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CN107204325B - Capacitor array and method of manufacture - Google Patents

Capacitor array and method of manufacture Download PDF

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CN107204325B
CN107204325B CN201710378230.5A CN201710378230A CN107204325B CN 107204325 B CN107204325 B CN 107204325B CN 201710378230 A CN201710378230 A CN 201710378230A CN 107204325 B CN107204325 B CN 107204325B
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capacitor
plate
area
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plates
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CN107204325A (en
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方向明
伍荣翔
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Shenzhen Xinqu Semiconductor Co ltd
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Chengdu Xianyi Technology Co ltd
University of Electronic Science and Technology of China
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5222Capacitive arrangements or effects of, or between wiring layers
    • H01L23/5223Capacitor integral with wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/10Applying interconnections to be used for carrying current between separate components within a device

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  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

The embodiment of the invention provides a capacitor array and a manufacturing method thereof. The capacitor array includes: the first group of capacitors comprises a first capacitor and a second capacitor, the second group of capacitors comprises a third capacitor and a fourth capacitor, the first capacitor, the second capacitor, the third capacitor and the fourth capacitor are all capacitors with mirror symmetry plane polar plates and comprise an upper polar plate and a lower polar plate, the same-layer plane polar plates of the first capacitor and the second capacitor are distributed in a mirror symmetry mode by taking a first symmetry axis as an axis, the same-layer plane polar plates of the third capacitor and the fourth capacitor are distributed in a mirror symmetry mode by taking a second symmetry axis as an axis, and a preset angle is formed between the first symmetry axis and the second symmetry axis. The signals coupled from one set of capacitors to the other set of capacitors are of substantially equal magnitude and form a common mode signal that can be filtered by the differential signal detection port, thereby improving the interference problem between the different capacitive channels.

Description

电容器阵列及制造方法Capacitor array and manufacturing method

技术领域technical field

本发明涉及电气元件领域,具体而言,涉及一种电容器阵列及制造方法。The invention relates to the field of electrical components, in particular to a capacitor array and a manufacturing method.

背景技术Background technique

使用电容在具有高电压差的芯片或模块之间传输信号,在通讯模块和数据总线中具有广泛的应用。随着系统集成度的提高,分立电容器件逐渐被芯片上的集成电容取代。Using capacitors to transmit signals between chips or modules with high voltage differences has a wide range of applications in communication modules and data buses. With the improvement of system integration, discrete capacitor devices are gradually replaced by integrated capacitors on chips.

集成电容多采取平面结构,包含上下两层平面金属极板,通过极板间的介质层实现电容极板之间的高压隔离和电场耦合。随着系统体积的缩小以及传输信号的脉冲宽度的缩短,集成电容的极板面积相应的缩小,并且相邻电容的间距也不断缩小。这导致了不同电容的极板之间耦合增强,属于不同信号通道的电容之间会产生更强的干扰信号。Integrated capacitors mostly adopt a planar structure, including two upper and lower plane metal plates, and the high-voltage isolation and electric field coupling between the capacitor plates are realized through the dielectric layer between the plates. With the shrinking of the system volume and the shortening of the pulse width of the transmission signal, the plate area of the integrated capacitor is correspondingly reduced, and the distance between adjacent capacitors is also continuously reduced. This results in enhanced coupling between plates of different capacitors, and stronger interference signals between capacitors belonging to different signal channels.

传统的差分信号检测方法虽然可以有效过滤共模干扰信号,但无法消除由于集成电容内在的通道间耦合产生的非共模干扰信号,特别是在使用电容进行双向信号传输的时,通道间的耦合情况更加复杂和显著。因此,如何解决电容集成技术中不同电容通道的干扰问题是本领域亟需解决的问题。Although the traditional differential signal detection method can effectively filter the common-mode interference signal, it cannot eliminate the non-common-mode interference signal caused by the inherent inter-channel coupling of integrated capacitors, especially when using capacitors for bidirectional signal transmission, the inter-channel coupling The situation is more complex and significant. Therefore, how to solve the interference problem of different capacitive channels in the capacitive integration technology is an urgent problem to be solved in this field.

发明内容Contents of the invention

有鉴于此,本发明提供了一种电容器阵列及制造方法,以改善现有的电容集成技术中不同电容通道的干扰问题。In view of this, the present invention provides a capacitor array and a manufacturing method to improve the interference problem of different capacitor channels in the existing capacitor integration technology.

为实现上述目的,本发明提供如下技术方案:To achieve the above object, the present invention provides the following technical solutions:

一种电容器阵列,包括第一组电容器和第二组电容器,所述第一组电容器包括第一电容器和第二电容器,所述第二组电容器包括第三电容器和第四电容器,所述第一电容器、第二电容器、第三电容器和第四电容器均为具有镜像对称平面极板的电容器,包含上层极板和下层极板,所述第一电容器和第二电容器的同层极板以第一对称轴为轴成镜像对称分布,所述第三电容器和第四电容器的同层极板以第二对称轴为轴成镜像对称分布,所述第一对称轴与第二对称轴之间具有预设角度。A capacitor array, comprising a first group of capacitors and a second group of capacitors, the first group of capacitors includes a first capacitor and a second capacitor, the second group of capacitors includes a third capacitor and a fourth capacitor, the first The capacitor, the second capacitor, the third capacitor and the fourth capacitor are all capacitors with mirror-image symmetrical plane plates, including an upper plate and a lower plate, and the same layer plates of the first capacitor and the second capacitor are separated by the first The axis of symmetry is a mirror-image symmetrical distribution of the axis, and the plates of the same layer of the third capacitor and the fourth capacitor are distributed in a mirror-symmetrical manner with the second axis of symmetry as an axis, and there is a predetermined gap between the first and second symmetry axes. set angle.

一种电容器阵列的制造方法,用于制造上述的电容器阵列,所述方法包括:在衬底沉积第一介质层;使用金属材料在所述第一介质层形成电容器的第一极板;在所述第一极板的表面以及第一介质层的表面形成第二介质层;使用金属材料在所述第二介质层形成电容器的第二极板;在所述第二极板的表面以及第二介质层的表面形成第三介质层。A method for manufacturing a capacitor array, which is used to manufacture the above-mentioned capacitor array, the method comprising: depositing a first dielectric layer on a substrate; using a metal material to form a first plate of a capacitor on the first dielectric layer; Form the second dielectric layer on the surface of the first pole plate and the surface of the first dielectric layer; use metal materials to form the second pole plate of the capacitor on the second dielectric layer; form the second pole plate on the surface of the second pole plate and the second The surface of the dielectric layer forms a third dielectric layer.

本发明实施例提供的电容器阵列及制造方法的有益效果为:The beneficial effects of the capacitor array and manufacturing method provided by the embodiments of the present invention are:

本发明实施例提供的电容器阵列及制造方法包括第一组电容器和第二组电容器,其中第一组电容器包括第一电容器和第二电容器,第二组电容器包括第三电容器和第四电容器,第一电容器、第二电容器、第三电容器以及第四电容器均为具有镜像对称平面极板的电容器,包含上层极板和下层极板,并且第一电容器和第二电容器的同层极板以第一对称轴为轴成镜像对称分布,第三电容器和第四电容器的同层极板以第二对称轴为轴成镜像对称分布,并且第一对称轴与第二对称轴具有预设角度。第一电容器、第二电容器各自的平面极板关于第二对称轴成镜像对称,第三电容器以及第四电容器各自的平面极板关于第一对称轴成镜像对称,因此第一电容器上(下)层极板与第三电容器、第四电容器上层极板或下层极板之间的寄生电容是对称(相等)的,第二电容器上(下)层极板与第三电容器、第四电容器上层极板或下层极板之间的寄生电容是对称(相等)的,第三电容器上(下)层极板与第一电容器、第二电容器上层极板或下层极板之间的寄生电容是对称(相等)的,第四电容器上(下)层极板与第一电容器、第二电容器上层极板或下层极板之间的寄生电容是对称(相等)的。所以一组电容耦合到另一组电容的信号大小完全相等,构成共模信号,该共模信号可以被差分信号检测端口过滤,从而改善了不同电容通道的干扰问题。The capacitor array and manufacturing method provided by the embodiments of the present invention include a first group of capacitors and a second group of capacitors, wherein the first group of capacitors includes a first capacitor and a second capacitor, the second group of capacitors includes a third capacitor and a fourth capacitor, and the second group of capacitors includes a third capacitor and a fourth capacitor. A capacitor, the second capacitor, the third capacitor and the fourth capacitor are all capacitors with mirror-image symmetrical plane plates, including an upper plate and a lower plate, and the same layer plates of the first capacitor and the second capacitor are separated by the first The axis of symmetry is distributed mirror-symmetrically to the axis, the plates of the same layer of the third capacitor and the fourth capacitor are distributed symmetrically to the axis of the second axis of symmetry, and the first axis of symmetry and the second axis of symmetry have a preset angle. The respective planar plates of the first capacitor and the second capacitor are mirror-symmetrical about the second axis of symmetry, and the respective planar plates of the third capacitor and the fourth capacitor are mirror-symmetrical about the first axis of symmetry, so the upper (lower) of the first capacitor The parasitic capacitance between the upper plate and the third capacitor, the fourth capacitor upper plate or the lower plate is symmetrical (equal), the second capacitor upper (lower) layer plate and the third capacitor, the fourth capacitor upper plate The parasitic capacitance between the plates or the lower plate is symmetrical (equal), and the parasitic capacitance between the upper (lower) plate of the third capacitor and the first capacitor, the upper plate or the lower plate of the second capacitor is symmetrical ( equal), the parasitic capacitance between the upper (lower) plate of the fourth capacitor and the first capacitor, the upper plate or the lower plate of the second capacitor is symmetrical (equal). Therefore, the magnitudes of signals coupled from one set of capacitors to another set of capacitors are completely equal, forming a common-mode signal, which can be filtered by the differential signal detection port, thereby improving the interference problem of different capacitor channels.

附图说明Description of drawings

为了更清楚的说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单的介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.

图1是本发明第一实施例提供的电容器阵列的部分结构的俯视示意图;FIG. 1 is a schematic top view of a partial structure of a capacitor array provided by the first embodiment of the present invention;

图2是本发明第一实施例提供的电容器阵列的一种具体实施方式的单层极板俯视示意图;2 is a schematic top view of a single-layer plate of a specific embodiment of the capacitor array provided by the first embodiment of the present invention;

图3a是本发明第一实施例提供的电容器阵列的上层极板的俯视示意图;3a is a schematic top view of the upper plate of the capacitor array provided by the first embodiment of the present invention;

图3b是本发明第一实施例提供的电容器阵列的下层极板的俯视示意图;3b is a schematic top view of the lower plate of the capacitor array provided by the first embodiment of the present invention;

图4a是本发明第二实施例提供的电容器阵列的结构示意图;Fig. 4a is a schematic structural diagram of a capacitor array provided by a second embodiment of the present invention;

图4b是图4a示出的电容器阵列的上层极板的俯视示意图;Fig. 4b is a schematic top view of the upper plate of the capacitor array shown in Fig. 4a;

图4c是图4a示出的电容器阵列的下层极板的俯视示意图;Fig. 4c is a schematic top view of the lower plate of the capacitor array shown in Fig. 4a;

图5是本发明实施例示出的电容器阵列的制作方法的分步示意图;5 is a step-by-step schematic diagram of a method for manufacturing a capacitor array shown in an embodiment of the present invention;

图6是本发明实施例示出的电容器阵列的制作方法的流程示意图。FIG. 6 is a schematic flowchart of a method for manufacturing a capacitor array shown in an embodiment of the present invention.

图标:10-电容器阵列;110-第一组电容器;111-第一电容器;112-第二电容器;120-第二组电容器;121-第三电容器;122-第四电容器;130-第一对称轴;140-第二对称轴;150-导体结构;161-第一走线;162-第二走线;163-第三走线;164-第四走线;171-第一焊盘;172-第二焊盘;173-第三焊盘;174-第四焊盘;180-寄生电容;191-上层极板;192-下层极板;193-子极板;201-第一开口;202-第二开口;210-衬底;220-第一介质层;230-第一极板;240-第二介质层;250-第二极板;260-第三介质层。Icon: 10-capacitor array; 110-first capacitor; 111-first capacitor; 112-second capacitor; 120-second capacitor; 121-third capacitor; 122-fourth capacitor; 130-first symmetry Axis; 140-second symmetry axis; 150-conductor structure; 161-first routing; 162-second routing; 163-third routing; 164-fourth routing; 171-first pad; 172 - second pad; 173 - third pad; 174 - fourth pad; 180 - parasitic capacitance; 191 - upper plate; 192 - lower plate; 193 - sub-plate; 201 - first opening; 202 - second opening; 210 - substrate; 220 - first dielectric layer; 230 - first polar plate; 240 - second dielectric layer; 250 - second polar plate; 260 - third dielectric layer.

具体实施方式Detailed ways

下面将结合本发明实施例中附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。以下对在附图中提供的本发明的实施例的详细描述并非旨在限制要求保护的本发明的范围,而是仅仅表示本发明的选定实施例。基于本发明的实施例,本领域技术人员在没有做出创造性劳动的前提下所获得的所有其他实施例,都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. The following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts belong to the protection scope of the present invention.

详情请参见图1,图1示出了本发明第一实施例提供的电容器阵列10的俯视示意图。该电容器阵列10包括第一组电容器110和第二组电容器120。其中,第一组电容器110包括第一电容器111和第二电容器112,第二组电容器120包括第三电容器121和第四电容器122。Please refer to FIG. 1 for details. FIG. 1 shows a schematic top view of a capacitor array 10 provided by a first embodiment of the present invention. The capacitor array 10 includes a first set of capacitors 110 and a second set of capacitors 120 . Wherein, the first set of capacitors 110 includes a first capacitor 111 and a second capacitor 112 , and the second set of capacitors 120 includes a third capacitor 121 and a fourth capacitor 122 .

上述电容器均包含上层极板191和下层极板192。上述电容器的下层极板192由同一工艺步骤制作,大致位于一个平面内;上述电容器的上层极板191也由同一工艺步骤制作,也大致位于一个平面内;所以电容器的上层极板191和下层极板192均为平面极板。上述电容器的上下层极板的位置和形状在垂直方向上相互对应,因此在俯视示意图中电容器的上层极板与下层极板重合,图1所示的俯视示意图既代表上层极板191俯视示意图又代表下层极板192俯视示意图。The above capacitors all include an upper plate 191 and a lower plate 192 . The lower pole plate 192 of the above-mentioned capacitor is made by the same process step, and is roughly located in a plane; the upper pole plate 191 of the above-mentioned capacitor is also made by the same process step, and is also roughly positioned in a plane; so the upper pole plate 191 and the bottom pole of the capacitor Plates 192 are planar plates. The positions and shapes of the upper and lower pole plates of the above-mentioned capacitor correspond to each other in the vertical direction, so the upper pole plate and the lower pole plate of the capacitor overlap in the schematic plan view. The top view schematic diagram shown in FIG. It represents a schematic top view of the lower plate 192 .

本发明中的镜像对称是指把图形沿着对称轴折叠,对称轴两旁的部分能够互相重合。本发明中的平面极板等三维结构镜像对称是指该三维结构的俯视图形镜像对称。Mirror symmetry in the present invention means that the figure is folded along the axis of symmetry, and the parts on both sides of the axis of symmetry can overlap with each other. The mirror image symmetry of a three-dimensional structure such as a plane polar plate in the present invention means that the top view of the three-dimensional structure is mirror image symmetric.

第一电容器111为具有镜像对称平面极板的电容器,具体表现为第一电容器111的上下两层平面极板俯视图形均为镜像对称图形。类似的,第二电容器112为具有镜像对称平面极板的电容器,具体表现为第二电容器112的上下两层平面极板俯视图形均为镜像对称图形。第一电容器111与第二电容器112的同层极板俯视图以第一对称轴130为轴成镜像对称分布。The first capacitor 111 is a capacitor with a mirror-symmetrical plane plate, specifically, the upper and lower plane plates of the first capacitor 111 are both mirror-symmetrical in plan view. Similarly, the second capacitor 112 is a capacitor with a mirror-symmetrical plane plate, specifically, the upper and lower plane plates of the second capacitor 112 are both mirror-symmetrical in top view. In the plan view of the first capacitor 111 and the second capacitor 112 , the plates of the same layer are distributed symmetrically in mirror image with the first axis of symmetry 130 as the axis.

第三电容器121为具有镜像对称平面极板的电容器,具体表现为第三电容器121的上下两层平面极板俯视图形均为镜像对称图形。类似的,第四电容器122为具有镜像对称平面极板的电容器,具体表现为第四电容器122的上下两层平面极板俯视图形均为镜像对称图形。第三电容器121的极板的形状可以与第一电容器111的极板形状或第二电容器112的极板形状不同。第三电容器121与第四电容器122的同层极板俯视图形以第二对称轴140为轴成镜像对称分布。The third capacitor 121 is a capacitor with a mirror-symmetrical plane plate, specifically, the upper and lower plane plates of the third capacitor 121 are both mirror-symmetrical in plan view. Similarly, the fourth capacitor 122 is a capacitor with a mirror-symmetrical plane plate, specifically, the plan view shapes of the upper and lower plane plates of the fourth capacitor 122 are mirror-symmetrical figures. The shape of the plates of the third capacitor 121 may be different from the shape of the plates of the first capacitor 111 or the shape of the plates of the second capacitor 112 . The plan views of the same-layer plates of the third capacitor 121 and the fourth capacitor 122 are mirror-symmetrically distributed with the second axis of symmetry 140 as an axis.

第一电容器111和第二电容器112均可以是具有以第二对称轴140为轴的镜像对称平面极板的电容器,第三电容器121和第四电容器122均可以是具有以第一对称轴130为轴的镜像对称平面极板的电容器。从数学上可以证明,当第一电容器111和第二电容器112的平面极板本身关于第二对称轴140镜像对称,第一电容器111和第二电容器112的同层平面极板之间关于第一对称轴130镜像对称;并且第三电容器121和第四电容器122的平面极板本身关于第一对称轴130镜像对称,第三电容器121和第四电容器122的同层平面极板之间关于第二对称轴140镜像对称,并且第一对称轴130与第二对称轴140的预设夹角为90°时,所述的电容阵列具有最佳的对称性及其技术效果。Both the first capacitor 111 and the second capacitor 112 can be capacitors having mirror-image symmetrical plane plates with the second axis of symmetry 140 as the axis, and both the third capacitor 121 and the fourth capacitor 122 can be capacitors with the first axis of symmetry 130 as the axis. Axis of a capacitor with mirror-symmetric plane plates. Mathematically, it can be proved that when the plane plates of the first capacitor 111 and the second capacitor 112 are mirror-symmetrical about the second axis of symmetry 140, the plane plates of the first capacitor 111 and the second capacitor 112 are in the same layer with respect to the first The axis of symmetry 130 is mirror symmetrical; When the axis of symmetry 140 is mirror-symmetrical, and the preset included angle between the first axis of symmetry 130 and the second axis of symmetry 140 is 90°, the capacitor array has the best symmetry and its technical effect.

第一对称轴130与第二对称轴140之间具有预设角度,具体的,第一对称轴130与第二对称轴140之间的预设角度可以为80°至100°,优选地,第一对称轴130与第二对称轴140之间的预设角度可以为90°。There is a preset angle between the first axis of symmetry 130 and the second axis of symmetry 140, specifically, the preset angle between the first axis of symmetry 130 and the second axis of symmetry 140 can be 80° to 100°, preferably, the first The preset angle between a symmetry axis 130 and the second symmetry axis 140 may be 90°.

本发明第一实施例提供的电容器阵列10的一种具体实施方式中,还包括导体结构150,导体结构150可以分别设置于第一电容器111、第二电容器112、第三电容器121、第四电容器122极板的边缘位置,详情请参见图2。同一个电容器的上下层极板边缘位置的导体结构150的形状可以独立设置,即根据上下层极板具体的应用需要确定其形状,所以属于上下层极板的边缘导体结构可以具有相同或者不同的形状。In a specific implementation of the capacitor array 10 provided in the first embodiment of the present invention, it also includes a conductor structure 150, and the conductor structure 150 can be respectively arranged on the first capacitor 111, the second capacitor 112, the third capacitor 121, and the fourth capacitor For the edge position of the 122 pole plate, please refer to Figure 2 for details. The shape of the conductor structure 150 at the edge of the upper and lower plates of the same capacitor can be set independently, that is, its shape is determined according to the specific application needs of the upper and lower plates, so the edge conductor structures belonging to the upper and lower plates can have the same or different shapes. shape.

设置于第一电容器111极板的边缘位置的导体结构150的面积小于第一电容器111的极板的面积,优选的,设置于第一电容器111极板边缘位置的导体结构150的面积小于或等于第一电容器111的极板的面积的50%。The area of the conductor structure 150 arranged on the edge of the first capacitor 111 plate is smaller than the area of the first capacitor 111. Preferably, the area of the conductor structure 150 arranged on the edge of the first capacitor 111 is less than or equal to 50% of the area of the plates of the first capacitor 111 .

设置于第二电容器112极板的边缘位置的导体结构150的面积小于第二电容器112的极板的面积,优选的,设置于第二电容器112极板边缘位置的导体结构150的面积小于或等于第二电容器112的极板的面积的50%。The area of the conductor structure 150 arranged at the edge of the pole plate of the second capacitor 112 is smaller than the area of the pole plate of the second capacitor 112. Preferably, the area of the conductor structure 150 arranged at the edge of the pole plate of the second capacitor 112 is less than or equal to 50% of the area of the plates of the second capacitor 112 .

设置于第三电容器121极板的边缘位置的导体结构150的面积小于第三电容器121的极板的面积;优选的,设置于第三电容器121极板边缘位置的导体结构150的面积小于或等于第三电容器121的极板的面积的50%。The area of the conductor structure 150 arranged at the edge of the pole plate of the third capacitor 121 is smaller than the area of the pole plate of the third capacitor 121; preferably, the area of the conductor structure 150 arranged at the edge of the pole plate of the third capacitor 121 is less than or equal to 50% of the area of the plate of the third capacitor 121 .

设置于第四电容器122极板的边缘位置的导体结构150的面积小于第四电容器122的极板的面积。优选的,设置于第四电容器122极板边缘位置的导体结构150的面积小于或等于第四电容器122的极板的面积的50%。The area of the conductive structure 150 disposed on the edge of the plate of the fourth capacitor 122 is smaller than the area of the plate of the fourth capacitor 122 . Preferably, the area of the conductor structure 150 disposed at the edge of the plate of the fourth capacitor 122 is less than or equal to 50% of the area of the plate of the fourth capacitor 122 .

设置于电容器边缘位置的导体结构150可以与电容器的极板构成不具备前述对称性的结构或者构成以其他对称轴为轴的镜像对称结构,例如参见图2,第一电容器111以及第一电容器111极板边缘的导体结构150构成的俯视图形与第二电容器112以及第二电容器112边缘的导体结构150构成的俯视图形不具有镜像对称性。同一个电容器的上下层极板边缘位置的导体结构150的形状可以独立设置,即根据上下层极板具体的应用需要确定其形状,所以属于上下层极板的边缘导体结构可以具有相同或者不同的形状,图2中只示出了一层极板及其边缘位置导体的俯视图形。The conductor structure 150 arranged at the edge of the capacitor can form a structure that does not have the aforementioned symmetry with the pole plate of the capacitor or form a mirror-symmetric structure with other symmetry axes as axes. For example, referring to FIG. 2, the first capacitor 111 and the first capacitor 111 The top view pattern formed by the conductor structure 150 at the edge of the pole plate and the top view pattern formed by the second capacitor 112 and the conductor structure 150 at the edge of the second capacitor 112 do not have mirror symmetry. The shape of the conductor structure 150 at the edge of the upper and lower plates of the same capacitor can be set independently, that is, its shape is determined according to the specific application needs of the upper and lower plates, so the edge conductor structures belonging to the upper and lower plates can have the same or different shapes. Figure 2 only shows the top view of a layer of pole plates and their edge conductors.

本发明第一实施例提供的电容器阵列10还包括第一走线161、第二走线162、第三走线163、第四走线164、第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174。The capacitor array 10 provided in the first embodiment of the present invention further includes a first wire 161, a second wire 162, a third wire 163, a fourth wire 164, a first pad 171, a second pad 172, a The third pad 173 and the fourth pad 174 .

详情请参见图3a,在第一实施例示出的整个电容器阵列10的上层极板191中,第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174设置在如图3a所示的上部。Please refer to FIG. 3 a for details. In the upper plate 191 of the entire capacitor array 10 shown in the first embodiment, the first pad 171 , the second pad 172 , the third pad 173 and the fourth pad 174 are arranged as shown in FIG. The upper part shown in Figure 3a.

其中,第一电容器111与第二电容器112左右分布,第三电容器121与第四电容器122上下分布,且第三电容器121与第四电容器122的形状分别与第一电容器111以及第二电容器112的形状形成比较紧密的布局。第一电容器111通过第一走线161与第一焊盘171连接,第二电容器112通过第二走线162与第二焊盘172连接,第三电容器121通过第三走线163与第三焊盘173连接,第四电容器122通过第四走线164与第四焊盘174连接。Wherein, the first capacitor 111 and the second capacitor 112 are distributed left and right, the third capacitor 121 and the fourth capacitor 122 are distributed up and down, and the shapes of the third capacitor 121 and the fourth capacitor 122 are respectively the same as those of the first capacitor 111 and the second capacitor 112. Shapes form relatively tight layouts. The first capacitor 111 is connected to the first pad 171 through the first wire 161, the second capacitor 112 is connected to the second pad 172 through the second wire 162, and the third capacitor 121 is connected to the third solder pad through the third wire 163. The pad 173 is connected, and the fourth capacitor 122 is connected to the fourth pad 174 through the fourth wire 164 .

详情参见图3b,在第一实施例示出的整个电容器阵列10的下层极板192中,第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174设置在如图3b所示的下部。Referring to FIG. 3 b for details, in the lower plate 192 of the entire capacitor array 10 shown in the first embodiment, the first pad 171 , the second pad 172 , the third pad 173 and the fourth pad 174 are arranged as shown in FIG. Lower part shown in 3b.

其中,第一电容器111、第二电容器112左右分布,第三电容器121与第四电容器122上下分布,且在下层极板192中,第一电容器111至第四电容器122的位置与在上层极板191中的位置相对应。第一电容器111通过第一走线161与第一焊盘171连接,第二电容器112通过第二走线162与第二焊盘172连接,第三电容器121通过第三走线163与第三焊盘173连接,第四电容器122通过第四走线164与第四焊盘174连接。因此,在第一实施例示出的电容器阵列10的上层极板191和下层极板192中,除了第一焊盘171、第二焊盘172、第三焊盘173、第四焊盘174以及各自分别相连的第一走线161、第二走线162、第三走线163以及第四走线164的位置不同外,第一电容器111至第四电容器122的上层极板191和下层极板192的位置对应相同。Wherein, the first capacitor 111 and the second capacitor 112 are distributed left and right, the third capacitor 121 and the fourth capacitor 122 are distributed up and down, and in the lower plate 192, the positions of the first capacitor 111 to the fourth capacitor 122 are the same as those on the upper plate. Corresponds to the position in 191. The first capacitor 111 is connected to the first pad 171 through the first wire 161, the second capacitor 112 is connected to the second pad 172 through the second wire 162, and the third capacitor 121 is connected to the third solder pad through the third wire 163. The pad 173 is connected, and the fourth capacitor 122 is connected to the fourth pad 174 through the fourth wire 164 . Therefore, in the upper plate 191 and the lower plate 192 of the capacitor array 10 shown in the first embodiment, except for the first pad 171, the second pad 172, the third pad 173, the fourth pad 174 and their respective The positions of the first wiring 161, the second wiring 162, the third wiring 163 and the fourth wiring 164 connected respectively are different, and the upper plate 191 and the lower plate 192 of the first capacitor 111 to the fourth capacitor 122 corresponding to the same position.

并且,所述第一走线161与第一焊盘171的面积之和可以小于第一电容器111的极板的面积,所述第二走线162与第二焊盘172的面积之和可以小于第二电容器112的极板的面积,所述第三走线163与第三焊盘173的面积之和可以小于第三电容器121的极板的面积,所述第四走线164与第四焊盘174的面积之和可以小于第四电容器122的极板的面积。Moreover, the sum of the areas of the first wiring 161 and the first pad 171 may be smaller than the area of the plate of the first capacitor 111, and the sum of the areas of the second wiring 162 and the second pad 172 may be less than The area of the pole plate of the second capacitor 112, the sum of the areas of the third wiring 163 and the third pad 173 may be smaller than the area of the pole plate of the third capacitor 121, the fourth wiring 164 and the fourth welding pad The sum of the areas of the plates 174 may be smaller than the area of the plates of the fourth capacitor 122 .

详情请参见图4a,图4a示出了本发明第二实施例提供的电容器阵列10的结构示意图。所述第一电容器111、第二电容器112、第三电容器121、第四电容器122的极板均包括至少一个子极板193。使用子极板可以缩短极板到焊盘之间走线的距离,减小寄生参数。Please refer to FIG. 4a for details. FIG. 4a shows a schematic structural diagram of the capacitor array 10 provided by the second embodiment of the present invention. The plates of the first capacitor 111 , the second capacitor 112 , the third capacitor 121 and the fourth capacitor 122 each include at least one sub-plate 193 . Using the sub-plate can shorten the distance from the plate to the pad and reduce the parasitic parameters.

第一电容器111可以包括两个子极板,具体请参见图4a、图4b和图4c。两个子极板具体可以由导体结构150连接。在第二实施例示出的电容器阵列10的上层极板191中,第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174位于如图4a以及图4b的右侧。在第二实施例示出的电容器阵列10的下层极板192中,第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174位于如图4a以及图4c的左侧。The first capacitor 111 may include two sub-plates, please refer to FIG. 4a , FIG. 4b and FIG. 4c for details. Specifically, the two sub-plates may be connected by a conductor structure 150 . In the upper plate 191 of the capacitor array 10 shown in the second embodiment, the first pad 171, the second pad 172, the third pad 173 and the fourth pad 174 are located on the right side as shown in Fig. 4a and Fig. 4b . In the lower plate 192 of the capacitor array 10 shown in the second embodiment, the first pad 171, the second pad 172, the third pad 173 and the fourth pad 174 are located on the left side as shown in Fig. 4a and Fig. 4c .

在上层极板191中,请参见图4b,第一电容器111通过连接两个子极板的导体结构150与第一焊盘171经由第一走线161连接。第二电容器112的两个子极板则可以通过各自的第二走线162与第二焊盘172连接,第三电容器121则通过第三走线163与第三焊盘173连接,第四电容器122通过第四走线164与第四焊盘174连接。In the upper plate 191 , please refer to FIG. 4 b , the first capacitor 111 is connected to the first pad 171 via the first wiring 161 through the conductor structure 150 connecting the two sub-plates. The two sub-plates of the second capacitor 112 can be connected to the second pad 172 through their respective second wires 162, the third capacitor 121 is connected to the third pad 173 through the third wire 163, and the fourth capacitor 122 It is connected to the fourth pad 174 through the fourth wire 164 .

在下层极板192中,请参见图4c,第一电容器111的两个子极板193可以通过各自的第一走线161与第一焊盘171连接,第二电容器112通过连接两个子极板的导体结构150与第二焊盘172经由第一走线161连接。第三电容器121则通过第三走线163与第三焊盘173连接,第四电容器122通过第四走线164与第四焊盘174连接。In the lower plate 192, please refer to FIG. 4c, the two sub-plates 193 of the first capacitor 111 can be connected to the first pad 171 through their respective first wires 161, and the second capacitor 112 can be connected to the two sub-plates through the The conductor structure 150 is connected to the second pad 172 via the first trace 161 . The third capacitor 121 is connected to the third pad 173 through the third wire 163 , and the fourth capacitor 122 is connected to the fourth pad 174 through the fourth wire 164 .

类似的,第三电容器和第四电容器也可以包含子极板,在此不再赘述。Similarly, the third capacitor and the fourth capacitor may also include sub-plates, which will not be repeated here.

本发明实施例提供的电容器阵列10的工作原理为:The working principle of the capacitor array 10 provided by the embodiment of the present invention is as follows:

第一组电容器110和第二组电容器120分别用于传输两组不同的差分信号,接下来以第二电容器112为例进行说明:The first set of capacitors 110 and the second set of capacitors 120 are respectively used to transmit two sets of different differential signals. Next, the second capacitor 112 is taken as an example for illustration:

参见图1,由于第二电容器112的平面极板具有镜像对称俯视图形,且在图1示出的第一实施例中,第二电容器112的平面极板俯视图形具体是以第二对称轴140为轴的镜像对称图形。因此,在不受外加干扰的情况下,第二电容器112在工作时是一个对称电势体,即第二电容器112发出的电场线和电势分布也关于垂直于平面极板所在平面且经过第二对称轴140的平面成镜像对称。关于垂直于平面极板所在平面且经过第二对称轴140的平面成镜像对称的电场分别耦合到同样关于垂直于平面极板所在平面且经过第二对称轴140的平面成镜像成镜像对称分布的第三电容器121和第四电容器122。因此,产生的干扰信号也是对称的。Referring to FIG. 1 , since the planar plate of the second capacitor 112 has a mirror-symmetric top view shape, and in the first embodiment shown in FIG. is a mirror image of the axis. Therefore, in the absence of external interference, the second capacitor 112 is a symmetrical potential body during operation, that is, the electric field lines and potential distribution emitted by the second capacitor 112 are also about the plane perpendicular to the plane where the plane plate is located and passing through the second symmetrical potential body. The plane of the axis 140 is mirror-symmetrical. The electric fields that are mirror-symmetrical to the plane perpendicular to the plane where the planar pole plate is located and pass through the second axis of symmetry 140 are respectively coupled to the electric fields that are also mirror-symmetrically distributed about the plane that is perpendicular to the plane where the plane pole plate is located and passes through the second axis of symmetry 140. The third capacitor 121 and the fourth capacitor 122 . Therefore, the generated interference signal is also symmetrical.

具体参见图1,第二电容器112与第三电容器121之间分布着多个寄生电容180,如图1示出的上侧的四个寄生电容180;第二电容器112与第四电容器122之间同样也分布着多个寄生电容180,如图1示出的下侧的四个寄生电容180。Specifically referring to FIG. 1, a plurality of parasitic capacitances 180 are distributed between the second capacitor 112 and the third capacitor 121, such as the four parasitic capacitances 180 on the upper side shown in FIG. 1; between the second capacitor 112 and the fourth capacitor 122 Likewise, a plurality of parasitic capacitors 180 are also distributed, such as the four parasitic capacitors 180 on the lower side shown in FIG. 1 .

由于第二电容器112与第三电容器121之间分布的寄生电容180与第二电容器112与第四电容器122之间分布的寄生电容180是对称的,因此,第二电容器112耦合到第三电容器121以及第二电容器112耦合到第四电容器122的信号大小完全相等,构成共模信号。这一共模信号会被差分信号检测端口过滤,而不在第二电容器112对应的信号通道上产生错误的信号,也不会在第三电容121及第四电容122对应的信号通道上产生错误的信号。Since the parasitic capacitance 180 distributed between the second capacitor 112 and the third capacitor 121 and the parasitic capacitance 180 distributed between the second capacitor 112 and the fourth capacitor 122 are symmetrical, the second capacitor 112 is coupled to the third capacitor 121 And the signals coupled from the second capacitor 112 to the fourth capacitor 122 are completely equal in magnitude, forming a common mode signal. This common mode signal will be filtered by the differential signal detection port, so that no wrong signal will be generated on the signal channel corresponding to the second capacitor 112, and no wrong signal will be generated on the signal channel corresponding to the third capacitor 121 and the fourth capacitor 122. .

同理,可以对第一电容器111、第三电容器121以及第四电容器122进行逐一验证,第一组电容器110在第二组电容器120产生的干扰信号为大小相等、方向相同的共模信号,第二组电容器120在第一组电容器110产生的干扰信号也是大小相等、方向相同的共模信号,而共模信号可以被差分信号检测端口过滤。Similarly, the first capacitor 111, the third capacitor 121, and the fourth capacitor 122 can be verified one by one. The interference signal generated by the first capacitor 110 in the second capacitor 120 is a common mode signal with the same magnitude and the same direction. The interference signal generated by the second set of capacitors 120 in the first set of capacitors 110 is also a common-mode signal with the same magnitude and the same direction, and the common-mode signal can be filtered by the differential signal detection port.

第一对称轴130与第二对称轴140之间的夹角为90度是消除干扰信号较好的形式,由于电容器的极板需要通过走线和焊盘与其他元件和电路相连,因此,第一组电容器110以及第二组电容器120未必具有严格的对称性,不具有严格对称性部分的面积(例如导体结构150,走线,及焊盘)相对极板对称部分的面积较小。The angle between the first axis of symmetry 130 and the second axis of symmetry 140 is 90 degrees, which is a better way to eliminate interference signals. Since the plates of the capacitor need to be connected to other components and circuits through wires and pads, the first The first set of capacitors 110 and the second set of capacitors 120 do not necessarily have strict symmetry, and the area of the portion without strict symmetry (such as the conductor structure 150 , traces, and pads) is smaller than the area of the symmetrical portion of the plate.

因此,第一对称轴130与第二对称轴140之间的夹角可以为一个范围,例如80度至100度之间,或不具备对称性的导体结构150的面积小于或等于具有对称性的极板的面积的一半,上述不具备对称性的导体结构150产生的干扰信号相对较小,未严格对称的电容器阵列10依然可以显著降低干扰信号的强度。Therefore, the included angle between the first axis of symmetry 130 and the second axis of symmetry 140 can be in a range, for example, between 80 degrees and 100 degrees, or the area of the conductor structure 150 without symmetry is smaller than or equal to that of the one with symmetry. Half the area of the plate, the interference signal generated by the above-mentioned asymmetrical conductor structure 150 is relatively small, and the non-strictly symmetrical capacitor array 10 can still significantly reduce the intensity of the interference signal.

详情参见图6,图6示出了制造该电容器阵列10的流程,具体包括如下步骤:Refer to FIG. 6 for details. FIG. 6 shows the process of manufacturing the capacitor array 10, which specifically includes the following steps:

步骤S110,在衬底210沉积第一介质层220。Step S110 , depositing a first dielectric layer 220 on the substrate 210 .

衬底210可以是PCB板、硅片、玻璃或者有机基板,如图5(a)所示。在衬底210沉积第一介质层220,第一介质层220常用的材料包括氧化硅、氮化硅、氧化铝、聚合物(例如聚酰亚胺、苯并环丁烯等),如图5(b)所示。如果衬底为绝缘体,可省略该步骤。The substrate 210 may be a PCB board, a silicon wafer, glass or an organic substrate, as shown in FIG. 5( a ). The first dielectric layer 220 is deposited on the substrate 210. Commonly used materials for the first dielectric layer 220 include silicon oxide, silicon nitride, aluminum oxide, and polymers (such as polyimide, benzocyclobutene, etc.), as shown in Figure 5 (b) shown. This step can be omitted if the substrate is an insulator.

步骤S120,使用金属材料在所述第一介质层220形成电容器的第一极板230。Step S120 , forming the first plate 230 of the capacitor on the first dielectric layer 220 using metal material.

第一极板230可以为上述的下层极板192,即第一极板230可以按照图3b或图4c示出的形状,用金属材料(例如铜或铝)在第一介质层220的表面形成,如图5(c)所示。The first pole plate 230 can be the above-mentioned lower pole plate 192, that is, the first pole plate 230 can be formed on the surface of the first dielectric layer 220 with a metal material (such as copper or aluminum) according to the shape shown in Figure 3b or Figure 4c , as shown in Figure 5(c).

步骤S130,在所述第一极板230的表面以及第一介质层220的表面形成第二介质层240。Step S130 , forming a second dielectric layer 240 on the surface of the first electrode plate 230 and the surface of the first dielectric layer 220 .

参见图5(d),在第一极板230以及第一介质层220的表面覆盖第二介质层240,由于需要将下层极板192引出,故可以在图5(d)的左上侧留出第一开口201。如果需要较厚的第二介质层240,可以通过多次沉积的方式形成。Referring to Fig. 5(d), the surface of the first pole plate 230 and the first dielectric layer 220 is covered with the second dielectric layer 240. Since the lower pole plate 192 needs to be drawn out, it can be left on the upper left side of Fig. 5(d) The first opening 201 . If a thicker second dielectric layer 240 is required, it can be formed by multiple depositions.

步骤S140,使用金属材料在所述第二介质层240形成电容器的第二极板250。Step S140 , forming the second plate 250 of the capacitor on the second dielectric layer 240 using a metal material.

第二极板250为上述的上层极板191,具体可以按照图3a或图4b的形状,用金属材料在第二介质层240的表面形成,参见图5(e)。The second pole plate 250 is the above-mentioned upper pole plate 191, specifically, it can be formed on the surface of the second dielectric layer 240 with a metal material according to the shape of Fig. 3a or Fig. 4b, see Fig. 5(e).

步骤S150,在所述第二极板250的表面以及第二介质层240的表面形成第三介质层260。Step S150 , forming a third dielectric layer 260 on the surface of the second electrode plate 250 and the surface of the second dielectric layer 240 .

在第二极板250以及第二介质层240的表面覆盖第二极板250,第二极板250也可以设置有第二开口202,用于引出上层极板191,参见图5(f)。The surface of the second pole plate 250 and the second dielectric layer 240 is covered with the second pole plate 250 , and the second pole plate 250 may also be provided with a second opening 202 for leading out the upper pole plate 191 , see FIG. 5( f ).

本发明实施例提供的电容器阵列10及制造方法包括第一组电容器110和第二组电容器120,其中第一组电容器110包括第一电容器111和第二电容器112,第二组电容器120包括第三电容器121和第四电容器122,第一电容器111、第二电容器112、第三电容器121以及第四电容器122均为镜像对称的电容器,并且第一电容器111和第二电容器112的平面极板俯视图形以第一对称轴130为轴成镜像对称分布,第三电容器121和第四电容器122的平面极板俯视图形以第二对称轴140为轴成镜像对称分布,并且第一对称轴130与第二对称轴140具有预设角度。由于第一电容器111、第二电容器112、第三电容器121以及第四电容器122均为镜像对称的,且第一电容器111与第二电容器112成镜像对称分布,第三电容器121与第四电容器122成镜像对称分布,因此第一电容器111与第三电容器121、第四电容器122之间的寄生电容180是对称的,第二电容器112与第三电容器121、第四电容器122之间的寄生电容180是对称的。同理,第三电容器121以及第四电容器122在第一组电容器110的寄生电容180也是对称的。所以一组电容耦合到另一组电容的信号大小完全相等,构成共模信号,该共模信号可以被差分信号检测端口过滤,从而改善了不同电容通道的干扰问题。The capacitor array 10 and the manufacturing method provided by the embodiment of the present invention include a first group of capacitors 110 and a second group of capacitors 120, wherein the first group of capacitors 110 includes a first capacitor 111 and a second capacitor 112, and the second group of capacitors 120 includes a third The capacitor 121 and the fourth capacitor 122, the first capacitor 111, the second capacitor 112, the third capacitor 121 and the fourth capacitor 122 are mirror symmetrical capacitors, and the top view of the plane plates of the first capacitor 111 and the second capacitor 112 Take the first symmetry axis 130 as the axis to form a mirror image symmetrical distribution, the planar plate top view figures of the third capacitor 121 and the fourth capacitor 122 take the second symmetry axis 140 as the axis to form a mirror image symmetrical distribution, and the first symmetry axis 130 and the second The axis of symmetry 140 has a preset angle. Since the first capacitor 111, the second capacitor 112, the third capacitor 121, and the fourth capacitor 122 are all mirror-symmetrical, and the first capacitor 111 and the second capacitor 112 are distributed mirror-symmetrically, the third capacitor 121 and the fourth capacitor 122 Mirror symmetrical distribution, so the parasitic capacitance 180 between the first capacitor 111 and the third capacitor 121, the fourth capacitor 122 is symmetrical, the parasitic capacitance 180 between the second capacitor 112 and the third capacitor 121, the fourth capacitor 122 is symmetrical. Similarly, the parasitic capacitance 180 of the third capacitor 121 and the fourth capacitor 122 in the first group of capacitors 110 is also symmetrical. Therefore, the magnitudes of signals coupled from one set of capacitors to another set of capacitors are completely equal, forming a common-mode signal, which can be filtered by the differential signal detection port, thereby improving the interference problem of different capacitor channels.

为使本发明实施例的目的、技术方案和优点更加清楚,上面结合本发明实施例中的附图,对本发明实施例中的技术方案进行了清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。通常在此处附图中描述和示出的本发明实施例的组件可以以各种不同的配置来布置和设计。In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention have been clearly and completely described above in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. The components of the embodiments of the invention generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations.

因此,以上对在附图中提供的本发明的实施例的详细描述并非旨在限制要求保护的本发明的范围,而是仅仅表示本发明的选定实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。Accordingly, the above detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention but represents only selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

应注意到:相似的标号和字母在下面的附图中表示类似项,因此,一旦某一项在一个附图中被定义,则在随后的附图中不需要对其进行进一步定义和解释。It should be noted that like numerals and letters denote similar items in the following figures, therefore, once an item is defined in one figure, it does not require further definition and explanation in subsequent figures.

在本发明的描述中,需要说明的是,术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,或者是该发明产品使用时惯常摆放的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”、“第三”等仅用于区分描述,而不能理解为指示或暗示相对重要性。In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship that is usually placed when the product of the invention is used, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying References to devices or elements must have a particular orientation, be constructed, and operate in a particular orientation and therefore should not be construed as limiting the invention. In addition, the terms "first", "second", "third", etc. are only used for distinguishing descriptions, and should not be construed as indicating or implying relative importance.

在本发明的描述中,还需要说明的是,除非另有明确的规定和限定,术语“设置”、“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,可以具体情况理解上述术语在本发明中的具体含义。In the description of the present invention, it should also be noted that, unless otherwise clearly specified and limited, the terms "installation", "installation", "connection" and "connection" should be understood in a broad sense, for example, it may be a fixed connection, It can also be a detachable connection or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediary, and it can be the internal communication of two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention in specific situations.

Claims (8)

1.一种电容器阵列,其特征在于,所述电容器阵列包括:第一组电容器和第二组电容器,所述第一组电容器包括第一电容器和第二电容器,所述第二组电容器包括第三电容器和第四电容器,1. A capacitor array, characterized in that, the capacitor array includes: a first group of capacitors and a second group of capacitors, the first group of capacitors includes the first capacitor and the second capacitor, and the second group of capacitors includes the first Three capacitors and a fourth capacitor, 所述第一电容器、第二电容器、第三电容器和第四电容器均为具有镜像对称平面极板的电容器,且包含上层极板和下层极板,The first capacitor, the second capacitor, the third capacitor and the fourth capacitor are all capacitors with mirror-image symmetrical plane plates, and include an upper plate and a lower plate, 所述第一电容器和第二电容器的同层平面极板以第一对称轴为轴成镜像对称分布,所述第三电容器和第四电容器的同层平面极板以第二对称轴为轴成镜像对称分布,所述第一对称轴与第二对称轴之间具有预设角度;The same-layer planar plates of the first capacitor and the second capacitor are mirror-symmetrically distributed with the first symmetry axis as the axis, and the same-layer planar plates of the third capacitor and the fourth capacitor are arranged with the second symmetry axis as the axis. Mirror symmetrical distribution, the first symmetry axis and the second symmetry axis have a preset angle; 其中,所述镜像对称是指把图像沿着对称轴折叠,所述对称轴两旁的部分能够互相重合;所述第一对称轴与第二对称轴之间的预设角度的角度范围为[80°,90°)∪(90°,100°]。Wherein, the mirror symmetry refers to folding the image along the axis of symmetry, and the parts on both sides of the axis of symmetry can overlap each other; the angle range of the preset angle between the first axis of symmetry and the second axis of symmetry is [80 °,90°)∪(90°,100°]. 2.根据权利要求1所述的电容器阵列,其特征在于:2. The capacitor array according to claim 1, characterized in that: 所述第一电容器、第二电容器、第三电容器、第四电容器的极板均包括至少一个子极板。The plates of the first capacitor, the second capacitor, the third capacitor and the fourth capacitor all include at least one sub-plate. 3.根据权利要求2所述的电容器阵列,其特征在于:还包括导体结构,3. The capacitor array according to claim 2, further comprising a conductor structure, 所述第一电容器的极板和第二电容器的极板均包括多个子极板,所述第一电容器的极板的多个子极板通过所述导体结构连接,所述第二电容器的极板的多个子极板通过所述导体结构连接。Both the pole plates of the first capacitor and the pole plates of the second capacitor include a plurality of sub-plates, the multiple sub-plates of the pole plates of the first capacitor are connected through the conductor structure, and the pole plates of the second capacitor The plurality of sub-plates are connected through the conductor structure. 4.根据权利要求1所述的电容器阵列,其特征在于:还包括导体结构,所述导体结构分别设置于所述第一电容器、第二电容器、第三电容器、第四电容器极板的边缘位置,上下层极板的导体结构形状独立设置,并且:4. The capacitor array according to claim 1, characterized in that: it also includes a conductor structure, and the conductor structure is respectively arranged at the edge positions of the plates of the first capacitor, the second capacitor, the third capacitor, and the fourth capacitor , the conductor structure shapes of the upper and lower plates are set independently, and: 设置于第一电容器的极板的边缘位置的导体结构的面积小于第一电容器的极板的面积;the area of the conductor structure disposed at the edge of the plate of the first capacitor is smaller than the area of the plate of the first capacitor; 设置于第二电容器的极板的边缘位置的导体结构的面积小于第二电容器的极板的面积;The area of the conductor structure disposed at the edge of the plate of the second capacitor is smaller than the area of the plate of the second capacitor; 设置于第三电容器的极板的边缘位置的导体结构的面积小于第三电容器的极板的面积;The area of the conductor structure disposed at the edge of the pole plate of the third capacitor is smaller than the area of the pole plate of the third capacitor; 设置于第四电容器的极板的边缘位置的导体结构的面积小于第四电容器的极板的面积。The area of the conductor structure disposed at the edge of the pole plate of the fourth capacitor is smaller than the area of the pole plate of the fourth capacitor. 5.根据权利要求4所述的电容器阵列,其特征在于:5. The capacitor array according to claim 4, characterized in that: 设置于第一电容器的极板的边缘位置的导体结构的面积小于或等于第一电容器的极板的面积的一半;The area of the conductor structure disposed at the edge of the plate of the first capacitor is less than or equal to half the area of the plate of the first capacitor; 设置于第二电容器的极板的边缘位置的导体结构的面积小于或等于第二电容器的极板的面积的一半;The area of the conductor structure disposed at the edge of the plate of the second capacitor is less than or equal to half the area of the plate of the second capacitor; 设置于第三电容器的极板的边缘位置的导体结构的面积小于或等于第三电容器的极板的面积的一半;The area of the conductor structure disposed at the edge of the plate of the third capacitor is less than or equal to half the area of the plate of the third capacitor; 设置于第四电容器的极板的边缘位置的导体结构的面积小于或等于第四电容器的极板的面积的一半。The area of the conductor structure disposed at the edge of the pole plate of the fourth capacitor is less than or equal to half of the area of the pole plate of the fourth capacitor. 6.根据权利要求1所述的电容器阵列,其特征在于:还包括第一走线、第二走线、第三走线、第四走线、第一焊盘、第二焊盘、第三焊盘以及第四焊盘,6. The capacitor array according to claim 1, further comprising a first wiring, a second wiring, a third wiring, a fourth wiring, a first pad, a second pad, a third pad and the fourth pad, 所述第一电容器通过第一走线与第一焊盘连接;The first capacitor is connected to the first pad through a first wiring; 所述第二电容器通过第二走线与第二焊盘连接;The second capacitor is connected to the second pad through a second wire; 所述第三电容器通过第三走线与第三焊盘连接;The third capacitor is connected to the third pad through a third wire; 所述第四电容器通过第四走线与第四焊盘连接。The fourth capacitor is connected to the fourth pad through a fourth wire. 7.根据权利要求6所述的电容器阵列,其特征在于:7. The capacitor array according to claim 6, characterized in that: 所述第一走线与第一焊盘的面积之和小于第一电容器的极板的面积;The sum of the areas of the first wiring and the first pad is smaller than the area of the plate of the first capacitor; 所述第二走线与第二焊盘的面积之和小于第二电容器的极板的面积;The sum of the areas of the second wiring and the second pad is smaller than the area of the plate of the second capacitor; 所述第三走线与第三焊盘的面积之和小于第三电容器的极板的面积;The sum of the areas of the third wiring and the third pad is smaller than the area of the plate of the third capacitor; 所述第四走线与第四焊盘的面积之和小于第四电容器的极板的面积。The sum of the areas of the fourth wiring and the fourth pad is smaller than the area of the plate of the fourth capacitor. 8.一种电容器阵列的制造方法,用于制造如权利要求1所述的电容器阵列,其特征在于:8. A method for manufacturing a capacitor array, used to manufacture the capacitor array as claimed in claim 1, characterized in that: 在衬底沉积第一介质层;Depositing a first dielectric layer on the substrate; 使用金属材料在所述第一介质层形成电容器的第一极板;forming a first plate of a capacitor on the first dielectric layer by using a metal material; 在所述第一极板的表面以及第一介质层的表面形成第二介质层;forming a second dielectric layer on the surface of the first pole plate and the surface of the first dielectric layer; 使用金属材料在所述第二介质层形成电容器的第二极板;forming a second plate of the capacitor on the second dielectric layer using a metal material; 在所述第二极板的表面以及第二介质层的表面形成第三介质层。A third dielectric layer is formed on the surface of the second polar plate and the surface of the second dielectric layer.
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