CN106119914A - 一种钴锰合金电镀液及其应用 - Google Patents
一种钴锰合金电镀液及其应用 Download PDFInfo
- Publication number
- CN106119914A CN106119914A CN201610669764.9A CN201610669764A CN106119914A CN 106119914 A CN106119914 A CN 106119914A CN 201610669764 A CN201610669764 A CN 201610669764A CN 106119914 A CN106119914 A CN 106119914A
- Authority
- CN
- China
- Prior art keywords
- cobalt
- manganese alloy
- manganese
- electroplating solution
- ion source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- MZZUATUOLXMCEY-UHFFFAOYSA-N cobalt manganese Chemical compound [Mn].[Co] MZZUATUOLXMCEY-UHFFFAOYSA-N 0.000 title claims abstract description 80
- 229910000914 Mn alloy Inorganic materials 0.000 title claims abstract description 69
- 239000007788 liquid Substances 0.000 title claims 3
- 238000009713 electroplating Methods 0.000 claims abstract description 82
- 238000000576 coating method Methods 0.000 claims abstract description 38
- 239000011248 coating agent Substances 0.000 claims abstract description 36
- 239000002738 chelating agent Substances 0.000 claims abstract description 25
- 150000003839 salts Chemical class 0.000 claims abstract description 21
- 238000000034 method Methods 0.000 claims abstract description 20
- 239000003381 stabilizer Substances 0.000 claims abstract description 20
- 229910001429 cobalt ion Inorganic materials 0.000 claims abstract description 19
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims abstract description 19
- 238000005238 degreasing Methods 0.000 claims abstract description 19
- 229910001437 manganese ion Inorganic materials 0.000 claims abstract description 19
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000002904 solvent Substances 0.000 claims abstract description 15
- 239000008367 deionised water Substances 0.000 claims description 44
- 229910021641 deionized water Inorganic materials 0.000 claims description 44
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical group O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 44
- 229910052751 metal Inorganic materials 0.000 claims description 43
- 239000002184 metal Substances 0.000 claims description 43
- 230000004913 activation Effects 0.000 claims description 26
- 238000007747 plating Methods 0.000 claims description 25
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical group CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 20
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 18
- 239000013527 degreasing agent Substances 0.000 claims description 18
- 238000005237 degreasing agent Methods 0.000 claims description 16
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical group [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 12
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 12
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 8
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical group [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910021380 Manganese Chloride Inorganic materials 0.000 claims description 6
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical group Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 claims description 6
- 239000004115 Sodium Silicate Substances 0.000 claims description 6
- 235000019270 ammonium chloride Nutrition 0.000 claims description 6
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical group [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 claims description 6
- 229940097267 cobaltous chloride Drugs 0.000 claims description 6
- 239000010439 graphite Substances 0.000 claims description 6
- 229910002804 graphite Inorganic materials 0.000 claims description 6
- 239000011565 manganese chloride Substances 0.000 claims description 6
- 235000002867 manganese chloride Nutrition 0.000 claims description 6
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 6
- 239000001488 sodium phosphate Substances 0.000 claims description 6
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 claims description 6
- 229910000406 trisodium phosphate Inorganic materials 0.000 claims description 6
- 235000019801 trisodium phosphate Nutrition 0.000 claims description 6
- 239000001103 potassium chloride Substances 0.000 claims description 4
- 235000011164 potassium chloride Nutrition 0.000 claims description 4
- 239000011780 sodium chloride Substances 0.000 claims description 4
- 230000003213 activating effect Effects 0.000 abstract 1
- 230000007613 environmental effect Effects 0.000 abstract 1
- 238000011112 process operation Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 81
- 239000011572 manganese Substances 0.000 description 21
- 238000003756 stirring Methods 0.000 description 20
- 239000000203 mixture Substances 0.000 description 11
- 229910052748 manganese Inorganic materials 0.000 description 9
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 8
- 229910052596 spinel Inorganic materials 0.000 description 7
- 239000011029 spinel Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010965 430 stainless steel Substances 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 229910020632 Co Mn Inorganic materials 0.000 description 1
- 229910020678 Co—Mn Inorganic materials 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229940099607 manganese chloride Drugs 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610669764.9A CN106119914B (zh) | 2016-08-15 | 2016-08-15 | 一种钴锰合金电镀液及其应用 |
Applications Claiming Priority (1)
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---|---|---|---|
CN201610669764.9A CN106119914B (zh) | 2016-08-15 | 2016-08-15 | 一种钴锰合金电镀液及其应用 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106119914A true CN106119914A (zh) | 2016-11-16 |
CN106119914B CN106119914B (zh) | 2018-06-29 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610669764.9A Active CN106119914B (zh) | 2016-08-15 | 2016-08-15 | 一种钴锰合金电镀液及其应用 |
Country Status (1)
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CN (1) | CN106119914B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108441911A (zh) * | 2018-03-20 | 2018-08-24 | 中南大学 | 阴极电沉积法制备锰钴复合材料的方法 |
CN111005045A (zh) * | 2019-12-31 | 2020-04-14 | 西安西工大超晶科技发展有限责任公司 | 一种钛及钛合金表面镀层的制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060077791A (ko) * | 2004-12-31 | 2006-07-05 | 동부제강주식회사 | 내식성이 우수한 아연계 합금의 전기도금강판 및 그 도금용액 조성물 |
CN103103592A (zh) * | 2013-01-22 | 2013-05-15 | 昆明理工大学 | 一种(Mn,Co)3O4尖晶石涂层的制备方法 |
CN105018982A (zh) * | 2014-11-28 | 2015-11-04 | 东北大学 | 一种利用离子液体低温电沉积制备钴锰合金的方法 |
-
2016
- 2016-08-15 CN CN201610669764.9A patent/CN106119914B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060077791A (ko) * | 2004-12-31 | 2006-07-05 | 동부제강주식회사 | 내식성이 우수한 아연계 합금의 전기도금강판 및 그 도금용액 조성물 |
CN103103592A (zh) * | 2013-01-22 | 2013-05-15 | 昆明理工大学 | 一种(Mn,Co)3O4尖晶石涂层的制备方法 |
CN105018982A (zh) * | 2014-11-28 | 2015-11-04 | 东北大学 | 一种利用离子液体低温电沉积制备钴锰合金的方法 |
Non-Patent Citations (2)
Title |
---|
张慧慧 等: "Co-Mn尖晶石涂层的制备", 《腐蚀科学与防护技术》 * |
王建朝 等: "DMF 中电化学制备Ce-Fe-Co 合金及磁性研究", 《中山大学学报( 自然科学版)》 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108441911A (zh) * | 2018-03-20 | 2018-08-24 | 中南大学 | 阴极电沉积法制备锰钴复合材料的方法 |
CN108441911B (zh) * | 2018-03-20 | 2019-08-06 | 中南大学 | 阴极电沉积法制备锰钴复合材料的方法 |
CN111005045A (zh) * | 2019-12-31 | 2020-04-14 | 西安西工大超晶科技发展有限责任公司 | 一种钛及钛合金表面镀层的制备方法 |
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Publication number | Publication date |
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CN106119914B (zh) | 2018-06-29 |
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Effective date of registration: 20241204 Address after: Room 008, F1901, 19th Floor, Building 4-A, Xixian Financial Port, Fengdong New City Energy Gold Trade Zone, Xixian New Area, Xi'an City, Shaanxi Province 712044 Patentee after: Shaanxi Dingsheng Yongyan New Material Technology Co.,Ltd. Country or region after: China Address before: 710054 No. 58, Yanta Road, Shaanxi, Xi'an Patentee before: XI'AN University OF SCIENCE AND TECHNOLOGY Country or region before: China |
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Effective date of registration: 20241223 Address after: Room 1602, Unit 3, Building 2, Longhu Xiangdi Blue Bay Phase II, Gaolou Road, Chanba Ecological Zone, Xi'an City, Shaanxi Province, China 710038 Patentee after: Shaanxi Yongshi Material Technology Co.,Ltd. Country or region after: China Address before: Room 008, F1901, 19th Floor, Building 4-A, Xixian Financial Port, Fengdong New City Energy Gold Trade Zone, Xixian New Area, Xi'an City, Shaanxi Province 712044 Patentee before: Shaanxi Dingsheng Yongyan New Material Technology Co.,Ltd. Country or region before: China |
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