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CN106892813A - A kind of method that difluoro chloracetyl chloride is prepared by gas phase photooxidation reaction - Google Patents

A kind of method that difluoro chloracetyl chloride is prepared by gas phase photooxidation reaction Download PDF

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Publication number
CN106892813A
CN106892813A CN201510946309.4A CN201510946309A CN106892813A CN 106892813 A CN106892813 A CN 106892813A CN 201510946309 A CN201510946309 A CN 201510946309A CN 106892813 A CN106892813 A CN 106892813A
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gas phase
difluoro
chloracetyl chloride
photooxidation reaction
photooxidation
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CN106892813B (en
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王术成
刘武灿
张迪
刘建鹏
吴江平
袁光伟
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Zhejiang Lantian Environmental Protection Hi Tech Co Ltd
Sinochem Lantian Co Ltd
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Zhejiang Lantian Environmental Protection Hi Tech Co Ltd
Sinochem Lantian Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/58Preparation of carboxylic acid halides

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  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

The invention provides one kind under ultraviolet light, by CClF2CHCl2With the method that oxygen prepares difluoro chloracetyl chloride through gas phase photooxidation reaction, effective ultraviolet light Domain Volume of ultraviolet source is more than the 70% of photooxidation reaction body product in the photooxidation reaction device.The characteristics of method that the present invention is provided has photooxidation reaction efficiency high and difluoro chloracetyl chloride selectively high.

Description

A kind of method that difluoro chloracetyl chloride is prepared by gas phase photooxidation reaction
Technical field
The present invention relates to a kind of method for preparing difluoro chloracetyl chloride, more particularly to one kind prepares difluoro by gas phase photooxidation reaction The method of chloracetyl chloride.
Background technology
Difluoro chloracetyl chloride, abbreviation CDFAC is a kind of colourless liquid of the smell with irritating of high volatility, facile hydrolysis, Smoke in atmosphere, is soluble in organic solvent, can be used for synthesizing fluoro azetidin ketone antibiotic, pyrazole carboxamides sterilized The intermediate of the medicine such as agent, herbicide and agricultural chemicals.
Mainly there are two kinds for the preparation method of difluoro chloracetyl chloride.One kind is with R112a (CClF2CCl3) it is raw material, oleum Acid is oxidant, under mercuri catalyst action, difluoro chloracetyl chloride is prepared through catalysis oxidation.Another kind is in photoinitiation Under, R122 (CClF2CHCl2) prepare difluoro chloracetyl chloride with oxygen generation photooxidation reaction.
Wherein first method, prior art has done following effort:
United States Patent (USP) US3160659 reports R112a and SO3The method that reaction prepares difluoro chloracetyl chloride, catalyst is HgSO4/Hg2SO4, the yield of difluoro chloracetyl chloride can reach 94%.
United States Patent (USP) US3725475 is improved this, by R112a and SO3The method that reaction prepares difluoro chloracetyl chloride, Catalyst is HgSO4/Hg2SO4, with SO2Cl2Used as the solvent of R112a, the yield of difluoro chloracetyl chloride can reach 96.3%.
For second method, prior art has done following effort:
United States Patent (USP) US5545298 reports R122 and O2Generation photochemical oxidation reacts, and continuously prepares the side of difluoro chloracetyl chloride Method, initiation light source is high pressure mercury vapour lamp, and the conversion ratio of R122 can reach 89%, and accessory substance is mainly COCl2、CO2、COF2
United States Patent (USP) US5569782 uses chlorine as light trigger, makes R122, O2And Cl2Generation photooxidation reaction prepares two Fluorine chloracetyl chloride.Up to 94%, the selectivity of difluoro chloracetyl chloride is 93% to the conversion ratio of wherein light source lambda >=290nm, R122, Generation accessory substance is including R112a etc..
Chinese patent CN103351292 is reported under high voltage mercury lamp radiation, makes R122 and O2And Cl2Generation gas phase photochemistry oxygen Change the method that reaction prepares difluoro chloracetyl chloride, difluoro chloracetyl chloride yield is up to 85%.
United States Patent (USP) US5259938 reports the M (CF comprising R1222)nCHxCly、O2And Cl2Generation liquid phase photooxidation is anti- The corresponding method containing fluoracyl chloride, wherein light source lambda > 280nm should be prepared.The method liquid phase photooxidation reaction free radical is effectively touched Hit less, photooxidation reaction efficiency is low.
Above-mentioned the first catalysed oxidation processes difluoro chloracetyl chloride high income, but mercury catalyst must be used, exist in terms of environmental protection Pressure.Second Photoxidation Methods reacts more difficult control, is susceptible to the hypertoxic by-product COCl of photolysis reactionses generation2So that difluoro Chloracetyl chloride is selectively relatively low, it is more difficult to accomplish scale production.
Therefore, still it is hopeful to be further improved the preparation method of difluoro chloracetyl chloride choosing.
The content of the invention
It is an object of the invention to provide a kind of method that gas phase photooxidation reaction prepares difluoro chloracetyl chloride, with photooxidation reaction The characteristics of efficiency high and difluoro chloracetyl chloride selectively high.
The present invention provides following technical scheme:
A kind of method that gas phase photooxidation reaction prepares difluoro chloracetyl chloride, methods described includes:
In photooxidation reaction device, under ultraviolet light, in the presence of chlorine, CClF2CHCl2It is anti-through gas phase photooxidation with oxygen Difluoro chloracetyl chloride should be obtained;
The photooxidation reaction device includes one or more ultraviolet sources, and the ultraviolet source is placed in cold-trap, and ultraviolet source Effective ultraviolet light Domain Volume is more than the 70% of photooxidation reaction body product.
Synthetic route of the invention is as follows:
Photooxidation reaction device of the present invention is made up of main reaction device and ultraviolet source etc..The longitudinal profile schematic diagram of reaction unit Such as Fig. 1, wherein:1 is ultraviolet source, and 2 is cold-trap, R1It is cold-trap external diameter, R2For the radial light of ultraviolet source shines radius.
Cold-trap of the present invention is arranged on outside ultraviolet source, can be cooled down light source and be filtered part short wave ultraviolet light.According to reactor Structure, cold-trap can be secured transverse on main reaction device.
Preferably, the cold-trap material is preferably quartz, simple glass or high-boron-silicon glass.
The present invention can center one, two or more ultraviolet sources in main reaction dress as needed.When only set a purple During outer light source, the shape of the ultraviolet source can be the annular reactor with mean intensity.It is two or more ultraviolet when setting During light source, the ultraviolet source can vertical distribution in main reaction device.
Preferably, the ultraviolet source is selected from medium pressure mercury lamp, high-pressure sodium lamp, Metal halogen lamp or xenon lamp.
Preferably, the EWL of ultraviolet source is 300~400nm.
Preferably, the unit volume light source power of the photooxidation reaction device is 5~195W/L.
Ultraviolet source of the present invention provides an effective ultraviolet light region, its volume V1=π L (R2 2-R1 2), wherein:L It is ultraviolet source axial direction optical path, R2For ultraviolet source radial light shines radius, R1It is cold-trap external diameter.
Preferably, effective ultraviolet light Domain Volume of the ultraviolet source is more than the 70% of photooxidation reaction body product. It may further be preferable that effective ultraviolet light Domain Volume of the ultraviolet source is the 75~95% of photooxidation reaction body product.
When the photooxidation reaction device includes two or more ultraviolet sources, it is preferred that between the ultraviolet source Distance is effective ultraviolet light regional diameter 2R of ultraviolet source2180~200%.
The method that the gas phase photooxidation reaction that the present invention is provided prepares difluoro chloracetyl chloride, the raw material CClF2CHCl2, oxygen and Mol ratio between chlorine meets is smoothed out reaction.To improve reaction efficiency, it is preferred that the CClF2CHCl2、 Mol ratio between oxygen and chlorine is 1:0.6~2.4:0.07~1.0.It may further be preferable that CClF2CHCl2, oxygen Mol ratio and chlorine between is 1:0.7~2.2:0.1~0.9.The oxygen for using is oxidant, and described oxygen is not limited to Pure oxygen, or non-pure oxygen, such as air or through N2The oxygen of dilution.The chlorine for using is light trigger, and illumination produces chlorine certainly By triggering the reaction after base.
The method that the gas phase photooxidation reaction that the present invention is provided prepares difluoro chloracetyl chloride, reaction temperature meets is smoothed out reaction .If reaction temperature is too low, raw material CClF2CHCl2It is then liquid phase, free radical effective collision is less, photooxidation reaction efficiency It is relatively low.To improve reaction efficiency, it is preferred that the reaction temperature is 80~200 DEG C.It may further be preferable that described anti- It is 90~180 DEG C to answer temperature.
The method that the gas phase photooxidation reaction that the present invention is provided prepares difluoro chloracetyl chloride, reaction pressure meets is smoothed out reaction .Light reaction efficiency and product is conducive to continuously quickly to be discharged from reactor to improve, it is preferred that the reaction pressure is 0~0.5MPa.It may further be preferable that the reaction pressure is 0~0.2MPa.
The method that the gas phase photooxidation reaction that the present invention is provided prepares difluoro chloracetyl chloride, residence time satisfaction is smoothed out reaction .To improve reaction efficiency, it is preferred that the residence time is 0.2~25min.It may further be preferable that described stop It is 0.5~20min to stay the time.
The method that the gas phase photooxidation reaction that the present invention is provided prepares difluoro chloracetyl chloride, the raw material CClF2CHCl2, oxygen and Chlorine, before photooxidation reaction device is entered, preferably through preheating, to promote the carrying out of radical reaction.Preferably, preheat Temperature is 100~190 DEG C.
Brief description of the drawings
Fig. 1 is the longitudinal profile schematic diagram of reaction unit, wherein:1 is ultraviolet source, and 2 is cold-trap, and 3 is temperature-measuring port, and 4 are Material inlet, 5 is heat-conducting medium import, and 6 is cold-trap mounting flange, and 7 is reacting product outlet, and 8 export for heat-conducting medium, 9 It is heating medium chuck, 10 is effective ultraviolet light region of single source, R1It is cold-trap external diameter, R2It is the footpath of ultraviolet source To illumination radius.
Specific embodiment
The present invention is further described with reference to specific embodiment, but does not limit the invention to these specific implementations Mode.One skilled in the art would recognize that all alternative present invention encompasses what is potentially included in Claims scope Scheme, improvement project and equivalents.
Embodiment 1
Using 2L photooxidation reactions device and single 80W high-pressure sodium lamp, effective ultraviolet light Domain Volume of ultraviolet source is photooxidation Change the 90% of reactor volume.Mol ratio is 1:1.5:0.3 R122, oxygen and chlorine are mixed by 120 DEG C of vaporizer preheating Enter reactor after conjunction, 0.22mol (36.5g) R122 is introduced in 60min.Under the conditions of normal pressure, 110 DEG C of reaction temperature, The gas phase photo-oxidation product of illumination reaction 4min is continuously discharged from reactor head.Chromatography result:R122 conversion ratios 99.8%, CDFAC、R112a、COCl2It is with other selectivity selectivity respectively 98.5%, 0.1%, 0.8% and 0.6%, CDFAC yield 98.3%.
Embodiment 2
Respectively using 4L photooxidation reactions device and single 80W high-pressure sodium lamp, effective ultraviolet light Domain Volume of ultraviolet source is Respectively the 45% and 23% of photooxidation reaction body product.Other conditions are with embodiment 1.Implementation result data are shown in Table 1.
Embodiment 3
Respectively using 8L photooxidation reactions device and single 80W high-pressure sodium lamp, effective ultraviolet light Domain Volume of ultraviolet source is Respectively the 45% and 23% of photooxidation reaction body product.Other conditions are with embodiment 1.Implementation result data are shown in Table 1.
Table 1
Embodiment 4
Use 100L photooxidation reactions device and 4 equally distributed 600W high-pressure sodium lamps, effective ultraviolet light of ultraviolet source Domain Volume is the 80% of photooxidation reaction body product.Mol ratio is 1:1.2:0.4 R122, oxygen and chlorine are by 150 DEG C The pre- hot mixing of vaporizer after enter reactor, in 60min introduce 14.59mol (2472.4g) R122.In normal pressure, instead Answer under the conditions of 110 DEG C of temperature, light application time 6min, gas phase photo-oxidation product is continuously discharged from reactor head.Chromatography knot Really:R122 conversion ratios 99.5%, CDFAC, R112a, COCl2And CO2Selectivity selectivity is respectively 98.3%, 0.2%, 1.0% It is 97.8% with 0.5%, CDFAC yields.
Embodiment 5
Use 100L photooxidation reactions device and 4 equally distributed 600W high-pressure sodium lamps, effective ultraviolet light of ultraviolet source Domain Volume is the 80% of photooxidation reaction body product.Reaction temperature is respectively 70 DEG C, 90 DEG C, 110 DEG C, 130 DEG C and 150 DEG C, Other conditions are with embodiment 2.Chromatography result is as shown in table 2 below.
Table 2
Embodiment 6
Use 100L photooxidation reactions device and 4 equally distributed 600W high-pressure sodium lamps, effective ultraviolet light of ultraviolet source Domain Volume is the 80% of photooxidation reaction body product.R122, oxygen and chlorine mol ratio are respectively 1:1.5:0.1、1:1.5:0.3、 1:1.5:0.5、1:1.5:0.7、1:1.5:0.9, other conditions are with embodiment 2.Chromatography result is as shown in table 3 below.
Table 3
Embodiment 7
Use 100L photooxidation reactions device and 4 equally distributed 600W high-pressure sodium lamps, effective ultraviolet light of ultraviolet source Domain Volume is the 80% of photooxidation reaction body product.The illumination reaction time is respectively 1min, 3min, 5min, 10min, 25min, Other conditions are with embodiment 2.Chromatography result is as shown in table 4 below.
Table 4

Claims (10)

1. a kind of method that gas phase photooxidation reaction prepares difluoro chloracetyl chloride, it is characterised in that methods described includes:
In photooxidation reaction device, under ultraviolet light, in the presence of chlorine, CClF2CHCl2It is anti-through gas phase photooxidation with oxygen Difluoro chloracetyl chloride should be obtained;
The photooxidation reaction device includes one or more ultraviolet sources, and the ultraviolet source is placed in cold-trap, and ultraviolet source Effective ultraviolet light Domain Volume is more than the 70% of photooxidation reaction body product.
2. the method for preparing difluoro chloracetyl chloride according to the gas phase photooxidation reaction described in claim 1, it is characterised in that the ultraviolet light Effective ultraviolet light Domain Volume in source is the 75~95% of photooxidation reaction body product.
3. the method for preparing difluoro chloracetyl chloride according to the gas phase photooxidation reaction described in claim 1, it is characterised in that the photooxidation When reactor includes two or more ultraviolet sources, the distance between ultraviolet source is effective ultraviolet light of ultraviolet source The 180~200% of regional diameter.
4. the method for preparing difluoro chloracetyl chloride according to the gas phase photooxidation reaction described in claim 1, it is characterised in that the ultraviolet light The EWL in source be 300~400nm, in the photooxidation reaction device unit volume light source power of ultraviolet source be 5~ 195W/L。
5. the method for preparing difluoro chloracetyl chloride according to the gas phase photooxidation reaction described in claim 1, it is characterised in that CClF2CHCl2、 Mol ratio between oxygen and chlorine is 1:0.6~2.4:0.07~1.0.
6. the method for preparing difluoro chloracetyl chloride according to the gas phase photooxidation reaction described in claim 5, it is characterised in that CClF2CHCl2、 Mol ratio between oxygen and chlorine is 1:0.7~2.2:0.1~0.9.
7. the method for preparing difluoro chloracetyl chloride according to the gas phase photooxidation reaction described in claim 1, it is characterised in that reaction temperature is 80~200 DEG C, reaction pressure is 0~0.5MPa, and the residence time is 0.2~25min.
8. the method for preparing difluoro chloracetyl chloride according to the gas phase photooxidation reaction described in claim 1, it is characterised in that reaction temperature is 90~180 DEG C, reaction pressure is 0~0.2MPa, and the residence time is 0.5~20min.
9. the method for preparing difluoro chloracetyl chloride according to the gas phase photooxidation reaction described in claim 1, it is characterised in that CClF2CHCl2、 Enter photooxidation reaction device after oxygen and chlorine are preheated, preheating temperature is 100~190 DEG C.
10. the method for preparing difluoro chloracetyl chloride according to the gas phase photooxidation reaction described in claim 1, it is characterised in that the cold-trap Material be selected from quartz, simple glass or high-boron-silicon glass.
CN201510946309.4A 2015-12-17 2015-12-17 Method for preparing difluorochloroacetyl chloride by gas-phase photooxidation reaction Active CN106892813B (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108191644A (en) * 2017-12-28 2018-06-22 湖北卓熙氟化股份有限公司 A kind of preparation method of chlorine difluoroacetic acid chloride
CN108516932A (en) * 2018-05-29 2018-09-11 江苏蓝色星球环保科技股份有限公司 The method that trichloro ethylene prepares trifluoro-acetyl chloride
CN109180479A (en) * 2018-09-30 2019-01-11 禾信天成科技(天津)有限公司 A kind of preparation method of difluoro bromacetate
CN112979465A (en) * 2019-12-02 2021-06-18 浙江省化工研究院有限公司 Method for preparing ethyl difluorobromoacetate
WO2024075010A1 (en) * 2022-10-05 2024-04-11 Fluorinnovation L.L.C-Fz New photochemical reactor design and process for performing exothermic photochemical reactions

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3883407A (en) * 1973-04-20 1975-05-13 Halocarbon Prod Corp Production of 2,2,2-trifluoroacetyl chloride

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3883407A (en) * 1973-04-20 1975-05-13 Halocarbon Prod Corp Production of 2,2,2-trifluoroacetyl chloride

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108191644A (en) * 2017-12-28 2018-06-22 湖北卓熙氟化股份有限公司 A kind of preparation method of chlorine difluoroacetic acid chloride
CN108516932A (en) * 2018-05-29 2018-09-11 江苏蓝色星球环保科技股份有限公司 The method that trichloro ethylene prepares trifluoro-acetyl chloride
CN109180479A (en) * 2018-09-30 2019-01-11 禾信天成科技(天津)有限公司 A kind of preparation method of difluoro bromacetate
CN112979465A (en) * 2019-12-02 2021-06-18 浙江省化工研究院有限公司 Method for preparing ethyl difluorobromoacetate
CN112979465B (en) * 2019-12-02 2022-06-28 浙江省化工研究院有限公司 Method for preparing ethyl difluorobromoacetate
WO2024075010A1 (en) * 2022-10-05 2024-04-11 Fluorinnovation L.L.C-Fz New photochemical reactor design and process for performing exothermic photochemical reactions

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