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CN106906442B - A kind of coating with high hardness and self-lubrication and preparation method thereof - Google Patents

A kind of coating with high hardness and self-lubrication and preparation method thereof Download PDF

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CN106906442B
CN106906442B CN201510982935.9A CN201510982935A CN106906442B CN 106906442 B CN106906442 B CN 106906442B CN 201510982935 A CN201510982935 A CN 201510982935A CN 106906442 B CN106906442 B CN 106906442B
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coating
self
high hardness
lubricity
preparing
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CN106906442A (en
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李金龙
王越
王永欣
王立平
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Ningbo Institute of Material Technology and Engineering of CAS
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Ningbo Institute of Material Technology and Engineering of CAS
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
    • C23C14/022Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5806Thermal treatment

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  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
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  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

本发明提供了一种具有高硬度与自润滑性的涂层。该涂层将具有高强韧性的非晶纳米晶结构与MAX相层状结构相结合,利用MAX相层状结构具有的良好自润滑性,使涂层不仅具有高硬度,而且具有良好的自润滑性能,能够满足装备关键零部件和工模具等基体的减摩耐磨防护需求。另外,针对由纳米晶TiN、非晶Si3N4以及Ti‑Si‑C三种元素的MAX相层状结构构成的涂层,本发明利用多弧离子镀技术制备该涂层,得到的涂层硬度可达30‑40GPa,摩擦系数可达0.1‑0.2。

The present invention provides a coating with high hardness and self-lubricating properties. The coating combines the amorphous nanocrystalline structure with high strength and toughness with the MAX phase layered structure, and utilizes the good self-lubricating property of the MAX phase layered structure, so that the coating not only has high hardness, but also has good self-lubricating properties , can meet the anti-friction and wear-resistant protection requirements of key components and tooling and other substrates. In addition, for the coating composed of the MAX phase layered structure of nanocrystalline TiN, amorphous Si 3 N 4 and Ti-Si-C three elements, the present invention utilizes the multi-arc ion plating technology to prepare the coating, and the obtained coating The layer hardness can reach 30‑40GPa, and the friction coefficient can reach 0.1‑0.2.

Description

A kind of coating and preparation method thereof with high rigidity and self-lubrication
Technical field
The present invention relates to a kind of technical field of surface more particularly to a kind of coatings with high rigidity and self-lubrication And preparation method thereof.
Background technique
Currently, equipment manufacture just develops towards high speed, high load, high-accuracy and green processing direction, to equipment key portion The reliability and long-life of part and tool and mould are also put forward higher requirements.Develop the surface peening of Advanced Equipment critical component and prevents Shield technology is to reduce equipment critical component friction power loss, extend service life and improve the key technology of functional reliability.
The hard coats such as titanium-based, the chromium base obtained using physical gas phase deposition technology can be used for tool and mould and equipment key portion The surfacecti proteon of part, and obtain good protection effect.However, although the hard coat hardness of these systems is sufficiently high, It is that friction reducing effect is undesirable.On the other hand, although the antifriction self-lubricating performance of some coatings is preferable, its hardness is not high, example Such as MoS2Coating has good antifriction self-lubricating performance, but its hardness is not high.
Therefore, exploring a kind of high rigidity and the coating of low-friction coefficient of having both is one of research topic of scientific worker, It can be applied to the anti-friction wear-resistant protection of equipment key components and parts and tool and mould.
Summary of the invention
Status in view of the above technology, the present invention is intended to provide a kind of coating with high rigidity and self-lubrication.
In order to achieve the above technical purposes, the present inventor is after a large amount of exploratory developments, by the amorphous with high-strength tenacity Nanocrystalline structure is combined with MAX phase layer structure, and the MAX phase layer structure refers to ternary layered ceramic Mn+1AXn(n=1- 6) structure, referred to as MAX phase, wherein M is magnesium-yttrium-transition metal, and A is major element, and X is C or N element.These MAX same genus six Prismatic crystal system, crystal structure can be described as M6X octahedron and A atomic layer interval stacking.Between M-X mainly with strong covalent bond and Ionic bond combines, and the combination between M-X and A atom is weaker.On the one hand this unique bonding pattern makes MAX phase ceramics With the excellent machinability of metal material and thermally conductive, electric conductivity;On the other hand again with anticorrosive, the antioxygen of ceramic material The characteristics such as change;Meanwhile unique nanometer laminated structure imparts the good self-lubrication of MAX phase ceramics and certain damage is held Limit.As lubricant, lubricant effect can compare favourably with common solid lubricant graphite, molybdenum disulfide etc.;And damage tolerance is then Make it that can bear certain deformation at normal temperature and brittle fracture will not occur, MAX phase is even more to have preferable plasticity at high temperature. Therefore, it when nanocrystalline structure is combined with MAX phase layer structure, since MAX phase layer structure has good self-lubrication, obtains To coating not only there is high rigidity, but also there is good self-lubricating property, can satisfy equipment key components and parts and work mould The anti-friction wear-resistant protection requirements of the matrixes such as tool.
That is, technical solution proposed by the present invention are as follows: a kind of coating with high rigidity and self-lubrication, it is characterized in that: institute Stating includes the amorphous nano crystal structure with high-strength tenacity in coating, also includes MAX phase layer structure.
The MAX phase include but is not limited to 211 phases, 312 phases, 413 phases, 514 phases, 615 phases, 716 phases, 523 phases or Any one of 725 phases or wherein several combinations.
Wherein, 211 phases include but is not limited to Ti2AlC、Ti2AlN、Hf2PbN、Cr2GaC、V2AsC、Ti2InN、Nb2AlC、 (Nb,Ti)2AlC、Ti2AlN0.5C0.5、Nb2GaC、Nb2AsC、Zr2InN、Ti2GeC、Cr2AlC、Zr2SC、Mo2GaC、Ti2CdC、 Hf2InN、Zr2SnC、Ta2AlC、Ti2SC、Ta2GaC、Sc2InC、Hf2SnN、Hf2SnC、V2AlC、Nb2SC、Ti2GaN、Ti2InC、 Ti2TIC、Ti2SnC、V2PC、Hf2SC、Cr2GaN、Zr2InC、Zr2TIC、Nb2SnC、Nb2PC、Ti2GaC、V2GaN、Nb2InC、 Hf2TIC、Zr2PbC、Ti2PbC、V2GaC、V2GeC、Hf2InC、Zr2TIN。
312 phases include but is not limited to Ti3AlC2、Ti3GeC2、Ti3SiC2、Ti3SnC2、Ta3AlC2、(V0.5Cr0.5)3AlC2、 V3AlC2、Ta3Al0.6Sn0.4C2
413 phases include but is not limited to Ti4SiC3、Ti4GaC3、Ti4GeC3、α-Ta4AlC3、β-Ta4AlC3、Nb4AlC3、 V4AlC3、(V,Cr)4AlC3
514 phases include but is not limited to (Nb0.5Ti0.5)5AlC4
615 phases include but is not limited to β-Ta6AlC5
716 phases include but is not limited to Ti7SnC6
523 phases include but is not limited to (V0.5Cr0.5)5Al2C3、Ti5Al2C3、Ti5Si2C3、Ti5Ge2C3
725 phases include but is not limited to Ti7Si2C5、Ti7Ge2C5
The amorphous nano-crystalline structural material with high-strength tenacity is unlimited including titanium-based amorphous nanocrystalline or chromium base The hard materials such as amorphous nano-crystalline.
As a kind of implementation, the amorphous nano crystal structure with high-strength tenacity is nanocrystalline TiN and amorphous Si3N4The nano composite structure of composition;The MAX phase layer structure is the MAX phase stratiform being made of tri- kinds of elements of Ti-Si-C Structure, including Ti4SiC3、Ti3SiC2、Ti5Si2C3、Ti7Si2C5Deng one of or two or more mixing.At this point, described The hardness of coating is up to 30-40GPa, and coefficient of friction is up to 0.1-0.2.The present inventor additionally provides a kind of using multi-arc ion coating The method that physical gas phase deposition technology prepares the coating, specific as follows:
(1) matrix of coating to be deposited is subjected to surface cleaning processing, is then fed into vacuum chamber and carries out forvacuum, and Keeping vacuum room temperature is 350-450 DEG C;
In the step (1), surface cleaning processing method is unlimited, including cleaned by ultrasonic vibration etc.;
Preferably, vacuum degree is lower than 3 × 10 after vacuum chamber carries out forvacuum processing in the step (1)-3Pa;
(2) it is filled with inert gas argon gas, using multi sphere ion plating technology etching described matrix surface;
In the step (2), the target that when etching uses is unlimited, can be pure titanium target material, titanium silicon target or silicon target Material bombards target under high bias using multi sphere ion plating technology, to have the function that etch described matrix surface;
In the step (2), preferably, etching bias used is 900-1200V;.
In the step (2), preferably, preferably, the target current is controlled in 40-50A;.
In the step (2), preferably, the etch period is 5-10min;
In the step (2), preferably, etching is more than three times, etching bias gradually increases from low to high, further The etch period 2-3min preferably under each bias condition;
(3) pure titanium target material is used, reaction gas is acetylene or nitrogen, utilizes multi sphere ion plating technology depositing Ti C transition Layer or TiN transition zone;
In the step (3), preferably, the purity of pure titanium target material is more than or equal to 99.9at.%;
In the step (3), preferably, TiC transition zone or TiN transition zone with a thickness of 100-200nm;
In the step (3), preferably, nitrogen pressure is 0.5-5Pa, target current 60-80A, substrate bias is 70-120V, depositing temperature are 350-450 DEG C;
In the step (3), preferably, acetylene air pressure is 0.5-5Pa, target current 60-80A, substrate bias is 70-120V, depositing temperature are 350-450 DEG C;
(4) TiSi target is used, reaction gas is the mixed gas of acetylene and nitrogen, is deposited using multi sphere ion plating technology The coating takes out after furnace cooling;
In the titanium silicon target, the mass percentage content of element silicon is 5-15%;
In the deposition process, air pressure 0.5-5Pa, target current 60-80A, substrate bias 10-40V, deposition temperature Degree is 400-450 DEG C;
(5) vacuum or protective atmosphere heat treatment, heat treatment temperature 600- will be carried out through step (4) treated matrix 1000℃。
In the step (5), preferably, heat treatment time is 1-3 hours.
In conclusion the present invention combines the amorphous nano crystal structure with high-strength tenacity with MAX phase layer structure To a kind of new coating structure, the good self-lubrication having using MAX phase layer structure makes coating not only have high rigidity, And there is good self-lubricating property, the anti-friction wear-resistant protection that can satisfy the equipment matrixes such as key components and parts and tool and mould needs It asks.In addition, for by nanocrystalline TiN, amorphous Si3N4And the coating that the MAX phase layer structure of tri- kinds of elements of Ti-Si-C is constituted, The present invention prepares the coating using multi sphere ion plating technology, has the following beneficial effects:
(1) multi sphere ion plating technology is utilized, by selection TiSi target, is filled with acetylene and nitrogen, and control sedimentary condition, I.e. control depositing temperature is 400-450 DEG C, substrate bias 10-40V, target current 60-80A and deposition pressure are 0.5- 5Pa, not only deposition obtains nanocrystalline TiN and amorphous Si3N4, and the MAX phase layer structure of tri- kinds of elements of Ti-Si-C is obtained, because And improve the self-lubricating property of coating;
(2) subsequent vacuum or protective atmosphere heat treatment are carried out by the coating to deposition, further promoted in coating Formation with layer structure MAX phase;
(3) high rigidity and self-lubrication are had both using the coating that this method deposits, hardness is rubbed up to 30-40GPa Coefficient is wiped up to 0.1-0.2.
Detailed description of the invention
Fig. 1 is the transmission electron microscope picture of TiSiCN coating made from the embodiment of the present invention 1;
Fig. 2 is the hardness of TiSiCN coating made from the embodiment of the present invention 1 with the change curve of depth;
Fig. 3 is the friction coefficient curve of TiSiCN coating made from the embodiment of the present invention 1.
Specific embodiment
Present invention is further described in detail with embodiment with reference to the accompanying drawing, it should be pointed out that reality as described below It applies example to be intended to convenient for the understanding of the present invention, and does not play any restriction effect to it.
Embodiment 1:
In the present embodiment, the coating with high rigidity and self-lubrication includes by nanocrystalline TiN and amorphous Si3N4It constitutes Amorphous nano-crystalline composite construction with high-strength tenacity further includes the MAX phase layer structure of tri- element of Ti-Si-C.
In the present embodiment, above-mentioned coating is prepared using multi sphere ion plating technology, specifically includes the following steps:
(1) the titanium alloy test piece sample of coating to be deposited is subjected to mechanical lapping polishing, is then carried out in acetone reagent Cleaned by ultrasonic vibration, sample clean 3 times, the sample after cleaning air-dries;
(2) sample is sent into vacuum chamber, vacuum chamber carries out forvacuum to back end vacuum degree 1 × 10-3Pa, in forvacuum During vacuum chamber is heated, heating temperature is to 450 DEG C;
(3) after back end vacuum and heating temperature reach requirement, it is filled with inert gas argon gas, is splashed using multi sphere ion plating technology Penetrate cleaning pure Ti target 2min, ion sputtering etch cleaner sample 5min;
(4) pure titanium target material (target purity 99.9at.%) is used, is filled with reaction gas nitrogen, utilizes multi-arc ion coating skill Art, adjustment air pressure are 0.5Pa, and target current 60A, matrix is bias 70V, in sample surfaces depositing TiN transition zone;
(5) titanium silicon target is used, wherein the mass percentage content of element silicon is 5-15%, and reaction gas is acetylene and nitrogen The mixed gas of gas, using multi sphere ion plating technology, adjustment air pressure is 0.5Pa, target current 60A, substrate bias 40V, is sunk Accumulated temperature degree is 450 DEG C, sedimentation time 2h, in TiN transition layer surface depositing coating, then cools to 200 DEG C or less with the furnace and takes Out;
(6) 800 DEG C will be carried out vacuum heat treatment 1 hour through step (5) treated sample.
Through the above-mentioned coating being prepared using its result of its microstructure of transmission electron microscope observing as shown in Figure 1, being shown in It forms that TiN is nanocrystalline and Si3N4 amorphous phase in coating, while observing the presence of stratiform MAX phase.
The above-mentioned coating being prepared is subjected to hardness test, test method are as follows: use nano-hardness tester continuous stiffness measurement It is tested, the hardness of the coating is with the curve of change in depth as shown in Fig. 2, showing that the hardness of the coating is up to 38GPa.
The above-mentioned coating being prepared is subjected to frictional behaviour test, test method are as follows: utilize UMT friction wear testing machine It is tested, the friction coefficient curve of the coating is as shown in figure 3, show that the coefficient of friction of the coating is about 0.15.
Embodiment 2:
In the present embodiment, the coating with high rigidity and self-lubrication includes by nanocrystalline TiN and amorphous Si3N4It constitutes Amorphous nano-crystalline composite construction with high-strength tenacity further includes the MAX phase layer structure of tri- element of Ti-Si-C.
In the present embodiment, above-mentioned coating is prepared using multi sphere ion plating technology, specifically includes the following steps:
(1) the titanium alloy test piece sample of coating to be deposited is subjected to mechanical lapping polishing, is then carried out in acetone reagent Cleaned by ultrasonic vibration, sample clean 3 times, the sample after cleaning air-dries;
(2) sample is sent into vacuum chamber, vacuum chamber carries out forvacuum to back end vacuum degree 1 × 10-3Pa, in forvacuum During vacuum chamber is heated, heating temperature is to 400 DEG C;
(3) after back end vacuum and heating temperature reach requirement, it is filled with inert gas argon gas, is splashed using multi sphere ion plating technology Penetrate cleaning pure Ti target 2min, ion sputtering etch cleaner sample 5min;
(4) pure titanium target material (target purity 99.9at.%) is used, being filled with reaction gas is acetylene, utilizes multi-arc ion coating Technology, adjustment air pressure are 2Pa, and target current 80A, matrix is bias 40V, in sample surfaces depositing Ti C transition zone;
(5) titanium silicon target is used, wherein the mass percentage content of element silicon is 5-15%, and reaction gas is acetylene and nitrogen The mixed gas of gas, using multi sphere ion plating technology, adjustment air pressure is 3Pa, target current 70A, substrate bias 30V, deposition Temperature is 400 DEG C, sedimentation time 2h, in TiC transition layer surface depositing coating, then cools to 200 DEG C or less taking-ups with the furnace;
(6) 700 DEG C will be carried out vacuum heat treatment 1 hour through step (5) treated sample.
, the display similar to Figure 1 using its result of its microstructure of transmission electron microscope observing through the above-mentioned coating being prepared It forms that TiN is nanocrystalline and Si3N4 amorphous phase in the coating, while observing the presence of stratiform MAX phase.
The above-mentioned coating being prepared is subjected to hardness test, test method is same as Example 1, measures the hard of the coating Degree shows that the hardness of the coating is up to 36GPa with the curve similar to Figure 2 of change in depth.
The above-mentioned coating being prepared is subjected to frictional behaviour test, test method is same as Example 1, measures the coating Hardness with the curve similar to Figure 3 of change in depth, show that the coefficient of friction of the coating is about 0.12.
Technical solution of the present invention and beneficial effect is described in detail in embodiment described above, it should be understood that Above is only a specific embodiment of the present invention, it is not intended to restrict the invention, it is all to be done in spirit of the invention Any modification and improvement etc., should all be included in the protection scope of the present invention.

Claims (13)

1.一种具有高硬度与自润滑性的涂层的制备方法,其特征是:所述涂层中包括纳米晶TiN、非晶Si3N4,以及由Ti-Si-C三种元素构成的MAX相层状结构;1. a kind of preparation method of the coating with high hardness and self-lubricity is characterized in that: comprise nanocrystalline TiN, amorphous Si 3 N 4 in the described coating, and be made up of three kinds of elements of Ti-Si-C The MAX phase layered structure; 采用多弧离子镀物理气相沉积技术,具体包括如下步骤:Adopt multi-arc ion plating physical vapor deposition technology, which specifically includes the following steps: (1)将待沉积涂层的基体进行表面清洗处理,然后送入真空室进行预抽真空,并且保持真空室内温度为350-450℃;(1) The substrate on which the coating is to be deposited is subjected to surface cleaning treatment, and then sent to a vacuum chamber for pre-evacuation, and the temperature in the vacuum chamber is kept at 350-450 °C; (2)充入惰性气体氩气,采用多弧离子镀技术清洗刻蚀所述基体表面;(2) Filling with inert gas argon, using multi-arc ion plating technology to clean and etch the surface of the substrate; (3)采用纯钛靶材,反应气体为乙炔或者氮气,利用多弧离子镀技术沉积TiC过渡层或者TiN过渡层;(3) Using pure titanium target material, the reaction gas is acetylene or nitrogen, and using multi-arc ion plating technology to deposit TiC transition layer or TiN transition layer; (4)采用TiSi靶材,反应气体为乙炔和氮气的混合气体,利用多弧离子镀技术沉积所述涂层,然后随炉冷却后取出;(4) adopt TiSi target material, the reaction gas is the mixed gas of acetylene and nitrogen, utilize multi-arc ion plating technology to deposit described coating, and then take out after cooling with the furnace; 所述的钛硅靶材中,硅元素的质量百分比含量为5-15%;In the titanium-silicon target, the mass percentage of silicon is 5-15%; 所述的沉积过程中,气压为0.5-5Pa,靶电流为60-80A,基体偏压为10-40V,沉积温度为400-450℃;In the deposition process, the air pressure is 0.5-5Pa, the target current is 60-80A, the substrate bias voltage is 10-40V, and the deposition temperature is 400-450°C; (5)将经步骤(4)处理后的基体进行真空或保护气氛热处理,热处理温度为600-1000℃。(5) The substrate treated in step (4) is subjected to vacuum or protective atmosphere heat treatment, and the heat treatment temperature is 600-1000°C. 2.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的MAX相包括Ti2SC、Ti3SiC2、Ti4SiC3、Ti5Si2C3、Ti7Si2C5中的任一种或者其中几种的组合。2. The method for preparing a coating with high hardness and self-lubricity as claimed in claim 1, wherein the MAX phase comprises Ti 2 SC, Ti 3 SiC 2 , Ti 4 SiC 3 , Ti 5 Si Any one of 2 C 3 , Ti 7 Si 2 C 5 or a combination of several of them. 3.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述涂层的硬度为30-40GPa,摩擦系数为0.1-0.2。3 . The method for preparing a coating with high hardness and self-lubricity as claimed in claim 1 , wherein the hardness of the coating is 30-40 GPa and the friction coefficient is 0.1-0.2. 4 . 4.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(2)中,刻蚀时采用的靶材是纯钛靶材、钛硅靶材或者硅靶材。4. The method for preparing a coating with high hardness and self-lubricity as claimed in claim 1, wherein in the step (2), the target material used during etching is a pure titanium target material, a titanium Silicon target or silicon target. 5.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(2)中,刻蚀所用偏压为900-1200V。5 . The method for preparing a coating with high hardness and self-lubricity as claimed in claim 1 , wherein in the step (2), the bias voltage used for etching is 900-1200V. 6 . 6.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(2)中,所述的靶电流控制在40-50A。6 . The method for preparing a coating with high hardness and self-lubricity as claimed in claim 1 , wherein in the step (2), the target current is controlled at 40-50A. 7 . 7.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(2)中,所述的刻蚀时间为5-10min。7 . The method for preparing a coating with high hardness and self-lubricity as claimed in claim 1 , wherein in the step (2), the etching time is 5-10 min. 8 . 8.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(2)中,刻蚀三次以上,刻蚀偏压由低到高逐渐增加。8. The method for preparing a coating with high hardness and self-lubricity as claimed in claim 1, wherein in the step (2), etching is performed more than three times, and the etching bias is gradually increased from low to high. Increase. 9.如权利要求7所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(3)中,纯钛靶材的纯度大于或者等于99.9at.%。9 . The method for preparing a coating with high hardness and self-lubricity according to claim 7 , wherein in the step (3), the purity of the pure titanium target is greater than or equal to 99.9 at.%. 10 . 10.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(3)中,TiC过渡层或者TiN过渡层的厚度为100-200nm。10 . The method for preparing a coating with high hardness and self-lubricity as claimed in claim 1 , wherein in the step (3), the thickness of the TiC transition layer or the TiN transition layer is 100-200 nm. 11 . 11.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(3)中,氮气气压为0.5-5Pa,靶电流为60-80A,基体偏压为70-120V,沉积温度为350-450℃。11. The preparation method of the coating with high hardness and self-lubricity as claimed in claim 1, characterized in that: in the step (3), the nitrogen gas pressure is 0.5-5Pa, and the target current is 60-80A, The substrate bias is 70-120V, and the deposition temperature is 350-450°C. 12.如权利要求1所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(3)中,乙炔气压为0.5-5Pa,靶电流为60-80A,基体偏压为70-120V,沉积温度为350-450℃。12. The method for preparing a coating with high hardness and self-lubricity as claimed in claim 1, wherein in the step (3), the acetylene gas pressure is 0.5-5Pa, and the target current is 60-80A, The substrate bias is 70-120V, and the deposition temperature is 350-450°C. 13.如权利要求7所述的具有高硬度与自润滑性的涂层的制备方法,其特征是:所述的步骤(5)中,热处理时间为1-3小时。13 . The method for preparing a coating with high hardness and self-lubricity as claimed in claim 7 , wherein in the step (5), the heat treatment time is 1-3 hours. 14 .
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