[go: up one dir, main page]

CN107119267A - Surface of ceramic body chemical solution nickel plating process - Google Patents

Surface of ceramic body chemical solution nickel plating process Download PDF

Info

Publication number
CN107119267A
CN107119267A CN201710516606.4A CN201710516606A CN107119267A CN 107119267 A CN107119267 A CN 107119267A CN 201710516606 A CN201710516606 A CN 201710516606A CN 107119267 A CN107119267 A CN 107119267A
Authority
CN
China
Prior art keywords
nickel
plating
chemical
sodium
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710516606.4A
Other languages
Chinese (zh)
Inventor
张军会
吴术爱
李立
欧新耀
成海
张荣华
刘红建
胡志生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiequn Electronic Technology (Huaian) Co., Ltd.
Original Assignee
Kunshan Fu Shi Electronic Materials Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kunshan Fu Shi Electronic Materials Industry Co Ltd filed Critical Kunshan Fu Shi Electronic Materials Industry Co Ltd
Priority to CN201710516606.4A priority Critical patent/CN107119267A/en
Publication of CN107119267A publication Critical patent/CN107119267A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate
    • C23C18/1639Substrates other than metallic, e.g. inorganic or organic or non-conductive

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)

Abstract

Contain following components in surface of ceramic body chemical solution nickel plating process, every liter of chemical nickel-plating solution formula:Nickel sulfate:10~30g;Sodium Thiosulfate:10~25g;Sodium succinate is as buffer, and pH value is between 3.8~5.0;Complexing agent includes citric acid and sodium citrate, totally 5.5~15g;Wherein, citric acid quality is more than sodium citrate;Surplus is water;Temperature control is at 85 DEG C;Because the surface after catalytic treatment is amorphous state, i.e., in substantially planar state, wearability and self lubricity are good, coefficient of friction is small, and Abherent is good, and case hardness can be enhanced about more than once, after heat treatment hardness reaches more than 3 times of life-span raising after Hv1000, work plated film to coating.In wedge angle or edge projection, without significantly thickening, imitate type very well, grinding, the thickness and uniform ingredients of sedimentary are not required to after plating.Alloy catalytic layer fusing point is 850 890 DEG C.Low resistance, solderability is good.

Description

Surface of ceramic body chemical solution nickel plating process
Technical field
The invention belongs to chemical plating nickel technology fields of the C23C in IPC classification to metal material, i.e., with metallic nickel materials pair The general chemical plating of the coating surface processing of ceramic material, especially surface of ceramic body chemical solution nickel plating process.
Background technology
Chemical plating is a kind of effective surface modifying method, and chemical plating is also known as electroless plating (Electroless Plating), it is referred to as self-catalysis plating (Autocatalytic plating) [1].Detailed process refers to:In certain bar Under part, the metal ion in the aqueous solution is reduced agent reduction, and the process being deposited on solid matrix surface.Chemical nickel plating is A kind of technique that last layer amorphous Ni-P alloy plate is plated in metal or nonmetallic surface by chemical method.By in ceramics Material surface metal lining nickel tends to improve the surface property of material on the basis of original material property is kept.Due to changing Learning nickel coating has the performances such as excellent corrosion resistance, wearability and micromagnetism, therefore chemical nickel plating has extensive industry should With such as being protected on the nonmetallic surface such as steel, casting, aluminium alloy metal surface or glass, plastics, ceramics by chemical nickel Shield organism material is not wear-resistant or play clear embellishment etc. by burn into.
Traditional chemical nickel-plating solution mainly includes basal liquid and additive, and the nickel ion in basal liquid is during plating Progressively it is transferred to workpiece to be machined surface.Contain Pb in its additive2+、Sn2+、Sb3+、Hg2+Etc. one kind or several of heavy metal ion Kind, these heavy metal ion do not participate in reaction during plating, only occur transfer and convert, if liquid waste processing is improper, very Environmental pollution is easily caused, and its pollution to soil is irreversible, has a strong impact on ecological environment and health.Separately Outside, the stability of present chemical nickel-plating solution is relatively low, and misoperation is easily hydrolyzed, and causes the waste of material and environment dirty Dye, and easily there are the bad phenomenons such as pit, pin hole, uneven thickness, surface piebald in chemical Ni-plating layer.
Improved technology scheme of the prior art is less.Pacify micro electronmechanical institute to exist《Material science》Disclose one《Ceramic watch Face chemical nickel plating》Document, describe using Sodium Thiosulfate as reducing agent respectively using potassium tartrate, sodium hypophosphite, tertiary sodium phosphate as Complexing agent carries out the optimum formula and process conditions of chemical nickel plating and the characteristics of to each formula and effect compares in ceramic surface Compared with, as a result show, this technique can ceramic surface obtain function admirable chemical Ni-plating layer.
Kunming University of Science and Technology discloses ZTA ceramics in a kind of ionic liquid in Chinese patent application 201610499240.X The method of chemical nickel plating on surface, its step is:Surface preparation is carried out to ZTA ceramic particles first, then prepares and contains ion The chemical nickel-plating solution of liquid, and chemical nickel-plating solution is added into heating in rotation coating bath, after temperature is constant, it is put into surface clear Clean ZTA ceramic particles, slow rotation carries out chemical nickel plating.Ionic liquid is introduced chemical nickel-plating solution by the present invention, slow down Plating rate, overcomes the shortcoming that plating solution is unstable, ceramic grain surface plating is uneven;In addition, the rotation that the present invention is used Stirring means efficiently solve the problem of big particle diameter ZTA ceramic particle plating is uneven, and ZTA ceramic grain surface nickel plating is improved Its wettability with molten metal, and enhance its bond strength with metallic matrix.
University of Science & Technology, Beijing comes to the surface in Chinese patent application 201010520736.3 there is provided a kind of aluminium nitride ceramics The method for learning nickel plating, belongs to ceramic membrane metallizing art.It is comprised the following steps that:1st, mechanical grinding aln surface;2nd, use Mixed acid or alkali roughening aluminium nitride chip, and thoroughly clean the soda acid of residual;3rd, by the substrate being roughened in stannous chloride solution Middle sensitization, is activated in palladium chloride solution;Or no-palladium activating;4th, by nickel sulfate, sodium hypophosphite, sodium citrate, sodium acetate, Lactic acid, thiocarbamide, lauryl sodium sulfate, weigh certain mass and are configured to chemical plating solution in order;4th, will be molten with acid or alkali Liquid pH value is adjusted to 4.0~6.0, and solution is heated into 70~95 DEG C, is put into ready substrate and is carried out chemical nickel plating.The present invention The characteristics of be that can add a certain amount of surfactant so that coating is more in Difficult to plate substrates performing electroless nickel plating on surface of aluminum nitride ceramic Plus it is fine and close smooth, coating strengthens with basal body binding force, and coating soldering is more preferable.
Kunming University of Science and Technology discloses Al in a kind of ionic liquid in Chinese patent application 201610496597.22O3Pottery The method of porcelain chemical nickel plating on surface, its process is:(1) by Al2O3Ceramic particle is cleaned and clear with deionized water after filtering with acetone Wash;(2) first nickel sulfate solution is slowly added into sodium citrate solution, then sequentially adds ortho phosphorous acid sodium solution, boric acid Solution obtains base soln, and ionic liquid, regulation solution ph to 9-10, you can obtain chemistry are then added into base soln Nickel plating solution;(3) chemical nickel-plating solution is heated to 40-70 DEG C, Al is put into after temperature is constant2O3Ceramic particle carries out chemistry Nickel plating, drying is sealed up for safekeeping after plating is cleaned after terminating with deionized water, you can.
Shanghai Shenhe Thermo-magenetic Electronic Co., Ltd. is related to a kind of pottery in the Chinese patent application 201010564506.7 of proposition The golden processing method of porcelain metallized substrate metal surface electronickelling, makes circuit on metallized ceramic base plate first;Then use Ceramic deposited metal technology is to metallized ceramic base plate deposited metal layer, so as to realize the connection of circuit;Use anti-plate nickel gold Deposited metal layer in the spacing of ink special covering circuit is so as to form the golden ink special coating of anti-plate nickel;Dispel circuit Surface on the golden ink special of the anti-plate nickel that remains and the metal level of deposition, and be ground it is smooth, with certain roughness Metal covering carry out electronickelling gold;Dispel the golden ink special coating of anti-plate nickel;Dispel deposited metal layer.Additionally provide thus Manufacture metallized ceramic base plate.
In the prior art, although, chemical nickel plating has many advantages, and such as wetability to metal is good, coating is combined by force Spend higher, wear-resisting, corrosion resistance preferable, easy to operate etc..But still suffer from following deficiency in surface of ceramic body chemical nickel plating:
1), led due to containing 8% or so phosphorus, usually easily occurring nickel corrosion and phosphorus rich layer etc. in chemical nickel and gold nickel dam The risk for causing welding spot reliability to decline.Some high-end metallized ceramic base plates, such as DBC substrates, can to its solderability and solder joint Require very high by property, usual chemical nickel and gold can not meet its needs.
2), for metallized ceramic base plate, when metallic circuit is when being smaller than 0.20mm, chemical nickel is done in circuit surface It would be possible on ceramics to be deposited nickel gold and cause line short during gold processing, in circuit spacing.Its reason is chemistry Because trace clearance is too small during nickel gold, it is difficult to accomplish that cleaning thoroughly causes metal ion residual in gap to be deposited upper nickel gold, Cause line short.
3), require that layer gold thickness reaches 0.2um~3um for some special ceramics metallized substrates, and chemical nickel and gold without Method meets this requirement.
4), due to chemical nickel plating during except solid state N i and P precipitation, also gaseous state H2Precipitation, if H2Can not Discharge coating and plating solution, will remain in coating, cause uneven coating even, brazing property is bad in time.
The content of the invention
It is an object of the invention to provide surface of ceramic body chemical solution nickel plating process, by improving the technique of chemical plating, make Absorption H in coating2Exclude to greatest extent, to obtain finer and close coating, improve chemical nickel plating quality, effectively solve chemistry Coating surface is uneven in plating, plating rate is too fast causes the problem of plating solution is unstable.
The purpose of the present invention will be realized by following technical measures:Contain in every liter of chemical nickel-plating solution formula with the following group Point:
Nickel sulfate:10~30g;
Sodium Thiosulfate:10~25g;
Sodium succinate:As buffer, the pH value of the chemical nickel-plating solution is maintained between 3.8~5.0;
Complexing agent includes citric acid and sodium citrate, totally 5.5~15g;Wherein, citric acid quality is more than sodium citrate;
Surplus is water;
Chemical nickel plating reactions steps include successively:Chemical nickel plating in sour environment, chemical nickel plating is immersed in by workpiece to be plated In solution, temperature control is at 85 DEG C;Carry out, reducing agent dehydrogenation, aoxidize successively in plating process, hydrogen hydrogen is combined, and is reoxidized, nickel Salt metal is separated out, and liberation of hydrogen and phosphorus are separated out.
Especially, the chemical nickel-plating solution is using water as solvent, and ph is controlled in 3.8~5.0, every liter of chemical nickel-plating solution Contain following components:
Nickel sulfate 10g, citric acid 3.5g, sodium hypophosphite 13g, sodium succinate 5g, ammonium chloride 7g, sodium citrate 2g are remaining Measure as water.
Especially, the chemical nickel-plating solution is using water as solvent, and ph is controlled in 3.8~5.0, every liter of chemical nickel-plating solution Contain following components:
Nickel sulfate 25g, citric acid 7g, sodium hypophosphite 25g, sodium succinate 10g, ammonium chloride 15g, sodium citrate 5g are remaining Measure as water.
Advantages of the present invention and effect:Hg is free of in chemical nickel-plating solution2+、Cd2+、Cr2+、Pb2+Etc. heavy metal ion, greatly It is big to reduce the program and workload of chemical nickle-plating wastewater processing;Because the surface after catalytic treatment is amorphous state, i.e., in base This flat state, wearability and self lubricity are good, therefore, and coefficient of friction is small, and Abherent is good, and alternative hard chrome is used.Through this After technical finesse, case hardness can be enhanced about more than once, in steel and copper surface up to Hv570.Coating after heat treatment hardness Up to Hv1000, General Life improves more than 3 times after plated film.Coating after processing increases with substrate bond strength, typically 350~ Non-scale under the conditions of 400Mpa, do not fall off, bubble-free, the bond strength with aluminium is up to 102~241Mpa.It is prominent in wedge angle or edge Go out part, without too significantly thickening, imitate type very well, grinding, the thickness and uniform ingredients of sedimentary are not required to after plating. Alloy catalytic layer fusing point is 850-890 DEG C.Low resistance, solderability is good.Blind hole, deep hole, pipe fitting, turning, gap inner surface Strong adaptability, can obtain homogeneous coating, no matter how complicated product structure has, absolutely not in place of plating leakage.
Embodiment
The present invention develops the compound additive of the element without heavy metal, reduces cost of sewage disposal, meanwhile, favorably In environmental protection.
In the present invention:Contain following components in every liter of chemical nickel-plating solution formula:
Nickel sulfate:10~30g;
Sodium Thiosulfate:10~25g;
Sodium succinate:As buffer, the pH value of the chemical nickel-plating solution is maintained between 3.8~5.0;
Complexing agent includes citric acid and sodium citrate, totally 5.5~15g;Wherein, citric acid quality is more than sodium citrate;
Surplus is water;
Chemical nickel plating reactions steps include successively:Chemical nickel plating in sour environment, chemical nickel plating is immersed in by workpiece to be plated In solution, temperature control is at 85 DEG C;Carry out, reducing agent dehydrogenation, aoxidize successively in plating process, hydrogen hydrogen is combined, and is reoxidized, nickel Salt metal is separated out, and liberation of hydrogen and phosphorus are separated out.
With reference to embodiment, the invention will be further described.
Embodiment 1:
The chemical nickel-plating solution using water as solvent, ph control in 3.8~5.0, every liter of chemical nickel-plating solution contain with Lower component:
Nickel sulfate 10g, citric acid 3.5g, sodium hypophosphite 13g, sodium succinate 5g, ammonium chloride 7g, sodium citrate 2g are remaining Measure as water.
Embodiment 2:
The chemical nickel-plating solution using water as solvent, ph control in 3.8~5.0, every liter of chemical nickel-plating solution contain with Lower component:
Nickel sulfate 25g, citric acid 7g, sodium hypophosphite 25g, sodium succinate 10g, ammonium chloride 15g, sodium citrate 5g are remaining Measure as water.
In the present invention:
Nickel sulfate is mainly used in electroplating industry, is the main nickel salt of electronickelling and chemical nickel, is also coming for metallic nickel ions Source, can dissociate nickel ion and sulfate ion in electroplating process.
Sodium hypophosphite is chemical plating agent, and catalyst, stabilizer prepare polyamide macromolecule polyamides thing, accelerate chemistry anti- Should;And can combine to form chelant thing with nickel as the stabilizer chemically reacted, as reducing agent in nickel plating bath and control Acid-base value, can effectively improve the surface property and finish of nickel plating product.For the big of coating can not be entered using electroplating technology Type equipment and fine pieces, precision prescribed it is higher and with the complicated profile object of asperities, inner walls of deep holes, require higher table The object of surface hardness and wearability;Or the surface metalation of the nonmetallic materials such as plastics, ceramics, hyaline-quartz, use this product Fine and close, uniform nickel, chrome plating can be obtained, and it is more more firm than electroplating.Electronics is widely used in, aviation, machinery, oil etc. is gone Industry.
Ammonium chloride is clear crystal or white crystalline powder;Odorless, taste is salty, cool;Have and draw moist.It is readily soluble in water, Slightly soluble in ethanol.The aqueous solution is in faintly acid, acid enhancing during heating.Ferrous metal and other metals are corrosive, it is especially right Copper corrosion is bigger, to the corrosion-free effect of the pig iron.Industrial ammonium chloride is white powder or grain crystalline body, and odorless, taste be salty and band Have refrigerant.Easy moisture absorption caking, it is soluble in water, glycerine and liquefied ammonia are dissolved in, ethanol is insoluble in, insoluble in acetone and ether, at 350 DEG C Shi Shenghua, the aqueous solution is in faintly acid.The purposes of industrial grade ammonium chloride is mainly used in battery, plating, dyeing and weaving, casting, medicine, plant In terms of suede, fine hair, chemical intermediate.Ammonium chloride in itself can there is provided chlorion progress as the stable reagent of solution containing nickel Its compound and ammonium chloride, are codissolved in watery hydrochloric acid by coordination when using.
Sodium succinate molecular formula is C4H4Na2O4, is a kind of white solid, odorlessness, in atmosphere not deliquescence;It is soluble in Water, insoluble in organic solvent.It is mainly used in buffer.It can be additionally used in synthesis medicine and other organic synthesis raw materials.
Citric acid is a kind of important organic acid, also known as citric acid, and clear crystal, Chang Hanyi molecular crystalline water, odorless has Very strong tart flavour, it is soluble in water.Its calcium salt is more soluble than in hot water in cold water, and this property is commonly used to be identified and isolated from lemon Acid.Suitable temperature is controlled to obtain anhydrous citric acid during crystallization.Citric acid chemical name 2- hydroxy propane -1,2,3- tricarboxylics Acid.According to the difference of its water content, it is divided into Citric Acid Mono and anhydrous citric acid.The purposes of citric acid widely, for changing Industry is learned, as buffer, complexing agent, metal cleaner, mordant, gelling agent, toner etc..
Sodium citrate alias sodium citrate, is a kind of organic compound, and outward appearance arrives clear crystal for white.Odorless, there is clear Cool salty pungent.It is stable in normal temperature and air, it is micro- in humid air to have dissolubility, weathering phenomenon is produced in hot-air.It is heated to 150 DEG C lose the crystallization water.It is soluble in water, dissolve in glycerine, be insoluble in alcohols and other organic solvents, cross thermally decompose, in humidity Environment in it is micro- have deliquescence, micro- in hot-air to have weathering, its solution ph is about 8.Sodium citrate is excellent in chemistry Chelating agent/complexing agent, industrially the application to sodium citrate is all to utilize this characteristic.With complexing of metal ion ability. Sodium citrate is to Ca2+、Mg2+There is good complexing power Deng metal ion, to other metal ions, such as Fe2+ plasmas There is good complexing power.Sodium citrate has fabulous solubility property, and dissolubility is raised and increased with water temperature.Citric acid There is sodium good pH to adjust and shock-absorbing capacity.Sodium citrate is a kind of weak acid strong alkali salt, can constitute stronger with compatibility of citric acid PH buffer, therefore have its important use in some occasions for being not suitable for pH wide variations.In addition, sodium citrate also has Excellent retarding performance and stability.
The present invention description is made by specific embodiment, but it is clear that still can with various modification can be adapted and convert and Without departing substantially from the spirit and scope of the present invention.Therefore, specification is regarded in an illustrative, rather than a restrictive.

Claims (3)

1. surface of ceramic body chemical solution nickel plating process, it is characterised in that contain in every liter of chemical nickel-plating solution formula with the following group Point:
Nickel sulfate:10~30g;
Sodium Thiosulfate:10~25g;
Sodium succinate:As buffer, the pH value of the chemical nickel-plating solution is maintained between 3.8~5.0;
Complexing agent includes citric acid and sodium citrate, totally 5.5~15g;Wherein, citric acid quality is more than sodium citrate;
Surplus is water;
Chemical nickel plating reactions steps include successively:Chemical nickel plating in sour environment, chemical nickel-plating solution is immersed in by workpiece to be plated In, temperature control is at 85 DEG C;Carry out, reducing agent dehydrogenation, aoxidize successively in plating process, hydrogen hydrogen is combined, and is reoxidized, nickel salt gold Category is separated out, and liberation of hydrogen and phosphorus are separated out.
2. surface of ceramic body chemical solution nickel plating process as claimed in claim 1, it is characterised in that the chemical nickel-plating solution Using water as solvent, ph controls contain following components in 3.8~5.0, every liter of chemical nickel-plating solution:
Nickel sulfate 10g, citric acid 3.5g, sodium hypophosphite 13g, sodium succinate 5g, ammonium chloride 7g, sodium citrate 2g, surplus is Water.
3. surface of ceramic body chemical solution nickel plating process as claimed in claim 1, it is characterised in that the chemical nickel-plating solution Using water as solvent, ph controls contain following components in 3.8~5.0, every liter of chemical nickel-plating solution:
Nickel sulfate 25g, citric acid 7g, sodium hypophosphite 25g, sodium succinate 10g, ammonium chloride 15g, sodium citrate 5g, surplus is Water.
CN201710516606.4A 2017-06-29 2017-06-29 Surface of ceramic body chemical solution nickel plating process Pending CN107119267A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710516606.4A CN107119267A (en) 2017-06-29 2017-06-29 Surface of ceramic body chemical solution nickel plating process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710516606.4A CN107119267A (en) 2017-06-29 2017-06-29 Surface of ceramic body chemical solution nickel plating process

Publications (1)

Publication Number Publication Date
CN107119267A true CN107119267A (en) 2017-09-01

Family

ID=59719937

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710516606.4A Pending CN107119267A (en) 2017-06-29 2017-06-29 Surface of ceramic body chemical solution nickel plating process

Country Status (1)

Country Link
CN (1) CN107119267A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113151811A (en) * 2021-04-13 2021-07-23 赤壁市聚茂新材料科技有限公司 Non-palladium activated nickel plating solution and nickel plating method

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1105397A (en) * 1994-01-13 1995-07-19 鎌仓国年 Plating method combined unelectrolysis and electric plating
CN1301881A (en) * 1999-12-29 2001-07-04 上海雅驰科技发展有限公司 Chemical nickel-plating solution and its preparation and using method
CN1752284A (en) * 2004-09-24 2006-03-29 桂林工学院 Polymer Powder Electroless Nickel Plating Formula and Process
CN101962760A (en) * 2010-10-20 2011-02-02 北京科技大学 Method for performing electroless nickel plating on surface of aluminum nitride ceramic
CN102168261A (en) * 2011-03-21 2011-08-31 山东建筑大学 Low-temperature chemical Ni-Cu-P plating solution and chemical Ni-Cu-P plating method applying the solution
CN103484839A (en) * 2013-10-10 2014-01-01 江门市九星科技材料有限公司 Metal surface treatment reagent for cyanide-free chemical plating or cyanide-free electroplating, and metal surface treatment method
CN105567066A (en) * 2016-02-04 2016-05-11 宁波格莱美厨具有限公司 High-temperature-resistant abrasion-resistant non-stick pan coating, preparation method and non-stick pan with same
CN105734538A (en) * 2016-04-29 2016-07-06 罗林 Chemical nickel-plating solution and nickel-plating process

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1105397A (en) * 1994-01-13 1995-07-19 鎌仓国年 Plating method combined unelectrolysis and electric plating
CN1301881A (en) * 1999-12-29 2001-07-04 上海雅驰科技发展有限公司 Chemical nickel-plating solution and its preparation and using method
CN1752284A (en) * 2004-09-24 2006-03-29 桂林工学院 Polymer Powder Electroless Nickel Plating Formula and Process
CN101962760A (en) * 2010-10-20 2011-02-02 北京科技大学 Method for performing electroless nickel plating on surface of aluminum nitride ceramic
CN102168261A (en) * 2011-03-21 2011-08-31 山东建筑大学 Low-temperature chemical Ni-Cu-P plating solution and chemical Ni-Cu-P plating method applying the solution
CN103484839A (en) * 2013-10-10 2014-01-01 江门市九星科技材料有限公司 Metal surface treatment reagent for cyanide-free chemical plating or cyanide-free electroplating, and metal surface treatment method
CN105567066A (en) * 2016-02-04 2016-05-11 宁波格莱美厨具有限公司 High-temperature-resistant abrasion-resistant non-stick pan coating, preparation method and non-stick pan with same
CN105734538A (en) * 2016-04-29 2016-07-06 罗林 Chemical nickel-plating solution and nickel-plating process

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
潘卫东等: ""次亚磷酸钠作为还原剂的化学镀镍"", 《沈阳工业大学学报》 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113151811A (en) * 2021-04-13 2021-07-23 赤壁市聚茂新材料科技有限公司 Non-palladium activated nickel plating solution and nickel plating method

Similar Documents

Publication Publication Date Title
CN101319318B (en) Electroless gold plating bath, electroless gold plating method, and electronic component
KR101930585B1 (en) Plating bath for electroless deposition of nickel layers
CN101665962B (en) Alkaline non-cyanide plating solution for copper-plating used on iron and steel base and preparation method thereof
CN1924091B (en) Aqueous solution for surface treatment of tin films and method for preventing discoloration of a tin film surface
TWI457462B (en) Electroless gold plating bath, electroless gold plating method and electronic parts
CN101314848A (en) A kind of ammonia-free electroless nickel plating bath
CN101260549B (en) Non-preplating type non-cyanide silver-plating electroplate liquid
CN102248159A (en) Preparation method of silver-coated aluminum powder
CN112593220B (en) Cyanide-free chemical gold-deposition solution suitable for semiconductor and display panel
CN101838828A (en) Cyanogen-less gold plating solution
KR100994579B1 (en) Electroless Pure Palladium Plating Solution
US6776828B2 (en) Plating composition
CN107119267A (en) Surface of ceramic body chemical solution nickel plating process
CN101092724A (en) Non-cyanogen type electroplating solution for plating silver
JPH02305971A (en) Nonelectrolytic copper plating solution without containing formaldehyde
CN101634021B (en) Electroless gold plating solution
JP4105205B2 (en) Electroless gold plating solution
CN102560451B (en) Chemical nano-silver plating solution and preparation method thereof, and silver plating method for copper part
CN207121638U (en) Surface of ceramic body chemical solution ni plating apparatus
CN100510174C (en) Electroless gold plating solution
CN118541509A (en) Composition for depositing palladium coating on activated copper coated substrate
CN100509215C (en) Black phosphate coating treatment method of powder melallugical workpiece
CN108754467B (en) Ruthenium-palladium alloy electroless plating solution and plating method and application thereof
CN109355644B (en) Plating solution of nickel-iron-phosphorus alloy plating layer and preparation method and plating method thereof
JPH02159383A (en) Electroless gold plating

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right
TA01 Transfer of patent application right

Effective date of registration: 20190604

Address after: 223001 No. 88 Shanyang Avenue, Huai'an District, Huai'an City, Jiangsu Province

Applicant after: Jiequn Electronic Technology (Huaian) Co., Ltd.

Address before: 215333 No. 288, Huan Lou Road, Kunshan Development Zone, Suzhou, Jiangsu.

Applicant before: Kunshan Fu Shi Electronic Materials Industry Co., Ltd.

RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20170901