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CN106129090B - A linear pixel defining layer structure and preparation method thereof - Google Patents

A linear pixel defining layer structure and preparation method thereof Download PDF

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Publication number
CN106129090B
CN106129090B CN201610585890.6A CN201610585890A CN106129090B CN 106129090 B CN106129090 B CN 106129090B CN 201610585890 A CN201610585890 A CN 201610585890A CN 106129090 B CN106129090 B CN 106129090B
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pixel
insulating layer
heat treatment
layer structure
linear pixel
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CN106129090A (en
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王坚
王娟红
刘会敏
彭俊彪
曹镛
宋晨
郑华
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South China University of Technology SCUT
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South China University of Technology SCUT
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

A kind of linear pixel defines the preparation method of layer structure, includes the following steps: A. in the insulating layer of substrate surface deposition lyophobicity；B. the solvent that insulating layer can be dissolved in surface of insulating layer printing, forms pixel wall and pixel limits area；C. oxonium ion bombardment processing is carried out, pixel is limited into remaining insulating layer in area and is removed, overall structure is in lyophily state at this time；D. it is heat-treated, so that the insulating materials in structure restores lyophobicity, pixel limits area and keeps lyophily state.The present invention obtains pixel defining layer by printing solvent in surface of insulating layer, its pixel, which limits area, has lyophily, be conducive to sprawling for solution, pixel wall has lyophobicity, it can prevent solution from overflowing, and since the insulating materials is only soluble in its specific solvent, it can prevent luminescent layer solution from corroding pixel defining layer.Have the characteristics that preparation process is simple, stock utilization is high.

Description

A kind of linear pixel defines layer structure and preparation method thereof
Technical field
The present invention relates to technical field of semiconductors, define layer structure and its a preparation side more particularly to a kind of linear pixel Method.
Background technique
Organic Light Emitting Diode OLED (Organic light emitting diode) is a kind of electroluminescent hair of organic film Optical device needs to carry out colored display by OLED colorization.Colorization effect is most preferably arranged side by side (side-by- Side mode).Being arranged side by side is to have three sub-pixels of RGB in a pixel coverage, and each pixel is the independent list that shines Member.Inkjet printing be can use by solution precise Printing to pixel region, form luminescent layer.But due to printing formed drop with Dot structure is in same dimension scale, in order to guarantee that the accuracy of printing avoids solution from spilling over adjacent pixel structure, inclines at present To using pixel defining layer.
In the prior art, pixel defining layer is formed by two layers, and first layer (lower layer) is made of lyophilic material, the second layer (on Layer) it is made of lyophobic material, it is typically prepared by the method for photoetching, preparation process is complicated, and stock utilization is low.
Therefore, in view of the shortcomings of the prior art, providing that a kind of preparation process is simple, defines layer knot with the less linear pixel of material The preparation method of structure is very necessary to overcome the deficiencies of the prior art.
Summary of the invention
There is provided it is an object of the invention to avoid in place of the deficiencies in the prior art a kind of linear pixel define layer structure and Its preparation method, the preparation method which defines layer structure have the characteristics that simple process, less with material.
Above-mentioned purpose of the invention is realized by following technological means.
The preparation method that a kind of linear pixel defines layer structure is provided, is included the following steps:
A. in the insulating layer of substrate surface deposition lyophobicity；
B. the solvent of insulating layer can be dissolved in surface of insulating layer printing, the solvent of printing make the insulating layer of dissolution because Coffee ring effect accumulates to form pixel wall, surrounds corresponding pixel by pixel wall and limits area；
C. oxonium ion bombardment processing is carried out to the structure that step B is formed, pixel is limited into remaining insulating layer in area and is removed, Overall structure is in lyophily state at this time；
D. the step C structure formed is heat-treated, so that the insulating materials in structure restores lyophobicity, pixel is limited Area keeps lyophily state, obtains linear pixel and defines a layer structure.
Preferably, spin-coating method depositing insulating layer is specifically used in above-mentioned steps A.
Preferably, the material of the insulating layer in above-mentioned steps A is cytop.
Preferably, above-mentioned steps B prints solvent in the method that surface of insulating layer specifically uses inkjet printing.
Preferably, the temperature of the heat treatment in above-mentioned steps D is not less than 180 degrees Celsius, and heat treatment time is no less than 5 points Clock.
Preferably, the temperature of the heat treatment in above-mentioned steps D is 190 to 350 degrees Celsius, and heat treatment time is 6 to 20 points Clock.
Preferably, the temperature of the heat treatment in above-mentioned steps D is 200 to 300 degrees Celsius, and heat treatment time is 6 to 10 points Clock.
Preferably, the temperature of the heat treatment in above-mentioned steps D is 249 degrees Celsius, and heat treatment time is 7.8 minutes.
Preferably, the substrate in above-mentioned steps A is ITO or glass or thin polymer film.
Present invention simultaneously provides a kind of linear pixels to define a layer structure, is prepared by the above method.
Linear pixel of the invention defines the preparation method of layer structure, includes the following steps:
A. in the insulating layer of substrate surface deposition lyophobicity；B. the molten of insulating layer can be dissolved in surface of insulating layer printing Agent, the solvent of printing make the insulating layer of dissolution because coffee ring effect accumulates to form pixel wall, are surrounded by pixel wall corresponding Pixel limits area；C. oxonium ion bombardment processing is carried out to the structure that step B is formed, pixel is limited into remaining insulating layer in area and is removed Fall, overall structure is in lyophily state at this time；D. the step C structure formed is heat-treated, so that the insulating materials in structure Restore lyophobicity, pixel limits area and keeps lyophily state.The present invention is defined by obtaining pixel in surface of insulating layer printing solvent Layer, pixel, which limits area, has lyophily, is conducive to sprawling for solution, and pixel wall has lyophobicity, can prevent solution from overflowing, And since the insulating materials is only soluble in its specific solvent, it can prevent luminescent layer solution from corroding pixel defining layer.In conclusion The preparation method that linear pixel of the invention defines layer structure has the characteristics that preparation process is simple, stock utilization is high.
Detailed description of the invention
Using attached drawing, the present invention is further illustrated, but the content in attached drawing is not constituted to any limit of the invention System.
Fig. 1 is the schematic diagram that a kind of linear pixel of the present invention defines dot structure prepared by the preparation method of layer structure.
Fig. 2 is the schematic diagram of the independent linear structure printed by means of the present invention.
Fig. 3 is the schematic diagram of the contiguous pixels structure printed by means of the present invention.
Specific embodiment
The invention will be further described with the following Examples.
Embodiment 1.
A kind of linear pixel defines the preparation method of layer structure, carries out as follows:
A. in the insulating layer of substrate surface deposition lyophobicity.Spin-coating method depositing insulating layer, insulating layer are specifically used in step A Material be cytop.Substrate can be ITO or glass or thin polymer film or other substrates.
B. the solvent of insulating layer can be dissolved in surface of insulating layer printing, the solvent of printing make the insulating layer of dissolution because Coffee ring effect accumulates to form pixel wall, surrounds corresponding pixel by pixel wall and limits area.Fig. 1 is showing for the acquaintanceship structure of printing It is intended to, dot structure is U-shaped, and pixel, which limits area 1,2, few insulating materials residual, and 3 be to be formed by pixel wall.
Specifically solvent, by adjusting printed droplets spacing, available needs can be printed using the method for inkjet printing Dot matrix, linear pixel structure, the available various sizes of linear structure of different drop spacing, Fig. 2, Fig. 3 be two kinds knot The schematic diagram of structure.
C. oxonium ion bombardment processing is carried out to the structure that step B is formed, pixel is limited into remaining insulating layer in area and is removed, Overall structure is in lyophily state at this time.
D. the step C structure formed is heat-treated, so that the insulating materials in structure restores lyophobicity, pixel is limited Area keeps lyophily state, obtains linear pixel and defines a layer structure.The temperature of heat treatment in step D is not less than 180 degrees Celsius, heat The processing time is no less than 5 minutes.
The present invention prints solvent by the insulating layer in substrate surface spin coating lyophobicity, in surface of insulating layer, available Dot matrix or linear pixel structure, this structure include that pixel limits area and pixel wall, pass through O2Plasma processing, can be by pixel It limits the remaining insulating materials in area to destroy, using heat treatment, insulating materials is made to restore hydrophobicity, and then obtain required pixel Structure.
The present invention obtains pixel defining layer by printing solvent in surface of insulating layer, and pixel, which limits area, has lyophily, Be conducive to sprawling for solution, pixel wall has lyophobicity, can prevent solution from overflowing, and since the insulating materials is only soluble in its spy Fixed solvent can prevent luminescent layer solution from corroding pixel defining layer.In conclusion linear pixel of the invention defines a layer structure Preparation method have the characteristics that preparation process is simple, stock utilization is high.
Embodiment 2.
A kind of linear pixel defines the preparation method of layer structure, and other feature is same as Example 1 to be somebody's turn to do, and difference exists In: the temperature of the heat treatment in the present embodiment in step D is 190 to 350 degrees Celsius, and heat treatment time is 6 to 20 minutes.Practice It was found that define layer structural behaviour preferable for linear pixel prepared by the heat treatment.
Embodiment 3.
A kind of linear pixel defines the preparation method of layer structure, and other feature is same as Example 1 to be somebody's turn to do, and difference exists In: the temperature of the heat treatment in the present embodiment in step D is 200 to 300 degrees Celsius, and heat treatment time is 6 to 10 minutes.The work It is preferable that skill prepares effect.
Embodiment 4.
A kind of linear pixel defines the preparation method of layer structure, and other feature is same as Example 1 to be somebody's turn to do, and difference exists In: the temperature of the heat treatment in the present embodiment in step D is 249 degrees Celsius, and heat treatment time is 7.8 minutes.The technique has Preparing simple, prepared linear pixel, to define sprawling for layer solution easy, can prevent solution from overflowing, save the use of solution Amount.
Finally it should be noted that the above embodiments are merely illustrative of the technical solutions of the present invention rather than protects to the present invention The limitation of range, although the invention is described in detail with reference to the preferred embodiments, those skilled in the art should be managed Solution, can with modification or equivalent replacement of the technical solution of the present invention are made, without departing from technical solution of the present invention essence and Range.

Claims (10)

1.一种线性像素界定层结构的制备方法，其特征在于，通过如下步骤进行：1. a preparation method of linear pixel definition layer structure is characterized in that, carry out by following steps: A.在基板表面沉积疏液性的绝缘层；A. Deposit a lyophobic insulating layer on the surface of the substrate; B.在绝缘层表面打印能够溶解绝缘层的溶剂，打印的溶剂使得溶解的绝缘层因为咖啡环效应堆积形成像素墙，由像素墙围成对应的像素限定区；B. Printing a solvent capable of dissolving the insulating layer on the surface of the insulating layer, the printed solvent makes the dissolved insulating layer accumulate to form a pixel wall due to the coffee ring effect, and the pixel wall forms a corresponding pixel defined area; C.对步骤B形成的结构进行氧离子轰击处理，将像素限定区内残留的绝缘层除掉，此时整体结构呈亲液状态；C. The structure formed in step B is subjected to oxygen ion bombardment treatment, and the insulating layer remaining in the pixel limited area is removed, and the overall structure is in a lyophilic state at this time; D.将步骤C形成的结构进行热处理，使得结构中的绝缘材料恢复疏液性，像素限定区保持亲液状态，得到线性像素界定层结构。D. The structure formed in step C is subjected to heat treatment, so that the insulating material in the structure recovers the lyophobicity, and the pixel-defining region maintains a lyophilic state, thereby obtaining a linear pixel-defining layer structure. 2.根据权利要求1所述的线性像素界定层结构的制备方法，其特征在于，所述步骤A中具体采用旋涂法沉积绝缘层。2 . The method for preparing a linear pixel defining layer structure according to claim 1 , wherein in the step A, the insulating layer is deposited by a spin coating method. 3 . 3.根据权利要求2所述的线性像素界定层结构的制备方法，其特征在于，所述步骤A中的绝缘层的材料为cytop。3 . The method for preparing a linear pixel defining layer structure according to claim 2 , wherein the material of the insulating layer in the step A is cytop. 4 . 4.根据权利要求3所述的线性像素界定层结构的制备方法，其特征在于：所述步骤B在绝缘层表面具体采用喷墨打印的方法打印溶剂。4 . The method for preparing a linear pixel definition layer structure according to claim 3 , wherein in the step B, an inkjet printing method is used to print a solvent on the surface of the insulating layer. 5 . 5.根据权利要求4所述的线性像素界定层结构的制备方法，其特征在于，所述步骤D中的热处理的温度不低于180摄氏度，热处理时间不少于5分钟。5 . The method for preparing a linear pixel definition layer structure according to claim 4 , wherein the temperature of the heat treatment in the step D is not lower than 180 degrees Celsius, and the heat treatment time is not less than 5 minutes. 6 . 6.根据权利要求5所述的线性像素界定层结构的制备方法，其特征在于，所述步骤D中的热处理的温度为190至350摄氏度，热处理时间为6至20分钟。6 . The method for preparing a linear pixel definition layer structure according to claim 5 , wherein the temperature of the heat treatment in the step D is 190 to 350 degrees Celsius, and the heat treatment time is 6 to 20 minutes. 7 . 7.根据权利要求6所述的线性像素界定层结构的制备方法，其特征在于，所述步骤D中的热处理的温度为200至300摄氏度，热处理时间为6至10分钟。7 . The method for preparing a linear pixel definition layer structure according to claim 6 , wherein the temperature of the heat treatment in the step D is 200 to 300 degrees Celsius, and the heat treatment time is 6 to 10 minutes. 8 . 8.根据权利要求7所述的线性像素界定层结构的制备方法，其特征在于，所述步骤D中的热处理的温度为249摄氏度，热处理时间为7.8分钟。8 . The method for preparing a linear pixel definition layer structure according to claim 7 , wherein the temperature of the heat treatment in the step D is 249 degrees Celsius, and the heat treatment time is 7.8 minutes. 9 . 9.根据权利要求1至8任意一项所述的线性像素界定层结构的制备方法，其特征在于，所述步骤A中的基板为ITO或者玻璃或者聚合物薄膜。9 . The method for preparing a linear pixel-defining layer structure according to claim 1 , wherein the substrate in the step A is ITO or glass or a polymer film. 10 . 10.一种线性像素界定层结构，其特征在于，通过权利要求1至9任意一项所述的制备方法制备而成。10 . A linear pixel defining layer structure, characterized in that, it is prepared by the preparation method according to any one of claims 1 to 9 .
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CN107644951A (en) * 2017-10-20 2018-01-30 东莞理工学院 A kind of preparation method of printed OLED display screen
CN107785504B (en) * 2017-10-20 2020-08-25 东莞理工学院 Preparation method of OLED device
JP2022016024A (en) * 2020-07-10 2022-01-21 パナソニックＩｐマネジメント株式会社 Light-emitting device, display panel, and manufacturing method of light-emitting device
CN113097423B (en) * 2021-04-08 2023-05-23 深圳扑浪创新科技有限公司 Preparation method of quantum dot luminescent layer

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