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CN106935734B - Inspection device, vacuum drying device and control method of vacuum drying device - Google Patents

Inspection device, vacuum drying device and control method of vacuum drying device Download PDF

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CN106935734B
CN106935734B CN201610881393.0A CN201610881393A CN106935734B CN 106935734 B CN106935734 B CN 106935734B CN 201610881393 A CN201610881393 A CN 201610881393A CN 106935734 B CN106935734 B CN 106935734B
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CN106935734A (en
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佐田彻也
佐竹顺
植田稔彦
西山淳
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Tokyo Electron Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/70Testing, e.g. accelerated lifetime tests
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/861Repairing

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

本发明提供一种检查装置、减压干燥装置和减压干燥装置的控制方法,能够在早期检测基板中涂敷有有机材料的涂敷区域的干燥状态。一种实施方式的检查装置包括拍摄部和干燥状态检测部。拍摄部对基板中涂敷有有机材料的涂敷区域进行拍摄。干燥状态检测部基于由拍摄部所拍摄的涂敷区域的色浓度来检测涂敷区域的干燥状态。

The present invention provides an inspection device, a reduced-pressure drying device, and a control method of the reduced-pressure drying device, capable of early detection of the drying state of a coated area of a substrate coated with an organic material. An inspection device according to one embodiment includes an imaging unit and a dry state detection unit. The imaging unit captures an image of a coated area of the substrate on which the organic material is applied. The dry state detection unit detects the dry state of the applied area based on the color density of the applied area captured by the imaging unit.

Description

检查装置、减压干燥装置和减压干燥装置的控制方法Inspection device, vacuum drying device and control method of vacuum drying device

技术领域technical field

本发明的实施方式涉及检查装置、减压干燥装置和减压干燥装置的控制方法。Embodiments of the present invention relate to an inspection device, a reduced-pressure drying device, and a control method of the reduced-pressure drying device.

背景技术Background technique

在现有技术中,公知的是利用了有机EL(Electroluminescence:电致发光)发光的发光二极管即有机发光二极管(OLED:Organic Light Emitting Diode)。使用了有机发光二极管的有机EL显示器不仅薄型轻量且低耗电,而且具有在响应速度和视角以及对比度方面优异这样的优点。因此,近年来作为下一代的平板显示器(FPD)受到关注。Conventionally, an organic light emitting diode (OLED: Organic Light Emitting Diode), which is a light emitting diode that utilizes organic EL (Electroluminescence: electroluminescence) to emit light, is known. An organic EL display using an organic light emitting diode is not only thin, lightweight, and low in power consumption, but also has the advantages of being excellent in response speed, viewing angle, and contrast. Therefore, in recent years, it has attracted attention as a next-generation flat panel display (FPD).

有机发光二极管具有在基板上的阳极与阴极之间夹着有机EL层的构造。有机EL层例如从阳极侧起依次层叠空穴注入层、空穴输送层、发光层、电子输送层、电子注入层而形成。在这样的层叠结构中,例如空穴注入层、空穴输送层和发光层分别通过在基板上以喷涂方式涂敷有机材料,并在减压环境下使涂敷有有机材料的基板干燥来形成(例如参照专利文献1)。An organic light emitting diode has a structure in which an organic EL layer is sandwiched between an anode and a cathode on a substrate. The organic EL layer is formed by stacking, for example, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer in this order from the anode side. In such a stacked structure, for example, a hole injection layer, a hole transport layer, and a light emitting layer are formed by spraying an organic material on a substrate and drying the substrate coated with the organic material under a reduced pressure environment. (For example, refer to Patent Document 1).

但是,上述的直至干燥完成的干燥时间例如根据被涂敷在基板的有机材料的种类和量、基板的表面状态等各种因素而发生变化。因此,例如在量产有机发光二极管的情况下,需要事先设定最佳的干燥时间的工作。However, the above-mentioned drying time until the completion of drying varies depending on various factors such as the type and amount of the organic material coated on the substrate, the surface state of the substrate, and the like. Therefore, for example, in the case of mass-producing organic light emitting diodes, it is necessary to set an optimum drying time in advance.

在现有技术中,例如,将进行干燥处理的时间一点一点改变的同时制作大量的样品,测量所制作的样品的各层的膜厚和光学特性。然后,在得到了良好的测定结果的样品的情况下,断定为可靠地完成了干燥,将对这样的样品所进行的干燥处理的时间设定为最佳的干燥时间。In conventional techniques, for example, a large number of samples are produced while changing the time for performing the drying treatment little by little, and the film thickness and optical properties of each layer of the produced samples are measured. Then, in the case of a sample in which a good measurement result was obtained, it is judged that drying has been reliably completed, and the time of drying treatment for such a sample is set as an optimum drying time.

现有技术文献prior art literature

专利文献patent documents

专利文献1:日本特开2000-181079号公报Patent Document 1: Japanese Patent Laid-Open No. 2000-181079

发明内容Contents of the invention

发明想要解决的技术问题The technical problem that the invention wants to solve

但是,在现有技术中,因为通过在样品做成后测量膜厚和光学特性,检测基板的干燥状态,所以需要较多的时间。因此,在现有技术中,对于在早期检测基板的干燥状态方面还有改善的余地。However, in the prior art, it takes a lot of time to detect the drying state of the substrate by measuring the film thickness and optical characteristics after the sample is prepared. Therefore, in the prior art, there is still room for improvement in detecting the drying state of the substrate at an early stage.

实施方式的一个方式的目的在于,提供一种能够在早期检测在基板涂敷有有机材料的涂敷区域的干燥状态的检查装置、减压干燥装置和减压干燥装置的控制方法。An object of one embodiment of the present invention is to provide an inspection device, a reduced-pressure drying device, and a control method for a reduced-pressure drying device capable of early detection of a drying state of a coating region of a substrate coated with an organic material.

用于解决技术问题的技术方案Technical solutions for technical problems

实施方式的一个方式的检查装置具有拍摄部和干燥状态检测部。拍摄部拍摄在基板中涂敷有有机材料的涂敷区域。干燥状态检测部基于由上述拍摄部拍摄的上述涂敷区域的色浓度来检测上述涂敷区域的干燥状态。An inspection device according to one aspect of the embodiment includes an imaging unit and a dry state detection unit. The imaging unit captures an image of a coating area on the substrate where the organic material is coated. The dry state detecting unit detects the dry state of the applied area based on the color density of the applied area captured by the imaging unit.

发明效果Invention effect

根据实施方式的一个方式,能够在早期检测出基板中涂敷有有机材料的涂敷区域的干燥状态。According to one aspect of the embodiment, it is possible to detect the drying state of the coated region of the substrate where the organic material is coated at an early stage.

附图说明Description of drawings

图1是表示有机发光二极管的构成的概况的示意截面图。FIG. 1 is a schematic cross-sectional view showing an outline of the structure of an organic light emitting diode.

图2是表示有机发光二极管的堤的构成的概括的示意平面图。FIG. 2 is a schematic plan view showing an outline of the structure of a bank of an organic light emitting diode.

图3是表示有机发光二极管的制造方法的主要的步骤的流程图。FIG. 3 is a flowchart showing main steps in a method of manufacturing an organic light emitting diode.

图4是表示本实施方式的基板处理系统的构成的概括的示意平面图。FIG. 4 is a schematic plan view showing an outline of the configuration of the substrate processing system according to the present embodiment.

图5A是表示涂敷有用于形成空穴注入层的有机材料的基板的示意截面图。5A is a schematic cross-sectional view showing a substrate coated with an organic material for forming a hole injection layer.

图5B是表示在减压干燥装置中被减压干燥后的基板的示意截面图。5B is a schematic cross-sectional view showing a substrate dried under reduced pressure in a reduced-pressure drying apparatus.

图6A是表示涂敷有用于形成空穴输送层的有机材料的基板的示意截面图。6A is a schematic cross-sectional view showing a substrate coated with an organic material for forming a hole transport layer.

图6B是表示在减压干燥装置中被减压干燥后的基板的示意截面图。6B is a schematic cross-sectional view showing a substrate dried under reduced pressure in a reduced-pressure drying device.

图7A是表示涂敷有用于形成发光层的有机材料的基板的示意截面图。7A is a schematic cross-sectional view showing a substrate coated with an organic material for forming a light emitting layer.

图7B是表示在减压干燥装置中被减压干燥后的基板的示意截面图。7B is a schematic cross-sectional view showing a substrate dried under reduced pressure in a reduced-pressure drying device.

图8是表示本实施方式的减压干燥装置的构成的示意平面图。Fig. 8 is a schematic plan view showing the configuration of the reduced-pressure drying device of the present embodiment.

图9是表示图8的IX-IX线示意截面图。FIG. 9 is a schematic cross-sectional view taken along line IX-IX of FIG. 8 .

图10是表示控制装置的框图。Fig. 10 is a block diagram showing a control device.

图11是放大表示拍摄部所拍摄的拍摄图像的一部分的示意放大图。FIG. 11 is a schematic enlarged view showing a part of a captured image captured by the imaging unit in an enlarged manner.

图12是表示减压干燥处理中由色浓度测量部所测量的色浓度的图表。FIG. 12 is a graph showing the color density measured by the color density measuring unit in the reduced-pressure drying process.

图13是表示具备本实施方式的检查装置的减压干燥装置中,设定干燥时间的处理的处理流程的流程图。13 is a flowchart showing a processing flow of processing for setting a drying time in a reduced-pressure drying device including the inspection device according to the present embodiment.

图14是表示周边部的涂敷区域和中央部的涂敷区域的G色浓度的图表。FIG. 14 is a graph showing the G color density in the application area of the peripheral portion and the application area of the central portion.

图15是表示第二实施方式的拍摄单元的拍摄部附近的示意放大截面图。15 is a schematic enlarged cross-sectional view showing the vicinity of an imaging unit of an imaging unit according to a second embodiment.

附图标记说明Explanation of reference signs

11、311 拍摄部11. 311 Filming Department

12、312 照明部12. 312 Lighting Department

21 涂敷区域21 Application area

100 基板处理系统100 substrate handling system

121c、122c、123c 减压干燥装置121c, 122c, 123c Vacuum drying device

140 控制装置140 Controls

141 控制部141 Control Department

141a 照明控制部141a Lighting Control Division

141b 拍摄控制部141b Shooting Control Unit

141c 图像取得部141c Image Acquisition Department

141d 色浓度测量部141d Color density measurement unit

141e 判断部141e Judgment Department

141f 干燥状态检测部141f Dry state detection part

141g 减压控制部141g Decompression Control Unit

141h 升降控制部141h Lift control department

160 基板保持机构160 Substrate holding mechanism

161 保持部161 Keeping Department

163 升降部163 Lifting Department

170 减压机构170 decompression mechanism

200 检查装置200 Inspection device

400 偏振滤光片400 polarizing filter

G 基板。G substrate.

具体实施方式Detailed ways

以下,基于附图详细说明本发明所公开的检查装置、减压干燥装置和减压干燥装置的控制方法的实施方式。此外,本发明并不限定于以下所示的实施方式。Hereinafter, embodiments of the inspection device, the reduced-pressure drying device, and the control method for the reduced-pressure drying device disclosed in the present invention will be described in detail based on the drawings. In addition, this invention is not limited to embodiment shown below.

(第一实施方式)(first embodiment)

<1.有机发光二极管的构成和制造方法><1. Structure and Manufacturing Method of Organic Light Emitting Diode>

首先,利用图1~图3对有机发光二极管的构成的概况及其制造方法进行说明。图1是表示有机发光二极管500的构成的概况的示意性截面图。图2是表示有机发光二极管500的堤(bank)540的构成的概略的示意性平面图。图3是表示有机发光二极管500的制造方法的主要步骤的流程图。First, the outline of the structure of the organic light emitting diode and its manufacturing method will be described with reference to FIGS. 1 to 3 . FIG. 1 is a schematic cross-sectional view showing an outline of the configuration of an organic light emitting diode 500 . FIG. 2 is a schematic plan view showing a schematic configuration of a bank 540 of the organic light emitting diode 500 . FIG. 3 is a flowchart showing main steps of a method of manufacturing an organic light emitting diode 500 .

如图1所示,有机发光二极管500在作为基板的玻璃基板G(以下记作“基板G”)上具有在阳极510和阴极520之间夹着有机EL层530的构造。As shown in FIG. 1 , the organic light emitting diode 500 has a structure in which an organic EL layer 530 is sandwiched between an anode 510 and a cathode 520 on a glass substrate G (hereinafter referred to as “substrate G”) as a substrate.

有机EL层530通过从阳极510侧依次层叠空穴注入层531、空穴输送层532、发光层533、电子输送层534和电子注入层535而形成。The organic EL layer 530 is formed by stacking a hole injection layer 531 , a hole transport layer 532 , a light emitting layer 533 , an electron transport layer 534 , and an electron injection layer 535 sequentially from the anode 510 side.

具体而言,首先,在阳极形成处理(图3的步骤S101)中,在基板G上形成阳极510。阳极510例如使用蒸镀法形成。此外,在阳极510例如使用由ITO(Indium Tin Oxide:氧化铟锡)构成的透明电极。Specifically, first, the anode 510 is formed on the substrate G in the anode formation process (step S101 in FIG. 3 ). The anode 510 is formed using, for example, a vapor deposition method. In addition, a transparent electrode made of, for example, ITO (Indium Tin Oxide: indium tin oxide) is used as the anode 510 .

接着,在堤形成处理(图3的步骤S102)中,在阳极510上形成堤540。堤540例如通过光刻处理或者蚀刻处理等图案化为规定的图案。Next, in a bank forming process (step S102 in FIG. 3 ), a bank 540 is formed on the anode 510 . The bank 540 is patterned into a predetermined pattern by, for example, photolithography or etching.

如图2所示,堤540在行方向和列方向上形成有多个。并且,在堤540的内部,如后文所述,层叠有机EL层530和阴极520而形成像素。在堤540中,例如使用感光性聚酰亚胺树脂。As shown in FIG. 2 , a plurality of banks 540 are formed in the row direction and the column direction. In addition, inside the bank 540, as will be described later, the organic EL layer 530 and the cathode 520 are stacked to form a pixel. In the bank 540, for example, a photosensitive polyimide resin is used.

接着,在堤540的阳极510上形成有机EL层530。具体而言,在空穴注入层形成处理(图3的步骤S103)中,在阳极510上形成空穴注入层531。然后,在空穴输送层形成处理(图3的步骤S104)中,在空穴注入层531上形成空穴输送层532。Next, the organic EL layer 530 is formed on the anode 510 of the bank 540 . Specifically, in the hole injection layer forming process (step S103 in FIG. 3 ), the hole injection layer 531 is formed on the anode 510 . Then, in the hole transport layer forming process (step S104 in FIG. 3 ), the hole transport layer 532 is formed on the hole injection layer 531 .

然后,在发光层形成处理(图3的步骤S105)中,在空穴输送层532上形成发光层533。此外,在发光层533中包含R色发光层(红色发光层)、G色发光层(绿色发光层)和B色发光层(蓝色发光层)。Then, in the light emitting layer forming process (step S105 in FIG. 3 ), the light emitting layer 533 is formed on the hole transport layer 532 . In addition, the light-emitting layer 533 includes an R-color light-emitting layer (red light-emitting layer), a G-color light-emitting layer (green light-emitting layer), and a B-color light-emitting layer (blue light-emitting layer).

接着,在电子输送层形成处理(图3的步骤S106)中,在发光层533上形成电子输送层534,在电子注入层形成处理(图3的步骤S107)中,在电子输送层534上形成电子注入层535。Next, in the electron transport layer forming process (step S106 in FIG. 3 ), the electron transport layer 534 is formed on the light emitting layer 533, and in the electron injection layer forming process (step S107 in FIG. 3 ), an electron transport layer 534 is formed on the electron transport layer 534. Electron injection layer 535 .

在本实施方式中,在后述的基板处理系统100中分别形成空穴注入层531、空穴输送层532和发光层533。在基板处理系统100中,依次进行基于喷涂方式的有机材料的涂敷处理、有机材料的减压干燥处理、有机材料的烧制处理,形成这些空穴注入层531、空穴输送层532和发光层533。此外,关于空穴注入层531、空穴输送层532和发光层533的形成使用图4~图7B等进行叙述。In this embodiment, the hole injection layer 531 , the hole transport layer 532 , and the light emitting layer 533 are each formed in the substrate processing system 100 described later. In the substrate processing system 100, the coating process of the organic material based on the spray coating method, the decompression drying process of the organic material, and the firing process of the organic material are sequentially performed to form the hole injection layer 531, the hole transport layer 532 and the light emitting layer. Layer 533. In addition, the formation of the hole injection layer 531, the hole transport layer 532, and the light emitting layer 533 will be described using FIGS. 4 to 7B and the like.

另外,电子输送层534和电子注入层535分别例如使用蒸镀法形成。In addition, the electron transport layer 534 and the electron injection layer 535 are each formed using, for example, a vapor deposition method.

并且,在阴极形成处理(图3的步骤S108)中,在电子注入层535上形成阴极520。阴极520例如使用蒸镀法形成。此外,在阴极520中例如能够使用铝。Then, in the cathode forming process (step S108 in FIG. 3 ), the cathode 520 is formed on the electron injection layer 535 . The cathode 520 is formed using, for example, a vapor deposition method. In addition, aluminum, for example, can be used for the cathode 520 .

并且,为了将经由步骤S101~S108所形成的层叠构造与大气中的水分等阻隔,对其进行密封处理(图3的步骤S109)。Then, the laminated structure formed through steps S101 to S108 is sealed from moisture in the atmosphere and the like (step S109 in FIG. 3 ).

在经由这样的成膜步骤~密封步骤所制造的有机发光二极管500中,通过对阳极510与阴极520之间施加电压,在空穴注入层531所注入的规定数量的空穴经由空穴输送层532被输送到发光层533。In the organic light emitting diode 500 manufactured through such a film forming step to a sealing step, by applying a voltage between the anode 510 and the cathode 520, a predetermined number of holes injected into the hole injection layer 531 pass through the hole transport layer. 532 is transported to the light-emitting layer 533 .

另外,在电子注入层535所注入的规定数量的电子经由电子输送层534被输送到发光层533。并且,在发光层533内空穴和电子再结合形成激励状态的分子,发光层533发光。In addition, a predetermined number of electrons injected into the electron injection layer 535 are transported to the light emitting layer 533 via the electron transport layer 534 . Then, holes and electrons recombine in the light emitting layer 533 to form molecules in an excited state, and the light emitting layer 533 emits light.

<2.基板处理系统的构成><2. Substrate processing system configuration>

接着,参照图4说明具备本实施方式的检查装置和减压干燥装置的基板处理系统100的构成。图4是表示本实施方式的基板处理系统100的构成的概略的示意性平面图。此外,图4中为了易于理解地表示检查装置200,以规定的图案涂抹检查装置200来示意性表示。Next, the configuration of a substrate processing system 100 including the inspection device and the reduced-pressure drying device according to the present embodiment will be described with reference to FIG. 4 . FIG. 4 is a schematic plan view showing an outline of the configuration of the substrate processing system 100 according to this embodiment. In addition, in FIG. 4 , in order to show the inspection device 200 easily, the inspection device 200 is schematically shown with a predetermined pattern.

此外,在下文中,为了使位置关系明确,规定相互正交的X轴方向、Y轴方向和Z轴方向,将Z轴正方向设定为向铅直方向上方。In addition, hereinafter, in order to clarify the positional relationship, mutually orthogonal X-axis directions, Y-axis directions, and Z-axis directions are defined, and the Z-axis positive direction is set to be vertically upward.

如图4所示,向基板处理系统100搬入基板G,该基板G为预先经由阳极形成处理和堤形成处理(参照图3的步骤S101和S102)形成了阳极510和堤540的基板G。然后,在基板处理系统100中,进行与图3的步骤S103~S105相应的各处理,在基板G上形成空穴注入层531、空穴输送层532和发光层533之后,向电子输送层形成处理(参照图3的步骤S106)搬出。As shown in FIG. 4 , a substrate G on which an anode 510 and a bank 540 have been formed in advance through an anode forming process and a bank forming process (refer to steps S101 and S102 in FIG. 3 ) is loaded into the substrate processing system 100 . Then, in the substrate processing system 100, each process corresponding to steps S103 to S105 in FIG. The processing (refer to step S106 in FIG. 3 ) is carried out.

如图4所示,基板处理系统100具有搬入站110、处理站120和搬出站130连接为一体的构成。搬入站110从外部将多个基板G以晶盒C单位搬入,并从晶盒C取出处理前的基板G。As shown in FIG. 4 , the substrate processing system 100 has a configuration in which a carry-in station 110 , a processing station 120 , and a carry-out station 130 are integrally connected. The carrying-in station 110 carries in a plurality of substrates G in units of a cell C from the outside, and takes out the substrate G from the cell C before processing.

处理站120包括:对基板G进行空穴注入层形成处理的空穴注入层形成模块121;和对空穴注入层形成处理后的基板G进行空穴输入层形成处理的空穴输入层形成模块122。此外,处理站120具有对空穴输入层形成处理后的基板G进行发光层形成处理的发光层形成模块123。The processing station 120 includes: a hole injection layer forming module 121 for performing a hole injection layer forming process on the substrate G; and a hole input layer forming module for performing a hole input layer forming process on the substrate G after the hole injection layer forming process 122. Furthermore, the processing station 120 has a light emitting layer forming module 123 for performing a light emitting layer forming process on the substrate G after the hole input layer forming process.

搬出站130将处理后的基板G收纳在晶盒C内,并将多个基板G以晶盒C单位向外部搬出。The unloading station 130 stores the processed substrates G in the cassette C, and unloads a plurality of substrates G in units of the cassette C to the outside.

搬入站110、空穴注入层形成模块121、空穴输送层形成模块122、发光层形成模块123和搬出站130在从X轴负方向向X轴正方向按照该顺序被排列配置。The loading station 110 , hole injection layer forming module 121 , hole transport layer forming module 122 , light emitting layer forming module 123 and unloading station 130 are arranged in this order from the X-axis negative direction to the X-axis positive direction.

搬入站110包括晶盒载置台111、搬送通路112和基板搬送体113。晶盒载置台111将多个晶盒C在Y轴方向上自由载置成一列。The carry-in station 110 includes a cassette mounting table 111 , a conveyance path 112 , and a substrate conveyance body 113 . The cell mounting table 111 freely mounts the some cell C in a row in the Y-axis direction.

搬送通路112设置为在Y轴方向上延伸。基板搬送体113设置为能够在上述搬送通路112上移动并且能够在Z轴方向和能够绕Z轴移动,在晶盒C与处理站120之间搬送基板G。此外,基板搬送体113例如在吸附保持基板G的同时将其搬送。The conveyance path 112 is provided to extend in the Y-axis direction. The substrate transfer body 113 is provided movable on the transfer path 112 and movable in the Z-axis direction and around the Z-axis, and transfers the substrate G between the cassette C and the processing station 120 . In addition, the substrate transport body 113 transports the substrate G while sucking and holding it, for example.

在处理站120中,空穴注入层形成模块121包括涂敷装置121a、缓冲装置121b、减压干燥装置121c、热处理装置121d和温度调节装置121e。In the processing station 120, the hole injection layer forming module 121 includes a coating device 121a, a buffer device 121b, a reduced pressure drying device 121c, a heat treatment device 121d, and a temperature adjusting device 121e.

涂敷装置121a是对形成于基板G的阳极510上涂敷用于形成空穴注入层531的有机材料的装置。图5A是表示涂敷有用于形成空穴注入层531的有机材料的基板G的示意截面图。The coating device 121 a is a device for coating an organic material for forming the hole injection layer 531 on the anode 510 formed on the substrate G. 5A is a schematic cross-sectional view showing a substrate G coated with an organic material for forming a hole injection layer 531 .

如图5A所示,由涂敷装置121a以喷涂方式在基板G上的规定的位置即堤540的内部涂敷有机材料。该有机材料是将用于形成空穴注入层531的规定的材料溶解在有机溶剂中的溶液。As shown in FIG. 5A , an organic material is applied to a predetermined position on the substrate G, that is, the inside of the bank 540 , by the application device 121 a by spraying. The organic material is a solution in which a predetermined material for forming the hole injection layer 531 is dissolved in an organic solvent.

图4所示的缓冲装置121b是暂时收纳的多个基板G的装置。减压干燥装置121c是将由涂敷装置121a所涂敷的有机材料减压干燥的装置。The buffer device 121b shown in FIG. 4 is a device for temporarily storing a plurality of substrates G. The reduced-pressure drying device 121c is a device for drying the organic material coated by the coating device 121a under reduced pressure.

图5B是表示在减压干燥装置121c中被减压干燥后的基板G的示意截面图。从图5A与图5B的对比可知,在堤540的内部所涂敷的有机材料通过减压干燥被除去溶剂,由此成为在阳极510上层叠了膜厚均匀或者大致均匀的空穴注入层531的状态。FIG. 5B is a schematic cross-sectional view showing the substrate G dried under reduced pressure in the reduced-pressure drying device 121c. As can be seen from a comparison of FIG. 5A and FIG. 5B , the organic material coated inside the bank 540 is dried under reduced pressure to remove the solvent, thereby forming a hole injection layer 531 with a uniform or substantially uniform film thickness stacked on the anode 510. status.

图4所示的热处理装置121d是将由减压干燥装置121c干燥后的有机材料作为热处理进行烧制的装置。例如,热处理装置121d具有能够收纳基板G的腔室和配置在腔室内的热板(省略图示),利用来自热板的热进行有机材料的烧制。The heat treatment apparatus 121d shown in FIG. 4 is an apparatus for firing the organic material dried by the reduced-pressure drying apparatus 121c as heat treatment. For example, the thermal processing apparatus 121d has a chamber capable of accommodating the substrate G and a hot plate (not shown) arranged in the chamber, and burns the organic material using heat from the hot plate.

温度调节装置121e是将由热处理装置121d热处理后的基板G调节为规定的温度、例如常温的装置。此外,空穴注入层形成模块121中的涂敷装置121a、缓冲装置121b、减压干燥装置121c、热处理装置121d和温度调节装置121e的配置和个数能够任意地选择。The temperature adjustment device 121e is a device for adjusting the substrate G heat-treated by the heat treatment device 121d to a predetermined temperature, for example, normal temperature. In addition, the arrangement and number of the coating device 121a, the buffer device 121b, the reduced pressure drying device 121c, the heat treatment device 121d and the temperature adjustment device 121e in the hole injection layer forming module 121 can be selected arbitrarily.

另外,空穴注入层形成模块121具有基板搬送区域CR1~CR3和交接装置TR1~TR3。基板搬送区域CR1~CR3例如是搬送机械臂,将基板G分别搬送到相邻设置的各装置。In addition, the hole injection layer forming module 121 has substrate transfer regions CR1 to CR3 and transfer devices TR1 to TR3. The substrate conveyance regions CR1 to CR3 are, for example, conveyance robots, and convey the substrates G to respective devices adjacent to each other.

具体而言,基板搬送区域CR1将基板G搬送到与基板搬送区域CR1相邻的涂敷装置121a和缓冲装置121b。另外,基板搬送区域CR2将基板G搬送到与基板搬送区域CR2相邻的减压干燥装置121c。Specifically, the substrate conveyance region CR1 conveys the substrate G to the coating device 121 a and the buffer device 121 b adjacent to the substrate conveyance region CR1 . Moreover, the substrate conveyance area CR2 conveys the board|substrate G to the reduced-pressure drying apparatus 121c adjacent to the board|substrate conveyance area CR2.

另外,基板搬送区域CR3将基板G搬送到与该基板搬送区域CR3相邻的热处理装置121d和温度调节装置121e。此外,将基板G分别搬送到基板搬送区域CR1~CR3的基板搬送装置设置为在水平方向、铅直方向和绕铅直轴自由移动。In addition, the substrate transfer region CR3 transfers the substrate G to the heat treatment apparatus 121d and the temperature adjustment apparatus 121e adjacent to the substrate transfer region CR3. In addition, the substrate conveying devices for conveying the substrates G to the substrate conveying regions CR1 to CR3 are provided so as to freely move in the horizontal direction, the vertical direction, and around the vertical axis.

交接装置TR1~TR3分别依次地设置在搬入站110与基板搬送区域CR1之间、基板搬送区域CR1与CR2之间、基板搬送区域CR2与CR3之间,在它们之间进行基板G的交接。Delivery devices TR1 to TR3 are sequentially installed between the carry-in station 110 and the substrate transfer area CR1 , between the substrate transfer areas CR1 and CR2 , and between the substrate transfer areas CR2 and CR3 , and transfer the substrate G between them.

空穴输送层形成模块122包括涂敷装置122a、缓冲装置122b、减压干燥装置122c、热处理装置122d和温度调节装置122e。涂敷装置122a在形成于基板G的空穴注入层531上涂敷用于形成空穴输送层532的有机材料。图6A是表示涂敷有用于形成空穴输送层532的有机材料的基板G的示意截面图。The hole transport layer forming module 122 includes a coating device 122a, a buffer device 122b, a decompression drying device 122c, a heat treatment device 122d, and a temperature adjustment device 122e. The coating device 122a coats the organic material for forming the hole transport layer 532 on the hole injection layer 531 formed on the substrate G. 6A is a schematic cross-sectional view showing a substrate G coated with an organic material for forming a hole transport layer 532 .

如图6A所示,通过该涂敷装置122a以喷涂方式在基板G上的规定的位置、即堤540的内部涂敷有机材料。该有机材料是将用于形成空穴输送层532的规定的材料溶解于有机溶剂而成的溶液。As shown in FIG. 6A , an organic material is applied to a predetermined position on the substrate G, ie, inside the bank 540 , by the application device 122 a by spraying. The organic material is a solution obtained by dissolving a predetermined material for forming the hole transport layer 532 in an organic solvent.

关于图4所示的缓冲装置122b和减压干燥装置122c,由于与缓冲装置121b和减压干燥装置121c是大致同样的结构,所以省略详细的说明。The buffer device 122b and the reduced-pressure drying device 122c shown in FIG. 4 have substantially the same configuration as the buffer device 121b and the reduced-pressure drying device 121c, so detailed description thereof will be omitted.

图6B是表示在减压干燥装置122c中被减压干燥后的基板G的示意截面图。从图6A和图6B的对比可知,在堤540的内部所涂敷的有机材料通过减压干燥被除去溶剂,由此成为在空穴注入层531上层叠了膜厚均匀或者大致均匀的空穴输送层532的状态。FIG. 6B is a schematic cross-sectional view showing the substrate G dried under reduced pressure in the reduced-pressure drying device 122c. As can be seen from a comparison of FIG. 6A and FIG. 6B , the organic material coated inside the bank 540 is dried under reduced pressure to remove the solvent, thereby forming holes with a uniform or substantially uniform film thickness stacked on the hole injection layer 531 . The state of the transport layer 532 .

另外,由于热处理装置122d和温度调节装置122e也是与热处理装置121d和温度调节装置121e大致相同的构成,所以省略详细的说明。但是,在空穴输送层形成模块122中,热处理装置122d和温度调节装置122e内部维持为低氧且低露点气氛。In addition, since the heat processing apparatus 122d and the temperature adjustment apparatus 122e also have substantially the same structure as the heat processing apparatus 121d and the temperature adjustment apparatus 121e, detailed description is abbreviate|omitted. However, in the hole transport layer forming module 122, the interior of the heat treatment device 122d and the temperature adjustment device 122e is maintained in a low oxygen and low dew point atmosphere.

这里,所谓低氧气氛是指与大气相比氧浓度低的气氛,例如是氧浓度为10ppm以下的气氛。另外,所谓低露点气氛是指与大气相比露点温度低的气氛,例如是露点温度为-10℃以下的气氛。此外,这样的低氧且低露点气氛使用例如氮气等的不活泼气体维持。Here, the low-oxygen atmosphere refers to an atmosphere having a lower oxygen concentration than the air, for example, an atmosphere having an oxygen concentration of 10 ppm or less. In addition, the term "low dew point atmosphere" refers to an atmosphere having a dew point temperature lower than that of the air, for example, an atmosphere having a dew point temperature of -10°C or lower. In addition, such a low-oxygen and low-dew-point atmosphere is maintained using an inert gas such as nitrogen.

在空穴输送层形成模块122中,这些涂敷装置122a、缓冲装置122b、减压干燥装置122c、热处理装置122d和温度调节装置122e的数量和配置能够任意地选择。In the hole transport layer forming module 122, the number and arrangement of these coating devices 122a, buffer devices 122b, reduced-pressure drying devices 122c, heat treatment devices 122d, and temperature adjustment devices 122e can be selected arbitrarily.

另外,空穴输送层形成模块122包括基板搬送区域CR4~CR6和交接装置TR5以及TR6。此外,在空穴注入层形成模块121和空穴输送层形成模块122之间经由交接装置TR4连接。In addition, the hole transport layer forming module 122 includes substrate transfer regions CR4 to CR6 and delivery devices TR5 and TR6 . In addition, the hole injection layer forming module 121 and the hole transport layer forming module 122 are connected via a transfer device TR4.

这里,由于基板搬送区域CR4~CR6和交接装置TR5以及TR6是与上述的基板搬送区域CR1~CR3和交接装置TR1~TR3大致相同的构成,所以省略详细的说明。Here, since the substrate transfer regions CR4 to CR6 and the transfer devices TR5 and TR6 have substantially the same configuration as the substrate transfer regions CR1 to CR3 and transfer devices TR1 to TR3 described above, detailed description thereof will be omitted.

但是,如上所述,热处理装置122d和温度调节装置122e的内部被维持为低氧且低露点气氛,因此基板搬送区域CR6的内部也维持为低氧且低露点气氛。However, as described above, the interior of the heat treatment device 122d and the temperature adjustment device 122e is maintained in a low-oxygen and low-dew-point atmosphere, so the interior of the substrate transfer region CR6 is also maintained in a low-oxygen and low-dew-point atmosphere.

另外,连接上述的基板搬送区域CR6和基板搬送区域CR5的交接装置TR6构成为,暂时收纳基板G并且能够切换内部气氛、即设计成能够切换低氧且低露点气氛与大气气氛的闭锁装置。In addition, the transfer device TR6 connecting the substrate transfer area CR6 and the substrate transfer area CR5 described above is configured as a lock device designed to temporarily accommodate the substrate G and switch the internal atmosphere, that is, a low-oxygen low dew point atmosphere and an atmospheric atmosphere.

发光层形成模块123包括涂敷装置123a、缓冲装置123b、减压干燥装置123c、热处理装置123d和温度调节装置123e。The luminescent layer forming module 123 includes a coating device 123a, a buffer device 123b, a decompression drying device 123c, a heat treatment device 123d, and a temperature adjustment device 123e.

涂敷装置123a是在形成于基板G的空穴输送层532上涂敷用于形成发光层533的有机材料的装置。图7A是表示涂敷有用于形成发光层533的有机材料的基板G的示意截面图。The coating device 123a is a device for coating the organic material for forming the light emitting layer 533 on the hole transport layer 532 formed on the substrate G. 7A is a schematic cross-sectional view showing a substrate G coated with an organic material for forming a light emitting layer 533 .

如图7所示,在涂敷装置123a中,以喷涂方式在基板G上的规定的位置、即堤540的内部涂敷有机材料。这样的有机材料是将用于形成发光层533的规定的材料溶解在有机溶剂中而成的溶液。此外,在图7A中,在发光层533的R色发光层附加附图标记533R、在G色发光层附加附图标记533G、在B色发光层附加附图标记533B。As shown in FIG. 7 , in the coating device 123 a , an organic material is coated on a predetermined position on the substrate G, that is, inside the bank 540 , by spraying. Such an organic material is a solution obtained by dissolving a predetermined material for forming the light emitting layer 533 in an organic solvent. In addition, in FIG. 7A , the R color light emitting layer of the light emitting layer 533 is assigned a reference numeral 533R, the G color light emitting layer is assigned a reference numeral 533G, and the B color light emitting layer is assigned a reference numeral 533B.

关于图4所示的缓冲装置123b和减压干燥装置123c,由于是与上述的缓冲装置122b和减压干燥装置122c大致相同的构成,所以省略详细说明。The buffer device 123b and the reduced-pressure drying device 123c shown in FIG. 4 have substantially the same configuration as the buffer device 122b and the reduced-pressure drying device 122c described above, so detailed description thereof will be omitted.

图7B是表示在减压干燥装置123c中被减压干燥后的基板G的示意截面图。从图7A与图7B的对比可知,涂敷在堤540的内部的有机材料通过减压干燥被除去溶剂,由此成为在空穴输送层532上层叠了膜厚均匀或者大致均匀的发光层533的状态。Fig. 7B is a schematic cross-sectional view showing the substrate G dried under reduced pressure in the reduced-pressure drying device 123c. As can be seen from a comparison between FIG. 7A and FIG. 7B , the organic material coated inside the bank 540 is dried under reduced pressure to remove the solvent, thereby forming a light-emitting layer 533 with a uniform or substantially uniform film thickness stacked on the hole transport layer 532 . status.

在上述的减压干燥装置121c、122c、123c分别设置用于检测基板G的干燥状态的检查装置200。参照图8、图9在后文中叙述这些减压干燥装置121c、122c、123c和检查装置200的详细构成。The inspection apparatus 200 for detecting the dry state of the board|substrate G is provided in each of the above-mentioned reduced-pressure drying apparatuses 121c, 122c, and 123c. The detailed configuration of these reduced-pressure drying devices 121c, 122c, and 123c and the inspection device 200 will be described later with reference to FIGS. 8 and 9 .

接着图4的说明,关于缓冲装置123b和减压干燥装置123c,由于也与缓冲装置122b和减压干燥装置122c是大致同样的构成,所以省略详细的说明。Following the description of FIG. 4, the buffer device 123b and the reduced-pressure drying device 123c have substantially the same configuration as the buffer device 122b and the reduced-pressure drying device 122c, so detailed descriptions are omitted.

在发光层形成模块123中,这些涂敷装置123a、缓冲装置123b、减压干燥装置123c、热处理装置123b和温度调节装置123e的数量和配置能够任意地选择。In the light-emitting layer forming module 123, the number and arrangement of these coating devices 123a, buffer devices 123b, reduced-pressure drying devices 123c, heat treatment devices 123b, and temperature adjustment devices 123e can be selected arbitrarily.

发光层形成模块123包括基板搬送区域CR7~CR9和交接装置TR8~TR10。此外,空穴输送层形成模块122和发光层形成模块123之间经由交接装置TR7连接。The light emitting layer forming module 123 includes substrate transfer regions CR7 to CR9 and transfer devices TR8 to TR10. In addition, the hole transport layer forming module 122 and the light emitting layer forming module 123 are connected via the transfer device TR7.

这里,基板搬送区域CR7~CR9和交接装置TR7~TR9,由于与上述的基板搬送区域CR4~CR6和交接装置TR4~TR6是大致相同的构成,因此省略详细的说明。Here, since the substrate transfer regions CR7 to CR9 and the transfer devices TR7 to TR9 have substantially the same configuration as the substrate transfer regions CR4 to CR6 and transfer devices TR4 to TR6 described above, detailed description thereof will be omitted.

交接装置TR10设置在基板搬送区域CR9和搬出站130之间,在它们之间交接基板G。此外,交接装置TR10优选构成为,暂时收纳基板G并且能够切换内部气氛、即设计成能够切换低氧且低露点气氛与大气气氛的闭锁装置。The transfer device TR10 is installed between the substrate transfer region CR9 and the carry-out station 130, and transfers the substrate G between them. In addition, the transfer device TR10 is preferably configured as a lock device capable of temporarily storing the substrate G and switching the internal atmosphere, that is, a low-oxygen and low dew point atmosphere and an atmospheric atmosphere.

搬出站130包括晶盒载置台131、搬送通路132和基板搬送体133。晶盒载置台131将多个晶盒C在Y轴方向上自由载置成一列。The carry-out station 130 includes a cassette mounting table 131 , a conveyance path 132 , and a substrate conveyance body 133 . The cell mounting stand 131 freely mounts a plurality of cell C in a row in the Y-axis direction.

搬送通路132设置为在Y轴方向上延伸。基板搬送体133设置为能够在该搬送通路132上移动并且能够在Z轴方向和绕Z轴自由移动,在处理站120与晶盒C之间搬送基板G。此外,基板搬送体133例如在吸附保持基板G的同时进行搬送。此外,搬送站130的内部优选被维持为低氧且低露点气氛。The conveyance path 132 is provided to extend in the Y-axis direction. The substrate transport body 133 is provided movable on the transport path 132 and freely movable in the Z-axis direction and around the Z-axis, and transports the substrate G between the processing station 120 and the cassette C. In addition, the substrate transport body 133 transports the substrate G while suction-holding, for example. In addition, the inside of the transfer station 130 is preferably maintained in a low-oxygen and low-dew-point atmosphere.

另外,基板处理系统100具有控制装置140。控制装置140例如是计算机,包括控制部141和存储部142。在存储部142中保存有控制在基板处理系统100中执行的各种处理的程序。控制部141例如为CPU(Central Processing Unit:中央处理器),通过读取存储于存储部142中的程序并执行来控制基板处理系统100。In addition, the substrate processing system 100 has a control device 140 . The control device 140 is, for example, a computer, and includes a control unit 141 and a storage unit 142 . Programs for controlling various processes executed in the substrate processing system 100 are stored in the storage unit 142 . The control unit 141 is, for example, a CPU (Central Processing Unit: central processing unit), and controls the substrate processing system 100 by reading and executing a program stored in the storage unit 142 .

此外,该程序是记录在通过计算机能够读取的存储介质中的程序,也可以是从其存储介质存储在控制装置140的存储部142中的程序。作为通过计算机能够读取的存储介质,例如有硬盘(HD)、软盘(FD)、光盘(CD)、磁盘(MO)和存储卡等。此外,控制部141也可以是不使用程序而仅由硬盘构成。另外,关于控制装置140的具体的构成,参照图10在后文叙述。In addition, this program is a program recorded in a computer-readable storage medium, or may be a program stored in the storage unit 142 of the control device 140 from the storage medium. Examples of storage media that can be read by a computer include a hard disk (HD), a flexible disk (FD), an optical disk (CD), a magnetic disk (MO), and a memory card. In addition, the control unit 141 may be constituted only by a hard disk without using a program. In addition, the specific configuration of the control device 140 will be described later with reference to FIG. 10 .

但是,在上述的减压干燥装置121c、122c、123c中,直至干燥完成的干燥时间例如根据涂敷于基板G的有机材料的种类和量、基板G的表面状态、形成的层的种类等的因此发生变化。因此,例如在量产有机发光二极管500的情况下,必须要实现进行设定最佳的干燥时间的操作。However, in the above-mentioned reduced-pressure drying devices 121c, 122c, and 123c, the drying time until the drying is completed depends on, for example, the type and amount of the organic material applied to the substrate G, the surface state of the substrate G, the type of the formed layer, etc. Hence the change. Therefore, for example, in the case of mass-producing the organic light emitting diode 500 , it is necessary to implement an operation of setting an optimum drying time.

在现有技术中,通过制作大量的样品,测量所制作的样品的各层的膜厚和光学特性,设定最佳的干燥时间,因此在设定操作是需要花费时间。In the prior art, an optimum drying time is set by making a large number of samples, measuring the film thickness and optical characteristics of each layer of the prepared samples, and therefore time is required for setting operations.

但是,在本实施方式的减压干燥装置121c、122c、123c中,构成为具有对在基板G中涂敷有有机材料的涂敷区域的干燥状态进行检测的检查装置200。并且,这样的检查装置200中,对基板G的涂敷区域进行拍摄的同时测量所拍摄的涂敷区域的色浓度,基于所测量的色浓度检测涂敷区域的干燥状态。However, the reduced-pressure drying devices 121c, 122c, and 123c of the present embodiment are configured to include an inspection device 200 that detects the drying state of the coated region of the substrate G coated with an organic material. Furthermore, in such an inspection apparatus 200 , the color density of the imaged coated area is measured while imaging the coated area of the substrate G, and the dry state of the coated area is detected based on the measured color density.

像这样,加压干燥装置121c、122c、123c具有基于涂敷区域的色浓度检测干燥状态的检查装置,由此能够在早期检测涂敷区域的干燥状态。另外,由此也能够实现设定最佳的干燥时间的操作的高效化。In this way, the pressure drying apparatuses 121c, 122c, and 123c have an inspection device for detecting the dry state based on the color density of the applied area, thereby enabling early detection of the dried state of the applied area. In addition, it is also possible to improve the efficiency of the operation of setting the optimum drying time by this.

<3.检查装置和减压干燥装置的构成><3. Configuration of inspection device and decompression drying device>

以下参照图8、图9对本实施方式的具有检查装置200的减压干燥装置121c、122c、123c的构成进行说明。图8是表示本实施方式的减压干燥装置123c的构成的示意平面图,图9是表示图8的IX-IX线示意截面图。The configuration of the reduced-pressure drying apparatuses 121c, 122c, and 123c having the inspection apparatus 200 according to the present embodiment will be described below with reference to FIGS. 8 and 9 . FIG. 8 is a schematic plan view showing the configuration of a reduced-pressure drying device 123c according to this embodiment, and FIG. 9 is a schematic cross-sectional view showing line IX-IX in FIG. 8 .

此外,这里以减压干燥装置123c为例进行说明,但是由于减压干燥装置121c、122c、123c是大致相同的构成,所以以下的说明对于减压干燥装置121c、122c也是适合的。In addition, here, the reduced-pressure drying device 123c is described as an example, but since the reduced-pressure drying devices 121c, 122c, and 123c have substantially the same configuration, the following description is also applicable to the reduced-pressure drying devices 121c and 122c.

如图8和图9所示,减压干燥装置123c包括腔室150、基板保持机构160(参照图9)、减压机构170(参照图9)和检查装置200。As shown in FIGS. 8 and 9 , the decompression drying device 123 c includes a chamber 150 , a substrate holding mechanism 160 (see FIG. 9 ), a decompression mechanism 170 (see FIG. 9 ), and an inspection device 200 .

腔室150是能够将内部密闭的大致长方体状的处理容器。如图9所示,在腔室150中收纳有由基板保持机构160保持的基板G等。另外,在腔室150中,设置有开口部151和窗部152。具体而言,在腔室150的顶部150a,设置多个开口部151,在这些开口部151分别设置窗部152。The chamber 150 is a substantially rectangular parallelepiped processing container whose interior can be hermetically sealed. As shown in FIG. 9 , the substrate G and the like held by the substrate holding mechanism 160 are accommodated in the chamber 150 . In addition, in the chamber 150, an opening 151 and a window 152 are provided. Specifically, a plurality of openings 151 are provided on the ceiling 150 a of the chamber 150 , and windows 152 are respectively provided in these openings 151 .

窗部152是具有能够从腔室150的外部利用拍摄部11a~11c(后述)拍摄腔室150的内部的基板G的程度的透光性的玻璃。此外,窗部152例如由石英玻璃形成,但并不限定于此。另外,开口部151和窗部152的数量和配置能够任意地选择。The window portion 152 is glass having translucency to such an extent that the substrate G inside the chamber 150 can be imaged by the imaging units 11 a to 11 c (described later) from the outside of the chamber 150 . In addition, the window portion 152 is formed of, for example, quartz glass, but is not limited thereto. In addition, the number and arrangement of openings 151 and windows 152 can be selected arbitrarily.

基板保持机构160包括保持部161、支柱部162和升降部163。保持部161是载置台。具体而言,保持部161具有多个平板状的部件,载置并保持基板G。此外,在图9所示的例中,表示平板状的部件为5个,但并不限定于此。另外,构成保持部161的平板状的部件也可以是1个。The substrate holding mechanism 160 includes a holding portion 161 , a pillar portion 162 , and a lifting portion 163 . The holding unit 161 is a mounting table. Specifically, the holding unit 161 has a plurality of flat members, and places and holds the substrate G. As shown in FIG. In addition, in the example shown in FIG. 9, five flat members are shown, but it is not limited to this. In addition, there may be one flat member constituting the holding portion 161 .

支柱部162为在铅直方向上延伸的部件,基端部与升降部163连接,在前端部将保持部161水平地支承。升降部163例如为电动电极等的驱动源,使支柱部162和保持部161在铅直方向上升降。由此,保持在保持部161的基板G能够升降。此外,升降部163与保持部161为相同个数,分别与多个保持部161连接,但在图9中,为了图示的简化,将升降部163示意性地表示为1个模块。The pillar part 162 is a member extending in the vertical direction, the base end part is connected to the lift part 163, and the holding|maintenance part 161 is horizontally supported by the front-end|tip part. The raising and lowering unit 163 is, for example, a driving source of the electromotive electrode, and moves the pillar unit 162 and the holding unit 161 up and down in the vertical direction. Accordingly, the substrate G held by the holding portion 161 can be raised and lowered. In addition, the elevating unit 163 is the same number as the holding unit 161 , and is connected to a plurality of holding units 161 , but in FIG. 9 , the elevating unit 163 is schematically shown as one module for simplification of illustration.

另外,基于升降部163的保持部161的升降,如后所述在减压干燥时进行,但也可以在基板G的搬入搬出时进行。即,例如在基板G被从基板搬送区域CR8(参照图4)向减压干燥装置123c搬入的情况下,升降部163首先使多个保持部161的一部分(例如保持基板G的中央部的保持部161的位于两侧的保持部161)下降。In addition, although the raising and lowering of the holding part 161 by the raising and lowering part 163 is performed at the time of depressurization drying as mentioned later, it may also be performed at the time of loading and unloading of the board|substrate G. That is, for example, when the substrate G is carried into the reduced-pressure drying device 123c from the substrate transfer region CR8 (see FIG. The holding parts 161) on both sides of the part 161 are lowered.

然后,载置了基板G的基板搬送装置的叉部(未图示)被插入到下降了的保持部161的上方的空间,之后叉部被降低,基板G被载置在没有下降的保持部161。接着,拔出叉部,升降部163使下降了的保持部161上升至原来的位置,如图9所示,成为基板G被保持部161保持的状态。Then, the fork portion (not shown) of the substrate transfer device on which the substrate G is placed is inserted into the space above the lowered holding portion 161, and then the fork portion is lowered, and the substrate G is placed on the non-lowered holding portion. 161. Next, the fork is pulled out, and the lifting unit 163 raises the lowered holding unit 161 to its original position, and as shown in FIG. 9 , the board G is held by the holding unit 161 .

减压机构170与腔室150连接,将腔室150的内部气氛减压到例如1Pa以下。此外,作为减压机构170,例如能够使用干泵、机械增压泵、涡轮分子泵等的真空泵。The decompression mechanism 170 is connected to the chamber 150, and depressurizes the internal atmosphere of the chamber 150 to 1 Pa or less, for example. In addition, as the decompression mechanism 170, for example, a vacuum pump such as a dry pump, a mechanical booster pump, or a turbomolecular pump can be used.

检查装置200包括第一拍摄单元210a、第二拍摄单元210b和第三拍摄单元210c。此外,拍摄单元的数量并不限定于例示,可以为2台以下或者4台以上。The inspection device 200 includes a first photographing unit 210a, a second photographing unit 210b, and a third photographing unit 210c. In addition, the number of imaging units is not limited to illustration, and may be 2 or less or 4 or more.

第一~第三拍摄单元210a~210b配置在窗部152的附近且在腔室150的外部。具体而言,第一、第三拍摄单元210a、210c配置在位于基板G的周边部的上方的窗部152的附近,第二拍摄单元210b配置在位于基板G的中央部的上方的窗部152的附近。The first to third imaging units 210 a to 210 b are arranged near the window portion 152 and outside the chamber 150 . Specifically, the first and third imaging units 210a and 210c are disposed near the window portion 152 located above the peripheral portion of the substrate G, and the second imaging unit 210b is disposed near the window portion 152 located above the central portion of the substrate G. near.

以下,以第一拍摄单元210a为例进行说明,但是第一~第三拍摄单元210a~210c是大致相同的构成,因此,以下的说明对于第二、第三拍摄单元210b、210c也是适合的。此外,在图8、图9中关于第二、第三拍摄单元210b、210c的构成要素,对于第一拍摄单元210a相同构成要素,标注相同的序号但只改变了末尾的字母的附图标记,省略详细说明。Hereinafter, the first imaging unit 210a will be described as an example, but the first to third imaging units 210a to 210c have substantially the same configuration, so the following description is also applicable to the second and third imaging units 210b and 210c. In addition, in FIG. 8 and FIG. 9, regarding the constituent elements of the second and third photographing units 210b and 210c, for the same constituent elements of the first photographing unit 210a, the same serial numbers are marked but only the letters at the end are changed. Detailed description is omitted.

第一拍摄单元210a包括拍摄部11a、照明部12a和焦点调整部13a。拍摄部11a位于窗部152的上方,拍摄基板G,具体而言经由窗部152拍摄基板G中涂敷有有机材料的涂敷区域(后述)。像这样,通过在腔室150设置拍摄用的窗部152,虽然是简单的构成,但能够从腔室150的外侧拍摄腔室150内的基板G。The first photographing unit 210a includes a photographing unit 11a, an illumination unit 12a, and a focus adjustment unit 13a. The imaging unit 11 a is positioned above the window portion 152 , and images the substrate G, specifically, the coating region (described later) on which the organic material is applied in the substrate G through the window portion 152 . Thus, by providing the imaging window 152 in the chamber 150 , the substrate G in the chamber 150 can be imaged from the outside of the chamber 150 , although it is a simple configuration.

另外,拍摄部11a配置成该拍摄部11a的光轴与基板G的主面垂直。此外,作为拍摄部11a,例如能够使用具有长焦透镜的CCD(Charge Coupled Device:电荷耦合器件)图像传感器拍摄机,但是并不限定于此。In addition, the imaging unit 11 a is arranged such that the optical axis of the imaging unit 11 a is perpendicular to the main surface of the substrate G. As shown in FIG. In addition, as the imaging unit 11a, for example, a CCD (Charge Coupled Device: Charge Coupled Device) image sensor camera having a telephoto lens can be used, but the present invention is not limited thereto.

照明部12a具有未图示的光源,安装在拍摄部11a的侧面。照明部12a从该光源对基板G照射拍摄用的光。具体而言,拍摄部11a具有将来自安装在侧面的照明部12a的光向下方反射的半反射镜(未图示)。并且,通过半反射镜所反射的来自照明部12a的光在与基板G的主面垂直的方向、换言之是在与拍摄部11a的光轴同轴的方向上入射,照射到拍摄对象物的涂敷区域。像这样,照明部12a构成为所谓的同轴照明,但并不限定于此,例如,也可以相对于基板G的涂敷区域从倾斜的方向照射光。The illuminating unit 12a has a light source not shown, and is attached to the side of the imaging unit 11a. The illuminating part 12a irradiates the board|substrate G with the light for imaging from this light source. Specifically, the imaging unit 11a has a half mirror (not shown) that reflects light downward from the illuminating unit 12a attached to the side. In addition, the light from the illuminating unit 12a reflected by the half mirror is incident in a direction perpendicular to the main surface of the substrate G, in other words, in a direction coaxial with the optical axis of the imaging unit 11a, and is irradiated to the surface of the object to be photographed. apply area. In this way, the illuminating unit 12a is configured as so-called coaxial illuminating, but it is not limited thereto. For example, light may be irradiated from an oblique direction with respect to the application area of the substrate G.

焦点调整部13a包括主体部14a和滑动部15a。主体部14a被固定在腔室150的顶部150a。此外,在主体部14a的内部,收纳驱动滑动部15a的驱动源(未图示)。作为该驱动源,例如能够使用电动机。The focus adjustment part 13a includes a main body part 14a and a slide part 15a. The main body portion 14a is secured to the top 150a of the chamber 150 . Moreover, the drive source (not shown) which drives the slide part 15a is accommodated in the inside of the main-body part 14a. As the drive source, for example, an electric motor can be used.

滑动部15a以基端部能够在与基板G的主面垂直的方向(Z轴方向)上滑动的方式安装在主体部14a。另外,拍摄部被固定在滑动部15a的前端部。The sliding part 15a is attached to the main body part 14a so that the base end part can slide in the direction (Z-axis direction) perpendicular to the main surface of the board|substrate G. As shown in FIG. In addition, the imaging unit is fixed to the front end of the sliding unit 15a.

在如上所述构成的焦点调整部13a通过未图示的线缆连接有控制装置140(参照图4)。并且,控制装置140通过控制主体部14a的驱动源,使滑动部15a和拍摄部11a在与基板G的主面垂直的方向上滑动,由此能够适当地调整拍摄部11a的焦点。The control device 140 (see FIG. 4 ) is connected to the focus adjustment unit 13 a configured as described above through a cable not shown. Furthermore, the control device 140 can appropriately adjust the focus of the imaging unit 11a by controlling the driving source of the main body unit 14a to slide the sliding unit 15a and the imaging unit 11a in a direction perpendicular to the main surface of the substrate G.

如上所述,第一~第三拍摄单元210a~210c为大致同样的构成。因此,以下,对于拍摄部11a和照明部12a,在没有将第一~第三拍摄单元特别地区别的情况下,有时省略末尾的字母而记载为“拍摄部11”和“照明部12”。As described above, the first to third imaging units 210a to 210c have substantially the same configuration. Therefore, below, the imaging unit 11 a and the lighting unit 12 a may be described as “the imaging unit 11 ” and “the lighting unit 12 ” without distinguishing the first to third imaging units.

上述的拍摄部11、照明不12、升降部163和减压基板170也经由未图示的线缆与控制装置140(参照图4)连接,被控制各自的动作。The aforementioned imaging unit 11, illuminating unit 12, lifting unit 163, and decompression board 170 are also connected to the control device 140 (see FIG. 4 ) via cables not shown, and their respective operations are controlled.

<4.控制装置的构成><4. Configuration of the control device>

参照图10详细地说明上述控制装置140的构成。图10是控制装置140的框图。此外,在图10中,用功能框表示为了说明本实施方式的检查装置200和减压干燥装置123c的特征所必须的构成要素,省略了对于一般的构成要素的记载。The configuration of the control device 140 described above will be described in detail with reference to FIG. 10 . FIG. 10 is a block diagram of the control device 140 . In addition, in FIG. 10 , components necessary for describing the features of the inspection device 200 and the reduced-pressure drying device 123c according to the present embodiment are represented by functional blocks, and the description of general components is omitted.

换言之,图10中图示的各构成要素是表示功能概念的内容,并不一定在物理上如图所示那样构成。例如,各功能模块的分散、整合的具体的形态并不限定于如图所示的内容,其全部或者一部分可以根据各种负载和使用状况等,以任意的单位按功能或者物理上进行分散、整合而构成。In other words, each component shown in FIG. 10 shows a functional concept and does not necessarily have to be physically configured as shown in the figure. For example, the specific forms of dispersing and integrating each functional module are not limited to those shown in the figure, and all or a part of them can be distributed, functionally or physically in any unit according to various loads and usage conditions, etc. integrated to form.

另外,在各功能模块进行的各处理功能,其全部或者任意的一部分能够通过CPU等的处理器和由该处理器分析并执行的程序来实现,或者,也可以是作为基于布线逻辑的硬件来实现的功能。In addition, all or any part of the processing functions performed by each functional block can be realized by a processor such as a CPU and a program analyzed and executed by the processor, or it can also be implemented as hardware based on wired logic. realized function.

首先,如上所述,控制装置140包括控制部141和存储部142。控制部141读取存储在存储部142中的程序并执行,由此,作为例如图10所示的各工模块141a~141h发挥功能。接着,对这些各功能模块141a~141h进行说明。First, as described above, the control device 140 includes the control unit 141 and the storage unit 142 . The control unit 141 reads and executes the program stored in the storage unit 142 , thereby functioning as, for example, each of the process modules 141 a to 141 h shown in FIG. 10 . Next, these functional blocks 141a to 141h will be described.

如图10所示,控制部141包括照明控制部141a、拍摄控制部141b、图像取得部141c、色浓度测量部141d、判断部141e、干燥状态检测部141f、减压控制部141g、升降控制部141h。另外,存储部142例如存储拍摄图像信息142a、图案/位置信息142b、规定范围信息142c和干燥状态信息142d。As shown in FIG. 10, the control unit 141 includes an illumination control unit 141a, an imaging control unit 141b, an image acquisition unit 141c, a color density measurement unit 141d, a judgment unit 141e, a dry state detection unit 141f, a decompression control unit 141g, and a lift control unit. 141h. In addition, the storage unit 142 stores, for example, captured image information 142a, pattern/position information 142b, predetermined range information 142c, and dry state information 142d.

照明控制部141a控制照明部12,将来自照明部12的光向基板G照射。拍摄控制部141b控制拍摄部11,使拍摄部11拍摄减压干燥处理中的基板G。The lighting control unit 141 a controls the lighting unit 12 to irradiate the substrate G with light from the lighting unit 12 . The imaging control unit 141b controls the imaging unit 11 so that the imaging unit 11 images the substrate G being subjected to the reduced-pressure drying process.

图像取得部141c取得拍摄部11所拍摄的拍摄图像,作为拍摄图像信息142a存储到存储部142。图11是拍摄部11所拍摄的拍摄图像20的一例,是将拍摄图像20的一部分放大表示的示意性放大图。The image acquisition unit 141c acquires a captured image captured by the imaging unit 11 and stores it in the storage unit 142 as captured image information 142a. FIG. 11 is an example of a captured image 20 captured by the imaging unit 11 , and is a schematic enlarged view showing a part of the captured image 20 enlarged.

如图11所示,拍摄部11对基板G的堤540和堤540的周边区域进行拍摄。此外,在图11中,只表示了一个堤540,但是拍摄部11也可以拍摄多个堤540。As shown in FIG. 11 , the imaging unit 11 images the bank 540 of the substrate G and the surrounding area of the bank 540 . In addition, in FIG. 11 , only one bank 540 is shown, but the imaging unit 11 may image a plurality of banks 540 .

另外,如图11所示的例子中,表示形成于基板G的发光层533中的拍摄G色发光层533G(参照图7A、图7B)而得到的拍摄图像20。即,图11表示设置在发光层形成模块123的减压干燥装置123c的拍摄部11所拍摄的拍摄图像20。此外,以下,以G色发光层533g形成的涂敷区域21为例进行说明,但以下的说明对于形成有R色发光层533R或B色发光层533B的涂敷区域21也是适合的。In addition, in the example shown in FIG. 11 , the captured image 20 obtained by imaging the G-color light-emitting layer 533G (see FIGS. 7A and 7B ) in the light-emitting layer 533 formed on the substrate G is shown. That is, FIG. 11 shows a captured image 20 captured by the imaging unit 11 of the reduced-pressure drying device 123 c provided in the light emitting layer forming module 123 . In addition, in the following, the application region 21 formed by the G-color light emitting layer 533g will be described as an example, but the following description is also applicable to the application region 21 formed by the R-color light-emitting layer 533R or the B-color light-emitting layer 533B.

在堤540的内部,如上所述,涂敷有形成G色发光层533G的有机溶剂,将该涂敷有有机材料的区域作为图11中的“涂敷区域21”以虚线的闭曲线表示。像这样,拍摄部11对基板G的涂敷区域21进行拍摄。Inside the bank 540 , as described above, the organic solvent for forming the G-color light emitting layer 533G is coated, and the region coated with the organic material is represented by a dotted closed curve as "coated region 21" in FIG. 11 . In this way, the imaging unit 11 images the application region 21 of the substrate G. As shown in FIG.

返回到图10的说明,色浓度测量部141d从存储部142读取拍摄图像信息142a,测量通过拍摄部11所拍摄的涂敷区域21的色浓度。这里,所谓色浓度是将所拍摄的涂敷区域21关于红色、绿色和蓝色这三原色分别以0~225灰度数值化表示的数值。Returning to the description of FIG. 10 , the color density measuring unit 141 d reads the captured image information 142 a from the storage unit 142 , and measures the color density of the application area 21 captured by the imaging unit 11 . Here, the so-called color density is a numerical value representing the three primary colors of red, green, and blue, which are the three primary colors of red, green, and blue, in the imaged application area 21 , respectively, in gradations of 0 to 225.

此外,在本实施方式中,将红色、绿色和蓝色的三原色各自按0~225灰度(8比特)数值化而表示的数值作为色浓度,但三原色各自的灰度也可以根据图像传感拍摄机的性能按65536灰度(16比特)或其以上的灰度数值化,作为色浓度来使用。In addition, in this embodiment, each of the three primary colors of red, green, and blue is numerically expressed as a color density in 0 to 225 grayscales (8 bits), but the respective grayscales of the three primary colors can also be determined according to the image sensor. The performance of the camera is digitized at 65536 gradations (16 bits) or higher, and used as the color density.

此外,拍摄部11拍摄多个堤540,在形成有G色发光层533G的涂敷区域21为多个的情况下,色浓度测量部141d例如也可以测量多个涂敷区域21的色浓度的平均值。上述的平均值能够使用简单平均或者加权平均等各种平均值。另外,在形成有G色发光层533G的涂敷区域21为多个的情况下,并不限定于测量上述的平均值的例子,例如也可以色浓度测量部141d从多个涂敷区域21中选择代表的一个涂敷区域21,测量该涂敷区域21的色浓度。In addition, the imaging unit 11 images a plurality of banks 540, and when there are a plurality of application regions 21 on which the G-color light emitting layer 533G is formed, the color density measurement unit 141d may measure the color density of the plurality of application regions 21, for example. average value. Various average values, such as a simple average and a weighted average, can be used for the average value mentioned above. In addition, when there are a plurality of application regions 21 in which the G-color light emitting layer 533G is formed, it is not limited to the example of measuring the above-mentioned average value. One representative coating area 21 is selected, and the color density of the coating area 21 is measured.

另外,色浓度测量部141d除了色浓度的测量之外,也进行图案检索处理和位置信息取得处理。图案检索处理检索是具有所拍摄的涂敷区域21的堤540的图案的形状与形成在基板G的图案中的哪个图案的形状一致的处理。另外,位置信息取得处理取得通过检索处理判断为一致的图案的基板G的位置信息的处理。In addition, the color density measurement unit 141d also performs pattern search processing and position information acquisition processing in addition to the measurement of color density. The pattern search processing search is a process in which the shape of the pattern of the bank 540 having the imaged application area 21 matches the shape of the pattern formed on the substrate G. FIG. In addition, the position information acquisition process acquires the position information of the substrate G of the pattern judged to match by the search process.

具体而言,在存储部142中,作为图案/位置信息142b预先存储有减压干燥处理实施的基板G中的堤540的图案形状(以下称为“存储图案形状”)、形成于堤540的有机EL层530的种类、堤540的位置信息等。Specifically, in the storage unit 142, the pattern shape of the bank 540 on the substrate G subjected to the reduced-pressure drying process (hereinafter referred to as "stored pattern shape"), the pattern shape of the bank 540 formed in the bank 540, and the shape of the bank 540 are stored in advance as the pattern/position information 142b. The type of the organic EL layer 530, the positional information of the bank 540, and the like.

此外,上述中存储的有机EL层530的种类的信息是例如空穴注入层531、空穴输送层532和发光层533等的信息。另外,有机EL层530的种类的信息,在发光层533的情况下,也包括是否是R色发光层533R、G色发光层533G和B色发光层533B的任一者的信息。另外,堤540的位置信息例如是表示相对设定在基板G上的基准点(原点)的堤540的相对位置的XY坐标,但并不限定于此。In addition, the information on the type of the organic EL layer 530 stored above is, for example, information on the hole injection layer 531 , the hole transport layer 532 , and the light emitting layer 533 . In addition, the information on the type of organic EL layer 530 includes, in the case of light emitting layer 533 , information on whether it is any one of R color light emitting layer 533R, G color light emitting layer 533G, and B color light emitting layer 533B. In addition, the position information of the bank 540 is, for example, XY coordinates indicating the relative position of the bank 540 with respect to a reference point (origin) set on the substrate G, but is not limited thereto.

在图案检索处理中,色浓度测量部141d将具有所拍摄的涂敷区域21的堤540的图案形状与存储图案形状相比较,检索一致的存储图案形状。并且,色浓度测量部141d,通过检索将具有一致的存储图案形状的堤540的有机EL层530的种类和位置的信息与表示上述所测量的色浓度的信息相关联,并将该信息向判断部141e输出。In the pattern search process, the color density measuring unit 141d compares the pattern shape of the bank 540 having the imaged application region 21 with the stored pattern shape, and searches for a matched stored pattern shape. And, the color density measurement unit 141d correlates the information indicating the above-mentioned measured color density with the information on the type and position of the organic EL layer 530 having the bank 540 having the same stored pattern shape by searching, and sends the information to the judgment. Section 141e outputs.

判断部141e基于从色浓度测量部141d输出的信息,计算出表示涂敷区域21的色浓度的变化的值,具体而言是色浓度的变化率。此外,在上述的判断部141e,作为表示色浓度的变化的值计算出变化率,但是并不限定于此,例如也可以是色浓度的变化量等的其它的值。The determination unit 141e calculates a value indicating a change in the color density of the application area 21, specifically, a change rate of the color density, based on the information output from the color density measurement unit 141d. In addition, in the determination unit 141e described above, the rate of change is calculated as a value indicating a change in color density, but is not limited thereto, and may be other values such as the amount of change in color density, for example.

这里,关于减压干燥处理中的色浓度的变化和基板G的涂敷区域21的干燥状态的关系,参照图12进行说明。图12是表示减压干燥处理中通过色浓度测量部141d所测量的色浓度的图表。Here, the relationship between the change in color density in the reduced-pressure drying process and the drying state of the coated region 21 of the substrate G will be described with reference to FIG. 12 . FIG. 12 is a graph showing the color density measured by the color density measuring unit 141d in the reduced-pressure drying process.

此外,在图12中,从上起依次为,虚线的图表表示“红色浓度30R”,点划线的图表表示“绿色浓度30G”,双点划线的图表表示“蓝色浓度30B”。此外,在图12中,实现的图表是腔室150内的压力值31。此外,在图12所示的例子中,从开始减压干燥处理起经过时刻T0后,开始色浓度的测定。In addition, in FIG. 12 , in order from the top, the dotted line graph indicates "red density 30R", the dotted line graph indicates "green density 30G", and the double dotted line graph indicates "blue density 30B". Furthermore, in FIG. 12 , the diagram realized is the pressure value 31 inside the chamber 150 . In addition, in the example shown in FIG. 12, the measurement of the color density is started after time T0 elapsed from the start of the reduced-pressure drying process.

发明者们在对减压干燥处理中的涂敷区域21进行色浓度的测量时,发现涂敷区域21的色浓度与涂敷区域21的干燥状态之间具有相关关系。具体说明,例如如图12所示,当开始减压干燥处理并经过时刻Ta时,压力值21的变化消失,腔室150内维持被减压为规定压力的状态。The inventors found that there is a correlation between the color density of the coated area 21 and the dry state of the coated area 21 when measuring the color density of the coated area 21 in the reduced-pressure drying process. Specifically, as shown in FIG. 12 , for example, when the depressurized drying process starts and the time Ta passes, the change in the pressure value 21 disappears, and the inside of the chamber 150 remains depressurized to a predetermined pressure.

在涂敷区域21中,在被减压到规定压力之前且刚刚开始干燥时,色浓度发生比较大的变化,但经过了时刻Ta,随着时间的经过,换言之,随着接近干燥完成的状态,色浓度逐渐稳定。并且,例如在绿色浓度30G中,在时刻Tb,值稳定,成为涂敷区域21的干燥完成了的状态。In the application region 21, the color density changes relatively greatly just before depressurization to a predetermined pressure and just when drying starts, but after the time Ta passes, as time passes, in other words, as the drying is approached, , the color density gradually stabilizes. And, for example, in the green density 30G, the value stabilizes at time Tb, and the drying of the application area 21 is completed.

这是由于,在涂敷区域21中,通过减压干燥而被除去的溶剂的量随着时间的经过逐渐减少,色浓度的变化也消失。像这样,可知涂敷区域21的色浓度与涂敷区域21的干燥状态之间存在相关关系。This is because, in the application region 21 , the amount of solvent removed by drying under reduced pressure gradually decreases with time, and the change in color density also disappears. Thus, it can be seen that there is a correlation between the color density of the application area 21 and the dry state of the application area 21 .

因此,在具备本实施方式的检查装置200的减压干燥装置123c中,计算出涂敷区域21的色浓度的变化率,基于所计算的变化率检测涂敷区域21的干燥状态。Therefore, in the reduced-pressure drying device 123c provided with the inspection device 200 of this embodiment, the change rate of the color density of the application area 21 is calculated, and the drying state of the application area 21 is detected based on the calculated change rate.

具体而言,图10所示的判断部141e,计算色浓度的变化率,判断所计算出的色浓度的变化率是否在规定范围内,换言之,关于色浓度判断变化是否消失而成为稳定的值。此外,上述的规定范围被预先设定为伴随干燥的进行的色浓度的变化变得比较小能够判断为已稳定的值,作为规定范围信息142c存储在存储部142中。判断部141e将判断结果向干燥状态检测部141f输出。Specifically, the judging unit 141e shown in FIG. 10 calculates the rate of change of the color density, and judges whether the calculated rate of change of the color density is within a predetermined range. . In addition, the above-mentioned predetermined range is set in advance as a value at which it can be judged that the change in color density accompanying the progress of drying becomes relatively small and stable, and is stored in the storage unit 142 as the predetermined range information 142c. The determination unit 141e outputs the determination result to the dry state detection unit 141f.

干燥状态检测部141f基于判断结果来检测涂敷区域21的干燥状态,详细而言,基于由拍摄部11拍摄的涂敷区域21的色浓度来检测涂敷区域21的干燥状态。更详细而言,在判断由判断部141e所计算出的变化率已在规定范围内的情况下,干燥状态检测部141f检测出涂敷区域21已经成为干燥了的状态。The dry state detection unit 141 f detects the dry state of the applied area 21 based on the determination result, specifically, detects the dry state of the applied area 21 based on the color density of the applied area 21 captured by the imaging unit 11 . More specifically, when it is determined that the rate of change calculated by the determination unit 141e is within a predetermined range, the dry state detection unit 141f detects that the application region 21 is in a dry state.

干燥状态检测部141f将从开始减压干燥处理到检测出已经成为干燥了的状态的时间(这里例如是时刻Tb)设定为“干燥时间”,将该干燥时间作为干燥状态信息142d存储在存储部142中。The dry state detection unit 141f sets the time (here, time Tb, for example) from the start of the reduced-pressure drying process to the detection of the dry state as the "dry time", and stores the dry time in the memory as the dry state information 142d. Section 142.

此外,干燥状态检测部141f,除了上述的干燥时间以外,还将形成有成为干燥了的状态的涂敷区域21的堤540的有机EL层530的种类和位置信息等作为干燥状态信息142d存储在存储部142。In addition, the dry state detecting unit 141f stores the type and position information of the organic EL layer 530 in the bank 540 of the applied region 21 in a dried state, as dry state information 142d, in addition to the above-mentioned drying time. storage unit 142 .

像这样,在有干燥状态检测部141f的情况下,通过利用涂敷区域21的色浓度,与制作大量的样品的技术相比,能够早期地检测出涂敷区域21的干燥状态。In this way, in the case where there is the dry state detection unit 141f, by using the color density of the applied area 21, the dry state of the applied area 21 can be detected earlier than the technique of producing a large number of samples.

此外,如上所述,在减压干燥装置123c设置用于检测涂敷区域21的干燥状态的检查装置200,基于所检测的涂敷区域21的干燥状态设定干燥时间。由此,例如在量产有机发光二极管500之前进行设定最佳的干燥时间的操作的情况下,不需要制作大量的样品,能够实现设定操作的高效化。In addition, as described above, the inspection device 200 for detecting the dry state of the coated area 21 is provided in the reduced-pressure drying device 123c, and the drying time is set based on the detected dry state of the coated area 21 . Thus, for example, when setting an optimum drying time before mass-producing the organic light emitting diode 500 , it is not necessary to prepare a large number of samples, and the efficiency of the setting operation can be improved.

此外,在有上述的干燥状态检测部141f的情况下,不需要对通过色浓度测量部141d所测量的色浓度的全部检测涂敷区域21的干燥状态。即,干燥状态检测部141f例如根据涂敷区域21的种类从红色浓度、绿色浓度和蓝色浓度中选择至少一种色浓度即可。In addition, in the case where the above-mentioned dry state detection unit 141f is present, it is not necessary to detect the dry state of the application area 21 for all the color densities measured by the color density measuring unit 141d. That is, the dry state detection unit 141f may select at least one color density from red density, green density, and blue density, for example, according to the type of the application area 21 .

详细地说明,色浓度如上所述包括红色浓度、绿色浓度和蓝色浓度。这三种色浓度的随着时间经过的变化的方式根据涂敷区域21的种类分别不同,这些色浓度的变化也与伴随干燥状态的进行的变化相对应。Explained in detail, the color density includes red density, green density, and blue density as described above. The manner in which these three kinds of color densities change over time differs depending on the type of the application area 21 , and these changes in the color densities also correspond to changes accompanying the progress of the drying state.

因此,预先通过实验等求出显著地表现伴随干燥状态的进行的变化的色浓度,干燥状态检测部141f根据涂敷区域21的种类从红色浓度、绿色浓度和蓝色浓度中选择至少一种色浓度即可。Therefore, the color density that significantly expresses the change accompanying the progress of the dry state is obtained through experiments in advance, and the dry state detection unit 141f selects at least one color from red density, green density, and blue density according to the type of the application area 21. concentration.

并且,干燥状态检测部141f也可以基于所选择的色浓度检测干燥状态。像这样,干燥状态检测部141f通过使用容易表现伴随干燥状态的进行的变化的色浓度,能够正确地检测涂敷区域21的干燥状态。此外,通过干燥状态检测部141f选择的色浓度的数量能够设定为任意的值。In addition, the dry state detection unit 141f may detect the dry state based on the selected color density. In this way, the dry state detection unit 141f can accurately detect the dry state of the application area 21 by using a color density that is likely to express a change accompanying the progress of the dry state. In addition, the number of color densities selected by the dry state detection unit 141f can be set to an arbitrary value.

接着进行图10的说明,减压控制部141g控制减压机构170,进行减压干燥处理。具体而言,减压控制部141g在干燥时间的设定操作结束之后,在所设定的干燥时间、或所设定的干燥时间上加上规定时间的时间中进行减压干燥处理。Next, the description of FIG. 10 will be carried out. The decompression control unit 141g controls the decompression mechanism 170 to perform a decompression drying process. Specifically, the decompression control unit 141g performs the decompression drying process for the set drying time or a predetermined time added to the set drying time after the drying time setting operation is completed.

升降控制部141h控制升降部163使保持部161升降。此外,升降控制部141h在干燥时间的设定操作完成之后进行的减压干燥处理中,换言之,在量产有机发光二极管500时进行的减压干燥处理中,根据涂敷区域21的干燥状态控制升降部163,对此参照附图14在后文叙述。The lift control unit 141h controls the lift unit 163 to lift the holding unit 161 up and down. In addition, the lift control unit 141h controls the drying process according to the drying state of the application area 21 in the reduced-pressure drying process performed after the drying time setting operation is completed, in other words, in the reduced-pressure drying process performed when the organic light emitting diode 500 is mass-produced. The lifting unit 163 will be described later with reference to FIG. 14 .

<5.检查装置和减压干燥装置的具体的动作><5. Specific actions of the inspection device and the decompression drying device>

接着,参照图13对具有本实施方式的检查装置200的减压干燥装置123c执行的处理内容进行说明。Next, the content of processing performed by the reduced-pressure drying device 123c provided with the inspection device 200 of this embodiment will be described with reference to FIG. 13 .

图13是表示在具有本实施方式的检查装置200的减压干燥装置123c中,设定干燥时间的处理的处理顺序的流程图。此外,图13表示例如在量产有机发光二极管500之前,用于设定最佳的干燥时间的处理顺序。因此,在图13所示的例子中,在预先设定了涂敷区域21的干燥状态的检测处理时间中持续进行检测,在检测处理时间经过后设定干燥时间。上述的检测处理时间设定为比预测为涂敷区域21成为干燥了的状态的时间充分长的时间。FIG. 13 is a flowchart showing the processing procedure of the processing for setting the drying time in the reduced-pressure drying device 123c provided with the inspection device 200 according to the present embodiment. In addition, FIG. 13 shows, for example, a processing sequence for setting an optimum drying time before mass-producing the organic light emitting diode 500 . Therefore, in the example shown in FIG. 13 , the detection is continued during the detection processing time for which the dry state of the application area 21 is set in advance, and the drying time is set after the detection processing time elapses. The detection processing time described above is set to be sufficiently longer than the time when the application region 21 is expected to be in a dry state.

另外,图13所示的各处理顺序按照控制装置140的控制部141的控制执行。In addition, each processing procedure shown in FIG. 13 is executed under the control of the control unit 141 of the control device 140 .

在以下进行详细说明,如图13所示,控制部141的拍摄控制部141b拍摄在基板G中涂敷有有机材料的涂敷区域21(步骤S10)。此外,在该拍摄处理之前,使来自照明部12的光为向基板G照射的光。As described below in detail, as shown in FIG. 13 , the imaging control unit 141b of the control unit 141 images the application region 21 on which the organic material is applied on the substrate G (step S10 ). In addition, before this imaging process, the light from the illumination part 12 is made into the light irradiated to the board|substrate G. As shown in FIG.

接着,色浓度测量部141d,将在所拍摄的拍摄图像中,具有涂敷区域21的堤540的图案的形状与存储图案形状相比较,检索一致的存储图案形状(步骤S11)。接着,色浓度测量部141d通过检索处理取得具有一致的存储图案形状的堤540的有机EL层530的种类和位置信息等(步骤S12)。Next, the color density measuring unit 141d compares the pattern shape of the bank 540 having the application region 21 in the captured image with the stored pattern shape, and searches for a matched stored pattern shape (step S11). Next, the color density measurement unit 141d acquires the type and position information of the organic EL layer 530 having the banks 540 having the same stored pattern shape by search processing (step S12 ).

接着,色浓度测量部141d在所拍摄的拍摄图像中测量涂敷区域21的色浓度(步骤S13)。接着,判断部141e计算出涂敷区域21的色浓度的变化率(步骤S14),判断所计算出的色浓度的变化率是否在规定范围内(步骤S15)。Next, the color density measurement unit 141d measures the color density of the application area 21 in the captured image (step S13). Next, the determination unit 141e calculates the rate of change of the color density of the application area 21 (step S14), and determines whether the calculated rate of change of the color density is within a predetermined range (step S15).

判断部141e判断为色浓度的变化率在规定范围内的情况下(步骤S15,是),计算出从开始减压干燥处理直至判断为色浓度的变化率在规定范围内的时间作为“干燥时间”(步骤S16)。When the judging unit 141e judges that the rate of change of the color density is within the predetermined range (step S15, Yes), it calculates the time from the start of the reduced-pressure drying process until it is judged that the rate of change of the color density is within the predetermined range as "drying time". " (step S16).

此外,判断部141e判断为色浓度的变化率不在规定范围内的情况下(步骤S15,否),即,判断为色浓度发生比较大的变化的情况下,跳过步骤S16的处理。Also, when the judging unit 141e judges that the rate of change of the color density is not within the predetermined range (step S15, No), that is, when it judges that the color density has relatively large change, the process of step S16 is skipped.

接着,干燥状态检测部141f例如在通过判断部141e判断为变化率在规定的范围内的情况下,检测出涂敷区域21成为已经干燥了的状态的情况,输出表示成为已经干燥的状态的情况的信息,存储到存储部142(步骤S17)。另外,干燥状态检测部141f无论判断部141e的判断结果如何,都将所取得的堤540的有机EL层530的种类和位置信息、所测量的涂敷区域21的色浓度等作为表示干燥状态的信息输出,存储到存储部142。Next, the dry state detection unit 141f detects that the application region 21 is in a dry state when it is judged by the judgment portion 141e that the rate of change is within a predetermined range, and outputs an output indicating that it has become a dry state. The information is stored in the storage unit 142 (step S17). In addition, the dry state detection unit 141f uses the acquired type and position information of the organic EL layer 530 of the bank 540, the measured color density of the application area 21, etc. as indicators indicating the dry state regardless of the determination result of the determination unit 141e. The information is output and stored in the storage unit 142 .

接着,干燥状态检测部141f判断是否已经经过了上述的检测处理时间(步骤S18)。干燥状态检测部141f判断为还未经过检测处理时间的情况下(步骤S18,否),重复步骤S10~S17的处理。Next, dry state detection part 141f judges whether the above-mentioned detection processing time has elapsed (step S18). When the dry state detection part 141f judges that the detection processing time has not elapsed (step S18, NO), it repeats the process of steps S10-S17.

另一方面,干燥状态检测部141f判断为经过了检测处理时间的情况下(步骤S18,是),设定干燥时间(步骤S19)。这里设定的干燥时间与在步骤S16中所计算出的干燥时间是相同的值。On the other hand, when the dry state detection part 141f judges that the detection processing time has elapsed (step S18, YES), it sets a dry time (step S19). The drying time set here is the same value as the drying time calculated in step S16.

如此一来,例如在量产有机发光二极管500之前,完成为了设定最佳的干燥时间的一系列的处理。并且,虽然省略了图示,但例如在量产有机发光二极管500的情况下,在减压干燥装置123c中,构成为在步骤S19所设定的干燥时间、或者在所设定的干燥时间上加上规定时间的时间中进行减压干燥处理。此外,在上述中,在干燥时间上加上规定时间是为了,例如即使涂敷区域21的干燥的进行因环境条件变迟的情况下,由规定时间吸收所变迟的时间,使涂敷区域21的干燥可靠地完成。In this way, for example, before mass-producing the OLED 500 , a series of processes for setting an optimum drying time are completed. Moreover, although illustration is omitted, for example, in the case of mass-producing the organic light emitting diode 500, in the reduced-pressure drying device 123c, the drying time set in step S19 or the set drying time Drying under reduced pressure was performed for a predetermined time plus time. In addition, in the above, the purpose of adding a predetermined time to the drying time is that, for example, even if the drying of the coated area 21 is delayed due to environmental conditions, the delayed time is absorbed by the specified time, so that the coated area 21 drying is reliably accomplished.

另外,在上述的减压干燥装置123c中,在设定干燥时间的操作时进行涂敷区域21的干燥状态的检测。但是,在减压干燥装置123c中,涂敷区域21的干燥状态的检测并不限定于上述内容。In addition, in the above-mentioned reduced-pressure drying device 123c, the detection of the drying state of the application area 21 is performed at the time of setting the drying time. However, in the reduced-pressure drying device 123c, the detection of the dry state of the application area 21 is not limited to the above.

即,例如也可以构成为在设定了干燥时间后的减压干燥装置123c中也进行涂敷区域21的干燥状态的检测。例如,如后文所述,在基板G的涂敷区域21中,在基板G的周边部和中央部,干燥的速度不同。因此,在本实施方式中,检测周边部的涂敷区域21和中央部的涂敷区域21的干燥状态,基于检测结果使基板G升降,由此实现干燥的促进。That is, for example, the dry state of the application area 21 may also be detected in the reduced-pressure drying device 123 c after setting the drying time. For example, as will be described later, in the coating region 21 of the substrate G, the drying speed is different between the peripheral portion and the central portion of the substrate G. Therefore, in the present embodiment, the drying states of the peripheral coating area 21 and the central coating area 21 are detected, and the substrate G is raised and lowered based on the detection results to promote drying.

对此参照图14进行说明。图14是表示周边部的涂敷区域21和中央部的涂敷区域21的G色浓度的图表。此外,在图14中,对于由第一拍摄单元210a的拍摄部11a所拍摄的涂敷区域21的G色浓度标注附图标记41。另外,在图14中,对于由第二拍摄单元210b的拍摄部11b所拍摄的涂敷区域21的G色浓度标注附图标记42,对于由第三拍摄单元210c的拍摄部11c所拍摄的涂敷区域21的G色浓度标注附图标记43。即,G色浓度41、43是周边部的涂敷区域21的G色浓度,G色浓度42是中央部的涂敷区域21的G色浓度。This will be described with reference to FIG. 14 . FIG. 14 is a graph showing the concentration of G color in the application area 21 in the peripheral portion and the application area 21 in the central portion. In addition, in FIG. 14, the code|symbol 41 is attached|subjected to the G color density of the application|coating area|region 21 image|photographed by the imaging part 11a of the 1st imaging means 210a. In addition, in FIG. 14 , the reference numeral 42 is attached to the G color density of the application area 21 captured by the imaging unit 11b of the second imaging unit 210b, and the color density of the coating area 21 captured by the imaging unit 11c of the third imaging unit 210c is marked with 42 . The G color density of the application area 21 is assigned the reference numeral 43 . That is, the G color densities 41 and 43 are the G color densities of the peripheral application area 21 , and the G color density 42 is the G color density of the central application area 21 .

如图14所示,关于G色浓度41~43,均是在开始减压干燥处理经过时刻T0之后急剧地增加之后转为减少。并且,三个G色浓度41~43中,关于G色浓度41、43,在时刻T1,减少了的值反转而增加,关于G色浓度42,在比时刻T1迟的时刻T2,减少了的值发生反转而增加。As shown in FIG. 14 , the G color densities 41 to 43 all sharply increase after the time T0 elapses after the start of the reduced-pressure drying process, and then turn to decrease. Furthermore, among the three G color densities 41 to 43, the G color densities 41 and 43 are reversed and increased at time T1, and the G color density 42 is decreased at time T2 later than time T1. The value of is reversed and increased.

这样的反转如图7A所示,是比堤540的上表面向上方隆起的发光层533由于干燥而降低,成为比堤540的上表面靠下方的状态(参照图7B)时被观察到的现象。此外,在紧接着变成图7B所示的状态后的涂敷区域21并不是完全干燥了的状态。Such inversion is observed when, as shown in FIG. 7A , the luminescent layer 533 raised upward from the upper surface of the bank 540 is lowered due to drying and is lower than the upper surface of the bank 540 (see FIG. 7B ). Phenomenon. In addition, the applied region 21 immediately after becoming the state shown in FIG. 7B is not completely dried.

如上所述,对于G色浓度41~43中反转的时刻,在中央部的涂敷区域21的G色浓度42中反转的时刻比周边部的涂敷区域21的G色浓度41、43中反转的时刻迟。即,可知中央部的涂敷区域21比周边部的涂敷区域21的干燥速度慢,难以干燥。As described above, with regard to the timing of inversion of the G color densities 41 to 43, the timing of inversion of the G color density 42 in the central application area 21 is higher than that of the G color densities 41 and 43 in the peripheral application area 21. The time of inversion is late. That is, it can be seen that the coating area 21 in the central part dries slower than the coating area 21 in the peripheral part, and it is difficult to dry.

另外,在腔室150内,由减压机构170生成气流,由于该气流的方向等,存在在腔室150内涂敷区域21存在易于干燥的部位的情况。In addition, in the chamber 150 , an air flow is generated by the decompression mechanism 170 , and depending on the direction of the air flow, etc., there may be a site in the chamber 150 where the coating region 21 is easy to dry.

因此,在本实施方式的减压干燥装置123c中,也可以例如根据涂敷区域21的干燥状态控制升降部163使保持部161升降,调整基板G的高度。Therefore, in the reduced-pressure drying device 123c of the present embodiment, for example, the height of the substrate G may be adjusted by controlling the raising and lowering unit 163 to raise and lower the holding unit 161 according to the dry state of the coating area 21 .

详细而言,升降控制部141h,在周边部的涂敷区域21的G色浓度41、43发生了反转的情况下,控制升降部163使保持部161升降,以中央部的涂敷区域21位于腔室150内的易于干燥的部位的方式调整基板G的高度。由此,能够实现中央部的涂敷区域21的干燥的促进。Specifically, the elevation control unit 141h controls the elevation unit 163 to raise and lower the holding portion 161 so that the central application region 21 The height of the substrate G is adjusted so as to be located in a place that is easy to dry in the chamber 150 . Thereby, it is possible to accelerate the drying of the application region 21 in the center.

另外,通过如上所述的构成,能够使中央部的涂敷区域21的干燥速度接近周边部的涂敷区域21的干燥速度,由此能够抑制在基板G中因部位不同而产生干燥不均的情况。In addition, with the above-mentioned configuration, the drying speed of the coated region 21 in the center can be made close to the drying speed of the coated region 21 in the peripheral part, thereby suppressing the occurrence of uneven drying in different parts of the substrate G. Happening.

如上述所构成的那样,第一实施方式的检查装置200包括拍摄部11和干燥状态检测部141f。拍摄部11对基板G中涂敷有有机材料的涂敷区域21进行拍摄。干燥状态检测部141f基于由拍摄部11所拍摄的涂敷区域21的色浓度检测出涂敷区域21的干燥状态。由此,在基板G中能够早期地检测涂敷有有机材料的涂敷区域21的干燥状态。As configured above, the inspection device 200 of the first embodiment includes the imaging unit 11 and the dry state detection unit 141f. The imaging unit 11 images the coated region 21 of the substrate G where the organic material is coated. The dry state detection unit 141 f detects the dry state of the applied area 21 based on the color density of the applied area 21 captured by the imaging unit 11 . Accordingly, in the substrate G, the drying state of the application region 21 coated with the organic material can be detected early.

此外,在上述中,干燥状态检测部141f基于涂敷区域21的一个部位的色浓度检测涂敷区域21的干燥状态,但并不限定于此。即,干燥状态检测部141f例如也可以如图11中的假想线所表示,基于涂敷区域21中的多个部位的点22的色浓度检测干燥状态。In addition, in the above description, the dry state detection unit 141f detects the dry state of the applied area 21 based on the color density of one part of the applied area 21 , but the present invention is not limited thereto. That is, the dry state detection unit 141f may detect the dry state based on the color densities of the dots 22 at a plurality of locations in the application area 21, for example, as indicated by phantom lines in FIG. 11 .

由此,干燥状态检测部141f例如能够进行涂敷区域21内的多个部位的点22中色浓度的比较,能够确认涂敷区域21内是否已经均匀的干燥。Thereby, the dry state detection unit 141 f can compare the color densities of the dots 22 at a plurality of locations in the application area 21 , for example, and can confirm whether the application area 21 has been dried uniformly.

另外,由于也能够计算出涂敷区域21内的多个部位的点22的色浓度的差,因此能够根据该差推测涂敷区域21中的膜厚分布,其结果是能够分析相对涂敷区域21的干燥状态的膜厚的变化。In addition, since the difference in color density of dots 22 at multiple locations in the coating area 21 can also be calculated, the film thickness distribution in the coating area 21 can be estimated from the difference, and as a result, the relative coating area can be analyzed. 21 changes in film thickness in the dry state.

(第二实施方式)(second embodiment)

接着,对具有第二实施方式的检查装置200的减压干燥装置123c进行说明。此外,在以下的说明中,对与已说明的部分同样的部分标注与已说明的部分同样的附图标记,省略重复的说明。Next, the reduced-pressure drying device 123c provided with the inspection device 200 of the second embodiment will be described. In addition, in the following description, the same code|symbol as a part already demonstrated is attached|subjected to the part similar to what was already demonstrated, and redundant description is abbreviate|omitted.

在图2的实施方式中,改变了拍摄部的配置。图15是表示第二实施方式的拍摄单元310的拍摄部311附近的示意放大截面图。In the embodiment of FIG. 2, the arrangement of the imaging unit is changed. 15 is a schematic enlarged cross-sectional view showing the vicinity of the imaging unit 311 of the imaging unit 310 of the second embodiment.

如图15所示,在第二实施方式中,拍摄部311配置成拍摄部311的光轴相对于基板G的主面倾斜。此外,作为拍摄单元310的照明部312,与第一实施方式同样能够使用同轴照明的照明部。As shown in FIG. 15 , in the second embodiment, the imaging unit 311 is arranged such that the optical axis of the imaging unit 311 is inclined with respect to the main surface of the substrate G. As shown in FIG. In addition, as the illuminating part 312 of the imaging unit 310, the illuminating part of coaxial illumination can be used similarly to 1st Embodiment.

另外,拍摄单元310也可以进一步具有辅助照明部320。辅助照明部320例如配置在拍摄对象物即涂敷区域21的上方,对基板G照射拍摄用的光。此外,在图15中,为了便于理解,以虚线的封闭曲线示意地表示了涂敷区域21。In addition, the imaging unit 310 may further include an auxiliary lighting unit 320 . The auxiliary lighting unit 320 is arranged, for example, above the coating area 21 which is an object to be photographed, and illuminates the substrate G with light for photographing. In addition, in FIG. 15 , the application region 21 is schematically shown by a dotted closed curve for easy understanding.

在第二实施方式中,通过将拍摄部311按如上所述方式配置,与第一实施方式同样地能够在早期检测出涂敷区域21的干燥状态。此外,在第二实施方式中,通过以如上所述方式配置拍摄部311,通过从斜上方对涂敷区域21进行拍摄。从斜上方所拍摄的涂敷区域21的色浓度,有时随着干燥进行表示出比较大的变化,因此在第二实施方式中,能够更加准确地检测出涂敷区域21的干燥状态。In the second embodiment, by arranging the imaging unit 311 as described above, it is possible to detect the drying state of the application area 21 at an early stage similarly to the first embodiment. In addition, in the second embodiment, by arranging the imaging unit 311 as described above, the application area 21 is imaged from obliquely above. The color density of the application area 21 photographed from obliquely above may show a relatively large change as drying progresses. Therefore, in the second embodiment, the drying state of the application area 21 can be detected more accurately.

另外,在第二实施方式中,也可以构成为求得从斜上方所拍摄的涂敷区域21的体积,分析相对涂敷区域21的干燥状态的体积的变动等。In addition, in the second embodiment, the volume of the application area 21 photographed obliquely from above may be obtained, and the change in volume with respect to the dry state of the application area 21 may be analyzed.

(第三实施方式)(third embodiment)

接着,对具有第三实施方式的检查装置200的减压干燥装置123c进行说明。在第三实施方式中,如图9中以假想线所表示具有偏振滤光片400。由此,能够更准确地测量涂敷区域21的色浓度,其结果是能够检测出准确的干燥状态。Next, the reduced-pressure drying device 123c provided with the inspection device 200 of the third embodiment will be described. In the third embodiment, a polarizing filter 400 is provided as shown by phantom lines in FIG. 9 . Thereby, the color density of the application|coated area 21 can be measured more accurately, As a result, an accurate dry state can be detected.

以下进行详细说明,偏振滤光片400配置在拍摄部11与基板G的涂敷区域21(参照图11)之间。此外,在图9中,为了图示的简化,仅表示了配置在拍摄部11a与涂敷区域21之间的偏振滤光片400,省略了配置在拍摄部11b、11c与涂敷区域21之间的偏振滤光片400的图示。As described below in detail, the polarizing filter 400 is disposed between the imaging unit 11 and the application region 21 of the substrate G (see FIG. 11 ). In addition, in FIG. 9, in order to simplify the illustration, only the polarizing filter 400 arranged between the imaging part 11a and the application area 21 is shown, and the polarizing filter 400 arranged between the imaging parts 11b and 11c and the application area 21 is omitted. An illustration of the polarizing filter 400 in between.

但是,照明部12的光照射到涂敷区域21,在涂敷区域21发生反射。来自该涂敷区域21的反射光包括到达涂敷区域21的内部在基板G的上表面反射的“内部反射光”和没有到达涂敷区域21的内部在涂敷区域21的表面发生漫反射的“表面反射光”。该漫反射后的表面反射光对于拍摄部11来说成为噪声(干扰)的主要因素,因此尽可能不受光。However, the light of the illuminating part 12 is irradiated to the application|coating area|region 21, and is reflected in the application|coating area|region 21. The reflected light from the coating area 21 includes "internal reflection light" that reaches the inside of the coating area 21 and is reflected on the upper surface of the substrate G, and light that does not reach the inside of the coating area 21 and is diffusely reflected on the surface of the coating area 21. "Surface Reflects Light". The diffusely reflected surface reflected light becomes a main factor of noise (noise) for the imaging unit 11, so it is not lighted as much as possible.

因此,在偏振滤光片400,使具有上述的内部反射光的相位的光通过拍摄部11的光轴通过的中心部,使偏光的方向正交具有漫反射后的表面反射光的相位的光不通过包围该中心部的周边部。Therefore, in the polarizing filter 400, the light having the phase of the above-mentioned internally reflected light passes through the central part through which the optical axis of the imaging unit 11 passes, and the direction of polarization is made to be perpendicular to the light having the phase of the surface reflected light after diffuse reflection. The peripheral portion surrounding the central portion is not passed.

由此,在拍摄部11,通过偏振滤光片400能够减轻漫反射后的表面反射光的受光,能够抑制表面反射光的影响。因此,在第三实施方式中,能够更准确地测量涂敷区域21的色浓度,其结果是,能够检测出准确的干燥状态。Accordingly, in the imaging unit 11 , the reception of diffusely reflected surface reflected light can be reduced by the polarizing filter 400 , and the influence of the surface reflected light can be suppressed. Therefore, in the third embodiment, the color density of the application area 21 can be measured more accurately, and as a result, an accurate dry state can be detected.

(第一变形例)(first modified example)

接着,对具有第一变形例的检查装置200的减压干燥装置123c进行说明。Next, the reduced-pressure drying device 123c provided with the inspection device 200 of the first modified example will be described.

在第一变形例的减压干燥装置123c中,如图10的假想线所示,具有通知部410。并且,在减压干燥装置123c中,干燥状态检测部141f例如,在色浓度的变化率收敛在规定范围内之后,偏离了规定范围的情况下,推测为减压干燥装置123c中有可能发生了什么异常,通过通知部410向用户通知。In the reduced pressure drying device 123c of the first modified example, a notification unit 410 is provided as shown by phantom lines in FIG. 10 . In addition, in the reduced pressure drying device 123c, if the dry state detection unit 141f, for example, deviates from the predetermined range after the rate of change of the color density falls within the predetermined range, it is estimated that the dryness may have occurred in the reduced pressure drying device 123c. Any abnormalities are notified to the user through the notification unit 410 .

作为通知部410能够使用显示器或蜂鸣器等,在推测为减压干燥装置123c中发生了什么异常的情况下,例如表示异常发生的显示器进行显示或者蜂鸣器进行蜂鸣。由此,用户能够在早期了解到减压干燥装置123c的异常。A display, a buzzer, etc. can be used as the notification unit 410, and when it is estimated that something abnormal has occurred in the vacuum drying apparatus 123c, for example, a display indicating the occurrence of the abnormality is displayed or the buzzer sounds. Thereby, the user can recognize abnormality of the reduced-pressure drying apparatus 123c at an early stage.

另外,在第一变形例的减压干燥装置123c中,如图10中由假想线所示,也可以具有光测定器420。光测定器420设置在照明部12,测定照明部12的光量。In addition, in the reduced-pressure drying apparatus 123c of a 1st modification, as shown by the imaginary line in FIG. 10, the photodetector 420 may be provided. The light measuring device 420 is provided in the lighting unit 12 and measures the light quantity of the lighting unit 12 .

表示由光测定器420所测定的光量的信息输出到照明控制部141a。照明控制部141a,例如照明部12的光量降低,在检测出照明部12的劣化的情况下,通过通知部410向用户通知。Information indicating the amount of light measured by the light measuring device 420 is output to the lighting control unit 141a. The lighting control unit 141 a notifies the user through the notification unit 410 when, for example, the light intensity of the lighting unit 12 decreases and the deterioration of the lighting unit 12 is detected.

由此,例如,由于照明部12的经年劣化而不能正确地测量涂敷区域21的色浓度之前,能够催促用户对照明部12进行维护。即,能够预先避免由于照明部12的经年劣化而不能正确地测量涂敷区域21的色浓度,涂敷区域21的干燥状态的检测精度降低的情况。Thereby, for example, the user can be urged to perform maintenance on the lighting unit 12 before the color density of the application area 21 cannot be accurately measured due to aging deterioration of the lighting unit 12 . That is, it is possible to avoid a situation where the color density of the application area 21 cannot be accurately measured due to aging deterioration of the illumination unit 12 and the detection accuracy of the dry state of the application area 21 decreases.

(第二变形例)(second modified example)

接着,对第二变形例进行说明。在第二变形例的减压干燥装置123c中,根据被测量的色浓度的种类改变从照明部12向涂敷区域21照射的光的波长。Next, a second modified example will be described. In the reduced-pressure drying device 123c of the second modified example, the wavelength of the light irradiated from the illumination unit 12 to the application area 21 is changed according to the type of color density to be measured.

详细而言,存在通过测浓度测量部141d测量的涂敷区域21的色浓度的值根据从照明部12照射的光的波长发生改变的情况。因此,在第二变形例中,照明控制部141a根据要测量的涂敷区域21的色浓度的种类,选择容易表现随着干燥状态的进行的色浓度的变化的波长,向涂敷区域21照射所选择的波长的光。此外,通过照明控制部141a选择的波长例如能够是通过实验等预先导出适当的值,存储在存储部142等中的值。Specifically, the value of the color density of the application area 21 measured by the density measurement unit 141 d may vary depending on the wavelength of light irradiated from the illumination unit 12 . Therefore, in the second modified example, the illumination control unit 141 a selects a wavelength that is likely to show a change in color density as the dry state progresses according to the type of color density of the application area 21 to be measured, and irradiates the application area 21 . light of the selected wavelength. In addition, the wavelength selected by the illumination control part 141a can be the value which derived the suitable value in advance by experiment etc., and memorize|stored in the storage part 142 etc., for example.

由此,干燥状态检测部141f能够准确地掌握伴随干燥状态的进行的色浓度的变化,其结果是能够正确地检测出涂敷区域21的干燥状态。另外,如上所述通过改变光的波长,也能够减轻对涂敷的墨水的损伤,也能够取得更容易观察的拍摄图像。Thereby, the dry state detection part 141f can accurately grasp the change of color density accompanying progress of a dry state, As a result, the dry state of the application|coated area|region 21 can be detected accurately. In addition, by changing the wavelength of light as described above, damage to the applied ink can be reduced, and a captured image that is easier to observe can also be obtained.

(第三变形例)(third modified example)

接着,对第三变形例进行说明。在第三变形例的减压干燥装置123c中,拍摄部11构成为具有由红外线的透射率比较高的材质所制作的长焦透镜的红外线图像传感照相机。另外,在该情况下,窗部152也使用红外线的透射率比较高的材质。Next, a third modified example will be described. In the decompression drying device 123c of the third modified example, the imaging unit 11 is configured as an infrared image sensor camera having a telephoto lens made of a material having a relatively high infrared transmittance. Also in this case, a material having a relatively high transmittance of infrared rays is used for the window portion 152 .

在第三变形例中,能够利用红外线图像传感照相机(红外热照相机等)测定从作为测定对象的基板G的涂敷区域21释放的红外线的强度,观察涂敷区域21的温度分布、温度图像。另外,通过利用红外线图像传感照相机(红外热照相机等),能够高速地且非接触地进行温度测定。In the third modified example, it is possible to measure the intensity of infrared rays released from the coating area 21 of the substrate G as the measurement target by using an infrared image sensing camera (such as an infrared thermal camera), and observe the temperature distribution and temperature image of the coating area 21. . In addition, by using an infrared image sensing camera (such as an infrared thermal camera), high-speed and non-contact temperature measurement can be performed.

并且,如果将所测定的涂敷区域21的温度作为干燥状态信息142d存储在存储部142中,则能够分析相对涂敷区域21的干燥状态的涂敷区域21的温度变化。Furthermore, if the measured temperature of the application area 21 is stored in the storage unit 142 as the dry state information 142d, the change in temperature of the application area 21 with respect to the dry state of the application area 21 can be analyzed.

此外,上述的第一实施方式至第三实施方式和第一变形例至第三变形例中分别所说明的各构成也能够适当组合。即,例如也可以在第一实施方式的构成中组合第一变形例的通知部410和改变第二变形例的照明部12的光的波长的照明控制部141a。In addition, the respective configurations described in the first to third embodiments and the first to third modification examples described above can also be appropriately combined. That is, for example, the notification unit 410 of the first modification example and the illumination control unit 141 a that changes the wavelength of light of the illumination unit 12 of the second modification example may be combined in the configuration of the first embodiment.

另外,在上述内容中,腔室150的顶部150a在俯视时为矩形,将窗部152和第一~第三拍摄单元210a~210c沿着顶部150a的对角线配置,但并不限定于此。即,例如也可以将窗部152和第一~第三拍摄单元210a~210c相对于顶部150a沿着X轴方向或Y轴方向配置。In addition, in the above, the top 150a of the chamber 150 is rectangular in plan view, and the window portion 152 and the first to third imaging units 210a to 210c are arranged along the diagonal of the top 150a, but the present invention is not limited thereto. . That is, for example, the window portion 152 and the first to third imaging units 210 a to 210 c may be arranged along the X-axis direction or the Y-axis direction with respect to the top 150 a.

另外,在上述的构成中,在拍摄图像信息142a中包括表示涂敷区域21的干燥进行的过程的连续的拍摄图像。由此,例如,在设定减压干燥装置121c、122c、123c的减压干燥处理的干燥方案时,通过解析连续的拍摄图像,能够高效地实现最佳化。In addition, in the above-mentioned configuration, continuous captured images showing the progress of drying of the application area 21 are included in the captured image information 142a. Thereby, for example, when setting the drying schedule of the reduced-pressure drying process of the reduced-pressure drying devices 121c, 122c, and 123c, optimization can be efficiently realized by analyzing consecutive captured images.

更多的效果和变形例能够由从业人员容易地得到。因此,本发明的更多的方式并不限定于以上所表示的和所描述的特定的详细内容以及代表性的实施方式。因此,只要不脱离所附的权利要求的范围及其均等的范围所定义的概括性的发明思想和范围,就能够进行各种变更。More effects and modifications can be easily obtained by practitioners. Therefore, further aspects of the present invention are not limited to the specific details and representative embodiments shown and described above. Therefore, various modifications can be made without departing from the general inventive concept and scope defined by the appended claims and their equivalents.

Claims (9)

1. a kind of check device characterized by comprising
The shoot part that the area of application that organic material is coated in substrate is shot;
Drying regime test section detects the coating based on the colour saturation of the described the area of application shot by the shoot part The drying regime in region;With
Judging part calculates the value for indicating the variation of colour saturation of described the area of application, and judges that the calculated value is It is no in preset prescribed limit,
In the case where being judged as that the calculated value is in the prescribed limit by the judging part, the drying regime inspection Survey portion detects that described the area of application has become the state dried.
2. check device as described in claim 1, it is characterised in that:
The colour saturation includes red-color concentration, green concentration and blue intensity,
The drying regime test section selects the red-color concentration, the green concentration and institute according to the type of described the area of application At least one of blue intensity colour saturation is stated, the drying regime is detected based on the selected colour saturation.
3. check device as claimed in claim 1 or 2, it is characterised in that:
The drying regime test section detects the drying regime based on the colour saturation at multiple positions in described the area of application.
4. check device as claimed in claim 1 or 2, it is characterised in that:
The shoot part is configured to its optical axis and tilts relative to described the area of application.
5. check device as claimed in claim 1 or 2, it is characterised in that:
Including the polarizing filter being configured between the shoot part and described the area of application of the substrate.
6. a kind of decompression dry device characterized by comprising
Check device according to any one of claims 1 to 5;
For storing the chamber of the substrate;With
To the mechanism of decompressor depressurized in the chamber.
7. decompression dry device as claimed in claim 6, it is characterised in that:
Window portion including the chamber is arranged in,
The shoot part shoots described the area of application across the window portion.
8. decompression dry device as claimed in claim 6 characterized by comprising
Keep the maintaining part of the substrate;
Make the lifting unit of the maintaining part lifting;With
The lifting unit is controlled according to the drying regime detected to make the elevating control portion of the maintaining part lifting.
9. a kind of control method of decompression dry device characterized by comprising
The shooting step that the area of application that organic material is coated in substrate is shot;
The drying of described the area of application is detected based on the colour saturation of captured described the area of application in the shooting step The drying regime detecting step of state;With
Drying time setting procedure, based on the detected drying regime in the drying regime detecting step, setting The drying time that the chamber indoor pressure-reducing for storing the substrate is dried.
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