CN106992235A - A kind of light-emitting diode chip for backlight unit - Google Patents
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- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
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- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
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Abstract
本发明公开了一种发光二极管芯片,包括:半导体堆叠结构,半导体堆叠结构依次包括衬底、第一半导体层、多量子阱层、第二半导体层和电流扩展层,第一半导体层和第二半导体层的导电类型相反,半导体堆叠结构自电流扩展层至衬底方向具有开槽,且开槽底部裸露第一半导体层;位于开槽内、且形成于第一半导体层上的第一电极层;形成于电流扩展层背离衬底一侧的第二电极层,第二电极层包括第二电极引脚,及延伸方向相同、且垂直延伸方向排列的多个第二延伸体,第二延伸体的一端与第二电极引脚相连。本发明提供的技术方案,保证多量子阱层中的电流分布更加均匀,且被遮挡光子可以通过相邻两个第二延伸体之间的空隙出射,提高发光二极管芯片的发光亮度。
The invention discloses a light emitting diode chip, comprising: a semiconductor stack structure, the semiconductor stack structure sequentially includes a substrate, a first semiconductor layer, a multi-quantum well layer, a second semiconductor layer and a current spreading layer, the first semiconductor layer and the second The conductivity type of the semiconductor layer is opposite, the semiconductor stack structure has a groove from the current spreading layer to the substrate, and the bottom of the groove exposes the first semiconductor layer; the first electrode layer located in the groove and formed on the first semiconductor layer ; The second electrode layer formed on the side of the current spreading layer away from the substrate, the second electrode layer includes a second electrode pin, and a plurality of second extensions arranged in the same extending direction and perpendicular to the extending direction, the second extending body One end is connected to the second electrode pin. The technical solution provided by the invention ensures that the current distribution in the multi-quantum well layer is more uniform, and the blocked photons can exit through the gap between two adjacent second extensions, thereby improving the luminance of the light-emitting diode chip.
Description
技术领域technical field
本发明涉及发光二极管技术领域,更为具体的说,涉及一种发光二极管芯片。The present invention relates to the technical field of light-emitting diodes, and more specifically, to a light-emitting diode chip.
背景技术Background technique
发光二极管(Light Emitting Diode,LED)作为代替白炽灯和荧光灯的新一代环保光源,被广泛应用在照明、显示和背光等领域。与传统照明光源相比,LED具有效率高、能耗低、寿命长、无污染、体积小、色彩丰富等诸多优点。一般的,发光二极管芯片主要包括半导体堆叠结构,以及与半导体堆叠结构接触的P型电极和N型电极,半导堆叠结构依次包括有衬底、N型半导体层、多量子阱层、P型半导体层和电流扩展层,半导体堆叠结构上形成有台阶裸露出N型半导体层。其中,P型电极形成在电流扩展层背离P型半导体层一侧表面,以及,N型电极形成在台阶区域所裸露的N型半导体层表面上。现有的发光二极管芯片工作时,P型电极和N型电极之间注入的电流在多量子阱层中较为集中,导致发光二极管芯片的发光亮度降低;以及,由于面积较大的P型电极的对发光二极管芯片的出光进行遮挡,进一步降低了发光二极管芯片的发光亮度。Light Emitting Diode (LED), as a new generation of environmentally friendly light source replacing incandescent lamps and fluorescent lamps, is widely used in lighting, display and backlighting and other fields. Compared with traditional lighting sources, LEDs have many advantages such as high efficiency, low energy consumption, long life, no pollution, small size, and rich colors. Generally, a light-emitting diode chip mainly includes a semiconductor stack structure, and a P-type electrode and an N-type electrode in contact with the semiconductor stack structure. The semiconductor stack structure sequentially includes a substrate, an N-type semiconductor layer, a multi-quantum well layer, and a P-type semiconductor layer and the current spreading layer, steps are formed on the semiconductor stack structure to expose the N-type semiconductor layer. Wherein, the P-type electrode is formed on the surface of the current spreading layer away from the P-type semiconductor layer, and the N-type electrode is formed on the exposed surface of the N-type semiconductor layer in the step region. When the existing light-emitting diode chip is working, the current injected between the P-type electrode and the N-type electrode is relatively concentrated in the multi-quantum well layer, resulting in a decrease in the luminous brightness of the light-emitting diode chip; and, due to the large area of the P-type electrode The light emitted by the light emitting diode chip is blocked to further reduce the light emitting brightness of the light emitting diode chip.
发明内容Contents of the invention
有鉴于此,本发明提供了一种发光二极管芯片,第二电极层包括第二电极引脚和多个第二延伸体,通过第二电极引脚和多个第二延伸体与第一电极层之间形成多个注入电流的通路,使得多量子阱层不同区域均有电流通过,保证多量子阱层中的电流分布更加均匀,提高发光二极管芯片的发光亮度;以及,通过优化第二延伸体的宽度,可以使光二极管芯片出射的光子,通过相邻两个第二延伸体之间的空隙出射,进一步提高发光二极管芯片的发光亮度。In view of this, the present invention provides a light-emitting diode chip, the second electrode layer includes a second electrode pin and a plurality of second extensions, through which the second electrode pin and a plurality of second extensions are connected to the first electrode layer Multiple injection current paths are formed between them, so that currents pass through different regions of the multi-quantum well layer, ensuring that the current distribution in the multi-quantum well layer is more uniform, and improving the luminous brightness of the light-emitting diode chip; and, by optimizing the second extension body The width of the light-emitting diode chip can make the photons emitted by the light-emitting diode chip exit through the gap between two adjacent second extensions, thereby further improving the luminous brightness of the light-emitting diode chip.
为实现上述目的,本发明提供的技术方案如下:In order to achieve the above object, the technical scheme provided by the invention is as follows:
一种发光二极管芯片,包括:A light emitting diode chip, comprising:
半导体堆叠结构,所述半导体堆叠结构依次包括衬底、第一半导体层、多量子阱层、第二半导体层和电流扩展层,所述第一半导体层和第二半导体层的导电类型相反,其中,所述半导体堆叠结构自所述电流扩展层至衬底方向具有开槽,且所述开槽底部裸露所述第一半导体层;A semiconductor stack structure, the semiconductor stack structure sequentially includes a substrate, a first semiconductor layer, a multiple quantum well layer, a second semiconductor layer and a current spreading layer, the conductivity types of the first semiconductor layer and the second semiconductor layer are opposite, wherein , the semiconductor stack structure has a groove from the current spreading layer to the substrate direction, and the bottom of the groove exposes the first semiconductor layer;
位于所述开槽内、且形成于所述第一半导体层上的第一电极层;a first electrode layer located in the groove and formed on the first semiconductor layer;
以及,形成于所述电流扩展层背离所述衬底一侧的第二电极层,其中,所述第二电极层包括第二电极引脚,及延伸方向相同、且垂直所述延伸方向排列的多个第二延伸体,所述第二延伸体的一端与所述第二电极引脚相连。And, the second electrode layer formed on the side of the current spreading layer away from the substrate, wherein the second electrode layer includes second electrode pins, and pins extending in the same direction and arranged perpendicular to the extending direction. A plurality of second extension bodies, one end of the second extension body is connected to the second electrode pin.
可选的,所述开槽与所述第二电极引脚相对设置;Optionally, the slot is arranged opposite to the second electrode pin;
其中,所述多个第二延伸体分布于所述开槽两侧。Wherein, the plurality of second extensions are distributed on both sides of the slot.
可选的,在所述开槽任意一侧的所有所述第二延伸体,相邻两个所述第二延伸体之间的间距,自所述开槽向该侧的所述第二延伸体的方向上呈减小趋势;Optionally, for all the second extensions on either side of the slot, the distance between two adjacent second extensions is from the slot to the second extension on the side. There is a decreasing trend in the direction of the body;
或者,在所述开槽任意一侧的所有所述第二延伸体,任意相邻两个所述第二延伸体之间的间距相同。Alternatively, for all the second extensions on any side of the slot, the distance between any two adjacent second extensions is the same.
可选的,在所述开槽任意一侧的所有所述第二延伸体,相邻两个所述第二延伸体之间的间距,自所述开槽向该侧的所述第二延伸体的方向上呈减小趋势,且相邻两个所述间距之间的差值相同。Optionally, for all the second extensions on either side of the slot, the distance between two adjacent second extensions is from the slot to the second extension on the side. There is a decreasing trend in the direction of the body, and the difference between two adjacent distances is the same.
可选的,在所述开槽任意一侧的所有所述第二延伸体,相邻两个所述第二延伸体之间的间距范围为10μm~50μm,包括端点值。Optionally, for all the second extensions on any side of the slot, the distance between two adjacent second extensions ranges from 10 μm to 50 μm, endpoint values included.
可选的,在所述开槽任意一侧的所有所述第二延伸体,所述第二延伸体在沿垂直所述延伸方向上的宽度,自所述开槽向该侧的所述第二延伸体的方向上呈增大趋势;Optionally, for all the second extensions on any side of the slot, the width of the second extensions along the direction perpendicular to the extension is from the slot to the first extension on the side. There is an increasing trend in the direction of the two extensions;
或者,在所述开槽任意一侧的所有所述第二延伸体,所述第二延伸体在沿垂直所述延伸方向上的宽度相同。Alternatively, for all the second extensions on any side of the slot, the widths of the second extensions along the direction perpendicular to the extension are the same.
可选的,在所述开槽任意一侧的所有所述第二延伸体,所述第二延伸体在沿垂直所述延伸方向上的宽度,自所述开槽向该侧的所述第二延伸体的方向上呈增大趋势,且相邻两个所述宽度之间的差值相同。Optionally, for all the second extensions on any side of the slot, the width of the second extensions along the direction perpendicular to the extension is from the slot to the first extension on the side. The direction of the two extensions tends to increase, and the difference between the widths of two adjacent ones is the same.
可选的,在所述开槽任意一侧的所有所述第二延伸体,所述第二延伸体在沿垂直所述延伸方向上的宽度范围为10nm~500nm,包括端点值。Optionally, for all the second extensions on any side of the groove, the width of the second extensions along the direction perpendicular to the extension ranges from 10 nm to 500 nm, endpoint values included.
可选的,位于所述开槽两侧的所述第二延伸体的数量相同。Optionally, the number of the second extensions located on both sides of the slot is the same.
可选的,所述第一电极层包括第一电极引脚,及位于所述第一电极引脚和第二电极引脚之间、且沿所述第一电极引脚至第二电极引脚的方向延伸的第一延伸体,其中,所述第一延伸体与所述第一电极引脚相连。Optionally, the first electrode layer includes a first electrode pin, and a A first extension body extending in a direction, wherein the first extension body is connected to the first electrode pin.
相较于现有技术,本发明提供的技术方案至少具有以下优点:Compared with the prior art, the technical solution provided by the present invention has at least the following advantages:
本发明提供了一种发光二极管芯片,包括:半导体堆叠结构,所述半导体堆叠结构依次包括衬底、第一半导体层、多量子阱层、第二半导体层和电流扩展层,所述第一半导体层和第二半导体层的导电类型相反,其中,所述半导体堆叠结构自所述电流扩展层至衬底方向具有开槽,且所述开槽底部裸露所述第一半导体层;位于所述开槽内、且形成于所述第一半导体层上的第一电极层;以及,形成于所述电流扩展层背离所述衬底一侧的第二电极层,其中,所述第二电极层包括第二电极引脚,及延伸方向相同、且垂直所述延伸方向排列的多个第二延伸体,所述第二延伸体的一端与所述第二电极引脚相连。The invention provides a light emitting diode chip, comprising: a semiconductor stack structure, the semiconductor stack structure sequentially includes a substrate, a first semiconductor layer, a multi-quantum well layer, a second semiconductor layer and a current spreading layer, the first semiconductor layer and the second semiconductor layer have opposite conductivity types, wherein the semiconductor stack structure has a groove from the current spreading layer to the substrate, and the bottom of the groove exposes the first semiconductor layer; a first electrode layer formed in the groove and on the first semiconductor layer; and a second electrode layer formed on the side of the current spreading layer facing away from the substrate, wherein the second electrode layer includes A second electrode pin, and a plurality of second extension bodies arranged in the same extending direction and perpendicular to the extending direction, one end of the second extension body is connected to the second electrode pin.
由上述内容可知,本发明提供的技术方案,第二电极层包括第二电极引脚和多个第二延伸体,通过第二电极引脚和多个第二延伸体与第一电极层之间形成多个注入电流的通路,使得多量子阱层不同区域均有电流通过,保证多量子阱层中的电流分布更加均匀,提高发光二极管芯片的发光亮度;以及,通过优化第二延伸体的宽度,可以使光二极管芯片出射的光子,通过相邻两个第二延伸体之间的空隙出射,进一步提高发光二极管芯片的发光亮度。It can be seen from the above that in the technical solution provided by the present invention, the second electrode layer includes a second electrode pin and a plurality of second extensions, and passes between the second electrode pin and the plurality of second extensions and the first electrode layer. Form multiple injection current paths, so that currents can pass through different regions of the multi-quantum well layer, ensure a more uniform current distribution in the multi-quantum well layer, and improve the luminous brightness of the light-emitting diode chip; and, by optimizing the width of the second extension , the photons emitted by the light emitting diode chip can be emitted through the gap between two adjacent second extensions, so as to further improve the luminous brightness of the light emitting diode chip.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据提供的附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only It is an embodiment of the present invention, and those skilled in the art can also obtain other drawings according to the provided drawings without creative work.
图1为本申请实施例提供的一种发光二极管芯片的结构示意图;FIG. 1 is a schematic structural diagram of a light-emitting diode chip provided in an embodiment of the present application;
图2为图1中沿AA’方向的切面图;Fig. 2 is the sectional view along AA ' direction in Fig. 1;
图3为本申请实施例提供的另一种发光二极管芯片的结构示意图;FIG. 3 is a schematic structural diagram of another light-emitting diode chip provided in the embodiment of the present application;
图4为图3中沿AA’方向的切面图;Fig. 4 is the sectional view along AA ' direction in Fig. 3;
图5为本申请实施例提供的又一种发光二极管芯片的结构示意图;FIG. 5 is a schematic structural diagram of another light-emitting diode chip provided by the embodiment of the present application;
图6为图5中沿AA’方向的切面图。Fig. 6 is a sectional view along AA' direction in Fig. 5 .
具体实施方式detailed description
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
正如背景技术所述,发光二极管芯片主要包括半导体堆叠结构,以及与半导体堆叠结构接触的P型电极和N型电极,半导堆叠结构依次包括有衬底、N型半导体层、多量子阱层、P型半导体层和电流扩展层,半导体堆叠结构上形成有台阶裸露出N型半导体层。其中,P型电极形成在电流扩展层背离P型半导体层一侧表面,以及,N型电极形成在台阶区域所裸露的N型半导体层表面上。现有的发光二极管芯片工作时,P型电极和N型电极之间注入的电流在多量子阱层中较为集中,导致发光二极管芯片的发光亮度降低;以及,由于面积较大的P型电极的对发光二极管芯片的出光进行遮挡,进一步降低了发光二极管芯片的发光亮度。As mentioned in the background technology, the light-emitting diode chip mainly includes a semiconductor stack structure, and a P-type electrode and an N-type electrode in contact with the semiconductor stack structure. The semiconductor stack structure sequentially includes a substrate, an N-type semiconductor layer, a multi-quantum well layer, For the P-type semiconductor layer and the current spreading layer, steps are formed on the semiconductor stack structure to expose the N-type semiconductor layer. Wherein, the P-type electrode is formed on the surface of the current spreading layer away from the P-type semiconductor layer, and the N-type electrode is formed on the exposed surface of the N-type semiconductor layer in the step region. When the existing light-emitting diode chip is working, the current injected between the P-type electrode and the N-type electrode is relatively concentrated in the multi-quantum well layer, resulting in a decrease in the luminous brightness of the light-emitting diode chip; and, due to the large area of the P-type electrode The light emitted by the light emitting diode chip is blocked to further reduce the light emitting brightness of the light emitting diode chip.
基于此,本申请实施例提供了一种发光二极管芯片,第二电极层包括第二电极引脚和多个第二延伸体,通过第二电极引脚和多个第二延伸体与第一电极层之间形成多个注入电流的通路,使得多量子阱层不同区域均有电流通过,保证多量子阱层中的电流分布更加均匀,提高发光二极管芯片的发光亮度;以及,通过优化第二延伸体的宽度,可以使光二极管芯片出射的光子,通过相邻两个第二延伸体之间的空隙出射,进一步提高发光二极管芯片的发光亮度。为实现上述目的,本申请实施例提供的技术方案如下,具体结合图1至图6所示,对本申请实施例提供的技术方案进行详细的描述。Based on this, an embodiment of the present application provides a light emitting diode chip. The second electrode layer includes a second electrode pin and a plurality of second extensions. Multiple injection current paths are formed between the layers, so that current flows through different regions of the multi-quantum well layer, ensuring that the current distribution in the multi-quantum well layer is more uniform, and improving the luminous brightness of the light-emitting diode chip; and, by optimizing the second extension The width of the body can make the photons emitted by the light-emitting diode chip exit through the gap between two adjacent second extension bodies, thereby further improving the luminous brightness of the light-emitting diode chip. In order to achieve the above purpose, the technical solutions provided by the embodiments of the present application are as follows. Specifically, referring to FIG. 1 to FIG. 6 , the technical solutions provided by the embodiments of the present application are described in detail.
参考图1所示,为本申请实施例提供的一种发光二极管芯片的结构示意图,其中,本申请实施例提供的发光二极管芯片为倒装芯片,即出光方向为衬底至电流扩展层的方向,发光二极管芯片包括:Referring to FIG. 1 , it is a schematic structural diagram of a light emitting diode chip provided in the embodiment of the present application, wherein the light emitting diode chip provided in the embodiment of the present application is a flip chip, that is, the direction of light output is the direction from the substrate to the current spreading layer , LED chips include:
半导体堆叠结构,所述半导体堆叠结构依次包括衬底110、第一半导体层120、多量子阱层130、第二半导体层140和电流扩展层150,所述第一半导体层120和第二半导体层140的导电类型相反,其中,所述半导体堆叠结构自所述电流扩展层150至衬底110方向具有开槽160,且所述开槽160底部裸露所述第一半导体层120;A semiconductor stack structure, the semiconductor stack structure sequentially includes a substrate 110, a first semiconductor layer 120, a multi-quantum well layer 130, a second semiconductor layer 140 and a current spreading layer 150, the first semiconductor layer 120 and the second semiconductor layer The conductivity type of 140 is opposite, wherein the semiconductor stack structure has a slot 160 from the current spreading layer 150 to the substrate 110, and the bottom of the slot 160 exposes the first semiconductor layer 120;
位于所述开槽160内、且形成于所述第一半导体层120上的第一电极层200;a first electrode layer 200 located in the groove 160 and formed on the first semiconductor layer 120;
以及,形成于所述电流扩展层150背离所述衬底110一侧的第二电极层300,其中,所述第二电极层300包括第二电极引脚310,及延伸方向相同、且垂直所述延伸方向(延伸方向为第一方向X,垂直延伸方向为第二方向Y)排列的多个第二延伸体320,所述第二延伸体320的一端与所述第二电极引脚310相连。And, the second electrode layer 300 formed on the side of the current spreading layer 150 away from the substrate 110, wherein the second electrode layer 300 includes a second electrode pin 310, and the extension direction is the same and perpendicular to the A plurality of second extensions 320 arranged in the extension direction (the extension direction is the first direction X, and the vertical extension direction is the second direction Y), one end of the second extensions 320 is connected to the second electrode pin 310 .
在本申请一实施例中,所述开槽160与所述第二电极引脚310相对设置;其中,所述多个第二延伸体320分布于所述开槽160两侧。以及,所述第一电极层200包括第一电极引脚210,及位于所述第一电极引脚210和第二电极引脚310之间、且沿所述第一电极引脚210至第二电极引脚310的方向延伸的第一延伸体220,其中,所述第一延伸体220与所述第一电极引脚210相连。In an embodiment of the present application, the slot 160 is disposed opposite to the second electrode pin 310 ; wherein, the plurality of second extensions 320 are distributed on both sides of the slot 160 . And, the first electrode layer 200 includes a first electrode pin 210, and is located between the first electrode pin 210 and the second electrode pin 310, and along the first electrode pin 210 to the second The first extension body 220 extending in the direction of the electrode pin 310 , wherein the first extension body 220 is connected to the first electrode pin 210 .
在本申请一实施例中,衬底110的材料包括但不限于蓝宝石、碳化硅、硅中的一种。In an embodiment of the present application, the material of the substrate 110 includes but not limited to one of sapphire, silicon carbide, and silicon.
另外,第一半导体层120可以为N型半导体层,具体可以为N型GaN层,以及,第二半导体层140为P型半导体层,具体可以为P型GaN层,对此本申请不做具体限;第一电极层200为N型电极层,第二电极层为P型电极层。其中,本申请实施例提供的第一电极层200和第二电极层300可以为金属或合金层,具体可以包括但不限于Ag、Al、Au、Cr、Ni、Pd、Pt、Ti、Ni、W中的一种金属或几种组合的合金,厚度范围约为包括端点值。In addition, the first semiconductor layer 120 may be an N-type semiconductor layer, specifically an N-type GaN layer, and the second semiconductor layer 140 may be a P-type semiconductor layer, specifically a P-type GaN layer, and this application will not describe in detail. limit; the first electrode layer 200 is an N-type electrode layer, and the second electrode layer is a P-type electrode layer. Among them, the first electrode layer 200 and the second electrode layer 300 provided in the embodiment of the present application may be metal or alloy layers, specifically including but not limited to Ag, Al, Au, Cr, Ni, Pd, Pt, Ti, Ni, A metal or an alloy of several combinations in W, with a thickness in the range of approx. Include endpoint values.
此外,电流扩展层150的材料包括但不限于氧化铟锡、Au、掺铝ZnO、金属纳米中的一种或几种,厚度范围约为包括端点值。In addition, the material of the current spreading layer 150 includes but is not limited to one or more of indium tin oxide, Au, aluminum-doped ZnO, and metal nanometers, and the thickness ranges from about Include endpoint values.
由上述内容可知,本申请实施例提供的技术方案,第二电极层包括第二电极引脚和多个第二延伸体,通过第二电极引脚和多个第二延伸体与第一电极层之间形成多个注入电流的通路,使得多量子阱层不同区域均有电流通过,保证多量子阱层中的电流分布更加均匀,提高发光二极管芯片的发光亮度;以及,通过优化第二延伸体的宽度(优选将第二延伸体在第二方向Y的宽度设置为纳米量级),可以使光二极管芯片出射的光子,通过相邻两个第二延伸体之间的空隙出射,进一步提高发光二极管芯片的发光亮度。It can be seen from the above that in the technical solution provided by the embodiment of the present application, the second electrode layer includes a second electrode pin and a plurality of second extensions, and the second electrode pin and a plurality of second extensions are connected to the first electrode layer. Multiple injection current paths are formed between them, so that currents pass through different regions of the multi-quantum well layer, ensuring that the current distribution in the multi-quantum well layer is more uniform, and improving the luminous brightness of the light-emitting diode chip; and, by optimizing the second extension body (preferably setting the width of the second extension body in the second direction Y to be on the order of nanometers), the photons emitted by the photodiode chip can be emitted through the gap between two adjacent second extension bodies, further improving the luminescence Luminous brightness of a diode chip.
在本申请一实施例中,在开槽160任意一侧的所有第二延伸体320,任意相邻两个第二延伸体320之间的间距可以设置为相同的。或者,可以优化设计该间距,在开槽160任意一侧的所有第二延伸体320,将相邻两个第二延伸体320之间的间距,自开槽160向该侧的第二延伸体320的方向上呈减小趋势;其中,由于远离第一电极层200的相邻第二延伸体320的间距小,相当于远离第一电极层200第二延伸体320的密度较大,使得注入多量子阱层的电流更易向远离第一电极层200的第二延伸体320的区域流动,避免注入多量子阱层的电流集中于第二延伸体320靠近第一电极层200一侧的区域,保证注入多量子阱层的电流均匀度高,提高发光二极管芯片的发光亮度。In an embodiment of the present application, all the second extensions 320 on any side of the slot 160 and the distance between any two adjacent second extensions 320 may be set to be the same. Alternatively, the spacing can be optimally designed, and for all the second extensions 320 on any side of the slot 160, the spacing between two adjacent second extensions 320 will be extended from the slot 160 to the second extensions on this side. 320 shows a decreasing trend; wherein, due to the small distance between adjacent second extensions 320 away from the first electrode layer 200, it is equivalent to a higher density of the second extensions 320 away from the first electrode layer 200, so that the injection The current of the multi-quantum well layer is more likely to flow to the area of the second extension 320 away from the first electrode layer 200, so as to prevent the current injected into the multi-quantum well layer from concentrating on the area of the second extension 320 close to the first electrode layer 200, The high uniformity of the current injected into the multi-quantum well layer is guaranteed, and the luminous brightness of the light-emitting diode chip is improved.
具体结合图3和图4所示,图3为本申请实施例提供的另一种发光二极管芯片的结构示意图,图4为图3中沿AA’方向的切面图。其中,在所述开槽160任意一侧的所有所述第二延伸体320,相邻两个所述第二延伸体320之间的间距,自所述开槽160向该侧的所述第二延伸体320的方向上呈减小趋势。Specifically shown in FIG. 3 and FIG. 4 , FIG. 3 is a schematic structural diagram of another light-emitting diode chip provided by the embodiment of the present application, and FIG. 4 is a sectional view along the AA' direction in FIG. 3 . Wherein, for all the second extensions 320 on any side of the slot 160, the distance between two adjacent second extensions 320 is from the slot 160 to the first extension on the side. The direction of the two extensions 320 shows a decreasing trend.
进一步的,在开槽160任意一侧的所有第二延伸体320,自开槽160向该侧的第二延伸体320的方向上,相邻两个第二延伸体320之间的间距呈渐变的减小趋势;即,在所述开槽160任意一侧的所有所述第二延伸体320,相邻两个所述第二延伸体320之间的间距,自所述开槽160向该侧的所述第二延伸体320的方向上呈减小趋势,且相邻两个所述间距之间的差值相同。Further, for all the second extensions 320 on any side of the slot 160, the distance between two adjacent second extensions 320 is gradually changing in the direction from the slot 160 to the second extensions 320 on this side. The decreasing trend; that is, for all the second extensions 320 on any side of the slot 160, the distance between two adjacent second extensions 320 is from the slot 160 to the The direction of the second extension body 320 on the side has a decreasing trend, and the difference between two adjacent distances is the same.
需要说明的是,上述实施例对于间距的优化方案只是本申请众多实施例中的一种,对此本申请不做具体限制,需要根据实际应用进行具体设计。其中,本申请实施例可选的,在所述开槽160任意一侧的所有所述第二延伸体320,相邻两个所述第二延伸体320之间的间距范围为10μm~50μm,包括端点值,其中,间距具体可以为15μm、20μm、30μm、45μm等,对此具体数值本申请同样不做限制。以及,本申请实施例提供的呈减小趋势的间距,具体可以为由靠近第一电极层200的相邻两个第二延伸体320的间距30μm,减小至远离第一电极层200的相邻两个第二延伸体320的间距10μm。It should be noted that the optimization scheme for the pitch in the above embodiments is only one of many embodiments in the present application, and the present application does not make specific limitations on this, and needs to be specifically designed according to actual applications. Wherein, in the embodiment of the present application, optionally, for all the second extensions 320 on any side of the slot 160, the distance between two adjacent second extensions 320 ranges from 10 μm to 50 μm, The endpoint values are included, wherein the spacing may specifically be 15 μm, 20 μm, 30 μm, 45 μm, etc., and the application does not limit the specific numerical value. And, the decreasing pitch provided by the embodiment of the present application can be specifically reduced from a pitch of 30 μm between two adjacent second extensions 320 close to the first electrode layer 200 to a phase far away from the first electrode layer 200 . The distance between two adjacent second extensions 320 is 10 μm.
以及,除可以如上述实施例中所述对相邻两第二延伸体320之间的间距进行优化设计外,还可以对第二延伸体320在第二方向Y的宽度进行优化设计。在本申请一实施例中,在开槽160任意一侧的所有第二延伸体320,第二延伸体320在沿垂直延伸方向(第二方向Y)上的宽度可以相同。或者,可以优化设计该宽度,在开槽160任意一侧的所有第二延伸体320,第二延伸体320在沿垂直延伸方向(第二方向Y)上的宽度,自开槽160向该侧的第二延伸体320的方向上呈增大趋势;其中,由于远离第一电极层200的第二延伸体320的宽度大,而靠近第一电极层200的第二延伸体320的宽度较小,使得注入多量子阱层的电流更易向远离第一电极层200的第二延伸体320的区域流动,避免注入多量子阱层的电流集中于第二延伸体320靠近第一电极层200一侧的区域,保证注入多量子阱层的电流均匀度高,提高发光二极管芯片的发光亮度。And, in addition to optimizing the distance between two adjacent second extensions 320 as described in the above embodiments, the width of the second extensions 320 in the second direction Y can also be optimized. In an embodiment of the present application, for all the second extensions 320 on either side of the slot 160 , the widths of the second extensions 320 along the vertical extension direction (the second direction Y) may be the same. Alternatively, the width can be optimally designed. For all second extensions 320 on any side of the slot 160, the width of the second extension 320 along the vertical extension direction (second direction Y) is from the slot 160 to the side. The direction of the second extension body 320 tends to increase; wherein, because the width of the second extension body 320 away from the first electrode layer 200 is large, the width of the second extension body 320 close to the first electrode layer 200 is small , making it easier for the current injected into the multi-quantum well layer to flow to the region of the second extension 320 away from the first electrode layer 200, so as to prevent the current injected into the multi-quantum well layer from concentrating on the side of the second extension 320 close to the first electrode layer 200 The area ensures high uniformity of the current injected into the multi-quantum well layer, and improves the luminous brightness of the light-emitting diode chip.
具体结合图5和图6所示,图5为本申请实施例提供的又一种发光二极管芯片的结构示意图,图6为图5中沿AA’方向的切面图。其中,在所述开槽160任意一侧的所有所述第二延伸体320,所述第二延伸体320在沿垂直所述延伸方向上的宽度,自所述开槽160向该侧的所述第二延伸体320的方向上呈增大趋势。Specifically shown in FIG. 5 and FIG. 6 , FIG. 5 is a schematic structural diagram of another light-emitting diode chip provided by the embodiment of the present application, and FIG. 6 is a sectional view along the AA' direction in FIG. 5 . Wherein, for all the second extensions 320 on any side of the slot 160, the width of the second extensions 320 along the direction perpendicular to the extension is from the slot 160 to all sides of the side. The direction of the second extension body 320 shows an increasing trend.
进一步的,在开槽160任意一侧的所有第二延伸体320,第二延伸体320在沿垂直延伸方向上的宽度,自开槽160向该侧的第二延伸体320的方向上呈渐变的增大趋势;即,在所述开槽160任意一侧的所有所述第二延伸体320,所述第二延伸体320在沿垂直所述延伸方向上的宽度,自所述开槽160向该侧的所述第二延伸体320的方向上呈增大趋势,且相邻两个所述宽度之间的差值相同。Further, for all the second extensions 320 on any side of the slot 160, the width of the second extensions 320 along the vertical extension direction gradually changes from the slot 160 to the second extension 320 on this side. That is, all the second extensions 320 on either side of the slot 160, the width of the second extension 320 along the direction perpendicular to the extension, from the slot 160 The direction toward the second extension body 320 on this side tends to increase, and the difference between two adjacent widths is the same.
需要说明的是,上述实施例对于宽度的优化方案只是本申请众多实施例中的一种,对此本申请不做具体限制,需要根据实际应用进行具体设计。本申请实施例可选的,在所述开槽160任意一侧的所有所述第二延伸体320,所述第二延伸体320在沿垂直所述延伸方向上的宽度范围为10nm~500nm,包括端点值,其中,宽度具体可以为20nm、30nm、100nm、200nm、350nm、450nm等,对此具体数值本申请同样不做限制。以及,本申请实施例提供的呈增大趋势的宽度,具体可以为由靠近第一电极层200的第二延伸体320的宽度50nm,增大至远离第一电极层200的第二延伸体320的宽度500nm。其中,设置第二延伸体320在第二方向Y上的宽度优选与发光二极管芯片的发光波长差值在预设范围(可以相等)内,进而通过衍射效应使第二延伸体320遮挡住的光子绕过该第二延伸体320出射,提高发光二极管芯片的发光亮度。It should be noted that the width optimization solution of the above embodiment is only one of many embodiments of the present application, and this application does not make specific limitations on it, and needs to be specifically designed according to actual applications. Optionally in this embodiment of the present application, for all the second extensions 320 on any side of the slot 160, the width of the second extensions 320 along the direction perpendicular to the extension is in the range of 10 nm to 500 nm, Including the endpoint value, the width may specifically be 20nm, 30nm, 100nm, 200nm, 350nm, 450nm, etc., and the application does not limit the specific numerical value. And, the width of the increasing trend provided by the embodiment of the present application can be specifically increased from the width of the second extension 320 close to the first electrode layer 200 of 50 nm to the second extension 320 away from the first electrode layer 200 The width is 500nm. Wherein, the width of the second extension 320 in the second direction Y is preferably set within a preset range (may be equal) to the light emitting wavelength difference of the light-emitting diode chip, and then the photons blocked by the second extension 320 can be blocked by the diffraction effect. Bypassing the second extension body 320 and emitting light, the luminous brightness of the light-emitting diode chip is improved.
以及,需要说明的是,在本申请实施例提供的发光二极管芯片中,还可以对开槽160任意一侧的所有第二延伸体320中,相邻两个第二延伸体320之间的间距和第二延伸体320在第二方向Y上的宽度同时进行优化,对此本申请不做具体限制。And, it should be noted that, in the light-emitting diode chip provided in the embodiment of the present application, the distance between two adjacent second extensions 320 in all the second extensions 320 on any side of the slot 160 can also be adjusted The optimization is performed simultaneously with the width of the second extension body 320 in the second direction Y, which is not specifically limited in this application.
在上述任意一实施例中,本申请提供的位于所述开槽160两侧的所述第二延伸体320的数量相同。此外,在本申请其他实施例中,开槽160两侧的第二延伸体320的数量还可以设置为不相同,对此本申请不做具体限制,需要根据实际应用进行具体设计。In any of the above embodiments, the number of the second extensions 320 located on both sides of the slot 160 provided in the present application is the same. In addition, in other embodiments of the present application, the number of the second extensions 320 on both sides of the slot 160 may also be set to be different, which is not specifically limited in the present application, and needs to be specifically designed according to actual applications.
对于上述任意一实施例提供的发光二极管芯片,其制作方法可以包括:For the light-emitting diode chip provided in any one of the above embodiments, its manufacturing method may include:
S1、首先提供一衬底。S1. First, a substrate is provided.
S2、在衬底表面上形成叠层,其中,叠层包括第一半导体层,位于第一半导体层背离衬底一侧的多量子阱层,及位于多量子阱层背离衬底一侧的第二半导体层。S2. Form a stack on the surface of the substrate, wherein the stack includes a first semiconductor layer, a multi-quantum well layer located on the side of the first semiconductor layer away from the substrate, and a first multi-quantum well layer located on the side of the multi-quantum well layer away from the substrate Two semiconductor layers.
S3、通过刻蚀工艺对叠层进行刻蚀台阶,其中,刻蚀的台阶不仅包括有开槽,以及进一步还包括有环绕叠层的台阶区域。其中,刻蚀工艺包括但不限于采用感应耦合等离子体刻蚀工艺、化学腐蚀、电化学腐蚀等中一种或几种,对此本申请不做具体限制;以及,刻蚀的台阶的高度范围约为 包括端点值,具体可以为保证裸露出第一半导体层。S3. Etching a step on the stack by an etching process, wherein the etched step not only includes a groove, but also includes a step region surrounding the stack. Among them, the etching process includes but is not limited to one or more of the inductively coupled plasma etching process, chemical corrosion, electrochemical corrosion, etc., which is not specifically limited in this application; and the height range of the etched steps about Include the endpoint value, which can be Ensure that the first semiconductor layer is exposed.
S4、在第二半导体层背离衬底一侧表面形成电流扩展层。其中,具体可以将的氧化铟锡薄膜溅射于第二半导体层背离衬底一侧表面,而后结合光刻工艺和氧化铟锡刻蚀液去除多余部分形成预设图案后,得到电流扩展层,以最终得到半导体堆叠结构。S4, forming a current spreading layer on the surface of the second semiconductor layer facing away from the substrate. Among them, the specific A thin film of indium tin oxide is sputtered on the surface of the second semiconductor layer facing away from the substrate, and then combined with photolithography and indium tin oxide etching solution to remove the excess part to form a preset pattern to obtain a current spreading layer to finally obtain a semiconductor stack structure.
S5、通过电子束蒸发镀膜或纳米压印等方法,在电流扩展层背离衬底一侧形成第二电极层和第一电极层,而后进行封装等后续工艺得到发光二极管芯片。S5. Form the second electrode layer and the first electrode layer on the side of the current spreading layer facing away from the substrate by means of electron beam evaporation coating or nanoimprinting, and then perform follow-up processes such as packaging to obtain a light-emitting diode chip.
本申请实施例提供了一种发光二极管芯片,包括:半导体堆叠结构,所述半导体堆叠结构依次包括衬底、第一半导体层、多量子阱层、第二半导体层和电流扩展层,所述第一半导体层和第二半导体层的导电类型相反,其中,所述半导体堆叠结构自所述电流扩展层至衬底方向具有开槽,且所述开槽底部裸露所述第一半导体层;位于所述开槽内、且形成于所述第一半导体层上的第一电极层;以及,形成于所述电流扩展层背离所述衬底一侧的第二电极层,其中,所述第二电极层包括第二电极引脚,及延伸方向相同、且垂直所述延伸方向排列的多个第二延伸体,所述第二延伸体的一端与所述第二电极引脚相连。An embodiment of the present application provides a light-emitting diode chip, including: a semiconductor stack structure, the semiconductor stack structure sequentially includes a substrate, a first semiconductor layer, a multi-quantum well layer, a second semiconductor layer, and a current spreading layer, and the first semiconductor layer A semiconductor layer and a second semiconductor layer have opposite conductivity types, wherein the semiconductor stack structure has a groove from the current spreading layer to the substrate, and the bottom of the groove exposes the first semiconductor layer; a first electrode layer formed in the groove and on the first semiconductor layer; and a second electrode layer formed on the side of the current spreading layer away from the substrate, wherein the second electrode The layer includes a second electrode pin, and a plurality of second extensions arranged in the same extending direction and perpendicular to the extending direction, one end of the second extending body is connected to the second electrode pin.
由上述内容可知,本申请实施例提供的技术方案,第二电极层包括第二电极引脚和多个第二延伸体,通过第二电极引脚和多个第二延伸体与第一电极层之间形成多个注入电流的通路,使得多量子阱层不同区域均有电流通过,保证多量子阱层中的电流分布更加均匀,提高发光二极管芯片的发光亮度;以及,通过优化第二延伸体的宽度,可以使光二极管芯片出射的光子,通过相邻两个第二延伸体之间的空隙出射,进一步提高发光二极管芯片的发光亮度。It can be seen from the above that in the technical solution provided by the embodiment of the present application, the second electrode layer includes a second electrode pin and a plurality of second extensions, and the second electrode pin and a plurality of second extensions are connected to the first electrode layer. Multiple injection current paths are formed between them, so that currents pass through different regions of the multi-quantum well layer, ensuring that the current distribution in the multi-quantum well layer is more uniform, and improving the luminous brightness of the light-emitting diode chip; and, by optimizing the second extension body The width of the light-emitting diode chip can make the photons emitted by the light-emitting diode chip exit through the gap between two adjacent second extensions, thereby further improving the luminous brightness of the light-emitting diode chip.
对所公开的实施例的上述说明,使本领域专业技术人员能够实现或使用本发明。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的,本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下,在其它实施例中实现。因此,本发明将不会被限制于本文所示的这些实施例,而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。The above description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention will not be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
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