CN106226945A - Colored filter and preparation method thereof, display module and display device - Google Patents
Colored filter and preparation method thereof, display module and display device Download PDFInfo
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- CN106226945A CN106226945A CN201610617514.0A CN201610617514A CN106226945A CN 106226945 A CN106226945 A CN 106226945A CN 201610617514 A CN201610617514 A CN 201610617514A CN 106226945 A CN106226945 A CN 106226945A
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- alignment film
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- black matrix
- photoresist layer
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- 238000002360 preparation method Methods 0.000 title abstract description 3
- 239000010410 layer Substances 0.000 claims abstract description 56
- 239000000758 substrate Substances 0.000 claims abstract description 49
- 239000011159 matrix material Substances 0.000 claims abstract description 43
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 43
- 239000012212 insulator Substances 0.000 claims abstract description 34
- 239000011241 protective layer Substances 0.000 claims abstract description 19
- 239000002096 quantum dot Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 241000196324 Embryophyta Species 0.000 description 1
- 244000283207 Indigofera tinctoria Species 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
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- 239000012528 membrane Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133519—Overcoatings
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
Abstract
The present invention relates to a kind of colored filter and preparation method thereof, display module and display device, wherein colored filter, including: substrate, the black matrix" being formed on described substrate, be arranged on described substrate and part cover the photoresist layer of described black matrix", stacking is arranged on described substrate and covers the alignment film of described black matrix" and described photoresist layer, and the multiple chock insulator matters being arranged on described alignment film, multiple described chock insulator matters interval is arranged.Above-mentioned colored filter eliminates protective layer; and make alignment film replace protective layer; reduce the difference of height of photoresist layer; make to arrange the surface opposed flattened of chock insulator matter; thus on the one hand chock insulator matter is conveniently set; on the other hand photoresist layer is played a protective role by alignment film, and can cost-effective, improve efficiency, simplify produce.
Description
Technical field
The present invention relates to a kind of display field, particularly relate to a kind of colored filter, display module, display device, be somebody's turn to do
The manufacture method of colored filter.
Background technology
Along with the progress of science and technology, the such as display devices such as mobile phone have become requisite article in people's life, display dress
Colored filter in putting, is the significant components of display device, and current colored filter is relatively costly, complex process.
Summary of the invention
Based on this, it is necessary to provide the colored filter that a kind of cost is relatively low, technique simple, production efficiency is higher, application
The display module of this colored filter, display device, and the manufacture method of this display filter.
A kind of colored filter, including: substrate, the black matrix" being formed on described substrate, it is arranged on described substrate
And part covers the photoresist layer of described black matrix", stacking is arranged on described substrate and covers described black matrix" and described light
The alignment film of resistance layer, and the multiple chock insulator matters being arranged on described alignment film, multiple described chock insulator matters interval is arranged.
Wherein in an embodiment, described photoresist layer includes red photoresistance region, green photoresistance region and clear area
Territory, described alignment film covers and fills described white space.
Wherein in an embodiment, described red photoresistance region, described green photoresistance region are quantum dot photoresistance district
Territory.
Wherein in an embodiment, described photoresist layer includes red photoresistance region, green photoresistance region and blue light
Resistance region.
Wherein in an embodiment, described colored filter also includes protective layer, described alignment film, described protective layer,
The order stacking of described substrate is arranged, and described black matrix", described photoresist layer are between described protective layer and described substrate.
Wherein in an embodiment, described chock insulator matter is arranged at the region of the corresponding described black matrix" of described alignment film
On.
Wherein in an embodiment, the thickness of described alignment film is 0.7 micron～2.5 microns.
A kind of display module, including the colored filter described in above-mentioned any one.
A kind of display device, including described display module.
The manufacture method of a kind of colored filter, comprises the steps:
Substrate is formed black matrix"；
Form photoresist layer on the substrate, and described photoresist layer part covers described black matrix"；
The described substrate being formed with described black matrix" and described photoresist layer is formed alignment film, and described alignment film covers
Cover described black matrix" and described photoresist layer；
Described alignment film is formed multiple chock insulator matter.
Comparing traditional color filter, above-mentioned colored filter eliminates protective layer (OC layer), and makes alignment film replace protecting
Sheath, reduces the difference of height of photoresist layer, makes to arrange the surface opposed flattened of chock insulator matter, thus on the one hand conveniently arranges chock insulator matter,
On the other hand photoresist layer is played a protective role by alignment film, and can cost-effective, improve efficiency, simplify produce.Additionally, every
Underbed is arranged on alignment film, rather than alignment film parcel chock insulator matter, liquid crystal molecule is had more preferable grappling effect, and orientation
Film there is no impact to orientation, the tilt angle of liquid crystal.
Accompanying drawing explanation
Fig. 1 is the structural representation of the colored filter of a preferred embodiment of the present invention.
Detailed description of the invention
For the ease of understanding the present invention, below with reference to relevant drawings, the present invention is described more fully.In accompanying drawing
Give the better embodiment of the present invention.But, the present invention can realize in many different forms, however it is not limited to herein
Described embodiment.On the contrary, providing the purpose of these embodiments is to make to understand the disclosure more
Add thorough comprehensive.
It should be noted that when element is referred to as " being arranged at " another element, and it can be directly on another element
Or element placed in the middle can also be there is.When an element is considered as " connection " another element, and it can be to be directly connected to
To another element or may be simultaneously present centering elements.Term as used herein " vertical ", " level ", " left ",
For illustrative purposes only, being not offered as is unique embodiment for " right " and similar statement.
Unless otherwise defined, all of technology used herein and scientific terminology and the technical field belonging to the present invention
The implication that technical staff is generally understood that is identical.The term used the most in the description of the invention is intended merely to describe tool
The purpose of the embodiment of body, it is not intended that in limiting the present invention.Term as used herein " and/or " include one or more
Arbitrary and all of combination of relevant Listed Items.
As it is shown in figure 1, the structural representation of the colored filter 10 that it is a preferred embodiment of the present invention.
Colored filter 10 includes: substrate 100, the black matrix" 200 being formed on substrate 100, be arranged on substrate 100
And part covers the photoresist layer 300 of black matrix" 200, stacking is arranged on substrate 100 and covers black matrix" 200, photoresist layer
The alignment film 400 of 300, and the multiple chock insulator matters 500 being arranged on alignment film 400, multiple chock insulator matters 500 interval is arranged.
It is also understood that substrate 100, alignment film 400 stacking setting, black matrix" 200, photoresist layer 300 are positioned at substrate
Between 100 and alignment film 400, and covered by alignment film 400.
Comparing traditional color filter 10, above-mentioned colored filter 10 eliminates protective layer (OC layer), and makes alignment film 400
Replace protective layer, reduce the difference of height of photoresist layer 300, make to arrange the surface opposed flattened of chock insulator matter 500, thus the most convenient
Arranging chock insulator matter 500, on the other hand photoresist layer 300 is played a protective role by alignment film 400, and can cost-effective, raising
Efficiency, simplifies and produces.Additionally, chock insulator matter 500 is arranged on alignment film 400, rather than alignment film 400 wraps up chock insulator matter 500, and order is joined
Preferably wrap up to film 400 and cover photoresist layer 300, liquid crystal molecule being had more preferable grappling effect, and alignment film 400 is right
The orientation of liquid crystal, tilt angle there is no impact.
In the present embodiment, photoresist layer 300 includes red photoresistance region, green photoresistance region and white space, alignment film
400 fill in the blanks region.And for example, alignment film 400 is filled and covers white space；And for example, alignment film is at least partly filled and covers
Lid white space；And for example, white space is filled and covered to alignment film, and, alignment film has smooth away from the one side of photoresist layer
Surface.And for example, in red photoresistance region or it is at green photoresistance region more than it for alignment film thickness at white space
Thickness；And for example, alignment film has projective structure at white space, and described projective structure is truncated conical shape or part ball
Shape, is used for being recessed to white space the region that at least partly fills in the blanks.And red photoresistance region, green photoresistance region are
Quantum dot photoresistance region.It is also understood that photoresistance is the photoresistance that quantum dot is made, and traditional blue light resistance region is led to
Cross white space to replace, and then the red photoresistance region of order, green photoresistance region and white space alternate intervals are arranged；Alignment film
400 fill in the blanks region so that its with red photoresistance region, green photoresistance region the most contour, and alignment film 400 also fills up
Gap between multiple regions, arranging alignment film 400 with order, to arrange the surface of chock insulator matter 500 the most smooth, and then order dress
Join the product stability of colored filter 10 more preferably, display effect more preferable.
Above-mentioned colored filter 10, alignment film 400 is after ultraviolet polarizing light irradiation, and it is blue-light source that formation needs backlight
Wide viewing angle optical filter, red photoresistance region, green photoresistance region excite generation HONGGUANG and green glow, blue-light source by blue-light source
Send blue light by the alignment film 400 of white space, thus make blue-light source have RGB three after passing through colored filter 10
Plant the light of color.
The color purity in quantum dot photoresistance region is higher, and order has colored filter 10 brightness in quantum dot photoresistance region
Higher, colour gamut is wider.Further, quantum dot photoresistance region more resistant to moisture, improves product than traditional organic coating photoresistance region
Life and reliability.Additionally, due to quantum dot photoresistance region is monoenergetic level structure, after the quantum dot of each fixed size is stimulated
The frequency spectrum of the light sent is unique, i.e. color is unique, is pure color.So, quantum spot size size can be passed through,
Conveniently, accurately regulate its optical wavelength produced, and then produce the light of different colours.
It should be noted that according to practical situation, photoresist layer 300 include red photoresistance region, green photoresistance region and
Blue light resistance region.I.e. photoresist layer 300 is red, green, blue photoresistance region.
Such as, photoresist layer 300 arranges several rows photoresistance region, and every a line photoresistance region includes some groups of photoresistance regions, example
As, each group of photoresistance region includes three kinds of color photoresistance districts；Each group photoresistance regional rule arranges three kinds of color photoresistance districts；Such as,
Each group photoresistance region arranges tri-kinds of color photoresistance districts of RGB by RGB Cahn-Ingold-Prelog sequence rule.And for example, the alternate setting in each row photoresistance region, in phase
It is provided with described black matrix" 200 between adjacent two row photoresistance regions, and for example, is often provided with described black square between group photoresistance region
Battle array 200, as such, it is possible to be easy to the production of color membrane substrates 100 and the realization of function thereof.Such as, it has been respectively present between each region
The part of black matrix", i.e. part black matrix", described region includes red photoresistance region, green photoresistance region and clear area
Territory.And for example, red photoresistance region, green photoresistance region and white space are uniformly arranged, such as, and red photoresistance region, green
Photoresistance region and the area equation of white space, and/or, red photoresistance region, green photoresistance region and white space are
The shape of congruence, such as red photoresistance region, green photoresistance region and white space are congruent sector or rectangle；And for example,
Red photoresistance region, green photoresistance region and white space form a spiral type, and red photoresistance region, green photoresistance district
It is spiral-shaped that territory and white space are respectively one of them son；And for example, the spiral-shaped and/or each son of each son spiral-shaped it
Between be respectively present part black matrix".
It should be noted that according to practical situation, colored filter 10 also includes protective layer.Such as, alignment film, protection
The order stacking of layer, substrate is arranged, and black matrix", photoresist layer are between protective layer and substrate.In such manner, it is possible to fill light further
Gap between adjacent photoresistance in resistance layer 300, so order to arrange the surface of chock insulator matter 500 more smooth.
Further, in the present embodiment, luminous intensity distribution film is the luminous intensity distribution film of light orientation, and the thickness of alignment film 400 is 0.7 micro-
Rice～2.5 microns, such as, thickness is 1 micron, 1.5 microns etc..
Light orientation is to utilize the ultraviolet light of linear polar biased to be radiated at the high molecular polymer alignment film 400 with photosensitizer
On so that high molecular polymer has orientation ability, compares friction matching and substrate 100 surface can be avoided to produce because of contact
Pollute and electrostatic.
Further, in the present embodiment, chock insulator matter 500 is arranged on the region of the corresponding black matrix" 200 of alignment film 400.
It is also understood that chock insulator matter 500 is arranged on black matrix" 200 by alignment film 400, so, make chock insulator matter 500 more steady
Fixed.
Display module, including any of the above-described colored filter 10 that box is arranged and array base palte 100, concrete, battle array
It is filled with liquid crystal layer between row substrate 100 and colored filter 10.Owing to the display panels of the present embodiment have employed above-mentioned
The technical scheme of colored filter 10, therefore this display module has the above-mentioned all of beneficial effect of colored filter 10.
Display device, including above-mentioned display module.Such as, display device is mobile phone, panel computer etc..
The manufacture method of colored filter, comprises the steps:
Step 201, on substrate formed black matrix".
In the present embodiment, substrate can use the transparency carriers such as glass substrate, quartz base plate and plastic base, preferably
, substrate is glass substrate, and before being put into by glass substrate, is cleaned glass baseplate surface processing, it is ensured that glass
Substrate surface foreign.
Specifically, on substrate, first coat blacking layer, then by mask plate, blacking layer is exposed, shows
Shadow, solidification, with the black matrix" formed.Wherein, the thickness of black matrix" is according to actual production requirements set, such as, and black square
The thickness of battle array is 1.0～1.7 microns, and and for example, the thickness of black matrix" is 1.5 microns.
Step 202, on substrate formed photoresist layer, and photoresist layer part cover black matrix".
Specifically, on substrate, coating has the coating of colored quantum dot, is exposed coating by mask plate, develops
And solidification, form photoresist layer.Wherein, red or green quantum dot is dissolved in acrylic coating, initiator or firming agent etc.
After in organic solvent, form the coating with colored quantum dot.
Further, substrate coats the encrimson of uniform thickness, by mask plate, encrimson is exposed, shows
Shadow.Such as, concrete, the viewing area of mask plate is provided with patterned patterned layer, it is preferred that encrimson is negative photo
Glue, i.e. solidify to form insoluble matter after illumination, so, through development, can retain encrimson pattern, discontinuous to be formed
The red photoresistance district of distribution.On substrate, coat green coating afterwards, exposed by mask plate, develop, formed in viewing area
The green photoresistance district of discontinuous distribution.
It should be noted that reserved white space on substrate so that blue-light source from therebetween by time formed and keep indigo plant
Light.
Step 203, on the substrate being formed with black matrix" and photoresist layer formed alignment film, and alignment film cover black square
Battle array and photoresist layer.
Concrete, black matrix" and photoresist layer coat alignment film.
Step 204, on alignment film, form multiple chock insulator matter.
Concrete, coated with resins layer on alignment film, exposed by mask plate, develop, multiple to be formed on alignment film
The chock insulator matter at interval.Wherein, chock insulator matter is formed at alignment film and correspond to the top of black matrix".
Such as, the altitude range of chock insulator matter is 2～4.5 microns.
In the present embodiment, chock insulator matter can be made as multiple applicable shape, such as cone, cylinder according to actual needs
Body, cuboid etc., it is preferred that the base area of chock insulator matter is less than the area of black matrix".Chock insulator matter can also be according to hardness need
Seek employing material of different nature.
In the present embodiment, after forming chock insulator matter, irradiate alignment film by ultraviolet light, with to alignment film orientation.According to reality
Need, it is also possible to after forming alignment film, before the step 204 alignment film is carried out orientation.
It should be noted that according to practical situation, after step 202, before step 203, this method also includes walking as follows
Suddenly,
Step 205, on the substrate being formed with black matrix" and photoresist layer formed protective layer.
Specifically, black matrix" and photoresist layer coat transparent resin layer, to form protective layer.Such as, protective layer is adopted
Make with transparent material.In the present embodiment, the thickness of protective layer is 1～3 micron.Protective layer can protect photoresistance further
Layer.
Now, the alignment film of step 203, be arranged on substrate by protective layer, i.e. alignment film is formed on protective layer.
According to practical situation, it is also possible to omit step 205.
Each technical characteristic of embodiment described above can combine arbitrarily, for making description succinct, not to above-mentioned reality
The all possible combination of each technical characteristic executed in example is all described, but, as long as the combination of these technical characteristics is not deposited
In contradiction, all it is considered to be the scope that this specification is recorded.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed, but also
Can not therefore be construed as limiting the scope of the patent.It should be pointed out that, come for those of ordinary skill in the art
Saying, without departing from the inventive concept of the premise, it is also possible to make some deformation and improvement, these broadly fall into the protection of the present invention
Scope.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. a colored filter, it is characterised in that including: substrate, the black matrix" being formed on described substrate, be arranged at institute
State on substrate and part covers the photoresist layer of described black matrix", stacking is arranged on described substrate and covers described black matrix"
With the alignment film of described photoresist layer, and multiple chock insulator matters being arranged on described alignment film, multiple described chock insulator matters interval sets
Put.
Colored filter the most according to claim 1, it is characterised in that described photoresist layer includes red photoresistance region, green
Coloured light resistance region and white space, described alignment film covers and fills described white space.
Colored filter the most according to claim 2, it is characterised in that described red photoresistance region, described green photoresistance
Region is quantum dot photoresistance region.
Colored filter the most according to claim 1, it is characterised in that described photoresist layer includes red photoresistance region, green
Coloured light resistance region and blue light resistance region.
Colored filter the most according to claim 1, it is characterised in that described colored filter also includes protective layer, institute
Stating alignment film, described protective layer, the order stacking setting of described substrate, described black matrix", described photoresist layer are positioned at described protection
Between layer and described substrate.
Colored filter the most according to claim 1, it is characterised in that it is corresponding that described chock insulator matter is arranged at described alignment film
On the region of described black matrix".
Colored filter the most according to claim 1, it is characterised in that the thickness of described alignment film is 0.7 micron～2.5
Micron.
8. a display module, it is characterised in that include the colored filter described in claim 1 to 7 any one.
9. a display device, it is characterised in that include the display module described in claim 8.
10. the manufacture method of a colored filter, it is characterised in that comprise the steps:
Substrate is formed black matrix"；
Form photoresist layer on the substrate, and described photoresist layer part covers described black matrix"；
The described substrate being formed with described black matrix" and described photoresist layer is formed alignment film, and described alignment film covers institute
State black matrix" and described photoresist layer；
Described alignment film is formed multiple chock insulator matter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610617514.0A CN106226945A (en) | 2016-07-29 | 2016-07-29 | Colored filter and preparation method thereof, display module and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610617514.0A CN106226945A (en) | 2016-07-29 | 2016-07-29 | Colored filter and preparation method thereof, display module and display device |
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|---|---|
| CN106226945A true CN106226945A (en) | 2016-12-14 |
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| CN201610617514.0A Pending CN106226945A (en) | 2016-07-29 | 2016-07-29 | Colored filter and preparation method thereof, display module and display device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110262117A (en) * | 2019-06-28 | 2019-09-20 | 厦门天马微电子有限公司 | A kind of color membrane substrates, display panel and display device |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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