CN106185893B - A kind of application for breathing graphene film in light stability is detected - Google Patents
A kind of application for breathing graphene film in light stability is detected Download PDFInfo
- Publication number
- CN106185893B CN106185893B CN201610523338.4A CN201610523338A CN106185893B CN 106185893 B CN106185893 B CN 106185893B CN 201610523338 A CN201610523338 A CN 201610523338A CN 106185893 B CN106185893 B CN 106185893B
- Authority
- CN
- China
- Prior art keywords
- graphene
- graphene film
- breathable
- graphite
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 167
- 229910021389 graphene Inorganic materials 0.000 title claims abstract description 113
- 230000029058 respiratory gaseous exchange Effects 0.000 title description 7
- 229910002804 graphite Inorganic materials 0.000 claims description 47
- 239000010439 graphite Substances 0.000 claims description 47
- 238000006243 chemical reaction Methods 0.000 claims description 25
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 21
- 239000000243 solution Substances 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 claims description 16
- 239000012286 potassium permanganate Substances 0.000 claims description 15
- 238000003756 stirring Methods 0.000 claims description 15
- 238000009826 distribution Methods 0.000 claims description 12
- 239000012634 fragment Substances 0.000 claims description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 10
- 239000012298 atmosphere Substances 0.000 claims description 10
- 239000011261 inert gas Substances 0.000 claims description 10
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 8
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 8
- 239000005457 ice water Substances 0.000 claims description 8
- PEDCQBHIVMGVHV-UHFFFAOYSA-N glycerol group Chemical group OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 7
- 239000011259 mixed solution Substances 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 4
- 239000012752 auxiliary agent Substances 0.000 claims description 4
- 239000003638 chemical reducing agent Substances 0.000 claims description 4
- 239000003085 diluting agent Substances 0.000 claims description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 4
- 238000001132 ultrasonic dispersion Methods 0.000 claims description 4
- 239000004202 carbamide Substances 0.000 claims description 3
- 230000021615 conjugation Effects 0.000 claims description 3
- 230000007547 defect Effects 0.000 claims description 3
- 235000011187 glycerol Nutrition 0.000 claims description 3
- 229910017053 inorganic salt Inorganic materials 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical group [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 claims description 2
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 claims description 2
- 239000004156 Azodicarbonamide Substances 0.000 claims description 2
- 229920001661 Chitosan Polymers 0.000 claims description 2
- 108010010803 Gelatin Proteins 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- 235000012538 ammonium bicarbonate Nutrition 0.000 claims description 2
- 239000001099 ammonium carbonate Substances 0.000 claims description 2
- XOZUGNYVDXMRKW-AATRIKPKSA-N azodicarbonamide Chemical compound NC(=O)\N=N\C(N)=O XOZUGNYVDXMRKW-AATRIKPKSA-N 0.000 claims description 2
- 235000019399 azodicarbonamide Nutrition 0.000 claims description 2
- 239000001913 cellulose Substances 0.000 claims description 2
- 229920002678 cellulose Polymers 0.000 claims description 2
- 230000008859 change Effects 0.000 claims description 2
- 238000007865 diluting Methods 0.000 claims description 2
- 239000008273 gelatin Substances 0.000 claims description 2
- 229920000159 gelatin Polymers 0.000 claims description 2
- 235000019322 gelatine Nutrition 0.000 claims description 2
- 235000011852 gelatine desserts Nutrition 0.000 claims description 2
- 229940113115 polyethylene glycol 200 Drugs 0.000 claims description 2
- 229940068918 polyethylene glycol 400 Drugs 0.000 claims description 2
- 229920002635 polyurethane Polymers 0.000 claims description 2
- 239000004814 polyurethane Substances 0.000 claims description 2
- 150000003384 small molecules Chemical class 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims 1
- 230000037303 wrinkles Effects 0.000 claims 1
- 230000023077 detection of light stimulus Effects 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 12
- 239000013078 crystal Substances 0.000 description 11
- 239000007789 gas Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 235000012431 wafers Nutrition 0.000 description 9
- 125000000524 functional group Chemical group 0.000 description 7
- 239000012528 membrane Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000001914 filtration Methods 0.000 description 4
- 230000008439 repair process Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 241000219000 Populus Species 0.000 description 1
- LUTSRLYCMSCGCS-BWOMAWGNSA-N [(3s,8r,9s,10r,13s)-10,13-dimethyl-17-oxo-1,2,3,4,7,8,9,11,12,16-decahydrocyclopenta[a]phenanthren-3-yl] acetate Chemical compound C([C@@H]12)C[C@]3(C)C(=O)CC=C3[C@@H]1CC=C1[C@]2(C)CC[C@H](OC(=O)C)C1 LUTSRLYCMSCGCS-BWOMAWGNSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000003113 dilution method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 229960005150 glycerol Drugs 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 239000002135 nanosheet Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Electromagnetism (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
本发明公开了一种可呼吸石墨烯膜在检测光强稳定性中的应用,所述应用通过检测可呼吸石墨烯膜的电磁屏蔽性能来实现,可呼吸石墨烯膜的电磁屏蔽性能数据越不稳定,光强稳定性越低。具有导热性能(1800‑2600 W/mK)的可呼吸石墨烯膜在光照下快速升温膨胀,屏蔽效能提高。通过该石墨烯膜可实现对光强稳定性的高灵敏度检测。The invention discloses an application of a breathable graphene film in detecting light intensity stability. The application is realized by detecting the electromagnetic shielding performance of the breathable graphene film. The lower the electromagnetic shielding performance data of the breathable graphene film Stable, the lower the light intensity stability. The breathable graphene film with thermal conductivity (1800‑2600 W/mK) expands rapidly under light irradiation, and the shielding effect is improved. High-sensitivity detection of light intensity stability can be realized through the graphene film.
Description
技术领域technical field
本发明涉及新型导热、吸波以及电磁屏蔽材料的应用,尤其涉及一种可呼吸石墨烯膜在检测光强稳定性中的应用。The invention relates to the application of novel heat conduction, wave absorption and electromagnetic shielding materials, in particular to the application of a breathable graphene film in the detection of light intensity stability.
背景技术Background technique
2010年,英国曼彻斯特大学的两位教授Andre GeiM和Konstantin Novoselov因为首次成功分离出稳定的石墨烯获得诺贝尔物理学奖,掀起了全世界对石墨烯研究的热潮。石墨烯有优异的电学性能(室温下电子迁移率可达2×105cM2/Vs),突出的导热性能(5000W/(MK),超常的比表面积(2630 M2/g),其杨氏模量(1100GPa)和断裂强度(125GPa)。石墨烯优异的导电导热性能完全超过金属,同时石墨烯具有耐高温耐腐蚀的优点,而其良好的机械性能和较低的密度更让其具备了在电热材料领域取代金属的潜力。In 2010, two professors Andre GeiM and Konstantin Novoselov from the University of Manchester won the Nobel Prize in Physics for their first successful separation of stable graphene, which set off a wave of research on graphene around the world. Graphene has excellent electrical properties (electron mobility up to 2×10 5 cM 2 /Vs at room temperature), outstanding thermal conductivity (5000W/(MK), extraordinary specific surface area (2630 M 2 /g), and its poplar Modulus (1100GPa) and breaking strength (125GPa). The excellent electrical and thermal conductivity of graphene completely exceeds that of metals. At the same time, graphene has the advantages of high temperature resistance and corrosion resistance, and its good mechanical properties and low density make it more The potential to replace metals in the field of electrothermal materials.
宏观组装氧化石墨烯或者石墨烯纳米片的石墨烯膜是纳米级石墨烯的主要应用形式。通过进一步的高温处理,能够修补石墨烯的缺陷,能够有效的提高石墨烯膜的导电性和热导性,可以广泛应用于智能手机、智能随身硬件、平板电脑、笔记本电脑等高散热需求随身电子设备中去。Graphene films with macroscopically assembled graphene oxide or graphene nanosheets are the main application forms of nanoscale graphene. Through further high-temperature treatment, the defects of graphene can be repaired, and the electrical conductivity and thermal conductivity of the graphene film can be effectively improved. It can be widely used in portable electronics with high heat dissipation requirements such as smartphones, smart portable hardware, tablet computers, and notebook computers. device.
目前石墨烯膜的应用限制于独立的功能性材料,例如导热膜、导电膜、吸波膜、屏蔽膜。单一的功能明显不能满足未来科技进步复杂的需求。为此,我们利用超大片无碎片石墨烯做基底设计了可呼吸石墨烯膜,一呼一吸之间完成导热导电和吸波屏蔽之间功能的转换。为多功能器件的设计提供的新的思路。At present, the application of graphene films is limited to independent functional materials, such as thermally conductive films, conductive films, wave absorbing films, and shielding films. A single function obviously cannot meet the complex needs of future technological progress. To this end, we designed a breathable graphene film using super-large pieces of fragment-free graphene as the substrate, and completed the function conversion between thermal conduction and wave-absorbing shielding between exhalation and inhalation. It provides new ideas for the design of multifunctional devices.
发明内容Contents of the invention
本发明的目的是克服现有技术的不足,提供一种可呼吸石墨烯膜在检测光强稳定性中的应用。The purpose of the present invention is to overcome the deficiencies of the prior art and provide an application of a breathable graphene film in detecting light intensity stability.
本发明的目的是通过以下技术方案实现的:一种可呼吸石墨烯膜在检测光强稳定性中的应用,所述应用通过检测可呼吸石墨烯膜的电磁屏蔽性能来实现,可呼吸石墨烯膜的电磁屏蔽性能数据越不稳定,光强稳定性越低。所述可呼吸石墨烯膜由平面取向的平均尺寸大于100μm的石墨烯片通过ππ共轭作用相互搭接而成。其中包含由1-4层石墨烯片构成的石墨烯结构。且石墨烯片的缺陷极少,其ID/TG<0.01。The purpose of the present invention is achieved through the following technical solutions: a kind of application of breathable graphene film in detecting light intensity stability, said application is realized by detecting the electromagnetic shielding performance of breathable graphene film, breathable graphene The more unstable the electromagnetic shielding performance data of the film, the lower the light intensity stability. The breathable graphene film is composed of planarly oriented graphene sheets with an average size larger than 100 μm, which are overlapped by ππ conjugation. It contains a graphene structure composed of 1-4 layers of graphene sheets. And the graphene sheet has very few defects, and its I D /T G <0.01.
进一步地,所述可呼吸石墨烯膜的制备方法如下:Further, the preparation method of the breathable graphene film is as follows:
(1)将平均尺寸大于100μm的氧化石墨烯配制成浓度为6~30mg/mL氧化石墨烯水溶液,在溶液中加入质量分数0.1-5%的助剂(即助剂在溶液中的质量分数为0.1-5%),所述助剂为无机盐、有机小分子或高分子;超声分散后,倒在模具板上烘干成氧化石墨烯膜,然后用还原剂进行还原;(1) Graphene oxide with an average size greater than 100 μm is formulated into a graphene oxide aqueous solution with a concentration of 6 to 30 mg/mL, and an auxiliary agent with a mass fraction of 0.1-5% is added in the solution (that is, the mass fraction of the auxiliary agent in the solution is 0.1-5%), the additives are inorganic salts, organic small molecules or macromolecules; after ultrasonic dispersion, pour it on the mold plate and dry it into a graphene oxide film, and then reduce it with a reducing agent;
(2)将还原后的石墨烯薄膜在惰性气体氛围下先以0.1-0.5℃/min的速率升温到500-700℃,保温0.5-2h;(2) Heating the reduced graphene film to 500-700°C at a rate of 0.1-0.5°C/min in an inert gas atmosphere, and keeping it warm for 0.5-2h;
(3)在惰性气体氛围下以1-3℃/min的速率升温到1000-1200℃,保温 0.5-3h;(3) Raise the temperature to 1000-1200°C at a rate of 1-3°C/min in an inert gas atmosphere, and keep it warm for 0.5-3h;
(4)在惰性气体氛围下以5-8℃/min的速率升温到2500-3000℃,保温 0.5-4h,自然降温后即可得到多孔的可呼吸石墨烯膜。(4) Raise the temperature to 2500-3000°C at a rate of 5-8°C/min in an inert gas atmosphere, keep it warm for 0.5-4h, and naturally cool down to obtain a porous breathable graphene film.
所述的无机盐选自碳酸氢铵、尿素、硫脲、偶氮二甲酰胺;有机小分子选自甘油、聚乙二醇200、聚乙二醇400;高分子选自纤维素、明胶、壳聚糖、水性聚氨酯、丙烯酸乳液等。Described inorganic salt is selected from ammonium bicarbonate, urea, thiourea, azodicarbonamide; Small organic molecule is selected from glycerol, polyethylene glycol 200, polyethylene glycol 400; Macromolecule is selected from cellulose, gelatin, Chitosan, water-based polyurethane, acrylic emulsion, etc.
所述步骤1中平均尺寸大于100μ m 的氧化石墨烯通过以下方法得到:The graphene oxide with an average size greater than 100 μm in the step 1 is obtained by the following method:
(1)将Modified-Hummer法获得的氧化石墨片的反应液稀释后,于140目的网筛进行过滤,得到过滤产物;(1) After diluting the reaction solution of the graphite oxide sheet obtained by the Modified-Hummer method, filter at 140 mesh sieves to obtain a filter product;
(2)将步骤1获得的过滤产物于冰水按照体积比1:10混合均匀后,静置 2h,逐滴加入双氧水(H2O2的质量分数为30%),直到混合液的颜色不再改变(即混合液中的高锰酸钾已完全去除);(2) After mixing the filtered product obtained in step 1 with ice water according to the volume ratio of 1:10, let it stand for 2 hours, and add hydrogen peroxide (H 2 O 2 mass fraction is 30%) dropwise until the color of the mixed solution changes. Change again (that is, the potassium permanganate in the mixed solution has been completely removed);
(3)向步骤2处理后的混合液中逐滴加入浓盐酸(浓度为12mol/L),直到絮状的氧化石墨消失,再用140目的网筛过滤出氧化石墨晶片;(3) Add concentrated hydrochloric acid (concentration is 12mol/L) dropwise in the mixed solution after step 2 treatment, until the flocculent graphite oxide disappears, then filter out the graphite oxide wafer with 140 mesh screens;
(4)将步骤3获得的氧化石墨晶片置于摇床中,20~80转/min,震荡洗涤,使得氧化石墨晶片剥离,得到无碎片超大片的氧化石墨烯,平均尺寸大于100 μ m ,分布系数在0.2-0.5之间。(4) Place the graphite oxide wafer obtained in step 3 in a shaking table, 20 to 80 rpm, shake and wash, so that the graphite oxide wafer is peeled off, and a large sheet of graphene oxide without fragments is obtained, with an average size greater than 100 μm, The distribution coefficient is between 0.2-0.5.
所述步骤1中的Modified-Hummer法具体为:在-10℃下,将高锰酸钾充分溶解于质量分数为98%的浓硫酸中,加入石墨,60转/分钟搅拌2h后停止搅拌,在低温(-10-20℃)下反应6-48h,得到宽分布的氧化石墨片反应液;所述的石墨、高锰酸钾与浓硫酸质量体积比为:1g:2-4g:30-40ml,石墨的粒度大于 150μm。The Modified-Hummer method in the step 1 is specifically: at -10°C, fully dissolve potassium permanganate in concentrated sulfuric acid with a mass fraction of 98%, add graphite, stir at 60 rpm for 2 hours, and then stop stirring. React at low temperature (-10-20°C) for 6-48h to obtain a wide distribution of graphite oxide flake reaction solution; the mass volume ratio of graphite, potassium permanganate and concentrated sulfuric acid is: 1g: 2-4g: 30- 40ml, the particle size of graphite is greater than 150μm.
所述网筛为钛合金等耐酸网筛。The mesh screen is an acid-resistant mesh screen such as titanium alloy.
所述步骤1中,氧化石墨片的反应液通过浓硫酸等稀释剂进行稀释,稀释剂的体积为反应液体积的1-10倍。In the step 1, the reaction solution of the graphite oxide sheet is diluted with a diluent such as concentrated sulfuric acid, and the volume of the diluent is 1-10 times the volume of the reaction solution.
本发明阐述了一种可在导热性能和电磁屏蔽性能之间转换的多功能石墨烯膜的新应用,并该石墨烯膜由平面取向的平均尺寸大于100μm的石墨烯片通过ππ共轭作用相互搭接而成。大共轭结构保证了石墨烯之间的通路的畅通,且 1-4层石墨烯片构成的石墨烯结构的引入,极大的提升了材料的导电性能;在未搭接处,石墨烯片与片之间形成空腔,当石墨烯膜置于高强度的光照下,通过石墨烯快速导热,使得其腔内气体快速升温膨胀,另一方面,高温下,褶皱本身有舒展的趋势,同时,在气体膨胀作用下,腔壁的褶皱被气体撑开,逐渐变得光滑;大空腔、光滑腔壁辅助以较好的导电性能,使其膜具有极强的电磁屏蔽性能。光照强度越高,电磁屏蔽性能越好。当需要重复利用时,采用高压条件将微气囊进行压缩即可。The present invention describes a new application of a multifunctional graphene film that can switch between thermal conductivity and electromagnetic shielding performance, and the graphene film is composed of planarly oriented graphene sheets with an average size greater than 100 μm interacting through ππ conjugation Lap made. The large conjugated structure ensures the smooth passage between graphene, and the introduction of the graphene structure composed of 1-4 layers of graphene sheets greatly improves the electrical conductivity of the material; A cavity is formed between the sheet and the sheet. When the graphene film is placed under high-intensity light, the graphene conducts heat rapidly, causing the gas in the cavity to heat up and expand rapidly. On the other hand, at high temperatures, the folds themselves tend to stretch, and at the same time , Under the action of gas expansion, the folds of the cavity wall are stretched by the gas and gradually become smooth; the large cavity and smooth cavity wall are assisted by good electrical conductivity, so that the film has a strong electromagnetic shielding performance. The higher the light intensity, the better the electromagnetic shielding performance. When it needs to be reused, the micro-airbag can be compressed under high pressure.
附图说明Description of drawings
图1为过滤前的氧化石墨晶体(左),过滤后的氧化石墨晶体(右)。Figure 1 shows graphite oxide crystals before filtration (left), and graphite oxide crystals after filtration (right).
图2为过滤前的氧化石墨烯(左),过滤后的氧化石墨烯(右)。Figure 2 shows graphene oxide before filtration (left) and graphene oxide after filtration (right).
图3为50度下反应得到的氧化石墨烯。Figure 3 is graphene oxide obtained by reaction at 50 degrees.
图4为50度下反应得到的氧化石墨烯尺寸分布(左),20度下反应得到的氧化石墨烯尺寸分布(右)。Figure 4 shows the size distribution of graphene oxide obtained by reaction at 50 degrees (left), and the size distribution of graphene oxide obtained by reaction at 20 degrees (right).
图5为可呼吸石墨烯膜呼和吸状态下截面图。Fig. 5 is a cross-sectional view of the breathable graphene membrane in the breathing and breathing state.
图6为不同功率光照下的电磁屏蔽曲线图。Fig. 6 is a curve diagram of electromagnetic shielding under illumination with different powers.
具体实施方式detailed description
本发明通过使用超大片氧化石墨烯成膜,其中平面取向的平均尺寸大于 100μm的石墨烯片在构成本发明石墨烯膜的过程中有着重要作用,本发明在氧化石墨晶体水洗之前,采用网筛分离的办法,将碎片分离出。并采用10倍以上体积的冰水进行稀释,使得其晶片不会因硫酸的溶解热而得到破坏。进一步采用摇床震荡洗涤,使得氧化石墨烯片层在剥离的时候避免了机械力的破碎。进一步地,本发明还通过低温条件制备石墨烯片,在低温下,高锰酸钾氧化性比较弱,其自分解产生氧气的速率比较慢,因此气体对氧化石墨晶体的破碎作用就很弱,使得大片层的氧化石墨烯得以保存。而且反应过程以及清洗过程中没有剧烈的搅拌和超声过程,因此片层基本上没有破碎。综合以上几点,我们得到了超大片的无碎片的氧化石墨烯,,平均尺寸大于87μ m ,分布系数在0.2-0.5 之间,碎片含量低于1%。The present invention forms a film by using super large sheets of graphene oxide, in which graphene sheets with an average size of plane orientation greater than 100 μm play an important role in the process of forming the graphene film of the present invention. Before the graphite oxide crystals are washed with water, the present invention uses a mesh screen The method of separation is to separate the fragments. And use more than 10 times the volume of ice water to dilute, so that the wafer will not be damaged by the heat of dissolution of sulfuric acid. Further use of a shaker to shake and wash, so that the graphene oxide sheet avoids mechanical crushing when it is peeled off. Further, the present invention also prepares graphene sheets by low temperature conditions. At low temperatures, potassium permanganate has relatively weak oxidizing properties, and its self-decomposition produces oxygen at a relatively slow rate, so the fragmentation effect of gas on graphite oxide crystals is very weak. This allows large sheets of graphene oxide to be preserved. Moreover, there is no vigorous stirring and ultrasonic process in the reaction process and the cleaning process, so the sheet is basically not broken. Based on the above points, we obtained a super-large sheet of non-fragmented graphene oxide, with an average size greater than 87 μm, a distribution coefficient between 0.2-0.5, and a fragment content of less than 1%.
下面结合附图及实施例对本发明作进一步的描述。本实施例只用于对本发明做进一步的说明,不能理解为对本发明保护范围的限制,本领域的技术人员根据上述发明的内容做出一些非本质的改变和调整,均属于本发明的保护范围。The present invention will be further described below in conjunction with the accompanying drawings and embodiments. This embodiment is only used to further illustrate the present invention, and should not be understood as limiting the protection scope of the present invention. Those skilled in the art make some non-essential changes and adjustments according to the content of the above invention, which all belong to the protection scope of the present invention .
实施例1:无碎片超大片的氧化石墨烯的制备Example 1: Preparation of Graphene Oxide without Fragmentary Super Large Sheets
实施例1-1Example 1-1
(1)在-10℃下将高锰酸钾缓慢加入到快速搅动的浓硫酸中,待充分溶解后,加入石墨,60转/分钟缓慢搅拌2h后停止搅拌,在20℃、50℃下分别反应 6h,分别得到宽分布的氧化石墨晶体;如图1所示,两种温度下得到的氧化石墨晶片中均存在较多的碎片,这使得其对应的氧化石墨烯同样有很多的碎片(图 2)。(1) Slowly add potassium permanganate into the rapidly stirring concentrated sulfuric acid at -10°C. After fully dissolving, add graphite, stir slowly at 60 rpm for 2 hours, then stop stirring. React 6h, obtain the graphite oxide crystal of wide distribution respectively; As shown in Figure 1, all there are more fragments in the graphite oxide wafer that obtains under two kinds of temperatures, this makes its corresponding graphene oxide have a lot of fragments equally (Fig. 2).
(2)将步骤1得到的反应液用浓硫酸稀释(稀释倍数可以为任意倍数,本实施例稀释了10倍左右),并用150μ m 孔径(140目)的钛合金网筛将氧化石墨晶体过滤出来(反应液回收),并缓慢倒入快速搅拌的相对于过滤产物10倍体积的冰水中,静置2h,缓慢加入H2O2,以除去反应中多余的高锰酸钾,加入适量的盐酸直到絮状氧化石墨消失,再用钛合金网筛(140目)过滤出氧化石墨晶片;摇床缓慢震荡洗涤,得到无碎片超大片的氧化石墨烯(平均尺寸为87μ m ,分布系数为0.5)。石墨、高锰酸钾与浓硫酸质量体积比为:1g:2g:40ml,石墨的粒度为200μ m 。(2) the reaction solution obtained in step 1 is diluted with concentrated sulfuric acid (the dilution factor can be any multiple, and the present embodiment has diluted about 10 times), and the graphite oxide crystal is filtered with a titanium alloy mesh sieve with a 150 μm aperture (140 orders) out (recovery of the reaction solution), and slowly pour into rapidly stirred ice water 10 times the volume of the filtered product, let it stand for 2 hours, slowly add H 2 O 2 , to remove excess potassium permanganate in the reaction, add an appropriate amount of Hydrochloric acid until the flocculent graphite oxide disappears, and then filter the graphite oxide wafer with a titanium alloy mesh sieve (140 mesh); the shaking table is slowly oscillating and washed to obtain a large sheet of graphene oxide without fragments (the average size is 87 μ m, and the distribution coefficient is 0.5 ). The mass volume ratio of graphite, potassium permanganate and concentrated sulfuric acid is: 1g:2g:40ml, and the particle size of graphite is 200μm.
如图3所示,高温50度下反应后分离出的氧化石墨晶片分离后洗涤得到的氧化石墨烯同样有很多的碎片;从图4可以看出,低温下(20℃)反应分离后的大片氧化石墨烯尺寸分布更加均匀集中,碎片含量极少。As shown in Figure 3, the graphite oxide wafer separated after the reaction at a high temperature of 50 degrees is separated and the graphene oxide obtained after washing has a lot of fragments; The size distribution of graphene oxide is more uniform and concentrated, and the fragment content is very small.
实施例1-2Example 1-2
在-10℃下将高锰酸钾缓慢加入到快速搅动的浓硫酸中,待充分溶解后,加入石墨,60转/分钟缓慢搅拌2h后停止搅拌,在低温(0℃、)下反应48h,得到反应液;将反应液分别用质量分数98%以上的浓硫酸、质量分数为10%的稀硫酸进行稀释,然后用150μ m 孔径的钛合金网筛将氧化石墨晶体过滤出来(反应液回收),并缓慢倒入快速搅拌的相对于过滤产物10倍体积的冰水中,静置2h,缓慢加入H2O2,以除去反应中多余的高锰酸钾,加入适量的盐酸直到絮状氧化石墨消失,再用钛合金网筛过滤出氧化石墨晶片;摇床缓慢震荡洗涤,得到反应产物。石墨、高锰酸钾与浓硫酸质量体积比为:1:4g:30ml;石墨的粒度为 500μ m 。Slowly add potassium permanganate into the rapidly stirring concentrated sulfuric acid at -10°C. After fully dissolving, add graphite, stir slowly at 60 rpm for 2 hours, stop stirring, and react at low temperature (0°C,) for 48 hours. Obtain the reaction solution; the reaction solution is diluted with concentrated sulfuric acid with a mass fraction of more than 98% and dilute sulfuric acid with a mass fraction of 10% respectively, and then the graphite oxide crystals are filtered out with a titanium alloy mesh sieve with a pore size of 150 μm (recovery of the reaction solution) , and slowly poured into rapidly stirred ice water 10 times the volume of the filtered product, let it stand for 2 hours, slowly added H 2 O 2 , to remove excess potassium permanganate in the reaction, and added an appropriate amount of hydrochloric acid until flocculent graphite oxide Disappeared, and then filtered out the graphite oxide wafers with a titanium alloy sieve; the shaker was slowly oscillating and washed to obtain the reaction product. The mass volume ratio of graphite, potassium permanganate and concentrated sulfuric acid is: 1:4g:30ml; the particle size of graphite is 500μm.
采用浓硫酸稀释,反应得到的无碎片超大片的氧化石墨烯(平均尺寸为98 μ m ,分布系数在0.4),而用稀硫酸稀释,得到的产物中含有大量碎片,尺寸分布系数超过100%。这是由于稀硫酸稀释过程中,大量放热,破坏了氧化石墨晶体。Diluted with concentrated sulfuric acid, the reaction obtained non-fragmented super large graphene oxide (average size is 98 μm, distribution coefficient at 0.4), and diluted with dilute sulfuric acid, the obtained product contains a large number of fragments, and the size distribution coefficient exceeds 100% . This is due to the large amount of heat released during the dilution process of dilute sulfuric acid, which destroys the graphite oxide crystals.
实施例1-3Example 1-3
在-10℃下将高锰酸钾缓慢加入到快速搅动的浓硫酸中,待充分溶解后,加入石墨,60转/分钟缓慢搅拌2h后停止搅拌,在低温(20℃)下反应28h,得到宽分布的氧化石墨晶体;将反应液用浓硫酸稀释并用150μ m 孔径的钛合金网筛将氧化石墨晶体过滤出来(反应液回收),并分别缓慢倒入快速搅拌的相对于过滤产物5倍体积、8倍体积、10倍体积的冰水中,静置2h,缓慢加入H2O2,以除去反应中多余的高锰酸钾,加入适量的盐酸直到絮状氧化石墨消失,再用钛合金网筛过滤出氧化石墨晶片;摇床缓慢震荡洗涤,得到反应产物;石墨、高锰酸钾与浓硫酸质量体积比为:1:5g:34ml,石墨的粒度为2mm。Slowly add potassium permanganate into the rapidly stirring concentrated sulfuric acid at -10°C. After fully dissolving, add graphite, stir slowly at 60 rpm for 2 hours, stop stirring, and react at low temperature (20°C) for 28 hours to obtain Widely distributed graphite oxide crystals; the reaction solution is diluted with concentrated sulfuric acid and the graphite oxide crystals are filtered out (reaction solution recovery) with a titanium alloy mesh screen with a pore size of 150 μm, and slowly poured into rapidly stirring 5 times the volume of the filtered product , 8 times the volume, 10 times the volume of ice water, let it stand for 2 hours, slowly add H 2 O 2 , to remove excess potassium permanganate in the reaction, add an appropriate amount of hydrochloric acid until the flocculent graphite oxide disappears, and then use a titanium alloy mesh Graphite oxide wafers were filtered out by sieve; the shaker was shaken and washed slowly to obtain the reaction product; the mass volume ratio of graphite, potassium permanganate and concentrated sulfuric acid was 1:5g:34ml, and the particle size of graphite was 2mm.
实验结果显示,5倍体积和8倍体积的冰水均不能的得到尺寸均一的石墨烯片,在10倍体积下才能得到无碎片超大片的氧化石墨烯(平均尺寸为92μ m ,分布系数在0.2)。由此可知,冰水的量过低,将使得混合热集中释放,破坏晶体结构。Experimental results show that 5 times the volume and 8 times the volume of ice water cannot obtain graphene sheets with uniform size, and only 10 times the volume can obtain graphene oxide with no fragments and super large sheets (the average size is 92 μ m, and the distribution coefficient is in 0.2). It can be seen that if the amount of ice water is too low, the heat of mixing will be released intensively and the crystal structure will be destroyed.
实施例2:采用实施例1制备得到的无碎片超大片的氧化石墨烯制备可呼吸的石墨烯膜。Embodiment 2: Using the non-fragmented super large sheet of graphene oxide prepared in embodiment 1 to prepare a breathable graphene film.
将平均尺寸大于100μ m 的氧化石墨烯配制成浓度为28mg/mL氧化石墨烯水溶液,在溶液中加入质量分数5.4%尿素,经过超声分散后倒在模具板上烘干成氧化石墨烯膜,然后用碘化氢还原剂进行还原;还原后的石墨烯薄膜在惰性气体氛围下按照表1~表3所示的热处理方式进行三步热处理;自然降温后即可得到厚度为1mm的多孔石墨烯薄膜。将石墨烯薄膜在高压下压制即可得超柔性高导热石墨烯膜。所述的压制过程压力为200MP,时间为300h。Graphene oxide with an average size greater than 100 μm is prepared into a concentration of 28mg/mL graphene oxide aqueous solution, adding mass fraction 5.4% urea in the solution, after ultrasonic dispersion, it is poured on the mold plate and dried to form a graphene oxide film, and then Reduction with a hydrogen iodide reducing agent; the reduced graphene film is subjected to three-step heat treatment in an inert gas atmosphere according to the heat treatment methods shown in Table 1 to Table 3; after natural cooling, a porous graphene film with a thickness of 1mm can be obtained . The graphene film is pressed under high pressure to obtain an ultra-flexible and highly thermally conductive graphene film. The pressure of the pressing process is 200MP, and the time is 300h.
将上述所得的石墨烯膜在50MP的高压下压制2h;测得其热导率;将压制后的石墨烯膜在置于400度的环境中,测得其电磁屏蔽性能,以获得制备高导热率和高灵敏度的石墨烯膜的参数;如表1-3所示。图5为可呼吸石墨烯膜呼吸过程电镜照片,在外力作用下的呼的过程中,石墨烯膜被压平,呼吸气孔通过褶皱的形式保留下来;在光致热作用下吸的过程中,褶皱被气体撑开,逐渐变得光滑。The graphene film obtained above was pressed at a high pressure of 50 MP for 2 hours; its thermal conductivity was measured; the pressed graphene film was placed in an environment of 400 degrees, and its electromagnetic shielding performance was measured to obtain a high thermal conductivity. The parameters of the graphene film with high rate and high sensitivity; as shown in Table 1-3. Figure 5 is an electron micrograph of the respiration process of the respirable graphene membrane. During the respiration process under the action of external force, the graphene membrane is flattened, and the breathing pores are preserved in the form of folds; during the respiration process under the action of light and heat, The folds are stretched by the gas and gradually become smooth.
表1:第一步的热处理方式Table 1: The heat treatment method of the first step
表2:第二步的热处理方式Table 2: The heat treatment method of the second step
表3:第三步的热处理方式Table 3: The heat treatment method of the third step
从表1~表3可以看出,本材料的性能主要有三方面决定,其一材料内部氧化石墨烯片结构修复情况,即官能团的脱落以及高温下碳共轭结构的修复。其二,材料内部三维取向结构的连续性,即内部片层结构的连接性。其三,微气囊的形成才能保证材料的柔性以及石墨烯片层结构的存在。三者共同作用以增加石墨烯膜的性能。It can be seen from Table 1 to Table 3 that the performance of this material is mainly determined by three aspects. One is the repair of the graphene oxide sheet structure inside the material, that is, the loss of functional groups and the repair of the carbon conjugated structure at high temperature. Second, the continuity of the three-dimensional orientation structure inside the material, that is, the connectivity of the internal lamellar structure. Third, the formation of micro-air pockets can ensure the flexibility of the material and the existence of the graphene sheet structure. All three work together to increase the performance of graphene membranes.
从表1可以看出,比较A1、B1、C1、D1、E1,A1的温度过低,不足以除去大部分易降解的官能团,导致第二步高温过程中气体大量快速产生,在高温下撕裂片层结构;E1温度过高,产生气体过快,会大量撕裂材料内部结构,两者都会使得材料性能变差。唯有在B1、C1、D1温度下,官能团会缓慢并彻底清除,以保障材料性能。比较C1、F1、G1、H1,F1升温速率过低,气体释放过于缓慢,不能使得材料内部形成通孔,在接下来的升温过程中不利于微气囊的形成;H1升温过程过快,气体释放过快,撕裂材料内部结构,不利于形成传输通道。唯有CG升温速率下才可以既保证微气囊的形成,又能保证通道的完整。比较C1、I1、J1、K1、L1、M1,I1保温时间过短,不能保证大部分官能团的降解;M1保温过程过长,会吸收炉子里面的焦油,不利于性能的提升。C1、J1、 K1、L1正好避免了以上两者。As can be seen from Table 1, comparing A1, B1, C1, D1, and E1, the temperature of A1 is too low to remove most of the easily degradable functional groups, resulting in a large amount of rapid gas generation in the second high-temperature process. Split layer structure; E1 temperature is too high, gas is generated too fast, and the internal structure of the material will be torn in large quantities, both of which will make the material performance worse. Only at B1, C1, and D1 temperatures, the functional groups will be removed slowly and completely to ensure the performance of the material. Comparing C1, F1, G1, and H1, the heating rate of F1 is too low, and the gas release is too slow, which cannot form through holes inside the material, which is not conducive to the formation of micro-air pockets in the subsequent heating process; the heating process of H1 is too fast, and the gas release Too fast will tear the internal structure of the material, which is not conducive to the formation of transmission channels. Only at the heating rate of CG can both the formation of micro-air pockets and the integrity of the channel be guaranteed. Comparing C1, I1, J1, K1, L1, and M1, the holding time of I1 is too short, which cannot guarantee the degradation of most functional groups; the holding time of M1 is too long, which will absorb the tar in the furnace, which is not conducive to the improvement of performance. C1, J1, K1, L1 just avoid the above two.
从表2中可以看出,比较A2、B2、C2、D2、E2,A2升温速率过低不足以形成微小的空隙结构,使得膜不能形成微气囊,严重影响电磁屏蔽性能。E2升温速度过高,会撕裂石墨烯层间结构,使得石墨烯膜链接性变差,导热电磁屏蔽性能都变差。唯有B2、C2、D2的升温速度下,才会有才能既保证微气囊结构又保证石墨烯膜内部的连续性。比较C2、I2、J2、K2、L2、M2,I2保温时间过短,稳定的官能团不能充分脱落;M2时间过长,石墨烯膜容易吸附焦油,不利于膜性能的提升;而C2、J2、K2、M2条件下既可以保证稳定官能团的充分脱落,又能避免焦油的困扰。It can be seen from Table 2 that, comparing A2, B2, C2, D2, and E2, the heating rate of A2 is too low to form a tiny void structure, so that the film cannot form micro-air pockets, which seriously affects the electromagnetic shielding performance. If the heating rate of E2 is too high, the interlayer structure of graphene will be torn, making the linkability of graphene film worse, and the heat conduction and electromagnetic shielding performance will be worse. Only at the heating rates of B2, C2, and D2 can it be possible to ensure both the micro-airbag structure and the continuity inside the graphene membrane. Comparing C2, I2, J2, K2, L2, and M2, the holding time of I2 is too short, and the stable functional groups cannot be fully detached; the holding time of M2 is too long, the graphene film is easy to absorb tar, which is not conducive to the improvement of film performance; while C2, J2, Under the conditions of K2 and M2, it can not only ensure the sufficient shedding of stable functional groups, but also avoid the trouble of tar.
从表3中可以看出,比较A3、B3、C3、D3、E,A3升温速率过低,最稳定官能团脱落的过慢,形成微气囊的过程中不足以支撑微气囊的形成;E3升温过程过快,气体释放以及高温膨胀过快,容易破坏微气囊的形成。只有B3、C3、 D3的情况下,微气囊才能稳定的形成,石墨烯上的结构才能缓慢的修复。比较 C3、F3、G3、H3、I3,F3终点温度过低,石墨烯结构修复不够完善,所以各种性能都很差;I3终点温度过高,石墨烯会被汽化掉;C3、G3、H3的温度下才能既保证石墨烯结构的修复,又不会被汽化掉。比较C3、J3、K3、L3、M3,J3 保温时间过低,石墨烯结构不能充分修复,M3保温时间过长,也会使得吸附炉体里的焦油,影响膜的性能。As can be seen from Table 3, comparing A3, B3, C3, D3, and E, the heating rate of A3 is too low, and the most stable functional group falls off too slowly, which is not enough to support the formation of microairbags in the process of forming microairbags; E3 heating process Too fast, gas release and high temperature expansion are too fast, easily destroying the formation of micro air pockets. Only in the case of B3, C3, and D3, the micro-air pockets can be formed stably, and the structure on the graphene can be repaired slowly. Comparing C3, F3, G3, H3, and I3, the end temperature of F3 is too low, and the repair of graphene structure is not perfect, so various performances are poor; the end temperature of I3 is too high, graphene will be vaporized; C3, G3, H3 Only at a high temperature can the repair of the graphene structure be guaranteed without being vaporized. Comparing C3, J3, K3, L3, and M3, the holding time of J3 is too low, the graphene structure cannot be fully repaired, and the holding time of M3 is too long, which will also cause the tar in the furnace to be adsorbed and affect the performance of the membrane.
实施例3:将石墨烯膜用于检测光强。Embodiment 3: Graphene film is used for detecting light intensity.
首先,制备可呼吸石墨烯膜如下First, the breathable graphene membrane is prepared as follows
(1)将平均尺寸大于100μm的氧化石墨烯配制成浓度为6mg/mL氧化石墨烯水溶液,在溶液中加入质量分数5%的甘油;超声分散后,倒在模具板上烘干成氧化石墨烯膜,然后用还原剂进行还原;(1) Graphene oxide with an average size greater than 100 μm is formulated into a graphene oxide aqueous solution with a concentration of 6 mg/mL, and glycerin with a mass fraction of 5% is added to the solution; after ultrasonic dispersion, it is poured on a mold plate and dried to form graphene oxide film, and then reduced with a reducing agent;
(2)将还原后的石墨烯薄膜在惰性气体氛围下先以0.5℃/min的速率升温到700℃,保温1h;(2) Heat the reduced graphene film to 700°C at a rate of 0.5°C/min in an inert gas atmosphere, and keep it warm for 1h;
(3)在惰性气体氛围下以2℃/min的速率升温到1200℃,保温1h;(3) Raise the temperature to 1200°C at a rate of 2°C/min under an inert gas atmosphere, and keep it warm for 1h;
(4)在惰性气体氛围下以7℃/min的速率升温到2500℃,保温1h,自然降温后即可得到多孔的可呼吸石墨烯膜。(4) In an inert gas atmosphere, the temperature was raised to 2500 °C at a rate of 7 °C/min, kept for 1 h, and a porous breathable graphene film was obtained after natural cooling.
然后,将制备得到的石墨烯膜分别置于暗环境I~VII中,每个暗环境中分别用同系列的激光器进行光照,暗环境I~VII中的激光器功率如下表所示。Then, the prepared graphene films were respectively placed in dark environments I-VII, and each dark environment was illuminated with the same series of lasers. The laser power in dark environments I-VII is shown in the table below.
光照10min,测得的电磁屏蔽数据如图6所示。After 10 minutes of light, the measured electromagnetic shielding data are shown in Figure 6.
从图6可知,石墨烯膜具有超高的热导率,基本上在1分钟内完成导热工作,灵敏度高。此外,不同功率光照下的石墨烯膜电磁屏蔽性能大小区分明显,说明可鉴别不同光照环境,光照强度越大,电磁屏蔽性能越大。因此,可对光强稳定性进行高效评价。It can be seen from Figure 6 that the graphene film has ultra-high thermal conductivity, basically completes the heat conduction work within 1 minute, and has high sensitivity. In addition, the electromagnetic shielding performance of the graphene film under different light powers is significantly different, indicating that different lighting environments can be identified. The greater the light intensity, the greater the electromagnetic shielding performance. Therefore, light intensity stability can be efficiently evaluated.
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610523338.4A CN106185893B (en) | 2016-07-05 | 2016-07-05 | A kind of application for breathing graphene film in light stability is detected |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610523338.4A CN106185893B (en) | 2016-07-05 | 2016-07-05 | A kind of application for breathing graphene film in light stability is detected |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106185893A CN106185893A (en) | 2016-12-07 |
CN106185893B true CN106185893B (en) | 2017-12-26 |
Family
ID=57465798
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610523338.4A Active CN106185893B (en) | 2016-07-05 | 2016-07-05 | A kind of application for breathing graphene film in light stability is detected |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106185893B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115010123A (en) * | 2022-06-14 | 2022-09-06 | 中北大学 | A kind of sulfonated reduced graphene oxide and laser preparation method thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105523547A (en) * | 2016-01-25 | 2016-04-27 | 浙江大学 | Graphene film with ultrahigh flexibility and high thermal conductivity and preparation method of graphene film |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001284880A (en) * | 2000-03-31 | 2001-10-12 | Furuya Kinzoku:Kk | Electromagnetic wave shield |
JP2005260214A (en) * | 2004-02-12 | 2005-09-22 | Toray Ind Inc | Electromagnetic wave shield material, stereo structure, electromagnetic wave shield property interior material, and image display device |
-
2016
- 2016-07-05 CN CN201610523338.4A patent/CN106185893B/en active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105523547A (en) * | 2016-01-25 | 2016-04-27 | 浙江大学 | Graphene film with ultrahigh flexibility and high thermal conductivity and preparation method of graphene film |
Also Published As
Publication number | Publication date |
---|---|
CN106185893A (en) | 2016-12-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN105523547B (en) | A kind of super flexible high heat conduction graphene film and preparation method thereof | |
CN105731435B (en) | A kind of high tensile flexible graphene composite heat conduction film and preparation method thereof | |
CN105752963B (en) | A kind of foldable electrothermal film device based on graphene | |
CN106197839B (en) | Application of a kind of breathable graphene film in the detection of vacuum stability | |
CN105731436B (en) | Pure graphene aerogel film of continuous ultralight rule orientating and preparation method thereof | |
CN105731434B (en) | A kind of efficient and light weight electromagnetic shielding graphene film and preparation method thereof | |
CN108251076B (en) | Carbon nanotube-graphene composite heat dissipation film, preparation method and application thereof | |
CN106882796B (en) | A kind of preparation method of three-dimensional graphene structure/high-quality graphene | |
CN103915630B (en) | A kind of molybdenum bisuphide/mesoporous carbon composite electrode material and its preparation method and application | |
CN105692600B (en) | A kind of preparation method of super soft light graphite alkene Electric radiant Heating Film | |
CN104030275A (en) | Preparation method of reduction graphene oxide heat-conducting film | |
CN104709900A (en) | Preparation method of nano graphene sheet | |
CN104966817A (en) | Three-dimensional porous network composite material of molybdenum disulfide and carbon and its preparation method | |
CN104108700B (en) | A kind of graphene material powder and preparation method thereof | |
CN103996829B (en) | A kind of nano and micron composite structure lithium iron phosphate positive material and co-precipitation preparation method thereof | |
CN104528707A (en) | Preparation method of high-conductivity graphene membrane | |
CN104650379A (en) | Method for producing three-dimensional net-like material | |
CN104787751A (en) | Graphene powder and preparation method thereof | |
CN104577131A (en) | A kind of preparation method of graphene-TiO2-B composite material | |
CN106185893B (en) | A kind of application for breathing graphene film in light stability is detected | |
CN108640107A (en) | A kind of intercalator of quick stripping graphite for high-quality graphene volume production | |
CN103482617B (en) | A kind of preparation method of tindioxide/graphene composite material | |
CN105731433B (en) | A kind of function conversion method for breathing graphene film | |
CN106517993B (en) | A kind of graphene/montmorillonite Composite porous membrane and preparation method thereof | |
CN105744817B (en) | A kind of preparation method of highly oriented graphene metal layer assembling electromagnetic shielding film |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190904 Address after: 313100 Room 830, 8th Floor, Changxing World Trade Building, 1278 Mingzhu Road, Changxing Economic Development Zone, Huzhou City, Zhejiang Province Patentee after: Changxin de Technology Co., Ltd. Address before: 310058 Xihu District, Zhejiang, Yuhang Tong Road, No. 866, No. Patentee before: Zhejiang University |
|
TR01 | Transfer of patent right |