CN107245564B - A kind of control method of non-orientation silicon steel internal oxidation layer - Google Patents
A kind of control method of non-orientation silicon steel internal oxidation layer Download PDFInfo
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- 238000007254 oxidation reaction Methods 0.000 title claims abstract description 51
- 230000003647 oxidation Effects 0.000 title claims abstract description 49
- 238000000034 method Methods 0.000 title claims abstract description 32
- 229910000976 Electrical steel Inorganic materials 0.000 title claims abstract description 20
- 238000000137 annealing Methods 0.000 claims abstract description 39
- 238000010438 heat treatment Methods 0.000 claims abstract description 24
- 239000001257 hydrogen Substances 0.000 claims abstract description 24
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 20
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 238000005097 cold rolling Methods 0.000 claims abstract description 10
- 238000003723 Smelting Methods 0.000 claims abstract description 9
- 238000005266 casting Methods 0.000 claims abstract description 9
- 238000005098 hot rolling Methods 0.000 claims abstract description 9
- 238000005554 pickling Methods 0.000 claims abstract description 5
- 238000002791 soaking Methods 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 12
- 239000007789 gas Substances 0.000 claims description 5
- -1 hydrogen Chemical class 0.000 claims description 4
- 230000000694 effects Effects 0.000 abstract description 5
- 230000002411 adverse Effects 0.000 abstract description 4
- 150000002431 hydrogen Chemical class 0.000 abstract description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 14
- 229910000831 Steel Inorganic materials 0.000 description 11
- 239000010959 steel Substances 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052742 iron Inorganic materials 0.000 description 7
- 229910052748 manganese Inorganic materials 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000004615 ingredient Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 229910052698 phosphorus Inorganic materials 0.000 description 6
- 238000005096 rolling process Methods 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 206010021143 Hypoxia Diseases 0.000 description 3
- 238000005275 alloying Methods 0.000 description 3
- 208000018875 hypoxemia Diseases 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000036632 reaction speed Effects 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241000269333 Caudata Species 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 238000013178 mathematical model Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000005381 potential energy Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
- C21D8/12—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
- C21D8/1244—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties the heat treatment(s) being of interest
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/26—Methods of annealing
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
- C21D1/76—Adjusting the composition of the atmosphere
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/02—Ferrous alloys, e.g. steel alloys containing silicon
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/04—Ferrous alloys, e.g. steel alloys containing manganese
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- Mechanical Engineering (AREA)
- Metallurgy (AREA)
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- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
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Abstract
A kind of control method of non-orientation silicon steel internal oxidation layer: conventional converter smelting, RH application of vacuum are casting continuously to form base；Conventional slab heats hot rolling, normalizing treatment, pickling and once cold rolling to finished product thickness；Finished products: control heating ramp rate is not less than 50 DEG C/s, and controls: the intrinsic standoff ratio of vapor and hydrogen, the intrinsic standoff ratio of annealing soak section vapor and hydrogen in annealing heating section atmosphere.The present invention is by the intrinsic standoff ratio of vapor and hydrogen in the control rate of heat addition of continuous annealing furnace bringing-up section, annealing heating section atmosphere in P (H2O)/P(H2) and annealing soak section vapor and hydrogen intrinsic standoff ratio, to realize internal oxidation layer thickness at 1 μm hereinafter, the adverse effect for reducing it to magnetic history.
Description
Technical field
The present invention relates to a kind of method for producing non-oriented silicon steel, particularly belong in a kind of non-orientation silicon steel production about steel plate
Internal oxidation layer thickness control method.
Background technique
Non-orientation silicon steel is after cold rolling at least through a heat-treatment of annealing, the purpose of full-technique non-oriented annealing process of silicon steel
It is to make steel plate recrystallization, crystal grain is promoted to grow up and be roughened, eliminates rolling stress, the oxygen of outside is diffused into steel plate base in annealing process
It is combined in annealing process in body with such as Si of the alloying element in silicon steel, Al, Mn, Cr etc. and oxidation reaction occurs, in matrix
Generate layer oxide film, referred to as internal oxidation layer.Internal oxidation layer makes steel plate generate stress field, hinders the movement of neticdomain wall, makes iron
Damage increases, and magnetism deteriorates.
Atmosphere in continuous annealing furnace, mainly N2、H2And H2The gaseous mixture atmosphere of O three.The oxidation of silicon steel is mainly pressed
It is carried out according to following formula:
3Fe(s)+2O2(g)=Fe3O4(s) (1)
3Fe(s)+4H2O(g)=Fe3O4(s)+4H2(g) (2)
It is well known that the intrinsic standoff ratio P (H2O) of vapor and hydrogen/P (H2) is directly determined instead in continuous annealing furnace atmosphere
The carry out direction answered and degree.Control for the intrinsic standoff ratio of vapor and hydrogen in continuous annealing furnace atmosphere, in reducing
Oxidated layer thickness, reduce makes steel plate generate stress field by internal oxidation layer, increases the movement of neticdomain wall, reduces iron loss, magnetic property
It improves.
In the art, people are in order to solve the increase of internal oxidation layer Thickness ness, to the magnetism of orientation free silicon steel plate
Energy adverse effect, has carried out a large amount of experimental study and has taken measures, e.g., through what is retrieved: Japanese patent application publication No.
For the document of JP2011-241416 A, a kind of non-oriented magnetic steel sheet that high frequency has excellent core loss and its manufacturing method are disclosed.
The document is proposed according to P (H2O)/P(H2)≤0.015 × (Cr+Si+Al) controls the intrinsic standoff ratio of vapor and hydrogen, alloying element
The content of Si, Al, Cr are higher, P (H2O)/P(H2) upper control limit it is higher, also mean that steam vapour amount is bigger or amounts of hydrogen
Lower, oxidisability in atmosphere improves, and reproducibility weakens, and actually higher especially Al content is higher is easy to for alloy content
It aoxidizes, the intrinsic standoff ratio control of the patent is significant adverse to the control of internal oxidation layer.In addition, the patent takes into consideration only according to conjunction
Gold content adjusts P (H2O)/P(H2), and it is directed to the P (H of entire annealing furnace2O)/P(H2) all identical, do not account for each bringing-up section
With the specific P (H of soaking zone2O)/P(H2) control, other annealing heating rate in practical annealing process, the heating-up time of bringing-up section
The thickness of oxide layer can all be had an impact with rate, the soaking temperature of soaking zone, for different furnace area P (H2O)/P(H2)
Control is also not quite similar.
China Patent Publication No. is the document of 101812571 A of CN, provides one kind " at electrical hot-rolled strip steel normalizing
The method of internal oxidation layer is prevented in reason ".The document is by the control to normalizing process, to reduce and eliminate hot-strip normalizing
When the internal oxidation layer that generates, i.e., furnace hearth roller salamander when final annealing is eliminated from source.The document is mainly for hot-strip
Surface cord problem, propose to control air-fuel ratio, dew point and oxygen content in furnace, gas in furnace using straight fire heating in non-oxidation furnace
Atmosphere is pure N2.Although the internal oxidation layer during control normalizing, which is generated, plays one to the finished product internal oxidation layer control after cold rolled annealed
Determine advantageous effect, but the internal oxidation layer after finished products can not be controlled and be played a decisive role.
Summary of the invention
It is an object of the invention to overcome deficiency present in above-mentioned document, one kind is provided and passes through while controlling continuous annealing
The intrinsic standoff ratio of vapor and hydrogen is in P (H in the rate of heat addition of stove heating section, annealing heating section atmosphere2O)/P(H2)≤0.10,
And the intrinsic standoff ratio of annealing soak section vapor and hydrogen, to realize internal oxidation layer thickness in 1 μm of non-orientation silicon steel below
The control method of oxide layer.
Realize the measure of above-mentioned purpose:
A kind of control method of non-orientation silicon steel internal oxidation layer, step:
1) conventional converter smelting, RH application of vacuum are casting continuously to form base；
2) conventional slab heats hot rolling, normalizing treatment, pickling and once cold rolling to finished product thickness；
3) finished products: wherein:
It controls heating ramp rate and is not less than 50 DEG C/s, annealing process uses N2、H2And vapor mixed gas carries out, and
Control: the intrinsic standoff ratio of vapor and hydrogen is in P (H in annealing heating section atmosphere2O)/P(H2) ≤0.10；
Intrinsic standoff ratio P (the H of annealing soak section vapor and hydrogen2O)/P(H2) meet following formula:
In formula: T-is the soaking temperature of soaking zone, and unit is DEG C.
Further: heating ramp rate is not less than 80 DEG C/s.
Further: the intrinsic standoff ratio of vapor and hydrogen is in P (H in annealing heating section atmosphere2O)/P(H2) 0.04 ~
0.08。
Further: the intrinsic standoff ratio P (H of vapor and hydrogen in annealing soak section atmosphere2O)/P(H2) ≤0.25。
It is: it is suitable for the ingredients of non-orientation silicon steel and weight percent content to exist: C :≤0.003%, N :≤
0.003%, S :≤0.002%, P :≤0.05%, Si:0.5 ~ 3.5%, Al are no more than 1.5%, Mn:0.2 ~ 2.0%.
The mechanism and effect of main technique in the present invention
Why in the art, by the internal oxidation layer thickness control of orientation free silicon steel plate at 1.0 μm hereinafter, be by
It is all namagnetic substance in the oxide of iron and aluminium, according to skin effect principle, the magnetic flux density close to material surface is concentrated, because
This directly results in the mobile difficulty of surface magnetic domain close to the internal oxidation layer of material surface, and iron loss increases.Oxidated layer thickness is more than 1.0 μm
Later high-frequency loss deteriorates particularly evident.
Why the present invention controls heating ramp rate is steamed not less than water in 50 DEG C/s, and control annealing heating section atmosphere
The intrinsic standoff ratio of vapour and hydrogen is in P (H2O)/P(H2The problem of)≤0.10:
The applicant through a large amount of experimental study the result shows that, the formation of the internal oxidation layer of orientation free silicon steel plate and oxygen
Gesture is closely related, and oxygen gesture is mainly by P (H2O)/P(H2) influence.And it is required in heat temperature raising stage and soaking holding stage
Hypoxemia gesture, especially in the heat temperature raising stage with greater need for hypoxemia gesture, because hypoxemia potential energy prevents the quick formation of internal oxidation layer；Separately
Outside, alloying element diffuses to the surface during heating, however is contacting with atmosphere to the oxygen that matrix is spread close to interface
Reaction is the important stage of the formation of internal oxidation layer, has literature research to show that the temperature of above-mentioned oxidation reaction is every and improves 10 DEG C, instead
It answers speed to be increased to original 2-4 times, therefore is reacted to reduce iron and other alloys with oxygen in coming into full contact with for heating period
Probability, therefore heating ramp rate is set in not less than 50 DEG C/s by the present invention, to reduce the reaction time, while heat temperature raising rank
Section is the initial and important stage that internal oxidation layer is formed, but it is also in unstable state, at this time strict control P (H2O)/P
(H2), so that internal oxidation layer is difficult to stablize formation or is reduced rapidly, lays good base for the internal oxidation layer control of subsequent soaking zone
Plinth.
The present invention why in establishing annealing soak section atmosphere the intrinsic standoff ratio of vapor and hydrogen is in P (H2O)/P(H2)
Mathematical model, i.e. P (H2O)/P(H2)≤1-T/1200 be because are as follows:
According to reaction equation (1) and (2), the molar Gibbs free energy chemically reacted known to Material Thermodynamics relative theory
Positive and negative direction and the speed for directly determining to react with size, the speed of reaction and direction, P (O2), P (H2O)/P(H2) close phase
It closes, and P (O2), P (H2O)/P(H2) environment temperature when depending on reaction, temperature when especially in accordance with soaking adjusts P
(H2O)/P(H2), so that it may the direction of control reaction (2), since the annealing soak stage is finished product recrystallization and the rank that crystal grain is grown up
Section, must assure that enough temperature levels just can guarantee the properties of finished product, therefore can only reduce air in the soaking stage
In H2The H of O and the generation after burning2O and steel plate react or reduce its reaction speed, to finally control interior oxygen in finished product
Change the thickness of layer.
Shown by lot of experimental data and the observation of internal oxidation layer result: annealing soak temperature is higher, iron and other alloys,
With H2The reaction of O is more violent, even controls reaction reversely to reduce reaction speed at this time, needs to reduce water vapor partial pressure, increases H2
Partial pressure, i.e. reduction P (H2O)/P(H2) value, internal oxidation layer thickness can be effectively reduced.
And annealing soak temperature is lower, iron and other alloys and H2The reaction of O is slower, can suitably reduce H at this time2Point
Pressure reduces production cost, that is, properly increases P (H2O)/P(H2) value, internal oxidation layer thickness will not obviously rise at this time.By testing
Data are available to draw a conclusion
When meeting formula
When, it can effectively control soaking zone internal oxidation layer thickness.
Compared with prior art, the present invention passing through the rate of heat addition of control continuous annealing furnace bringing-up section, annealing heating section gas
The intrinsic standoff ratio of vapor and hydrogen is in P (H in atmosphere2O)/P(H2The partial pressure of)≤0.10 and annealing soak section vapor and hydrogen
Than to realize internal oxidation layer thickness at 1 μm hereinafter, thus the adverse effect for reducing it to magnetic history.
Detailed description of the invention
Fig. 1 is the internal oxidation layer distribution map of present invention non-orientation silicon steel steel plate produced.
Specific embodiment
The present invention is described in detail below:
Table 1 is the technique value and internal oxidation layer thickness list of the embodiment of the present invention 1 and comparative example；
Table 2 is the technique value and internal oxidation layer thickness list of the embodiment of the present invention 2 and comparative example；
Table 3 is the technique value and internal oxidation layer thickness list of the embodiment of the present invention 3 and comparative example；
Table 4 is the technique value and internal oxidation layer thickness list of the embodiment of the present invention 4 and comparative example；
Table 5 is the technique value and internal oxidation layer thickness list of the embodiment of the present invention 5 and comparative example；
Various embodiments of the present invention produce according to the following steps:
1) conventional converter smelting, RH application of vacuum are casting continuously to form base；
2) conventional slab heats hot rolling, normalizing treatment, pickling and once cold rolling to finished product thickness；
3) finished products: wherein:
It controls heating ramp rate and is not less than 50 DEG C/s, annealing process uses N2、H2And vapor mixed gas carries out, and
Control: the intrinsic standoff ratio of vapor and hydrogen is in P (H in annealing heating section atmosphere2O)/P(H2) ≤0.10；
Intrinsic standoff ratio P (the H of annealing soak section vapor and hydrogen2O)/P(H2) meet following formula:
In formula: T-is the soaking temperature of soaking zone, and unit is DEG C.
Embodiment 1
The present embodiment is used converter smelting, and RH application of vacuum, after being casting continuously to form base, slab ingredient is C:0.0015%, Si:
2.5%, Al:1.4%, Mn:1.5%, P:0.02%, S:0.0008%, N:0.0014%；Normalizing treatment and pickling are carried out after slab hot rolling
Afterwards, thickness is rolling to 0.50mm through once cold rolling；Finished products are carried out to cold-reduced sheet, anneal relevant parameter and corresponding interior oxygen
Change thickness degree to be shown in Table 1:
Table 1
Seen from table 1, when using present invention process, internal oxidation layer thickness be can control at 1 μm or less.
Embodiment 2
The present embodiment is used converter smelting, and RH application of vacuum, after being casting continuously to form base, slab ingredient is C:0.0018%, Si:
1.5%, Al:0.4%, Mn:0.5%, P:0.015%, S:0.0013%, N:0.0019%；Normalizing treatment and acid are carried out after slab hot rolling
After washing, thickness is rolling to 0.35mm through once cold rolling；Finished products are carried out to cold-reduced sheet, are annealed in relevant parameter and correspondence
Oxidated layer thickness is shown in Table 2:
Table 2
As can be seen from Table 2, internal oxidation layer thickness can control at 1 μm or less when using present invention process.
Embodiment 3
The present embodiment is used converter smelting, and RH application of vacuum, after being casting continuously to form base, slab ingredient is C:0.0021%, Si:
0.8%, Al:0.6%, Mn:0.2%, P:0.018%, S:0.0017%, N:0.0021%；Normalizing treatment and acid are carried out after slab hot rolling
After washing, thickness is rolling to 0.30mm through once cold rolling；Finished products are carried out to cold-reduced sheet, are annealed in relevant parameter and correspondence
Oxidated layer thickness is shown in Table 3:
Table 3
Seen from table 3, when using technique 5- 8, internal oxidation layer thickness be can control at 1 μm hereinafter, especially with excellent
When selecting technique 7,8, internal oxidation layer thickness is smaller.
Embodiment 4
The present embodiment is used converter smelting, and RH application of vacuum, after being casting continuously to form base, slab ingredient is C:0.0024%, Si:
2.6%, Al:0.9%, Mn:0.35%, P:0.028%, S:0.0013%, N:0.0011%；Normalizing treatment and acid are carried out after slab hot rolling
After washing, thickness is rolling to 0.27mm through once cold rolling；Finished products are carried out to cold-reduced sheet, are annealed in relevant parameter and correspondence
Oxidated layer thickness is shown in Table 4:
Table 4
By table 4 as it can be seen that internal oxidation layer thickness can control at 1 μm or less when using present invention process.
Embodiment 5
The present embodiment is used converter smelting, and RH application of vacuum, after being casting continuously to form base, slab ingredient is C:0.0022%, Si:
3.1%, Al:1.2%, Mn:0.52%, P:0.024%, S:0.0012%, N:0.0016%；Normalizing treatment and acid are carried out after slab hot rolling
After washing, thickness is rolling to 0.20mm through once cold rolling；Finished products are carried out to cold-reduced sheet, are annealed in relevant parameter and correspondence
Oxidated layer thickness is shown in Table 5:
Table 5
By table 5 as it can be seen that internal oxidation layer thickness can control at 1 μm or less when using present invention process.
By table 1- table 5 as it can be seen that whenever heating ramp rate is less than 50 DEG C/s or bringing-up section P (H2O)/P(H2) be greater than 0.1 when
Or soaking zone P (H2O)/P(H2) be greater than 1-T/1200 when, will lead to steel plate internal oxidation layer thickness be greater than 1 μm, can not achieve
The purpose of the present invention；Only meet heating ramp rate simultaneously not less than 50 DEG C/s, bringing-up section P (H2O)/P(H2) less than 0.1, it moves back
Intrinsic standoff ratio P (the H of fiery soaking zone vapor and hydrogen2O)/P(H2) formula, i.e.,, just can control steel
The thickness of plate internal oxidation layer could improve the magnetic property of orientation free silicon steel plate less than 1 μm.
Above-described embodiment is only the best example, rather than a limitation of the embodiments of the present invention.
Claims (3)
1. a kind of control method of non-orientation silicon steel internal oxidation layer, step:
1) conventional converter smelting, RH application of vacuum are casting continuously to form base；
2) conventional slab heats hot rolling, normalizing treatment, pickling and once cold rolling to finished product thickness；
3) finished products: wherein:
It controls heating ramp rate and is not less than 50 DEG C/s, annealing process uses N2、H2And vapor mixed gas carries out, and controls:
The intrinsic standoff ratio of vapor and hydrogen is in P (H in annealing heating section atmosphere2O)/P(H2) ≤0.10；
Intrinsic standoff ratio P (the H of annealing soak section vapor and hydrogen2O)/P(H2) meet following formula:
In formula: T-is the soaking temperature of soaking zone, and unit is DEG C.
2. a kind of control method of non-orientation silicon steel internal oxidation layer as described in claim 1, it is characterised in that: heat temperature raising speed
Rate is not less than 80 DEG C/s.
3. a kind of control method of non-orientation silicon steel internal oxidation layer as described in claim 1, it is characterised in that: annealing soak section
Intrinsic standoff ratio P (the H of vapor and hydrogen in atmosphere2O)/P(H2) ≤0.25。
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