正投影区域内;栅极在衬底基板上的正投影面积小于有源层在衬底基板上的正投影面积。这样可以降低栅极与源漏电极之间的寄生电容,同时通过栅极与挡光层遮挡有源层,避免有源层因感光而产生光漏电的问题。

Figure 201710525619

The invention discloses an array substrate, a preparation method thereof and a display panel. The array substrate comprises: a gate electrode, an active layer, a source electrode and a drain electrode sequentially located on a base substrate; further comprising: a light blocking layer; the The orthographic projection of the active layer on the base substrate overlaps with the orthographic projection of the light blocking layer on the base substrate and the orthographic projection of the gate electrode on the base substrate; The orthographic projection of the source layer on the base substrate is located in the orthographic projection area of the light blocking layer and the gate on the base substrate; the orthographic projection area of the gate on the base substrate is smaller than that of the active layer on the base substrate. shadow area. In this way, the parasitic capacitance between the gate electrode and the source-drain electrodes can be reduced, and the active layer is shielded by the gate electrode and the light blocking layer, so as to avoid the problem of light leakage caused by the active layer due to light exposure.

Figure 201710525619

Description

一种阵列基板、其制备方法及显示面板An array substrate, its preparation method and display panel

技术领域technical field

本发明涉及显示技术领域,尤其涉及一种阵列基板、其制备方法及显示面板。The present invention relates to the field of display technology, and in particular, to an array substrate, a preparation method thereof and a display panel.

背景技术Background technique

与传统的阴极射线显示器(CRT,Cathode ray tube)相比,液晶显示器(LCD,Liquid Crystal Display)可以被制造得较小且质轻,目前被广泛应用于电视、手机以及公共信息的显示。目前,在液晶显示面板中,可以通过向两个电极施加电压,在液晶层上产生电场,并通过调节产生的电场的强度,以调节穿过液晶层的光的透过率,从而可以得到显示图像。Compared with a traditional cathode ray display (CRT, Cathode ray tube), a liquid crystal display (LCD, Liquid Crystal Display) can be made smaller and lighter, and is currently widely used in televisions, mobile phones and display of public information. At present, in a liquid crystal display panel, an electric field can be generated on the liquid crystal layer by applying a voltage to two electrodes, and the transmittance of light passing through the liquid crystal layer can be adjusted by adjusting the intensity of the generated electric field, so that a display can be obtained. image.

液晶显示面板的阵列基板的结构如图1所示,主要包括:位于衬底基板1上的栅极2、栅绝缘层3、有源层4、源电极5、漏电极6、像素电极7、钝化层8和公共电极9;其中,主要由栅极2、有源层4、源电极5和漏电极6组成用于控制各像素开关的薄膜晶体管(TFT,ThinFilm Transistor)。由于现有的TFT中栅极与源漏电极之间交叠的面积较多,从而会在栅极与源漏电极之间产生较大的寄生电容,而较大的寄生电容使得液晶显示面板驱动显示过程中负载大,因此会造成显示面板整体的功耗较大的问题。另外,如图1所示,在TFT关闭时,由于栅极对应的沟道区域感应出大量电荷;且如图2所示,栅极2与源电极5和漏电极6之间具有较多的交叠面积;因此如图3所示,感应出的电荷可以与两侧的源电极5和漏电极6的金属接触,从而形成电流通路,最终导致显示面板存在侧壁漏电的问题。The structure of the array substrate of the liquid crystal display panel is shown in FIG. 1, which mainly includes: a gate 2, a gate insulating layer 3, an active layer 4, a source electrode 5, a drain electrode 6, a pixel electrode 7, The passivation layer 8 and the common electrode 9; wherein, the gate electrode 2, the active layer 4, the source electrode 5 and the drain electrode 6 are mainly composed of a thin film transistor (TFT, ThinFilm Transistor) used to control the switch of each pixel. Due to the large overlapping area between the gate and the source-drain electrodes in the existing TFT, a large parasitic capacitance will be generated between the gate and the source-drain electrodes, and the large parasitic capacitance will make the liquid crystal display panel drive During the display process, the load is large, which will cause the problem of large power consumption of the display panel as a whole. In addition, as shown in FIG. 1 , when the TFT is turned off, a large amount of charges are induced in the channel region corresponding to the gate; and as shown in FIG. Therefore, as shown in Figure 3, the induced charges can contact the metal of the source electrode 5 and the drain electrode 6 on both sides, thereby forming a current path, which eventually leads to the problem of sidewall leakage of the display panel.

因此,如何降低显示面板的功耗,提高显示面板的显示效果,是本领域技术人员亟待解决的问题。Therefore, how to reduce the power consumption of the display panel and improve the display effect of the display panel is an urgent problem to be solved by those skilled in the art.

发明内容SUMMARY OF THE INVENTION

本发明实施例提供了一种阵列基板、其制备方法及显示面板,用以解决现有技术中存在的显示面板的功耗较大的问题。Embodiments of the present invention provide an array substrate, a method for manufacturing the same, and a display panel, so as to solve the problem of high power consumption of the display panel in the prior art.

本发明实施例提供了一种阵列基板,包括:依次位于衬底基板上的栅极、有源层、源极和漏极;还包括:挡光层;An embodiment of the present invention provides an array substrate, comprising: a gate electrode, an active layer, a source electrode and a drain electrode sequentially located on a base substrate; further comprising: a light blocking layer;

所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠;The orthographic projection of the active layer on the base substrate overlaps with the orthographic projection of the light blocking layer on the base substrate and the orthographic projection of the gate on the base substrate ;

所述有源层在所述衬底基板上的正投影位于所述挡光层与所述栅极在所述衬底基板上的正投影区域内;The orthographic projection of the active layer on the base substrate is located in the orthographic projection area of the light blocking layer and the gate on the base substrate;

所述栅极在所述衬底基板上的正投影面积小于所述有源层在所述衬底基板上的正投影面积。The orthographic projection area of the gate electrode on the base substrate is smaller than the orthographic projection area of the active layer on the base substrate.

在一种可能的实施方式中,本发明实施例提供的上述阵列基板中,所述栅极在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影不交叠或者部分交叠。In a possible implementation manner, in the above array substrate provided by the embodiment of the present invention, the orthographic projection of the gate on the base substrate and the orthographic projection of the light blocking layer on the base substrate Do not overlap or partially overlap.

在一种可能的实施方式中,本发明实施例提供的上述阵列基板中,所述挡光层位于所述衬底基板与所述栅极之间。In a possible implementation manner, in the above-mentioned array substrate provided by the embodiment of the present invention, the light blocking layer is located between the base substrate and the gate electrode.

在一种可能的实施方式中,本发明实施例提供的上述阵列基板中,所述源极的形状为U形。In a possible implementation manner, in the above-mentioned array substrate provided by the embodiment of the present invention, the shape of the source electrode is U-shaped.

在一种可能的实施方式中,本发明实施例提供的上述阵列基板中,所述挡光层的材料为金属材料。In a possible implementation manner, in the above-mentioned array substrate provided by the embodiment of the present invention, the material of the light blocking layer is a metal material.

在一种可能的实施方式中,本发明实施例提供的上述阵列基板中,还包括:像素电极、钝化层和公共电极;其中,In a possible implementation manner, the above-mentioned array substrate provided in the embodiment of the present invention further includes: a pixel electrode, a passivation layer and a common electrode; wherein,

所述像素电极与所述有源层同层设置且与所述漏极电性相连;The pixel electrode is disposed in the same layer as the active layer and is electrically connected to the drain;

所述钝化层位于所述源极和所述漏极之上;the passivation layer is located over the source electrode and the drain electrode;

所述公共电极位于所述钝化层之上。The common electrode is located on the passivation layer.

本发明实施例提供了一种显示面板,包括本发明实施例提供的上述阵列基板。An embodiment of the present invention provides a display panel including the above-mentioned array substrate provided by an embodiment of the present invention.

本发明实施例提供了一种本发明实施例提供的上述阵列基板的制备方法,包括:An embodiment of the present invention provides a method for preparing the above-mentioned array substrate provided by an embodiment of the present invention, including:

在所述衬底基板上形成所述挡光层的图形;forming a pattern of the light blocking layer on the base substrate;

在形成有所述挡光层的图形的衬底基板上,形成包括所述栅极、所述有源层、所述源极和所述漏极的图形;forming a pattern including the gate electrode, the active layer, the source electrode and the drain electrode on the base substrate on which the pattern of the light blocking layer is formed;

其中,in,

所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠;The orthographic projection of the active layer on the base substrate overlaps with the orthographic projection of the light blocking layer on the base substrate and the orthographic projection of the gate on the base substrate ;

所述有源层在所述衬底基板上的正投影位于所述挡光层与所述栅极在所述衬底基板上的正投影区域内;The orthographic projection of the active layer on the base substrate is located in the orthographic projection area of the light blocking layer and the gate on the base substrate;

所述栅极在所述衬底基板上的正投影面积小于所述有源层在所述衬底基板上的正投影面积。The orthographic projection area of the gate electrode on the base substrate is smaller than the orthographic projection area of the active layer on the base substrate.

在一种可能的实施方式中,本发明实施例提供的上述制备方法中,所述栅极在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影不交叠或者部分交叠。In a possible implementation, in the above-mentioned preparation method provided by the embodiment of the present invention, the orthographic projection of the gate on the base substrate and the orthographic projection of the light blocking layer on the base substrate Do not overlap or partially overlap.

在一种可能的实施方式中,本发明实施例提供的上述制备方法中,还包括:In a possible implementation, the above-mentioned preparation method provided in the embodiment of the present invention further includes:

在形成有所述挡光层的图形的衬底基板上,形成包括所述像素电极、所述钝化层和所述公共电极的图形。On the base substrate on which the pattern of the light blocking layer is formed, a pattern including the pixel electrode, the passivation layer and the common electrode is formed.

本发明实施例的有益效果包括:The beneficial effects of the embodiments of the present invention include:

本发明实施例提供了一种阵列基板、其制备方法及显示面板,该阵列基板包括:依次位于衬底基板上的栅极、有源层、源极和漏极;还包括:挡光层;所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠,有源层在衬底基板上的正投影位于挡光层与栅极在衬底基板上的正投影区域内;栅极在衬底基板上的正投影面积小于有源层在衬底基板上的正投影面积。这样本发明通过在衬底基板上设置挡光层,使挡光层与栅极均与有源层具有交叠区域,从而可以减小栅极与有源层的交叠区域,进而减小栅极与源漏电极的交叠区域,即通过增加挡光层来减少栅极的宽度,使栅极与源漏电极的交叠面积减小,降低栅极与源漏电极之间的寄生电容,从而降低显示面板的功耗;同时设置有源层在衬底基板上的正投影位于栅极与挡光层在衬底基板上的正投影区域内,这样可以通过栅极和挡光层遮挡有源层,避免有源层因感光而产生光生载流子即光漏电的问题。Embodiments of the present invention provide an array substrate, a preparation method thereof, and a display panel. The array substrate includes: a gate electrode, an active layer, a source electrode and a drain electrode sequentially located on a base substrate; and further includes: a light blocking layer; The orthographic projection of the active layer on the base substrate overlaps with the orthographic projection of the light blocking layer on the base substrate and the orthographic projection of the gate on the base substrate , the orthographic projection of the active layer on the base substrate is located in the orthographic projection area of the light blocking layer and the gate on the base substrate; the orthographic projection area of the gate on the base substrate is smaller than that of the active layer on the base substrate the orthographic projection area of . In this way, in the present invention, by arranging a light-blocking layer on the base substrate, both the light-blocking layer and the gate electrode have overlapping areas with the active layer, so that the overlapping area between the gate electrode and the active layer can be reduced, thereby reducing the size of the gate electrode and the active layer. The overlapping area between the electrode and the source-drain electrode, that is, the width of the gate is reduced by adding a light-blocking layer, so that the overlapping area of the gate and the source-drain electrode is reduced, and the parasitic capacitance between the gate and the source-drain electrode is reduced. Thereby, the power consumption of the display panel is reduced; at the same time, the orthographic projection of the active layer on the base substrate is arranged in the orthographic projection area of the gate and the light-blocking layer on the base substrate, so that the gate and the light-blocking layer can block the The source layer can avoid the problem of photo-generated carriers, that is, optical leakage, caused by the active layer due to light exposure.

附图说明Description of drawings

图1为现有技术中阵列基板的结构示意图;1 is a schematic structural diagram of an array substrate in the prior art;

图2为现有技术中阵列基板的平面结构示意图;2 is a schematic plan view of an array substrate in the prior art;

图3为现有技术中沟道区域的感应电荷分布示意图;3 is a schematic diagram of an induced charge distribution in a channel region in the prior art;

图4为本发明实施例提供的阵列基板的结构示意图;FIG. 4 is a schematic structural diagram of an array substrate provided by an embodiment of the present invention;

图5为本发明实施例提供的阵列基板的平面结构示意图;FIG. 5 is a schematic plan view of an array substrate provided by an embodiment of the present invention;

图6为本发明实施例提供的道区域的感应电荷分布示意图;6 is a schematic diagram of an induced charge distribution in a track region provided by an embodiment of the present invention;

图7为本发明实施例提供的阵列基板的制备方法流程图;FIG. 7 is a flowchart of a method for fabricating an array substrate according to an embodiment of the present invention;

图8a-图8g分别为本发明实施例提供的阵列基板的制备过程示意图。8a-8g are schematic diagrams of a preparation process of an array substrate according to an embodiment of the present invention, respectively.

具体实施方式Detailed ways

下面结合附图,对本发明实施例提供的阵列基板、其制备方法及显示面板的具体实施方式进行详细的说明。The specific implementations of the array substrate, the manufacturing method thereof, and the display panel provided by the embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

本发明实施例提供了一种阵列基板,如图4所示,可以包括:依次位于衬底基板01上的栅极02、有源层03、源极04和漏极05;还可以包括:挡光层06;有源层03在所述衬底基板上01的正投影与所述挡光层06在所述衬底基板01上的正投影以及所述栅极02在所述衬底基板01上的正投影均有交叠;有源层03在衬底基板01上的正投影位于挡光层06与栅极02在衬底基板上的正投影区域内;栅极02在衬底基板01上的正投影面积小于有源层03在衬底基板01上的正投影面积。An embodiment of the present invention provides an array substrate, as shown in FIG. 4 , which may include: a gate electrode 02 , an active layer 03 , a source electrode 04 and a drain electrode 05 sequentially located on a base substrate 01 ; and may further include: a blocking Optical layer 06; the orthographic projection of the active layer 03 on the base substrate 01 and the orthographic projection of the light blocking layer 06 on the base substrate 01 and the gate 02 on the base substrate 01 The orthographic projections on the base plate 03 are overlapped; the orthographic projection of the active layer 03 on the base substrate 01 is located in the orthographic projection area of the light blocking layer 06 and the gate 02 on the base substrate; the gate 02 is on the base substrate 01 The orthographic projection area on the substrate 01 is smaller than the orthographic projection area of the active layer 03 on the base substrate 01 .

本发明实施例提供的上述阵列基板中,通过在衬底基板上设置挡光层06,使挡光层06与栅极02均与有源层03具有交叠区域,如图5所示(沿俯视图5中A-A切割线切割,可以得到截面图4),从而可以减小栅极与有源层的交叠区域,进而减小栅极与源漏电极的交叠区域,即通过增加挡光层来减少栅极的宽度,使栅极与源漏电极的交叠面积减小,降低栅极与源漏电极之间的寄生电容,从而降低显示面板的功耗;同时设置有源层在衬底基板上的正投影位于栅极与挡光层在衬底基板上的正投影区域内,这样可以通过栅极和挡光层在垂直于衬底基板的方向上完全遮挡有源层,避免有源层因感光而产生光生载流子即光漏电的问题。并且,如图6所示,栅极的宽度减小后,有源层中感应出的电荷只存在于栅极正对的区域,这样可以减少感应电荷与源极和漏极的直接接触,降低空穴漏电,从而改善了显示面板侧壁漏电的问题。In the above-mentioned array substrate provided by the embodiment of the present invention, by disposing the light blocking layer 06 on the base substrate, the light blocking layer 06 and the gate 02 both have overlapping regions with the active layer 03, as shown in FIG. The A-A cutting line in the top view 5 can be cut, and the cross-sectional view 4) can be obtained, so that the overlapping area between the gate and the active layer can be reduced, and the overlapping area between the gate and the source and drain electrodes can be reduced, that is, by adding a light blocking layer. To reduce the width of the gate, reduce the overlapping area between the gate and the source-drain electrodes, reduce the parasitic capacitance between the gate and the source-drain electrodes, thereby reducing the power consumption of the display panel; at the same time, the active layer is arranged on the substrate The orthographic projection on the substrate is located in the orthographic projection area of the gate and the light-blocking layer on the substrate, so that the active layer can be completely blocked by the gate and the light-blocking layer in the direction perpendicular to the substrate to avoid active The problem of photo-generated carriers, that is, light leakage, occurs when the layer is exposed to light. Moreover, as shown in Figure 6, after the width of the gate is reduced, the charges induced in the active layer only exist in the area facing the gate, which can reduce the direct contact between the induced charges and the source and drain, reducing the Hole leakage, thereby improving the leakage problem of the sidewall of the display panel.

在具体实施时,本发明实施例提供的上述阵列基板中,可以设置栅极在衬底基板上的正投影与挡光层在衬底基板上的正投影部分交叠,或者不交叠。具体地,本发明实施例提供的上述阵列基板中,将栅极与挡光层设置为无交叠,进而可以使得栅极和源漏极交叠的区域与挡光层和源漏极交叠的区域无重合,这样可以将与源漏极交叠的区域由挡光层和栅极分担,从而减少栅极的宽度,进而减小栅极与源漏极的交叠,从而降低栅极与源漏电极之间的寄生电容,降低显示面板的功耗;同时挡光层和栅极不交叠,还可以避免挡光层和栅极之间形成寄生电容。During specific implementation, in the above-mentioned array substrate provided by the embodiments of the present invention, the orthographic projection of the gate on the base substrate may be set to partially overlap or not overlap with the orthographic projection of the light blocking layer on the base substrate. Specifically, in the above-mentioned array substrate provided by the embodiment of the present invention, the gate electrode and the light-blocking layer are set to be non-overlapping, so that the overlapping region of the gate electrode and the source and drain electrodes can overlap with the light-blocking layer and the source and drain electrodes. There is no overlap in the area of the source and drain, so that the area overlapping the source and drain can be shared by the light blocking layer and the gate, thereby reducing the width of the gate, thereby reducing the overlap between the gate and the source and drain, thereby reducing the gate and the gate. The parasitic capacitance between the source and drain electrodes reduces the power consumption of the display panel; at the same time, the light blocking layer and the gate do not overlap, and parasitic capacitance can also be avoided from being formed between the light blocking layer and the gate.

在具体实施时,本发明实施例提供的上述阵列基板中,挡光层可以位于衬底基板与栅极之间,且可以将源极的形状设置为U形。具体地,本发明实施例提供的上述阵列基板中,如图2所示,串联的两个U形源极5的大部分区域与栅极2交叠,这样栅极与源极之间就会因为交叠的区域过大,造成寄生电容过大,因此本发明通过设置挡光层,如图5所示,挡光层06可以在围绕栅极02对应的区域设置,从而可以实现对有源层03的遮挡,这样栅极02无需做的过大,造成与U形源极04的交叠,从而有效降低栅极与源电极之间的寄生电容,降低显示面板的功耗。During specific implementation, in the above-mentioned array substrate provided by the embodiment of the present invention, the light blocking layer may be located between the base substrate and the gate, and the shape of the source may be set to be U-shaped. Specifically, in the above-mentioned array substrate provided by the embodiment of the present invention, as shown in FIG. 2 , most areas of the two U-shaped source electrodes 5 connected in series overlap with the gate electrode 2 , so that there is a gap between the gate electrode and the source electrode. Because the overlapping area is too large, the parasitic capacitance is too large. Therefore, in the present invention, a light-blocking layer is provided. As shown in FIG. The shielding of the layer 03, so that the gate 02 does not need to be made too large, resulting in the overlap with the U-shaped source 04, thereby effectively reducing the parasitic capacitance between the gate and the source electrode, and reducing the power consumption of the display panel.

在具体实施时,本发明实施例提供的上述阵列基板中,挡光层的材料可以为不透光的金属材料。具体地,本发明实施例提供的上述阵列基板中,采用非透光的金属材料制作挡光层,既可以遮挡外界光线对有源层的影响,防止有源层产生光生载流子,又可以减小栅极与源漏电极的交叠面积,从而降低栅极与源漏电极之间的寄生电容,从而降低显示面板的功耗。During specific implementation, in the above-mentioned array substrate provided by the embodiment of the present invention, the material of the light blocking layer may be an opaque metal material. Specifically, in the above-mentioned array substrate provided by the embodiment of the present invention, the light-blocking layer is made of a non-light-transmitting metal material, which can not only block the influence of external light on the active layer, prevent the active layer from generating photo-generated carriers, but also can The overlapping area between the gate and the source-drain electrodes is reduced, thereby reducing the parasitic capacitance between the gate and the source-drain electrodes, thereby reducing the power consumption of the display panel.

在具体实施时,挡光层可以浮空;也可以接如相应信号,如可以作为公共电极线输入公共电极信号,或者也可以接入触摸信号,根据实际需要,遮光层可以和其他功能层同时制作,如可以和公共电极线,或者触摸引线通过同一次构图工艺制作等,本申请不做限制。In the specific implementation, the light-blocking layer can be floated; it can also be connected to corresponding signals, for example, the common electrode signal can be input as a common electrode line, or the touch signal can also be connected. According to actual needs, the light-blocking layer can be connected with other functional layers at the same time. For example, it can be made through the same patterning process as the common electrode line or the touch lead, which is not limited in this application.

在具体实施时,本发明实施例提供的上述阵列基板中,如图4所示,还可以包括:像素电极07、钝化层08和公共电极09;其中,像素电极07与有源层同层设置且与漏极05电性相连;钝化层08位于源极04和漏极05之上;公共电极09位于钝化层08之上。具体地,本发明实施例提供的上述阵列基板中,还包括像素电极、钝化层和公共电极等多个必要膜层结构,从而实现阵列基板的驱动显示功能。各膜层的功能与结构设计均匀现有技术相同,在此不作详述。During specific implementation, the above-mentioned array substrate provided in the embodiment of the present invention, as shown in FIG. 4 , may further include: pixel electrode 07 , passivation layer 08 and common electrode 09 ; wherein, the pixel electrode 07 and the active layer are in the same layer The passivation layer 08 is located on the source electrode 04 and the drain electrode 05 ; the common electrode 09 is located on the passivation layer 08 . Specifically, the above-mentioned array substrate provided by the embodiment of the present invention further includes a plurality of necessary film layer structures such as pixel electrodes, passivation layers, and common electrodes, so as to realize the driving and display function of the array substrate. The function and structure design of each film layer are the same as in the prior art, and will not be described in detail here.

基于同一发明构思,本发明实施例提供了一种显示面板,包括本发明实施例提供的上述阵列基板。该显示面板可以应用于手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。由于该显示面板解决问题的原理与阵列基板相似,因此该显示面板的实施可以参见上述阵列基板的实施,重复之处不再赘述。Based on the same inventive concept, an embodiment of the present invention provides a display panel including the above-mentioned array substrate provided by an embodiment of the present invention. The display panel can be applied to any product or component with a display function, such as a mobile phone, a tablet computer, a TV, a monitor, a notebook computer, a digital photo frame, and a navigator. Since the principle of solving the problem of the display panel is similar to that of the array substrate, the implementation of the display panel can refer to the implementation of the above-mentioned array substrate, and the repetition will not be repeated.

基于同一发明构思,本发明实施例提供了一种本发明实施例提供的上述阵列基板的制备方法,如图7所示,可以具体包括:Based on the same inventive concept, an embodiment of the present invention provides a method for preparing the above-mentioned array substrate provided by an embodiment of the present invention, as shown in FIG. 7 , which may specifically include:

S101、在衬底基板上形成挡光层的图形;S101, forming a pattern of a light blocking layer on a base substrate;

S102、在形成有挡光层的图形的衬底基板上,形成包括栅极、有源层、源极和漏极的图形;S102, forming a pattern including a gate electrode, an active layer, a source electrode and a drain electrode on the base substrate on which the pattern of the light blocking layer is formed;

其中,所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠;有源层在衬底基板上的正投影位于挡光层与栅极在衬底基板上的正投影区域内;Wherein, the orthographic projection of the active layer on the base substrate, the orthographic projection of the light blocking layer on the base substrate, and the orthographic projection of the gate on the base substrate are both overlapping; the orthographic projection of the active layer on the base substrate is located in the orthographic projection area of the light blocking layer and the gate on the base substrate;

栅极在衬底基板上的正投影面积小于有源层在衬底基板上的正投影面积。The orthographic projection area of the gate on the base substrate is smaller than the orthographic projection area of the active layer on the base substrate.

本发明实施例提供的上述制备方法中,还可以包括制作像素电极、钝化层和公共电极等多个必要膜层的过程,具体地,各膜层的制作过程具体如下,The above-mentioned preparation method provided by the embodiment of the present invention may further include a process of fabricating a plurality of necessary film layers such as a pixel electrode, a passivation layer, and a common electrode. Specifically, the fabrication process of each film layer is as follows:

第一步骤:在衬底基板01上通过构图工艺形成挡光层06的图形,形成挡光层的衬底基板如图8a所示;The first step: forming a pattern of the light-blocking layer 06 on the base substrate 01 through a patterning process, and the base substrate for forming the light-blocking layer is shown in FIG. 8a;

第二步骤:在形成有挡光层06的衬底基板01上通过构图工艺形成栅极02的图形,其中还包括形成绝缘层10的图形;形成栅极的衬底基板如图8b所示;The second step: forming the pattern of the gate 02 on the base substrate 01 formed with the light blocking layer 06 through a patterning process, which also includes forming the pattern of the insulating layer 10; the base substrate for forming the gate is shown in Figure 8b;

第三步骤:在形成有栅极02的衬底基板01上通过构图工艺形成有源层03的图形,其中还包括形成栅绝缘层11的图形;形成有源层的衬底基板如图8c所示;The third step: forming a pattern of the active layer 03 on the base substrate 01 formed with the gate 02 through a patterning process, which also includes forming the pattern of the gate insulating layer 11; the base substrate for forming the active layer is shown in Figure 8c Show;

第四步骤:在形成有源层03的衬底基板01上通过构图工艺形成像素电极07的图形;形成像素电极的衬底基板如图8d所示;The fourth step: forming the pattern of the pixel electrode 07 on the base substrate 01 on which the active layer 03 is formed by a patterning process; the base substrate for forming the pixel electrode is shown in FIG. 8d;

第五步骤:在形成有像素电极07的衬底基板01上通过构图工艺形成源极04和漏极05的图形;形成源极和漏极的衬底基板如图8e所示;The fifth step: forming the pattern of the source electrode 04 and the drain electrode 05 on the base substrate 01 formed with the pixel electrode 07 through a patterning process; the base substrate for forming the source electrode and the drain electrode is shown in FIG. 8e;

第六步骤:在形成有源极04和漏极05的衬底基板01上通过构图工艺形成钝化层08的图形;形成钝化层的衬底基板如图8f所示;The sixth step: forming a pattern of the passivation layer 08 on the base substrate 01 on which the source electrode 04 and the drain electrode 05 are formed by a patterning process; the base substrate for forming the passivation layer is shown in FIG. 8f;

第七步骤:在形成有钝化层08的衬底基板01上通过构图工艺形成公共电极09的图形;形成公共电极的衬底基板如图8g所示。The seventh step: forming the pattern of the common electrode 09 on the base substrate 01 formed with the passivation layer 08 through a patterning process; the base substrate for forming the common electrode is shown in FIG. 8g.

本发明实施例提供的上述制备方法中,通过在衬底基板上制作挡光层,使挡光层与栅极均与有源层具有交叠区域,从而可以减小栅极与有源层的交叠区域,进而减小栅极与源漏电极的交叠区域,即通过增加挡光层来减少栅极的宽度,使栅极与源漏电极的交叠面积减小,降低栅极与源漏电极之间的寄生电容,从而降低显示面板的功耗;同时设置有源层在衬底基板上的正投影位于栅极与挡光层在衬底基板上的正投影区域内,这样在垂直于衬底基板的方向上栅极和挡光层完全遮挡有源层,避免有源层因感光而产生光生载流子即光漏电的问题。In the above-mentioned preparation method provided by the embodiment of the present invention, by fabricating a light-blocking layer on the base substrate, both the light-blocking layer and the gate electrode have overlapping regions with the active layer, so that the difference between the gate electrode and the active layer can be reduced. The overlap area, thereby reducing the overlap area between the gate and the source-drain electrodes, that is, by increasing the light-blocking layer to reduce the width of the gate, so that the overlap area between the gate and the source-drain electrodes is reduced, and the gate and the source are reduced. The parasitic capacitance between the drain electrodes reduces the power consumption of the display panel; at the same time, the orthographic projection of the active layer on the substrate is located in the orthographic projection area of the gate and the light-blocking layer on the substrate, so that the vertical In the direction of the base substrate, the gate electrode and the light blocking layer completely shield the active layer, so as to avoid the problem that the active layer generates photo-generated carriers due to light exposure, that is, light leakage.

在具体实施时,本发明实施例提供的上述制备方法中,形成的栅极在衬底基板上的正投影与挡光层在衬底基板上的正投影不交叠或者部分交叠,。具体地,将栅极与挡光层设置为无交叠,进而可以使得栅极和源漏极交叠的区域与挡光层和源漏极交叠的区域无重合,这样可以将与源漏极交叠的区域由挡光层和栅极分担,从而减少栅极的宽度,进而减小栅极与源漏极的交叠,从而降低栅极与源漏电极之间的寄生电容,降低显示面板的功耗;同时挡光层和栅极不交叠,还可以避免挡光层和栅极之间形成寄生电容。In specific implementation, in the above-mentioned preparation method provided by the embodiment of the present invention, the orthographic projection of the gate formed on the base substrate does not overlap or partially overlaps with the orthographic projection of the light blocking layer on the base substrate. Specifically, the gate and the light-blocking layer are set to be non-overlapping, so that the overlapped region of the gate and the source-drain and the overlapped region of the light-blocking layer and the source-drain are not overlapped. The overlapping area is shared by the light blocking layer and the gate, thereby reducing the width of the gate, thereby reducing the overlap between the gate and the source and drain electrodes, thereby reducing the parasitic capacitance between the gate and the source and drain electrodes, reducing the display The power consumption of the panel; at the same time, the light blocking layer and the gate do not overlap, and the formation of parasitic capacitance between the light blocking layer and the gate can also be avoided.

本发明实施例提供了一种阵列基板、其制备方法及显示面板,该阵列基板包括:依次位于衬底基板上的栅极、有源层、源极和漏极;还包括:挡光层;所述有源层在所述衬底基板上的正投影与所述挡光层在所述衬底基板上的正投影以及所述栅极在所述衬底基板上的正投影均有交叠;有源层在衬底基板上的正投影位于挡光层与栅极在衬底基板上的正投影区域内;栅极在衬底基板上的正投影面积小于有源层在衬底基板上的正投影面积。这样本发明通过在衬底基板上设置挡光层,使挡光层与栅极均与有源层具有交叠区域,从而可以减小栅极与有源层的交叠区域,进而减小栅极与源漏电极的交叠区域,即通过增加挡光层来减少栅极的宽度,使栅极与源漏电极的交叠面积减小,降低栅极与源漏电极之间的寄生电容,从而降低显示面板的功耗;同时设置有源层在衬底基板上的正投影位于栅极与挡光层在衬底基板上的正投影区域内,这样可以通过栅极和挡光层遮挡有源层,避免有源层因感光而产生光生载流子即光漏电的问题。Embodiments of the present invention provide an array substrate, a preparation method thereof, and a display panel. The array substrate includes: a gate electrode, an active layer, a source electrode and a drain electrode sequentially located on a base substrate; and further includes: a light blocking layer; The orthographic projection of the active layer on the base substrate overlaps with the orthographic projection of the light blocking layer on the base substrate and the orthographic projection of the gate on the base substrate ; the orthographic projection of the active layer on the base substrate is located in the orthographic projection area of the light blocking layer and the gate on the base substrate; the orthographic projection area of the gate on the base substrate is smaller than that of the active layer on the base substrate the orthographic projection area of . In this way, in the present invention, by arranging a light-blocking layer on the base substrate, the light-blocking layer and the gate electrode both have overlapping areas with the active layer, so that the overlapping area between the gate electrode and the active layer can be reduced, thereby reducing the size of the gate electrode and the active layer. The overlapping area between the electrode and the source-drain electrode, that is, the width of the gate is reduced by adding a light-blocking layer, so that the overlapping area of the gate and the source-drain electrode is reduced, and the parasitic capacitance between the gate and the source-drain electrode is reduced. Therefore, the power consumption of the display panel is reduced; at the same time, the orthographic projection of the active layer on the base substrate is located in the orthographic projection area of the gate and the light-blocking layer on the base substrate, so that the gate and the light-blocking layer can block the The source layer can avoid the problem of photo-generated carriers, that is, optical leakage, caused by the active layer due to light exposure.

显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit and scope of the invention. Thus, provided that these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.

Claims (9)

1. An array substrate, comprising: the grid electrode, the active layer, the source electrode and the drain electrode are sequentially positioned on the substrate; it is characterized by also comprising: a light-blocking layer;
the orthographic projection of the active layer on the substrate base plate is overlapped with the orthographic projection of the light blocking layer on the substrate base plate and the orthographic projection of the grid electrode on the substrate base plate;
the orthographic projection of the active layer on the substrate is positioned in an orthographic projection area of the light blocking layer and the grid electrode on the substrate;
the orthographic projection area of the grid electrode on the substrate is smaller than that of the active layer on the substrate;
the orthographic projection of the grid electrode on the substrate base plate is not overlapped with the orthographic projection of the light blocking layer on the substrate base plate;
wherein the light blocking layer is arranged in a region corresponding to the surrounding of the grid electrode.
2. The array substrate of claim 1, wherein the light blocking layer is between the substrate and the gate electrode.
3. The array substrate of claim 1, wherein the source electrode is U-shaped.
4. The array substrate of any of claims 1-3, wherein the light blocking layer is made of a metal material.
5. The array substrate of claim 4, further comprising: a pixel electrode, a passivation layer and a common electrode; wherein,
the pixel electrode and the active layer are arranged on the same layer and are electrically connected with the drain electrode;
the passivation layer is positioned above the source electrode and the drain electrode;
the common electrode is located on the passivation layer.
6. A method for preparing the array substrate according to any one of claims 1 to 5, comprising:
forming a pattern of the light blocking layer on the substrate base plate;
forming a pattern including the gate electrode, the active layer, the source electrode and the drain electrode on the substrate on which the pattern of the light blocking layer is formed;
wherein, the orthographic projection of the active layer on the substrate base plate is overlapped with the orthographic projection of the light blocking layer on the substrate base plate and the orthographic projection of the grid electrode on the substrate base plate;
the orthographic projection of the active layer on the substrate is positioned in an orthographic projection area of the light blocking layer and the grid electrode on the substrate;
the orthographic projection area of the grid electrode on the substrate is smaller than that of the active layer on the substrate.
7. The method according to claim 6, wherein an orthographic projection of the gate electrode on the substrate base plate does not overlap or partially overlaps with an orthographic projection of the light-blocking layer on the substrate base plate.
8. The method of claim 6 or 7, further comprising:
and forming a pattern comprising a pixel electrode, a passivation layer and a common electrode on the substrate with the pattern of the light blocking layer.
9. A display panel comprising the array substrate according to any one of claims 1 to 5.
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