CN106093599B - Optical probe and electromagnetic field measuring equipment and measuring method thereof - Google Patents
Optical probe and electromagnetic field measuring equipment and measuring method thereof Download PDFInfo
- Publication number
- CN106093599B CN106093599B CN201610466416.1A CN201610466416A CN106093599B CN 106093599 B CN106093599 B CN 106093599B CN 201610466416 A CN201610466416 A CN 201610466416A CN 106093599 B CN106093599 B CN 106093599B
- Authority
- CN
- China
- Prior art keywords
- electromagnetic field
- optical
- electro
- laser
- wave plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000005672 electromagnetic field Effects 0.000 title claims abstract description 131
- 230000003287 optical effect Effects 0.000 title claims abstract description 114
- 239000000523 sample Substances 0.000 title claims abstract description 76
- 238000000034 method Methods 0.000 title claims abstract description 22
- 239000013078 crystal Substances 0.000 claims abstract description 76
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 71
- 239000010453 quartz Substances 0.000 claims abstract description 59
- 238000002310 reflectometry Methods 0.000 claims abstract description 32
- 230000035945 sensitivity Effects 0.000 claims abstract description 30
- 239000013307 optical fiber Substances 0.000 claims abstract description 16
- 230000010287 polarization Effects 0.000 claims description 49
- 238000005259 measurement Methods 0.000 claims description 27
- 230000005684 electric field Effects 0.000 claims description 23
- 230000009471 action Effects 0.000 claims description 8
- 238000004458 analytical method Methods 0.000 claims description 7
- 230000005693 optoelectronics Effects 0.000 claims description 7
- 230000005697 Pockels effect Effects 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 6
- 238000001228 spectrum Methods 0.000 claims description 6
- 238000004026 adhesive bonding Methods 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 4
- 238000000691 measurement method Methods 0.000 claims description 4
- 239000003292 glue Substances 0.000 claims description 2
- 230000006698 induction Effects 0.000 claims 2
- 239000011521 glass Substances 0.000 abstract description 4
- 230000010354 integration Effects 0.000 abstract description 4
- 230000004044 response Effects 0.000 abstract description 2
- 230000006872 improvement Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000009545 invasion Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
- G01R29/08—Measuring electromagnetic field characteristics
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/28—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with deflection of beams of light, e.g. for direct optical indication
- G01D5/30—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with deflection of beams of light, e.g. for direct optical indication the beams of light being detected by photocells
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Tests Of Electronic Circuits (AREA)
- Measuring Instrument Details And Bridges, And Automatic Balancing Devices (AREA)
Abstract
The invention discloses an optical probe, an electromagnetic field measuring device and a measuring method thereof. The optical probe comprises a collimator, a polarizer, a quartz wave plate, an electro-optic crystal, a high-reflectivity dielectric plate, an incident optical fiber and a quartz glass tube. The collimator, the polarizer, the quartz wave plate, the electro-optic crystal and the high-reflectivity dielectric plate are sequentially assembled in a quartz glass tube, and the incident optical fiber is connected to the collimator and fixed on the wall of the glass tube. The invention has the advantages of small volume, high integration level, small interference to the measured electromagnetic field, strong anti-interference capability, high spatial resolution, large dynamic range, large response bandwidth, large dynamic range, adjustable sensitivity and the like. The invention also discloses a measuring method of the optical probe, electromagnetic field measuring equipment with the optical probe and a measuring method of the electromagnetic field measuring equipment.
Description
Technical Field
The invention relates to an optical probe, electromagnetic field measuring equipment and measuring methods thereof in the field of electromagnetic field measurement, in particular to an optical probe with adjustable sensitivity for electromagnetic field measurement, a measuring method of the optical probe, electromagnetic field measuring equipment with the optical probe and a measuring method of the electromagnetic field measuring equipment.
Background
Electromagnetic field measurement is a key part in various scientific and technical fields, and process control, electric field monitoring of medical equipment, trajectory control, electromagnetic compatibility measurement, microwave integrated circuit test, strong electric field measurement and the like are all application fields of electromagnetic field sensors. The traditional electromagnetic field measurement system usually uses an active metal probe, which disturbs the measured electromagnetic field to cause the reduction of measurement accuracy, and the sensor is particularly sensitive to electromagnetic noise and has obvious defects and deficiencies in the aspects of bandwidth, anti-interference capability, invasiveness and the like. The optical method for measuring the electromagnetic field has the unique advantages that the optical signal is hardly influenced by external electromagnetic waves during propagation and has strong anti-interference capability, so that the problem of electromagnetic compatibility can be well solved, and meanwhile, because the wavelength of light is extremely short and the frequency is extremely high, an optical device for measuring the electromagnetic field has the characteristics of small size, light weight, high spatial resolution and the like.
Patent CN 102472785 and patent CN 103105541B both disclose a method and apparatus for electromagnetic field measurement, which utilize the characteristic that laser enters into a material and the refractive index of the material changes with the intensity of the measured electromagnetic field, and then obtain the information of the electromagnetic field through the measurement and analysis of the laser signal. The technology has the advantages of small invasiveness, high spatial resolution, large bandwidth, electromagnetic interference resistance and the like, and has wide application prospect. However, in the two technologies, only the electro-optical crystal is used as a sensing probe, a polarization controller, an optical analyzer and other separation optical devices are required to be connected externally, and only the reflected signal is obtained by the reflection of the section of the electro-optical crystal, so that the light intensity of the reflected signal is small and is easily influenced by external disturbance. Meanwhile, the polarization state of incident laser is not controlled by the technology, the probe cannot be guaranteed to work at the optimal working point, and the sensitivity of the probe can be selected according to the requirements of working occasions, so that the micro optical probe for measuring the electromagnetic field, which has higher integration level, better stability and adjustable sensitivity, is necessary.
Disclosure of Invention
The invention aims to provide an optical probe with adjustable sensitivity for measuring an electromagnetic field, a measuring method of the optical probe, electromagnetic field measuring equipment with the optical probe and a measuring method of the electromagnetic field measuring equipment.
The invention is realized by the following technical scheme: an optical probe with adjustable sensitivity for electromagnetic field measurement comprises a collimator, a polarizer, a quartz wave plate, an electro-optic crystal, a high-reflectivity dielectric plate, an incident optical fiber and a quartz glass tube; the collimator, the polarizer, the quartz wave plate, the electro-optic crystal and the high-reflectivity dielectric plate are sequentially assembled in a quartz glass tube, and the incident optical fiber is connected to the collimator and fixed on the wall of the glass tube. As a further improvement of the above scheme, the incident optical fiber is fixed on the wall of the glass tube by dispensing; the collimator, the polarizer, the quartz wave plate, the electro-optic crystal and the high-reflectivity dielectric plate are integrated in the quartz glass tube through gluing and fixing.
As a further improvement of the scheme, the included angle between the fast axis of the quartz wave plate and the polarization pass optical axis of the polarizer is 45 degrees.
The invention also provides a measuring method of the optical probe with adjustable arbitrary sensitivity for measuring the electromagnetic field, which adjusts the polarization state of laser incident to the electro-optical crystal through the quartz wave plate, and changes the polarization state of light beams transmitted in the electromagnetic field by utilizing the Pockels effect of the electro-optical crystal in the electromagnetic field, so that the optical signal reflected from the high-reflectivity dielectric sheet carries the amplitude information of the electromagnetic field, and the information of the measured electromagnetic field is obtained by demodulating the optical signal.
As a further improvement of the above scheme, the incident optical fiber is connected to a collimator to focus and collimate the incident laser; the collimated laser passes through a polarizer and a quartz wave plate, and the initial polarization state of the incident laser is adjusted by selecting the type of the quartz wave plate; then the laser is incident to the electro-optical crystal, the electro-optical crystal generates electro-optical effect under the action of the measured electromagnetic field, the optical refractive index distribution of the electro-optical crystal changes, the polarization characteristic of the laser transmitted in the electro-optical crystal changes along with the measured electromagnetic field, and thus the electric field signal of the measured electromagnetic field is loaded on the laser beam; the laser beam is reflected by the high-reflectivity medium piece, and the reflected laser can be modulated to the polarization state of the laser beam again through the electro-optic crystal; then the quartz wave plate and the polarizer modulate the polarization state of the detected electromagnetic field signal to the laser beam to be converted into the change of the light intensity signal, so that the optical signal output by the probe is subjected to photoelectric conversion and analysis detection to obtain the information of the detected electromagnetic field.
Furthermore, the optical probe designs and selects different quartz wave plates according to the requirements of the dynamic range and the sensitivity of the field intensity of the measured electromagnetic field in the actual application occasion, and adjusts the polarization state of the laser incident to the electro-optical crystal, so that the measured electromagnetic field is at different modulation working points to the laser, and the measurement sensitivity of the optical probe is different.
The invention also provides electromagnetic field measuring equipment, which comprises a spectrum analyzer, a photoelectric detector, a laser, an optical circulator and an optical probe; the optical probe is the optical probe with adjustable arbitrary sensitivity and used for electromagnetic field measurement: the laser emitted by the laser enters the optical probe in the measured electromagnetic field through the optical circulator, the optical probe reflects the modulated laser carrying the measured electromagnetic field, the reflected laser enters the photoelectric detector through the optical circulator, and the reflected laser enters the frequency spectrum analyzer after being photoelectrically converted into a radio frequency signal.
The invention also provides a measuring method of the electromagnetic field measuring equipment, which is characterized in that the polarization state of laser incident to the electro-optical crystal is adjusted through the quartz wave plate, and then the polarization state of light beams transmitted in the electromagnetic field is changed by utilizing the Pockels effect of the electro-optical crystal in the electromagnetic field, so that the optical signals reflected from the high-reflectivity dielectric sheet carry amplitude information of the electromagnetic field, and information of the measured electromagnetic field is obtained through demodulation of the optical signals.
As a further improvement of the above scheme, the incident optical fiber is connected to a collimator to focus and collimate the incident laser; the collimated laser passes through a polarizer and a quartz wave plate, and the initial polarization state of the incident laser is adjusted by selecting the type of the quartz wave plate; then the laser is incident to the electro-optical crystal, the electro-optical crystal generates electro-optical effect under the action of the measured electromagnetic field, the optical refractive index distribution of the electro-optical crystal changes, the polarization characteristic of the laser transmitted in the electro-optical crystal changes along with the measured electromagnetic field, and thus the electric field signal of the measured electromagnetic field is loaded on the laser beam; the laser beam is reflected by the high-reflectivity medium piece, and the reflected laser can be modulated to the polarization state of the laser beam again through the electro-optic crystal; then the quartz wave plate and the polarizer modulate the polarization state of the detected electromagnetic field signal to the laser beam to be converted into the change of the light intensity signal, so that the optical signal output by the probe is subjected to photoelectric conversion and analysis detection to obtain the information of the detected electromagnetic field.
Furthermore, the optical probe designs and selects different quartz wave plates according to the requirements of the dynamic range and the sensitivity of the field intensity of the measured electromagnetic field in the actual application occasion, and adjusts the polarization state of the laser incident to the electro-optical crystal, so that the measured electromagnetic field is at different modulation working points to the laser, and the measurement sensitivity of the optical probe is different.
The invention has the advantages that: the micro optical probe has the advantages of small size, low invasion to a tested antenna unit, strong anti-interference capability, high spatial resolution, large dynamic range, large response bandwidth, large dynamic range and the like, and a plurality of discrete optical components are integrated in the optical probe, so that the integration level is high, the reflected signal is strong, the operation is more stable and reliable, and the optical probe with corresponding sensitivity and working dynamic range can be designed according to the applied occasions.
Drawings
Fig. 1 is a schematic structural diagram of an electromagnetic field measuring apparatus according to a preferred embodiment of the present invention.
Fig. 2 is a schematic structural diagram of an optical probe for electromagnetic field measurement with adjustable sensitivity of the electromagnetic field measurement device in fig. 1.
Detailed Description
The present invention will be described in further detail with reference to examples. It should be understood that the specific embodiments described herein are merely illustrative of the invention and do not limit the invention.
Referring to fig. 1, fig. 1 is a schematic structural diagram of an electromagnetic field measuring apparatus according to a preferred embodiment of the present invention, that is, a schematic working mode of a micro optical probe for electromagnetic field measurement with adjustable sensitivity of the electromagnetic field measuring apparatus. The electromagnetic field measuring equipment comprises a spectrum analyzer 1, a photoelectric detector 2, a laser 3, an optical circulator 4 and an optical probe 5. The optical probe 5 is an optical probe with adjustable sensitivity for electromagnetic field measurement. The laser emitted by the laser 3 enters the optical probe 5 in the measured electromagnetic field through the optical circulator 4, the optical probe 5 reflects the modulated laser carrying the measured electromagnetic field, the laser enters the photoelectric detector 2 through the optical circulator 4, the laser is photoelectrically converted into a radio frequency signal and then enters the frequency spectrum analyzer 1, so that an electrical signal in a certain proportional relation with the amplitude of the measured electromagnetic field is obtained, and the information of the measured electromagnetic field can be obtained by analyzing and processing the electrical signal.
The structure of the micro optical probe 5 for measuring the electromagnetic field with adjustable sensitivity is shown in FIG. 2. The optical probe 5 mainly comprises a collimator 8, a polarizer 9, a quartz wave plate 10, an electro-optic crystal 11, an incident optical fiber 13, a high-reflectivity dielectric plate 12, a quartz glass tube 6 and the like. The polarizer 9, the quartz wave plate 10, the electro-optic crystal 11 and the high-reflectivity dielectric plate 12 are subjected to accurate optical cutting, sequentially adhered and combined according to the sequence of the collimator 8, the polarizer 9, the quartz wave plate 10, the electro-optic crystal 11 and the high-reflectivity dielectric plate 12, and are integrated in the quartz glass tube 6 in a gluing manner, and the incident optical fiber 13 is connected to the collimator 8 and fixed on the tube wall of the glass tube 6 through the glue 7, so that the protective buffering effect is achieved.
The incident optical fiber 13 is connected to the collimator 8 to focus and collimate the incident laser, the collimated laser passes through the polarizer 9 and the quartz wave plate 10, an included angle of a fast axis of the quartz wave plate 10 and a polarization pass optical axis of the polarizer 9 is fixed to be 45 degrees, and the initial polarization state of the incident laser is adjusted by selecting the type of the quartz wave plate 10. Then, the laser light is incident to the electro-optical crystal 11, the electro-optical crystal 11 generates an electro-optical effect under the action of the measured electromagnetic field, and the optical refractive index distribution of the electro-optical crystal changes, so that the polarization characteristic of the laser light transmitted in the electro-optical crystal changes along with the measured electromagnetic field, and an electric field signal of the measured electromagnetic field is loaded on a laser beam. The laser beam is reflected by the high-reflectivity dielectric sheet 12, the reflected laser beam is modulated by the electro-optic crystal 11 again, and then the quartz wave plate 10 and the polarizer 9 convert the modulation of the measured electromagnetic field signal on the polarization state of the laser beam into the change of a light intensity signal, so that the information of the measured electromagnetic field can be obtained after the optical signal output by the probe is subjected to photoelectric conversion and analysis detection.
The measuring method of the optical probe 5 of the present invention is: let the intensity of the incident laser beam passing through the polarizer 9 be expressed as a matrix [ E ]0,0]TThen, the electric field intensity of the polarized light that is reflected and returned from the original path through the quartz wave plate 10 and the electro-optic crystal 11 and the high-reflectivity dielectric plate 12 and output can be represented by the jones matrix as (the reflectivity of the high-reflectivity dielectric plate is 1):
in the formula, θ is an included angle between the fast axis of the quartz wave plate 10 and the polarization pass optical axis of the polarizer 9, θ' is an included angle between the induced fast axis of the electro-optical crystal 11 and the polarization pass optical axis of the polarizer 9, and is a phase difference generated by the laser passing through the electro-optical crystal 11 on the two induced main axes under the action of the measured electromagnetic field. When θ is selected to be 45 °, the electric field intensity of the output laser light of the optical probe 5 can be expressed as:
the light intensity of the laser light output from the optical probe can then be expressed as:
wherein, I0The light intensity of the incident laser after passing through the polarizer 9. If θ' is 45 °, the electric field intensity of the output laser light of the optical probe 5 can be expressed as:
from the above formula, it can be found that the output light intensity of the optical probe 5 under the measured electromagnetic field is related to the selection of the quartz wave plate, since the output light intensity is much less than 1, when the measured electromagnetic field is very small, the quartz wave plate is selected as the 1/8 wave plate, the approximate calculation is performed on the above formula, and the omission of the above formula is realized2The higher order terms can be followed:
as can be seen from the above formula, the phase difference and incident light intensity I generated by the electro-optic effect of the electro-optic crystal due to the measured electromagnetic field0In a linear relationship, the optical probe 5 has a high electric field sensitivity to the measured electromagnetic field, in which case the optical probe 5 is suitable for measurement in a weak electromagnetic field environment.
When the measured electromagnetic field is larger, the quartz wave plate is selected as the 1/4 wave plate, and the approximate calculation is carried out on the formula to obtain:
from the above formula, when the selected quartz wave plate is the 1/4 wave plate, the output light intensity of the optical probe 5 and the square of the phase difference generated by the electro-optical crystal due to the electro-optical effect of the measured electromagnetic field form a linear relationship, and because of being small, the electric field sensitivity of the optical probe 5 to the measured electromagnetic field is low, so that the method is very suitable for measuring the environment of the high-intensity electromagnetic field with a large dynamic range. Therefore, according to the field intensity of the measured electromagnetic field, the quartz wave plate 10 is selected to realize the measurement of a plurality of application occasions from a weak electric field to a high strong electric field.
In summary, the micro optical probe of the present invention mainly comprises optical devices such as a collimator, a polarizer, a quartz wave plate, an electro-optic crystal, and a high-reflectivity dielectric plate, and the measurement method can be summarized as follows: the polarization state of laser incident to the electro-optical crystal is adjusted through the quartz wave plate, and then the polarization state of light beams transmitted in the electro-optical crystal is changed through the Pockels effect of the electro-optical crystal in an electromagnetic field, so that the optical signals reflected by the probe carry amplitude information of the electromagnetic field, and information of the measured electromagnetic field can be obtained through demodulation of the optical signals.
The polarizer, the quartz wave plate, the electro-optic crystal and the high-reflectivity dielectric plate are subjected to accurate optical cutting, sequentially adhered and combined according to the sequence of the collimator, the polarizer, the quartz wave plate, the electro-optic crystal and the high-reflectivity dielectric plate, and are integrated in the quartz glass tube in a gluing and fixing mode, so that the integration level and the mechanical strength of the optical probe are improved.
The quartz wave plates are designed and selected according to the requirements of the dynamic range and the sensitivity of the field intensity of the measured electromagnetic field in practical application occasions, the polarization state of laser incident to the electro-optical crystal is adjusted, the measured electromagnetic field is in different modulation working points to the laser, and the measurement sensitivity of the optical probe is different, so that the optical probe can meet the requirements of different application occasions, and the measurement of the measured electromagnetic field from weak electric field occasions such as electromagnetic leakage to high-strength electric field occasions such as a transmitting antenna is realized.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.
Claims (7)
1. An optical probe with adjustable sensitivity for electromagnetic field measurement; the photoelectric detector comprises a collimator (8), an electro-optic crystal (11), a high-reflectivity medium sheet (12) and an incident optical fiber (13), wherein the incident optical fiber (13) is connected to the collimator (8) and sequentially connected with the collimator (8), the electro-optic crystal (11) and the high-reflectivity medium sheet (12) in sequence;
the incident optical fiber (13) is connected to the collimator (8) to focus and collimate the incident laser; then the laser light enters an electro-optical crystal (11), under the action of the measured electromagnetic field, an electro-optical effect is generated, the optical refractive index distribution of the electro-optical crystal changes, the polarization characteristic of the laser light transmitted in the electro-optical crystal changes along with the measured electromagnetic field, and therefore an electric field signal of the measured electromagnetic field is loaded on a laser beam; the laser beam is reflected by the high-reflectivity medium piece (12), and the reflected laser is modulated to the polarization state of the laser beam by the electro-optic crystal (11) again;
the method is characterized in that: the device also comprises a polarizer (9), a quartz wave plate (10) and a quartz glass tube (6); a polarizer (9) and a quartz wave plate (10) are sequentially connected between the collimator (8) and the electro-optic crystal (11), and the collimator (8), the polarizer (9), the quartz wave plate (10), the electro-optic crystal (11) and the high-reflectivity dielectric plate (12) are sequentially assembled in the quartz glass tube (6);
the incident optical fiber (13) is fixed on the wall of the quartz glass tube (6) through a glue dispensing (7); the collimator (8), the polarizer (9), the quartz wave plate (10), the electro-optic crystal (11) and the high-reflectivity dielectric plate (12) are integrated in the quartz glass tube (6) through gluing;
the included angle between the fast axis of the quartz wave plate (10) and the polarization pass optical axis of the polarizer (9) is 45 degrees;
the polarization state of laser incident to the electro-optical crystal (11) is adjusted through the quartz wave plate (10), and then the polarization state of light beams transmitted in an electromagnetic field is changed by utilizing the Pockels effect of the electro-optical crystal (11) in the electromagnetic field, so that the optical signals reflected from the high-reflectivity medium plate (12) carry amplitude information of the electromagnetic field, and information of the measured electromagnetic field is obtained through demodulation of the optical signals;
the collimated laser passes through a polarizer (9) and a quartz wave plate (10), the initial polarization state of the incident laser is adjusted by selecting the type of the quartz wave plate (10) and then is incident to an electro-optic crystal (11), the laser modulated by the electro-optic crystal (11) enters the quartz wave plate (10) and the polarizer (9), the quartz wave plate (10) and the polarizer (9) convert the polarization state modulation of the detected electromagnetic field signal on the laser beam into the change of a light intensity signal, and thus the optical signal output by a probe is subjected to photoelectric conversion and analysis detection to obtain the information of the detected electromagnetic field;
the measuring method of the optical probe comprises the following steps: let the electric field intensity of the incident laser light after passing through the polarizer (9) be expressed as a matrix [ E ]0,0]TThe electric field intensity of the polarized light which is reflected and returned in the original path and output by the quartz wave plate (10) and the electro-optic crystal (11) and the high-reflectivity dielectric plate (12) can be expressed as a formula (1) by the Jones matrix, the reflectivity of the high-reflectivity dielectric plate is set as 1,
in the formula, theta is an included angle between a fast axis of the quartz wave plate (10) and a polarization pass optical axis of the polarizer (9), theta' is an included angle between an induction fast axis of the electro-optical crystal (11) and the polarization pass optical axis of the polarizer (9), and is a phase difference generated by laser passing through the electro-optical crystal (11) on two induction main shafts under the action of a measured electromagnetic field;
when the quartz wave plate (10) is selected to be the 1/8 wave plate, the electric field sensitivity of the optical probe to the measured electromagnetic field is high, and the optical probe is suitable for measuring in a weak electromagnetic field environment, and when the quartz wave plate (10) is selected to be the 1/4 wave plate, the electric field sensitivity of the optical probe to the measured electromagnetic field is low, and the optical probe is suitable for measuring in a high-intensity electromagnetic field environment with a large dynamic range, so that the proper quartz wave plate (10) is selected according to the field intensity of the measured electromagnetic field, and the measurement in a plurality of application occasions from a weak electric field to a high-intensity electric field can be realized.
2. A measuring method using the optical probe for electromagnetic field measurement with adjustable sensitivity of claim 1, wherein an incident optical fiber (13) is connected to a collimator (8) to focus and collimate incident laser light; then the laser light enters an electro-optical crystal (11), under the action of the measured electromagnetic field, an electro-optical effect is generated, the optical refractive index distribution of the electro-optical crystal changes, the polarization characteristic of the laser light transmitted in the electro-optical crystal changes along with the measured electromagnetic field, and therefore an electric field signal of the measured electromagnetic field is loaded on a laser beam; the laser beam is reflected by the high-reflectivity medium piece (12), and the reflected laser is modulated to the polarization state of the laser beam by the electro-optic crystal (11) again;
the method is characterized in that: the polarization state of laser incident to the electro-optical crystal (11) is adjusted through the quartz wave plate (10), and then the polarization state of light beams transmitted in an electromagnetic field is changed by utilizing the Pockels effect of the electro-optical crystal (11) in the electromagnetic field, so that the optical signals reflected from the high-reflectivity medium plate (12) carry amplitude information of the electromagnetic field, and information of the measured electromagnetic field is obtained through demodulation of the optical signals;
the collimated laser passes through a polarizer (9) and a quartz wave plate (10), and the initial polarization state of the incident laser is adjusted by selecting the type of the quartz wave plate (10); then, laser is incident to the electro-optical crystal (11), the laser modulated by the electro-optical crystal (11) enters the quartz wave plate (10) and the polarizer (9), the quartz wave plate (10) and the polarizer (9) modulate the polarization state of the laser beam by the measured electromagnetic field signal and convert the laser beam into the change of a light intensity signal, and therefore the information of the measured electromagnetic field is obtained after the optical signal output by the probe is subjected to photoelectric conversion and analysis detection.
3. The measurement method according to claim 2, characterized in that: the optical probe is designed and selected according to the requirements of the dynamic range and the sensitivity of the field intensity of the measured electromagnetic field in the actual application occasion, and the polarization state of laser incident to the electro-optical crystal (11) is adjusted, so that the measured electromagnetic field is positioned at different modulation working points to the laser, and the measurement sensitivity of the optical probe is different.
4. An electromagnetic field measuring device comprises a spectrum analyzer (1), a photoelectric detector (2), a laser (3), an optical circulator (4) and an optical probe (5); the method is characterized in that: the optical probe (5) for electromagnetic field measurement with adjustable sensitivity according to claim 1: laser emitted by the laser (3) enters the optical probe (5) in the measured electromagnetic field through the optical circulator (4), the optical probe (5) reflects the modulated laser carrying the measured electromagnetic field, the reflected laser enters the photoelectric detector (2) through the optical circulator (4), and the reflected laser enters the spectrum analyzer (1) after being photoelectrically converted into a radio frequency signal.
5. A measuring method using the electromagnetic field measuring apparatus of claim 4, characterized in that: the polarization state of laser light entering the electro-optical crystal (11) is adjusted through the quartz wave plate (10), and then the polarization state of light beams transmitted in an electromagnetic field is changed by utilizing the Pockels effect of the electro-optical crystal (11) in the electromagnetic field, so that the optical signals reflected from the high-reflectivity medium plate (12) carry amplitude information of the electromagnetic field, and information of the measured electromagnetic field is obtained through demodulation of the optical signals.
6. The measurement method according to claim 5, characterized in that: the incident optical fiber (13) is connected to the collimator (8) to focus and collimate the incident laser; the collimated laser passes through a polarizer (9) and a quartz wave plate (10), and the initial polarization state of the incident laser is adjusted by selecting the type of the quartz wave plate (10); then laser is incident to the electro-optical crystal (11), the electro-optical crystal (11) generates an electro-optical effect under the action of the measured electromagnetic field, the optical refractive index distribution of the electro-optical crystal changes, the polarization characteristic of the laser transmitted in the electro-optical crystal changes along with the measured electromagnetic field, and therefore an electric field signal of the measured electromagnetic field is loaded on a laser beam; the laser beam is reflected by the high-reflectivity medium piece (12), and the reflected laser is modulated to the polarization state of the laser beam by the electro-optic crystal (11) again; then the quartz wave plate (10) and the polarizer (9) modulate the polarization state of the detected electromagnetic field signal to the laser beam to be converted into the change of the light intensity signal, so that the optical signal output by the probe is subjected to photoelectric conversion and analysis detection to obtain the information of the detected electromagnetic field.
7. The measurement method according to claim 6, characterized in that: the optical probe is designed and selected according to the requirements of the dynamic range and the sensitivity of the field intensity of the measured electromagnetic field in the actual application occasion, and the polarization state of laser incident to the electro-optical crystal (11) is adjusted, so that the measured electromagnetic field is positioned at different modulation working points to the laser, and the measurement sensitivity of the optical probe is different.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610466416.1A CN106093599B (en) | 2016-06-21 | 2016-06-21 | Optical probe and electromagnetic field measuring equipment and measuring method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610466416.1A CN106093599B (en) | 2016-06-21 | 2016-06-21 | Optical probe and electromagnetic field measuring equipment and measuring method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106093599A CN106093599A (en) | 2016-11-09 |
| CN106093599B true CN106093599B (en) | 2020-07-14 |
Family
ID=57252549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610466416.1A Active CN106093599B (en) | 2016-06-21 | 2016-06-21 | Optical probe and electromagnetic field measuring equipment and measuring method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106093599B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108535520A (en) * | 2018-05-18 | 2018-09-14 | 浙江大学 | A kind of method of electromagnetic field near field measurement device and making electromagnetic probe |
| CN109839545B (en) * | 2019-03-19 | 2021-07-20 | 浙江大学 | Rotating optical fiber electric field sensor and rotating optical electric field sensor measurement system |
| CN109839546A (en) * | 2019-03-19 | 2019-06-04 | 浙江大学 | The fixation device of sonde configuration in a kind of reflective micro-optical electric-field sensor |
| CN110161295B (en) * | 2019-04-30 | 2020-05-22 | 浙江大学 | Probe of a reflective fiber optic electric field sensor and its assembling method |
| CN110632509A (en) * | 2019-10-10 | 2019-12-31 | 湖北航天技术研究院计量测试技术研究所 | Hall switch test tool and test method |
| CN111239500A (en) * | 2020-02-20 | 2020-06-05 | 云南电网有限责任公司电力科学研究院 | A system for measuring electric field in space inside transformer |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004286583A (en) * | 2003-03-20 | 2004-10-14 | Nippon Telegr & Teleph Corp <Ntt> | Electric field detection optical device and transceiver |
| JP2005037227A (en) * | 2003-07-14 | 2005-02-10 | Nippon Telegr & Teleph Corp <Ntt> | Electric field sensor |
| CN101074983A (en) * | 2006-05-17 | 2007-11-21 | 袁海骏 | Fiber magnetic optical probe device and its usage system |
| CN101614770A (en) * | 2009-07-28 | 2009-12-30 | 西安交通大学 | A Surface Charge Measurement System Based on Electro-optic Effect |
| CN102472785A (en) * | 2009-06-29 | 2012-05-23 | 日本电气株式会社 | Probe for electric/magnetic field |
| CN203324388U (en) * | 2013-05-23 | 2013-12-04 | 国家电网公司 | Optical crystal electric field sensor based on DFB laser |
| CN104635064A (en) * | 2015-02-11 | 2015-05-20 | 华北电力大学 | Light path structure of paper oil insulation space electric field measurement and adjusting method thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002043380A (en) * | 2000-07-28 | 2002-02-08 | Ando Electric Co Ltd | Electrooptic sampling prober |
| CN2927042Y (en) * | 2006-06-08 | 2007-07-25 | 湖北众友科技实业股份有限公司 | Electro-optic modulating experimental equipment |
| CN101806623B (en) * | 2010-04-07 | 2011-10-05 | 中国科学院半导体研究所 | A Multifunctional Reflective Magneto-Optical Spectroscopy Measurement System |
| CN104049134A (en) * | 2014-06-24 | 2014-09-17 | 国家电网公司 | Optical VFTO measurement system based on Pockels effect |
-
2016
- 2016-06-21 CN CN201610466416.1A patent/CN106093599B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004286583A (en) * | 2003-03-20 | 2004-10-14 | Nippon Telegr & Teleph Corp <Ntt> | Electric field detection optical device and transceiver |
| JP2005037227A (en) * | 2003-07-14 | 2005-02-10 | Nippon Telegr & Teleph Corp <Ntt> | Electric field sensor |
| CN101074983A (en) * | 2006-05-17 | 2007-11-21 | 袁海骏 | Fiber magnetic optical probe device and its usage system |
| CN102472785A (en) * | 2009-06-29 | 2012-05-23 | 日本电气株式会社 | Probe for electric/magnetic field |
| CN101614770A (en) * | 2009-07-28 | 2009-12-30 | 西安交通大学 | A Surface Charge Measurement System Based on Electro-optic Effect |
| CN203324388U (en) * | 2013-05-23 | 2013-12-04 | 国家电网公司 | Optical crystal electric field sensor based on DFB laser |
| CN104635064A (en) * | 2015-02-11 | 2015-05-20 | 华北电力大学 | Light path structure of paper oil insulation space electric field measurement and adjusting method thereof |
Non-Patent Citations (2)
| Title |
|---|
| Microwave-Field Imaging with a Fiber-Based Electro-Optic Probe;K. Yang;《IEEE Lasers and Electro-Optics Society 2000 Annual Meeting》;20001231;第388-389页 * |
| 光学电磁场探测探针标定技术研究;张思敏 等;《计测技术》;20151231;第35卷(第4期);第62页第1节以及图1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106093599A (en) | 2016-11-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106093599B (en) | Optical probe and electromagnetic field measuring equipment and measuring method thereof | |
| CN101701852B (en) | An electro-optical sampling device and measurement method for measuring terahertz optical pulses | |
| US10215696B2 (en) | System for determining at least one property of a sheet dielectric sample using terahertz radiation | |
| CN104568819B (en) | All-fiber transmission reflection integrated terahertz time-domain spectroscopy system | |
| US7511511B2 (en) | Specific absorption rate measuring system, and a method thereof | |
| CN102937416B (en) | A kind of fully distributed fiber switched based on orthogonal polarisation state strains and vibration sensing method and device | |
| CN112098737B (en) | Method and device for measuring intensity of microwave electric field | |
| CN101074983B (en) | Fiber magnetic optical probe device and its usage system | |
| CN104316777A (en) | Electric field strength measurement system based on Pockels effect | |
| CN108982975B (en) | Electric field detector | |
| CN106441580A (en) | Terahertz Time-Domain Spectrometer with Variable Angle Incident Simultaneous Measurement of Transmission and Reflection | |
| CN112558001B (en) | Pulse high-power field calibration device and method | |
| CN112326588B (en) | Terahertz time-domain spectrometer | |
| CN103134997A (en) | Thunder and lightening detector based on optics principle | |
| CN113029341A (en) | High-precision laser polarization characteristic measurement and calibration device | |
| CN110988759A (en) | An omnidirectional magneto-optical pump magnetometer | |
| CN109782197B (en) | Implementation method of chip atomic sensing and its sensor | |
| KR101700875B1 (en) | Electormagnetic wave power sensing apparatus and system comprising thereof | |
| CN102928647B (en) | Optical profile type voltage sensor system and corresponding iterative demodulation method | |
| CN202330527U (en) | Optical electric field sensor | |
| CN116520037A (en) | Method and device for measuring polarization direction of microwave electric field based on Redberg atoms | |
| CN103267576B (en) | Device and method for light wave polarization state high-speed static measurement | |
| CN101561317B (en) | A high-precision system for automatically measuring the influence of the target on the polarization state of the transmitted beam | |
| CN107702888B (en) | For detecting the device and method of electro-optic phase modulator bandwidth | |
| CN108279390B (en) | Non-blind area optical pump magnetometer probe |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |