CN106876363A - The fan-out package structure and its process of 3D connections - Google Patents
The fan-out package structure and its process of 3D connections Download PDFInfo
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/03—Manufacturing methods
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H—ELECTRICITY
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- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
- H01L2224/0231—Manufacturing methods of the redistribution layers
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
- H01L2224/0233—Structure of the redistribution layers
- H01L2224/02331—Multilayer structure
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
- H01L2224/0237—Disposition of the redistribution layers
- H01L2224/02381—Side view
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- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
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- H01L2924/19107—Disposition of discrete passive components off-chip wires
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Abstract
本发明涉及一种3D连接的扇出型封装结构及其工艺方法,所述结构包括线路层(1),所述线路层(1)背面设置有芯片(3),所述芯片(3)正面设置有重布线线路层(2),所述芯片(3)与重布线线路层(2)之间通过金属球柱(4)和第一焊线(5)相连接,所述线路层(1)、重布线线路层(2)以及芯片(3)外围均包封有第一塑封料(6),所述线路层(1)正面设置有电子元件(9)或封装元件(10),所述电子元件(9)或封装元件(10)外围包封有第二塑封料(11)。本发明一种3D连接的扇出型封装结构及其工艺方法,它采用传统的两端打线方法在芯片与金属线路层上或邻近封装元件的金属线路层上焊线,以此提高高度和稳定性,并提高打线效率。
The invention relates to a 3D-connected fan-out packaging structure and a process method thereof. The structure includes a circuit layer (1), a chip (3) is arranged on the back of the circuit layer (1), and a front side of the chip (3) A redistribution circuit layer (2) is provided, and the chip (3) is connected to the redistribution circuit layer (2) through metal balls (4) and first bonding wires (5), and the circuit layer (1 ), the rewiring circuit layer (2) and the periphery of the chip (3) are all encapsulated with the first plastic compound (6), and the front side of the circuit layer (1) is provided with electronic components (9) or packaging components (10), so The outer periphery of the electronic component (9) or the package component (10) is encapsulated with a second plastic compound (11). The present invention is a 3D-connected fan-out packaging structure and its process method. It adopts the traditional two-end wire bonding method to solder wires on the chip and the metal circuit layer or on the metal circuit layer adjacent to the package component, thereby improving the height and Stability, and improve wiring efficiency.
Description
技术领域technical field
本发明涉及一种3D连接的扇出型封装结构及其工艺方法,属于半导体封装技术领域。The invention relates to a 3D-connected fan-out packaging structure and a process method thereof, belonging to the technical field of semiconductor packaging.
背景技术Background technique
现有半导体堆叠封装技术中,原先常用锡球作为叠层的连接载体。将锡球以植球方式固定在基板上,在模封包覆锡球之后,再以镭射钻孔的制程使锡球局部露出,然后在锡球上方继续进行下一封装制程,被包覆锡球的球径与间距限制了纵向接合元件的数量与排列密度。为了克服锡球的不足,又发展出了通过金属柱互联的方式,将金属柱设置于基板的周围,围绕基板上的芯片,来作为与其他基板互联的输入/输出连接垫。然而,随着封装产品尺寸进一步缩小,以及金属柱的制程的限制,难以进一步提高基板上金属柱的数量,因此也不能提高互联的I/O数量。In the existing semiconductor stack packaging technology, solder balls were commonly used as the connection carrier of the stack. Fix the solder balls on the substrate by planting balls. After the solder balls are molded and coated, the solder balls are partially exposed through the process of laser drilling, and then the next packaging process is continued on the solder balls. The ball diameter and spacing of the balls limit the number and arrangement density of the longitudinal engagement elements. In order to overcome the shortage of solder balls, a method of interconnecting through metal pillars has been developed. The metal pillars are arranged around the substrate and surround the chips on the substrate to serve as input/output connection pads interconnected with other substrates. However, with the further shrinking of packaged product size and the limitation of the manufacturing process of metal pillars, it is difficult to further increase the number of metal pillars on the substrate, so the number of interconnected I/Os cannot be increased.
发明内容Contents of the invention
本发明所要解决的技术问题是针对上述现有技术提供一种3D连接的扇出型封装结构及其工艺方法,它采用传统的两端打线方法在芯片与金属线路层上或邻近封装元件的金属线路层上焊线,能利用打线同时在芯片上打球柱和拉线,以此提高高度和稳定性(特别是在EMC的热压中),并提高打线的效率。The technical problem to be solved by the present invention is to provide a 3D-connected fan-out packaging structure and its process method for the above-mentioned prior art. The wire bonding on the metal circuit layer can use the wire bonding to simultaneously play the ball post and the wire on the chip, so as to improve the height and stability (especially in the hot pressing of EMC), and improve the efficiency of the wire bonding.
本发明解决上述问题所采用的技术方案为:一种3D连接的扇出型封装结构,它包括线路层,所述线路层背面设置有芯片,所述芯片正面设置有金属球柱和第一焊线,所述芯片正面设置有重布线线路层,所述芯片与重布线线路层之间通过金属球柱和第一焊线相连接,所述线路层与重布线线路之间通过第二焊线相连接,所述线路层、重布线线路层以及芯片外围均包封有第一塑封料,所述线路层正面设置有电子元件或封装元件,所述电子元件或封装元件外围包封有第二塑封料,所述重布线线路层背面设置有焊球,所述焊球与焊球之间设置第三绝缘材料。The technical solution adopted by the present invention to solve the above problems is: a 3D-connected fan-out packaging structure, which includes a circuit layer, a chip is arranged on the back of the circuit layer, and a metal ball post and a first solder are arranged on the front of the chip. line, the front of the chip is provided with a rewiring circuit layer, the chip and the rewiring circuit layer are connected through metal balls and the first bonding wire, and the circuit layer and the rewiring circuit are connected through the second bonding wire The circuit layer, the rewiring circuit layer and the periphery of the chip are all encapsulated with a first molding compound, the front of the circuit layer is provided with electronic components or packaging components, and the periphery of the electronic components or packaging components is encapsulated with a second In the molding compound, solder balls are provided on the back of the rewiring circuit layer, and a third insulating material is provided between the solder balls.
线路层由多层金属线路层和绝缘材料构成。The circuit layer is composed of multiple layers of metal circuit layers and insulating materials.
重布线线路层由多层金属线路层和绝缘材料构成。The redistribution circuit layer is composed of multiple layers of metal circuit layers and insulating materials.
一种3D连接的扇出型封装结构的工艺方法,所述方法包括如下步骤:A process method for a 3D-connected fan-out packaging structure, the method comprising the steps of:
步骤一、取一片载板,Step 1. Take a carrier board,
步骤二、载板正面通过多次电镀以及绝缘披覆形成线路层;Step 2, the front of the carrier board is formed into a circuit layer by multiple electroplating and insulation coating;
步骤三、在线路层上贴装芯片;Step 3, mount the chip on the circuit layer;
步骤四、采用两端打线方法在芯片正面部分焊垫打金属球柱、在芯片与金属线路层之间焊线以及邻近封装元件的金属线路层之间焊线;Step 4. Using the wire bonding method at both ends to punch metal balls on the pads on the front of the chip, wire bonding between the chip and the metal circuit layer, and between the metal circuit layers adjacent to the packaged components;
步骤五、将线路层、芯片以及焊线用塑封料进行包封;Step 5, encapsulating the circuit layer, chips and bonding wires with a plastic encapsulant;
步骤六、研磨减薄,断开邻近封装元件之间的焊线连接,断开芯片与金属线路层之间部分的焊线连接,并暴露出芯片上方部分或者全部金属球柱;Step 6. Grinding and thinning, disconnecting the bonding wire connection between adjacent package components, disconnecting the bonding wire connection between the chip and the metal circuit layer, and exposing part or all of the metal balls above the chip;
步骤七、塑封料表面通过电镀以及填充绝缘材料形成重布线线路层,将芯片表面的金属球柱以及断开的焊线部分重布线电性延伸出去;Step 7: The surface of the molding compound is electroplated and filled with insulating material to form a rewiring circuit layer, and the rewiring part of the metal ball post on the chip surface and the disconnected wire is electrically extended;
步骤八、在重布线线路层表面披覆绝缘层,在绝缘层上需要跟外部电性连接处开窗植入锡球;Step 8. Cover the surface of the rewiring circuit layer with an insulating layer, and open a window on the insulating layer to connect with the external electrical connection and implant solder balls;
步骤九、正面贴焊球保护膜,背面去除载板;Step 9. Paste the solder ball protective film on the front and remove the carrier board on the back;
步骤十、在去除载板的背面继续植入电子元件或封装元件;Step 10. Continue implanting electronic components or packaging components on the backside of the removed carrier board;
步骤十一、植入元件后在背面进行选择性包封;Step 11. Selective encapsulation on the back side after implanting the components;
步骤十二、最后去除焊球保护膜后切割成单颗产品。Step 12. Finally, remove the solder ball protection film and cut into individual products.
与现有技术相比,本发明的优点在于:Compared with the prior art, the present invention has the advantages of:
1、采用传统的两端打线方法直接在芯片与金属线路层上或邻近封装元件的金属线路层上焊线,对相应的设备都不需要进行改造,可直接使用传统工艺制程,不增加生产成本;1. Use the traditional two-end bonding method to directly bond wires on the chip and the metal circuit layer or on the metal circuit layer adjacent to the packaged components. There is no need to modify the corresponding equipment, and the traditional process can be used directly without increasing production. cost;
2、能选择性地在芯片上打金属球柱或焊线,提高焊线的效率,而且中间芯片既可以跟下方封装体进行电性连接,又可以通过金属球柱与上部分的封装体进行电性互联;2. Metal balls or wires can be selectively placed on the chip to improve the efficiency of wire bonding, and the middle chip can be electrically connected to the lower package, and can be connected to the upper package through metal balls. electrical interconnection;
3、通过焊线进行3D结构的电性互联,相较焊球和金属柱来说,直径小,间距细,可以增加电性互联的复杂度,从而提高产品功能、缩小整个封装体的体积。3. The electrical interconnection of the 3D structure is carried out by bonding wires. Compared with solder balls and metal pillars, the diameter is smaller and the spacing is finer, which can increase the complexity of electrical interconnection, thereby improving product functions and reducing the volume of the entire package.
附图说明Description of drawings
图1为本发明一种3D连接的扇出型封装结构的示意图。FIG. 1 is a schematic diagram of a 3D-connected fan-out packaging structure according to the present invention.
图2~图16为本发明一种3D连接的扇出型封装结构工艺方法的各工序流程图。FIG. 2 to FIG. 16 are flow charts of each process of a 3D connection fan-out packaging structure process method according to the present invention.
其中:in:
线路层1Line layer 1
第一线路层1-1The first line layer 1-1
第一金属柱1-2The first metal pillar 1-2
第二线路层1-3The second line layer 1-3
第一绝缘材料1-4First insulating material 1-4
重布线线路层2RWL 2
第三线路层2-1The third line layer 2-1
第二金属柱2-2The second metal column 2-2
第四线路层2-3Fourth line layer 2-3
第二绝缘材料2-4Second insulating material 2-4
芯片3chip 3
金属球柱4Metal ball post 4
第一焊线5First bond wire 5
第一塑封料6The first molding compound 6
第二焊线7Second bonding wire 7
焊球8Ball 8
电子元件9Electronic Components 9
封装元件10package components 10
第二塑封料11Second molding compound 11
第三绝缘材料12。The third insulating material 12 .
具体实施方式detailed description
以下结合附图实施例对本发明作进一步详细描述。The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.
参见图1,本实施例中的一种3D连接的扇出型封装结构,它包括线路层1,所述线路层1包括第一线路层1-1、第二线路层1-3,所述第一线路层1-1和第二线路层1-3之间通过第一金属柱1-2电性连接,所述第一线路层1-1和第一金属柱1-2周围有第一绝缘材料1-4,所述线路层1背面设置有芯片3,所述芯片3正面设置有金属球柱4和第一焊线5,所述芯片3正面设置有重布线线路层2,所述芯片3与重布线线路层2之间通过金属球柱4和第一焊线5相连接,所述,线路层1与重布线线路2之间通过第二焊线7相连接,所述线路层1、重布线线路层2以及芯片3外围均包封有第一塑封料6,所述线路层1正面设置有电子元件9或封装元件10,所述电子元件9或封装元件10外围包封有第二塑封料11,所述重布线线路层2包括第三线路层2-1、第四线路层2-3,所述第三线路层2-1和第四线路层2-3之间通过第二金属柱2-2电性连接,所述第三线路层2-1和第二金属柱2-2周围有第二绝缘材料2-4,所述重布线线路层2背面设置有焊球8,所述焊球8与焊球8之间设置第三绝缘材料12。Referring to FIG. 1 , a 3D-connected fan-out packaging structure in this embodiment includes a circuit layer 1, and the circuit layer 1 includes a first circuit layer 1-1 and a second circuit layer 1-3. The first circuit layer 1-1 and the second circuit layer 1-3 are electrically connected through the first metal pillar 1-2, and the first circuit layer 1-1 and the first metal pillar 1-2 are surrounded by first Insulating materials 1-4, the back of the circuit layer 1 is provided with a chip 3, the front of the chip 3 is provided with metal balls 4 and the first bonding wire 5, the front of the chip 3 is provided with a rewiring circuit layer 2, the The chip 3 and the redistribution circuit layer 2 are connected through the metal ball post 4 and the first bonding wire 5, and the circuit layer 1 and the redistribution circuit layer 2 are connected through the second bonding wire 7, and the circuit layer 1. The periphery of the rewiring circuit layer 2 and the chip 3 is encapsulated with a first plastic compound 6, the front of the circuit layer 1 is provided with an electronic component 9 or a packaging component 10, and the periphery of the electronic component 9 or the packaging component 10 is encapsulated with The second molding compound 11, the rewiring circuit layer 2 includes a third circuit layer 2-1 and a fourth circuit layer 2-3, and the third circuit layer 2-1 and the fourth circuit layer 2-3 pass through The second metal pillar 2-2 is electrically connected, the third circuit layer 2-1 and the second metal pillar 2-2 are surrounded by a second insulating material 2-4, and the back of the rewiring circuit layer 2 is provided with solder balls 8. A third insulating material 12 is provided between the solder balls 8 and the solder balls 8 .
其工艺方法包括如下步骤:Its process method comprises the following steps:
步骤一、参见图2,取一片载板;可以是金属板,晶圆,玻璃等;可在载板上直接沉积电镀导电底层;在载板和电镀底层之间可有选择性的分离或保护层。Step 1, see Figure 2, take a carrier plate; it can be a metal plate, wafer, glass, etc.; the electroplating conductive bottom layer can be directly deposited on the carrier plate; there can be selective separation or protection between the carrier plate and the electroplating bottom layer Floor.
步骤二、参见图3,载板正面通过电镀成型工艺形成第一线路层,在第一线路层正面形成第一金属柱,对第一线路层与第一金属柱进行第一绝缘材料披覆;并对其作需要的露线工艺处理,如打磨,或光刻,或激光开孔;Step 2. Referring to FIG. 3, the front of the carrier board is formed by electroplating forming process to form the first circuit layer, the first metal pillar is formed on the front of the first circuit layer, and the first insulating material is applied to the first circuit layer and the first metal pillar; And do the required exposure process, such as grinding, or photolithography, or laser opening;
步骤三、参见图4,在第一金属柱与第一绝缘材料表面通过导电底层沉积,线路成型,电镀成型工艺,和导电底层刻蚀,形成第二线路层和相应的打线表面定位金属层,如Ni/Au 或Ni/Pt/Au;在另一种方法中,第二线路层可以是通过Ti/Al物理溅射沉积(PVD)和随后的光刻成型与化学刻蚀来形成;Step 3, see Figure 4, on the surface of the first metal pillar and the first insulating material, the second circuit layer and the corresponding positioning metal layer on the wiring surface are formed through the deposition of the conductive bottom layer, the circuit forming, the electroplating forming process, and the etching of the conductive bottom layer , such as Ni/Au or Ni/Pt/Au; in another method, the second wiring layer can be formed by Ti/Al physical sputter deposition (PVD) followed by photolithography and chemical etching;
步骤四、参见图5,在第二线路层上贴装芯片,芯片底部有贴片膜或胶;Step 4, see Figure 5, mount the chip on the second circuit layer, with a patch film or glue on the bottom of the chip;
步骤五、参见图6,采用传统的两端打线方法在芯片正面部分焊垫打金属球柱、在芯片与第二线路层之间焊线以及邻近封装元件的第二线路层之间焊线;Step 5, see Figure 6, use the traditional method of bonding wires at both ends to punch metal balls on the pads on the front of the chip, bond wires between the chip and the second circuit layer, and bond wires between the second circuit layer adjacent to the packaged components ;
步骤六、参见图7,将线路层、芯片以及焊线用塑封料进行包封,可使用塑封料,如ABF绝缘膜或颗粒塑封料,通过真空热压缩成型制程形成绝缘层,然后将其固化;Step 6, see Figure 7, encapsulate the circuit layer, chips and bonding wires with a plastic encapsulant, such as ABF insulating film or granular plastic encapsulant, form an insulating layer through a vacuum thermocompression molding process, and then cure it ;
步骤七、参见图8,对塑封料表面进行研磨减薄,断开邻近封装元件之间的焊线连接,断开芯片与第二线路层之间部分的焊线连接,并暴露出芯片上方部分或者全部金属球柱;Step 7, see Figure 8, grind and thin the surface of the plastic encapsulant, disconnect the bonding wire connection between adjacent package components, disconnect the bonding wire connection between the chip and the second circuit layer, and expose the upper part of the chip or all metal balls;
步骤八、参见图9,在塑封料表面通过电镀形成第三线路层,将芯片表面的金属球柱以及断开的焊线部分重布线电性延伸出去,在第三线路层正面形成第二金属柱,并对第三线路层与第二金属柱进行第二绝缘材料披覆;并对其作需要的露线工艺处理,如打磨,或光刻,或激光开孔;Step 8, see Figure 9, form the third circuit layer by electroplating on the surface of the plastic encapsulant, rewire the metal ball post on the chip surface and the disconnected wire part to electrically extend out, and form the second metal circuit layer on the front of the third circuit layer pillars, and coat the third circuit layer and the second metal pillars with a second insulating material; and perform the required exposure process on them, such as grinding, or photolithography, or laser opening;
步骤九、参见图10,在第二金属柱与第二绝缘材料表面通过导电底层沉积,线路成型,电镀成型工艺,和导电底层刻蚀,形成第四线路层;Step 9. Referring to FIG. 10 , a fourth circuit layer is formed on the surface of the second metal pillar and the second insulating material through conductive bottom layer deposition, line forming, electroplating forming process, and conductive bottom layer etching;
步骤十、参见图11,在第四线路层外披覆第三绝缘材料,并对第三绝缘材料表面进行开窗暴露出后续需要植球的区域;Step 10. Referring to FIG. 11 , coat the third insulating material on the outside of the fourth circuit layer, and open a window on the surface of the third insulating material to expose the area that needs to be planted later;
步骤十一、参见图12,在表面暴露开窗的部分进行植球;Step 11, see Figure 12, perform ball planting on the part where the window is exposed on the surface;
步骤十二、参见图13,在焊球正面贴焊球保护膜,背面去除载板板或载板和分离层;Step 12. Referring to Figure 13, stick a solder ball protective film on the front of the solder ball, and remove the carrier board or the carrier board and the separation layer on the back;
步骤十三、参见图14,去除载板的背面可以继续植入芯片、有源器件、无源器件等电子元件,也可以连接已完成的封装元件,例如QFN,CSP,BGA,LGA等等;Step 13, see Figure 14, remove the back of the carrier to continue implanting chips, active devices, passive devices and other electronic components, or connect completed package components, such as QFN, CSP, BGA, LGA, etc.;
步骤十四、参加图15,选择性的进行包封;Step 14, refer to Figure 15, and selectively perform encapsulation;
步骤十五、参见图16,去除焊球保护膜后切割成单品。Step 15, see Figure 16, remove the solder ball protection film and cut into individual products.
除上述实施例外,本发明还包括有其他实施方式,凡采用等同变换或者等效替换方式形成的技术方案,均应落入本发明权利要求的保护范围之内。In addition to the above-mentioned embodiments, the present invention also includes other implementations, and any technical solution formed by equivalent transformation or equivalent replacement shall fall within the protection scope of the claims of the present invention.
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