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CN107112221A - Dicing tape - Google Patents

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Publication number
CN107112221A
CN107112221A CN201680004665.7A CN201680004665A CN107112221A CN 107112221 A CN107112221 A CN 107112221A CN 201680004665 A CN201680004665 A CN 201680004665A CN 107112221 A CN107112221 A CN 107112221A
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mass
dicing tape
meth
parts
acrylate
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CN107112221B (en
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津久井友也
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Denka Co Ltd
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Denki Kagaku Kogyo KK
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J175/00Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
    • C09J175/04Polyurethanes
    • C09J175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/50Tape automated bonding [TAB] connectors, i.e. film carriers; Manufacturing methods related thereto
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dicing (AREA)
  • Adhesive Tapes (AREA)

Abstract

本发明提供一种即使是小型、薄型的电子部件也能够抑制切割工序中的芯片飞散和崩裂,能够使拾取容易且不易产生残胶的切割胶带。根据本发明,提供一种切割胶带,其是在基材膜上层叠由粘合剂组合物构成的粘合剂层而形成的,其特征在于,上述粘合剂组合物含有(甲基)丙烯酸酯共聚物100质量份、光聚合性化合物5~250质量份、固化剂0.1~20质量份和光聚合引发剂0.1~20质量份,上述(甲基)丙烯酸酯共聚物含有(甲基)丙烯酸甲酯单元35~85质量%、(甲基)丙烯酸2-乙基己酯单元10~60质量%、具有羧基的单体单元0.5~10质量%以及具有羟基的单体单元を0.05~5质量%,上述光聚合性化合物是重均分子量为4000~8000,且不饱和双键官能团数为10~15的聚氨酯丙烯酸酯低聚物,上述粘合剂层的厚度为3~7μm。The present invention provides a dicing tape capable of suppressing chip flying and chipping during a dicing process even for small and thin electronic components, enabling easy pickup and less generation of adhesive residue. According to the present invention, there is provided a dicing tape in which an adhesive layer composed of an adhesive composition is laminated on a base film, wherein the adhesive composition contains (meth)acrylic acid 100 parts by mass of an ester copolymer, 5 to 250 parts by mass of a photopolymerizable compound, 0.1 to 20 parts by mass of a curing agent, and 0.1 to 20 parts by mass of a photopolymerization initiator, the (meth)acrylate copolymer containing methyl (meth)acrylate 35 to 85% by mass of ester units, 10 to 60% by mass of 2-ethylhexyl (meth)acrylate units, 0.5 to 10% by mass of monomer units having carboxyl groups, and 0.05 to 5% by mass of monomer units having hydroxyl groups , the photopolymerizable compound is a urethane acrylate oligomer with a weight average molecular weight of 4000-8000 and an unsaturated double bond functional group number of 10-15, and the thickness of the adhesive layer is 3-7 μm.

Description

切割胶带cutting tape

【技术领域】【Technical field】

本发明涉及电子部件的制造工序中使用的切割胶带。This invention relates to the dicing tape used in the manufacturing process of an electronic component.

【背景技术】【Background technique】

半导体晶片或基板在贴合切割胶带后将经历分割(切割)成元件小片、切割胶带的延伸(扩展)、将元件小片从切割胶带剥离(拾取,即pick up)等各工序。对于这些工序中使用的切割胶带,期望对切割工序中形成的元件小片(芯片)具有充分的粘合力,同时在拾取工序时粘合力减小至不产生残胶的程度。After the semiconductor wafer or substrate is bonded with dicing tape, it undergoes various processes such as division (dicing) into component pieces, extension (expansion) of the dicing tape, and peeling (pick up) of component pieces from the dicing tape. It is desired that the dicing tape used in these processes has sufficient adhesive force to the component chips (chips) formed in the dicing process, and at the same time reduce the adhesive force to such an extent that no adhesive residue occurs in the pick-up process.

作为切割胶带,有如下的切割胶带:在对紫外线和/或电子束等活性光线具有透射性的基材膜上涂布有由紫外线等引起聚合固化反应的粘合剂层。该切割胶带采取如下方法:在切割工序后对粘合剂层照射紫外线等使粘合剂层聚合固化而使粘合力降低后,拾取分割成的芯片。As a dicing tape, there is a dicing tape in which an adhesive layer that is polymerized and cured by ultraviolet rays or the like is coated on a base film that is transparent to active rays such as ultraviolet rays and/or electron beams. In this dicing tape, after the dicing process, the adhesive layer is irradiated with ultraviolet light or the like to polymerize and cure the adhesive layer to reduce the adhesive force, and then the divided chips are picked up.

作为这种切割胶带,专利文献1和专利文献2中公开了一种切割胶带,其在基材膜面上涂布了含有例如因活性光线而能够三维网状化的、分子内具有光聚合性不饱和双键的化合物(多官能性低聚物)而形成的粘合剂。As such a dicing tape, Patent Document 1 and Patent Document 2 disclose a dicing tape in which a film containing, for example, a three-dimensionally reticulated, photopolymerizable polymer in the molecule is coated on the substrate film surface. Adhesives made of compounds with unsaturated double bonds (polyfunctional oligomers).

【现有技术文献】[Prior Art Literature]

【专利文献】【Patent Literature】

【专利文献1】日本特开2006-049509号公报[Patent Document 1] Japanese Unexamined Patent Publication No. 2006-049509

【专利文献2】日本特开2007-246633号公报[Patent Document 2] Japanese Unexamined Patent Publication No. 2007-246633

【发明内容】【Content of invention】

【发明要解决的课题】【Problems to be solved by the invention】

近年来,随着电子部件的小型化、薄型化,有时在半导体晶片或基板的切割工序中容易发生芯片飞散、崩裂(芯片缺损),成为成品率降低的主要原因。In recent years, along with miniaturization and thinning of electronic components, chip flying and chipping (chip chipping) are likely to occur during the dicing process of semiconductor wafers or substrates, which may become a factor of yield reduction.

因此,本发明的主要目的是提供一种切割胶带,该切割胶带,即使是小型、薄型的电子部件,也能够抑制切割工序中的芯片飞散和崩裂,容易拾取,不易产生残胶。Therefore, the main object of the present invention is to provide a dicing tape that can suppress chip flying and chipping during the dicing process even for small and thin electronic components, is easy to pick up, and does not easily generate adhesive residue.

【为解决课题的技术手段】【Technical means to solve the problem】

根据本发明,提供一种切割胶带,其是在基材膜上层叠由粘合剂组合物构成的粘合剂层而形成的,其特征在于,上述粘合剂组合物含有(甲基)丙烯酸酯共聚物100质量份、光聚合性化合物5~250质量份、固化剂0.1~20质量份、以及光聚合引发剂0.1~20质量份,上述(甲基)丙烯酸酯共聚物含有(甲基)丙烯酸甲酯单元35~85质量%、(甲基)丙烯酸2-乙基己酯单元10~60质量%、具有羧基的单体单元0.5~10质量%、以及具有羟基的单体单元0.05~5质量%,上述光聚合性化合物是重均分子量为4000~8000且不饱和双键官能团数为10~15的聚氨酯丙烯酸酯低聚物,上述粘合剂层的厚度为3~7μm。According to the present invention, there is provided a dicing tape in which an adhesive layer composed of an adhesive composition is laminated on a base film, wherein the adhesive composition contains (meth)acrylic acid 100 parts by mass of an ester copolymer, 5 to 250 parts by mass of a photopolymerizable compound, 0.1 to 20 parts by mass of a curing agent, and 0.1 to 20 parts by mass of a photopolymerization initiator, the (meth)acrylate copolymer containing (meth) 35 to 85 mass % of methyl acrylate units, 10 to 60 mass % of 2-ethylhexyl (meth)acrylate units, 0.5 to 10 mass % of monomer units having carboxyl groups, and 0.05 to 5 mass % of monomer units having hydroxyl groups % by mass, the photopolymerizable compound is a urethane acrylate oligomer with a weight average molecular weight of 4000-8000 and an unsaturated double bond functional group number of 10-15, and the thickness of the adhesive layer is 3-7 μm.

一般而言,若减小粘合剂层的厚度,则不易发生崩裂,但粘合力变小而容易发生芯片飞散。另外,若为了抑制芯片飞散的发生而调整粘合剂的组成,则容易产生如下问题:容易发生崩裂,或者拾取性变差,或者容易发生残胶。因此,以往很难在有效抑制崩裂、芯片飞散和残胶的同时使拾取性良好。In general, when the thickness of the adhesive layer is reduced, cracking is less likely to occur, but the adhesive force becomes smaller and chip flying tends to occur. In addition, if the composition of the adhesive is adjusted in order to suppress the occurrence of chip fly, problems such as easy occurrence of cracking, deterioration of pick-up performance, or occurrence of adhesive residue tend to occur. Therefore, it has been difficult to achieve good pick-up performance while effectively suppressing chipping, chip flying, and adhesive residue.

本发明人为了得到这些方面均优异的切割胶带而进行了深入研究,结果发现,在使用特定组成的粘合剂来形成厚度3~7μm的粘合剂层的情况下,能够在有效抑制崩裂、芯片飞散和残胶的同时使拾取性良好,从而完成了本发明。The inventors of the present invention conducted intensive studies to obtain a dicing tape excellent in these aspects, and as a result, found that when an adhesive layer having a thickness of 3 to 7 μm is formed using an adhesive of a specific composition, cracking can be effectively suppressed, The present invention has been accomplished by improving the pick-up performance while chip flying and adhesive residue are combined.

优选特征在于,上述固化剂是多官能异氰酸脂固化剂或多官能环氧固化剂。It is preferably characterized in that the above-mentioned curing agent is a polyfunctional isocyanate curing agent or a polyfunctional epoxy curing agent.

优选特征在于,上述切割胶带的依据JISZ0237测得的对硅晶片的镜面的粘合力为5.0N/20mm以上。Preferably, the dicing tape has an adhesive force to a mirror surface of a silicon wafer measured in accordance with JIS Z0237 of 5.0 N/20 mm or more.

根据本发明的另一观点,提供一种电子部件的制造方法,该方法具备如下工序:(a)贴附工序,在半导体晶片或基板和环形框贴上附切割胶带;(b)切割工序,切割上述半导体晶片或基板而形成半导体芯片或半导体部件;(c)光照射工序对上述切割胶带照射活性光线;(d)扩展工序,为了扩大上述半导体芯片或半导体部件之间的间隔,对上述切割胶带进行拉伸;以及(e)拾取工序,从上述切割胶带拾取半导体芯片或半导体部件,上述切割胶带是上述记载的切割胶带。According to another aspect of the present invention, there is provided a method of manufacturing an electronic component, the method having the following steps: (a) attaching step, attaching a dicing tape to a semiconductor wafer or a substrate and a ring frame; (b) cutting step, dicing the above-mentioned semiconductor wafer or substrate to form semiconductor chips or semiconductor components; (c) a light irradiation process irradiating active light rays to the above-mentioned dicing tape; (d) an expanding process, in order to expand the interval between the above-mentioned semiconductor chips or semiconductor components, The tape is stretched; and (e) a pick-up step of picking up a semiconductor chip or a semiconductor component from the above-mentioned dicing tape, which is the above-mentioned dicing tape.

【发明效果】【Invention effect】

根据本发明,可提供一种切割胶带:即使是小型、薄型的电子部件,也能够抑制切割工序中的芯片飞散和崩裂,容易拾取(pick up),不易产生残胶。According to the present invention, it is possible to provide a dicing tape that can suppress chip flying and chipping during a dicing process, is easy to pick up, and hardly generates adhesive residue, even for small and thin electronic components.

【具体实施方式】【detailed description】

以下,对用于实施本发明的优选方式进行说明。应予说明,以下说明的实施方式表示本发明的代表实施方式的一个例子,本发明的范围不会因此而被过窄地解释。Hereinafter, preferred modes for carrying out the present invention will be described. In addition, the embodiment described below is an example of typical embodiment of this invention, and the scope of this invention should not be interpreted too narrowly accordingly.

<粘合剂组合物><Adhesive composition>

本发明的切割胶带的粘合剂层的形成所使用的粘合剂组合物含有(甲基)丙烯酸酯共聚物100质量份、光聚合性化合物5~250质量份、固化剂0.1~20质量份、以及光聚合引发剂0.1~20质量份。The adhesive composition used for forming the adhesive layer of the dicing tape of the present invention contains 100 parts by mass of a (meth)acrylate copolymer, 5 to 250 parts by mass of a photopolymerizable compound, and 0.1 to 20 parts by mass of a curing agent. , and 0.1 to 20 parts by mass of a photopolymerization initiator.

((甲基)丙烯酸酯共聚物)((meth)acrylate copolymer)

(甲基)丙烯酸酯共聚物含有:(甲基)丙烯酸甲酯单元35~85质量%(优选为45~75质量%,进一步优选为50~70质量%,进一步优选为55~65质量%)、(甲基)丙烯酸2-乙基己酯单元10~60质量%(优选为20~50质量%,进一步优选为25~45质量%,进一步优选为30~40质量%)、具有羧基的单体单元0.5~10质量%(优选为2~7质量%,进一步优选为3~6质量%,进一步优选为4~5质量%)、具有羟基的单体单元0.05~5质量%(优选为0.1~3质量%,进一步优选为0.2~2质量%,进一步优选为0.3~1质量%,进一步优选为0.4~0.7质量%)。通过使(甲基)丙烯酸酯共聚物由这样的单体单元构成,即使粘合剂层的厚度较小为3~7μm,也能够得到粘合力足够高的切割胶带。应予说明,对于切割胶带的粘合力,优选依据JIS Z 0237测得的、对硅晶片的镜面的粘合力为5.0N/20mm以上。The (meth)acrylate copolymer contains: 35 to 85% by mass (preferably 45 to 75% by mass, more preferably 50 to 70% by mass, still more preferably 55 to 65% by mass) of methyl (meth)acrylate units) 10 to 60% by mass (preferably 20 to 50% by mass, more preferably 25 to 45% by mass, still more preferably 30 to 40% by mass) of 2-ethylhexyl (meth)acrylate units, units having carboxyl groups 0.5 to 10% by mass (preferably 2 to 7% by mass, more preferably 3 to 6% by mass, further preferably 4 to 5% by mass) of monomeric units, 0.05 to 5% by mass (preferably 0.1% by mass) of monomeric units having hydroxyl groups to 3% by mass, more preferably 0.2 to 2% by mass, still more preferably 0.3 to 1% by mass, still more preferably 0.4 to 0.7% by mass). By making the (meth)acrylate copolymer consist of such monomer units, even if the thickness of the pressure-sensitive adhesive layer is as small as 3 to 7 μm, a dicing tape having sufficiently high adhesive force can be obtained. In addition, as for the adhesive force of a dicing tape, it is preferable that the adhesive force to the mirror surface of a silicon wafer measured based on JIS Z 0237 is 5.0 N/20mm or more.

作为具有羧基的单体,例如可举出(甲基)丙烯酸、巴豆酸、马来酸、衣康酸、富马酸、丙烯酰胺N-甘醇酸、以及肉桂酸等,优选(甲基)丙烯酸。Examples of monomers having a carboxyl group include (meth)acrylic acid, crotonic acid, maleic acid, itaconic acid, fumaric acid, acrylamide N-glycolic acid, and cinnamic acid, among which (methyl) acrylic acid.

作为具有含羟基官能团的单体,例如有(甲基)丙烯酸2-羟基乙酯、(甲基)丙烯酸2-羟基丙酯、以及(甲基)丙烯酸2-羟基丁酯,优选(甲基)丙烯酸2-羟基乙酯。Examples of monomers with hydroxyl-containing functional groups include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 2-hydroxybutyl (meth)acrylate, preferably (meth) 2-Hydroxyethyl acrylate.

(光聚合性化合物)(photopolymerizable compound)

光聚合性化合物的混合量相对于(甲基)丙烯酸酯共聚物100质量份为5~250质量份,优选为40~200质量份。若减少光聚合性化合物的混合量,则照射紫外线等活性光线后的切割胶带的剥离性降低,容易产生半导体芯片的拾取不良。另一方面,若增加光聚合性化合物的混合量,则粘合力会因光照射工序而过度降低,在拾取工序中产生芯片松动,成为生产率降低的主要原因。The compounding quantity of a photopolymerizable compound is 5-250 mass parts with respect to 100 mass parts of (meth)acrylate copolymers, Preferably it is 40-200 mass parts. When the compounding quantity of a photopolymerizable compound is reduced, the peelability of the dicing tape after irradiating active light rays, such as an ultraviolet-ray, will fall, and the pick-up defect of a semiconductor chip will become easy to generate|occur|produce. On the other hand, if the compounding amount of the photopolymerizable compound is increased, the adhesive force will be excessively reduced by the light irradiation process, chip looseness will occur in the pick-up process, and this will become a factor of decrease in productivity.

本发明中可利用的光聚合性化合物是重均分子量为4000~8000且不饱和双键官能团数为10~15的聚氨酯丙烯酸酯低聚物。若重均分子量小,则粘合剂边的柔软,因此容易发生崩裂,若重均分子量大,则与被粘物的密合性降低,容易发生芯片飞散。若不饱和双键官能团数少,则照射紫外线等后的粘合剂的固化性降低,容易发生拾取不良,若不饱和双键官能团数多,则照射紫外线等后的粘合剂的固化过度,产生芯片松动。另外,在使用聚氨酯丙烯酸酯低聚物的情况下,由于与基材膜的密合性和柔软性优异,所以有在拾取时不易产生残胶的优点。The photopolymerizable compound usable in the present invention is a urethane acrylate oligomer having a weight average molecular weight of 4,000 to 8,000 and 10 to 15 unsaturated double bond functional groups. If the weight-average molecular weight is small, the side of the adhesive is soft, so chipping is likely to occur, and when the weight-average molecular weight is large, the adhesiveness with the adherend is reduced, and chip flying is likely to occur. If the number of unsaturated double bond functional groups is small, the curability of the adhesive after irradiation with ultraviolet light or the like is reduced, and pick-up failures are likely to occur. If the number of unsaturated double bond functional groups is large, the curing of the adhesive after irradiation with ultraviolet light, etc. Chip loosening occurs. Moreover, when using a urethane acrylate oligomer, since it has excellent adhesiveness with a base film, and flexibility, there exists an advantage that adhesive residue does not generate|occur|produce easily at the time of picking up.

聚氨酯丙烯酸酯低聚物可通过使具有羟基的(甲基)丙烯酸酯与聚酯型或聚醚型等的末端异氰酸脂聚氨酯预聚物反应而得到,该末端异氰酸脂聚氨酯预聚物是使多元醇化合物与多元异氰酸脂化合物反应而得到的。The urethane acrylate oligomer can be obtained by reacting a (meth)acrylate having a hydroxyl group with a terminal isocyanate urethane prepolymer such as a polyester type or a polyether type, and the terminal isocyanate urethane prepolymer The product is obtained by reacting a polyol compound and a polyisocyanate compound.

作为多元醇化合物,例如使用乙二醇、丙二醇、丁二醇、己二醇、新戊二醇、二乙二醇、三乙二醇、戊二醇、甘油、三羟甲基丙烷、三羟甲基乙烷、季戊四醇等。作为多元异氰酸脂化合物,例如使用2,4-甲苯二异氰酸脂、2,6-甲苯二异氰酸脂、1,3-二甲苯二异氰酸脂、1,4-二甲苯二异氰酸脂、二苯基甲烷4,4-二异氰酸脂、三甲基六亚甲基二异氰酸脂、六亚甲基二异氰酸脂、异氟尔酮二异氰酸脂等。另外,作为具有羟基的(甲基)丙烯酸酯,例如可举出(甲基)丙烯酸2-羟基乙酯、(甲基)丙烯酸2-羟基丙酯、聚乙二醇(甲基)丙烯酸酯、季戊四醇三丙烯酸酯、缩水甘油二(甲基)丙烯酸酯、二季戊四醇单羟基五丙烯酸酯等。As the polyol compound, for example, ethylene glycol, propylene glycol, butylene glycol, hexanediol, neopentyl glycol, diethylene glycol, triethylene glycol, pentylene glycol, glycerin, trimethylolpropane, trihydroxy Methylethane, pentaerythritol, etc. As polyvalent isocyanate compounds, for example, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 1,3-xylene diisocyanate, 1,4-xylene diisocyanate, Diisocyanate, diphenylmethane 4,4-diisocyanate, trimethylhexamethylene diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate Sour fat, etc. In addition, examples of (meth)acrylates having a hydroxyl group include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, polyethylene glycol (meth)acrylate, Pentaerythritol triacrylate, glycidyl di(meth)acrylate, dipentaerythritol monohydroxypentaacrylate, and the like.

(固化剂)(Hardener)

固化剂的混合量相对于(甲基)丙烯酸酯共聚物100质量份为0.1质量份~20质量份,优选为1质量份~10质量份。若减少固化剂的混合量,则容易产生残胶。另一方面,若增加固化剂的混合量,则发生粘合力的不足或芯片松动,成为生产率降低的主要原因。The compounding quantity of a hardening|curing agent is 0.1-20 mass parts with respect to 100 mass parts of (meth)acrylate copolymers, Preferably it is 1-10 mass parts. If the mixing amount of curing agent is reduced, adhesive residue will easily occur. On the other hand, if the mixing amount of the curing agent is increased, insufficient adhesive force or chip loosening will occur, which will be a factor of lowering productivity.

作为固化剂,有多官能异氰酸脂固化剂、多官能环氧固化剂、氮丙啶化合物、三聚氰胺化合物等,优选多官能异氰酸脂固化剂、多官能环氧固化剂。通过使用多官能环氧固化剂或多官能异氰酸脂固化剂作为上述固化剂中的至少一部分,能够选择性地使具有羧基的官能团含有单体反应而使其减少,因而能够调节固化后的具有含羧基官能团的单体量。As the curing agent, there are polyfunctional isocyanate curing agents, polyfunctional epoxy curing agents, aziridine compounds, melamine compounds, etc., preferably polyfunctional isocyanate curing agents and polyfunctional epoxy curing agents. By using a polyfunctional epoxy curing agent or a polyfunctional isocyanate curing agent as at least a part of the above-mentioned curing agents, it is possible to selectively react the functional group-containing monomers having carboxyl groups to reduce them, thereby adjusting the cured Amount of monomers having carboxyl-containing functional groups.

作为多官能异氰酸脂固化剂,例如有芳香族聚异氰酸脂固化剂、脂肪族聚异氰酸脂固化剂、脂环族聚异氰酸脂固化剂。Examples of polyfunctional isocyanate curing agents include aromatic polyisocyanate curing agents, aliphatic polyisocyanate curing agents, and alicyclic polyisocyanate curing agents.

芳香族聚异氰酸脂没有特别限定,例如可举出1,3-苯二异氰酸脂、4,4'-二苯基二异氰酸脂、1,4-苯二异氰酸脂、4,4'-二苯基甲烷二异氰酸脂、2,4-甲苯二异氰酸脂、2,6-甲苯二异氰酸脂、4,4'-甲苯胺二异氰酸脂、2,4,6-三异氰酸脂甲苯、1,3,5-三异氰酸脂苯、联茴香胺二异氰酸脂、4,4'-二苯基醚二异氰酸脂、4,4',4”-三苯基甲烷三异氰酸脂、ω,ω'-二异氰酸脂-1,3-二甲基苯、ω,ω'-二异氰酸脂-1,4-二甲基苯、ω,ω'-二异氰酸脂-1,4-二乙基苯、1,4-四甲基亚二甲苯基二异氰酸脂、以及1,3-四甲基亚二甲苯基二异氰酸脂等。The aromatic polyisocyanate is not particularly limited, and examples include 1,3-phenylene diisocyanate, 4,4'-diphenylene diisocyanate, 1,4-phenylene diisocyanate , 4,4'-diphenylmethane diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 4,4'-toluene diisocyanate , 2,4,6-triisocyanate toluene, 1,3,5-triisocyanate benzene, dianisidine diisocyanate, 4,4'-diphenyl ether diisocyanate , 4,4',4"-triphenylmethane triisocyanate, ω,ω'-diisocyanate-1,3-dimethylbenzene, ω,ω'-diisocyanate- 1,4-Dimethylbenzene, ω,ω'-diisocyanate-1,4-diethylbenzene, 1,4-tetramethylxylylene diisocyanate, and 1,3 - Tetramethylxylylene diisocyanate, etc.

脂肪族聚异氰酸脂没有特别限定,例如可举出三亚甲基二异氰酸脂、四亚甲基二异氰酸脂、六亚甲基二异氰酸脂、五亚甲基二异氰酸脂、1,2-亚丙基二异氰酸脂、2,3-亚丁基二异氰酸脂、1,3-亚丁基二异氰酸脂、十二亚甲基二异氰酸脂、以及2,4,4-三甲基六亚甲基二异氰酸脂等。The aliphatic polyisocyanate is not particularly limited, and examples thereof include trimethylene diisocyanate, tetramethylene diisocyanate, hexamethylene diisocyanate, pentamethylene diisocyanate, and pentamethylene diisocyanate. Cyanate, 1,2-propylene diisocyanate, 2,3-butylene diisocyanate, 1,3-butylene diisocyanate, dodecamethylene diisocyanate Grease, and 2,4,4-trimethylhexamethylene diisocyanate, etc.

脂环族聚异氰酸脂没有特别限定,例如可举出3-异氰酸脂甲基-3,5,5-三甲基环己基异氰酸脂、1,3-环戊烷二异氰酸脂、1,3-环己烷二异氰酸脂、1,4-环己烷二异氰酸脂、甲基-2,4-环己烷二异氰酸脂、甲基-2,6-环己烷二异氰酸脂、4,4'-亚甲基双(环己基异氰酸脂)、1,4-双(异氰酸脂甲基)环己烷、以及1,4-双(异氰酸脂甲基)环己烷。The alicyclic polyisocyanate is not particularly limited, and examples thereof include 3-isocyanatomethyl-3,5,5-trimethylcyclohexyl isocyanate, 1,3-cyclopentane diisocyanate Cyanate, 1,3-cyclohexane diisocyanate, 1,4-cyclohexane diisocyanate, methyl-2,4-cyclohexane diisocyanate, methyl-2 ,6-cyclohexane diisocyanate, 4,4'-methylene bis(cyclohexyl isocyanate), 1,4-bis(isocyanatomethyl)cyclohexane, and 1, 4-bis(isocyanatomethyl)cyclohexane.

聚异氰酸脂中,优选使用1,3-苯二异氰酸脂、4,4'-二苯基二异氰酸脂、1,4-苯二异氰酸脂、4,4'-二苯基甲烷二异氰酸脂、2,4-甲苯二异氰酸脂、2,6-甲苯二异氰酸脂、4,4'-甲苯胺二异氰酸脂、六亚甲基二异氰酸脂。Among polyisocyanates, 1,3-phenylene diisocyanate, 4,4'-diphenyl diisocyanate, 1,4-phenylene diisocyanate, 4,4'- Diphenylmethane diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 4,4'-toluene diisocyanate, hexamethylene diisocyanate isocyanate.

多官能环氧固化剂主要是指具有2个以上环氧基、1个以上叔氮原子的化合物,可举出N·N-缩水甘油基苯胺、N·N-缩水甘油基甲苯胺、m-N·N-缩水甘油基氨基苯基缩水甘油醚、p-N·N-缩水甘油基氨基苯基缩水甘油醚、三缩水甘油基异氰脲酸酯、N·N·N'·N'-四缩水甘油基二氨基二苯基甲烷、N·N·N'·N'-四缩水甘油基-m-亚二甲苯基二胺、N·N·N'·N'·N”-五缩水甘油基二亚乙基三胺等。Multifunctional epoxy curing agents mainly refer to compounds with more than 2 epoxy groups and more than 1 tertiary nitrogen atom, such as N N-glycidyl aniline, N N-glycidyl toluidine, m- N·N-glycidylaminophenyl glycidyl ether, p-N·N-glycidylaminophenyl glycidyl ether, triglycidyl isocyanurate, N·N·N'·N'- Tetraglycidyl diaminodiphenylmethane, N·N·N'·N'-tetraglycidyl-m-xylylenediamine, N·N·N'·N'·N”-pentahydric Glyceryl diethylene triamine, etc.

(光聚合引发剂)(photopolymerization initiator)

光聚合引发剂的混合量相对于(甲基)丙烯酸酯聚合物100质量份为0.1质量份~20质量份,优选为1质量份~10质量份。若混合量过少,则光照射后的从切割胶带的剥离性降低,容易发生半导体芯片的拾取不良。另一方面,若混合量过多,则光聚合引发剂会向粘合剂表面渗出,成为污染的原因。The compounding quantity of a photoinitiator is 0.1-20 mass parts with respect to 100 mass parts of (meth)acrylate polymers, Preferably it is 1-10 mass parts. When the mixing amount is too small, the peelability from the dicing tape after light irradiation will fall, and the pick-up defect of a semiconductor chip will become easy to generate|occur|produce. On the other hand, if the blending amount is too large, the photopolymerization initiator will ooze out on the surface of the adhesive, causing contamination.

作为光聚合引发剂,使用苯偶姻,苯偶姻烷基醚类、苯乙酮类、蒽醌类、噻吨酮类、缩酮类、二苯甲酮类或呫吨酮类等。As the photopolymerization initiator, benzoin, benzoin alkyl ethers, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones, xanthones, or the like are used.

作为苯偶姻,例如有苯偶姻、苯偶姻甲醚、苯偶姻乙醚、苯偶姻丙醚等。Examples of benzoin include benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin propyl ether.

作为苯乙酮类,例如有苯偶姻烷基醚类、苯乙酮、2,2-二甲氧基-2-苯乙酮、2,2―二乙氧基-2-苯乙酮、1,1-二氯苯乙酮等。Examples of acetophenones include benzoin alkyl ethers, acetophenone, 2,2-dimethoxy-2-acetophenone, 2,2-diethoxy-2-acetophenone, 1,1-dichloroacetophenone, etc.

作为蒽醌类,有2-甲基蒽醌、2-乙基蒽醌、2-叔丁基蒽醌、1-氯蒽醌等。Examples of the anthraquinones include 2-methylanthraquinone, 2-ethylanthraquinone, 2-tert-butylanthraquinone, 1-chloroanthraquinone, and the like.

作为噻吨酮类,例如有2,4-二甲基噻吨酮、2,4-二异丙基噻吨酮、2-氯噻吨酮、2,4-二异丙基噻吨酮等。Examples of thioxanthones include 2,4-dimethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone, 2,4-diisopropylthioxanthone, etc. .

作为缩酮类,例如有苯乙酮二甲基缩酮、苄基二缩酮、苄基二苯基硫醚、四甲基秋兰姆单硫化物、偶氮二异丁腈、联苄、双乙酰、β-氯蒽醌等。Examples of ketals include acetophenone dimethyl ketal, benzyl diketal, benzyl diphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, bibenzyl, Diacetyl, β-chloroanthraquinone, etc.

光聚合引发剂中可以根据需要组合1种或2种以上的以往公知的光聚合促进剂来并用。作为光聚合促进剂,可使用安息香酸系、叔胺等。作为叔胺,可举出三乙胺、四乙基五胺、二甲基氨基醚等。The photopolymerization initiator can be used in combination of 1 type or 2 or more types of conventionally well-known photopolymerization accelerators as needed. As a photopolymerization accelerator, a benzoic acid system, a tertiary amine, etc. can be used. Triethylamine, tetraethylpentamine, dimethylaminoether, etc. are mentioned as a tertiary amine.

(粘合赋予树脂)(adhesion imparting resin)

可以在粘合剂组合物中配合粘合赋予树脂。作为粘合赋予树脂,是将萜烯酚树脂完全或部分氢化而成的萜烯酚树脂。An adhesion-imparting resin may be blended in the adhesive composition. The tackifier resin is a terpene phenol resin obtained by completely or partially hydrogenating a terpene phenol resin.

萜烯酚树脂例如可通过使萜烯化合物1摩尔与酚类0.1~50反应来制造。The terpene phenol resin can be produced by making 1 mol of a terpene compound react with 0.1-50 phenols, for example.

作为萜烯化合物,可举出月桂烯、别罗勒烯、罗勒烯、α-蒎烯、β-蒎烯、双戊烯、柠檬烯、α-水芹烯、α-松油烯、γ-松油烯、异松油烯、1,8-桉叶素、1,4-桉叶素、α-松油醇、β-松油醇、γ-松油醇、莰烯、三环烯、桧烯、对薄荷二烯类、蒈烯类等。这些化合物中,本发明特别优选使用α-蒎烯、β-蒎烯、柠檬烯、月桂烯、别罗勒烯、α-松油烯。Examples of terpene compounds include myrcene, alloocimene, ocimene, α-pinene, β-pinene, dipentene, limonene, α-phellandrene, α-terpinene, and γ-pine oil Terpinene, Terpinene, 1,8-Cineole, 1,4-Cineole, α-Terpineol, β-Terpineol, γ-Terpineol, Camphene, Tricyclene, Sabinene , p-menthadiene, carene, etc. Among these compounds, α-pinene, β-pinene, limonene, myrcene, alloocimene, and α-terpinene are particularly preferably used in the present invention.

作为酚类,可举出苯酚、甲酚、二甲酚、儿茶酚、间苯二酚、对苯二酚、双酚A等,但并不限定于此。Examples of phenols include phenol, cresol, xylenol, catechol, resorcinol, hydroquinone, bisphenol A, and the like, but are not limited thereto.

萜烯酚树脂的酚类的比例为25~50摩尔%左右,但并不限定于此。The ratio of phenols in the terpene phenol resin is about 25 to 50 mol%, but it is not limited thereto.

完全或部分氢化的萜烯酚树脂的羟值优选为50~250。羟值小于50时,与异氰酸脂系固化剂的反应不充分而向粘合剂表面渗出,成为污染的原因,若大于250,则粘度升高,产生与(甲基)丙烯酸酯共聚物等的混合不均,拾取特性不稳定。The hydroxyl value of the fully or partially hydrogenated terpene phenol resin is preferably 50-250. When the hydroxyl value is less than 50, the reaction with the isocyanate-based curing agent is insufficient and oozes out to the surface of the adhesive, causing contamination. If it is greater than 250, the viscosity increases and copolymerization with (meth)acrylate occurs. Inhomogeneous mixing of objects, etc., unstable pickup characteristics.

作为氢化方法,没有特别限定,例如可举出如下方法:使用钯、钌、铑等贵金属或者将它们担载于活性炭、活性氧化铝、硅藻土等载体上而成的物质作为催化剂而进行的方法,氢化率可通过溴值测定、碘值测定等来测定。The hydrogenation method is not particularly limited, and examples include the following method: using as a catalyst a noble metal such as palladium, ruthenium, rhodium, or a carrier such as activated carbon, activated alumina, or diatomaceous earth. Method, the hydrogenation rate can be determined by bromine value measurement, iodine value measurement, etc.

完全或部分氢化的萜烯酚树脂的氢化率优选为30摩尔%以上,更优选为70摩尔%以上。小于30摩尔%时,因活性光线的照射所引起的光聚合性化合物的反应阻碍而导致粘合力无法充分降低,因而拾取性降低。The hydrogenation rate of the fully or partially hydrogenated terpene phenol resin is preferably 30 mol % or more, more preferably 70 mol % or more. When it is less than 30 mol%, since the reaction inhibition of the photopolymerizable compound by irradiation of actinic light rays cannot fully reduce adhesive force, pick-up property will fall.

完全或部分氢化的萜烯酚树脂的配合比优选相对于(甲基)丙烯酸酯共聚物100质量份为0.5质量份~100质量份,更有选为1.0质量份~50质量份。若完全或部分氢化的萜烯酚树脂为0.5质量份以上,则粘合力不会过低,切割时半导体芯片的保持性得到维持,若为100质量份以下,则可抑制拾取不良的发生。The compounding ratio of the fully or partially hydrogenated terpene phenol resin is preferably 0.5 to 100 parts by mass with respect to 100 parts by mass of the (meth)acrylate copolymer, more preferably 1.0 to 50 parts by mass. When the amount of fully or partially hydrogenated terpene phenol resin is 0.5 parts by mass or more, the adhesive force will not be too low, and the holding property of the semiconductor chip during dicing is maintained, and if it is 100 parts by mass or less, the occurrence of pick-up failure can be suppressed.

(添加剂等)(additives, etc.)

粘合剂组合物中例如可以添加软化剂、抗老化剂、填充剂、导电剂、紫外线吸収剂以及光稳定剂等各种添加剂。Various additives such as softeners, anti-aging agents, fillers, conductive agents, ultraviolet absorbers, and light stabilizers can be added to the adhesive composition, for example.

粘合剂层的厚度为3~7μm,优选为4~6μm。若粘合剂层过厚,则容易发生崩裂。另外,若粘合剂层过薄,则粘合力变得过低,有时切割时的芯片保持性降低而引起芯片飞散,或者在环形框与片之间产生剥离性。The thickness of the adhesive layer is 3 to 7 μm, preferably 4 to 6 μm. If the adhesive layer is too thick, it will easily crack. In addition, if the adhesive layer is too thin, the adhesive force will be too low, and the chip holding property at the time of dicing may be lowered to cause chips to fly, or peelability may occur between the ring frame and the sheet.

(基材膜)(substrate film)

作为基材膜的材料,例如可举出用金属离子将如下物质交联而成的离聚物树脂等:聚氯乙烯、聚对苯二甲酸乙二醇酯、乙酸-乙酸乙烯酯共聚物、乙烯-丙烯酸-丙烯酸酯膜、乙烯-丙烯酸乙酯共聚物、聚乙烯、聚丙烯、丙烯系共聚物、乙烯-丙烯酸共聚物、以及乙烯-(甲基)丙烯酸共聚物或乙烯-(甲基)丙烯酸-(甲基)丙烯酸酯共聚物等。基材膜可以是这些树脂的混合物或共聚物,也可以是由这些树脂构成的膜或片的层叠体。As the material of the base film, for example, an ionomer resin obtained by cross-linking the following substances with metal ions, etc.: polyvinyl chloride, polyethylene terephthalate, acetic acid-vinyl acetate copolymer, Ethylene-acrylic acid-acrylate film, ethylene-ethyl acrylate copolymer, polyethylene, polypropylene, propylene-based copolymer, ethylene-acrylic acid copolymer, and ethylene-(meth)acrylic acid copolymer or ethylene-(meth)acrylic acid copolymer Acrylic acid-(meth)acrylate copolymer, etc. The base film may be a mixture or a copolymer of these resins, or may be a laminate of films or sheets made of these resins.

基材膜的材料优选使用离聚物树脂。作为离聚物树脂,若使用将具有乙烯单元、甲基丙烯酸单元和(甲基)丙烯酸烷基酯单元的共聚物用Na+、K+、Zn2+等金属离子交联而成的离聚物树脂,则切削屑抑制效果显著,因而优选使用。As a material of the base film, ionomer resin is preferably used. As the ionomer resin, if a copolymer having ethylene units, methacrylic acid units and alkyl (meth)acrylate units is cross-linked with metal ions such as Na + , K + , Zn 2+ If the material resin is used, the cutting chip suppression effect is remarkable, so it is preferably used.

基材膜可以是由上述材料构成的单层或多层的膜或片,也可以是将由不同材料构成的膜等层叠而成的物质。基材膜的厚度为50~200μm,优选为70~150μm。The base film may be a single-layer or multi-layer film or sheet made of the above materials, or may be a laminate of films made of different materials. The thickness of the base film is 50 to 200 μm, preferably 70 to 150 μm.

优选对基材膜实施抗静电处理。作为抗静电处理,有在基材膜中配合抗静电剂的处理、在基材膜表面涂布抗静电剂的处理、基于电晕放电的处理。It is preferable to apply antistatic treatment to the base film. Examples of the antistatic treatment include a treatment in which an antistatic agent is incorporated into a base film, a treatment in which an antistatic agent is applied to the surface of a base film, and a treatment by corona discharge.

作为抗静电剂,例如可使用季铵盐单体等。作为季铵盐单体,例如可举出(甲基)丙烯酸二甲基氨基乙酯氯化季盐、(甲基)丙烯酸二乙基氨基乙酯氯化季盐、(甲基)丙烯酸甲基乙基氨基乙酯氯化季盐、对二甲基氨基苯乙烯氯化季盐、以及对二乙基氨基苯乙烯氯化季盐。其中,优选甲基丙烯酸二甲基氨基乙酯氯化季盐。As an antistatic agent, a quaternary ammonium salt monomer etc. can be used, for example. Examples of quaternary ammonium salt monomers include (meth)acrylate dimethylaminoethyl chloride quaternary salt, (meth)acrylate diethylaminoethyl chloride quaternary salt, (meth)acrylate methyl Ethylaminoethyl ester quaternary chloride, p-dimethylaminostyrene chlorinated quaternary salt, and p-diethylaminostyrene chlorinated quaternary salt. Among them, dimethylaminoethyl methacrylate chloride quaternary salt is preferred.

滑动剂和抗静电剂的使用方法没有特别限定,例如可以在基材膜的一面涂布粘合剂,在其背面涂布滑动剂和/或抗静电剂,也可以将滑动剂和/或抗静电剂混入基材膜的树脂中进行片化。The usage method of slipping agent and antistatic agent is not particularly limited, for example, adhesive agent can be coated on one side of substrate film, slipping agent and/or antistatic agent can be coated on its back side, also can slip agent and/or antistatic agent The electrostatic agent is mixed into the resin of the base film to form a sheet.

可以在基材膜的一面层叠粘合剂,另一面成为平均表面粗糙度(Ra)为0.3~1.5μm的压纹面。通过在扩展装置的机台侧设置压纹面,在切割后的扩展工序中可使基材膜容易扩张。An adhesive may be laminated on one side of the base film, and the other side may be an embossed surface having an average surface roughness (Ra) of 0.3 to 1.5 μm. By providing an embossed surface on the machine side of the expanding device, the base film can be easily expanded in the expanding step after cutting.

(滑动剂)(slip agent)

为了提高切割后的扩展性,可以对基材膜的粘合剂非接触面施以滑动剂,或者在基材膜中混入滑动剂。In order to improve the spreadability after dicing, a slip agent may be applied to the adhesive non-contact surface of the base film, or a slip agent may be mixed into the base film.

滑动剂只要是使切割胶带与扩展装置的摩擦系数降低的物质就没有特别限定,例如可举出有机硅树脂或者(改性)硅油等有机硅化合物、氟树脂、六方晶氮化硼、炭黑和二硫化钼等。这些摩擦降低剂也可以混合多种成分。为了在洁净室中进行电子部件的制造,优选使用有机硅化合物或氟树脂。有机硅化合物中,尤其是具有有机硅大分子单体单元的共聚物与抗静电层的相溶性良好,可实现抗静电性与扩展性的平衡,因而优选使用。The sliding agent is not particularly limited as long as it is a substance that lowers the coefficient of friction between the dicing tape and the expansion device, and examples thereof include silicone compounds such as silicone resins or (modified) silicone oils, fluororesins, hexagonal boron nitride, and carbon black. and molybdenum disulfide. These friction reducers may also be mixed with various components. For the production of electronic components in a clean room, it is preferable to use a silicone compound or a fluororesin. Among organosilicon compounds, especially copolymers having organosilicon macromonomer units are preferably used because they have good compatibility with the antistatic layer and can achieve a balance between antistatic properties and expansibility.

按顺序对本发明所涉及的电子部件的制造方法的具体工序进行说明。The specific process of the manufacturing method of the electronic component which concerns on this invention is demonstrated sequentially.

(1)贴附工序(1) Attachment process

首先,在贴附工序中,将切割胶带贴附于半导体晶片或基板和环形框。半导体晶片可以是硅晶片和氮化镓晶片、碳化硅晶片、蓝宝石晶片等以往通用的晶片。基板可以是用树脂密封芯片而成的封装基板、LED封装基板、陶瓷基板等通用基板。First, in the attaching process, the dicing tape is attached to the semiconductor wafer or substrate and the ring frame. The semiconductor wafer may be a silicon wafer, a gallium nitride wafer, a silicon carbide wafer, a sapphire wafer, or other conventionally used wafers. The substrate may be a general-purpose substrate such as a package substrate in which chips are sealed with resin, an LED package substrate, or a ceramic substrate.

(2)切割工序(2) Cutting process

切割工序中,切割半导体晶片或基板形成半导体芯片或半导体部件。In the dicing process, a semiconductor wafer or substrate is diced to form semiconductor chips or semiconductor components.

(3)光照射工序(3) Light irradiation process

光照射工序中,对上述切割胶带照射紫外线或电子束等活性光线。活性光线优选从基材膜侧照射。作为紫外线的光源,可使用低压汞灯、高压汞灯、超高压汞灯、金属卤化物灯。另外,也可以使用电子束来代替紫外线,作为电子束光源,可使用α射线、β射线、γ射线。In the photoirradiation step, the dicing tape is irradiated with active rays such as ultraviolet rays or electron beams. Actinic light is preferably irradiated from the base film side. As a light source of ultraviolet light, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, or a metal halide lamp can be used. In addition, electron beams may be used instead of ultraviolet rays, and α-rays, β-rays, and γ-rays may be used as electron beam light sources.

通过光照射,粘合剂层三维网状化而固化,粘合剂层的粘合力降低。此时,如上所述,本发明所涉及的切割胶带即使经加热也不会与半导体晶片或基板过度密合,因此通过紫外线等的照射,可得到足够低的粘接力。Light irradiation causes the adhesive layer to form a three-dimensional network and is cured, reducing the adhesive force of the adhesive layer. At this time, as described above, the dicing tape according to the present invention does not adhere excessively to the semiconductor wafer or the substrate even when heated, and thus sufficiently low adhesive force can be obtained by irradiation of ultraviolet rays or the like.

(4)扩展·拾取工序(4) Expansion and pick-up process

扩展·拾取工序中,为扩大半导体芯片或半导体部件之间的间隔,对切割胶带进行拉伸,并用针销等将芯片或部件向上推。其后,真空夹头或气动夹架等吸引芯片或部件,使其从切割胶带的粘合剂层剥离进行拾取。此时,由于本发明所涉及的切割胶带通过紫外线等的照射可使粘接力充分降低,因此芯片或部件与粘合剂层之间的剥离变得容易,得到良好的拾取性,也不会产生残胶等不良现象。In the expanding/pick-up process, the dicing tape is stretched to expand the space between semiconductor chips or semiconductor parts, and the chips or parts are pushed up with pins, etc. Thereafter, chips or parts are attracted by vacuum chucks or pneumatic chucks, and the chips or parts are picked up by peeling them off the adhesive layer of the dicing tape. At this time, since the adhesive force of the dicing tape according to the present invention can be sufficiently reduced by irradiation of ultraviolet rays or the like, the peeling between the chip or the component and the adhesive layer becomes easy, and good pick-up performance is obtained, and there is no There are adverse phenomena such as residual glue.

<切割胶带的制造><Manufacturing of dicing tape>

作为在基材膜上形成粘合剂层而得到切割胶带的方法,例如有如下方法:使用凹版涂布机、逗点涂布机、棒涂机、刮刀涂布机或辊涂机之类的涂布机将粘合剂直接塗布在基材膜上的方法;或者将粘合剂涂布于剥离膜并使其干燥后与基材膜贴合的方法。也可采用凸板印刷、凹板印刷、平板印刷、柔版印刷、胶版印刷或丝网印刷等将粘合剂印刷在基材膜上。As a method of forming an adhesive layer on a base film to obtain a dicing tape, for example, there is a method of using a gravure coater, a comma coater, a rod coater, a knife coater, or a roll coater. A method in which the adhesive is directly coated on the substrate film by a coating machine; or a method in which the adhesive is applied to a release film and dried and bonded to the substrate film. The adhesive may also be printed on the substrate film using letterpress printing, gravure printing, offset printing, flexographic printing, offset printing, or screen printing, among others.

本发明的切割胶带在电子部件的制造工序即切割工序、背面研磨工序中,优选用于称为工件的电子部件集合体的粘贴用途。The dicing tape of the present invention is preferably used for adhering an assembly of electronic components called a workpiece in a dicing process and a back grinding process in the manufacturing process of electronic components.

【实施例】【Example】

按如下配方制造实施例·比较例所涉及的粘合剂组合物和切割胶带。将主要配合成分及各实验例的结果示于表1~表3。The adhesive compositions and dicing tapes related to Examples and Comparative Examples were produced according to the following formulations. The main compounding components and the result of each experiment example are shown in Table 1-Table 3.

表1~表3中的组成的数值表示质量份。光聚合性化合物、固化剂、光聚合引发剂的数值表示将(甲基)丙烯酸酯共聚物设为100份时的质量份。基材膜、光聚合性化合物、固化剂、光聚合引发剂的详细情况如下所述。The numerical values of the compositions in Tables 1 to 3 represent parts by mass. The numerical value of a photopolymerizable compound, a hardening|curing agent, and a photoinitiator shows the mass part when the (meth)acrylate copolymer was 100 parts. Details of the base film, photopolymerizable compound, curing agent, and photopolymerization initiator are as follows.

应予说明,重均分子量是采用凝胶渗透色谱法(GPC)作为经聚苯乙烯换算的重均分子量测得的值。具体而言如下所述。In addition, the weight average molecular weight is the value measured as the polystyrene conversion weight average molecular weight by gel permeation chromatography (GPC). Specifically, it is as follows.

装置:GPC-8020SEC系统(东曹公司制)Device: GPC-8020SEC system (manufactured by Tosoh Corporation)

住:TSK Guard HZ-L+HZM-N 6.0×150mm×3Housing: TSK Guard HZ-L+HZM-N 6.0×150mm×3

流量:0.5ml/minFlow rate: 0.5ml/min

检测器:RI-8020Detector: RI-8020

浓度:0.2wt/Vol%Concentration: 0.2wt/Vol%

注入量:20μLInjection volume: 20μL

住温度:40℃Living temperature: 40℃

系统温度:40℃System temperature: 40℃

溶剂:THFSolvent: THF

标准曲线:使用标准聚苯乙烯(PL公司制)制作,重均分子量(Mw)用聚苯乙烯换算值表示。Calibration curve: prepared using standard polystyrene (manufactured by PL Co., Ltd.), and the weight-average molecular weight (Mw) is expressed in terms of polystyrene.

<基材膜><Base film>

·树脂膜A:厚度80μm的离聚物树脂制膜,以乙烯-甲基丙烯酸-丙烯酸2-甲基丙酯共聚物的Zn盐为主体。MFR 2.8g/10min(JIS K7210法,210℃),Mitsui DuPontPolychemicals株式会社制(市售品)。· Resin film A: an ionomer resin film having a thickness of 80 μm, mainly composed of Zn salt of an ethylene-methacrylic acid-2-methylpropyl acrylate copolymer. MFR 2.8g/10min (JIS K7210 method, 210 degreeC), the Mitsui DuPont Polychemicals Co., Ltd. make (commercial item).

<光聚合性化合物><Photopolymerizable compound>

·光聚合性化合物A:使六亚甲基二异氰酸脂的异氰酸脂与以二季戊四醇五丙烯酸酯为主成分的含羟基的丙烯酸酯反应而得的化合物,重均分子量为7500,且不饱和双键官能团数为10的聚氨酯丙烯酸酯低聚物(合成品)。Photopolymerizable compound A: a compound obtained by reacting the isocyanate of hexamethylene diisocyanate with the hydroxyl-containing acrylate mainly composed of dipentaerythritol pentaacrylate, the weight average molecular weight is 7500, And urethane acrylate oligomer (synthetic product) with 10 unsaturated double bond functional groups.

·光聚合性化合物B:采用与光聚合性化合物A相同的制法合成的重均分子量为4200、不饱和双键官能团数为10的聚氨酯丙烯酸酯低聚物(合成品)Photopolymerizable compound B: a polyurethane acrylate oligomer (synthetic product) with a weight average molecular weight of 4200 and an unsaturated double bond functional group number of 10 synthesized by the same method as photopolymerizable compound A

·光聚合性化合物C:采用与光聚合性化合物A相同的制法合成的重均分子量为2100、不饱和双键官能团数为10的聚氨酯丙烯酸酯低聚物(合成品)Photopolymerizable compound C: a polyurethane acrylate oligomer (synthetic product) with a weight average molecular weight of 2100 and an unsaturated double bond functional group number of 10 synthesized by the same method as photopolymerizable compound A

·光聚合性化合物D:采用与光聚合性化合物A相同的制法合成的重均分子量为10300、不饱和双键官能团数为10的聚氨酯丙烯酸酯低聚物(合成品)Photopolymerizable compound D: a polyurethane acrylate oligomer (synthetic product) with a weight average molecular weight of 10300 and a number of unsaturated double bond functional groups of 10 synthesized by the same method as photopolymerizable compound A

·光聚合性化合物E:使异氟尔酮二异氰酸脂的三聚体的异氰酸脂与二季戊四醇五丙烯酸酯为主成分的含羟基的丙烯酸酯反应而得到的化合物,重均分子量为4900,且不饱和双键官能团数为15的聚氨酯丙烯酸酯低聚物(合成品)。・Photopolymerizable compound E: a compound obtained by reacting an isophorone diisocyanate trimer isocyanate with a hydroxyl-containing acrylate mainly composed of dipentaerythritol pentaacrylate, weight average molecular weight The polyurethane acrylate oligomer (synthetic product) is 4900 and has 15 unsaturated double bond functional groups.

应予说明,光聚合性化合物采用日本特开昭61-42529号公报等中记载的公知方法制备。In addition, the photopolymerizable compound was prepared by the well-known method described in Unexamined-Japanese-Patent No. 61-42529 etc.,.

<固化剂><curing agent>

·固化剂A:2,4-甲苯二异氰酸脂的三羟甲基丙烷加成物(市售品)・Curing agent A: trimethylolpropane adduct of 2,4-toluene diisocyanate (commercially available)

·固化剂B:六亚甲基二异氰酸脂的三羟甲基丙烷加成物(市售品)· Curing agent B: trimethylolpropane adduct of hexamethylene diisocyanate (commercially available)

·固化剂C:N,N,N',N'-四缩水甘油基间亚二甲苯基二胺(市售品)· Curing agent C: N,N,N',N'-tetraglycidyl m-xylylenediamine (commercially available)

<光聚合引发剂><Photopolymerization Initiator>

·光聚合引发剂A:1-羟基环己基苯基甲酮(市售品)・Photopolymerization initiator A: 1-hydroxycyclohexyl phenyl ketone (commercially available)

·光聚合引发剂B:苄基二甲基缩酮(市售品)・Photopolymerization initiator B: benzyl dimethyl ketal (commercially available)

【表1】【Table 1】

【表2】【Table 2】

【表3】【table 3】

(1)粘合力(1) Adhesion

依据JIS Z 0237;2009,使用拉伸试验机(A&D公司制,RTG-1210),采用180°剥离法测定贴附于硅晶片的镜面且经过20分钟后的切割胶带在23℃、相对湿度50%下的粘合力。拉伸速度为300mm/min,切割胶带的尺寸为250mm×20mm。应予说明,硅晶片的镜面使用根据JIS H 0614制得的镜面。According to JIS Z 0237; 2009, using a tensile tester (manufactured by A&D Corporation, RTG-1210), measure the dicing tape attached to the mirror surface of a silicon wafer by the 180° peeling method after 20 minutes at 23°C and a relative humidity of 50 Adhesion under %. The stretching speed is 300 mm/min, and the size of the dicing tape is 250 mm×20 mm. In addition, the mirror surface of a silicon wafer used the mirror surface manufactured based on JISH0614.

(2)芯片保持性,拾取性和崩裂的评价(2) Evaluation of chip retention, pick-up and cracking

将所得切割胶带贴合于形成有虚拟电路图案的直径8英寸×厚度0.15mm的硅晶片和环形框。贴合20分钟后用高压汞灯照射150mJ/cm2的紫外线,其后进行切割、拾取各工序。The obtained dicing tape was bonded to a silicon wafer having a diameter of 8 inches x a thickness of 0.15 mm and a ring frame on which a dummy circuit pattern was formed. After bonding for 20 minutes, irradiate 150mJ/cm 2 of ultraviolet rays with a high-pressure mercury lamp, and then perform cutting and picking processes.

切割工序的条件如下。The conditions of the cutting process are as follows.

切割装置:DISCO公司制DAD341Cutting device: DAD341 manufactured by DISCO

切割刀片:DISCO公司制NBC-ZH205O-27HEEECutting blade: NBC-ZH205O-27HEEE manufactured by DISCO

切割刀片的形状:外径55.56mm、刃宽35μm、内径19.05mmCutting blade shape: outer diameter 55.56mm, blade width 35μm, inner diameter 19.05mm

切割刀片转速:40000rpmCutting blade speed: 40000rpm

切割刀片进给速度:100mm/秒Cutting blade feed speed: 100mm/sec

切割尺寸:1.0mm见方Cutting size: 1.0mm square

在切割胶带中的切入量:30μmCutting amount in dicing tape: 30μm

切削水温度:25℃Cutting water temperature: 25℃

切削水量:1.0升/分钟Cutting water volume: 1.0 L/min

拾取工序的条件如下。The conditions of the picking up process are as follows.

拾取装置:Canon Machinery公司制CAP-300IIPickup device: CAP-300II manufactured by Canon Machinery

扩展量:8mmExpansion: 8mm

针销形状:70μmRPin shape: 70μmR

针销数:1根Number of pins: 1

针销上推高度:0.3mmPin push-up height: 0.3mm

切割工序和拾取工序中,进行以下评价。In the dicing process and the picking-up process, the following evaluations were performed.

(2-1)芯片保持性(2-1) Chip retention

芯片保持性根据切割工序后半导体芯片保持于切割胶带的半导体芯片的残留率,按以下基准进行评价。Chip retention was evaluated on the basis of the following criteria based on the residual ratio of semiconductor chips held by the dicing tape after the dicing process.

◎(优):芯片飞散低于5%◎(Excellent): Chip scattering is less than 5%

○(良):芯片飞散为5%以上且低于10%○ (Good): Chip scattering is 5% or more and less than 10%

×(不可):芯片飞散为10%以上× (impossible): Chip scattering is 10% or more

(2-2)拾取性(2-2) Pickup

拾取性根据拾取工序中可拾取半导体芯片的比例,按以下基准评价。Pickup performance was evaluated on the basis of the following criteria based on the ratio of semiconductor chips that can be picked up in the pick-up process.

◎(优):芯片的拾取成功率为95%以上◎(Excellent): The chip picking success rate is over 95%

○(良):芯片的拾取成功率为80%以上且低于95%○ (Good): The chip picking success rate is above 80% and below 95%

×(不可):芯片的拾取成功率低于80%× (Not allowed): The chip picking success rate is less than 80%

(2-3)崩裂(Chipping)(2-3)Chipping

对于崩裂,随机选择50个所拾取的芯片,用500倍的显微镜观察观察芯片背面的4条边,按以下基准评价向中心方向最大缺损的大小。For chipping, 50 picked-up chips were randomly selected, and the four sides on the back of the chip were observed with a microscope at magnification of 500, and the size of the largest defect in the center direction was evaluated according to the following criteria.

◎(优):缺损大小小于25μm◎(Excellent): The defect size is less than 25μm

○(良):缺损大小为25μm以上且小于50μm○ (good): The size of the defect is 25 μm or more and less than 50 μm

×(不可):缺损大小为50μm以上× (impossible): The size of the defect is 50 μm or more

(3)污染性(3) Pollution

将切割胶带贴附于硅晶片的镜面,20分钟后用高压汞灯照射150mJ/cm2的紫外线后,将切割胶带剥离。用颗粒计数器测定硅晶片的镜面(贴附面)上残留的0.28μm以上的粒子数。A dicing tape was attached to the mirror surface of the silicon wafer, and after 20 minutes, 150 mJ/cm 2 of ultraviolet rays was irradiated with a high-pressure mercury lamp, and the dicing tape was peeled off. The number of particles of 0.28 μm or more remaining on the mirror surface (attachment surface) of the silicon wafer was measured with a particle counter.

◎(优):颗粒为500个以下◎(Excellent): Less than 500 particles

○(良):颗粒为501个以上且小于2000个。○ (good): 501 or more particles and less than 2,000 particles.

×(不可):颗粒为2000个以上。× (impossible): 2000 or more particles.

(4)芯片松动(4) The chip is loose

芯片松动根据拾取工序中要拾取的半导体芯片所邻接的半导体芯片因销顶起的冲击而松动的比例,按以下基准评价。Chip looseness was evaluated on the basis of the following criteria based on the ratio of semiconductor chips adjacent to the semiconductor chip to be picked up in the pick-up process loosened by the impact of the pins.

◎(优):芯片松动低于1%◎(Excellent): Chip looseness is less than 1%

○(良):芯片松动为1%以上且低于3%○ (good): chip looseness is more than 1% and less than 3%

×(不可):芯片松动为3%以上× (impossible): Chip looseness is more than 3%

(考察)(investigation)

如表1~表3的实施例·比较例所示,使用特定组成的粘合剂形成厚度为3~7μm的粘合剂层的所有实施例中,综合判断为○或◎。另一方面,粘合剂的组成或粘合剂层的厚度为规定外的所有比较例中,综合判断为×。由这些结果证实了:若使用本发明的切割胶带,则可有效抑制崩裂、芯片飞散和残胶,同时能够使拾取性良好。As shown in Examples and Comparative Examples in Tables 1 to 3, in all Examples in which an adhesive layer having a thickness of 3 to 7 μm was formed using an adhesive of a specific composition, the overall judgment was ◯ or ⊚. On the other hand, in all comparative examples in which the composition of the adhesive and the thickness of the adhesive layer were out of specification, the overall judgment was x. From these results, it was confirmed that when the dicing tape of the present invention is used, chipping, chip flying, and adhesive residue can be effectively suppressed, and pick-up properties can be improved.

进一步进行详细分析,如下所述。Further detailed analysis was performed as described below.

比较例1中,由于(甲基)丙烯酸甲酯单元过少,所以污染性差。In Comparative Example 1, since there were too few methyl (meth)acrylate units, the contamination property was poor.

比较例2中,由于(甲基)丙烯酸甲酯单元过多,所以芯片保持性差,且芯片容易松动。In Comparative Example 2, since there were too many methyl (meth)acrylate units, the chip holding property was poor, and the chip was easily loosened.

比较例3中,由于具有羧基的单体单元过少,所以芯片保持性差。In Comparative Example 3, since there were too few monomer units having a carboxyl group, chip retention was poor.

比较例4中,由于具有羧基的单体单元过多,所以拾取性和污染性差。In Comparative Example 4, since there were too many monomer units having a carboxyl group, the pick-up property and contamination property were poor.

比较例5中,由于具有羟基的单体单元过少,所以污染性差。In Comparative Example 5, since there were too few monomer units having a hydroxyl group, the contamination property was poor.

比较例6中,由于具有羟基的单体单元过多,所以芯片容易松动。In Comparative Example 6, since there were too many monomer units having a hydroxyl group, the chip was easily loosened.

比较例7中,由于光聚合性化合物过少,所以芯片保持性和拾取性差。In Comparative Example 7, since the photopolymerizable compound was too small, the chip retention and pick-up properties were inferior.

比较例8中,由于光聚合性化合物过多,所以污染性差,且芯片容易松动。In Comparative Example 8, since there was too much photopolymerizable compound, the contamination property was poor, and the chip was easily loosened.

比较例9中,由于光聚合性化合物的重均分子量过小,所以容易发生崩裂。In Comparative Example 9, since the weight average molecular weight of the photopolymerizable compound was too small, cracking easily occurred.

比较例10中,由于光聚合性化合物的重均分子量过大,所以芯片保持性差。In Comparative Example 10, since the weight average molecular weight of the photopolymerizable compound was too large, chip retention was poor.

比较例11中,由于固化剂过少,所以污染性差。In Comparative Example 11, since the curing agent was too small, the staining property was poor.

比较例12中,由于固化剂过多,所以芯片保持性和污染性差,且芯片容易松动。In Comparative Example 12, since there was too much curing agent, the chip retention and contamination properties were poor, and the chip was easily loosened.

比较例13中,由于光聚合引发剂过少,所以拾取性差。In Comparative Example 13, since the photopolymerization initiator was too small, the pick-up property was poor.

比较例14中,由于光聚合引发剂过多,所以污染性差,且芯片容易松动。In Comparative Example 14, since there was too much photopolymerization initiator, the contamination property was poor, and the chip was easily loosened.

比较例15中,由于粘合剂层过薄,所以芯片保持性差,且芯片容易松动。In Comparative Example 15, since the adhesive layer was too thin, the chip holding property was poor, and the chip was easily loosened.

比较例16中,由于粘合剂层过厚,所以容易发生崩裂,且拾取性差。In Comparative Example 16, since the adhesive layer was too thick, cracking easily occurred and the pick-up property was poor.

Claims (4)

1.一种切割胶带,是在基材膜上层叠由粘合剂组合物构成的粘合剂层而形成的,其特征在于,1. A dicing tape formed by laminating an adhesive layer composed of an adhesive composition on a base film, wherein: 所述粘合剂组合物含有(甲基)丙烯酸酯共聚物100质量份、光聚合性化合物5~250质量份、固化剂0.1~20质量份、以及光聚合引发剂0.1~20质量份,The adhesive composition contains 100 parts by mass of a (meth)acrylate copolymer, 5 to 250 parts by mass of a photopolymerizable compound, 0.1 to 20 parts by mass of a curing agent, and 0.1 to 20 parts by mass of a photopolymerization initiator, 所述(甲基)丙烯酸酯共聚物含有(甲基)丙烯酸甲酯单元35~85质量%、(甲基)丙烯酸2-乙基己酯单元10~60质量%、具有羧基的单体单元0.5~10质量%、以及具有羟基的单体单元0.05~5质量%,The (meth)acrylate copolymer contains 35 to 85% by mass of methyl (meth)acrylate units, 10 to 60% by mass of 2-ethylhexyl (meth)acrylate units, and 0.5% of monomer units having carboxyl groups. ~10% by mass, and 0.05 ~ 5% by mass of monomeric units having hydroxyl groups, 所述光聚合性化合物是重均分子量为4000~8000且不饱和双键官能团数为10~15的聚氨酯丙烯酸酯低聚物,The photopolymerizable compound is a polyurethane acrylate oligomer with a weight average molecular weight of 4000-8000 and an unsaturated double bond functional group of 10-15, 所述粘合剂层的厚度为3~7μm。The thickness of the adhesive layer is 3-7 μm. 2.根据权利要求1所述的切割胶带,其特征在于,所述固化剂是多官能异氰酸脂固化剂或多官能环氧固化剂。2. The dicing tape according to claim 1, wherein the curing agent is a multifunctional isocyanate curing agent or a multifunctional epoxy curing agent. 3.根据权利要求1或2所述的切割胶带,其特征在于,所述切割胶带的、依据JIS Z 0237测得的、对硅晶片的镜面的粘合力为5.0N/20mm以上。3 . The dicing tape according to claim 1 , wherein the adhesive force of the dicing tape to the mirror surface of the silicon wafer measured in accordance with JIS Z 0237 is 5.0 N/20 mm or more. 4 . 4.一种电子部件的制造方法,其特征在于,具有如下工序:4. A method of manufacturing an electronic component, characterized in that it has the following steps: (a)贴附工序,在半导体晶片或基板和环形框上贴附切割胶带;(a) attaching process, attaching dicing tape on semiconductor wafer or substrate and ring frame; (b)切割工序,切割所述半导体晶片或基板,形成半导体芯片或半导体部件;(b) cutting process, cutting the semiconductor wafer or substrate to form semiconductor chips or semiconductor components; (c)光照射工序,对所述切割胶带照射活性光线;(c) light irradiation process, irradiating active light to the dicing tape; (d)扩展工序,为扩大所述半导体芯片或半导体部件之间的间隔,对所述切割胶带进行拉伸;以及(d) an expanding step of stretching the dicing tape in order to expand the interval between the semiconductor chips or semiconductor parts; and (e)拾取工序,从所述切割胶带拾取半导体芯片或半导体部件;(e) a pick-up process of picking up a semiconductor chip or a semiconductor component from the dicing tape; 所述切割胶带是权利要求1~3中任一项所述的切割胶带。The dicing tape is the dicing tape according to any one of claims 1-3.
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