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CN106941101A - Package substrate and manufacturing method thereof - Google Patents

Package substrate and manufacturing method thereof Download PDF

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Publication number
CN106941101A
CN106941101A CN201610004607.6A CN201610004607A CN106941101A CN 106941101 A CN106941101 A CN 106941101A CN 201610004607 A CN201610004607 A CN 201610004607A CN 106941101 A CN106941101 A CN 106941101A
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China
Prior art keywords
circuit chip
conductive
metal
conductor layer
connecting elements
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Pending
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CN201610004607.6A
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Chinese (zh)
Inventor
胡竹青
许诗滨
刘晋铭
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Phoenix Pioneer Ltd By Share Ltd
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Phoenix Pioneer Technology Co Ltd
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Priority to CN201610004607.6A priority Critical patent/CN106941101A/en
Publication of CN106941101A publication Critical patent/CN106941101A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/367Cooling facilitated by shape of device
    • H01L23/3672Foil-like cooling fins or heat sinks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18161Exposing the passive side of the semiconductor or solid-state body of a flip chip

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

本发明公开了一种封装基板及其制作方法。该封装基板包括:一导线层,包含至少一金属走线;一导电连接单元,位于该导线层上;一电路晶片,具有至少一外接脚垫,并设置于该导电连接单元上;以及一铸模化合物层,包覆该导线层、该导电连接单元及该电路晶片;其中,该导电连接单元用以连接该至少一外接脚垫的其中一个与该至少一金属走线的其中一个。

The present invention discloses a packaging substrate and a manufacturing method thereof. The packaging substrate comprises: a conductor layer, including at least one metal trace; a conductive connection unit, located on the conductor layer; a circuit chip, having at least one external pin pad, and arranged on the conductive connection unit; and a mold compound layer, covering the conductor layer, the conductive connection unit and the circuit chip; wherein the conductive connection unit is used to connect one of the at least one external pin pad and one of the at least one metal trace.

Description

封装基板及其制作方法Packaging substrate and manufacturing method thereof

技术领域technical field

本发明关于一种封装基板以及其制作方法,属于半导体技术领域。The invention relates to a packaging substrate and a manufacturing method thereof, belonging to the technical field of semiconductors.

背景技术Background technique

新一代电子产品不仅追求轻薄短小的高密度,更有朝向高功率发展的趋势;因此,积体电路(Integrated Circuit,简称IC)技术及其后端的晶片封装技术亦随之进展,以符合此新一代电子产品的效能规格。电路晶片埋入封装基板的内埋元件技术,因为具有降低封装基板产品受到杂讯干扰及产品尺寸减小的优点,近年来已成为本领域制造商的研发重点。现有技术通常是先将电路晶片或晶粒埋入作为封装基板主体的铸模化合物中,再来制作作为封装基板电路布局的导线层。The new generation of electronic products not only pursues light, thin, small and high density, but also tends to develop towards high power; therefore, the integrated circuit (Integrated Circuit, IC) technology and its back-end chip packaging technology have also been developed to meet this new trend. Performance specifications for a generation of electronic products. Embedded component technology, in which circuit chips are embedded in packaging substrates, has become the research and development focus of manufacturers in this field in recent years because of its advantages of reducing noise interference and product size reduction on packaging substrate products. In the prior art, the circuit chips or crystal grains are usually embedded in the molding compound as the main body of the packaging substrate, and then the wiring layer as the circuit layout of the packaging substrate is fabricated.

然而,导线层大多为宽度较窄的细线路,制程难度高,使得当导线层发生制作上的缺陷时,该电路晶片或晶粒也必须连带报废。此外,一旦电路晶片或晶粒被埋入封装基板中,该电路晶片或晶粒与外部电路的电性连接线路将会变得难以处理,例如,额外的雷射开孔、介电材料层压合等加工制程及复杂结构的电性连接线路,这些都会提高制造成本及降低产品良率。因此,有必要发展新的封装基板技术,以对治及改善上述的问题。However, most of the wiring layers are thin lines with narrow width, and the manufacturing process is difficult, so that when the wiring layer has a manufacturing defect, the circuit chip or crystal grain must also be scrapped. In addition, once the circuit chip or die is buried in the packaging substrate, the electrical connection between the circuit chip or die and the external circuit will become difficult to handle, for example, additional laser opening, dielectric material lamination Combined processing and electrical connection circuits with complex structures will increase manufacturing costs and reduce product yields. Therefore, it is necessary to develop a new packaging substrate technology to address and improve the above-mentioned problems.

发明内容Contents of the invention

为达成此目的,本发明提供一种封装基板,其包含:一导线层,包含至少一金属走线;一导电连接单元,位于该导线层上;一电路晶片,具有至少一外接脚垫,并设置于该导电连接单元上;以及一铸模化合物层,包覆该导线层、该导电连接单元及该电路晶片;其中,该导电连接单元用以连接该至少一外接脚垫的其中一个与该至少一金属走线的其中一个。To achieve this purpose, the present invention provides a packaging substrate, which includes: a wire layer including at least one metal wire; a conductive connection unit located on the wire layer; a circuit chip with at least one external pad, and disposed on the conductive connection unit; and a mold compound layer covering the wire layer, the conductive connection unit and the circuit chip; wherein the conductive connection unit is used to connect one of the at least one external pad with the at least one One of the metal traces.

在一实施例中,该导电连接单元为一金属柱状物。In one embodiment, the conductive connection unit is a metal pillar.

在一实施例中,该导电连接单元为一焊锡凸块物。In one embodiment, the conductive connection unit is a solder bump.

在一实施例中,该封装基板更包含一散热片,其设置于该电路晶片上,并连接该电路晶片。In one embodiment, the packaging substrate further includes a heat sink disposed on the circuit chip and connected to the circuit chip.

在一实施例中,该封装基板更包含一金属承载板,其设置于该导线层下。In one embodiment, the package substrate further includes a metal carrier plate disposed under the wire layer.

另一方面,本发明提供一种封装基板的制作方法,其步骤包含:提供一承载板;形成一第一导线层在该承载板上,使得该第一导线层包含至少一第一金属走线;形成一导电连接单元在该第一导线层上;设置一具有至少一外接脚垫的电路晶片在该导电连接单元上,使得该导电连接单元连接该至少一外接脚垫的其中一个与该至少一第一金属走线的其中一个;以及形成一铸模化合物层在该电路晶片上,并使得该铸模化合物层充填该电路晶片与该承载板之间的空间。In another aspect, the present invention provides a method for manufacturing a packaging substrate, the steps of which include: providing a carrier board; forming a first wire layer on the carrier board, so that the first wire layer includes at least one first metal wire ; forming a conductive connection unit on the first wire layer; setting a circuit chip with at least one external pad on the conductive connection unit, so that the conductive connection unit connects one of the at least one external pad and the at least one one of the first metal traces; and forming a mold compound layer on the circuit chip so that the mold compound layer fills the space between the circuit chip and the carrier board.

在一实施例中,该导电连接单元为一第一金属柱状物。In one embodiment, the conductive connection unit is a first metal pillar.

在一实施例中,该导电连接单元为一焊锡凸块物。In one embodiment, the conductive connection unit is a solder bump.

在一实施例中,该方法更包含:移除部分的该铸模化合物层,以露出该电路晶片的上表面;以及移除该承载板。In one embodiment, the method further includes: removing a portion of the mold compound layer to expose the upper surface of the circuit chip; and removing the carrier plate.

在一实施例中,该方法更包含:设置一散热片在该电路晶片上,使得该散热片连接该电路晶片的上表面。In one embodiment, the method further includes: disposing a heat sink on the circuit chip, so that the heat sink is connected to the upper surface of the circuit chip.

在一实施例中,该方法更包含:形成一第二导线层在该铸模化合物层上,使得该第二导线层包含至少一第二金属走线;形成一导电柱层在该第二导线层上,该导电柱层包含至少一第二金属柱状物;以及形成一介电材料层在该铸模化合物层上,并使得该介电材料层包覆该铸模化合物层上所有的该至少一第二金属走线与该至少一第二金属柱状物。In one embodiment, the method further includes: forming a second wiring layer on the mold compound layer, such that the second wiring layer includes at least a second metal trace; forming a conductive column layer on the second wiring layer On, the conductive pillar layer includes at least one second metal pillar; and a dielectric material layer is formed on the mold compound layer, and the dielectric material layer covers all the at least one second metal pillar on the mold compound layer. The metal wiring and the at least one second metal pillar.

附图说明Description of drawings

图1为根据本发明第一实施例封装基板的剖面示意图。FIG. 1 is a schematic cross-sectional view of a package substrate according to a first embodiment of the present invention.

图2~6为本发明第一实施例封装基板的各个制程步骤的剖面图。2-6 are cross-sectional views of various manufacturing steps of the package substrate according to the first embodiment of the present invention.

图7A及7B为根据本发明第二实施例的封装基板的剖面示意图。7A and 7B are schematic cross-sectional views of a packaging substrate according to a second embodiment of the present invention.

图8~10为根据本发明第三实施例封装基板的各个制程步骤的剖面图。8-10 are cross-sectional views of various manufacturing steps of the packaging substrate according to the third embodiment of the present invention.

附图标记说明:100、200、300—封装基板;110—承载板;120—第一导线层;121~125—第一金属走线;130、131~134—导电连接单元;140—电路晶片;141~144—外接脚垫;150—铸模化合物层;160—散热片;170—第二导线层;171~174—第二金属走线;180—导电柱层;181~184—金属柱状物;190—介电材料层。Explanation of reference signs: 100, 200, 300—package substrate; 110—loading board; 120—first wire layer; 121-125—first metal wiring; 130, 131-134—conductive connection unit; 140—circuit chip ;141~144—external pad; 150—molding compound layer; 160—heat sink; 170—second wire layer; 171~174—second metal trace; 180—conductive column layer; 181~184—metal pillar ; 190—Layer of dielectric material.

具体实施方式detailed description

为使对本发明的特征、目的及功能有更进一步的认知与了解,兹配合图式详细说明本发明的实施例如后。在所有的说明书及图示中,将采用相同的元件编号以指定相同或类似的元件。In order to have a better understanding of the features, objectives and functions of the present invention, the embodiments of the present invention will be described in detail below with reference to the drawings. Throughout the description and drawings, the same element number will be used to designate the same or similar elements.

在各个实施例的说明中,当一元素被描述是在另一元素的「上方/上」或「下方/下」,指直接地或间接地在该另一元素之上或之下的情况,其可能包含设置于其间的其他元素;所谓的「直接地」指其间并未设置其他中介元素。「上方/上」或「下方/下」等的描述以图式为基准进行说明,但亦包含其他可能的方向转变。所谓的「第一」、「第二」、及「第三」用以描述不同的元素,这些元素并不因为此类谓辞而受到限制。为了说明上的便利和明确,图式中各元素的厚度或尺寸,以夸张或省略或概略的方式表示,且各元素的尺寸并未完全为其实际的尺寸。In the description of various embodiments, when an element is described as being "above/on" or "below/under" another element, it means that it is directly or indirectly on or under the other element, It may contain other elements set in between; by "directly" I mean that no other intervening elements are set in between. Descriptions such as "above/up" or "below/under" are described with reference to the drawings, but include other possible changes in direction. The terms "first", "second", and "third" are used to describe various elements, and these elements are not limited by such predicates. For the convenience and clarity of illustration, the thickness or size of each element in the drawings is expressed in an exaggerated, omitted or approximate manner, and the size of each element is not entirely its actual size.

图1为根据本发明第一实施例的封装基板100的剖面示意图。该封装基板100包含:一第一导线层120、一导电连接单元130、一电路晶片140以及一铸模化合物层150。该第一导线层120代表该封装基板100的线路布局,其包含至少一第一金属走线;该导电连接单元130形成于该第一导线层120上,其数量可以是一个以上;该电路晶片140设置于该导电连接单元130上,且该电路晶片140具有至少一外接脚垫;为了说明上的方便,如第1图所示的例子,该第一导线层120具有五个第一金属走线(由左至右编号为121~125)、该导电连接单元130的数量为四个(由左至右编号为131~134)、该电路晶片140具有四个外接脚垫(由左至右编号为141~144),但其数量并不以此为限,端视该封装基板100线路布局的需要而定。各个导电连接单元131~134用以连接该等外接脚垫141~144的其中一个与该等第一金属走线121~125的其中一个;例如,该导电连接单元131连接该外接脚垫141与该第一金属走线121,该导电连接单元132连接该外接脚垫142与该第一金属走线122,该导电连接单元133连接该外接脚垫143与该第一金属走线123,该导电连接单元134连接该外接脚垫144与该第一金属走线124。此外,该铸模化合物层150则包覆该第一导线层120、该导电连接单元130及该电路晶片140,其超出该电路晶片140上表面的部分可作为该封装基板100最外侧的保护层。FIG. 1 is a schematic cross-sectional view of a packaging substrate 100 according to a first embodiment of the present invention. The packaging substrate 100 includes: a first wire layer 120 , a conductive connection unit 130 , a circuit chip 140 and a molding compound layer 150 . The first wire layer 120 represents the circuit layout of the packaging substrate 100, which includes at least one first metal wire; the conductive connection unit 130 is formed on the first wire layer 120, and its number can be more than one; the circuit chip 140 is disposed on the conductive connection unit 130, and the circuit chip 140 has at least one external pad; for the convenience of illustration, as shown in the example shown in FIG. wires (numbered 121-125 from left to right), the number of the conductive connection units 130 is four (numbered 131-134 from left to right), and the circuit chip 140 has four external pads (numbered from left to right The numbers are 141-144), but the number is not limited thereto, and depends on the needs of the circuit layout of the packaging substrate 100 . Each conductive connecting unit 131-134 is used to connect one of the external pads 141-144 with one of the first metal traces 121-125; for example, the conductive connecting unit 131 connects the external pad 141 and The first metal trace 121, the conductive connection unit 132 connects the external pad 142 and the first metal trace 122, the conductive connection unit 133 connects the external pad 143 and the first metal trace 123, the conductive The connection unit 134 connects the external pad 144 and the first metal trace 124 . In addition, the molding compound layer 150 covers the first wire layer 120 , the conductive connection unit 130 and the circuit chip 140 , and the part beyond the upper surface of the circuit chip 140 can be used as the outermost protective layer of the packaging substrate 100 .

该第一导线层120的组成材质可以是铜(Cu)、镍(Ni)、锡(Sn)及镍/金(Ni/Au)的组合或合金,其可在电镀(Electrolytic plating)、溅镀(Sputtering coating)或蒸镀(Evaporation)形成金属膜之后,通过微影蚀刻(Photolithography)的图案化制程来制作,作为该封装基板100的电路布局线路层的其中一层。在本实施例中,该第一导线层120具有五个第一金属走线121~125,如图1所示。The composition material of this first wire layer 120 can be the combination or alloy of copper (Cu), nickel (Ni), tin (Sn) and nickel/gold (Ni/Au), and it can be in electrolytic plating (Electrolytic plating), sputtering After the metal film is formed by (Sputtering coating) or evaporation (Evaporation), it is fabricated by a patterning process of Photolithography as one of the circuit layout layers of the packaging substrate 100 . In this embodiment, the first wire layer 120 has five first metal wires 121 - 125 , as shown in FIG. 1 .

该电路晶片140为一主动元件。在本实施例中,该电路晶片140的制作可以是以积体电路(IC)制程施加于半导体晶圆(wafer),并加以切割成晶粒(die),并已预先接上外接脚垫(例如,导电接脚(pin)、导电垫片(pad)或导电凸块(bump)),而将应用内埋元件技术而埋入该封装基板100中。藉此,可有效减低封装基板产品所受到的杂讯干扰及缩小其成品尺寸,而可应用于可携式装置的应用处理器(Application processor)及电源管理晶片。如图1所示,该电路晶片140具有四个外接脚垫141~144,当其设置于该导电连接单元130上时,能自我对位(Self-alignment)地将该等外接脚垫141~144分别连接该等导电连接单元131~134,而不须使用精密对准技术。The circuit chip 140 is an active device. In this embodiment, the fabrication of the circuit chip 140 may be applied to a semiconductor wafer (wafer) by an integrated circuit (IC) process, and cut into dies, and pre-connected with external pads ( For example, conductive pins, conductive pads, or conductive bumps) will be embedded in the package substrate 100 using embedded device technology. Thereby, the noise interference received by the packaging substrate product can be effectively reduced and the size of the finished product can be reduced, so that it can be applied to an application processor (Application processor) and a power management chip of a portable device. As shown in FIG. 1, the circuit chip 140 has four external pads 141-144. When it is arranged on the conductive connection unit 130, these external pads 141-144 can be self-aligned (Self-alignment). 144 respectively connects the conductive connecting units 131 - 134 without using precise alignment technology.

为了让该电路晶片140能在不使用精密对准技术的情况下连接至该第一导线层120,本实施例在该第一导线层120层上制作有柱状结构或凸块结构的导电连接单元131~134,例如,铜柱(Cu pillar)或焊锡凸块(solder bump),使得该电路晶片140的外接脚垫141~144能简易地自我对位至该等导电连接单元131~134,则将可有效降低封装基板的制作成本。在本实施例中,单一个导电连接单元130(或,该等导电连接单元131~134)用以连接该等外接脚垫141~144的其中一个与该等第一金属走线121~125的其中一个。如图1所示,该导电连接单元131连接该外接脚垫141与该第一金属走线121,该导电连接单元132连接该外接脚垫142与该第一金属走线122,该导电连接单元133连接该外接脚垫143与该第一金属走线123,该导电连接单元134连接该外接脚垫144与该第一金属走线124,使得该电路晶片140可依据该封装基板100的电路设计而连接至该第一导线层120。In order to allow the circuit chip 140 to be connected to the first wire layer 120 without using precise alignment technology, in this embodiment, a conductive connection unit with a columnar structure or a bump structure is fabricated on the first wire layer 120 131-134, such as copper pillars (Cu pillar) or solder bumps (solder bump), so that the external pads 141-144 of the circuit chip 140 can be easily self-aligned to the conductive connection units 131-134, then The manufacturing cost of the packaging substrate can be effectively reduced. In this embodiment, a single conductive connection unit 130 (or, the conductive connection units 131-134) is used to connect one of the external pads 141-144 and the first metal traces 121-125. one of. As shown in FIG. 1, the conductive connection unit 131 connects the external pad 141 and the first metal trace 121, the conductive connection unit 132 connects the external pad 142 and the first metal trace 122, and the conductive connection unit 133 connects the external pad 143 and the first metal trace 123, and the conductive connection unit 134 connects the external pad 144 and the first metal trace 124, so that the circuit chip 140 can be designed according to the circuit design of the package substrate 100 And connected to the first wire layer 120 .

该铸模化合物层150可通过封装胶体的铸模技术来制作,例如,压缩铸模法(Compression Molding),而封装胶体的组成材质可以是酚醛基树脂(Novolac-Based Resin)、环氧基树脂(Epoxy-Based Resin)、或硅基树脂(Silicone-Based Resin)等绝缘材料,但不以此为限。该铸模化合物层150会包覆该电路晶片140,并充填该电路晶片140与该第一导线层120之间的空间,使得该封装基板100形成具稳固结构的电子元件或产品。此外,该铸模化合物层150之超出该电路晶片140上表面的部分亦可作为该封装基板100的外侧保护层,用以保护该封装基板100免于受到来自外部环境或后续制程(例如,焊接)的可能伤害。The molding compound layer 150 can be made by molding technology of encapsulating colloid, for example, compression molding (Compression Molding), and the composition material of encapsulating colloid can be phenolic-based resin (Novolac-Based Resin), epoxy-based resin (Epoxy-based resin) Based Resin), or silicone-based resin (Silicone-Based Resin) and other insulating materials, but not limited thereto. The molding compound layer 150 covers the circuit chip 140 and fills the space between the circuit chip 140 and the first wiring layer 120 , so that the packaging substrate 100 forms an electronic component or product with a stable structure. In addition, the portion of the mold compound layer 150 beyond the upper surface of the circuit chip 140 can also be used as an outer protective layer of the package substrate 100 to protect the package substrate 100 from external environment or subsequent processes (such as soldering). of possible harm.

在本实施例中,该封装基板100可作为应用于铸模互连基板技术的覆晶式晶片尺寸封装(FCCSP)之基板。此外,本实施例封装基板的线路布局之单导线亦可以是多层导线层的堆迭结构,例如,二层、三层或更多层的导线层。In this embodiment, the packaging substrate 100 can be used as a substrate of a flip chip chip scale package (FCCSP) applied to molded interconnect substrate technology. In addition, the single wire of the circuit layout of the packaging substrate in this embodiment may also be a stacked structure of multiple wire layers, for example, two, three or more layers of wire layers.

以下说明本发明实施例之封装基板100的制程。请参照图2~6及图1,其分别对应上述实施例的封装基板100的各个制程步骤的封装基板剖面图。The following describes the manufacturing process of the packaging substrate 100 according to the embodiment of the present invention. Please refer to FIGS. 2-6 and FIG. 1 , which respectively correspond to cross-sectional views of the packaging substrate in each process step of the packaging substrate 100 of the above-mentioned embodiment.

首先,如图2所示,提供一承载板110,其可为一导电材质的基板,例如,金属基板或是表面镀有一层导电层的介电材质基板,用以承载或支持该封装基板100的后续制程,例如,制作该封装基板100的导电线路。上述的金属基板包含铁(Fe)、铜(Cu)、镍(Ni)、锡(Sn)、铝(Al)、镍/金(Ni/Au)及其组合或合金,但本发明不以此为限。First, as shown in FIG. 2, a carrier board 110 is provided, which can be a substrate of conductive material, for example, a metal substrate or a substrate of dielectric material coated with a conductive layer on the surface, for carrying or supporting the packaging substrate 100. Subsequent processes, for example, fabricating the conductive lines of the packaging substrate 100 . The above-mentioned metal substrates include iron (Fe), copper (Cu), nickel (Ni), tin (Sn), aluminum (Al), nickel/gold (Ni/Au) and combinations or alloys thereof, but the present invention does not limit.

接着,如图2所示,形成一第一导线层120于该承载板110上,使得该第一导线层120包含至少一第一金属走线。例如,我们可使用感光型的光阻材料,先在该承载板110上形成一光阻薄膜,再通过微影蚀刻制程进行图案化,形成金属电镀的阻镀层,再电镀金属膜于其上,而形成金属走线的图案于该承载板110上。或者是,我们可使用非感光型的介电材料,先在该承载板110上形成一介电薄膜,再通过雷射转印技术对该介电薄膜进行图案化,再蒸镀或溅镀金属膜于其上,最后以剥离法(Lift-off)移除该介电薄膜,同时将金属走线的图案留在该承载板110上。在本实施例中,该导线层120具有五个第一金属走线121~125,且其组成材质可以是铜、镍、锡及镍/金的组合或合金。Next, as shown in FIG. 2 , a first wire layer 120 is formed on the carrier board 110 such that the first wire layer 120 includes at least one first metal wire. For example, we can use a photosensitive photoresist material to form a photoresist film on the carrier board 110 first, and then pattern it through a lithographic etching process to form a metal plating resist layer, and then electroplate a metal film on it. A pattern of metal traces is formed on the carrier board 110 . Alternatively, we can use a non-photosensitive dielectric material, first form a dielectric film on the carrier plate 110, then pattern the dielectric film by laser transfer technology, and then evaporate or sputter metal film on it, and finally remove the dielectric film by lift-off, while leaving the pattern of the metal wiring on the carrier board 110 . In this embodiment, the wire layer 120 has five first metal wires 121 - 125 , and the composition material thereof may be a combination or alloy of copper, nickel, tin, and nickel/gold.

接着,形成该至少一导电连接单元130于该第一导线层120上。如图4A所示,该至少一导电连接单元130包含四个凸块结构的导电连接单元131~134,例如,焊锡凸块(Solder bump),用以在后续制程中将该电路晶片140连接至该第一导线层120。但该至少一导电连接单元130的数量并不以此为限,端视该封装基板100线路布局的需要或该电路晶片140的外接脚垫数量而定。在另一实施例中,该等导电连接单元131’~134’亦可为柱状结构,如图4B所示,例如,铜柱、铝柱、镍柱、锡柱或合金柱,较佳者为铜柱。为避免过多的赘述,本说明书后半部以该等导电连接单元131~134为凸块结构(如图4A所示)来说明相关的实施例,但读者应能理解,该些实施例亦同样适用于该等导电连接单元131’~134’为柱状结构(如图4B所示)的案例。Next, the at least one conductive connection unit 130 is formed on the first wiring layer 120 . As shown in FIG. 4A, the at least one conductive connection unit 130 includes four conductive connection units 131-134 with a bump structure, such as solder bumps, for connecting the circuit chip 140 to the The first wire layer 120 . However, the number of the at least one conductive connection unit 130 is not limited thereto, and depends on the requirements of the circuit layout of the packaging substrate 100 or the number of external pads of the circuit chip 140 . In another embodiment, the conductive connection units 131'˜134' can also be columnar structures, as shown in FIG. 4B, for example, copper columns, aluminum columns, nickel columns, tin columns or alloy columns, preferably copper pillars. In order to avoid too many details, the second half of this specification uses the conductive connection units 131-134 as bump structures (as shown in FIG. 4A ) to illustrate related embodiments, but readers should understand that these embodiments also It is also applicable to the case where the conductive connecting units 131 ′˜ 134 ′ are columnar structures (as shown in FIG. 4B ).

接着,设置一具有至少一外接脚垫的电路晶片140于该至少一导电连接单元130上(在本实施例中,该电路晶片140具有四个外接脚垫141~144,如图5所示,但本发明并不以此为限制),使得各个外接脚垫141~144连接该至少一外接脚垫141~144的其中一个与该至少一第一金属走线121~125的其中一个。该电路晶片140以积体电路(IC)制程所制成的主动元件,而为切割成晶粒(die)形式的晶片,并已预先接上外接脚垫(例如,导电接脚、导电垫片或导电凸块),可应用内埋元件技术而埋入该封装基板100中。当该电路晶片140安装于该导电连接单元130上时,该等外接脚垫141~144可以轻易地被放置于该等导电连接单元131~134,例如,自我对位(self-alignment),而不须使用精密对准技术。在本实施例中,该导电连接单元131连接该外接脚垫141与该第一金属走线121,该导电连接单元132连接该外接脚垫142与该第一金属走线122,该导电连接单元133连接该外接脚垫143与该第一金属走线123,该导电连接单元134连接该外接脚垫144与该第一金属走线124,使得该电路晶片140可依据该封装基板100的电路设计而连接至该第一导线层120。Next, a circuit chip 140 with at least one external pad is arranged on the at least one conductive connection unit 130 (in this embodiment, the circuit chip 140 has four external pads 141-144, as shown in FIG. 5 , But the present invention is not limited thereto), so that each external pad 141 - 144 is connected to one of the at least one external pad 141 - 144 and one of the at least one first metal trace 121 - 125 . The circuit chip 140 is an active component made by an integrated circuit (IC) process, and is a chip cut into a die form, and has been pre-connected with external pads (for example, conductive pins, conductive pads) or conductive bumps) can be embedded in the packaging substrate 100 by using embedded device technology. When the circuit chip 140 is installed on the conductive connection unit 130, the external pads 141-144 can be easily placed on the conductive connection units 131-134, for example, self-alignment (self-alignment), and Precision alignment techniques need not be used. In this embodiment, the conductive connection unit 131 connects the external pad 141 and the first metal trace 121, the conductive connection unit 132 connects the external pad 142 and the first metal trace 122, and the conductive connection unit 133 connects the external pad 143 and the first metal trace 123, and the conductive connection unit 134 connects the external pad 144 and the first metal trace 124, so that the circuit chip 140 can be designed according to the circuit design of the package substrate 100 And connected to the first wire layer 120 .

接着,如图6所示,形成一铸模化合物层150于该电路晶片140上,并使得该铸模化合物层150充填该电路晶片140与该承载板110之间的空间。该铸模化合物层150可通过封装胶体的铸模技术来制作,例如,压缩铸模法,而封装胶体的组成材质可以是酚醛(Novolac)基树脂、环氧基树脂、或硅基树脂等绝缘材料,但不以此为限。该铸模化合物层150会包覆该电路晶片140,并充填该电路晶片140与该第一导线层120之间的空间,使得该封装基板100形成具稳固结构的电子元件或产品。此外,该铸模化合物层150的超出该电路晶片140上表面的部分亦可作为该封装基板100的外侧保护层,用以保护该封装基板100免于受到来自外部环境或后续制程(例如,焊接)的可能伤害。至此,该封装基板100的基本电路已完成,可先将该承载板110移除,如图1所示。Next, as shown in FIG. 6 , a mold compound layer 150 is formed on the circuit chip 140 such that the mold compound layer 150 fills the space between the circuit chip 140 and the carrier plate 110 . The molding compound layer 150 can be made by the molding technique of encapsulating colloid, for example, compression molding method, and the composition material of encapsulating colloid can be insulating materials such as phenolic (Novolac)-based resin, epoxy-based resin, or silicon-based resin, but This is not the limit. The molding compound layer 150 covers the circuit chip 140 and fills the space between the circuit chip 140 and the first wiring layer 120 , so that the packaging substrate 100 forms an electronic component or product with a stable structure. In addition, the part of the molding compound layer 150 beyond the upper surface of the circuit chip 140 can also be used as an outer protective layer of the package substrate 100 to protect the package substrate 100 from the external environment or subsequent processes (such as soldering). of possible harm. So far, the basic circuit of the packaging substrate 100 has been completed, and the carrier board 110 can be removed first, as shown in FIG. 1 .

电路晶片埋入封装基板的内埋元件技术,因为具有降低封装基板产品受到杂讯干扰及产品尺寸减小的优点,近年来已成为本领域制造商的研发重点。以图1的封装基板为例,现有技术通常是先将电路晶片140埋入封装基板100的主体(铸模化合物层150)中,再来制作作为封装基板电路布局的第一导线层120,而该第一导线层120大多为宽度较窄的细线路,制程难度高,使得当该第一导线层120发生制作上的缺陷,则该电路晶片140也必须连带报废。此外,一旦该电路晶片140被埋入该封装基板100,该电路晶片140与外部电路的电性连接线路将会变得难以处理,例如,额外的雷射开孔、介电材料层压合等加工制程及复杂结构的电性连接线路,这些都会提高制造成本及降低产品良率。Embedded component technology, in which circuit chips are embedded in packaging substrates, has become the research and development focus of manufacturers in this field in recent years because of its advantages of reducing noise interference and product size reduction on packaging substrate products. Taking the packaging substrate of FIG. 1 as an example, in the prior art, the circuit chip 140 is usually first embedded in the main body of the packaging substrate 100 (molding compound layer 150), and then the first wiring layer 120 as the circuit layout of the packaging substrate is fabricated. Most of the first wiring layer 120 is a thin circuit with a narrow width, and the manufacturing process is difficult, so that when the first wiring layer 120 has a manufacturing defect, the circuit chip 140 must also be scrapped. In addition, once the circuit chip 140 is embedded in the packaging substrate 100, the electrical connection between the circuit chip 140 and the external circuit will become difficult to handle, for example, additional laser opening, dielectric material layer lamination, etc. The processing process and the electrical connection circuit with complex structure will increase the manufacturing cost and reduce the product yield.

反观本发明技术,如上实施例的制程步骤所述,是在将电路晶片140埋入该封装基板100之前,就先完成作为封装基板电路布局的第一导线层120,再将该电路晶片140粘接至该第一导线层120,最后再将铸模化合物层150以铸模方式注入,而完成如图1所示的封装基板100。因此,宽度较窄、制程难度较高的细线路(该第一导线层120)先会被制作,而该第一导线层120亦可包含电路晶片140与外部电路的电性连接线路而同时制作完成或不须额外加工;因此,可降低制造成本及提高产品良率。In contrast, the technology of the present invention, as described in the process steps of the above embodiment, is to complete the first wiring layer 120 as the circuit layout of the packaging substrate before the circuit chip 140 is embedded in the packaging substrate 100, and then the circuit chip 140 is bonded connected to the first wire layer 120 , and finally the mold compound layer 150 is injected into the mold to complete the package substrate 100 shown in FIG. 1 . Therefore, the thin circuit (the first wiring layer 120 ) with a narrower width and higher manufacturing process difficulty will be manufactured first, and the first wiring layer 120 can also include the electrical connection circuit between the circuit chip 140 and the external circuit and be fabricated at the same time. Complete or no additional processing; therefore, can reduce manufacturing costs and improve product yield.

依据上述实施例,图6的封装基板可被进一步发展成具有更高阶功能的产品。例如,图7A为根据本发明第二实施例的封装基板200的剖面示意图。在上述第一实施例制程进行到图6的步骤之后,可自上而下移除该铸模化合物层150至露出该电路晶片140的上表面;例如,采用研磨方式来移除该铸模化合物层150的上半部,而以该电路晶片140的上表面为研磨停止点。因此,由于该电路晶片140的上表面为外露的状态,这将有利于该电路晶片140的散热效果。在另一实施例中,一散热片(Heat sink)160可进一步设置于该电路晶片140上,使得该散热片160连接该电路晶片140,以增强对该电路晶片140的散热效果,如图7B所示。例如,采用粘贴方式,将该散热片160直接粘贴于该电路晶片140的上表面。According to the above-mentioned embodiments, the packaging substrate shown in FIG. 6 can be further developed into a product with higher-order functions. For example, FIG. 7A is a schematic cross-sectional view of a packaging substrate 200 according to a second embodiment of the present invention. After the process of the above-mentioned first embodiment proceeds to the step of FIG. 6 , the mold compound layer 150 can be removed from top to bottom to expose the upper surface of the circuit chip 140; for example, the mold compound layer 150 can be removed by grinding. The upper half of the circuit wafer 140 is used as the grinding stop point. Therefore, since the upper surface of the circuit chip 140 is exposed, it is beneficial to the heat dissipation effect of the circuit chip 140 . In another embodiment, a heat sink (Heat sink) 160 can be further arranged on the circuit chip 140, so that the heat sink 160 is connected to the circuit chip 140 to enhance the heat dissipation effect of the circuit chip 140, as shown in FIG. 7B shown. For example, the heat sink 160 is directly pasted on the upper surface of the circuit chip 140 by pasting.

此外,由于上述实施例所采用的承载板110为具有导电性的基板,无论其为整块的金属基板或是只在表面镀有导电层的介电基板,该承载板110亦可作为提供该电路晶片140的散热之用,而将它保留于图6之后的制程。例如,图8~10为根据本发明第三实施例的封装基板300对应后续制程步骤的剖面示意图。在上述第一实施例进行到图6的步骤时,倘若欲将该承载板110作为散热片,则该第一导线层120可作为将该电路晶片140所产生热量向该承载板110传送的散热路径。在本实施例中,我们可在该铸模化合物层150上另行制作封装基板的电路布局线路层;因此,如图8所示,一第二导线层170可形成于该铸模化合物层150上,使得该第二导线层170包含至少一第二金属走线;例如,该第二导线层170具有四个第二金属走线171~174,其制作方式及组成材质可参照如图2步骤的第一导线层120,但不以此为限。In addition, since the carrier board 110 used in the above embodiments is a conductive substrate, no matter it is a whole metal substrate or a dielectric substrate with a conductive layer plated on the surface, the carrier board 110 can also be used to provide the The circuit chip 140 is used for heat dissipation, and it is reserved for the process after FIG. 6 . For example, FIGS. 8-10 are schematic cross-sectional views of the package substrate 300 corresponding to subsequent manufacturing steps according to the third embodiment of the present invention. When the above-mentioned first embodiment proceeds to the step of FIG. 6, if the carrier board 110 is intended to be used as a heat sink, the first wire layer 120 can be used as a heat sink for transferring the heat generated by the circuit chip 140 to the carrier board 110. path. In this embodiment, we can make the circuit layout layer of the package substrate separately on the molding compound layer 150; therefore, as shown in FIG. 8, a second wire layer 170 can be formed on the molding compound layer 150, so that The second wire layer 170 includes at least one second metal wire; for example, the second wire layer 170 has four second metal wires 171-174. The wire layer 120, but not limited thereto.

接着,如图9所示,一导电柱层180可形成于该第二导线层170上,该导电柱层180包含至少一金属柱状物;例如,该导电柱层180具有四个金属柱状物181~184,其分别对应该等第二金属走线171~174。Next, as shown in FIG. 9, a conductive column layer 180 can be formed on the second wire layer 170, and the conductive column layer 180 includes at least one metal column; for example, the conductive column layer 180 has four metal columns 181 ˜184, which respectively correspond to the second metal wires 171-174.

接着,如图10所示,形成一介电材料层190于该铸模化合物层150上,并使得该介电材料层190包覆该铸模化合物层150上的该等第二金属走线171~174与该等金属柱状物181~184。该介电材料层190的制作方式及组成材质可参照如图6步骤的该铸模化合物层150,但不以此为限Next, as shown in FIG. 10 , a dielectric material layer 190 is formed on the mold compound layer 150 such that the dielectric material layer 190 covers the second metal traces 171-174 on the mold compound layer 150 and the metal pillars 181-184. The manufacturing method and composition material of the dielectric material layer 190 can refer to the mold compound layer 150 as shown in the steps in Figure 6, but it is not limited thereto.

此外,我们可以图1的封装基板100为基础,因应不同的需求或用途而作进一步的应用。例如,在该封装基板100的下方制作锡球(Solder ball)以连接外部电路;在该封装基板100的上方迭加表面粘着技术(Surface-Mount Technology,简称SMT)元件或是其他的电路晶片或晶粒;在该封装基板100的上方或下方迭加其他的封装基板,形成多层结构的封装基板。In addition, we can use the package substrate 100 in FIG. 1 as a basis for further applications according to different requirements or uses. For example, make solder balls (Solder ball) under the package substrate 100 to connect external circuits; overlay the package substrate 100 with Surface-Mount Technology (SMT) components or other circuit chips or Die: stack other packaging substrates above or below the packaging substrate 100 to form a multi-layer packaging substrate.

以上这些实施例仅是范例性的,并不对本发明的范围构成任何限制。本领域技术人员应该理解的是,在不偏离本发明的精神和范围下可以对本发明技术方案的细节和形式进行修改或替换,但这些修改和替换均落入本发明的保护范围内。The above embodiments are only exemplary, and do not constitute any limitation to the scope of the present invention. Those skilled in the art should understand that the details and forms of the technical solutions of the present invention can be modified or replaced without departing from the spirit and scope of the present invention, but these modifications and replacements all fall within the protection scope of the present invention.

Claims (11)

1. a kind of package substrate, it is characterised in that include:
One conductor layer, includes an at least metal routing;
One conductive connecting elements, on the conductor layer;
One circuit chip, with least one external foot pad, and is arranged on the conductive connecting elements;With And
One conductive film, coats the conductor layer, the conductive connecting elements and the circuit chip;
Wherein, the conductive connecting elements to connect at least one external foot pad one of them with this extremely One of them of a few metal routing.
2. package substrate as claimed in claim 1, it is characterised in that the conductive connecting elements are a gold medal Belong to column.
3. package substrate as claimed in claim 1, it is characterised in that the conductive connecting elements are a weldering Tin projection thing.
4. package substrate as claimed in claim 1, it is characterised in that further include a fin, it sets It is placed on the circuit chip, and connects the circuit chip.
5. package substrate as claimed in claim 1, it is characterised in that further include a metal loading plate, It is arranged under the conductor layer.
6. a kind of preparation method of package substrate, it is characterised in that step is included:
(A) loading plate is provided;
(B) conductor layer No.1 is formed on the loading plate so that the conductor layer No.1 includes at least one First metal routing;
(C) conductive connecting elements are formed on the conductor layer No.1;
(D) set a circuit chip with least one external foot pad on the conductive connecting elements, make Obtain the conductive connecting elements connect at least one external foot pad one of them with this at least one One of them of first metal routing;And
(E) conductive film is formed on the circuit chip, and make it that the conductive film fills The space filled out between the circuit chip and the loading plate.
7. preparation method as claimed in claim 6, it is characterised in that the conductive connecting elements are one the One columnar metal thing.
8. preparation method as claimed in claim 6, it is characterised in that the conductive connecting elements are a weldering Tin projection thing.
9. preparation method as claimed in claim 6, it is characterised in that further include:
(F1) conductive film of part is removed, to expose the upper surface of the circuit chip;And
(F2) loading plate is removed.
10. preparation method as claimed in claim 9, it is characterised in that further include:
One fin is set on the circuit chip so that the fin connects the upper table of the circuit chip Face.
11. preparation method as claimed in claim 6, it is characterised in that further include:
(H1) one second conductor layer is formed on the conductive film so that second conductor layer is included At least one second metal routing;
(H2) conductive posts are formed on second conductor layer, the conductive posts include at least one second Columnar metal thing;And
(H3) dielectric materials layer is formed on the conductive film, and causes the dielectric materials layer bag Cover at least one second metal routings all on the conductive film with this at least 1 the Two columnar metal things.
CN201610004607.6A 2016-01-05 2016-01-05 Package substrate and manufacturing method thereof Pending CN106941101A (en)

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