CN106497433A - A kind of sapphire lapping liquid - Google Patents
A kind of sapphire lapping liquid Download PDFInfo
- Publication number
- CN106497433A CN106497433A CN201610791079.3A CN201610791079A CN106497433A CN 106497433 A CN106497433 A CN 106497433A CN 201610791079 A CN201610791079 A CN 201610791079A CN 106497433 A CN106497433 A CN 106497433A
- Authority
- CN
- China
- Prior art keywords
- parts
- lapping liquid
- sapphire
- diadust
- kerosene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 21
- 229910052594 sapphire Inorganic materials 0.000 title claims abstract description 21
- 239000010980 sapphire Substances 0.000 title claims abstract description 21
- 239000003350 kerosene Substances 0.000 claims abstract description 11
- 239000013556 antirust agent Substances 0.000 claims abstract description 9
- 239000007866 anti-wear additive Substances 0.000 claims abstract description 8
- 150000002170 ethers Chemical class 0.000 claims abstract description 7
- 239000003921 oil Substances 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims abstract description 5
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 claims description 16
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- 235000010265 sodium sulphite Nutrition 0.000 claims description 8
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 6
- 239000001509 sodium citrate Substances 0.000 claims description 6
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 claims description 6
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 2
- OQUFOZNPBIIJTN-UHFFFAOYSA-N 2-hydroxypropane-1,2,3-tricarboxylic acid;sodium Chemical compound [Na].OC(=O)CC(O)(C(O)=O)CC(O)=O OQUFOZNPBIIJTN-UHFFFAOYSA-N 0.000 claims 1
- 238000005660 chlorination reaction Methods 0.000 claims 1
- 239000004575 stone Substances 0.000 claims 1
- 238000000227 grinding Methods 0.000 abstract description 11
- -1 diadust Substances 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 3
- 239000013078 crystal Substances 0.000 abstract description 2
- 238000003801 milling Methods 0.000 abstract description 2
- 238000004062 sedimentation Methods 0.000 abstract description 2
- 239000006061 abrasive grain Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000012188 paraffin wax Substances 0.000 description 3
- 102000004160 Phosphoric Monoester Hydrolases Human genes 0.000 description 2
- 108090000608 Phosphoric Monoester Hydrolases Proteins 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- LDVVTQMJQSCDMK-UHFFFAOYSA-N 1,3-dihydroxypropan-2-yl formate Chemical compound OCC(CO)OC=O LDVVTQMJQSCDMK-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- OYHQOLUKZRVURQ-HZJYTTRNSA-N Linoleic acid Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(O)=O OYHQOLUKZRVURQ-HZJYTTRNSA-N 0.000 description 1
- 230000004523 agglutinating effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- OYHQOLUKZRVURQ-IXWMQOLASA-N linoleic acid Natural products CCCCC\C=C/C\C=C\CCCCCCCC(O)=O OYHQOLUKZRVURQ-IXWMQOLASA-N 0.000 description 1
- 235000020778 linoleic acid Nutrition 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000223 polyglycerol Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention belongs to the field of milling of sapphire single-crystal, more particularly to a kind of sapphire lapping liquid, including diadust, kerosene, ether Esters oil, antiwear additive, antirust agent, the parts by weight of each composition are：110 200 parts of diadust, 400 600 parts of kerosene, 500 800 parts of ether Esters oil, 15 24 parts of antiwear additive, 58 parts of antirust agent.Compared with prior art, the present invention has the advantages that：The temperature that can be effectively reduced in process, and then reduce the possibility of " grinding is motionless "；Greasy property is good, and sedimentation rate is low.
Description
Technical field
The invention belongs to the field of milling of sapphire single-crystal, more particularly to a kind of sapphire lapping liquid.
Background technology
Synthetic sapphire lens have translucency good, and hardness is high, and wear-resistant, linear expansion coefficient is little, and compression strength is high and resistance to
The features such as acid and alkali corrosion, application is widely.But, as synthetic sapphire has hardness height (9 grades of Mohs), fragility big, brilliant
The characteristics such as body anisotropy, its difficulty of processing are also quite big, and particularly high accuracy, best bright finish require the curvature of sapphire lens
The processing of radius surface.
Grinding, is the most frequently used semiconductor wafer processing method, and used in which, the component ratio of lapping liquid is directly affected and ground
The result of mill, therefore, lapping liquid is improved can Optimizing Technical significantly, improve yield rate.The allotment of lapping liquid is
The key factor of grinding effect is improved, grinding technics is directly affected and is removed machined material speed, the surface of machined material
Flatness, roughness and stress damage.The allotment difficulty of lapping liquid is big, and complicated factor is a lot, such as grinding abrasive grain
It is difficult in a solvent be uniformly dispersed, grain graininess size is unequal, lapping liquid long-time is reunited using there is abrasive grain
Phenomenon, as abrasive grain and agglutinating for material residues of cutting cause secondary damage, and the pH value imbalance of lapping liquid etc..
Sapphire lens radius of curvature Surface Finishing is mainly using diadust resinoid bonded grinding tool or normal at present
Using JR2The resin abrasive tools (or trickleer powder) of W7.In process, workpiece is constantly increased with the contact area of grinding tool, by
Have hardness height (9 grades of Mohs), fragility big in sapphire, the characteristic such as crystalline anisotropy, it may appear that " grinding is motionless " phenomenon, special
It is not that " grinding is motionless " phenomenon becomes apparent from the finishing of major diameter sapphire lens.Lapping liquid grinding efficiency is larger, grinds
As sapphire wafer is constantly rubbed at the volley with solid particle in lapping liquid during mill, thus can produce a large amount of
Heat, if being disperseed not in time to take away, its surface can be made after the heat build-up of generation to produce small deformation, and then affect to grind
Mill quality.
Content of the invention
A kind of sapphire lapping liquid, including diadust, kerosene, ether Esters oil, antiwear additive, antirust agent, respectively
The parts by weight of composition are：Diadust 110-200 parts, kerosene 400-600 parts, ether Esters oil 500-800 parts, wear-resistant add
Plus agent 15-24 parts, antirust agent 5-8 parts.
Preferably, the antiwear additive is chlorinated paraffin, olefine sulfide, sulfurized lard.
Preferably, mixture of the antirust agent for phosphoric acid, sodium citrate and sodium sulfite, mixed proportion is phosphoric acid：Lemon
Lemon acid sodium：Sodium sulfite=20：2.5：1-10：3：1.
During use, above-mentioned diadust is uniform, be dispersed stably in lapping liquid, forms suspension.Kerosene and ether-ether
As long as class its dispersant of oil and effect of lubricant, ether Esters oil, antiwear additive and antirust agent interact and also act as
The effect for cooling.
Compared with prior art, the present invention has the advantages that：
(1) temperature that can be effectively reduced in process, and then reduce the possibility of " grinding is motionless "；
(2) greasy property is good, and sedimentation rate is low.
Specific embodiment
Embodiment one
A kind of sapphire lapping liquid, including diadust 110g, kerosene 400g, monoglyceride 500g, chlorinated paraffin
15g, phosphatase 24 g, sodium citrate 0.5g and sodium sulfite 0.2g.
Embodiment two
A kind of sapphire lapping liquid, including diadust 110g, kerosene 400g, tristerin 550g, sulfuration alkene
Hydrocarbon 18g, phosphatase 24 .8g, sodium citrate 0.6g and sodium sulfite 0.24g.
Embodiment three
A kind of sapphire lapping liquid, including diadust 120g, kerosene 450g, linoleic acid 600g, chlorinated paraffin 15g,
Phosphoric acid 6g, sodium citrate 0.75g and sodium sulfite 0.3g.
Example IV
A kind of sapphire lapping liquid, including diadust 150g, kerosene 500g, polyglycerol ester 700g, sulfurized lard
24g, phosphoric acid 5.7g, sodium citrate 1.7g and sodium sulfite 0.6g.
Following table is the removal rate and surface roughness of each embodiment.
| Removal rate (um/min) | Roughness Ra (nm) | |
| Embodiment one | 2.1 | 12.890 |
| Embodiment two | 2.4 | 12.035 |
| Embodiment three | 2.3 | 13.234 |
| Example IV | 2.3 | 12.780 |
Claims (3)
1. a kind of sapphire lapping liquid, it is characterised in that：Including diadust, kerosene, ether Esters oil, antiwear additive,
Antirust agent, the parts by weight of each composition are：Diadust 110-200 parts, kerosene 400-600 parts, ether Esters oil 500-800
Part, antiwear additive 15-24 parts, antirust agent 5-8 parts.
2. a kind of sapphire lapping liquid according to claim 1, it is characterised in that：The antiwear additive is chlorination stone
Wax, olefine sulfide, sulfurized lard.
3. a kind of sapphire lapping liquid according to claim 1, it is characterised in that：The antirust agent is phosphoric acid, citric acid
Sodium and the mixture of sodium sulfite, mixed proportion is phosphoric acid：Sodium citrate：Sodium sulfite=20：2.5：1-10：3：1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610791079.3A CN106497433A (en) | 2016-08-30 | 2016-08-30 | A kind of sapphire lapping liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610791079.3A CN106497433A (en) | 2016-08-30 | 2016-08-30 | A kind of sapphire lapping liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106497433A true CN106497433A (en) | 2017-03-15 |
Family
ID=58291318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610791079.3A Pending CN106497433A (en) | 2016-08-30 | 2016-08-30 | A kind of sapphire lapping liquid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106497433A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107699140A (en) * | 2017-11-06 | 2018-02-16 | 北京国瑞升科技股份有限公司 | A kind of oiliness lapping liquid and preparation method thereof |
| CN110752143A (en) * | 2019-09-03 | 2020-02-04 | 福建晶安光电有限公司 | Process for improving flatness of sapphire substrate |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101993661A (en) * | 2009-08-10 | 2011-03-30 | 重庆川仪自动化股份有限公司 | Grinding liquid for processing surface curvature radiuses of sapphires and preparation method |
| CN104164192A (en) * | 2014-07-31 | 2014-11-26 | 青岛华承天机械制造有限公司 | Low-pollution mechanical polishing solution |
| CN105368324A (en) * | 2015-12-07 | 2016-03-02 | 苏州博洋化学股份有限公司 | Oily diamond grinding lubricant |
| CN105505316A (en) * | 2015-12-23 | 2016-04-20 | 北京国瑞升科技股份有限公司 | Grinding auxiliary and grinding liquid for coarse grinding of sapphire and preparation methods of grinding auxiliary and grinding liquid |
| CN105733446A (en) * | 2016-04-07 | 2016-07-06 | 天津大学 | Oil-based silicon carbide precision grinding and polishing liquid |
-
2016
- 2016-08-30 CN CN201610791079.3A patent/CN106497433A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101993661A (en) * | 2009-08-10 | 2011-03-30 | 重庆川仪自动化股份有限公司 | Grinding liquid for processing surface curvature radiuses of sapphires and preparation method |
| CN104164192A (en) * | 2014-07-31 | 2014-11-26 | 青岛华承天机械制造有限公司 | Low-pollution mechanical polishing solution |
| CN105368324A (en) * | 2015-12-07 | 2016-03-02 | 苏州博洋化学股份有限公司 | Oily diamond grinding lubricant |
| CN105505316A (en) * | 2015-12-23 | 2016-04-20 | 北京国瑞升科技股份有限公司 | Grinding auxiliary and grinding liquid for coarse grinding of sapphire and preparation methods of grinding auxiliary and grinding liquid |
| CN105733446A (en) * | 2016-04-07 | 2016-07-06 | 天津大学 | Oil-based silicon carbide precision grinding and polishing liquid |
Non-Patent Citations (1)
| Title |
|---|
| 冯亚青 等: "《助剂化学及工艺学》", 30 June 1997, 北京：化学工业出版社 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107699140A (en) * | 2017-11-06 | 2018-02-16 | 北京国瑞升科技股份有限公司 | A kind of oiliness lapping liquid and preparation method thereof |
| CN107699140B (en) * | 2017-11-06 | 2020-04-10 | 北京国瑞升科技股份有限公司 | Oily grinding fluid and preparation method thereof |
| CN110752143A (en) * | 2019-09-03 | 2020-02-04 | 福建晶安光电有限公司 | Process for improving flatness of sapphire substrate |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170315 |
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| RJ01 | Rejection of invention patent application after publication |