CN106596059B - A kind of measurement method of the stress birfringence amount of non-spherical element - Google Patents
A kind of measurement method of the stress birfringence amount of non-spherical element Download PDFInfo
- Publication number
- CN106596059B CN106596059B CN201611058939.9A CN201611058939A CN106596059B CN 106596059 B CN106596059 B CN 106596059B CN 201611058939 A CN201611058939 A CN 201611058939A CN 106596059 B CN106596059 B CN 106596059B
- Authority
- CN
- China
- Prior art keywords
- test point
- light source
- spherical element
- angle
- measurement method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000691 measurement method Methods 0.000 title claims abstract description 20
- 238000012360 testing method Methods 0.000 claims abstract description 97
- 230000003287 optical effect Effects 0.000 claims abstract description 16
- 238000005259 measurement Methods 0.000 claims abstract description 10
- 238000006073 displacement reaction Methods 0.000 claims description 8
- 239000012530 fluid Substances 0.000 claims 1
- 238000010422 painting Methods 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
- 230000000644 propagated effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 13
- 238000001459 lithography Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
Description
技术领域technical field
本发明涉及光学元件检测技术领域,尤其涉及一种非球面元件的应力双折射量的测量方法。The invention relates to the technical field of optical element detection, in particular to a method for measuring the stress birefringence of an aspheric element.
背景技术Background technique
随着半导体工业的发展,大规模集成电路的特征尺寸越来越小,光刻技术作为制备半导体器件的关键技术,面临着新的挑战。为了提高光刻系统的分辨率,曝光光源的波长不断减小,从436nm,355nm的近紫外进入到248nm,193nm的深紫外波段。以193nm ArF准分子激光光刻为例,已经突破90nm,65nm和45nm节点,成为目前主流的曝光技术。With the development of the semiconductor industry, the feature size of large-scale integrated circuits is getting smaller and smaller. Photolithography, as a key technology for manufacturing semiconductor devices, is facing new challenges. In order to improve the resolution of the lithography system, the wavelength of the exposure light source is continuously reduced, from the near ultraviolet of 436nm and 355nm to the deep ultraviolet of 248nm and 193nm. Taking 193nm ArF excimer laser lithography as an example, it has broken through the 90nm, 65nm and 45nm nodes and has become the current mainstream exposure technology.
在深紫外波段中,由于光学系统中元件的个数受限于材料的吸收,这就导致了非球面元件的大量应用。而非球面元件从毛坯到光学系统中的一部分,需要经过加工、镀膜、集成以及装调等过程。在这些过程中都会对元件施加或引入新的应力,此时需要比较处理前后元件的应力双折射测量结果,但是目前的应力双折射测试系统只能测量平面、球面元件的应力双折射延迟,对非球面的应力双折射量则无法进行测量。In the deep ultraviolet band, since the number of elements in the optical system is limited by the absorption of materials, this leads to a large number of applications of aspheric elements. Aspherical components need to go through processes such as processing, coating, integration and assembly from the blank to a part of the optical system. In these processes, new stresses will be applied or introduced to the components. At this time, it is necessary to compare the stress birefringence measurement results of the components before and after the treatment. However, the current stress birefringence test system can only measure the stress birefringence retardation of planar and spherical components. The amount of stress birefringence of aspheric surfaces cannot be measured.
发明内容Contents of the invention
本发明旨在解决现有技术中对非球面的应力双折射量无法进行测量的技术问题,提供一种测量过程简单且成本较低,且能实现应力双折射量的非球面元件的应力双折射量的测量方法。The invention aims to solve the technical problem that the stress birefringence of the aspheric surface cannot be measured in the prior art, and provides a stress birefringence of the aspheric element with a simple measurement process and low cost, which can realize the stress birefringence Quantity measurement method.
本发明提供一种非球面元件的应力双折射量的测量方法,所述测量方法包括:The invention provides a method for measuring the stress birefringence of an aspheric element, the measuring method comprising:
确定非球面元件上的测试点和光源的初始位置以及根据当前测试点与非球面元件光轴的角度得到所述光源的偏转角;Determining the test point on the aspheric element and the initial position of the light source and obtaining the deflection angle of the light source according to the angle between the current test point and the optical axis of the aspheric element;
根据非球面元件的尺寸,当前测试点的位置和当前测试点到光源的距离得到所述光源的位移距离;Obtain the displacement distance of the light source according to the size of the aspheric element, the position of the current test point and the distance from the current test point to the light source;
调整所述非球面元件与所述测试台的同心度;adjusting the concentricity of the aspheric element and the test bench;
根据所述光源的偏转角和所述光源的位移距离将所述光源移动对应的位置;moving the light source to a corresponding position according to the deflection angle of the light source and the displacement distance of the light source;
根据当前测试点的位置确定所述应力双折射设备的探测器的位置;determining the position of the detector of the stress birefringence device according to the position of the current test point;
根据所述探测器的位置将所述探测器移动对应的位置move the detector to a corresponding position according to the position of the detector
通过探测器得到当前测试点的应力双折射量;Obtain the stress birefringence of the current test point through the detector;
通过旋转所述测试台将所述非球面元件转动到同一圆周上的多个指定角度对应测试点上,并通过探测器得到同一圆周上的多个指定角度对应测试点的多个应力双折射量;By rotating the test table, the aspheric element is rotated to test points corresponding to multiple specified angles on the same circumference, and multiple stress birefringence values corresponding to multiple specified angles on the same circumference are obtained by the detector ;
进入确定非球面元件上的测试点和光源的初始位置,根据当前测试点与光源光轴的角度得到所述光源的偏转角的步骤,直到所有的测试点测量完毕。Enter the step of determining the test point on the aspheric element and the initial position of the light source, and obtain the deflection angle of the light source according to the angle between the current test point and the optical axis of the light source, until all the test points are measured.
本发明的技术方案与现有技术相比,有益效果在于:无需对设备进行升级改造,无需使用软件编程,只需要测量设备尺寸,已知待测元件尺寸、非球面方程以及折射率的情况下即可进行应力双折射的测量;另外仅需要计算一个径向测试点对应的光源位置和探测器位置,便可测量该圆周上的应力双折射延迟,使得本测量方法的测量过程简单且成本较低。Compared with the prior art, the technical solution of the present invention has beneficial effects in that: no need to upgrade the equipment, no need to use software programming, only need to measure the size of the equipment, and the size of the component to be measured, the aspheric equation and the refractive index are known The measurement of stress birefringence can be carried out; in addition, it is only necessary to calculate the position of the light source and the position of the detector corresponding to a radial test point, and then the stress birefringence delay on the circle can be measured, which makes the measurement process of this measurement method simple and cost-effective. Low.
附图说明Description of drawings
图1为本发明非球面镜的偏心测量方法一种实施例的流程图。FIG. 1 is a flow chart of an embodiment of the method for measuring eccentricity of an aspheric mirror according to the present invention.
图2为非球面元件的结构示意图;Fig. 2 is the structural representation of aspherical element;
图3为非球面元件、探测器和光源的位置示意图。Fig. 3 is a schematic diagram of the positions of the aspheric element, the detector and the light source.
图中,31、探测器;32、非球面元件;33、光源;34、测试点。In the figure, 31, a detector; 32, an aspheric element; 33, a light source; 34, a test point.
具体实施方式Detailed ways
下面结合附图对本发明的具体实施方式作进一步说明。The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings.
本发明提供一种实施例的非球面元件的应力双折射量的测量方法,如图1所示,所述测量方法包括:The present invention provides a method for measuring the stress birefringence of the aspheric element of an embodiment, as shown in Figure 1, the measurement method includes:
步骤S11,确定非球面元件上的测试点和光源的初始位置以及根据当前测试点与光源光轴的角度得到所述光源的偏转角;Step S11, determining the test point on the aspheric element and the initial position of the light source, and obtaining the deflection angle of the light source according to the angle between the current test point and the optical axis of the light source;
步骤S12,根据非球面元件的尺寸,当前测试点的位置和当前测试点到光源的距离得到所述光源的位移距离;Step S12, obtaining the displacement distance of the light source according to the size of the aspheric element, the position of the current test point and the distance from the current test point to the light source;
步骤S13,调整所述非球面元件与应力双折射设备的测试台的同心度;Step S13, adjusting the concentricity of the aspheric element and the test bench of the stress birefringence device;
步骤S14,根据所述光源的偏转角和所述光源的位移距离将所述光源移动对应的位置;Step S14, moving the light source to a corresponding position according to the deflection angle of the light source and the displacement distance of the light source;
步骤S15,根据当前测试点的位置确定所述应力双折射设备的探测器的位置;Step S15, determining the position of the detector of the stress birefringence device according to the position of the current test point;
步骤S16,根据所述探测器的位置将所述探测器移动对应的位置;Step S16, moving the detector to a corresponding position according to the position of the detector;
步骤S17,通过探测器得到当前测试点的应力双折射量;Step S17, obtaining the stress birefringence of the current test point through the detector;
步骤S18,通过旋转所述测试台将所述非球面元件转动到同一圆周上的多个指定角度对应测试点上,并通过探测器得到同一圆周上的多个指定角度对应测试点的多个应力双折射量;进入步骤S11;Step S18, by rotating the test bench, the aspheric element is rotated to test points corresponding to multiple specified angles on the same circumference, and multiple stresses of multiple specified angles corresponding to test points on the same circumference are obtained by the detector Birefringence amount; enter step S11;
步骤S19,直到所有的测试点测量完毕。Step S19, until all test points are measured.
在步骤S13中,将非球面元件放置在应力双折射设备的测试台上通过手动操作以调整所述非球面元件与应力双折射设备的测试台的同心度。In step S13 , the concentricity between the aspheric element and the test stand of the stress birefringence device is adjusted manually by placing the aspheric element on the test stand of the stress birefringence device.
在具体实施中,所述光源偏转角等于当前测试点的法线与非球面元件光轴的夹角减去光在空气中的入射角,也就是说,假设光线在非球面元件内部沿光轴方向传播,计算光在空气中的入射角即光在当前测试点的入射角,并转换成光源偏转角。In a specific implementation, the deflection angle of the light source is equal to the angle between the normal of the current test point and the optical axis of the aspheric element minus the incident angle of light in the air, that is, assuming that the light is inside the aspheric element along the optical axis Direction propagation, calculate the incident angle of light in the air, that is, the incident angle of light at the current test point, and convert it into the deflection angle of the light source.
在具体实施中,所述应力双折射设备测试非球面元件时采用极坐标的方式,其中非球面元件的中心点为基准点,中心点水平向右的矢量为极轴。与极轴重合即为0°位置,极轴逆时针旋转90°即为90°位置。In a specific implementation, the stress birefringence device uses polar coordinates when testing the aspheric element, wherein the center point of the aspheric element is the reference point, and the horizontal vector to the right of the center point is the polar axis. Coincident with the polar axis is the 0° position, and the polar axis is rotated 90° counterclockwise to be the 90° position.
在具体实施中,步骤S11,具体为:In specific implementation, step S11 is specifically:
在非球面元件的径向方向上从非球面元件的中心开始选择单位间隔为第一预设距离的N个测试点,其中N为大于等于1的正整数。每个第一预设距离在同一圆周上具有角度为0°、90°的两个测试点,当然也可以是,每个第一预设距离在同一圆周上具有角度为0°、90°、180°和270°的四个测试点。比如当第一预设距离为5mm时,非球面元件的半径为35mm时,测试点具体为与非球面元件的中心的距离为5mm的四个点,与非球面元件的中心的距离为10mm的四个点,距离25mm四个点,距离30mm四个点。另外非球面元件的中心的距离为5mm的两个点在圆周上的角度为0°、90°、180°和270°。In the radial direction of the aspheric element, select N test points whose unit interval is the first preset distance from the center of the aspheric element, where N is a positive integer greater than or equal to 1. Each first preset distance has two test points with angles of 0° and 90° on the same circumference. Of course, each first preset distance has two test points with angles of 0°, 90°, Four test points at 180° and 270°. For example, when the first preset distance is 5mm and the radius of the aspheric element is 35mm, the test points are specifically four points whose distance from the center of the aspheric element is 5mm, and the distance from the center of the aspheric element is 10mm. Four points, four points at a distance of 25mm, and four points at a distance of 30mm. In addition, the angles on the circumference of two points at which the distance between the centers of the aspherical elements is 5 mm are 0°, 90°, 180°, and 270°.
在具体实施中,所述光源的初始位置为:位移量为0mm,偏转角度为0°In a specific implementation, the initial position of the light source is: the displacement is 0mm, and the deflection angle is 0°
在具体实施中,所述非球面元件与所述测试台的同心度小于或等于0.1mm。In a specific implementation, the concentricity between the aspheric element and the test bench is less than or equal to 0.1 mm.
在具体实施中,所述非球面元件可以为双面抛光元件和毛面涂匹配液的元件。In a specific implementation, the aspheric element may be a double-sided polished element and an element coated with matching liquid on the matte surface.
在具体实施中,步骤S15,具体为:将应力双折射设备的探测器移动到当前测试点的正下方。由于应力双折射设备在测量时,测试光在非球面元件内沿光轴方向传播,也就是竖直方向传播。具体的,非球面元件下表面为平面,竖直传播的光与非球面元件下表面垂直,不会发生折射,所以光出射位置与入射位置相同,探测器只要在非球面元件的测试点的下方,便可以检测到完成出射光。In a specific implementation, step S15 is specifically: moving the detector of the stress birefringence device directly below the current test point. When measuring the stress birefringence device, the test light propagates along the optical axis in the aspheric element, that is, the vertical direction. Specifically, the lower surface of the aspheric element is flat, and the light propagating vertically is perpendicular to the lower surface of the aspheric element without refraction, so the light exit position is the same as the incident position, and the detector only needs to be below the test point of the aspheric element , the complete exit light can be detected.
在具体实施中,在步骤S18中,还包括:根据非球面元件的周向上选择的测试点个数M得到所述指定角度,其中M为大于等于1的正整数。非球面元件的周向上选择的测试点个数M根据测量的实际情况决定的,当测试点个数M越大,测量的结果越精确,比如测试点个数M可为4、8或12等。当测试点个数M为2时,多个指定角度为:0°和90°。当测试点个数M为4时,多个指定角度为:0°,90°,180°和270°。也就是说,当当前测试点是角度为0°、90°、180°和270°的四个测试点之一时,同一圆周上的多个指定角度对应测试点是角度为0°、90°、180°和270°的四个角度的其余三者,那么下一个测试点为同一圆周上的多个指定角度对应测试点中的一个,检测完径向上同一第一预设距离的四个测试点之后,在进入步骤S11,接着测量其余的测试点。In a specific implementation, in step S18, it further includes: obtaining the specified angle according to the number M of test points selected in the circumferential direction of the aspheric element, wherein M is a positive integer greater than or equal to 1. The number M of test points selected in the circumferential direction of the aspheric element is determined according to the actual situation of the measurement. When the number M of test points is larger, the measurement result is more accurate. For example, the number M of test points can be 4, 8 or 12, etc. . When the number of test points M is 2, the multiple specified angles are: 0° and 90°. When the number of test points M is 4, the specified angles are: 0°, 90°, 180° and 270°. That is to say, when the current test point is one of the four test points with angles of 0°, 90°, 180° and 270°, multiple specified angles on the same circle correspond to test points with angles of 0°, 90°, For the remaining three of the four angles of 180° and 270°, the next test point is one of the test points corresponding to multiple specified angles on the same circumference, and the four test points with the same first preset distance in the radial direction are detected Afterwards, proceed to step S11, and then measure the rest of the test points.
在具体实施中,以图2中的非球面元件为例详细描述非球面元件的应力双折射量的测量方法。其中非球面元件的非球面I的公式:In a specific implementation, the method for measuring the stress birefringence of the aspheric element is described in detail by taking the aspheric element in FIG. 2 as an example. The formula of the aspheric surface I of the aspheric element:
其中,非球面I的直径r0=100mm,非球面I的系数k=-1.329873206,非球面元件的直径长度x=104mm,中心厚度y=10mm。Wherein, the diameter r 0 of the aspheric surface I = 100 mm, the coefficient k of the aspheric surface I = -1.329873206, the diameter length of the aspheric surface element x = 104 mm, and the center thickness y = 10 mm.
接着,在上述待测非球面元件的径向上从中心开始选择间隔为5mm的10个点,每个圆周上选择0°和90°两个点进行测试,以距中心20mm的1点为例,如图3所示,所述测量方法的具体步骤如下:确定非球面元件32上的测试点34和光源33的初始位置,比如测试点34的角度为0°。然后假设光线在元件内部沿光轴方向传播,计算光在空气中的入射角,并转换成光源偏转角5.216°;根据非球面元件32的尺寸、所选测试点34的位置及该位置到光源的距离,计算光源位移距离53mm;将非球面元件32放置在应力双折射设备的测试台上,调整样品与测试台同心度0.02mm;将光源按照计算出的偏转角及位移移动,如图3所示,探测器31移动到测试点34的正下方20mm;测量并记录数据;旋转样品至指定角度,由于当前测试点34的角度为0°,旋转样品至距中心20mm且角度为90°上测量并记录数据,即测完一周后,选择下一个距离的测试点比如距中心25mm且角度为0°重复以上步骤,将非球面元件32所有的测试数据进行处理得到非球面元件的应力双折射量。Next, select 10 points with an interval of 5mm from the center in the radial direction of the above-mentioned aspheric element to be tested, and select two points at 0° and 90° on each circumference for testing, taking 1 point 20mm from the center as an example, As shown in FIG. 3 , the specific steps of the measurement method are as follows: determine the initial positions of the test point 34 and the light source 33 on the aspheric element 32 , for example, the angle of the test point 34 is 0°. Then assuming that the light propagates along the optical axis inside the element, calculate the incident angle of the light in the air, and convert it into a light source deflection angle of 5.216°; according to the size of the aspheric element 32, the position of the selected test point 34 and the position Calculate the light source displacement distance of 53 mm; place the aspheric element 32 on the test bench of the stress birefringence device, adjust the concentricity between the sample and the test bench to 0.02 mm; move the light source according to the calculated deflection angle and displacement, as shown in Figure 3 As shown, the detector 31 moves to 20mm directly below the test point 34; measures and records the data; rotates the sample to a specified angle, since the current angle of the test point 34 is 0°, rotate the sample to 20mm from the center and the angle is 90° Measure and record the data, that is, after one week of measurement, select a test point with a distance of 25 mm from the center and an angle of 0° to repeat the above steps, and process all the test data of the aspheric element 32 to obtain the stress birefringence of the aspheric element quantity.
本发明的测量方法无需对设备进行升级改造,无需使用软件编程,只需要测量设备尺寸,已知待测元件尺寸、非球面方程以及折射率的情况下即可进行应力双折射的测量;另外仅需要计算径向上一测试点对应的光源位置和探测器位置,便可测量该圆周上的应力双折射延迟,使得本测量方法的测量过程简单且成本较低。The measurement method of the present invention does not need to upgrade the equipment, does not need to use software programming, only needs to measure the size of the equipment, and the stress birefringence can be measured when the size of the component to be measured, the aspheric surface equation and the refractive index are known; in addition, only The stress birefringence delay on the circumference can be measured by calculating the position of the light source and the position of the detector corresponding to a test point in the radial direction, which makes the measurement process of the measurement method simple and low in cost.
上述实施例和说明书中描述的只是说明本发明的原理和最佳实施例,在不脱离本发明精神和范围的前提下,本发明还会有各种变化和改进,这些变化和改进都落入要求保护的本发明范围内。What described in above-mentioned embodiment and description just illustrate the principle of the present invention and preferred embodiment, under the premise of not departing from the spirit and scope of the present invention, the present invention also can have various changes and improvements, and these changes and improvements all fall into within the scope of the claimed invention.
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201611058939.9A CN106596059B (en) | 2016-11-25 | 2016-11-25 | A kind of measurement method of the stress birfringence amount of non-spherical element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201611058939.9A CN106596059B (en) | 2016-11-25 | 2016-11-25 | A kind of measurement method of the stress birfringence amount of non-spherical element |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106596059A CN106596059A (en) | 2017-04-26 |
CN106596059B true CN106596059B (en) | 2018-12-04 |
Family
ID=58593458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201611058939.9A Expired - Fee Related CN106596059B (en) | 2016-11-25 | 2016-11-25 | A kind of measurement method of the stress birfringence amount of non-spherical element |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106596059B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107543684B (en) * | 2017-08-18 | 2019-05-10 | 清华大学深圳研究生院 | A kind of device and method measuring optical window birefringence effect |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0979827A (en) * | 1995-09-18 | 1997-03-28 | Furukawa Electric Co Ltd:The | Optical fiber sensor |
JP2012031063A (en) * | 2004-06-02 | 2012-02-16 | Ohara Inc | Method for producing optical glass |
CN104359600A (en) * | 2014-12-02 | 2015-02-18 | 中国航天科工集团第三研究院第八三五八研究所 | Method for measuring stress optical coefficient of optical thin film |
CN104568248A (en) * | 2014-12-02 | 2015-04-29 | 中国航天科工集团第三研究院第八三五八研究所 | Measuring method of microzone stress of amorphous optical thin film |
CN105865686A (en) * | 2016-04-20 | 2016-08-17 | 西安科技大学 | Newton ring stress measuring device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8854623B2 (en) * | 2012-10-25 | 2014-10-07 | Corning Incorporated | Systems and methods for measuring a profile characteristic of a glass sample |
-
2016
- 2016-11-25 CN CN201611058939.9A patent/CN106596059B/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0979827A (en) * | 1995-09-18 | 1997-03-28 | Furukawa Electric Co Ltd:The | Optical fiber sensor |
JP2012031063A (en) * | 2004-06-02 | 2012-02-16 | Ohara Inc | Method for producing optical glass |
CN104359600A (en) * | 2014-12-02 | 2015-02-18 | 中国航天科工集团第三研究院第八三五八研究所 | Method for measuring stress optical coefficient of optical thin film |
CN104568248A (en) * | 2014-12-02 | 2015-04-29 | 中国航天科工集团第三研究院第八三五八研究所 | Measuring method of microzone stress of amorphous optical thin film |
CN105865686A (en) * | 2016-04-20 | 2016-08-17 | 西安科技大学 | Newton ring stress measuring device |
Non-Patent Citations (3)
Title |
---|
Quantitatively measurement and analysis of residual stresses in molded aspherical glass lenses;Bo Tao等;《Int J Adv Manuf Technol》;20140624;全文 * |
激光钕玻璃包边残余应力实验研究;胡俊江等;《中国激光》;20150228;第42卷(第2期);全文 * |
红外晶体材料应力双折射测试方法研究;撖芃芃等;《长春理工大学学报(自然科学版)》;20120930;第35卷(第3期);全文 * |
Also Published As
Publication number | Publication date |
---|---|
CN106596059A (en) | 2017-04-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102778210A (en) | Aspheric surface absolute detection method based on computer generated hologram | |
CN104483817A (en) | Device for detecting system wave aberration of photoetchingprojection objective | |
CN107345893A (en) | A kind of KPT Scatter phase function measurement apparatus and measuring method | |
CN106768886A (en) | A kind of deep ultraviolet optical system wave aberration detection means and method | |
CN101819017B (en) | Detecting device and method of vertex curvature radius of large-diameter non-spherical reflecting mirror | |
CN106596059B (en) | A kind of measurement method of the stress birfringence amount of non-spherical element | |
CN110455226A (en) | Calibration system and method for laser collimation, transceiver and straightness measurement | |
CN204479018U (en) | Based on the aspheric surface interference checking device of stitching interferometry and calculation holographic method | |
CN102889978A (en) | Large-aperture window detection device and detection method | |
CN108803248B (en) | On-line detection device and method for numerical aperture of projection objective | |
CN103398975B (en) | The measurement mechanism of optical glass refractive index and measuring method thereof | |
CN106643556A (en) | Ellipsoid reflector surface shape detection device and ellipsoid reflector surface shape detection method | |
CN206440452U (en) | A kind of deep ultraviolet optical system wave aberration detection means | |
CN105627945A (en) | Device and method of measuring deviation between center of aspheric element and center of outer circle | |
CN103175481B (en) | The measuring method of a kind of off-axis optics aspherical mirror vertex radius and device | |
Huang et al. | Novel image polarization method for measurement of lens decentration | |
CN108332686A (en) | A kind of detection device and method of conical mirror cone angle | |
CN108788929B (en) | A kind of processing method accurately controlling nontransparent thickness of workpiece | |
US7245361B2 (en) | Method for evaluating refractive index homogeneity of optical member | |
CN208207508U (en) | On-line measuring device for Optical Coatings for Photolithography | |
US11106144B2 (en) | Lithographic method and apparatus | |
Dai et al. | Stylus profilometry for steep aspheric surfaces with multisegment stitching | |
CN104807758A (en) | Device and method for measuring refractive indexes of high-temperature melt and liquid on line | |
CN103954230B (en) | A kind of method of collimation optical surface profiler effective spatial resolution | |
CN104777715A (en) | Method used for measuring photoetching machine vertical measuring system reflector surface shape |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20181204 Termination date: 20201125 |