CN106480458A - A kind of aluminum alloy chemically polishing fluid and preparation method thereof and glossing - Google Patents
A kind of aluminum alloy chemically polishing fluid and preparation method thereof and glossing Download PDFInfo
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- CN106480458A CN106480458A CN201610866710.1A CN201610866710A CN106480458A CN 106480458 A CN106480458 A CN 106480458A CN 201610866710 A CN201610866710 A CN 201610866710A CN 106480458 A CN106480458 A CN 106480458A
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- polishing fluid
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- polishing
- aluminum alloy
- phosphoric acid
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- 238000005498 polishing Methods 0.000 title claims abstract description 61
- 239000012530 fluid Substances 0.000 title claims abstract description 40
- 229910000838 Al alloy Inorganic materials 0.000 title claims abstract description 31
- 238000002360 preparation method Methods 0.000 title claims abstract description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 42
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 21
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000005260 corrosion Methods 0.000 claims abstract description 9
- 230000007797 corrosion Effects 0.000 claims abstract description 8
- 239000003112 inhibitor Substances 0.000 claims abstract description 7
- 229910003002 lithium salt Inorganic materials 0.000 claims abstract description 7
- 159000000002 lithium salts Chemical class 0.000 claims abstract description 7
- 239000002994 raw material Substances 0.000 claims abstract description 3
- 238000003756 stirring Methods 0.000 claims description 14
- 238000005238 degreasing Methods 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 claims description 8
- 238000005488 sandblasting Methods 0.000 claims description 6
- 239000004411 aluminium Substances 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- QGHDLJAZIIFENW-UHFFFAOYSA-N 4-[1,1,1,3,3,3-hexafluoro-2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical group C1=C(CC=C)C(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C(CC=C)=C1 QGHDLJAZIIFENW-UHFFFAOYSA-N 0.000 claims description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 4
- 229910019142 PO4 Inorganic materials 0.000 claims description 4
- 150000001412 amines Chemical class 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 229910052744 lithium Inorganic materials 0.000 claims description 4
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 4
- 239000010452 phosphate Substances 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 claims description 3
- 229910052808 lithium carbonate Inorganic materials 0.000 claims description 3
- MCPLVIGCWWTHFH-UHFFFAOYSA-L methyl blue Chemical compound [Na+].[Na+].C1=CC(S(=O)(=O)[O-])=CC=C1NC1=CC=C(C(=C2C=CC(C=C2)=[NH+]C=2C=CC(=CC=2)S([O-])(=O)=O)C=2C=CC(NC=3C=CC(=CC=3)S([O-])(=O)=O)=CC=2)C=C1 MCPLVIGCWWTHFH-UHFFFAOYSA-L 0.000 claims description 3
- 229950003937 tolonium Drugs 0.000 claims description 3
- HNONEKILPDHFOL-UHFFFAOYSA-M tolonium chloride Chemical compound [Cl-].C1=C(C)C(N)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 HNONEKILPDHFOL-UHFFFAOYSA-M 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 3
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 claims description 2
- SYELZBGXAIXKHU-UHFFFAOYSA-N dodecyldimethylamine N-oxide Chemical compound CCCCCCCCCCCC[N+](C)(C)[O-] SYELZBGXAIXKHU-UHFFFAOYSA-N 0.000 claims description 2
- 239000012467 final product Substances 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims description 2
- 229960000907 methylthioninium chloride Drugs 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract description 9
- 229910017604 nitric acid Inorganic materials 0.000 abstract description 9
- 239000004033 plastic Substances 0.000 abstract description 5
- 229920003023 plastic Polymers 0.000 abstract description 5
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000003292 glue Substances 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 4
- NSOXQYCFHDMMGV-UHFFFAOYSA-N Tetrakis(2-hydroxypropyl)ethylenediamine Chemical group CC(O)CN(CC(C)O)CCN(CC(C)O)CC(C)O NSOXQYCFHDMMGV-UHFFFAOYSA-N 0.000 description 3
- -1 aluminium Nitrogen dioxide Chemical compound 0.000 description 3
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- JNRLEMMIVRBKJE-UHFFFAOYSA-N 4,4'-Methylenebis(N,N-dimethylaniline) Chemical compound C1=CC(N(C)C)=CC=C1CC1=CC=C(N(C)C)C=C1 JNRLEMMIVRBKJE-UHFFFAOYSA-N 0.000 description 1
- 206010023126 Jaundice Diseases 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 210000002345 respiratory system Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/02—Light metals
- C23F3/03—Light metals with acidic solutions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The invention discloses a kind of aluminum alloy chemically polishing fluid, which includes the raw material of following mass percent:Phosphoric acid 50~80%, sulfuric acid 18~48%, lithium salts 0.1~0.2%, current mark inhibitor 0.3~0.5%, corrosion inhibiter 0.1 0.2%, water:Surplus;It is an object of the invention to provide a kind of polishing fluid without nitric acid, aluminium alloy and plastic-aluminum combined part for 3C electronic product, even if will not also produce polishing gas trace when the aluminium ion concentration in polishing fluid reaches 40g/L, while can also eliminate in two sour polishing fluids using the problem for forming current mark due to workpiece transfer on transfer matic, to plastic-aluminum combined part, plastic-aluminum glue interface can be prevented uneven, plastics turn to be yellow.Meanwhile, the present invention also provides the preparation method of above-mentioned polishing fluid and glossing.
Description
Technical field
The present invention relates to polishing fluid category, more particularly to a kind of aluminum alloy chemically polishing fluid and preparation method thereof and buffer
Skill.
Background technology
Due to workability energy and its surface high-corrosion resistance after treatment of aluminium and aluminium alloy, more and more
Al-alloy products be used in civilian and industrial goods.In order to improve the decoration performance of Al-alloy products, need to its surface
Carry out various process, wherein chemical polishing is a kind of to give aluminum alloy surface noble beautiful handling process.
The sour chemical polishing solution of traditional three is made up of 70% phosphoric acid, 20% sulfuric acid, 10% nitric acid.In this polishing fluid
Nitric acid acts as a kind of effect of corrosion inhibiter, nitric acid have oxidisability using when reacted and be reduced into brown color with aluminium
Nitrogen dioxide gas, nitrogen dioxide can be caused serious injury to the respiratory system of operating personnel, while nitrogen dioxide is also rotten
Plant equipment in erosion factory.Typically carry out at 100 DEG C or so additionally, due to three acid polishing operation, nitric acid is volatile and divides
Solution, the depletion rate of usual nitric acid are too fast, frequently its content need to be analyzed and add, cause between Al alloy parts batch
Gloss fluctuation larger, be also unfavorable for transfer matic continuity operate.
With the reinforcement of environmental consciousness and regulation, increasing factory selects two acid polishing process at present.But two acid
There is problems with 3C Product production process:1., when in polishing fluid, aluminium ion concentration is more than 16g/L, polish with through hole
Or blind hole sandblasting workpiece when can produce polishing gas trace, polishing gas trace especially when sandblasting workpiece is for the aluminium alloy of Al5252 material
Become apparent from.2. when pair polishing through the plastic-aluminum combined part that T is processed, plastic-aluminum intersection easily occurs uneven, and working of plastics easily turns to be yellow.3.
Al alloy parts in automatic polishing line upthrow light during workpiece transfer the time required to generally more than 18 seconds, aluminium section bar
The time spent in throwing production line is shifted is longer generally more than 30 seconds, as the drop of polishing fluid plows meeting on surface in transfer process
Irregular current mark is formed, affects appearance.
Content of the invention
For above-mentioned deficiency, it is an object of the invention to provide a kind of polishing fluid without nitric acid, produces for 3C electron-like
The aluminium alloy of product and plastic-aluminum combined part, even if also polishing gas trace will not be produced when the aluminium ion concentration in polishing fluid reaches 40g/L,
While can also eliminate in two sour polishing fluids using the problem for forming current mark due to workpiece transfer on transfer matic, to plastic-aluminum combined
Part, can prevent plastic-aluminum glue interface uneven, and plastics turn to be yellow.Meanwhile, the present invention also provides the preparation method of above-mentioned polishing fluid and throwing
Light technique.
In order to solve above-mentioned technical problem, the present invention provides technical scheme below:A kind of aluminum alloy chemically polishing fluid, its bag
Raw material containing following mass percent:Phosphoric acid 50~80%, sulfuric acid 18~48%, lithium salts 0.1~0.2%, current mark inhibitor
0.3~0.5%, corrosion inhibiter 0.1-0.2%, water:Surplus.
In above-mentioned aluminum alloy chemically polishing fluid, described lithium salts can be lithium acetate, and lithium carbonate, in lithium hexafluoro phosphate
One kind.
In above-mentioned aluminum alloy chemically polishing fluid, described current mark inhibitor is tetrahydroxypropyl ethylenediamine, lauryl two
Methyl oxidation amine, alkyldimethylbenzylammonium amine, the mixture of one or more in piperazine.
In above-mentioned aluminum alloy chemically polishing fluid, described corrosion inhibiter is acid red, crystal violet, methylene blue, methylene
Base is green, toluidine blue, the mixture of one or more in methyl blue.
The present invention also provides the preparation method of aluminum alloy chemically polishing fluid as above, and lithium salts, corrosion inhibiter are added to
In water, component A is obtained;
The phosphoric acid of current mark inhibitor, the 1/8-1/5 for accounting for phosphoric acid total amount is mixed and heated to 50-60 DEG C, stirring a period of time
After obtain component B;
The phosphoric acid of sulfuric acid and surplus is mixed to get component C;
After component A, B, C temperature are less than 40 DEG C, component A, B are added to mixing in component C and are obtained final product.
In addition, the present invention also provides the glossing of a kind of aluminium and aluminium alloy, comprise the steps:(1), Al alloy parts
Or the Al alloy parts through mechanical sandblasting, degreasing degreasing is carried out, sufficient water is carried out to metal works after degreasing degreasing
Wash;(2), metal works carry out chemical polishing in the polishing fluid as described in Claims 1-4 is arbitrary, are washed after polishing;
(3), metal works are immersed except to remove insoluble metal oxide in stain dedusting agent, so as to obtain the metal watch of cleaning light
Face, after fully washing, drying can obtain the surface of uniform light in an oven.
Compared with prior art, the technical scheme that the present invention is provided has the advantage that:
1., during conventional two sour polishing fluid uses, after Al alloy parts polishing, transfer time can produce polishing more than 18 seconds
Current mark, the polishing fluid of the present invention, after workpiece polishing, transfer time will not produce current mark before 50 seconds.2.. general two acid polishing
Can produce polishing gas trace when the liquid polishing band logical hole workpiece of sandblasting or complex-shaped workpieces, the polishing fluid of the present invention, even if aluminium from
Sub- concentration reaches 40g/L and does not also result in gas trace.3. the plastic-aluminum combined part that pair nanometer is molded, general polishing fluid can be in plastic-aluminum Jiao Jie
Place's generation is grown dim uneven, and plastics jaundice easy to change, the polishing fluid of the present invention process after intersection and other position outward appearances equal
Even consistent, plastics nondiscolouring.
Specific embodiment
With reference to specific embodiment, the claim to the present invention is described in further detail, but do not constitute right
Any restriction of the present invention, the modification of any limited number of time for being made within the scope of the invention as claimed, still in the power of the present invention
Profit is claimed in scope.
Embodiment 1:Prepare 100 grams of polishing fluids
0.1 gram of lithium acetate is added in 1.3 grams of pure water and is dissolved, and is added acid purplish red 0.2 gram of stirring and dissolving and is obtained component
A;0.3 gram of tetrahydroxypropyl ethylenediamine is added in 10 grams of phosphoric acid, is heated to 50-60 degree, stirs 15-20 minute, and component B is obtained;Will
18 grams of sulfuric acid mix to obtain component C with 70 grams of phosphoric acid;Under the temperature of 3 solution is less than 40 degree of situations below, component A, B is added
Enter in component C, stir.
Embodiment 2:Prepare 100 grams of polishing fluids
0.1 gram of lithium acetate is added in 1.5 grams of pure water and is dissolved, and is added 0.1 gram of stirring and dissolving of crystal violet and is obtained component A;
0.5 gram of lauryl dimethyl amine oxide is added in 10 grams of phosphoric acid, is heated to 50-60 degree, stirs 15-20 minute, and component B is obtained;
48 grams of sulfuric acid are mixed to obtain component C with 40 grams of phosphoric acid;Under the temperature of 3 solution is less than 40 degree of situations below, by component A, B
It is added in component C, stirs.
Embodiment 3:Prepare 100 grams of polishing fluids
0.2 gram of lithium hexafluoro phosphate is added in 1.3 grams of pure water and is dissolved, and is added the green 0.15 gram of stirring and dissolving of methylene and is obtained
Component A;0.2 gram of tetrahydroxypropyl ethylenediamine, 0.2 gram of piperazine are added in 10 grams of phosphoric acid, are heated to 50-60 degree, and stirring 15-20 divides
Clock, is obtained component B;18 grams of sulfuric acid are mixed to obtain component C with 70 grams of phosphoric acid;Less than 40 degree feelings are less than in the temperature of 3 solution
Under condition, component A, B is added in component C, is stirred.
Embodiment 4:Prepare 100 grams of polishing fluids
0.2 gram of lithium hexafluoro phosphate adds dissolving in 1.3 grams of pure water to obtain component A;0.2 gram of lauryl dimethyl oxidation
Amine, 0.1 gram of alkyl methyl benzyl amine and 0.2 gram of toluidine blue are added in 10 grams of phosphoric acid, are heated to 50-60 degree, and stirring 15-20 divides
Clock, is obtained component B;28 grams of sulfuric acid are mixed to obtain component C with 60 grams of phosphoric acid;Less than 40 degree feelings are less than in the temperature of 3 solution
Under condition, component A, B is added in component C, is stirred.
Embodiment 5:Prepare 100 grams of polishing fluids
0.1 gram of methyl blue, 0.2 gram of piperazine add dissolving in 1.3 grams of pure water to obtain component A;0.15 gram of lithium carbonate stirring
In 10 grams of phosphoric acid of lower addition, 50-60 degree after having reacted, is heated to, 0.2 gram of alkyl trimethyl benzyl amine is added, stirring 15-20 divides
Clock, is obtained component B;18 grams of sulfuric acid are mixed to obtain component C with 70 grams of phosphoric acid;Less than 40 degree feelings are less than in the temperature of 3 solution
Under condition, component A, B is added in component C, is stirred.
Comparative example 1 prepares 100 grams of polishing fluids
80 grams of phosphoric acid, 15 grams of sulfuric acid, 5 grams of nitric acid, stir.
Handling process and result
(1) handling process:Learn from else's experience the Al alloy parts of mechanical sandblasting, metal works are carried out nothing etch degreasing degreasing,
Metal works are sufficiently washed after degreasing degreasing;(2), metal works immerse the chemical polishing solution of embodiment 1- respectively
In, at 80-85 DEG C, the time that metal works are processed in polishing fluid is the 45-90 second to temperature control;Aerial stop 45 seconds after polishing
Washed again;(3), workpiece was immersed except (30% nitric acid or special dedusting agent) 1-3 minute in stain dedusting agent, after fully washing
In baking oven, drying can obtain the surface of uniform light.
The embodiment 1-5 and comparative example 1 such as table 1 below of the result after above-mentioned PROCESS FOR TREATMENT:
Table 1
Above-described be only presently preferred embodiments of the present invention, all made in the range of the spirit and principles in the present invention appoint
What modification, equivalent and improvement etc., should be included within the scope of the present invention.
Claims (6)
1. a kind of aluminum alloy chemically polishing fluid, it is characterised in which includes the raw material of following mass percent:Phosphoric acid 50~
80%, sulfuric acid 18~48%, lithium salts 0.1~0.2%, current mark inhibitor 0.3~0.5%, corrosion inhibiter 0.1-0.2%, water:Remaining
Amount.
2. aluminum alloy chemically polishing fluid according to claim 1, it is characterised in that described lithium salts can be lithium acetate,
Lithium carbonate, the one kind in lithium hexafluoro phosphate.
3. aluminum alloy chemically polishing fluid according to claim 1, it is characterised in that described current mark inhibitor is four hydroxypropyls
Base ethylenediamine, lauryl dimethyl amine oxide, alkyldimethylbenzylammonium amine, the mixture of one or more in piperazine.
4. the aluminum alloy chemically polishing fluid according to claim 1 or 2 or 3, it is characterised in that described corrosion inhibiter is acidity
Red, crystal violet, methylene blue, methylene are green, toluidine blue, the mixture of one or more in methyl blue.
5. a kind of preparation method of the aluminum alloy chemically polishing fluid as described in Claims 1-4 is arbitrary, it is characterised in that by lithium
Salt, corrosion inhibiter are added to the water, and obtain component A;
The phosphoric acid of current mark inhibitor, the 1/8-1/5 for accounting for phosphoric acid total amount is mixed and heated to 50-60 DEG C, after stirring a period of time
To component B;
The phosphoric acid of sulfuric acid and surplus is mixed to get component C;
After component A, B, C temperature are less than 40 DEG C, component A, B are added to mixing in component C and are obtained final product.
6. the glossing of a kind of aluminium and aluminium alloy, it is characterised in that comprise the steps:(1), Al alloy parts or through machine
The Al alloy parts of tool sandblasting, carry out degreasing degreasing, metal works are sufficiently washed after degreasing degreasing;(2), gold
Metal work-pieces carry out chemical polishing in the polishing fluid as described in Claims 1-4 is arbitrary, are washed after polishing;(3), metal
Workpiece is immersed except with the insoluble metal oxide of removal in stain dedusting agent, cleans bright metal surface so as to obtain, fully
After washing, drying can obtain the surface of uniform light in an oven.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107675181A (en) * | 2017-09-19 | 2018-02-09 | 佛山市海化表面处理科技有限公司 | Recyclable recovery two sour polishing fluid of Reusability of a kind of vertical oxidation line and preparation method thereof |
CN108411305A (en) * | 2018-05-23 | 2018-08-17 | 深圳市赛邦新材料有限公司 | A kind of the aluminium alloy polishing additive, aluminium alloy polishing fluid and the polishing process that prevent current mark from generating |
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CN1746253A (en) * | 2004-09-09 | 2006-03-15 | 福吉米株式会社 | Polishing composition and polishing method using the same |
CN102358825A (en) * | 2011-08-05 | 2012-02-22 | 清华大学 | Polishing composition for sapphire wafer |
CN102758205A (en) * | 2012-07-13 | 2012-10-31 | 东莞市东辉贸易有限公司 | Aluminum alloy polishing solution and preparing method thereof |
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2016
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CN1746253A (en) * | 2004-09-09 | 2006-03-15 | 福吉米株式会社 | Polishing composition and polishing method using the same |
CN102358825A (en) * | 2011-08-05 | 2012-02-22 | 清华大学 | Polishing composition for sapphire wafer |
CN102758205A (en) * | 2012-07-13 | 2012-10-31 | 东莞市东辉贸易有限公司 | Aluminum alloy polishing solution and preparing method thereof |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107675181A (en) * | 2017-09-19 | 2018-02-09 | 佛山市海化表面处理科技有限公司 | Recyclable recovery two sour polishing fluid of Reusability of a kind of vertical oxidation line and preparation method thereof |
CN107675181B (en) * | 2017-09-19 | 2020-05-22 | 佛山市海化表面处理科技有限公司 | Vertical oxidation line recyclable and reusable two-acid polishing solution and preparation method thereof |
CN108411305A (en) * | 2018-05-23 | 2018-08-17 | 深圳市赛邦新材料有限公司 | A kind of the aluminium alloy polishing additive, aluminium alloy polishing fluid and the polishing process that prevent current mark from generating |
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