CN106582127B - A kind of vacuum filtering system and method for thinned machine - Google Patents
A kind of vacuum filtering system and method for thinned machine Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000001914 filtration Methods 0.000 title claims description 12
- 239000007788 liquid Substances 0.000 claims abstract description 109
- 239000002699 waste material Substances 0.000 claims abstract description 24
- 238000000926 separation method Methods 0.000 claims abstract description 9
- 230000006837 decompression Effects 0.000 claims description 10
- 239000003638 chemical reducing agent Substances 0.000 claims 2
- 238000003828 vacuum filtration Methods 0.000 abstract description 20
- 230000003749 cleanliness Effects 0.000 abstract description 6
- 230000009471 action Effects 0.000 description 7
- 230000008901 benefit Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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- 239000012530 fluid Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Abstract
本发明提供了一种减薄机的真空过滤系统及方法，该真空过滤系统包括：密封腔体，设有真空接口、气源接口与排液接口，真空接口通过第一管路连接至真空源，第一管路上设有一真空电磁阀；气源接口通过第二管路连接至减薄机的气路终端；通过第三管路与第二管路连通的气源，第三管路上设有一气体电磁阀；与排液接口连接的排液管路，排液管路上设有一液体电磁阀；与真空电磁阀、气体电磁阀以及液体电磁阀电连接的控制装置。在本发明方案中，通过控制真空电磁阀、气体电磁阀以及液体电磁阀的开闭，可使得在气路终端产生的废液进入到密封腔体中，实现气液分离，极大地保证了真空管路的清洁度，解决了因废液进入到真空管路而造成的各零部件损坏的问题。
The invention provides a vacuum filtration system and method for a thinning machine. The vacuum filtration system includes: a sealed cavity, provided with a vacuum interface, an air source interface and a liquid discharge interface, and the vacuum interface is connected to a vacuum source through a first pipeline , a vacuum solenoid valve is provided on the first pipeline; the gas source interface is connected to the gas terminal of the thinning machine through the second pipeline; the gas source communicated with the second pipeline through the third pipeline is provided with a A gas solenoid valve; a liquid discharge pipeline connected to the liquid discharge interface, a liquid solenoid valve is arranged on the liquid discharge pipeline; a control device electrically connected with the vacuum solenoid valve, the gas solenoid valve and the liquid solenoid valve. In the solution of the present invention, by controlling the opening and closing of the vacuum solenoid valve, the gas solenoid valve and the liquid solenoid valve, the waste liquid generated at the end of the gas path can enter the sealed cavity to realize gas-liquid separation, which greatly ensures the vacuum tube The cleanliness of the pipeline solves the problem of damage to various parts caused by waste liquid entering the vacuum pipeline.
Description
技术领域technical field
本发明涉及半导体技术领域，尤其涉及一种减薄机的真空过滤系统及方法。The invention relates to the technical field of semiconductors, in particular to a vacuum filtration system and method for a thinning machine.
背景技术Background technique
在现代半导体专用设备制造过程中，晶圆减薄机在晶圆及各类材料进行磨削的一系列动作过程中，由真空源提供真空用来吸附晶圆及各类材料，由于磨削或者动作过程中需要吸入硅粉、磨粒等颗粒，以及磨削液、水等液体，会通过真空管路、通道、腔体等流向真空源，在流动过程中，会在各零部件上产生积累或者堵塞，长期以往则会造成零部件腐蚀、卡顿、损坏。In the manufacturing process of modern semiconductor special equipment, during a series of actions of grinding wafers and various materials, the vacuum source provides vacuum to absorb wafers and various materials. Due to grinding or During the action, it is necessary to inhale particles such as silicon powder and abrasive grains, as well as liquids such as grinding fluid and water, which will flow to the vacuum source through vacuum pipes, channels, cavities, etc. During the flow process, accumulation or Blockage, in the long run, will cause corrosion, jamming, and damage to parts.
然而已有的过滤装置，需要滤芯或者清洗。而且一般情况下，过滤装置处于真空管路的排放端，调压不便，不能有效保护真空管路内的各零部件，最终导致各零部件因损坏而不能有效配合减薄机的动作。However, the existing filtering devices require filter elements or cleaning. And generally speaking, the filter device is located at the discharge end of the vacuum pipeline, and it is inconvenient to adjust the pressure, which cannot effectively protect the components in the vacuum pipeline, and eventually cause the components to be damaged and cannot effectively cooperate with the action of the thinning machine.
发明内容Contents of the invention
为了克服现有技术中因有废液进入到真空管路而造成的各零部件损坏，不能有效配合减薄机的动作的问题，本发明的实施例提供了一种减薄机的真空过滤系统及方法。In order to overcome the problems in the prior art that the parts are damaged due to the waste liquid entering the vacuum pipeline and cannot effectively cooperate with the action of the thinning machine, the embodiment of the present invention provides a vacuum filtration system of the thinning machine and method.
为了解决上述技术问题，本发明的实施例采用如下技术方案：In order to solve the above technical problems, embodiments of the present invention adopt the following technical solutions:
依据本发明实施例的一个方面，提供了一种减薄机的真空过滤系统，包括：According to an aspect of an embodiment of the present invention, a vacuum filtration system of a thinning machine is provided, including:
密封腔体，所述密封腔体上分别设有真空接口、气源接口与排液接口，其中，在竖直方向上，所述真空接口与所述气源接口在所述密封腔体上的高度均高于所述排液接口在所述密封腔体上的高度；A sealed cavity, the sealed cavity is respectively provided with a vacuum interface, an air source interface and a liquid discharge interface, wherein, in the vertical direction, the vacuum interface and the gas source interface are on the sealed cavity The heights are all higher than the height of the liquid discharge interface on the sealed cavity;
所述真空接口通过第一管路连接至真空源，所述第一管路上设有一真空电磁阀；The vacuum interface is connected to a vacuum source through a first pipeline, and a vacuum solenoid valve is arranged on the first pipeline;
所述气源接口通过第二管路连接至减薄机的气路终端；The gas source interface is connected to the gas circuit terminal of the thinning machine through the second pipeline;
通过第三管路与所述第二管路连通的气源，所述第三管路上设有一气体电磁阀；A gas source communicated with the second pipeline through the third pipeline, and a gas solenoid valve is arranged on the third pipeline;
与所述排液接口连接的排液管路，所述排液管路上设有一液体电磁阀；A liquid discharge pipeline connected to the liquid discharge interface, and a liquid solenoid valve is arranged on the liquid discharge pipeline;
与所述真空电磁阀、所述气体电磁阀以及所述液体电磁阀电连接的控制装置；a control device electrically connected to the vacuum solenoid valve, the gas solenoid valve and the liquid solenoid valve;
其中，所述控制装置用于：控制所述真空电磁阀打开，所述气体电磁阀与所述液体电磁阀同时关闭，使所述真空源产生的真空通过所述密封腔体达到所述气路终端；以及，当所述气路终端产生的废液通过所述第二管路进入到所述密封腔体时，控制所述液体电磁阀打开，所述真空电磁阀与所述气体电磁阀同时关闭，使废液通过所述排液管路排出，以进行气液分离。Wherein, the control device is used for: controlling the opening of the vacuum solenoid valve, closing the gas solenoid valve and the liquid solenoid valve at the same time, so that the vacuum generated by the vacuum source reaches the gas path through the sealed cavity terminal; and, when the waste liquid generated at the terminal of the gas path enters the sealed cavity through the second pipeline, the liquid solenoid valve is controlled to open, and the vacuum solenoid valve and the gas solenoid valve are simultaneously Closed, the waste liquid is discharged through the drain line for gas-liquid separation.
可选地，所述控制装置还用于：控制所述气体电磁阀打开，所述真空电磁阀与所述液体电磁阀同时关闭，使所述气源产生的气体通过所述密封腔体达到所述气路终端，以供所述气路终端使用。Optionally, the control device is also used to: control the opening of the gas solenoid valve, and close the vacuum solenoid valve and the liquid solenoid valve at the same time, so that the gas generated by the gas source passes through the sealed cavity to reach the The gas path terminal is used for the gas path terminal.
可选地，所述第一管路上设有一真空减压阀，所述真空减压阀设置于所述真空源与所述真空电磁阀之间，或者所述真空减压阀设置于所述真空电磁阀与所述真空接口之间。Optionally, a vacuum relief valve is provided on the first pipeline, and the vacuum relief valve is arranged between the vacuum source and the vacuum solenoid valve, or the vacuum relief valve is arranged between the vacuum between the solenoid valve and the vacuum port.
可选地，所述第三管路上设有一气体减压阀，所述气体减压阀设置于所述气源与所述气体电磁阀之间，或者所述气体减压阀设置于所述气体电磁阀与所述气源接口之间。Optionally, a gas decompression valve is provided on the third pipeline, and the gas decompression valve is set between the gas source and the gas solenoid valve, or the gas decompression valve is set between the gas Between the solenoid valve and the air source interface.
可选地，所述第三管路与所述第二管路连接的末端设有一压力传感器，用于检测所述气路终端内的气体压力值。Optionally, the end of the third pipeline connected to the second pipeline is provided with a pressure sensor for detecting the gas pressure value in the terminal of the gas circuit.
可选地，所述真空接口与所述气源接口均设置于所述密封腔体的顶端，所述排液接口设置于所述密封腔体的底端。Optionally, both the vacuum port and the air source port are arranged at the top of the sealed cavity, and the liquid drainage port is arranged at the bottom of the sealed cavity.
可选地，所述真空接口、所述气源接口以及所述排液接口的数量至少为一个，所述第一管路、第二管路、排液管路的数量分别与所述真空接口、所述气源接口以及所述排液接口的数量相同。Optionally, the number of the vacuum interface, the air source interface and the drain interface is at least one, and the number of the first pipeline, the second pipeline, and the drain pipeline are respectively the same as that of the vacuum interface. , the number of the air source port and the liquid discharge port are the same.
可选地，所述真空接口、所述气源接口以及所述排液接口均为快插接口。Optionally, the vacuum port, the air source port and the liquid discharge port are all quick-plug ports.
可选地，所述气路终端为承片台、清洗台或者真空机械手。Optionally, the terminal of the gas path is a substrate table, a cleaning table or a vacuum manipulator.
依据本发明实施例的另一个方面，还提供了一种减薄机的真空过滤方法，应用于如上所述的减薄机的真空过滤系统，包括：According to another aspect of the embodiment of the present invention, there is also provided a vacuum filtration method for a thinning machine, which is applied to the vacuum filtration system of the thinning machine as described above, including:
向真空电磁阀、气体电磁阀以及液体电磁阀发送第一控制信号，控制所述真空电磁阀打开，所述气体电磁阀与所述液体电磁阀同时关闭，使所述真空源产生的真空通过所述密封腔体达到所述气路终端；Send the first control signal to the vacuum solenoid valve, the gas solenoid valve and the liquid solenoid valve to control the vacuum solenoid valve to open, and the gas solenoid valve and the liquid solenoid valve to close simultaneously, so that the vacuum generated by the vacuum source passes through the vacuum solenoid valve. The sealed cavity reaches the terminal of the gas path;
当所述气路终端产生的废液通过所述第二管路进入到所述密封腔体时，向所述真空电磁阀、所述气体电磁阀以及所述液体电磁阀发送第二控制信号，控制所述液体电磁阀打开，所述真空电磁阀与所述气体电磁阀同时关闭，使废液通过所述排液管路排出，以进行气液分离。When the waste liquid generated at the end of the gas path enters the sealed cavity through the second pipeline, a second control signal is sent to the vacuum solenoid valve, the gas solenoid valve and the liquid solenoid valve, The liquid solenoid valve is controlled to open, and the vacuum solenoid valve and the gas solenoid valve are closed at the same time, so that the waste liquid is discharged through the liquid discharge pipeline for gas-liquid separation.
可选地，所述真空过滤方法还包括：Optionally, the vacuum filtration method also includes:
向所述真空电磁阀、所述气体电磁阀以及所述液体电磁阀发送第三控制信号，控制所述气体电磁阀打开，所述真空电磁阀与所述液体电磁阀同时关闭，使所述气源产生的气体通过所述密封腔体达到所述气路终端，以供所述气路终端使用。Send a third control signal to the vacuum solenoid valve, the gas solenoid valve, and the liquid solenoid valve to control the gas solenoid valve to open, and the vacuum solenoid valve and the liquid solenoid valve to close at the same time, so that the gas solenoid valve The gas generated by the source reaches the terminal of the gas circuit through the sealed cavity, so as to be used by the terminal of the gas circuit.
本发明实施例的有益效果是：The beneficial effects of the embodiments of the present invention are:
在本发明实施例提供的减薄机的真空过滤系统中，由于密封腔体分别连接至真空管路、气源管路、气路终端以及排液管路，因此通过控制设置于各管路上的电磁阀的开闭状态，即可使得气路终端的废液进入到该密封腔体中，并通过排液管路进行排放，实现气液分离，确保真空管路中只有气体通过，极大地保证了真空管路的清洁度，解决了现有技术中因废液进入到真空管路而造成的各零部件损坏，不能有效配合减薄机的动作的问题。In the vacuum filtration system of the thinning machine provided by the embodiment of the present invention, since the sealed cavity is respectively connected to the vacuum pipeline, the gas source pipeline, the gas terminal and the liquid discharge pipeline, by controlling the electromagnetic When the valve is open and closed, the waste liquid at the end of the gas path can enter the sealed cavity and be discharged through the liquid discharge line to realize gas-liquid separation, ensuring that only gas passes through the vacuum line, which greatly guarantees the safety of the vacuum tube. The cleanliness of the pipeline solves the problem of the damage of various parts caused by the waste liquid entering the vacuum pipeline in the prior art, and the problem that it cannot effectively cooperate with the action of the thinning machine.
附图说明Description of drawings
图1表示本发明实施例中减薄机的真空过滤系统的示意图；Fig. 1 represents the schematic diagram of the vacuum filtration system of thinning machine in the embodiment of the present invention;
图2表示本发明实施例中密封腔体的结构示意图。Fig. 2 shows a schematic structural diagram of a sealed cavity in an embodiment of the present invention.
其中图中：1、密封腔体；101、真空接口；102、气源接口；103、排液接口；2、真空源；3、真空电磁阀；4、气路终端；5、气源；6、气体电磁阀；7、液体电磁阀；8、真空减压阀；9、气体减压阀；10、压力传感器。In the figure: 1. Sealed cavity; 101. Vacuum interface; 102. Air source interface; 103. Drainage interface; 2. Vacuum source; 3. Vacuum solenoid valve; 4. Gas circuit terminal; 5. Air source; 6 , Gas solenoid valve; 7, Liquid solenoid valve; 8, Vacuum pressure reducing valve; 9, Gas pressure reducing valve; 10, Pressure sensor.
具体实施方式Detailed ways
为使本发明的目的、技术方案和优点更加清楚，下面将结合附图及具体实施例对本发明进行详细描述。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
实施例一Embodiment one
依据本发明实施例的一个方面，提供了一种减薄机的真空过滤系统，如图1所示，该真空过滤系统包括：According to an aspect of an embodiment of the present invention, a vacuum filtration system of a thinning machine is provided. As shown in FIG. 1, the vacuum filtration system includes:
密封腔体1，密封腔体1上分别设有真空接口101、气源接口102与排液接口103，其中，在竖直方向上，真空接口101与气源接口102在密封腔体1上的高度均高于排液接口103在密封腔体1上的高度；The sealed chamber 1 is provided with a vacuum interface 101, an air source interface 102 and a liquid discharge interface 103 respectively, wherein, in the vertical direction, the vacuum interface 101 and the air source interface 102 are on the sealed chamber 1. The heights are all higher than the height of the liquid discharge interface 103 on the sealed cavity 1;
真空接口101通过第一管路连接至真空源2，第一管路上设有一真空电磁阀3；The vacuum interface 101 is connected to the vacuum source 2 through the first pipeline, and a vacuum solenoid valve 3 is arranged on the first pipeline;
气源接口102通过第二管路连接至减薄机的气路终端4，一般地，气路终端4为承片台、清洗台或者真空机械手；The gas source interface 102 is connected to the gas circuit terminal 4 of the thinning machine through the second pipeline. Generally, the gas circuit terminal 4 is a lamination table, a cleaning table or a vacuum manipulator;
通过第三管路与第二管路连通的气源5，第三管路上设有一气体电磁阀6；The gas source 5 communicated with the second pipeline through the third pipeline, and a gas solenoid valve 6 is arranged on the third pipeline;
与排液接口103连接的排液管路，排液管路上设有一液体电磁阀7；A liquid discharge pipeline connected to the liquid discharge interface 103, a liquid solenoid valve 7 is arranged on the liquid discharge pipeline;
与真空电磁阀3、气体电磁阀6以及液体电磁阀7电连接的控制装置。A control device electrically connected to the vacuum solenoid valve 3 , the gas solenoid valve 6 and the liquid solenoid valve 7 .
其中，该控制装置用于：控制真空电磁阀3打开，气体电磁阀6与液体电磁阀7同时关闭，使真空源2产生的真空通过密封腔体1达到气路终端4；以及，当气路终端4产生的废液通过第二管路进入到密封腔体1时，控制液体电磁阀7打开，真空电磁阀3与气体电磁阀6同时关闭，使废液通过排液管路排出，以进行气液分离。Wherein, the control device is used to: control the vacuum solenoid valve 3 to open, the gas solenoid valve 6 and the liquid solenoid valve 7 to close at the same time, so that the vacuum generated by the vacuum source 2 reaches the gas circuit terminal 4 through the sealed cavity 1; and, when the gas circuit When the waste liquid generated by the terminal 4 enters the sealed cavity 1 through the second pipeline, the control liquid solenoid valve 7 is opened, and the vacuum solenoid valve 3 and the gas solenoid valve 6 are closed at the same time, so that the waste liquid is discharged through the liquid discharge pipeline to carry out Gas-liquid separation.
在本发明实施例中，当真空电磁阀3打开，气体电磁阀6与液体电磁阀7同时关闭，真空源2产生的真空通过密封腔体1后，可到达气路终端4，此时，第一管路、第二管路以及密封腔体1内均为真空，可将在气路终端4产生的废液吸入到第二管路，并最终落入密封腔体1底部。当气路终端4产生的废液通过第二管路进入到密封腔体1时，控制液体电磁阀7打开时，由于在竖直方向上，真空接口101与气源接口102在密封腔体1上的高度均高于排液接口103在密封腔体1上的高度，因此废液可由排液接口103从排液管路排出。另外，当废液未从密封腔体1排出，可对密封腔体1的底部进一步形成密封，提高了整个真空过滤系统的密封稳定性。In the embodiment of the present invention, when the vacuum solenoid valve 3 is opened, the gas solenoid valve 6 and the liquid solenoid valve 7 are closed at the same time, and the vacuum generated by the vacuum source 2 can reach the gas circuit terminal 4 after passing through the sealed cavity 1. At this time, the first The first pipeline, the second pipeline and the sealed cavity 1 are all vacuum, and the waste liquid generated at the terminal 4 of the gas circuit can be sucked into the second pipeline, and finally fall into the bottom of the sealed cavity 1 . When the waste liquid generated by the gas circuit terminal 4 enters the sealed cavity 1 through the second pipeline, when the control liquid solenoid valve 7 is opened, the vacuum interface 101 and the gas source interface 102 are in the sealed cavity 1 in the vertical direction. The height above is higher than the height of the liquid discharge interface 103 on the sealed cavity 1, so the waste liquid can be discharged from the liquid discharge pipeline through the liquid discharge interface 103. In addition, when the waste liquid is not discharged from the sealed cavity 1, the bottom of the sealed cavity 1 can be further sealed, which improves the sealing stability of the entire vacuum filtration system.
具体地，在本发明实施例中，控制装置还用于：控制气体电磁阀6打开，真空电磁阀3与液体电磁阀7同时关闭，此时气源5产生的气体由第三管路进入密封腔体1，并达到气路终端4，此时，第二管路、第三管路以及密封腔体内均充满气体，首先保证了整个真空过滤系统的清洁性，另外气源5产生的气体还可供气路终端4使用。Specifically, in the embodiment of the present invention, the control device is also used to: control the gas solenoid valve 6 to open, the vacuum solenoid valve 3 and the liquid solenoid valve 7 to close at the same time, at this time, the gas generated by the gas source 5 enters the sealed valve through the third pipeline. cavity 1, and reaches the gas circuit terminal 4, at this time, the second pipeline, the third pipeline and the sealed cavity are all filled with gas, which firstly ensures the cleanliness of the entire vacuum filtration system, and the gas generated by the gas source 5 is also Available for air terminal 4.
具体地，如图1所示，在本发明实施例中，第一管路上设有一真空减压阀8，用于调整真空源2输出的真空压力。其中，该真空减压阀8可设置于真空源2与真空电磁阀3之间，或者真空减压阀8设置于真空电磁阀3与真空接口101之间。可以理解的是，在本发明实施例中，对于真空减压阀8在第一管路上的位置并不进行具体限定。Specifically, as shown in FIG. 1 , in the embodiment of the present invention, a vacuum relief valve 8 is provided on the first pipeline for adjusting the vacuum pressure output by the vacuum source 2 . Wherein, the vacuum decompression valve 8 can be disposed between the vacuum source 2 and the vacuum solenoid valve 3 , or the vacuum decompression valve 8 can be disposed between the vacuum solenoid valve 3 and the vacuum interface 101 . It can be understood that, in the embodiment of the present invention, the position of the vacuum pressure relief valve 8 on the first pipeline is not specifically limited.
具体地，如图1所示，在本发明实施例中，第三管路上设有一气体减压阀9，用于调整气源5输出的气体压力。其中，气体减压阀9设置于气源5与气体电磁阀6之间，或者气体减压阀9设置于气体电磁阀6与气源接口102之间。可以理解的是，在本发明实施例中，对于气体减压阀9在第三管路上的位置并不进行具体限定。Specifically, as shown in FIG. 1 , in the embodiment of the present invention, a gas pressure reducing valve 9 is provided on the third pipeline for adjusting the gas pressure output by the gas source 5 . Wherein, the gas decompression valve 9 is disposed between the gas source 5 and the gas solenoid valve 6 , or the gas decompression valve 9 is disposed between the gas solenoid valve 6 and the gas source interface 102 . It can be understood that, in the embodiment of the present invention, the position of the gas decompression valve 9 on the third pipeline is not specifically limited.
其中，上述真空电磁阀3、气体电磁阀6以及液体电磁阀7的开闭与真空减压阀8以及气体减压阀9的调节均可根据工艺进行调整，可以实现对多种对路中使用的真空管路进行过滤，并通过控制装置统一控制，操作方便。Among them, the opening and closing of the vacuum solenoid valve 3, the gas solenoid valve 6 and the liquid solenoid valve 7 and the adjustment of the vacuum pressure reducing valve 8 and the gas pressure reducing valve 9 can be adjusted according to the process, and can be used in various pairs of circuits. The vacuum pipeline is used for filtering, and it is controlled uniformly by the control device, which is easy to operate.
具体地，如图1所示，在本发明实施例中，第三管路与第二管路连接的末端设有一压力传感器10，用于检测气路终端4内的气体压力值，可使得气路终端4的气体压力保持在适当的工作范围内，并可将气路终端4的气体压力反馈到控制装置，以确保气路终端4达到工艺和使用要求。Specifically, as shown in FIG. 1 , in the embodiment of the present invention, a pressure sensor 10 is provided at the end of the connection between the third pipeline and the second pipeline, which is used to detect the gas pressure value in the terminal 4 of the gas circuit, which can make the gas The gas pressure at the gas path terminal 4 is kept within an appropriate working range, and the gas pressure at the gas path terminal 4 can be fed back to the control device to ensure that the gas path terminal 4 meets the process and use requirements.
具体地，如图2所示，在本发明实施例中，真空接口101与气源接口102均设置于密封腔体1的顶端，排液接口103设置于密封腔体1的底端。可以理解的是，在本发明实施例中，对于真空接口101、气源接口102以及排液接口103在密封腔体1上的位置并不进行具体限定，只要保证在竖直方向上，真空接口101、气源接口102在密封腔体1上的高度高于排液接口103在密封腔体1上的高度即可。Specifically, as shown in FIG. 2 , in the embodiment of the present invention, both the vacuum port 101 and the air source port 102 are arranged at the top of the sealed cavity 1 , and the liquid discharge port 103 is arranged at the bottom of the sealed cavity 1 . It can be understood that, in the embodiment of the present invention, the positions of the vacuum port 101, the air source port 102 and the liquid discharge port 103 on the sealed cavity 1 are not specifically limited, as long as the vacuum port is guaranteed to be in the vertical direction, 101. The height of the gas source interface 102 on the sealed cavity 1 may be higher than the height of the liquid discharge interface 103 on the sealed cavity 1 .
另外，需要说明的是，在本发明实施例中对真空接口101、气源接口102以及排液接口103的数量并不进行具体限定，其中，真空接口101、气源接口102以及排液接口103的数量均至少为一个。用于与真空接口101、气源接口102以及排液接口103连接的第一管路、第二管路、排液管路的数量分别与真空接口101、气源接口102以及排液接口103的数量对应。因此，本发明实施例提供的真空过滤系统并不仅仅适用于单独管路系统，对于多管路、多气路终端4的复杂管路系统也同样适用，只要相应的增加真空接口101、气源接口102以及排液接口103，与之连接的第一管路、第二管路、排液管路以及设置于第一管路、第三管路、排液管路上的电磁阀即可。In addition, it should be noted that the number of the vacuum interface 101, the air source interface 102 and the liquid discharge interface 103 is not specifically limited in the embodiment of the present invention, wherein the vacuum interface 101, the air source interface 102 and the liquid discharge interface 103 The number of is at least one. The number of the first pipeline, the second pipeline, and the drain pipeline used to connect with the vacuum interface 101, the air source interface 102, and the drain interface 103 is respectively the same as that of the vacuum interface 101, the air source interface 102, and the drain interface 103. Quantity corresponds. Therefore, the vacuum filtration system provided by the embodiment of the present invention is not only suitable for a single pipeline system, but also suitable for a complex pipeline system with multiple pipelines and multiple gas terminal 4, as long as the vacuum interface 101, gas source The interface 102 and the liquid discharge interface 103 , the first pipeline, the second pipeline, the liquid discharge pipeline connected thereto, and the solenoid valves provided on the first pipeline, the third pipeline, and the liquid discharge pipeline are sufficient.
具体地，在本发明实施例中，真空接口101、气源接口102以及排液接口103均为快插接口。快插接口是最方便的即插即用的连接方式，并具有体型小优点，在一些气管连接非常不便、困难的空间场合下，更具有一定的优越性。其中，真空接口101、气源接口102以及排液接口103还可为其他水气路接口元件。可以理解的是，在本发明实施例中，对此并不进行具体限定。Specifically, in the embodiment of the present invention, the vacuum port 101 , the air source port 102 and the liquid discharge port 103 are all quick-plug ports. The quick-plug interface is the most convenient plug-and-play connection method, and has the advantage of small size. It has certain advantages in some space situations where the trachea connection is very inconvenient and difficult. Wherein, the vacuum interface 101 , the air source interface 102 and the liquid discharge interface 103 can also be other water and air circuit interface components. It can be understood that, in this embodiment of the present invention, this is not specifically limited.
综上，通过本发明实施例提供的减薄机的真空过滤系统可实现气液分离，确保真空管路中只有气体通过，极大地保证了真空管路的清洁度，解决了现有技术中因废液进入到真空管路而造成的各零部件损坏，不能有效配合减薄机的动作的问题。In summary, the vacuum filtration system of the thinning machine provided by the embodiment of the present invention can realize gas-liquid separation, ensure that only gas passes through the vacuum pipeline, greatly ensure the cleanliness of the vacuum pipeline, and solve the problem of waste liquid in the prior art. The damage to various parts caused by entering the vacuum pipeline cannot effectively cooperate with the action of the thinning machine.
实施例二Embodiment two
依据本发明实施例的另一个方面，还提供了一种减薄机的真空过滤方法，应用于如实施例一中的减薄机的真空过滤系统，该真空过滤方法包括：According to another aspect of the embodiment of the present invention, there is also provided a vacuum filtration method for a thinning machine, which is applied to the vacuum filtration system for a thinning machine as in Embodiment 1. The vacuum filtration method includes:
向真空电磁阀3、气体电磁阀6以及液体电磁阀7发送第一控制信号，控制真空电磁阀3打开，气体电磁阀6与液体电磁阀7同时关闭，使真空源2产生的真空通过密封腔体1达到气路终端4，此时，第一管路、第二管路以及密封腔体1内均为真空，可使得在气路终端4产生的废液吸入到第二管路，并最终落入密封腔体1底部，实现气液分离。Send the first control signal to the vacuum solenoid valve 3, the gas solenoid valve 6 and the liquid solenoid valve 7, control the vacuum solenoid valve 3 to open, and the gas solenoid valve 6 and the liquid solenoid valve 7 to close at the same time, so that the vacuum generated by the vacuum source 2 passes through the sealed cavity The body 1 reaches the terminal 4 of the gas circuit. At this time, the first pipeline, the second pipeline and the sealed cavity 1 are all vacuum, so that the waste liquid generated at the terminal 4 of the gas circuit can be sucked into the second pipeline, and finally Fall into the bottom of the sealed chamber 1 to realize gas-liquid separation.
当气路终端4产生的废液通过第二管路进入到密封腔体1时，向真空电磁阀3、气体电磁阀6以及液体电磁阀7发送第二控制信号，控制液体电磁阀7打开，真空电磁阀3与气体电磁阀6同时关闭，由于在竖直方向上，真空接口101与气源接口102在密封腔体1上的高度均高于排液接口103在密封腔体1上的高度，因此可使废液通过排液管路排出，确保真空管路中只有气体通过，极大地保证了真空管路的清洁度，解决了现有技术中因废液进入到真空管路而造成的各零部件损坏，不能有效配合减薄机的动作的问题。When the waste liquid generated by the gas circuit terminal 4 enters the sealed cavity 1 through the second pipeline, a second control signal is sent to the vacuum solenoid valve 3, the gas solenoid valve 6 and the liquid solenoid valve 7 to control the liquid solenoid valve 7 to open, The vacuum solenoid valve 3 and the gas solenoid valve 6 are closed at the same time, because in the vertical direction, the heights of the vacuum port 101 and the gas source port 102 on the sealed cavity 1 are higher than the height of the drain port 103 on the sealed cavity 1 , so that the waste liquid can be discharged through the liquid discharge pipeline, ensuring that only gas passes through the vacuum pipeline, which greatly ensures the cleanliness of the vacuum pipeline, and solves the problems caused by the waste liquid entering the vacuum pipeline in the prior art. Damaged, unable to effectively cooperate with the action of the thinning machine.
具体地，在发明实施例中，还该真空过滤方法还包括：Specifically, in an embodiment of the invention, the vacuum filtration method also includes:
向真空电磁阀3、气体电磁阀6以及液体电磁阀7发送第三控制信号，控制气体电磁阀6打开，真空电磁阀3与液体电磁阀7同时关闭，使气源5产生的气体通过密封腔体1达到气路终端4，在保证整个真空管路高清洁度的同时，还能够供气路终端4使用。Send the third control signal to the vacuum solenoid valve 3, the gas solenoid valve 6 and the liquid solenoid valve 7, control the gas solenoid valve 6 to open, and the vacuum solenoid valve 3 and the liquid solenoid valve 7 to close at the same time, so that the gas generated by the gas source 5 passes through the sealed cavity The body 1 reaches the gas circuit terminal 4, which can be used by the gas circuit terminal 4 while ensuring the high cleanliness of the entire vacuum pipeline.
以上所述的是本发明的优选实施方式，应当指出对于本技术领域的普通人员来说，在不脱离本发明所述的原理前提下还可以作出若干改进和润饰，这些改进和润饰也在本发明的保护范围内。What has been described above is a preferred embodiment of the present invention. It should be pointed out that for those skilled in the art, some improvements and modifications can also be made without departing from the principles described in the present invention. within the scope of protection of the invention.
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