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CN106500846B - A kind of asymmetric correction method of infrared imaging system - Google Patents

A kind of asymmetric correction method of infrared imaging system Download PDF

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Publication number
CN106500846B
CN106500846B CN201610839361.4A CN201610839361A CN106500846B CN 106500846 B CN106500846 B CN 106500846B CN 201610839361 A CN201610839361 A CN 201610839361A CN 106500846 B CN106500846 B CN 106500846B
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China
Prior art keywords
baffle
infrared
picture data
internal baffle
imaging system
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Expired - Fee Related
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CN201610839361.4A
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Chinese (zh)
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CN106500846A (en
Inventor
周云
蒋伟
闫相宏
杨皓然
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University of Electronic Science and Technology of China
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University of Electronic Science and Technology of China
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Priority to CN201610839361.4A priority Critical patent/CN106500846B/en
Publication of CN106500846A publication Critical patent/CN106500846A/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/80Calibration
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J2005/0077Imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiation Pyrometers (AREA)

Abstract

The embodiment of the invention discloses a kind of asymmetric correction methods of infrared imaging system, it acquires interior panelling data and external baffle data, the rectification building-out factor is calculated by interior outer baffle data, then Internal baffle data are compensated during calculating Nonuniformity Correction parameter, is close to external baffle data.In this way, compensating for the temperature change of Internal baffle during the Nonuniformity Correction of infrared imaging system, so that Nonuniformity Correction process is more acurrate, the quality of infrared image is improved, reduces and covers yarn sense.

Description

A kind of asymmetric correction method of infrared imaging system
Technical field
The present invention relates to infrared imagery technique fields, more particularly, to a kind of Nonuniformity Correction side of infrared imaging system Method.
Background technique
With the development of science and technology, the acquisition of information is in occupation of increasingly consequence, infrared detection technique conduct A kind of important means for obtaining information, the irreplaceable advantage of Detection Techniques with its all band, either it is military still Civil field is suffered from and is widely applied, and receives great attention both domestic and external.
Currently, third generation infrared detector develops to the direction of non-brake method, array, miniaturization.Due to uncooled ir Focal plane imaging technology does not need additional refrigeration equipment, reduces the add-on module of system, keeps system more integrated, smaller, more Gently, the application for greatly expanding infrared imaging system becomes the emphasis of Recent study.
It is limited by material and technique, infrared focal plane array can not accomplish that each probe unit is complete in the fabrication process It repeats, and each probe unit has differences the response of temperature, results in the heterogeneity of infrared imaging system imaging, it is non-equal Even property has seriously affected the quality of imaging, limits the application of infrared detector.Currently, mainly from technique and image procossing two Reduce the spatial heterogeneity of probe unit on direction, wherein can be very good to improve by improvement processing technology non-homogeneous Property, but it is high due to improving process costs, it is not easy to use.And the method by the way that real time correction is added during image processing is not But cost is relatively low, and flexible and convenient, portable strong, can be very good to improve heterogeneity.
Improving heterogeneity using the method for image procossing is realized based on algorithm, and the selection principle of algorithm is to be easy to It realizes, speed is fast, and it is high-efficient, save hardware resource.Current algorithm mainly has based on scene and based on calibration and by the two In conjunction with three classes.Wherein bearing calibration and two point correction method have obtained widely answering because it is easy to implement with significant effect With.
It is usually used in existing heteropical method using the method correction infrared imaging system of image procossing Baffle in infrared imaging system is set, obtains infrared image and the baffle is imaged, and based on the red of baffle Outer image carries out image procossing to be corrected to heterogeneity.But due to baffle plate setting inside infrared imaging system (under It is referred to as Internal baffle in text), therefore over time, the machine core working time is elongated, and machine core internal temperature is higher than external environment temperature Degree, so that baffle temperature becomes larger with ambient temperature gap, the difference of response is consequently increased.In this way, making based on interior gear The effect for the Nonuniformity Correction that plate carries out will be influenced by bigger, so that infrared image occurs covering yarn sense.
Summary of the invention
An object of the present invention is to provide a kind of asymmetric correction method of infrared imaging system, can be infrared The temperature change that Internal baffle is compensated during the Nonuniformity Correction of imaging system, so that Nonuniformity Correction process is more quasi- Really, the quality of infrared image is improved.
In some embodiments of the present invention, a kind of asymmetric correction method of infrared imaging system is provided.This method It include: that outer baffle is set outside infrared imaging system;With infrared imaging system to the interior gear of outer baffle and infrared imaging system Plate is imaged, and outer baffle infrared picture data and the first Internal baffle infrared picture data are obtained;According to outer baffle infrared image Data and the first Internal baffle infrared picture data calculate the rectification building-out factor between Internal baffle and outer baffle;Use infrared imaging Internal baffle is imaged in system, obtains the second Internal baffle infrared picture data;It is red with the second Internal baffle of rectification building-out factor pair Outer image data compensates;The heterogeneity of infrared imaging system is calculated with compensated second Internal baffle infrared picture data Correction parameter;Imageable target is imaged with infrared imaging system, obtains imageable target infrared image;Use Nonuniformity Correction Parameter carries out Nonuniformity Correction to imageable target infrared image.
In some embodiments of the present invention, carried out with Internal baffle of the infrared imaging system to outer baffle and infrared imaging system Imaging obtains outer baffle infrared picture data and the first Internal baffle infrared picture data includes: to use under multiple set temperatures respectively The Internal baffle of outer baffle and infrared imaging system is imaged in infrared imaging system, to obtain outer under multiple set temperatures Baffle infrared picture data and the first Internal baffle infrared picture data.
In some embodiments of the present invention, according to outer baffle infrared picture data and the first Internal baffle infrared picture data meter The rectification building-out factor calculated between Internal baffle and outer baffle includes: respectively according to the outer baffle infrared image under multiple set temperatures Data and the first Internal baffle infrared picture data calculate the rectification building-out factor between Internal baffle and outer baffle, to obtain multiple The rectification building-out factor under set temperature.
It in some embodiments of the present invention, calculates after obtaining the rectification building-out factor further include: deposit correction compensation factor Storage is in infrared imaging system.
In some embodiments of the present invention, according to outer baffle infrared picture data and the first Internal baffle infrared picture data meter The rectification building-out factor calculated between Internal baffle and outer baffle includes: infrared according to outer baffle infrared picture data and the first Internal baffle Image data, the functional relation being fitted between outer baffle infrared picture data and the first Internal baffle infrared picture data, function close System is the rectification building-out factor.
In some embodiments of the present invention, according to outer baffle infrared picture data and the first Internal baffle infrared picture data meter The rectification building-out factor calculated between Internal baffle and outer baffle includes: infrared according to outer baffle infrared picture data and the first Internal baffle Image data, calculates the difference between outer baffle infrared picture data and the first Internal baffle infrared picture data, and difference is correction Compensation factor.
In some embodiments of the present invention, outer baffle is made of material identical with Internal baffle.
In the method for the embodiment of the present invention, by acquisition interior panelling data and external baffle data, pass through interior outer baffle Data calculate the rectification building-out factor, then mend during calculating Nonuniformity Correction parameter to Internal baffle data It repays, is close to external baffle data.In this way, compensating for Internal baffle during the Nonuniformity Correction of infrared imaging system Temperature change improves the quality of infrared image so that Nonuniformity Correction process is more acurrate, reduces and covers yarn sense.
Detailed description of the invention
Fig. 1 is the flow diagram of the asymmetric correction method of the infrared imaging system of one embodiment of the invention.
Specific embodiment
Below in conjunction with the asymmetric correction method of the infrared imaging system of the attached drawing embodiment that the present invention will be described in detail Specific steps.
Fig. 1 is the flow diagram of the asymmetric correction method of the infrared imaging system of some embodiments of the invention.
When needing to carry out Nonuniformity Correction to infrared imaging system, it is contemplated that interior gear used in Nonuniformity Correction Plate will receive the influence of the temperature of the machine core of infrared imaging system and generate temperature change, so that the temperature of Internal baffle and outside temperature It spends not consistent, therefore in some embodiments of the present invention, Internal baffle and external difference can be detected first, then rear During continuous Nonuniformity Correction, which is compensated.
Therefore, in step 10, an outer baffle can be set outside infrared imaging system.The outer baffle is located at infrared The outside of imaging system, temperature not will receive the influence of infrared imaging system internal element, but consistent with external temperature.It should Outer baffle for example can be set near the camera lens of infrared imaging system, block the camera lens of infrared imaging system.The outer baffle Material can be identical as Internal baffle.
In step 12, the Internal baffle in outer baffle and infrared imaging system can be carried out into the infrared imaging system Picture, to obtain the infrared picture data of outer baffle infrared picture data and Internal baffle, (referred to herein as the first Internal baffle is red Outer image data).It can be in the art using the specific steps that outer baffle and Internal baffle is imaged in infrared imaging system Common step, this will not be detailed here.
It then, at step 14, can be according to the outer baffle infrared picture data and the first Internal baffle infrared image of acquisition Data calculate the rectification building-out factor between Internal baffle and outer baffle.
For example, in some embodiments, can according to outer baffle infrared picture data and the first Internal baffle infrared picture data, Fit the functional relation between the outer baffle infrared picture data and the first Internal baffle infrared picture data, the functional relation For the rectification building-out factor above-mentioned.Although it does not limit to as it can be seen that having used rectification building-out " factor " to describe herein In some or certain numerical value, but it can also refer to certain functional relation.
In other embodiments, can also according to outer baffle infrared picture data and the first Internal baffle infrared picture data, The difference between the outer baffle infrared picture data and the first Internal baffle infrared picture data is calculated, using the difference as aforementioned The rectification building-out factor.
In other examples, the rectification building-out factor also can be used other suitable modes and calculate, as long as it can Compensate the difference between Internal baffle and outer baffle.
It, in step 12, can be respectively under multiple set temperatures with infrared imaging system in some embodiments of the present invention The Internal baffle of outer baffle and infrared imaging system is imaged in system, to obtain the infrared figure of outer baffle under multiple set temperatures As data and the first Internal baffle infrared picture data.It correspondingly, at step 14, can be respectively according under multiple set temperature Outer baffle infrared picture data and the first Internal baffle infrared picture data calculate the rectification building-out between Internal baffle and outer baffle The factor, to obtain the rectification building-out factor under multiple set temperature respectively.
Aforementioned the step of calculating the rectification building-out factor can be to carry out in advance, after the rectification building-out factor calculates, can To store it in infrared imaging system.It is subsequent in the course of work of infrared imaging system, when needing to carry out heterogeneity Timing can read the corresponding rectification building-out factor from infrared imaging system, and non-using rectification building-out factor participation Homogeneity correction process.In other examples, the step of aforementioned calculating rectification building-out factor is also possible to real-time perfoming.
After obtaining the rectification building-out factor above-mentioned, it can formally enter Nonuniformity Correction process.At this point, example Such as, in step 16, infrared imaging can be carried out to Internal baffle with the infrared imaging system, obtains the infrared image number of Internal baffle According to (referred to herein as the second Internal baffle infrared picture data).Then, in step 18, can with rectification building-out above-mentioned because Son compensates the second Internal baffle infrared picture data.
For example, in some embodiments, when the rectification building-out factor is to keep off in outer baffle infrared picture data above-mentioned and first When functional relation between plate infrared picture data, the compensated infrared figure of second Internal baffle can be calculated according to the functional relation As data.For example, the second Internal baffle infrared picture data can be replaced to the first Internal baffle infrared image in the functional relation Data substitute into the functional relation, calculate number of results corresponding with the outer baffle infrared picture data in the functional relation According to the calculated result data is compensated second Internal baffle infrared picture data.
In other embodiments, when the rectification building-out factor is outer baffle infrared picture data and the first Internal baffle infrared image It when difference between data, such as can be subtracted in the second Internal baffle infrared picture data or plus the difference, to obtain Obtain compensated second Internal baffle infrared picture data.
Then, in step 20, the infrared imaging system can be calculated with compensated second Internal baffle infrared picture data The Nonuniformity Correction parameter of system.In the embodiment of the present invention, Nonuniformity Correction parameter is calculated according to infrared picture data Specific method and step can be common method and steps in the art, and this will not be detailed here.
After having calculated Nonuniformity Correction parameter, infrared imaging system can carry out formal conventional infrared imaging, And Nonuniformity Correction is carried out using infrared image of the calculated Nonuniformity Correction parameter to acquisition.
For example, in step 22, the infrared imaging system can be used, imageable target is imaged, imageable target is obtained Then infrared image carries out the imageable target infrared image with Nonuniformity Correction parameter calculated in abovementioned steps non-equal Even property correction.
In the method for the embodiment of the present invention, by acquisition interior panelling data and external baffle data, pass through interior outer baffle Data calculate the rectification building-out factor, then mend during calculating Nonuniformity Correction parameter to Internal baffle data It repays, is close to external baffle data.In this way, compensating for Internal baffle during the Nonuniformity Correction of infrared imaging system Temperature change improves the quality of infrared image so that Nonuniformity Correction process is more acurrate, reduces and covers yarn sense.
Above by specific embodiment, the present invention is described, but the present invention is not limited to these specific implementations Example.It will be understood by those skilled in the art that various modifications, equivalent replacement, variation etc. can also be done to the present invention, these transformation It, all should be within protection scope of the present invention without departing from spirit of the invention.In addition, " a reality described in the above many places Apply example " indicate different embodiments, naturally it is also possible to it is completely or partially combined in one embodiment.

Claims (7)

1. a kind of asymmetric correction method of infrared imaging system characterized by comprising
Outer baffle is set outside the infrared imaging system;
It is imaged with Internal baffle of the infrared imaging system to the outer baffle and infrared imaging system, it is red to obtain outer baffle Outer image data and the first Internal baffle infrared picture data;
It is calculated between Internal baffle and outer baffle according to the outer baffle infrared picture data and the first Internal baffle infrared picture data The rectification building-out factor;
The Internal baffle is imaged using the infrared imaging system, obtains the second Internal baffle infrared picture data;
The second Internal baffle infrared picture data described in the rectification building-out factor pair compensates;
The Nonuniformity Correction parameter of the infrared imaging system is calculated with compensated second Internal baffle infrared picture data;
Imageable target is imaged with the infrared imaging system, obtains imageable target infrared image;
Nonuniformity Correction is carried out to the imageable target infrared image with the Nonuniformity Correction parameter.
2. the method as described in claim 1, which is characterized in that with the infrared imaging system to the outer baffle and it is infrared at As the Internal baffle of system carries out imaging to obtain outer baffle infrared picture data and the first Internal baffle infrared picture data including: difference It is imaged under multiple set temperatures with Internal baffle of the infrared imaging system to the outer baffle and infrared imaging system, To obtain the outer baffle infrared picture data and the first Internal baffle infrared picture data under multiple set temperatures.
3. method according to claim 2, which is characterized in that according to the outer baffle infrared picture data and the first Internal baffle The rectification building-out factor that infrared picture data calculates between Internal baffle and outer baffle includes: respectively according under multiple set temperatures Outer baffle infrared picture data and the first Internal baffle infrared picture data calculate the rectification building-out between Internal baffle and outer baffle because Son, to obtain the rectification building-out factor under the multiple set temperature.
4. the method as described in any one of claims 1 to 3, which is characterized in that calculate and obtain the rectification building-out factor Later further include: the rectification building-out factor is stored in the infrared imaging system.
5. the method as described in any one of claims 1 to 3, which is characterized in that according to the outer baffle infrared image number It include: according to described outer according to the rectification building-out factor between the first Internal baffle infrared picture data calculating Internal baffle and outer baffle Baffle infrared picture data and the first Internal baffle infrared picture data are fitted the outer baffle infrared picture data and described Functional relation between first Internal baffle infrared picture data, the functional relation are the rectification building-out factor.
6. the method as described in any one of claims 1 to 3, which is characterized in that according to the outer baffle infrared image number It include: according to described outer according to the rectification building-out factor between the first Internal baffle infrared picture data calculating Internal baffle and outer baffle Baffle infrared picture data and the first Internal baffle infrared picture data, calculate the outer baffle infrared picture data with it is described Difference between first Internal baffle infrared picture data, the difference are the rectification building-out factor.
7. the method as described in any one of claims 1 to 3, it is characterised in that: the outer baffle by with the Internal baffle Identical material is made.
CN201610839361.4A 2016-09-22 2016-09-22 A kind of asymmetric correction method of infrared imaging system Expired - Fee Related CN106500846B (en)

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CN107341780B (en) * 2017-07-12 2020-07-14 成都中昊英孚科技有限公司 Infrared image preprocessing correction method
CN108007576B (en) * 2017-11-24 2020-03-27 烟台艾睿光电科技有限公司 Lens calibration method and device for thermal infrared imager
CN108322732B (en) * 2017-12-01 2020-02-14 中国航空工业集团公司洛阳电光设备研究所 Thermal infrared imager non-uniform correction baffle testing method for temperature-variable radiation material
CN107942510B (en) * 2017-12-21 2020-02-14 中国航空工业集团公司洛阳电光设备研究所 Defocusing-based infrared imaging system non-uniform correction analysis method
CN109063533A (en) * 2018-04-30 2018-12-21 李泽中 A kind of dynamic face Fast Recognition Algorithm
CN108846805B (en) * 2018-05-02 2021-12-17 重庆邮电大学 Infrared thermal image two-point non-uniform correction method based on scene self-adaption
CN113436088B (en) * 2021-06-09 2022-07-26 浙江兆晟科技股份有限公司 Real-time suppression method and system for thermal window effect of infrared image
CN116623263B (en) * 2023-07-24 2023-10-31 深圳市顺益丰实业有限公司 Adjusting device for film coating uniformity of semiconductor device

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