CN106749776B - A kind of oxime ester lightlike initiating agent containing fluorenes - Google Patents
A kind of oxime ester lightlike initiating agent containing fluorenes Download PDFInfo
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- -1 oxime ester Chemical class 0.000 title claims abstract description 19
- 150000002220 fluorenes Chemical class 0.000 title abstract 2
- 230000000977 initiatory effect Effects 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 claims abstract description 13
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 11
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 10
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims description 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 239000002994 raw material Substances 0.000 claims description 11
- 239000002904 solvent Substances 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 9
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 claims description 6
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 claims description 6
- 238000000016 photochemical curing Methods 0.000 claims description 6
- 238000006146 oximation reaction Methods 0.000 claims description 5
- 239000007858 starting material Substances 0.000 claims description 5
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 4
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical group [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 claims description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 4
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 claims description 3
- 238000005886 esterification reaction Methods 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- OWFXIOWLTKNBAP-UHFFFAOYSA-N isoamyl nitrite Chemical compound CC(C)CCON=O OWFXIOWLTKNBAP-UHFFFAOYSA-N 0.000 claims description 3
- 239000012046 mixed solvent Substances 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 238000010992 reflux Methods 0.000 claims description 3
- 239000001632 sodium acetate Substances 0.000 claims description 3
- 235000017281 sodium acetate Nutrition 0.000 claims description 3
- 125000005913 (C3-C6) cycloalkyl group Chemical group 0.000 claims description 2
- ZQMYEPFHTNGUQE-UHFFFAOYSA-N 6-methylheptyl nitrite Chemical compound CC(C)CCCCCON=O ZQMYEPFHTNGUQE-UHFFFAOYSA-N 0.000 claims description 2
- QQZWEECEMNQSTG-UHFFFAOYSA-N Ethyl nitrite Chemical group CCON=O QQZWEECEMNQSTG-UHFFFAOYSA-N 0.000 claims description 2
- 238000005863 Friedel-Crafts acylation reaction Methods 0.000 claims description 2
- AZFNGPAYDKGCRB-XCPIVNJJSA-M [(1s,2s)-2-amino-1,2-diphenylethyl]-(4-methylphenyl)sulfonylazanide;chlororuthenium(1+);1-methyl-4-propan-2-ylbenzene Chemical compound [Ru+]Cl.CC(C)C1=CC=C(C)C=C1.C1=CC(C)=CC=C1S(=O)(=O)[N-][C@@H](C=1C=CC=CC=1)[C@@H](N)C1=CC=CC=C1 AZFNGPAYDKGCRB-XCPIVNJJSA-M 0.000 claims description 2
- 150000008065 acid anhydrides Chemical class 0.000 claims description 2
- 150000001263 acyl chlorides Chemical class 0.000 claims description 2
- 230000003197 catalytic effect Effects 0.000 claims description 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 239000004304 potassium nitrite Substances 0.000 claims description 2
- 235000010289 potassium nitrite Nutrition 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 235000010288 sodium nitrite Nutrition 0.000 claims description 2
- 235000005074 zinc chloride Nutrition 0.000 claims description 2
- 239000011592 zinc chloride Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 125000006850 spacer group Chemical group 0.000 claims 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 69
- 238000003756 stirring Methods 0.000 description 15
- 239000010410 layer Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 238000001035 drying Methods 0.000 description 7
- 238000001914 filtration Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 239000005457 ice water Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- VYOKOQDVBBWPKO-UHFFFAOYSA-N 1-nitro-9h-carbazole Chemical compound N1C2=CC=CC=C2C2=C1C([N+](=O)[O-])=CC=C2 VYOKOQDVBBWPKO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 125000005120 alkyl cycloalkyl alkyl group Chemical group 0.000 description 2
- 125000005119 alkyl cycloalkyl group Chemical group 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000000967 suction filtration Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 239000011345 viscous material Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- GHYOCDFICYLMRF-UTIIJYGPSA-N (2S,3R)-N-[(2S)-3-(cyclopenten-1-yl)-1-[(2R)-2-methyloxiran-2-yl]-1-oxopropan-2-yl]-3-hydroxy-3-(4-methoxyphenyl)-2-[[(2S)-2-[(2-morpholin-4-ylacetyl)amino]propanoyl]amino]propanamide Chemical compound C1(=CCCC1)C[C@@H](C(=O)[C@@]1(OC1)C)NC([C@H]([C@@H](C1=CC=C(C=C1)OC)O)NC([C@H](C)NC(CN1CCOCC1)=O)=O)=O GHYOCDFICYLMRF-UTIIJYGPSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- MROVZCRMXJZHCN-UHFFFAOYSA-N 3-[4-(aminomethyl)-6-(trifluoromethyl)pyridin-2-yl]oxy-N-(2-hydroxyethyl)benzamide Chemical compound NCC1=CC(=NC(=C1)C(F)(F)F)OC=1C=C(C(=O)NCCO)C=CC=1 MROVZCRMXJZHCN-UHFFFAOYSA-N 0.000 description 1
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 description 1
- 125000004648 C2-C8 alkenyl group Chemical group 0.000 description 1
- 229940126062 Compound A Drugs 0.000 description 1
- 238000005727 Friedel-Crafts reaction Methods 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- LFZAGIJXANFPFN-UHFFFAOYSA-N N-[3-[4-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)piperidin-1-yl]-1-thiophen-2-ylpropyl]acetamide Chemical compound C(C)(C)C1=NN=C(N1C1CCN(CC1)CCC(C=1SC=CC=1)NC(C)=O)C LFZAGIJXANFPFN-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000005418 aryl aryl group Chemical group 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229940125773 compound 10 Drugs 0.000 description 1
- 229940125797 compound 12 Drugs 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000006471 dimerization reaction Methods 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical group C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 108010024043 drainin Proteins 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000000643 oven drying Methods 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- RZWZRACFZGVKFM-UHFFFAOYSA-N propanoyl chloride Chemical compound CCC(Cl)=O RZWZRACFZGVKFM-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
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- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
The present invention discloses a kind of oxime ester lightlike initiating agent containing fluorenes as shown in following formula (I), the compound synthesis is simple, at low cost, and dissolubility is good when applied to curing field, has excellent storage stability and filming performance, it is low to expose demand, and developability and pattern integrity are excellent.
Description
Technical Field
The invention belongs to the field of organic chemistry, and particularly relates to a fluorene-containing oxime ester photoinitiator, and synthesis and application thereof in the field of photocuring.
Background
Oxime ester compounds are well known to those skilled in the art as photoinitiators, and have outstanding activity and are widely used in high-end photoresists such as color filter films (RGB), Black Matrixes (BM), photo-spacers (photo-spacers), rib gratings (rib) and the like.
The common oxime ester photoinitiator takes carbazole or diphenyl sulfide group as a main group, so that the cost is high, and the solubility with matrix resin is often insufficient, so that the development of the photoinitiator with lower cost and good solubility is a pursued target on the premise that the sensitivity is not influenced.
Disclosure of Invention
The invention mainly aims to provide a fluorene-containing oxime ester photoinitiator which is simple to synthesize, low in cost, good in solubility and excellent in storage stability and film-forming property when applied to a photocuring composition.
The oxime ester photoinitiator containing fluorene has a structure shown as the following formula (I):
wherein,
R1each independently represents hydrogen, halogen, C1-C20Straight or branched alkyl of (2), C4-C20Cycloalkylalkyl of (C)2-C20Alkenyl of (2), the-CH of these groups2-is optionally substituted by-O-;
R2represents C3-C20Cycloalkyl of, C4-C20Cycloalkylalkyl or alkylcycloalkyl of (a);
R3represents C1-C20Straight or branched alkyl of (2), C3-C20Cycloalkyl radical, C4-C20Alkylcycloalkyl or cycloalkylalkyl, C6-C30Aryl or substituted aryl of, C7-C30Aralkyl of (2), C2-C20Alkenyl of (a);
a represents hydrogen, halogen, nitro, C1-C10Straight or branched alkyl of (2), C4-C10Alkylcycloalkyl or cycloalkylalkyl of (a);
x represents a null or a carbonyl group.
As a preferable technical scheme, in the fluorene oxime ester photoinitiator shown in the formula (I), R1Each independently represents hydrogen, halogen, C1-C10Straight or branched alkyl of (2), C4-C10Cycloalkylalkyl of (a), of which-CH2-is optionally substituted by-O-.
Further preferably, R1Each independently represents hydrogen, C1-C6And one or two of the alkyl groups are not adjacent to-CH2-is optionally substituted by-O-.
Preferably, R2Represents C3-C10Cycloalkyl of, C4-C10Cycloalkylalkyl or alkylcycloalkyl of (a). Further preferably, R2Represents C3-C6Cycloalkyl group of (a), terminal group by C3-C6Cycloalkyl-substituted C1-C4Straight or branched alkyl of (2), by C1-C4Alkyl substituted C3-C6A cycloalkyl group.
Preferably, R3Represents C1-C10Straight or branched alkyl of (2), C4-C10Cycloalkylalkyl, phenyl, C2-C8Alkenyl groups of (a). Further preferably, R3Represents C1-C6Straight or branched alkyl, end-capped by C3-C6Cycloalkyl-substituted C1-C4Straight or branched chain ofA chain alkyl group.
A is preferably nitro.
The invention also aims to provide a preparation method of the fluorene-containing oxime ester photoinitiator with the structure of the formula (I), which comprises the following steps:
(1) synthesis of intermediate a
The raw material a and the raw material b generate Friedel-crafts acylation reaction in an organic solvent under the catalytic action of aluminum trichloride or zinc chloride to obtain an intermediate a,
the starting material b is R2' -CO-Cl wherein R2' represents R2Or R2-CH2-, in particular, when X in formula (I) is null, then R2' represents R2When X is carbonyl, then R2' represents R2-CH2-;
(2) Synthesis of intermediate b
When X is empty, the intermediate a is subjected to oximation reaction under the action of hydroxylamine hydrochloride and sodium acetate to generate an intermediate b;
when X is carbonyl, under the existence of organic solvent and concentrated hydrochloric acid, the intermediate a and nitrite are subjected to oximation reaction at normal temperature to generate an intermediate b;
(3) synthesis of Compounds of formula (I)
Intermediate b with acid anhydride (R)3-CO)2O or acyl chloride compounds R3Carrying out esterification reaction on-CO-Cl to obtain a target product;
in the above-mentioned preparation methods, the starting materials used are all known compounds in the prior art, and can be commercially obtained or can be easily prepared by known synthetic methods.
The reactions involved in steps (1) - (3) are all conventional in the art for the synthesis of analogous compounds. Specific reaction conditions are readily determined by those skilled in the art, given the synthetic concepts disclosed herein.
In the Friedel-crafts reaction of step (1), the reaction temperature is usually-10 to 30 ℃. The organic solvent to be used is not particularly limited as long as it can dissolve the raw materials and does not adversely affect the reaction, and examples thereof include methylene chloride, dichloroethane, benzene, toluene, xylene, and the like.
The oximation reaction in step (2) is carried out in a solvent system, and the solvent used is not particularly limited as long as it can dissolve the starting materials and does not adversely affect the reaction.
When X is empty, the solvent used may be a mixed solvent of alcohol and water, preferably a mixed solvent of ethanol and water. The reaction was carried out under heating under reflux.
When X is carbonyl, the organic solvent used may be dichloromethane, benzene, toluene, tetrahydrofuran, etc., the nitrite used may be selected from ethyl nitrite, isoamyl nitrite, isooctyl nitrite, etc., and the nitrite used may be selected from sodium nitrite, potassium nitrite, etc.
The esterification reaction in the step (3) is carried out in an organic solvent, and the kind of the solvent is not particularly limited as long as the raw material can be dissolved and the reaction is not adversely affected, and examples thereof include dichloromethane, dichloroethane, benzene, toluene, xylene, and the like.
In the present invention, the fluorene-containing oxime ester compound represented by the above formula (I) may be further processedFrom R1(one or two), R2Or R3Are polymerized in conjunction with each other to form a dimer. These dimerization products are considered to exhibit application properties similar to those of the fluorene-containing oxime ester photoinitiator represented by formula (I).
The invention also aims to provide application of the fluorene oxime ester containing photoinitiator shown in the formula (I) in a photocuring composition (namely a photosensitive composition). Without limitation, the photoinitiator may be applied to color Resists (RGB), Black Matrixes (BM), photo-spacers (photo-spacers), rib grids (rib), dry films, semiconductor photoresists, inks, and the like. The photoinitiator has excellent solubility in application, good storage stability, low exposure requirement (namely high sensitivity), and good developability and pattern integrity.
Detailed Description
The present invention will be described in further detail with reference to specific examples, which should not be construed as limiting the scope of the present invention.
Preparation examples
Example 1
(1) Preparation of intermediate 1a
Adding 120g of raw material 1a, 67g of aluminum trichloride and 100mL of dichloromethane into a 500mL four-neck flask, cooling to 0 ℃ in an ice water bath, dropwise adding a mixed solution of 80g of raw material 1b and 50mL of dichloromethane, controlling the temperature to be below 10 ℃, completing dropwise addition within about 2 hours, continuing stirring for 2 hours after completing dropwise addition, tracking and reacting a liquid phase to be complete, slowly pouring the material into diluted hydrochloric acid prepared from 800g of ice water and 100mL of concentrated hydrochloric acid (37%), stirring while adding, and then pouring into a liquid separation drainIn the bucket, the lower dichloromethane layer was separated and the aqueous layer was further washed with 50mL dichloromethane, the dichloromethane layers were combined, the dichloromethane layer was washed with 5% aqueous sodium bicarbonate (300 mL each for 3 times), then washed with water until the pH was neutral, dried over 150g anhydrous magnesium sulfate, filtered, the dichloromethane product solution was rotary evaporated, recrystallized from methanol, and oven dried at 70 ℃ for 2h to give 141g of intermediate 1a in 78% yield and 98% purity MS (m/z): 364(M +1)+。
(2) Preparation of intermediate 1b
Adding 73g of intermediate 1a, 14g of hydroxylamine hydrochloride, 16g of sodium acetate, 150mL of ethanol and 50mL of water into a 500mL four-neck flask, heating at 85 ℃, refluxing and stirring for 5h, stopping the reaction, pouring the material into a 2000mL big beaker, adding 1000mL of water, stirring, extracting with 200mL of dichloromethane, adding 50g of anhydrous MgSO (MgSO) into the extract liquor, and stirring4Drying, performing suction filtration, performing rotary evaporation on the filtrate under reduced pressure to remove the solvent, rotating the bottle to obtain oily sticky matter, pouring the sticky matter into 150mL petroleum ether, stirring and separating out, performing suction filtration to obtain white powdery solid, drying at 60 ℃ for 5h to obtain an intermediate 1b57g, wherein the yield is 75%, the purity is 98%, and the mass ratio of MS (m/z): 379(M +1)+。
(3) Synthesis of Compound 1
Adding 38g of intermediate 1b and 100mL of dichloromethane into a 250mL four-neck flask, stirring at room temperature for 5min, then dropwise adding 11g of acetic anhydride, continuing to stir for 2h after about 30min of dropwise addition is finished, and then adding 5% NaHCO3Adjusting pH of the aqueous solution to neutral, separating organic layer with separating funnel, washing with 200mL water for 2 times, 50g anhydrous MgSO4Drying, filtering, evaporating the solvent to obtain a viscous liquid, recrystallizing with methanol to obtain white solid powder, and filtering to obtain 36g of product with yield of 85% and purity of 99%.
The structure of the product was confirmed by hydrogen nuclear magnetic resonance spectroscopy and mass spectrometry.
1H-NMR(CDCl3,500MHz):1.0023-1.1128(3H,d),1.409-1.4511(7H,m),1.6157-1.6832(10H,m),2.0824(3H,s),8.0121-8.4465(6H,m)。
MS(m/z):421(M+1)+。
Example 2
(1) Preparation of intermediate 2a
Adding 105g of raw material 2a, 67g of aluminum trichloride and 100mL of dichloromethane into a 500mL four-neck flask, cooling to 0 ℃ in an ice-water bath, dropwise adding a mixed solution of 74g of raw material 2b and 50mL of dichloromethane, controlling the temperature to be below 10 ℃, completing dropwise addition for about 2 hours, continuing to stir for 2 hours after dropwise addition, tracking the liquid phase until the reaction is completed, then slowly pouring the materials into diluted hydrochloric acid prepared from 800g of ice water and 100mL of concentrated hydrochloric acid (37%), stirring while adding, then pouring into a separating funnel, separating a dichloromethane layer at the lower layer, continuing to clean an aqueous layer with 50mL of dichloromethane, combining the dichloromethane layers, cleaning the dichloromethane layer with 5% sodium bicarbonate aqueous solution (300 mL each time and 3 times in total), then washing the dichloromethane layer with water until the pH value is neutral, drying the dichloromethane layer with 150g of anhydrous magnesium sulfate, filtering, then performing recrystallization on the dichloromethane solution, drying at 70 ℃ for 2 hours, 127g of intermediate 2a were obtained in 79% yield and 98% purity, MS (m/z): 322(M +1)+。
(2) Preparation of intermediate 2b
Adding 64g of intermediate 2a, 20g of 37% hydrochloric acid, 23g of isoamylnitrite and 100mL of tetrahydrofuran into a 250mL four-neck flask, stirring at normal temperature for 5 hours, and stopping reaction; the material was poured into a 2000mL beaker, 1000mL of water was added, stirring was carried out, 200mL of methylene chloride was used for extraction, and 50g of anhydrous MgSO was added to the extract4Drying, vacuum filtering, rotary evaporating the filtrate under reduced pressure to remove solvent, rotating the bottle to obtain oily viscous substance, pouring the viscous substance into 150mL petroleum ether, stirring for precipitation, vacuum filtering to obtain white powdery solid, oven drying at 60 deg.C for 5 hr to obtain intermediate 1b57g with yield of 78% and purity of 98%%,MS(m/z):351(M+1)+。
(3) Synthesis of Compound 2
Adding 35g of intermediate 2b and 100mL of dichloromethane into a 250mL four-neck flask, stirring at room temperature for 5min, then dropwise adding 10g of propionyl chloride, continuing stirring for 2h after about 30min of dropwise addition is finished, and then adding 5% NaHCO3Adjusting pH of the aqueous solution to neutral, separating organic layer with separating funnel, washing with 200mL water for 2 times, 50g anhydrous MgSO4Drying, filtering, evaporating the solvent to obtain a viscous liquid, recrystallizing with methanol to obtain white solid powder, and filtering to obtain 35g of product with yield of 86% and purity of 99%.
The structure of the product was confirmed by hydrogen nuclear magnetic resonance spectroscopy and mass spectrometry.
1H-NMR(CDCl3,500MHz):1.0162-1.1057(3H,t),1.5069-1.5161(5H,m),1.6755-1.6992(4H,m),2.2624-2.3004(2H,m),3.8774(2H,s)7.9151-8.3325(6H,m)。
MS(m/z):407(M+1)+。
Example 3
Referring to the methods of examples 1 and 2, compounds 3 to 12 shown in the following table 1 were synthesized using the corresponding starting materials.
TABLE 1
Evaluation of Performance
1. Dissolution Performance test
The solubility of the photoinitiator in PGMEA is one of the parameters that represent its solubility and measure the performance of the photoinitiator. The solubility of the compound of formula (I) of the present invention in PGMEA at 25 ℃ was tested using the compound of formula (I) of the present invention and the conventional nitrocarbazole-containing oxime ester photoinitiators for comparison, and the results are shown in Table 2.
TABLE 2
Examples/comparative examples | Photoinitiator | Solubility in PGMEA (% by weight) |
Example 4 | Compound 1 | 16% |
Example 5 | Compound 2 | 15% |
Example 6 | Compound 6 | 16% |
Example 7 | Compound 7 | 15% |
Example 8 | Compound 10 | 17% |
Example 9 | Compound 12 | 17% |
Comparative example 1 | Compound A | Not dissolving |
Comparative example 2 | Compound B | Not dissolving |
As can be seen from the above table, the two existing nitro carbazole containing oxime ester photoinitiators used as comparative compounds A and B are basically insoluble in PGMEA, while the compound of the present invention has good solubility in PGMEA, and both meet the requirement that the solubility in industrial application needs to be more than 8% by weight.
2. Storage stability and film formation Property test
Storage stability and film-forming properties of the photoinitiators of formula (I) of the invention were evaluated by formulating exemplary photocurable compositions.
(1) A photocurable composition was prepared as follows
200 parts by mass of an acrylic ester copolymer
[ benzyl methacrylate/methacrylic acid/hydroxyethyl methacrylate (molar ratio 70/10/20) copolymer (Mv: 10000) ]
100 parts by mass of dipentaerythritol hexaacrylate
5 parts by mass of photoinitiator
Butanone (solvent) 900 parts by mass
In the composition, the photoinitiator is a fluorene-containing oxime ester compound shown in formula (I) disclosed by the invention or a photoinitiator known in the prior art (for comparison).
(2) Storage stability
After the liquid photocurable composition was naturally stored at room temperature for 1 month, the degree of precipitation of the substance was visually evaluated according to the following criteria:
a: no precipitation was observed;
b: precipitation was slightly observed;
c: significant precipitation was observed.
(3) Film forming property
The exemplary photocurable composition having the above composition was stirred under a yellow light, taken out of a PET stencil and applied to a film by roll coating, and dried at 90 ℃ for 2min to give a coating film having a dry film thickness of 2 μm. The substrate on which the coating film was formed was cooled to room temperature, a mask plate was attached, and long-wavelength radiation was realized with a FWHM filter using a high-pressure mercury lamp 1PCS light source. Exposing the coating film by ultraviolet rays with the wavelength of 370-420nm through the gaps of the mask plate, then soaking in 2.5% sodium carbonate solution at 25 ℃ for 20s for development, washing with ultrapure water, air-drying, hard-baking at 220 ℃ for 30min for fixing the pattern, and evaluating the obtained pattern.
① sensitivity
At the time of exposure, the minimum exposure amount at which the residual film ratio after development of the light-irradiated region in the exposure step is 90% or more is evaluated as the exposure demand. A smaller exposure requirement indicates a higher sensitivity.
② developability and Pattern integrity
The substrate pattern was observed with a Scanning Electron Microscope (SEM) to evaluate developability and pattern integrity.
The developability was evaluated according to the following criteria:
○ No residue was observed in the unexposed parts;
◎ A small amount of residue was observed in the unexposed parts, but the residue was acceptable;
●: a clear residue was observed in the unexposed parts.
Pattern integrity was evaluated according to the following criteria:
◇ No pattern defects were observed;
□: a small part of the pattern was observed to have some defects;
◆ A number of pattern defects were clearly observed.
The evaluation results are shown in table 3.
TABLE 3
As can be seen from Table 3, compared with the existing nitro carbazole-containing oxime ester photoinitiator, the photocuring composition containing the fluorene-containing oxime ester photoinitiator has good storage stability and low exposure demand which are all lower than 60mJ/cm2And the developing effect and the pattern integrity are better, and the film-forming property is very excellent.
On the whole, the fluorene-containing oxime ester photoinitiator shown in the formula (I) disclosed by the invention has excellent application performance, low cost of raw materials and preparation and good application prospect.
Claims (6)
1. A fluorene-containing oxime ester photoinitiator has a structure shown as the following formula (I):
wherein,
R1each independently represents hydrogen, C1-C6And one or two of the alkyl groups are not adjacent to-CH2-is optionally substituted by-O-;
R2represents C3-C6Cycloalkyl group of (a), terminal group by C3-C6Cycloalkyl-substituted C1-C4Straight or branched alkyl of (2), by C1-C4Alkyl substituted C3-C6A cycloalkyl group;
R3represents end quilt C3-C6Cycloalkyl-substituted C1-C4Linear or branched alkyl of (a);
a represents nitro;
x represents a null or a carbonyl group.
2. The method for preparing the fluorenyloxime ester photoinitiator according to claim 1, comprising the following steps:
(1) synthesis of intermediate a
The raw material a and the raw material b generate Friedel-crafts acylation reaction in an organic solvent under the catalytic action of aluminum trichloride or zinc chloride to obtain an intermediate a,
the starting material b is R2' -CO-Cl wherein R2' represents R2Or R2-CH2-, in particular, when X in formula (I) is null, then R2' represents R2When X is carbonyl, then R2' represents R2-CH2-;
(2) Synthesis of intermediate b
When X is empty, the intermediate a is subjected to oximation reaction under the action of hydroxylamine hydrochloride and sodium acetate to generate an intermediate b;
when X is carbonyl, under the existence of organic solvent and concentrated hydrochloric acid, the intermediate a and nitrite are subjected to oximation reaction at normal temperature to generate an intermediate b;
(3) synthesis of Compounds of formula (I)
Intermediate b with acid anhydride (R)3-CO)2O or acyl chloride compounds R3Carrying out esterification reaction on-CO-Cl to obtain a target product;
3. the production method according to claim 2, characterized in that: in the step (2), when X is empty, the solvent used is a mixed solvent of alcohol and water, and the reaction is carried out under a heating reflux state.
4. The production method according to claim 2, characterized in that: in the step (2), when X is carbonyl, the nitrite is selected from ethyl nitrite, isoamyl nitrite and isooctyl nitrite, and the nitrite is selected from sodium nitrite and potassium nitrite.
5. The use of the fluorooxime ester photoinitiator according to claim 1 in the field of photocuring.
6. Use according to claim 5, characterized in that: the field of photocuring comprises preparation of color light resistors, black matrixes, light spacers, rib grids, dry films, semiconductor photoresist and printing ink.
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