CN106604514A - Exhaust pipe and low temperature plasma generation equipment - Google Patents

Abstract

The invention provides a pipe arrangement and low-temperature plasma generating equipment, which relate to the technical field of dielectric barrier discharge. The pipe arrangement includes: a conductive medium and an insulating medium; the insulating medium is in the shape of a bottomless prism, and the conductive medium is in the shape of a prism. Outside the conductive medium, the present invention also provides a low-temperature plasma generating device, including: a power supply unit and a plurality of row tubes; the row tubes are in a prismatic structure, and the plurality of row tubes are parallel to each other, and every two adjacent row tubes A gap is formed between them, and the side walls of the two pipes forming the gap are parallel to each other; the pipes are divided into high-potential pipes and low-potential pipes, and pipes with different potentials are distributed around each pipe, and the output terminal of the power supply unit They are respectively connected to the terminals of multiple high-potential pipes, and the terminals of multiple low-potential pipes are grounded to solve the technical problems of low-temperature plasma waste gas treatment efficiency and high equipment cost in the prior art, and to improve waste gas treatment. The technical effect of efficiency and cost reduction.

Description

Pipeline and low temperature plasma generating equipment

technical field

The invention relates to the technical field of dielectric barrier discharge, in particular to a pipe arrangement and low-temperature plasma generating equipment.

Background technique

Low temperature plasma is the fourth state of matter after solid state, liquid state and gas state. When the applied voltage reaches the ignition voltage of the gas, the gas is broken down and a mixture including electrons, various ions, atoms and free radicals is produced. Although the temperature of electrons is high during the discharge process, the temperature of heavy particles is very low, and the whole system presents a low-temperature state, so it is called low-temperature plasma. Low-temperature plasma has corona discharge, dielectric barrier discharge and other forms.

Dielectric Barrier Discharge (DBD), also known as silent discharge, is a form of gas discharge with an insulating medium inserted into the discharge space, which can generate low-temperature plasma with large volume and high energy density at normal temperature and pressure. The insulating medium inserted in the discharge space can make the charge generated in the discharge space accumulate on it, generate an additional electric field opposite to the direction of the applied electric field, and prevent the discharge from developing to the arc stage, so that a stable low-temperature plasma can be generated under atmospheric pressure. Compared with the low-pressure discharge used in the current industrial production, the dielectric barrier discharge has a broader application prospect. It has been widely used in industrial fields such as ozone synthesis, CO2 lasers, ultraviolet light sources, surface modification of insulating materials, and waste gas treatment. In recent years, it has been one of the hot issues in the research of low-temperature plasma and related fields.

Dielectric barrier discharge low-temperature plasma degradation of pollutants is the use of low-temperature plasma high-energy electrons, free radicals and other active particles and pollutants in the exhaust gas to decompose pollutant molecules in a very short period of time, and subsequent various reactions occur In order to achieve the purpose of decomposing pollutants. In the process of dielectric barrier discharge, electrons obtain energy from the electric field, and convert the energy into internal energy or kinetic energy of pollutant molecules through collisions. These energy-acquired molecules are excited or ionized to form active groups, while oxygen and moisture in the air Under the action of high-energy electrons, a large number of active groups such as new ecological hydrogen, ozone, and hydroxyl oxygen can also be generated. The pollutants in the exhaust gas react with these active groups with higher energy and are finally converted into substances such as CO2 and H2O. , so as to achieve the purpose of purifying the exhaust gas.

At present, the environmental protection industry generally adopts a row structure or a sleeve structure to generate a double dielectric barrier discharge low-temperature plasma. With the sleeve structure, due to the limited flow area in the sleeve, when the exhaust gas flow to be treated is large, many sets of sleeves need to be arranged, which will cause the equipment to be very large and heavy; while the serial structure is adopted, due to its discharge The position is the shortest distance between two adjacent circular tubes. Therefore, the discharge form of the continuous row structure is linear discharge. When the number of row tubes is constant, the proportion of the linear discharge area to the total volume is very low, and the formed The low-temperature plasma concentration is lower than that of the sleeve-type dielectric barrier discharge, which will lead to a reduction in its ability to treat waste gas, which in turn will lead to an increase in the cost of waste treatment.

Contents of the invention

In view of this, the object of the present invention is to provide pipe arrangement and low-temperature plasma generating equipment to alleviate the technical problems of low waste gas treatment efficiency and high cost in the prior art.

In a first aspect, an embodiment of the present invention provides a pipe arrangement, including: a conductive medium and an insulating medium;

The insulating medium is in the shape of a bottomless prism, the conductive medium is in the shape of a prism, and the insulating medium is sleeved outside the conductive medium.

With reference to the first aspect, the embodiment of the present invention provides a first possible implementation manner of the first aspect, wherein a cross section of the insulating medium is rectangular.

With reference to the first aspect, the embodiment of the present invention provides a second possible implementation manner of the first aspect, wherein the conductive medium is a conductive metal rod or a conductive metal powder.

With reference to the first aspect, the embodiment of the present invention provides a third possible implementation manner of the first aspect, wherein the insulating medium is made of quartz glass.

In combination with the first aspect, the embodiment of the present invention provides a fourth possible implementation manner of the first aspect, wherein, the side length of the inner wall of the insulating medium is 5 mm to 7 mm; the wall thickness of the insulating medium is 1 mm to 3 mm , the side length of the outer wall of the conductive medium is 5mm to 7mm.

With reference to the first aspect, the embodiment of the present invention provides a fifth possible implementation manner of the first aspect, wherein the outer wall of the conductive medium is in close contact with the inner wall of the insulating medium.

With reference to the first aspect, the embodiment of the present invention provides a sixth possible implementation manner of the first aspect, wherein the length of the insulating medium is 360 mm to 370 mm.

In a second aspect, an embodiment of the present invention provides a low-temperature plasma generating device, comprising: a power supply unit and a plurality of exhaust pipes as described in any one of the first aspects above;

The row pipes have a prismatic structure, a plurality of the row pipes are parallel to each other, a gap is formed between every two adjacent row pipes, and the side walls of the two row pipes forming the gap are parallel to each other;

The pipes are divided into high-potential pipes and low-potential pipes, and pipes with different potentials are distributed around each pipe, and the output terminals of the power supply unit are respectively connected to multiple high-potential pipes. The terminals are connected, and the terminals of the plurality of low-potential row pipes are grounded.

With reference to the second aspect, the embodiment of the present invention provides a first possible implementation manner of the second aspect, wherein the vertical distances between every two adjacent rows of pipes are equal.

With reference to the second aspect, the embodiment of the present invention provides a second possible implementation manner of the second aspect, wherein the vertical distance between every two adjacent row pipes is 2 mm to 10 mm.

The embodiment of the present invention brings the following beneficial effects: In the embodiment of the present invention, the current modulated by the power supply is sent to the input terminal of the transformer, and after the voltage is adjusted by the transformer, the current is sent to the high-potential row pipe through the output terminal, and the high-potential The row tube and the low-potential row tube are connected to generate low-temperature plasma. Since the square tube is used, when the high-potential row tube and the low-potential row tube are connected, a larger space of low-temperature plasma area can be formed between them, and the generation of low-temperature plasma can be increased, thereby improving the resistance to organic gases. processing effect. The user can arrange a plurality of row pipes side by side with intervals between the plurality of row pipes, and then apply voltage to the plurality of row pipes. When the gas flows through the gaps between multiple pipes, it is decomposed and purified under the action of low-temperature plasma.

In the embodiment of the present invention, the pipe arrangement is a square pipe (rectangular, square, etc.), the outer layer of the square pipe is an insulating medium, and the inner layer is a conductive medium. Compared with the casing structure, the technology used in the present invention can effectively reduce equipment Smaller volume and lower equipment cost; compared with the circular tube row structure, the square tube used in the present invention can effectively increase the generation of low-temperature plasma, thereby reducing equipment cost. Therefore, using the square tube electrode and the low-temperature plasma generating equipment used in the present invention can effectively improve the efficiency of treating waste gas with low-temperature plasma, and reduce the cost of treating organic waste gas with low-temperature plasma.

Additional features and advantages of the invention will be set forth in the description which follows, and in part will be apparent from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.

In order to make the above-mentioned objects, features and advantages of the present invention more comprehensible, preferred embodiments will be described in detail below together with the accompanying drawings.

Description of drawings

In order to more clearly illustrate the specific implementation of the present invention or the technical solutions in the prior art, the following will briefly introduce the accompanying drawings that need to be used in the specific implementation or description of the prior art. Obviously, the accompanying drawings in the following description The drawings show some implementations of the present invention, and those skilled in the art can obtain other drawings based on these drawings without any creative work.

Fig. 1 is a schematic diagram of the pipe arrangement provided by the embodiment of the present invention;

Fig. 2 is the plan view that cross section is the row pipe of square;

Fig. 3 is the plan view that cross section is the row pipe of rectangle;

Fig. 4 is a schematic structural diagram of a low-temperature plasma generating device.

Icons: 1-conductive medium; 2-insulating medium; 3-power supply unit; 3.1-power supply; 3.2-transformer; 4-pipe; 4.1-high potential pipe; 4.2-low potential pipe; 5-gap.

detailed description

In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the present invention, not all of them. the embodiment. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

At present, for the sleeve-type low-temperature plasma generation equipment, due to the limited flow area in the sleeve, when the gas flow to be processed is large, many sets of sleeves need to be arranged, which will cause the equipment to be very large and heavy; For low-temperature plasma generating equipment, since the discharge position is the shortest distance between two adjacent circular tubes, the discharge form of the continuous row structure is linear discharge. When the number of row tubes is constant, the linear discharge area accounts for the total The proportion of the volume is very low, therefore, the formed low-temperature plasma concentration is lower than that of the sleeve-type dielectric barrier discharge, which will lead to a reduction in its ability to treat exhaust gas, and further lead to an increase in the cost of exhaust gas treatment. Based on this, this paper The row tube provided by the embodiment of the invention can increase the relative area between adjacent row tubes, increase the low-temperature plasma area formed between the high-potential row tube and the low-potential row tube, and increase the generation amount of low-temperature plasma .

In order to facilitate the understanding of this embodiment, a pipe arrangement disclosed in the embodiment of the present invention is firstly introduced in detail. As shown in FIG. 1 , the pipe arrangement in the embodiment of the present invention includes: a conductive medium 1 and an insulating medium 2 .

The insulating medium 2 is in the shape of a bottomless prism, the conductive medium 1 is in the shape of a prism, and the insulating medium 2 is sleeved outside the conductive medium 1 .

In the embodiment of the present invention, the shape of the insulating medium 2 can be a straight bottomless prism, etc., the shape of the conductive medium 1 can be a straight prism, etc., and the cross-sections of the insulating medium 2 and the conductive medium 1 can be rectangular, etc.

The material of the conductive medium can be various, such as: iron, copper or other conductive metals, etc.; it can also be a composite metal or a composite of metal and non-metal, etc. In practical applications, the conductive medium is a conductive metal rod Or conductive metal powder, the material of the insulating medium is quartz glass, etc. Quartz glass has good insulating performance, is cheap and durable, and can further reduce production costs while improving the discharge effect of the discharge pipe.

In yet another embodiment of the present invention, the cross section of the insulating medium is rectangular. In practical applications, the cross section of the insulating medium may be a square as shown in FIG. 2 or a rectangle as shown in FIG. 3 . Such an arrangement can make the discharge uniform between the high-potential row tube and the low-potential row tube.

The side length of the inner wall of the insulating medium is 5 mm to 7 mm; the wall thickness of the insulating medium is 1 mm to 3 mm; the side length of the outer wall of the conductive medium is 5 mm to 7 mm; the length of the insulating medium is 360 mm to 370 mm.

In the embodiment of the present invention, the side length of the inner wall of the insulating medium is set to 5mm to 7mm; the wall thickness of the insulating medium is set to 1mm to 3mm; the length of the insulating medium is set to 360mm to 370mm; such setting can facilitate the insulation medium and The cooperative installation between the external support frame and the fastening piece improves the applicability of the pipe arrangement.

The length of the outer wall of the conductive medium is set to 5mm to 7mm, so that the conductive medium can better cooperate with the external insulating medium, reduce the processing and installation requirements for the conductive medium, and thus improve the applicability of the pipe arrangement.

In order to reduce the loss of electric energy in irrelevant areas and improve energy use efficiency, the outer wall of the conductive medium is closely attached to the inner wall of the insulating medium. Correspondingly, when the cross-section of the insulating medium is square, the cross-section of the conductive medium can also be square. , when the cross section of the insulating medium is rectangular, the cross section of the conductive medium can also be rectangular.

As shown in Figure 2 and Figure 3, on the basis of the above-mentioned embodiments, further, through the control of the processing process, the circumference of the insulating medium and the conductive medium is better (square or rectangular), and the conductive medium can be realized When placed inside the insulating medium, the central axes of the two are well coincident. The central axis of the conductive medium coincides with the central axis of the insulating medium, so that the conductive medium can be located at the center of the insulating medium, which can improve the uniformity of the discharge of the pipe discharge, thereby enhancing the discharge effect of the discharge pipe.

As shown in FIG. 4, in another embodiment of the present invention, there is also a low-temperature plasma generating device, which includes: a power supply unit 3 and a plurality of exhaust pipes 4 as described in any of the preceding embodiments;

The row pipe 4 is a prismatic structure, a plurality of the row pipes 4 are parallel to each other, a gap 5 is formed between every two adjacent row pipes 4, and the two row pipe side walls of the gap 5 are formed parallel to each other;

The row pipes are divided into high-potential row pipes 4.1 and low-potential row pipes 4.2, each of which is distributed around the row pipes with different potentials, and the output end of the power supply unit 3 is connected to multiple high-potential row pipes respectively. The terminals of the tubes 4.1 are connected, and the terminals of multiple low-potential row tubes 4.2 are grounded.

In the embodiment of the present invention, the power supply unit 3 includes a power supply 3.1 and a transformer 3.2, the output end of the power supply 3.1 is connected to the input end of the transformer 3.2, and the power supply 3.1 provides electric energy to a plurality of row pipes 4; the transformer 3.2 connects the power supply 3.1 The input electric energy is converted into the power required by the plurality of row pipes 4 .

In the low-temperature plasma generator, a plurality of row tubes can be arranged according to the arrangement shown in FIG. Row N, column M) to represent the coordinates. In Figure 4, the position with coordinates (1,1) is the low-potential tube, the position with coordinates (1,2) is the high-potential tube, and the coordinates are The position of (1,3) is the low potential pipe, the position of coordinates (1,4) is the high potential pipe, the position of coordinates (1,5) is the low potential pipe, and the coordinate is (1,6) The position is the high potential row pipe...;

Correspondingly, the position with coordinates (2,1) is the high-potential pipe, the position with coordinates (2,2) is the low-potential pipe, and the position with coordinates (2,3) is the high-potential pipe. The position with coordinates (2,4) is the low-potential pipe, the position with coordinates (2,5) is the high-potential pipe, and the position with coordinates (2,6) is the low-potential pipe...;

The position with coordinates (3,1) is the low-potential pipe, the position with coordinates (3,2) is the high-potential pipe, the position with coordinates (3,3) is the low-potential pipe, and the coordinate is (3 , the position of 4) is the high-potential pipe, the position with coordinates (3,5) is the low-potential pipe, and the position with coordinates (3,6) is the high-potential pipe...;

The position with coordinates (4,1) is the high-potential pipe, the position with coordinates (4,2) is the low-potential pipe, the position with coordinates (4,3) is the high-potential pipe, and the coordinate is (4 , the position of 4) is the low-potential pipe, the position with coordinates (4,5) is the high-potential pipe, and the position with coordinates (4,6) is the low-potential pipe...;

The position with coordinates (5,1) is the low-potential pipe, the position with coordinates (5,2) is the high-potential pipe, the position with coordinates (5,3) is the low-potential pipe, and the coordinate is (5 ,4) is the high-potential pipe, the position with coordinates (5,5) is the low-potential pipe, and the position with coordinates (5,6) is the high-potential pipe...;

Correspondingly, the position with coordinates (6,1) is the high-potential pipe, the position with coordinates (6,2) is the low-potential pipe, and the position with coordinates (6,3) is the high-potential pipe. The position with coordinates (6,4) is the low-potential pipe, the position with coordinates (6,5) is the high-potential pipe, and the position with coordinates (6,6) is the low-potential pipe...

Since the cross-section of each pipe is a square, the pipe is a regular prism. After being arranged in the manner shown in Figure 4, the orthographic projection of each side of the pipe on the side of the adjacent pipe is in line with the surrounding sides of the side. Coincident, that is to say, in the embodiment of the present invention, the adjacency between two row pipes refers to the orthographic projection of the side of one row of pipes on the side of the other row of pipes and the side of the other row of pipes. The surrounding edges overlap.

In FIG. 4 , the gap 5 between the high-potential row pipe 4.1 and the low-potential row pipe 4.2 is the circulation channel for the required processing gas.

Since a plurality of rows of pipes are parallel to each other, the vertical distance between every two adjacent rows of pipes is the distance between the rows of pipes, and the vertical distance between every two adjacent rows of pipes is equal, so that A uniform low-temperature plasma field will be formed to improve the gas purification effect; and the equidistant arrangement will help to increase the plasma output.

When the embodiment of the present invention is applied to different environments, the user can arrange multiple pipes side by side, the distance between every two adjacent pipes is 2mm to 10mm, and then apply voltage to the conductive medium in the pipes, The current enters the high-potential row tube from the power supply after being boosted by the transformer, and forms a current path through micro-discharge between the high-potential row tube and the low-potential row tube, and the low-potential row tube is connected to the ground wire to form a complete current loop; Low-temperature plasma is generated when gas flows through the intervals between multiple high-potential calandria and low-potential calandria.

In the embodiment of the present invention, the current modulated by the power supply is sent to the input terminal of the transformer, and after the voltage is adjusted by the transformer, the current is sent to the high-potential row tube through the output terminal, and the high-potential row tube and the low-potential row tube are connected , producing low-temperature plasma. Since the square tube is used, when the high-potential row tube and the low-potential row tube are connected, a larger space of low-temperature plasma area can be formed between them, and the generation of low-temperature plasma can be increased, thereby improving the resistance to organic gases. processing effect. The user can arrange a plurality of row pipes side by side with intervals between the plurality of row pipes, and then apply voltage to the plurality of row pipes. A low-temperature plasma is generated when gas flows through the spaces between the multiple calandria.

In the embodiment of the present invention, the pipe arrangement is a square pipe (rectangular, square, etc.), the outer layer of the square pipe is an insulating medium, and the inner layer is a conductive medium. Compared with the casing structure, the technology used in the present invention can effectively reduce equipment Smaller volume and lower equipment cost; compared with the circular tube row structure, the square tube used in the present invention can effectively increase the generation of low-temperature plasma, thereby reducing equipment cost. Therefore, using the square tube electrode and the low-temperature plasma generating equipment used in the present invention can effectively improve the efficiency of treating waste gas with low-temperature plasma, and reduce the cost of treating organic waste gas with low-temperature plasma.

In the description of the embodiments of the present invention, unless otherwise clearly stipulated and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection, or Integral connection; it can be mechanical connection or electrical connection; it can be direct connection or indirect connection through an intermediary, and it can be the internal communication of two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention in specific situations.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, or in a specific orientation. construction and operation, therefore, should not be construed as limiting the invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and should not be construed as indicating or implying relative importance.

Finally, it should be noted that: the above-described embodiments are only specific implementations of the present invention, used to illustrate the technical solutions of the present invention, rather than limiting them, and the scope of protection of the present invention is not limited thereto, although referring to the foregoing The embodiment has described the present invention in detail, and those skilled in the art should understand that any person familiar with the technical field can still modify the technical solutions described in the foregoing embodiments within the technical scope disclosed in the present invention Changes can be easily thought of, or equivalent replacements are made to some of the technical features; and these modifications, changes or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present invention, and should be included in the scope of the present invention within the scope of protection. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.

Claims (10)

1. a kind of comb, it is characterised in that include：Conducting medium and dielectric；

The dielectric is bottomless prism-shaped, and the conducting medium is prism-shaped, and the dielectric is placed on conductive Jie Outside matter.

2. comb according to claim 1, it is characterised in that the rectangular cross-section of the dielectric.

3. comb according to claim 1, it is characterised in that the conducting medium is conducting metal rod or conducting metal Powder.

4. comb according to claim 1, it is characterised in that the material of the dielectric is quartz glass.

5. comb according to claim 1, it is characterised in that the length of side of the inwall of the dielectric is 5mm to 7mm； The wall thickness of the dielectric is 1mm to 3mm, and the outer wall length of side of conducting medium is 5mm to 7mm.

6. comb according to claim 5, it is characterised in that the outer wall of conducting medium is closely pasted with the inwall of dielectric Close.

7. comb according to claim 1, it is characterised in that the length of the dielectric is 360mm to 370mm.

8. there is equipment in a kind of low temperature plasma, it is characterised in that include：Power supply unit and multiple such as claim 1 to 7 times Comb described in one；

The comb is prismatic structure, and multiple combs are parallel to each other, between being formed between the adjacent comb of each two Gap, and form two comb side walls in the gap and be parallel to each other；

The comb is divided into high potential comb and electronegative potential comb, and the rows different from its current potential are distributed around each described comb Pipe, the outfan of said supply unit is connected respectively with the terminals of multiple high potential combs, multiple electronegative potential rows The terminals ground connection of pipe.

9. there is equipment in low temperature plasma according to claim 8, it is characterised in that the adjacent comb of each two Between vertical dimension it is equal.

10. there is equipment in low temperature plasma according to claim 9, it is characterised in that the adjacent row of each two Vertical dimension between pipe is 2mm to 10mm.