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CN106292197B - A kind of focusing leveling device and method based on image processing techniques - Google Patents

A kind of focusing leveling device and method based on image processing techniques Download PDF

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Publication number
CN106292197B
CN106292197B CN201510270167.4A CN201510270167A CN106292197B CN 106292197 B CN106292197 B CN 106292197B CN 201510270167 A CN201510270167 A CN 201510270167A CN 106292197 B CN106292197 B CN 106292197B
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focusing
glass plate
leveling device
measured workpiece
speculum
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CN106292197A (en
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魏礼俊
陈飞彪
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Abstract

The present invention relates to a kind of focusing leveling device and method based on image processing techniques, the device includes the work stage for mask, projection objective, measured workpiece and the carrying measured workpiece being arranged in order from top to bottom, also include light source, the first speculum, projection slit, projection microscope group, the second speculum, imaging microscope group, the 3rd speculum, the 4th speculum, imaging len, detection slit and the photodetector being arranged in order along paths direction, rotatable glass plate is additionally provided between the projection slit and measured workpiece.The present invention rotates the alternative site to move horizontally the measurement facula position on measured workpiece surface, found and can completely or partly measure tested region height measurements using glass plate, so as to extrapolate tested region height measurements.The present invention can effectively improve the measurement accuracy and Technological adaptability of focusing leveling device, and then improve finished product yield.

Description

A kind of focusing leveling device and method based on image processing techniques
Technical field
The present invention relates to lithographic equipment field, more particularly to a kind of focusing leveling device and side based on image processing techniques Method.
Background technology
Projection mask aligner's (or projection lithography apparatus) is that the pattern on mask is projected into workpiece table by projection objective The device in face.In projection lithography apparatus, it is necessary to there is device for automatically focusing and leveling to guide work stage accurately to move workpiece surface Move the exposure position specified.The physical arrangement of the existing focusing leveling device based on image processing techniques is as shown in figure 1, cover Pattern on mould 10 projects to the surface of measured workpiece 30 of the carrying of work stage 31 by projection objective 20, wherein, light source 40 is sent Light successively by organizing camera lens 61, the second speculum 60 and projection lens before the first speculum 41, projection slit 50, projection microscope group Camera lens 62 is organized after group and exposes to the surface of measured workpiece 30, organized successively after imaged microscope group after the reflection of measured workpiece 30 camera lens 71, Camera lens 72, the 4th speculum 81, imaging len 82 and detection slit 80 are organized before 3rd speculum 70, imaging microscope group, is finally existed It is imaged on photodetector 90.When the optimal focal plane position of the upper surface location and projection objective 20 of adjustment measured workpiece 30 When (in Fig. 1 shown in the upper horizontal dotted line of measured workpiece 30) is overlapped, dotted line institute in the figure of reflection light path such as 1 of measured workpiece 30 Show, projection slit 50 is imaged on photodetector 90;When the upper surface location and projection objective 20 of measured workpiece 30 are most preferably burnt When the height tolerance of plan-position is Δ H, the imaging on photodetector 90 of projection slit 50 changes Δ in the position of Z-direction E is:
The Δ Hsin φ (1-1) of 1 β of Δ e=2 β 2
In formula (1-1), β 1 is imaging microscope group (including camera lens 72 is organized before imaging microscope group and organizes camera lens 71 after being imaged microscope group) Magnifying power, β 2 are the magnifying power of imaging len 82, and Ф is incidence angle of the light beam on measured workpiece 30.
Position of the existing focusing leveling device based on image processing techniques according to hot spot on photodetector 90 becomes Change the defocusing amount for drawing the surface of measured workpiece 30, typically use more facula measurement schemes to increase unit and be tested area, improve and survey Accuracy of measurement and efficiency.For increase Technological adaptability, reduce the surface reflectivity inhomogeneities pair of measured workpiece 30 under large area hot spot The influence of the surface defocus measurement of measured workpiece 30, single hot spot is typically split into multiple sub-light spots and measured, using flat Equal effect further improves measurement accuracy.With some hot spot in more facula measurement schemes and the hot spot is split into 3 below Exemplified by sub-light spot, the existing measurement process based on image processing techniques focusing leveling device is described.
Fig. 2A, 2B, 2C show most of operating mode of measured workpiece 30, i.e. 3 sub- hot spots (p1, p2, p3) be irradiated to by All reflected when surveying 30 surface of workpiece, be imaged on photodetector 90, suppress noise, filtering, digital processing through successive image After draw 3 gray scale crests (q1, q2, q3), according to the width of each gray scale crest and its location of pixels in entire image, And the parameter such as gray scale corrugation pitch can calculate the defocusing amount on the surface of measured workpiece 30 corresponding to whole hot spot.But in quilt Survey under the small part operating mode of workpiece 30, particularly measured workpiece 30 is when be craft piece, measured surface groove is more, relatively deep, such as figure Shown in 2D, 2E, 2F, the reflected light of sub-light spot, which has, to be partially or completely blocked, and imaging is not just on photodetector 90 Completely, then show that gray scale crest is also imperfect after successive image suppresses noise, filtering, digital processing, even without gray scale peak Value.In addition, in the marginal position of measured workpiece 30, the surface imperfection caused by the factors such as processing technology, as Fig. 2 G, 2H, 2I, Shown in 2J, 2K, again such that the reflected beam portion of sub-light spot is even all lost, cause gray scale crest imperfect.Ultimately result in Complete tested region height measurements can not be measured.
The content of the invention
The present invention provides a kind of focusing leveling device and method based on image processing techniques, is asked with solving above-mentioned technology Topic.
In order to solve the above technical problems, the present invention provides a kind of focusing leveling device based on image processing techniques, including The work stage of the mask, projection objective, measured workpiece and the carrying measured workpiece that are arranged in order from top to bottom, in addition to edge Light source that paths direction is arranged in order, the first speculum, projection slit, projection microscope group, the second speculum, imaging microscope group, 3rd speculum, the 4th speculum, imaging len, detection slit and photodetector, the projection slit and measured workpiece Between be additionally provided with optical path-deflecting device, such as rotatable glass plate, or other optics such as prism of optical path-deflecting can be carried out Element.
It is preferred that the glass plate is fixedly connected with the drive end of motor, the glass plate is driven around X-direction Rotate.
The present invention also provides a kind of focusing and leveling method based on image processing techniques, is filled applied to above-mentioned focusing and leveling In putting, comprise the following steps:
S100:Pretreatment, determine the slewing area and step pitch of the glass plate;
S200:Measurement processing, the 3 sub- light spot images obtained according to the photodetector, calculates vertical measured value.
It is preferred that in step S100, the slewing area of the glass plate and the vertical measurement range of focusing leveling device Match.
It is preferred that the slewing area of the glass plate passes through local gash depth maximum or the gradient in every batch of measured workpiece Maximum measured workpiece actual measurement determines.
It is preferred that measurement processing comprises the following steps that:
S210:If 3 sub- light spot images that the photodetector obtains obtain 3 gray scale crests after subsequent treatment, Then vertical measured value Δ e is:
The Δ Hsin φ of 1 β of Δ e=2 β 2,
In above formula, β 1 is the magnifying power of imaging microscope group, and β 2 is the magnifying power of imaging len, and Ф is light beam on measured workpiece Incidence angle;
S221:If 3 sub- light spot images that the photodetector obtains obtain 0~2 gray scale ripple after subsequent treatment Peak, then the glass plate is controlled to rotate by step pitch in the slewing area of glass plate, if can finally obtain 3 gray scale ripples Peak, then vertical measured value ZiFor:
Zi=Zi-1+(Z′i-Z0)+Δoffset, wherein, Δoffset=Lyi*ΔRxi-Lxi*ΔRyi,
In above formula, Zi-1Not rotate focusing leveling device last time measured value before glass plate, Z 'iTo rotate glass plate This measured value of back focusing levelling device, Z0Original position θ is in for glass plate0When focusing leveling device measured value, Δoffset To move horizontally the vertical offset drawn with measured workpiece face type, Δ Rx because of hot spoti、ΔRyiFor focusing leveling device this with The difference of last time measured value, Lxi、LyiRespectively this and last time X, the difference of Y-direction coordinate value of focusing leveling device;
S222:After if glass plate rotates, 1 or 2 gray scale crest is obtained, then vertical measured value ZiFor:
Zi=Zi-1offset, wherein, Δoffset=Lyi*ΔRxi-1-Lxi*ΔRyi-1,
In above formula, Zi-1Not rotate focusing leveling device last time measured value before glass plate, ΔoffsetFor because of hot spot level The mobile vertical offset drawn with measured workpiece face type, Δ Rxi-1、ΔRyi-1For on focusing leveling device twice measured value it Difference, Lxi、LyiRespectively this and last time X, the difference of Y-direction coordinate value of focusing leveling device;
S223:If after glass plate rotates, cannot get gray scale crest all the time, then the measured workpiece does not fill in this focusing and leveling In the measurable range put.
It is preferred that in each sub- incomplete position of light spot image, by progressively increasing in focusing leveling device measurable range Big step pitch, the forward and reverse rotation glass plate of alternating.
Compared with prior art, a kind of focusing leveling device and method based on image processing techniques provided by the invention, The device includes the workpiece for mask, projection objective, measured workpiece and the carrying measured workpiece being arranged in order from top to bottom Platform, in addition to be arranged in order along paths direction light source, the first speculum, projection slit, projection microscope group, second reflection Mirror, imaging microscope group, the 3rd speculum, the 4th speculum, imaging len, detection slit and photodetector, the projection are narrow Rotatable glass plate is additionally provided between seam and measured workpiece.The present invention is rotated using glass plate to move horizontally tested work Measurement facula position on part surface, the alternative site that can completely or partly measure tested region height measurements is found, from And extrapolate tested region height measurements.The present invention can effectively improve the measurement accuracy of focusing leveling device and technique adapts to Property, and then improve finished product yield.
Brief description of the drawings
Fig. 1 is the structural representation of existing focusing leveling device and method based on image processing techniques;
Fig. 2A~2K is the existing Test Cycle schematic diagram based on image processing techniques focusing leveling device;
Fig. 3 is the structural representation of the focusing leveling device based on image processing techniques of the embodiment of the invention Figure;
Fig. 4 is that the treatment effect of the focusing leveling device based on image processing techniques of the embodiment of the invention shows It is intended to;
Fig. 5 A~5J are the Test Cycle based on image processing techniques focusing leveling device of one embodiment of invention Schematic diagram;
Fig. 6 is the signal of the pretreatment process based on image processing techniques focusing and leveling method of one embodiment of invention Figure;
Fig. 7 is that the measurement processing flow based on image processing techniques focusing and leveling method of one embodiment of invention is shown It is intended to.
In Fig. 1:10- masks, 20- projection objectives, 30- measured workpieces, 31- work stages, 40- light sources, 41- first reflect Camera lens, 70- the 3rd are organized after camera lens, 62- projection microscope groups are organized before mirror, 50- projection slits, the speculums of 60- second, 61- projection microscope groups Camera lens, 80- detections slit, the speculums of 81- the 4th, 82- are organized before camera lens, 72- imaging microscope groups are organized after speculum, 71- imaging microscope groups Imaging len, 90- photodetectors;
In Fig. 3 and Fig. 4:110- masks, 120- projection objectives, 130- measured workpieces, 140- work stages;
Group before 210- light sources, the speculums of 220- first, 230- projection slits, the speculums of 240- second, 251- projection microscope groups Camera lens is organized after camera lens, 252- projection microscope groups;
Camera lens, the reflections of 330- the 4th are organized before camera lens, 322- imaging microscope groups are organized after the speculums of 310- the 3rd, 321- imaging microscope groups Mirror, 340- imaging lens, 350- detections slit, 360- photodetectors;
410- glass plates, 411- motors.
Embodiment
In order to more state the technical scheme of foregoing invention in detail, being exemplified below specific embodiment proves that technology is imitated Fruit;It is emphasized that these embodiments are used to illustrate the present invention and be not limited to limit the scope of the present invention.
A kind of focusing leveling device based on image processing techniques provided by the invention, as shown in figure 3, including from top to bottom The work stage 140 of the mask 110, projection objective 120, measured workpiece 130 and the carrying measured workpiece 130 that are arranged in order, Also include be arranged in order along paths direction light source 210, the first speculum 220, projection slit 230, projection microscope group, second Speculum 240, imaging microscope group, the 3rd speculum 310, the 4th speculum 330, imaging len 340, detection slit 350 and light Electric explorer 360, rotatable glass plate 410 is additionally provided between the projection slit 230 and measured workpiece 130.Specifically, Pattern on mask 110 projects to the surface of measured workpiece 130 of the carrying of work stage 140 by projection objective 120, and light source 210 is sent out The light gone out successively by the first speculum 220, projection slit 230, projection microscope group before organize camera lens 251, the second speculum 240 and Group camera lens 252 exposes to the surface of measured workpiece 130 after projection microscope group, after the reflection of measured workpiece 130 successively after imaged microscope group Camera lens 322, the 4th speculum 330, imaging len 340 and detection are organized before group camera lens 321, the 3rd speculum 310, imaging microscope group Slit 350, finally it is imaged on photodetector 360.The present invention by the projection slit 230 and measured workpiece 130 it Between increase rotatable glass plate 410, specifically, the glass plate 410 can be arranged on projection slit 230 and projection lens Before group between group camera lens 251 (as shown in Figure 3 and Figure 4), the speculum of camera lens 251 and second is organized before projection microscope group can also be arranged on Organized between 240, after the second speculum 240 and projection microscope group between camera lens 252 or organize camera lens 252 and tested work after projection microscope group Between the incidence point of part 130, as long as enabling to measurement hot spot to be moved horizontally in measured surface.It is preferred that the glass Glass flat board 410 is fixedly connected with the drive end of motor 411, drives the glass plate 410 to be rotated in X-direction, that is to say, that Under the dragging of motor 411, the glass plate 410 can in figure 3 it is shown around X-direction, in [- θmaxmax] scope It is interior to be rotated around its center point.
Please emphasis with reference to figure 3, if by the vertical optimal focal plane for being moved to projection objective 120 in the surface of measured workpiece 130 Position (in Fig. 3 shown in the upper horizontal dotted line of measured workpiece 130), adjusted 120 optimal focal plane position of projection objective as focusing The vertical measurement target location of leveling device, in other words, measurement hot spot are equivalent to focusing and leveling dress in moving horizontally for measured surface Put the vertical movement of vertical measurement target location.That is, to have adjusted focusing leveling device vertical for the rotation of glass plate 410 Measure target location, also, both the amount of spin of glass plate 410 and the vertical measurement target location adjustment amount of focusing leveling device Between be in one-to-one relationship.Specifically, as shown in figure 4, the slewing area [- θ of the glass plate 410maxmax] depend on The vertical measurement range of focusing leveling device, i.e. glass plate 410 rotate the vertical measurement that can not exceed focusing leveling device Scope.In addition, after rotation glass plate 410, the vertical measurement target location of focusing leveling device are adjusted to new position, focusing and leveling The vertical measurement range of device is unaffected, that is to say, that rotates the survey for the simply focusing leveling device that glass plate 410 changes Measure reference point location.
The present invention also provides a kind of focusing and leveling method based on image processing techniques, is filled applied to above-mentioned focusing and leveling In putting, comprise the following steps:
S100:Pretreatment, the slewing area and step pitch of the glass plate 410 are determined, it is preferred that the glass plate 410 slewing area and the vertical measurement range of focusing leveling device match, specifically, the rotation of the glass plate 410 Scope is surveyed by the measured workpiece 130 that local gash depth is maximum in every batch of measured workpiece 130 or the gradient is maximum and determined.In work In Cheng Yingyong, in order to reduce the number of revolutions of glass plate 410, increase production capacity, the slewing area of glass plate 410 can be further Utilize local gash depth maximum (as shown in Figure 2 F) in every batch of measured workpiece 130 or the workpiece of the gradient maximum (as shown in figure 2k) Actual measurement determine, it is determined that after slewing area can make appropriate nargin enhanced processing in the vertical measurement range of focusing leveling device, The rotation step pitch optimized is finally selected further according to capacity requirements.
The process of pretreatment is explained in detail below, asks emphasis to refer to figure 6, before the workpiece of a collection of same size of batch production,
First, the work of wherein local gash depth maximum (as shown in Figure 2 F) or the gradient maximum (as shown in figure 2k) is uploaded Part;Then the original position θ of glass plate 410 is set0(being typically 0);By workpiece motion s to the center of work stage 140, perform Global Levelling operation;By measurement trajectory planning motion measured workpiece 130, the starting altitude value Z that hot spot measures is read0
Each exposure field horizontal position coordinate (X, Y) is recorded, checks the photodetection using CCD as representative in each exposure field The image of device 360;
In each sub- incomplete position of light spot image, by incrementally increasing step pitch in focusing leveling device measurable range, Alternately forward and reverse rotation glass plate 410, if complete in a certain 3 sub- light spot images of opening position, record now glass and puts down Plate 410 rotates forward number i or negative sense number of revolutions j;If only have 2 or 1 in focusing leveling device measurable range The individual complete position of sub- light spot image, then record appearance 2 or 1 sub- light spot image first and completely locating glass plate 410 just To number of revolutions i or negative sense number of revolutions j;If it can not find any 1 son all the time in focusing leveling device measurable range The complete position of light spot image, then reported an error " without effective facula measurement value " to complete machine, workpiece, analysis reason are downloaded by complete machine;
After bottom sheet, by i, j maximum and appropriate nargin scope, complete machine capacity requirements, glass plate 410 is chosen most Optimize slewing area [- θmaxmax] with rotating step pitch θstep
S200:Measurement processing, the 3 sub- light spot images obtained according to the photodetector 360, calculates vertical measurement Value.
It is preferred that the step of measurement processing, is as follows:
S210:If 3 sub- light spot images that the photodetector 360 obtains obtain 3 gray scale ripples after subsequent treatment Under peak, that is, most of operating mode of measured workpiece 130 shown in Fig. 2A, 2B, 2C, measurement process provided by the invention with The existing measurement process based on image processing techniques focusing leveling device is identical, i.e., vertical measured value Δ e is:
The Δ Hsin φ (1-1) of 1 β of Δ e=2 β 2
In formula (1-1), β 1 is imaging microscope group (including organizing camera lens 322 before camera lens 321 and imaging microscope group are organized after imaging microscope group) Magnifying power, β 2 be imaging len 340 magnifying power, Ф is incidence angle of the light beam on measured workpiece 130;
S221:If 3 sub- light spot images that the photodetector 360 obtains obtain 0~2 gray scale after subsequent treatment Under crest, that is, operating mode shown in Fig. 2 D~2K, then the glass is controlled by step pitch in the slewing area of glass plate 410 Flat board 410 is rotated, and hot spot is carried out into horizontal translation, if can be as shown in Fig. 5 A, 5B, 5F or 5G in its rotatable scope Situation, i.e.,:The position that 3 sub- hot spots are not blocked can be reached, finally give 3 gray scale crests (be changed into Fig. 2 D~ Operating mode shown in 2K), then now vertical measured value ZiFor:
Zi=Zi-1+(Z′i-Z0)+Δoffset,
Δoffset=Lyi*ΔRxi-Lxi*ΔRyi (1-2)
In formula (1-2), Zi-1Not rotate focusing leveling device last time measured value before glass plate 410, Z 'iTo rotate glass Back focusing levelling device this measured value of glass flat board 410, Z0Original position θ is in for glass plate 4100Adjusted when (being typically 0) Burnt levelling device measured value, ΔoffsetTo move horizontally the vertical offset drawn with the face type of measured workpiece 130, Δ because of hot spot Rxi、ΔRyiFor focusing leveling device this with last time measured value (initial value can be configured by global focusing and leveling result) Difference, Lxi、LyiRespectively this and last time X, the difference (i.e. this displacement) of Y-direction coordinate value of focusing leveling device;
S222:After if glass plate 410 rotates in movable range, 1 or 2 gray scale crest is obtained, in other words, is only capable of Enough situations as shown in Fig. 5 C, 5D, 5H or 5I, i.e.,:Do not hidden in some or some positions at most only 1 or 2 sub- hot spots Gear, then now vertical measured value ZiFor:
Zi=Zi-1offset,
Δoffset=Lyi*ΔRxi-1-Lxi*ΔRyi-1 (1-3)
In formula (1-3), Zi-1Not rotate focusing leveling device last time measured value before the flat board of glass 410, ΔoffsetFor because of light Spot moves horizontally the vertical offset drawn with the face type of measured workpiece 130, Δ Rxi-1、ΔRyi-1For on focusing leveling device twice The difference of measured value (initial value can be configured by global focusing and leveling result), Lxi、LyiRespectively focusing leveling device this And the difference (i.e. this displacement) of last time X, Y-direction coordinate value;
S223:If after glass plate 410 rotates, cannot get gray scale crest all the time, in other words, as shown in Fig. 5 E, 5J, All the time the position that sub-light spot is not blocked is can not find in the rotatable scope of glass plate 410, then the measured workpiece 130 is not at this In the measurable range of focusing leveling device, that is to say, that the surface grooves dense degree of measured workpiece 130, depth are not advised Then degree has exceeded the measurable range of focusing leveling device, should separately find measurement scheme or measured workpiece 130 is entered again Row surface treatment.
The process of measurement processing is explained in detail below, asking emphasis, complete machine uploads workpiece with reference to figure 7, then sets glass plate 410 Original position θ0After (being typically 0), by workpiece motion s to the center of work stage 140, global Levelling operation is performed, then by rail Mark planning travelling workpiece platform 140, the image for the photodetector 360 that CCD is representative is checked, if the image of 3 sub- hot spots is complete It is whole, then the height value Z that hot spot measures is read, the operations such as subsequently alignment, exposure is carried out, then proceedes to by trajectory planning travelling workpiece Platform 140, circulation perform aforesaid operations, until end exposure, download workpiece;
If the image of 3 sub- hot spots is imperfect, remembered according to exposure field horizontal position coordinate (X, Y) and preprocessing process Record, corresponding with exposure field horizontal level glass plate 410 rotates forward number i or negative sense number of revolutions j rotation glass and put down Plate 410, then check the image for the photodetector 360 that CCD is representative:If the image of 3 sub- hot spots is complete, read now The height value Z that hot spot measuresi', then calculate current 3 sub- light spot image imperfect position height value Z', Ran Houjin by formula (1-2) The operations such as the follow-up alignment of row, exposure, it is further continued for performing aforesaid operations by trajectory planning travelling workpiece platform 140, circulation, until exposure Terminate, download workpiece;
If the image of only 1 or 2 sub- hot spot is complete, is calculated by formula (1-3) and calculate current 3 sub- light spot images Imperfect position height value Z';
If complete without the image of sub-light spot, with the current location θ of glass plate 410iBased on, in [θimax] (just To) or [- θmaxi] in the range of (reverse), continue by θstepGlass plate 410 is rotated, if can not find 3 sub- hot spot figures all the time As all complete position, then reported an error to complete machine:There is no effective facula measurement value, workpiece, analysis reason are downloaded by complete machine.
In summary, in the local surfaces deformation of measured workpiece 130, seriously, partly or entirely measurement hot spot can not be surveyed the present invention When obtaining complete tested region height measurements, rotated using glass plate 410 to move horizontally on the surface of measured workpiece 130 Measure facula position, find can perfect measurement go out the alternative sites of tested region height measurements, so as to extrapolate tested region Height measurements.Focusing leveling device and method provided by the invention based on image processing techniques can be severe to TSV etc. Craft piece measures.
Obviously, those skilled in the art can carry out the spirit of various changes and modification without departing from the present invention to invention And scope.So, if these modifications and variations of the present invention belong to the claims in the present invention and its equivalent technologies scope it Interior, then the present invention is also intended to including these changes and modification.

Claims (6)

1. a kind of focusing and leveling method based on image processing techniques, applied in focusing leveling device, the focusing and leveling fills The work stage of mask, projection objective, measured workpiece and the carrying measured workpiece including being arranged in order from top to bottom is put, also Including be arranged in order along paths direction light source, the first speculum, projection slit, projection microscope group, the second speculum, imaging Microscope group, the 3rd speculum, the 4th speculum, imaging len, detection slit and photodetector;The projection slit is with being tested Optical path-deflecting device is additionally provided between workpiece, the optical path-deflecting device is rotatable glass plate;It is characterised in that it includes Following steps:
S100:Pretreatment, determine the slewing area and step pitch of glass plate;
S200:Measurement processing, the 3 sub- light spot images obtained according to the photodetector, calculates vertical measured value.
A kind of 2. focusing and leveling method based on image processing techniques as claimed in claim 1, it is characterised in that step S100 In, the slewing area of the glass plate and the vertical measurement range of focusing leveling device match.
A kind of 3. focusing and leveling method based on image processing techniques as claimed in claim 2, it is characterised in that the glass The slewing area of flat board is surveyed by the measured workpiece that local gash depth is maximum in every batch of measured workpiece or the gradient is maximum and determined.
A kind of 4. focusing and leveling method based on image processing techniques as claimed in claim 1, it is characterised in that measurement processing Comprise the following steps that:
S210:If 3 sub- light spot images that the photodetector obtains obtain 3 gray scale crests after subsequent treatment, hang down It is to measured value Δ e:
The Δ Hsin φ of 1 β of Δ e=2 β 2,
In above formula, β 1 is the magnifying power of imaging microscope group, and β 2 is the magnifying power of imaging len, and Ф is light beam entering on measured workpiece Firing angle;
S221:If 3 sub- light spot images that the photodetector obtains obtain 0~2 gray scale crest after subsequent treatment, The glass plate is controlled to rotate by step pitch in the slewing area of glass plate, if can finally obtain 3 gray scale crests, Vertical measured value ZiFor:
Zi=Zi-1+(Z′i-Z0)+Δoffset, wherein, Δoffset=Lyi*ΔRxi-Lxi*ΔRyi,
In above formula, Zi-1Not rotate focusing leveling device last time measured value before glass plate, Z 'iTo rotate glass plate back focusing This measured value of levelling device, Z0Original position θ is in for glass plate0When focusing leveling device measured value, ΔoffsetFor because of light Spot moves horizontally the vertical offset drawn with measured workpiece face type, Δ Rxi、ΔRyiFor focusing leveling device, this was surveyed with last time The difference of value, Lxi、LyiRespectively this and last time X, the difference of Y-direction coordinate value of focusing leveling device;
S222:After if glass plate rotates, 1 or 2 gray scale crest is obtained, then vertical measured value ZiFor:
Zi=Zi-1offset, wherein, Δoffset=Lyi*ΔRxi-1-Lxi*ΔRyi-1,
In above formula, Zi-1Not rotate focusing leveling device last time measured value before glass plate, ΔoffsetTo be moved horizontally because of hot spot The vertical offset drawn with measured workpiece face type, Δ Rxi-1、ΔRyi-1For the difference of measured value twice on focusing leveling device, Lxi、LyiRespectively this and last time X, the difference of Y-direction coordinate value of focusing leveling device;
S223:After if glass plate rotates, it cannot get gray scale crest all the time, then the measured workpiece is not in this focusing leveling device In measurable range.
5. a kind of focusing and leveling method based on image processing techniques as claimed in claim 4, it is characterised in that in every height The incomplete position of light spot image, by step pitch is incrementally increased in focusing leveling device measurable range, replace forward and reverse rotation glass Glass flat board.
6. a kind of focusing and leveling method based on image processing techniques as claimed in claim 1, the glass plate and motor Drive end be fixedly connected, drive the glass plate to be rotated around X-direction.
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* Cited by examiner, † Cited by third party
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CN109426093B (en) * 2017-08-31 2020-12-11 上海微电子装备(集团)股份有限公司 Focusing and leveling detection device
CN109297940A (en) * 2018-09-06 2019-02-01 中国科学院沈阳自动化研究所 A kind of laser defocus amount automatic adjusting device and adjusting method in micron scale
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101169601A (en) * 2007-11-21 2008-04-30 上海微电子装备有限公司 Focusing leveling measuring system
CN101201546A (en) * 2007-11-28 2008-06-18 上海微电子装备有限公司 Device for automatically focusing and leveling
CN101344734A (en) * 2007-12-28 2009-01-14 上海微电子装备有限公司 Silicon slice focusing and leveling measurement device
CN101344727A (en) * 2008-06-26 2009-01-14 上海微电子装备有限公司 A focusing and leveling detection device and method
CN102768469A (en) * 2011-05-03 2012-11-07 上海微电子装备有限公司 Focusing and bisecting system and adjustment method thereof
CN103838088A (en) * 2012-11-23 2014-06-04 上海微电子装备有限公司 Focusing and levelling device and method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101169601A (en) * 2007-11-21 2008-04-30 上海微电子装备有限公司 Focusing leveling measuring system
CN101201546A (en) * 2007-11-28 2008-06-18 上海微电子装备有限公司 Device for automatically focusing and leveling
CN101344734A (en) * 2007-12-28 2009-01-14 上海微电子装备有限公司 Silicon slice focusing and leveling measurement device
CN101344727A (en) * 2008-06-26 2009-01-14 上海微电子装备有限公司 A focusing and leveling detection device and method
CN102768469A (en) * 2011-05-03 2012-11-07 上海微电子装备有限公司 Focusing and bisecting system and adjustment method thereof
CN103838088A (en) * 2012-11-23 2014-06-04 上海微电子装备有限公司 Focusing and levelling device and method

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