CN106773524A - Mask plate - Google Patents
Mask plate Download PDFInfo
- Publication number
- CN106773524A CN106773524A CN201710090975.1A CN201710090975A CN106773524A CN 106773524 A CN106773524 A CN 106773524A CN 201710090975 A CN201710090975 A CN 201710090975A CN 106773524 A CN106773524 A CN 106773524A
- Authority
- CN
- China
- Prior art keywords
- light shielding
- shielding part
- mask plate
- transparent area
- transmittance section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The embodiment of the present invention provides a kind of mask plate, including：Shading region and transparent area, the mask plate also include：Diffraction zone, the diffraction zone is arranged in the transparent area, for making transmission optical diffraction.The mask plate of the embodiment of the present invention, by setting diffraction zone in transparent area, makes transmitted light that diffraction to occur, so as to strengthen the exposure intensity at via, eliminates the residual of photoresist at via, improves the resolution of via, improves product yield.
Description
Technical field
The present invention relates to technical field of lithography, more particularly to a kind of mask plate.
Background technology
With the continuous progress of science and technology, status of the visual information in the life of people is more and more important, thus holds
The flat-panel display device for carrying visual information information also occupies increasingly consequence in people live.These FPD
Device include liquid crystal display device (LCD), Organic Light Emitting Diode (OLED), FED (FED), plasma shows
(PDP) etc..With the improvement of people ' s living standards with the progress of science and technology, people are also gradually carrying to the quality requirements of display panel
Height, for example, high-resolution, colour gamut high, quick response etc..The technology of these all counter plate manufacturers proposes strict requirements.
With display panel resolution ratio more and more higher, the size of wiring and via in display panel is also less and less, and
And due to special shape (circular, oval, square etc.) design of via, the boring ratio line width of crossing under same size is more difficult to
Differentiate, the phenomenon of photoetching glue residua at via so occurs, cause via to parse, influence the yields of product.For example,
As illustrated in fig. 1 and 2, the mask plate of the schematic diagram and prior art that respectively make via using the mask plate of prior art is bowed
View.Mask plate includes shading region 11 and transparent area 12.The photoresist 14 of the other parts of the corresponding substrate in shading region 11 will not
Irradiated by light, therefore, these photoresists 14 retain.The correspondence via 13 of transparent area 12.Light irradiates via through transparent area 12
Photoresist in 13, the photoresist after irradiation can be corroded removal.Due to above-mentioned defect, the light of residual occurs at via 13
Photoresist 15, causes via 13 to parse, and influences the yields of product.
The content of the invention
The embodiment of the present invention provides a kind of mask plate, is easily caused when being used for and made via with the mask plate for solving prior art
Occurs the problem of the photoresist of residual at via.
Technical scheme provides a kind of mask plate, including：Shading region and transparent area, the mask plate also include：
Diffraction zone, the diffraction zone is arranged in the transparent area, for making transmission optical diffraction.
Further, the diffraction zone includes：At least one light shielding part and at least one transmittance section, wherein, the transmittance section
The distance between relative both sides be 0.2~0.5 μm.
Further：The width of the light shielding part is 0.2~0.5 μm.
Further：When the quantity of the light shielding part is one, when the light shielding part is for annular, the transmittance section is the ring
The region that the light shielding part of shape is surrounded.
Further：The center superposition of the center of the transmittance section and the transparent area.
Further：It is more than two described when the light shielding part is for annular when the quantity of the light shielding part is two or more
The light shielding part of annular is arranged successively, the transmittance section include the region that surrounds of light shielding part of the annular positioned at innermost circle and
Region between the light shielding part of adjacent two for the being arranged annular.
Further：The center of the transmittance section surrounded positioned at the light shielding part of the annular of innermost circle and the transparent area
Center superposition.
Further：The light shielding part of more than two annulars is arranged concentrically.
Further：The annular is annulus, square loop or rectangle ring.
Further：It is more than two described when the light shielding part is bar shaped when the quantity of the light shielding part is two or more
Light shielding part is arranged in parallel, and the transmittance section is the region between two adjacent light shielding parts.
Further：The quantity of the light shielding part is even numbers, when the quantity of the transmittance section is odd number, positioned at most middle institute
State the center of transmittance section and the center superposition of the transparent area.
Further：The distance between the edge of the transparent area and adjacent described light shielding part are 1~2 μm.
So, in the embodiment of the present invention, transparent area corresponding with via is set, and diffraction zone is set in transparent area, make
There is diffraction in transmitted light, so as to strengthen the exposure intensity at via, eliminate the residual of photoresist at via, improve the parsing of via
Degree, improves product yield.
Brief description of the drawings
Technical scheme in order to illustrate more clearly the embodiments of the present invention, below by institute in the description to the embodiment of the present invention
The accompanying drawing for needing to use is briefly described, it should be apparent that, drawings in the following description are only some implementations of the invention
Example, for those of ordinary skill in the art, without having to pay creative labor, can also be according to these accompanying drawings
Obtain other accompanying drawings.
Fig. 1 is the schematic diagram that via is made using the mask plate of prior art；
Fig. 2 is the top view of the mask plate of prior art；
Fig. 3 is the schematic diagram that via is made using the mask plate of the embodiment of the present invention；
Fig. 4 is that transmitted light occurs the schematic diagram of diffraction in the mask plate of the embodiment of the present invention；
Fig. 5 is the contrast schematic diagram of the exposure intensity of the mask plate of the mask plate and prior art of the embodiment of the present invention；
Fig. 6 is a kind of side view of mask plate of the embodiment of the present invention；
Fig. 7 is the side view of another mask plate of the embodiment of the present invention；
Fig. 8 is the top view of the mask plate of the embodiment of the present invention 1；
Fig. 9 is the top view of the mask plate of the embodiment of the present invention 2；
Figure 10 is the top view of the mask plate of the embodiment of the present invention 3.
Specific embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is a part of embodiment of the invention, rather than whole embodiments.Based on this hair
Embodiment in bright, the acquired every other implementation under the premise of creative work is not made of those of ordinary skill in the art
Example, belongs to the scope of protection of the invention.
The embodiment of the invention discloses a kind of mask plate.As shown in figure 3, being to be made using the mask plate of the embodiment of the present invention
The schematic diagram of via.The mask plate includes：Shading region 31, transparent area 32 and diffraction zone 33.Specifically, the shading region 31, printing opacity
Area 32 and diffraction zone 33 may be provided on the surface of substrate 36.Substrate 36 is a kind of transparent material, and quartz glass typically may be selected.
Wherein, the difference of the shape of the via 34 for being formed as needed, shading region 31 can surround transparent area 32 (as shown in Figure 3), or
Person, shading region 31 can be surrounded by transparent area 32.Shading region 31 shuts out the light, so as to the photoresist 35 of the position will not be changed
Characteristic, the photoresist 35 at the position of the corresponding substrate in shading region 31 will not be removed.Shading region 31 can be by substrate 36
Black material is set on surface to be formed.The black material can be Cr, CrO2Deng black shading metal or metal oxide.Thoroughly
The correspondence via 34 of light area 32.Transparent area 32 can be formed by being not provided with black material on the surface of substrate 36.The transparent area 32
Shape can typically be determined according to the shape of via 34.Light may pass through the photoresist at the irradiation via 34 of transparent area 32, make this
The photoresist exposure at place, so that can be by the part photoresist erosion removal.General, the center of transparent area 32 is just to via 34
Center, so as to the Zone Full of the light irradiation via 34 of transmission can be made.Diffraction zone 33 is arranged in transparent area 32, for making
Penetrate optical diffraction.As shown in figure 4, to there is the schematic diagram of diffraction in the mask plate of the embodiment of the present invention in transmitted light.
Make transmission optical diffraction by using the mask plate, exposure intensity can be strengthened, effectively change the property of the photoresist of irradiation
Matter, so as to the problem of photoetching glue residua can be avoided being also easy to produce in the prior art, improves the resolution of via 34, improves product non-defective unit
Rate.As shown in figure 5, the contrast schematic diagram of the exposure intensity for the mask plate of the mask plate and prior art of the embodiment of the present invention,
Wherein, a represents the exposure intensity of the mask plate of the embodiment of the present invention, and b represents the exposure intensity of the mask plate of prior art.From figure
5 as can be seen that the exposure intensity of the mask plate of the embodiment of the present invention is bigger than the exposure intensity of the mask plate of prior art.Such as Fig. 3
It is shown, after the mask plate of the embodiment of the present invention, the photoresist not remained at via 34.
Specifically, as shown in Figures 6 and 7, the diffraction zone 33 includes：At least one light shielding part 331 and at least one transmittance section
332.The light shielding part 331 can be formed by setting black material on the surface of substrate 36, and the transmittance section 332 can be by substrate
Black material is not provided with 36 surface to be formed.Wherein, the distance between relative both sides of transmittance section 332 S is 0.2~0.5 μ
m.The transmittance section 332 of the specific dimensions can improve diffracting effect.The distance between the relative both sides of multiple transmittance sections 332 S can
With identical, it is also possible to different.
Preferably, the shape of above-mentioned light shielding part 331 can be annular, bar shaped etc..The width L of light shielding part 331 be 0.2~
0.5μm.The light shielding part 331 of the specific dimensions coordinates with the transmittance section 332 of specific dimensions, can further improve diffracting effect.It is many
The width L of individual light shielding part 331 can be with identical, it is also possible to different.
Preferably, the distance between the edge of transparent area 32 and adjacent light shielding part 331 D are 1~2 μm.The specific range
Can further improve diffracting effect.
Mask plate of the invention is described further with specific embodiment below.
Embodiment 1
As shown in figure 8, the top view of the mask plate for the embodiment of the present invention 1.The structure of the mask plate of embodiment 1 with it is above-mentioned
Mask plate structure it is identical, including：Shading region 81, transparent area 82 and diffraction zone 83.Diffraction zone 83 is including light shielding part 831 and thoroughly
Light portion 832.
Wherein, the quantity of light shielding part 831 is one.Therefore, in order to form diffraction zone 83, the light shielding part of the diffraction zone 83
831 is annular.The annular can be annulus, square loop or rectangle ring etc..As shown in Fig. 8 (a), the annular is rectangular
Shape ring；As shown in Fig. 8 (b), the annular is circular rings.The region that transmittance section 832 surrounds for the light shielding part 831 of annular.
Because the center of transparent area 82 typically easily remains with the center superposition of via, and the photoresist of the bottom of via,
It is preferred, therefore, that the center superposition of the center of transmittance section 832 and transparent area 82, so that the center of transmittance section 832 and via
Center superposition, so as to the photoresist of the Zone Full of the transmitted light irradiation via after diffraction, the particularly photoetching of the bottom of via
Glue, so as to the photoresist at via can be removed effectively.
Embodiment 2
As shown in figure 9, the top view of the mask plate for the embodiment of the present invention 2.The structure of the mask plate of embodiment 2 with it is above-mentioned
Mask plate structure it is identical, including：Shading region 91, transparent area 92 and diffraction zone 93.Diffraction zone 93 is including light shielding part 931 and thoroughly
Light portion 932.
Wherein, the quantity of light shielding part 931 is two or more, and the quantity of the light shielding part 931 shown in Fig. 9 is two.The shading
Portion 931 is annular.The annular can be annulus, square loop or rectangle ring etc..The light shielding part of more than two annulars
931 are arranged successively, and such as shown in Fig. 9 (a), the annular is rectangle ring；As shown in Fig. 9 (b), the annular is circular rings.Transmittance section
932 include the region surrounded positioned at the annular light shielding part 931 of innermost circle and adjacent two light shielding parts of annular 931 being arranged
Between region.
Because the center of transparent area 92 typically easily remains with the center superposition of via, and the photoresist of the bottom of via,
It is preferred, therefore, that positioned at the center of the center of transmittance section 932 that surrounds of annular light shielding part 931 of innermost circle and transparent area 92
Overlap, the photoresist of the Zone Full of via, the particularly photoresist of the bottom of via are irradiated so as to the transmitted light after diffraction, from
And can effectively remove the photoresist at via.
It is furthermore preferred that the light shielding part 931 of more than two annulars is arranged concentrically, so as to further make the transmitted light after diffraction
The photoresist of the Zone Full of uniform irradiation via, makes the exposure intensity of the different zones of via uniform.
Embodiment 3
As shown in Figure 10, be the embodiment of the present invention 3 mask plate top view.The structure of the mask plate of embodiment 3 with it is upper
The structure of the mask plate stated is identical, including：Shading region 101, transparent area 102 and diffraction zone 103.Diffraction zone 103 includes light shielding part
1031 and transmittance section 1032.
Wherein, the quantity of light shielding part 1031 is two or more.As shown in Figure 10 (a), the quantity of light shielding part 1031 is two；
As shown in Figure 10 (b), the quantity of light shielding part 1031 is four.Light shielding part 1031 is bar shaped.The phase of more than two light shielding parts 1031
Mutually it be arranged in parallel.Transmittance section 1032 is the region between two adjacent light shielding parts 1031.
Because the center of transparent area 102 typically easily remains with the center superposition of via, and the photoresist of the bottom of via,
It is preferred, therefore, that the quantity of light shielding part 1031 is even numbers, the quantity of transmittance section 1032 is odd number, could be caused positioned at most middle
Transmittance section 1032 center and transparent area 102 center superposition, the Zone Full of via is irradiated so as to the transmitted light after diffraction
Photoresist, the particularly photoresist of the bottom of via, so as to the photoresist at via can be removed effectively.
To sum up, the mask plate of the embodiment of the present invention, by setting diffraction zone in transparent area, makes transmitted light that diffraction to occur,
So as to strengthen the exposure intensity at via, the residual of photoresist at via is eliminated, improve the resolution of via, improve product non-defective unit
Rate.
Each embodiment in this specification is described by the way of progressive, what each embodiment was stressed be with
The difference of other embodiment, between each embodiment identical similar part mutually referring to.
Although having been described for the preferred embodiment of the embodiment of the present invention, those skilled in the art once know base
This creative concept, then can make other change and modification to these embodiments.So, appended claims are intended to be construed to
Including preferred embodiment and fall into having altered and changing for range of embodiment of the invention.
Finally, in addition it is also necessary to explanation, herein, such as first and second or the like relational terms be used merely to by
One entity or operation make a distinction with another entity or operation, and not necessarily require or imply these entities or operation
Between there is any this actual relation or order.And, term " including ", "comprising" or its any other variant meaning
Covering including for nonexcludability, so that process, method, article or terminal device including a series of key elements are not only wrapped
Those key elements, but also other key elements including being not expressly set out are included, or also includes being this process, method, article
Or the intrinsic key element of terminal device.In the absence of more restrictions, by wanting that sentence "including a ..." is limited
Element, it is not excluded that also there is other identical element in the process including the key element, method, article or terminal device.
The above, specific embodiment only of the invention, but protection scope of the present invention is not limited thereto, and it is any
Those familiar with the art the invention discloses technical scope in, change or replacement can be readily occurred in, should all contain
Cover within protection scope of the present invention.Therefore, protection scope of the present invention should be defined by scope of the claims.
Claims (12)
1. a kind of mask plate, including：Shading region and transparent area, it is characterised in that the mask plate also includes：Diffraction zone, it is described
Diffraction zone is arranged in the transparent area, for making transmission optical diffraction.
2. mask plate according to claim 1, it is characterised in that the diffraction zone includes：At least one light shielding part and extremely
A few transmittance section, wherein, the distance between relative both sides of the transmittance section are 0.2~0.5 μm.
3. mask plate according to claim 2, it is characterised in that：The width of the light shielding part is 0.2~0.5 μm.
4. mask plate according to claim 2, it is characterised in that：When the quantity of the light shielding part is one, the shading
When portion is for annular, the transmittance section is the region that the annular light shielding part is surrounded.
5. mask plate according to claim 4, it is characterised in that：The center of the center of the transmittance section and the transparent area
Overlap.
6. mask plate according to claim 2, it is characterised in that：It is described when the quantity of the light shielding part is two or more
When light shielding part is for annular, the light shielding part of more than two annulars is arranged successively, and the transmittance section is included positioned at innermost circle
Region between the light shielding part of region and adjacent two for the being arranged annular that the light shielding part of the annular is surrounded.
7. mask plate according to claim 6, it is characterised in that：Surrounded positioned at the light shielding part of the annular of innermost circle
The center superposition of the center of the transmittance section and the transparent area.
8. mask plate according to claim 6, it is characterised in that：The light shielding part of more than two annulars sets with one heart
Put.
9. the mask plate according to any one of claim 6~8, it is characterised in that：It is described annular for annulus, square loop or
Person's rectangle ring.
10. mask plate according to claim 2, it is characterised in that：It is described when the quantity of the light shielding part is two or more
When light shielding part is bar shaped, more than two light shielding parts are arranged in parallel, and the transmittance section is two adjacent screenings
Region between light portion.
11. mask plates according to claim 10, it is characterised in that：The quantity of the light shielding part is even numbers, the printing opacity
When the quantity in portion is odd number, positioned at the center superposition of center and the transparent area of the most middle transmittance section.
12. mask plates according to claim 2, it is characterised in that：The edge of the transparent area and the adjacent shading
The distance between portion is 1~2 μm.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710090975.1A CN106773524A (en) | 2017-02-20 | 2017-02-20 | Mask plate |
| US15/715,272 US20180239238A1 (en) | 2017-02-20 | 2017-09-26 | Mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710090975.1A CN106773524A (en) | 2017-02-20 | 2017-02-20 | Mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106773524A true CN106773524A (en) | 2017-05-31 |
Family
ID=58958923
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710090975.1A Pending CN106773524A (en) | 2017-02-20 | 2017-02-20 | Mask plate |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20180239238A1 (en) |
| CN (1) | CN106773524A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105045032A (en) * | 2015-08-27 | 2015-11-11 | 京东方科技集团股份有限公司 | Mask plate, spacer and display device |
| CN109491219A (en) * | 2019-01-15 | 2019-03-19 | 深圳市华星光电半导体显示技术有限公司 | A kind of mask plate |
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| CN105045032B (en) * | 2015-08-27 | 2020-01-31 | 京东方科技集团股份有限公司 | mask plates, spacer and display device |
| CN109491219A (en) * | 2019-01-15 | 2019-03-19 | 深圳市华星光电半导体显示技术有限公司 | A kind of mask plate |
| CN109491219B (en) * | 2019-01-15 | 2020-06-30 | 深圳市华星光电半导体显示技术有限公司 | Mask plate |
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| Publication number | Publication date |
|---|---|
| US20180239238A1 (en) | 2018-08-23 |
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Application publication date: 20170531 |