CN106283055A - 一种印刷板的蚀刻方法 - Google Patents
一种印刷板的蚀刻方法 Download PDFInfo
- Publication number
- CN106283055A CN106283055A CN201610770098.8A CN201610770098A CN106283055A CN 106283055 A CN106283055 A CN 106283055A CN 201610770098 A CN201610770098 A CN 201610770098A CN 106283055 A CN106283055 A CN 106283055A
- Authority
- CN
- China
- Prior art keywords
- printed panel
- film
- etching
- pattern
- engraving method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000005530 etching Methods 0.000 claims abstract description 33
- 238000005498 polishing Methods 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000005202 decontamination Methods 0.000 claims abstract description 5
- 230000003588 decontaminative effect Effects 0.000 claims abstract description 5
- 238000007639 printing Methods 0.000 claims abstract description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 claims description 8
- 229920002120 photoresistant polymer Polymers 0.000 claims description 7
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 239000006071 cream Substances 0.000 claims description 4
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 4
- 235000011149 sulphuric acid Nutrition 0.000 claims description 4
- 239000001117 sulphuric acid Substances 0.000 claims description 4
- 239000002562 thickening agent Substances 0.000 claims description 4
- 238000001312 dry etching Methods 0.000 claims description 3
- 239000003292 glue Substances 0.000 claims description 3
- 230000003487 anti-permeability effect Effects 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 239000002253 acid Substances 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000002351 wastewater Substances 0.000 abstract description 3
- 230000007423 decrease Effects 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610770098.8A CN106283055A (zh) | 2016-08-31 | 2016-08-31 | 一种印刷板的蚀刻方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610770098.8A CN106283055A (zh) | 2016-08-31 | 2016-08-31 | 一种印刷板的蚀刻方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN106283055A true CN106283055A (zh) | 2017-01-04 |
Family
ID=57675272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610770098.8A Pending CN106283055A (zh) | 2016-08-31 | 2016-08-31 | 一种印刷板的蚀刻方法 |
Country Status (1)
Country | Link |
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CN (1) | CN106283055A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108289381A (zh) * | 2018-01-11 | 2018-07-17 | 昆山华晨电子有限公司 | 一种多层细密线路电路板的生产工艺及线路板加工系统 |
CN112981403A (zh) * | 2020-12-29 | 2021-06-18 | 苏州运宏电子有限公司 | 一种金属薄片表面细纹蚀刻工艺 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101717645A (zh) * | 2009-11-17 | 2010-06-02 | 张�林 | 用于金属及金属氧化物透明导电层的蚀刻膏及蚀刻工艺 |
JP2013089731A (ja) * | 2011-10-17 | 2013-05-13 | Kanto Chem Co Inc | エッチング液組成物およびエッチング方法 |
CN103400902A (zh) * | 2013-08-14 | 2013-11-20 | 迅力光能(昆山)有限公司 | 一种ito薄膜太阳能电池片及其图案制备方法 |
KR101342061B1 (ko) * | 2007-07-20 | 2013-12-18 | 삼성디스플레이 주식회사 | 백라이트 어셈블리와 이의 조립 방법 및 이를 포함하는액정 표시 장치 |
CN104451680A (zh) * | 2014-12-20 | 2015-03-25 | 中山联合光电科技有限公司 | 一种化学蚀纹工艺 |
CN104674220A (zh) * | 2015-02-13 | 2015-06-03 | 河源西普电子有限公司 | 一种蚀刻方法 |
CN104765515A (zh) * | 2015-03-12 | 2015-07-08 | 青岛元盛光电科技有限公司 | 一种g1f结构电容式触摸屏的制作工艺 |
-
2016
- 2016-08-31 CN CN201610770098.8A patent/CN106283055A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101342061B1 (ko) * | 2007-07-20 | 2013-12-18 | 삼성디스플레이 주식회사 | 백라이트 어셈블리와 이의 조립 방법 및 이를 포함하는액정 표시 장치 |
CN101717645A (zh) * | 2009-11-17 | 2010-06-02 | 张�林 | 用于金属及金属氧化物透明导电层的蚀刻膏及蚀刻工艺 |
JP2013089731A (ja) * | 2011-10-17 | 2013-05-13 | Kanto Chem Co Inc | エッチング液組成物およびエッチング方法 |
CN103400902A (zh) * | 2013-08-14 | 2013-11-20 | 迅力光能(昆山)有限公司 | 一种ito薄膜太阳能电池片及其图案制备方法 |
CN104451680A (zh) * | 2014-12-20 | 2015-03-25 | 中山联合光电科技有限公司 | 一种化学蚀纹工艺 |
CN104674220A (zh) * | 2015-02-13 | 2015-06-03 | 河源西普电子有限公司 | 一种蚀刻方法 |
CN104765515A (zh) * | 2015-03-12 | 2015-07-08 | 青岛元盛光电科技有限公司 | 一种g1f结构电容式触摸屏的制作工艺 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108289381A (zh) * | 2018-01-11 | 2018-07-17 | 昆山华晨电子有限公司 | 一种多层细密线路电路板的生产工艺及线路板加工系统 |
CN112981403A (zh) * | 2020-12-29 | 2021-06-18 | 苏州运宏电子有限公司 | 一种金属薄片表面细纹蚀刻工艺 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB03 | Change of inventor or designer information |
Inventor after: Liu Qinghua Inventor before: He Rongte |
|
CB03 | Change of inventor or designer information | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20180119 Address after: 435000 Hubei city of Huangshi Province Economic and Technological Development Zone Jinshan Street Jinhong Road No. 1 Applicant after: Huangshi Electronic Technology Co., Ltd. Address before: 517000 Guangdong Province, Heyuan city high tech Development Zone, No. eight Fumin Industrial Park A District B building Applicant before: Riverhead Xi Pu Electronics Co., Ltd. |
|
TA01 | Transfer of patent application right | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170104 |
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RJ01 | Rejection of invention patent application after publication |