CN107204325B - Capacitor array and method of manufacture - Google Patents
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- 239000003990 capacitor Substances 0.000 title claims abstract description 383
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims description 10
- 239000004020 conductor Substances 0.000 claims description 38
- 239000007769 metal material Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
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- 238000000151 deposition Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 35
- 230000003071 parasitic effect Effects 0.000 description 15
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 230000010354 integration Effects 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 1
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- 230000005540 biological transmission Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
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- 239000011521 glass Substances 0.000 description 1
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5223—Capacitor integral with wiring layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/10—Applying interconnections to be used for carrying current between separate components within a device
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Abstract
Description
技术领域technical field
本发明涉及电气元件领域,具体而言,涉及一种电容器阵列及制造方法。The invention relates to the field of electrical components, in particular to a capacitor array and a manufacturing method.
背景技术Background technique
使用电容在具有高电压差的芯片或模块之间传输信号,在通讯模块和数据总线中具有广泛的应用。随着系统集成度的提高,分立电容器件逐渐被芯片上的集成电容取代。Using capacitors to transmit signals between chips or modules with high voltage differences has a wide range of applications in communication modules and data buses. With the improvement of system integration, discrete capacitor devices are gradually replaced by integrated capacitors on chips.
集成电容多采取平面结构,包含上下两层平面金属极板,通过极板间的介质层实现电容极板之间的高压隔离和电场耦合。随着系统体积的缩小以及传输信号的脉冲宽度的缩短,集成电容的极板面积相应的缩小,并且相邻电容的间距也不断缩小。这导致了不同电容的极板之间耦合增强,属于不同信号通道的电容之间会产生更强的干扰信号。Integrated capacitors mostly adopt a planar structure, including two upper and lower plane metal plates, and the high-voltage isolation and electric field coupling between the capacitor plates are realized through the dielectric layer between the plates. With the shrinking of the system volume and the shortening of the pulse width of the transmission signal, the plate area of the integrated capacitor is correspondingly reduced, and the distance between adjacent capacitors is also continuously reduced. This results in enhanced coupling between plates of different capacitors, and stronger interference signals between capacitors belonging to different signal channels.
传统的差分信号检测方法虽然可以有效过滤共模干扰信号,但无法消除由于集成电容内在的通道间耦合产生的非共模干扰信号,特别是在使用电容进行双向信号传输的时,通道间的耦合情况更加复杂和显著。因此,如何解决电容集成技术中不同电容通道的干扰问题是本领域亟需解决的问题。Although the traditional differential signal detection method can effectively filter the common-mode interference signal, it cannot eliminate the non-common-mode interference signal caused by the inherent inter-channel coupling of integrated capacitors, especially when using capacitors for bidirectional signal transmission, the inter-channel coupling The situation is more complex and significant. Therefore, how to solve the interference problem of different capacitive channels in the capacitive integration technology is an urgent problem to be solved in this field.
发明内容Contents of the invention
有鉴于此,本发明提供了一种电容器阵列及制造方法,以改善现有的电容集成技术中不同电容通道的干扰问题。In view of this, the present invention provides a capacitor array and a manufacturing method to improve the interference problem of different capacitor channels in the existing capacitor integration technology.
为实现上述目的,本发明提供如下技术方案:To achieve the above object, the present invention provides the following technical solutions:
一种电容器阵列,包括第一组电容器和第二组电容器,所述第一组电容器包括第一电容器和第二电容器,所述第二组电容器包括第三电容器和第四电容器,所述第一电容器、第二电容器、第三电容器和第四电容器均为具有镜像对称平面极板的电容器,包含上层极板和下层极板,所述第一电容器和第二电容器的同层极板以第一对称轴为轴成镜像对称分布,所述第三电容器和第四电容器的同层极板以第二对称轴为轴成镜像对称分布,所述第一对称轴与第二对称轴之间具有预设角度。A capacitor array, comprising a first group of capacitors and a second group of capacitors, the first group of capacitors includes a first capacitor and a second capacitor, the second group of capacitors includes a third capacitor and a fourth capacitor, the first The capacitor, the second capacitor, the third capacitor and the fourth capacitor are all capacitors with mirror-image symmetrical plane plates, including an upper plate and a lower plate, and the same layer plates of the first capacitor and the second capacitor are separated by the first The axis of symmetry is a mirror-image symmetrical distribution of the axis, and the plates of the same layer of the third capacitor and the fourth capacitor are distributed in a mirror-symmetrical manner with the second axis of symmetry as an axis, and there is a predetermined gap between the first and second symmetry axes. set angle.
一种电容器阵列的制造方法,用于制造上述的电容器阵列,所述方法包括:在衬底沉积第一介质层;使用金属材料在所述第一介质层形成电容器的第一极板;在所述第一极板的表面以及第一介质层的表面形成第二介质层;使用金属材料在所述第二介质层形成电容器的第二极板;在所述第二极板的表面以及第二介质层的表面形成第三介质层。A method for manufacturing a capacitor array, which is used to manufacture the above-mentioned capacitor array, the method comprising: depositing a first dielectric layer on a substrate; using a metal material to form a first plate of a capacitor on the first dielectric layer; Form the second dielectric layer on the surface of the first pole plate and the surface of the first dielectric layer; use metal materials to form the second pole plate of the capacitor on the second dielectric layer; form the second pole plate on the surface of the second pole plate and the second The surface of the dielectric layer forms a third dielectric layer.
本发明实施例提供的电容器阵列及制造方法的有益效果为:The beneficial effects of the capacitor array and manufacturing method provided by the embodiments of the present invention are:
本发明实施例提供的电容器阵列及制造方法包括第一组电容器和第二组电容器,其中第一组电容器包括第一电容器和第二电容器,第二组电容器包括第三电容器和第四电容器,第一电容器、第二电容器、第三电容器以及第四电容器均为具有镜像对称平面极板的电容器,包含上层极板和下层极板,并且第一电容器和第二电容器的同层极板以第一对称轴为轴成镜像对称分布,第三电容器和第四电容器的同层极板以第二对称轴为轴成镜像对称分布,并且第一对称轴与第二对称轴具有预设角度。第一电容器、第二电容器各自的平面极板关于第二对称轴成镜像对称,第三电容器以及第四电容器各自的平面极板关于第一对称轴成镜像对称,因此第一电容器上(下)层极板与第三电容器、第四电容器上层极板或下层极板之间的寄生电容是对称(相等)的,第二电容器上(下)层极板与第三电容器、第四电容器上层极板或下层极板之间的寄生电容是对称(相等)的,第三电容器上(下)层极板与第一电容器、第二电容器上层极板或下层极板之间的寄生电容是对称(相等)的,第四电容器上(下)层极板与第一电容器、第二电容器上层极板或下层极板之间的寄生电容是对称(相等)的。所以一组电容耦合到另一组电容的信号大小完全相等,构成共模信号,该共模信号可以被差分信号检测端口过滤,从而改善了不同电容通道的干扰问题。The capacitor array and manufacturing method provided by the embodiments of the present invention include a first group of capacitors and a second group of capacitors, wherein the first group of capacitors includes a first capacitor and a second capacitor, the second group of capacitors includes a third capacitor and a fourth capacitor, and the second group of capacitors includes a third capacitor and a fourth capacitor. A capacitor, the second capacitor, the third capacitor and the fourth capacitor are all capacitors with mirror-image symmetrical plane plates, including an upper plate and a lower plate, and the same layer plates of the first capacitor and the second capacitor are separated by the first The axis of symmetry is distributed mirror-symmetrically to the axis, the plates of the same layer of the third capacitor and the fourth capacitor are distributed symmetrically to the axis of the second axis of symmetry, and the first axis of symmetry and the second axis of symmetry have a preset angle. The respective planar plates of the first capacitor and the second capacitor are mirror-symmetrical about the second axis of symmetry, and the respective planar plates of the third capacitor and the fourth capacitor are mirror-symmetrical about the first axis of symmetry, so the upper (lower) of the first capacitor The parasitic capacitance between the upper plate and the third capacitor, the fourth capacitor upper plate or the lower plate is symmetrical (equal), the second capacitor upper (lower) layer plate and the third capacitor, the fourth capacitor upper plate The parasitic capacitance between the plates or the lower plate is symmetrical (equal), and the parasitic capacitance between the upper (lower) plate of the third capacitor and the first capacitor, the upper plate or the lower plate of the second capacitor is symmetrical ( equal), the parasitic capacitance between the upper (lower) plate of the fourth capacitor and the first capacitor, the upper plate or the lower plate of the second capacitor is symmetrical (equal). Therefore, the magnitudes of signals coupled from one set of capacitors to another set of capacitors are completely equal, forming a common-mode signal, which can be filtered by the differential signal detection port, thereby improving the interference problem of different capacitor channels.
附图说明Description of drawings
为了更清楚的说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单的介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.
图1是本发明第一实施例提供的电容器阵列的部分结构的俯视示意图;FIG. 1 is a schematic top view of a partial structure of a capacitor array provided by the first embodiment of the present invention;
图2是本发明第一实施例提供的电容器阵列的一种具体实施方式的单层极板俯视示意图;2 is a schematic top view of a single-layer plate of a specific embodiment of the capacitor array provided by the first embodiment of the present invention;
图3a是本发明第一实施例提供的电容器阵列的上层极板的俯视示意图;3a is a schematic top view of the upper plate of the capacitor array provided by the first embodiment of the present invention;
图3b是本发明第一实施例提供的电容器阵列的下层极板的俯视示意图;3b is a schematic top view of the lower plate of the capacitor array provided by the first embodiment of the present invention;
图4a是本发明第二实施例提供的电容器阵列的结构示意图;Fig. 4a is a schematic structural diagram of a capacitor array provided by a second embodiment of the present invention;
图4b是图4a示出的电容器阵列的上层极板的俯视示意图;Fig. 4b is a schematic top view of the upper plate of the capacitor array shown in Fig. 4a;
图4c是图4a示出的电容器阵列的下层极板的俯视示意图;Fig. 4c is a schematic top view of the lower plate of the capacitor array shown in Fig. 4a;
图5是本发明实施例示出的电容器阵列的制作方法的分步示意图;5 is a step-by-step schematic diagram of a method for manufacturing a capacitor array shown in an embodiment of the present invention;
图6是本发明实施例示出的电容器阵列的制作方法的流程示意图。FIG. 6 is a schematic flowchart of a method for manufacturing a capacitor array shown in an embodiment of the present invention.
图标:10-电容器阵列;110-第一组电容器;111-第一电容器;112-第二电容器;120-第二组电容器;121-第三电容器;122-第四电容器;130-第一对称轴;140-第二对称轴;150-导体结构;161-第一走线;162-第二走线;163-第三走线;164-第四走线;171-第一焊盘;172-第二焊盘;173-第三焊盘;174-第四焊盘;180-寄生电容;191-上层极板;192-下层极板;193-子极板;201-第一开口;202-第二开口;210-衬底;220-第一介质层;230-第一极板;240-第二介质层;250-第二极板;260-第三介质层。Icon: 10-capacitor array; 110-first capacitor; 111-first capacitor; 112-second capacitor; 120-second capacitor; 121-third capacitor; 122-fourth capacitor; 130-first symmetry Axis; 140-second symmetry axis; 150-conductor structure; 161-first routing; 162-second routing; 163-third routing; 164-fourth routing; 171-first pad; 172 - second pad; 173 - third pad; 174 - fourth pad; 180 - parasitic capacitance; 191 - upper plate; 192 - lower plate; 193 - sub-plate; 201 - first opening; 202 - second opening; 210 - substrate; 220 - first dielectric layer; 230 - first polar plate; 240 - second dielectric layer; 250 - second polar plate; 260 - third dielectric layer.
具体实施方式Detailed ways
下面将结合本发明实施例中附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。以下对在附图中提供的本发明的实施例的详细描述并非旨在限制要求保护的本发明的范围,而是仅仅表示本发明的选定实施例。基于本发明的实施例,本领域技术人员在没有做出创造性劳动的前提下所获得的所有其他实施例,都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. The following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts belong to the protection scope of the present invention.
详情请参见图1,图1示出了本发明第一实施例提供的电容器阵列10的俯视示意图。该电容器阵列10包括第一组电容器110和第二组电容器120。其中,第一组电容器110包括第一电容器111和第二电容器112,第二组电容器120包括第三电容器121和第四电容器122。Please refer to FIG. 1 for details. FIG. 1 shows a schematic top view of a
上述电容器均包含上层极板191和下层极板192。上述电容器的下层极板192由同一工艺步骤制作,大致位于一个平面内;上述电容器的上层极板191也由同一工艺步骤制作,也大致位于一个平面内;所以电容器的上层极板191和下层极板192均为平面极板。上述电容器的上下层极板的位置和形状在垂直方向上相互对应,因此在俯视示意图中电容器的上层极板与下层极板重合,图1所示的俯视示意图既代表上层极板191俯视示意图又代表下层极板192俯视示意图。The above capacitors all include an
本发明中的镜像对称是指把图形沿着对称轴折叠,对称轴两旁的部分能够互相重合。本发明中的平面极板等三维结构镜像对称是指该三维结构的俯视图形镜像对称。Mirror symmetry in the present invention means that the figure is folded along the axis of symmetry, and the parts on both sides of the axis of symmetry can overlap with each other. The mirror image symmetry of a three-dimensional structure such as a plane polar plate in the present invention means that the top view of the three-dimensional structure is mirror image symmetric.
第一电容器111为具有镜像对称平面极板的电容器,具体表现为第一电容器111的上下两层平面极板俯视图形均为镜像对称图形。类似的,第二电容器112为具有镜像对称平面极板的电容器,具体表现为第二电容器112的上下两层平面极板俯视图形均为镜像对称图形。第一电容器111与第二电容器112的同层极板俯视图以第一对称轴130为轴成镜像对称分布。The
第三电容器121为具有镜像对称平面极板的电容器,具体表现为第三电容器121的上下两层平面极板俯视图形均为镜像对称图形。类似的,第四电容器122为具有镜像对称平面极板的电容器,具体表现为第四电容器122的上下两层平面极板俯视图形均为镜像对称图形。第三电容器121的极板的形状可以与第一电容器111的极板形状或第二电容器112的极板形状不同。第三电容器121与第四电容器122的同层极板俯视图形以第二对称轴140为轴成镜像对称分布。The
第一电容器111和第二电容器112均可以是具有以第二对称轴140为轴的镜像对称平面极板的电容器,第三电容器121和第四电容器122均可以是具有以第一对称轴130为轴的镜像对称平面极板的电容器。从数学上可以证明,当第一电容器111和第二电容器112的平面极板本身关于第二对称轴140镜像对称,第一电容器111和第二电容器112的同层平面极板之间关于第一对称轴130镜像对称;并且第三电容器121和第四电容器122的平面极板本身关于第一对称轴130镜像对称,第三电容器121和第四电容器122的同层平面极板之间关于第二对称轴140镜像对称,并且第一对称轴130与第二对称轴140的预设夹角为90°时,所述的电容阵列具有最佳的对称性及其技术效果。Both the
第一对称轴130与第二对称轴140之间具有预设角度,具体的,第一对称轴130与第二对称轴140之间的预设角度可以为80°至100°,优选地,第一对称轴130与第二对称轴140之间的预设角度可以为90°。There is a preset angle between the first axis of
本发明第一实施例提供的电容器阵列10的一种具体实施方式中,还包括导体结构150,导体结构150可以分别设置于第一电容器111、第二电容器112、第三电容器121、第四电容器122极板的边缘位置,详情请参见图2。同一个电容器的上下层极板边缘位置的导体结构150的形状可以独立设置,即根据上下层极板具体的应用需要确定其形状,所以属于上下层极板的边缘导体结构可以具有相同或者不同的形状。In a specific implementation of the
设置于第一电容器111极板的边缘位置的导体结构150的面积小于第一电容器111的极板的面积,优选的,设置于第一电容器111极板边缘位置的导体结构150的面积小于或等于第一电容器111的极板的面积的50%。The area of the
设置于第二电容器112极板的边缘位置的导体结构150的面积小于第二电容器112的极板的面积,优选的,设置于第二电容器112极板边缘位置的导体结构150的面积小于或等于第二电容器112的极板的面积的50%。The area of the
设置于第三电容器121极板的边缘位置的导体结构150的面积小于第三电容器121的极板的面积;优选的,设置于第三电容器121极板边缘位置的导体结构150的面积小于或等于第三电容器121的极板的面积的50%。The area of the
设置于第四电容器122极板的边缘位置的导体结构150的面积小于第四电容器122的极板的面积。优选的,设置于第四电容器122极板边缘位置的导体结构150的面积小于或等于第四电容器122的极板的面积的50%。The area of the
设置于电容器边缘位置的导体结构150可以与电容器的极板构成不具备前述对称性的结构或者构成以其他对称轴为轴的镜像对称结构,例如参见图2,第一电容器111以及第一电容器111极板边缘的导体结构150构成的俯视图形与第二电容器112以及第二电容器112边缘的导体结构150构成的俯视图形不具有镜像对称性。同一个电容器的上下层极板边缘位置的导体结构150的形状可以独立设置,即根据上下层极板具体的应用需要确定其形状,所以属于上下层极板的边缘导体结构可以具有相同或者不同的形状,图2中只示出了一层极板及其边缘位置导体的俯视图形。The
本发明第一实施例提供的电容器阵列10还包括第一走线161、第二走线162、第三走线163、第四走线164、第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174。The
详情请参见图3a,在第一实施例示出的整个电容器阵列10的上层极板191中,第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174设置在如图3a所示的上部。Please refer to FIG. 3 a for details. In the
其中,第一电容器111与第二电容器112左右分布,第三电容器121与第四电容器122上下分布,且第三电容器121与第四电容器122的形状分别与第一电容器111以及第二电容器112的形状形成比较紧密的布局。第一电容器111通过第一走线161与第一焊盘171连接,第二电容器112通过第二走线162与第二焊盘172连接,第三电容器121通过第三走线163与第三焊盘173连接,第四电容器122通过第四走线164与第四焊盘174连接。Wherein, the
详情参见图3b,在第一实施例示出的整个电容器阵列10的下层极板192中,第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174设置在如图3b所示的下部。Referring to FIG. 3 b for details, in the
其中,第一电容器111、第二电容器112左右分布,第三电容器121与第四电容器122上下分布,且在下层极板192中,第一电容器111至第四电容器122的位置与在上层极板191中的位置相对应。第一电容器111通过第一走线161与第一焊盘171连接,第二电容器112通过第二走线162与第二焊盘172连接,第三电容器121通过第三走线163与第三焊盘173连接,第四电容器122通过第四走线164与第四焊盘174连接。因此,在第一实施例示出的电容器阵列10的上层极板191和下层极板192中,除了第一焊盘171、第二焊盘172、第三焊盘173、第四焊盘174以及各自分别相连的第一走线161、第二走线162、第三走线163以及第四走线164的位置不同外,第一电容器111至第四电容器122的上层极板191和下层极板192的位置对应相同。Wherein, the
并且,所述第一走线161与第一焊盘171的面积之和可以小于第一电容器111的极板的面积,所述第二走线162与第二焊盘172的面积之和可以小于第二电容器112的极板的面积,所述第三走线163与第三焊盘173的面积之和可以小于第三电容器121的极板的面积,所述第四走线164与第四焊盘174的面积之和可以小于第四电容器122的极板的面积。Moreover, the sum of the areas of the
详情请参见图4a,图4a示出了本发明第二实施例提供的电容器阵列10的结构示意图。所述第一电容器111、第二电容器112、第三电容器121、第四电容器122的极板均包括至少一个子极板193。使用子极板可以缩短极板到焊盘之间走线的距离,减小寄生参数。Please refer to FIG. 4a for details. FIG. 4a shows a schematic structural diagram of the
第一电容器111可以包括两个子极板,具体请参见图4a、图4b和图4c。两个子极板具体可以由导体结构150连接。在第二实施例示出的电容器阵列10的上层极板191中,第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174位于如图4a以及图4b的右侧。在第二实施例示出的电容器阵列10的下层极板192中,第一焊盘171、第二焊盘172、第三焊盘173以及第四焊盘174位于如图4a以及图4c的左侧。The
在上层极板191中,请参见图4b,第一电容器111通过连接两个子极板的导体结构150与第一焊盘171经由第一走线161连接。第二电容器112的两个子极板则可以通过各自的第二走线162与第二焊盘172连接,第三电容器121则通过第三走线163与第三焊盘173连接,第四电容器122通过第四走线164与第四焊盘174连接。In the
在下层极板192中,请参见图4c,第一电容器111的两个子极板193可以通过各自的第一走线161与第一焊盘171连接,第二电容器112通过连接两个子极板的导体结构150与第二焊盘172经由第一走线161连接。第三电容器121则通过第三走线163与第三焊盘173连接,第四电容器122通过第四走线164与第四焊盘174连接。In the
类似的,第三电容器和第四电容器也可以包含子极板,在此不再赘述。Similarly, the third capacitor and the fourth capacitor may also include sub-plates, which will not be repeated here.
本发明实施例提供的电容器阵列10的工作原理为:The working principle of the
第一组电容器110和第二组电容器120分别用于传输两组不同的差分信号,接下来以第二电容器112为例进行说明:The first set of
参见图1,由于第二电容器112的平面极板具有镜像对称俯视图形,且在图1示出的第一实施例中,第二电容器112的平面极板俯视图形具体是以第二对称轴140为轴的镜像对称图形。因此,在不受外加干扰的情况下,第二电容器112在工作时是一个对称电势体,即第二电容器112发出的电场线和电势分布也关于垂直于平面极板所在平面且经过第二对称轴140的平面成镜像对称。关于垂直于平面极板所在平面且经过第二对称轴140的平面成镜像对称的电场分别耦合到同样关于垂直于平面极板所在平面且经过第二对称轴140的平面成镜像成镜像对称分布的第三电容器121和第四电容器122。因此,产生的干扰信号也是对称的。Referring to FIG. 1 , since the planar plate of the
具体参见图1,第二电容器112与第三电容器121之间分布着多个寄生电容180,如图1示出的上侧的四个寄生电容180;第二电容器112与第四电容器122之间同样也分布着多个寄生电容180,如图1示出的下侧的四个寄生电容180。Specifically referring to FIG. 1, a plurality of
由于第二电容器112与第三电容器121之间分布的寄生电容180与第二电容器112与第四电容器122之间分布的寄生电容180是对称的,因此,第二电容器112耦合到第三电容器121以及第二电容器112耦合到第四电容器122的信号大小完全相等,构成共模信号。这一共模信号会被差分信号检测端口过滤,而不在第二电容器112对应的信号通道上产生错误的信号,也不会在第三电容121及第四电容122对应的信号通道上产生错误的信号。Since the
同理,可以对第一电容器111、第三电容器121以及第四电容器122进行逐一验证,第一组电容器110在第二组电容器120产生的干扰信号为大小相等、方向相同的共模信号,第二组电容器120在第一组电容器110产生的干扰信号也是大小相等、方向相同的共模信号,而共模信号可以被差分信号检测端口过滤。Similarly, the
第一对称轴130与第二对称轴140之间的夹角为90度是消除干扰信号较好的形式,由于电容器的极板需要通过走线和焊盘与其他元件和电路相连,因此,第一组电容器110以及第二组电容器120未必具有严格的对称性,不具有严格对称性部分的面积(例如导体结构150,走线,及焊盘)相对极板对称部分的面积较小。The angle between the first axis of
因此,第一对称轴130与第二对称轴140之间的夹角可以为一个范围,例如80度至100度之间,或不具备对称性的导体结构150的面积小于或等于具有对称性的极板的面积的一半,上述不具备对称性的导体结构150产生的干扰信号相对较小,未严格对称的电容器阵列10依然可以显著降低干扰信号的强度。Therefore, the included angle between the first axis of
详情参见图6,图6示出了制造该电容器阵列10的流程,具体包括如下步骤:Refer to FIG. 6 for details. FIG. 6 shows the process of manufacturing the
步骤S110,在衬底210沉积第一介质层220。Step S110 , depositing a first
衬底210可以是PCB板、硅片、玻璃或者有机基板,如图5(a)所示。在衬底210沉积第一介质层220,第一介质层220常用的材料包括氧化硅、氮化硅、氧化铝、聚合物(例如聚酰亚胺、苯并环丁烯等),如图5(b)所示。如果衬底为绝缘体,可省略该步骤。The
步骤S120,使用金属材料在所述第一介质层220形成电容器的第一极板230。Step S120 , forming the
第一极板230可以为上述的下层极板192,即第一极板230可以按照图3b或图4c示出的形状,用金属材料(例如铜或铝)在第一介质层220的表面形成,如图5(c)所示。The
步骤S130,在所述第一极板230的表面以及第一介质层220的表面形成第二介质层240。Step S130 , forming a
参见图5(d),在第一极板230以及第一介质层220的表面覆盖第二介质层240,由于需要将下层极板192引出,故可以在图5(d)的左上侧留出第一开口201。如果需要较厚的第二介质层240,可以通过多次沉积的方式形成。Referring to Fig. 5(d), the surface of the
步骤S140,使用金属材料在所述第二介质层240形成电容器的第二极板250。Step S140 , forming the
第二极板250为上述的上层极板191,具体可以按照图3a或图4b的形状,用金属材料在第二介质层240的表面形成,参见图5(e)。The
步骤S150,在所述第二极板250的表面以及第二介质层240的表面形成第三介质层260。Step S150 , forming a third
在第二极板250以及第二介质层240的表面覆盖第二极板250,第二极板250也可以设置有第二开口202,用于引出上层极板191,参见图5(f)。The surface of the
本发明实施例提供的电容器阵列10及制造方法包括第一组电容器110和第二组电容器120,其中第一组电容器110包括第一电容器111和第二电容器112,第二组电容器120包括第三电容器121和第四电容器122,第一电容器111、第二电容器112、第三电容器121以及第四电容器122均为镜像对称的电容器,并且第一电容器111和第二电容器112的平面极板俯视图形以第一对称轴130为轴成镜像对称分布,第三电容器121和第四电容器122的平面极板俯视图形以第二对称轴140为轴成镜像对称分布,并且第一对称轴130与第二对称轴140具有预设角度。由于第一电容器111、第二电容器112、第三电容器121以及第四电容器122均为镜像对称的,且第一电容器111与第二电容器112成镜像对称分布,第三电容器121与第四电容器122成镜像对称分布,因此第一电容器111与第三电容器121、第四电容器122之间的寄生电容180是对称的,第二电容器112与第三电容器121、第四电容器122之间的寄生电容180是对称的。同理,第三电容器121以及第四电容器122在第一组电容器110的寄生电容180也是对称的。所以一组电容耦合到另一组电容的信号大小完全相等,构成共模信号,该共模信号可以被差分信号检测端口过滤,从而改善了不同电容通道的干扰问题。The
为使本发明实施例的目的、技术方案和优点更加清楚,上面结合本发明实施例中的附图,对本发明实施例中的技术方案进行了清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。通常在此处附图中描述和示出的本发明实施例的组件可以以各种不同的配置来布置和设计。In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention have been clearly and completely described above in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. The components of the embodiments of the invention generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations.
因此,以上对在附图中提供的本发明的实施例的详细描述并非旨在限制要求保护的本发明的范围,而是仅仅表示本发明的选定实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。Accordingly, the above detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention but represents only selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
应注意到:相似的标号和字母在下面的附图中表示类似项,因此,一旦某一项在一个附图中被定义,则在随后的附图中不需要对其进行进一步定义和解释。It should be noted that like numerals and letters denote similar items in the following figures, therefore, once an item is defined in one figure, it does not require further definition and explanation in subsequent figures.
在本发明的描述中,需要说明的是,术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,或者是该发明产品使用时惯常摆放的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”、“第三”等仅用于区分描述,而不能理解为指示或暗示相对重要性。In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship that is usually placed when the product of the invention is used, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying References to devices or elements must have a particular orientation, be constructed, and operate in a particular orientation and therefore should not be construed as limiting the invention. In addition, the terms "first", "second", "third", etc. are only used for distinguishing descriptions, and should not be construed as indicating or implying relative importance.
在本发明的描述中,还需要说明的是,除非另有明确的规定和限定,术语“设置”、“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,可以具体情况理解上述术语在本发明中的具体含义。In the description of the present invention, it should also be noted that, unless otherwise clearly specified and limited, the terms "installation", "installation", "connection" and "connection" should be understood in a broad sense, for example, it may be a fixed connection, It can also be a detachable connection or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediary, and it can be the internal communication of two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention in specific situations.
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