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CN106086948A - A kind of high temperature resistant type electroplate liquid additive - Google Patents

A kind of high temperature resistant type electroplate liquid additive Download PDF

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Publication number
CN106086948A
CN106086948A CN201610653364.9A CN201610653364A CN106086948A CN 106086948 A CN106086948 A CN 106086948A CN 201610653364 A CN201610653364 A CN 201610653364A CN 106086948 A CN106086948 A CN 106086948A
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CN
China
Prior art keywords
sodium
additive
high temperature
temperature resistant
electroplate liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610653364.9A
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Chinese (zh)
Inventor
高峰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taicang City Kai Fu Shi Machinery Co Ltd
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Taicang City Kai Fu Shi Machinery Co Ltd
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Filing date
Publication date
Application filed by Taicang City Kai Fu Shi Machinery Co Ltd filed Critical Taicang City Kai Fu Shi Machinery Co Ltd
Priority to CN201610653364.9A priority Critical patent/CN106086948A/en
Publication of CN106086948A publication Critical patent/CN106086948A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coloring (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)

Abstract

The invention discloses a kind of high temperature resistant type electroplate liquid additive, every kilogram of additive is containing following component: tetren 30 60g, diethanolamine 1 5g, pyrovinic acid 20 30g, vanillin 0.1 1g, saccharin sodium 1 3g, polyacrylamide 20 30g, diethylhexyl sodium sulfate 10 20g, sodium sulfite 1 5g, sodium lauryl sulphate 20 30g, aluminium polychlorid 15 25g, benzophenone 10 20g, polyoxyethylene 10 20g, tri-chlorination ammonium 10 20g, remaining is deionized water.

Description

A kind of high temperature resistant type electroplate liquid additive
Technical field
The invention belongs to spare parts processing machinery technical field, be specifically related to a kind of high temperature resistant type electroplate liquid additive.
Background technology
Plating utilizes electrolysis principle to plate the process of other metal or alloy of a thin layer on some metal surface exactly, is Utilize electrolysis to make the technique thus play of surface attachment layer of metal film of metal or other materials product prevent corrosion, carry High-wearing feature, electric conductivity, reflective and having improved aesthetic appearance etc. act on.
Electrolysis is utilized to deposit attachment on machinework good, but the metal coating that performance is different with matrix material Technology, electrodeposited coating is more uniform than hot dipping layer, and the most all ratios are relatively thin, from several microns to tens micron.By plating, can To obtain decoration protectiveness and various functional surface layer on machinework, it is also possible to repair abrasion and the work of processing error Part.
But at present, there is serious pollution problem in electroplating technology.
Summary of the invention
Goal of the invention: the problem and shortage existed for above-mentioned prior art, it is an object of the invention to provide a kind of resistance to height Warm type electroplate liquid additive.
Technical scheme: the invention discloses a kind of high temperature resistant type electroplate liquid additive, every kilogram of additive is containing following component: Tetren 30-60g, diethanolamine 1-5g, pyrovinic acid 20-30g, vanillin 0.1-1g, saccharin sodium 1-3g, polypropylene Amide 20-30g, diethylhexyl sodium sulfate 10-20g, sodium sulfite 1-5g, sodium lauryl sulphate 20-30g, polyaluminium Aluminum 15-25g, benzophenone 10-20g, polyoxyethylene 10-20g, tri-chlorination ammonium 10-20g, remaining is deionized water.
As the further optimization of the present invention, the present invention every kilogram additive is containing following component: tetren 30g, Diethanolamine 1g, pyrovinic acid 20g, vanillin 0.1g, saccharin sodium 1g, polyacrylamide 20g, diethylhexyl sodium sulfate 10g, Sodium sulfite 1g, sodium lauryl sulphate 20g, aluminium polychlorid 15g, benzophenone 10g, polyoxyethylene 10g, tri-chlorination ammonium 10g, remaining is deionized water.
As the further optimization of the present invention, the present invention every kilogram additive is containing following component: tetren 60g, Diethanolamine 5g, pyrovinic acid 30g, vanillin 1g, saccharin sodium 3g, polyacrylamide 30g, diethylhexyl sodium sulfate 20g, Asia Sodium sulfate 5g, sodium lauryl sulphate 30g, aluminium polychlorid 25g, benzophenone 20g, polyoxyethylene 20g, tri-chlorination ammonium 20g, remaining is deionized water.
As the further optimization of the present invention, the present invention every kilogram additive is containing following component: tetren 46g, Diethanolamine 3.8g, pyrovinic acid 22g, vanillin 0.6g, saccharin sodium 2.7g, polyacrylamide 26g, diethylhexyl sodium sulfate 19g, sodium sulfite 4g, sodium lauryl sulphate 24g, aluminium polychlorid 19g, benzophenone 14g, polyoxyethylene 14g, trichlorine Changing ammonium 14g, remaining is deionized water.
As the further optimization of the present invention, the present invention every kilogram additive is containing following component: tetren 52g, Diethanolamine 4.8g, pyrovinic acid 27g, vanillin 0.4g, saccharin sodium 2.7g, polyacrylamide 22g, diethylhexyl sodium sulfate 12g, sodium sulfite 2g, sodium lauryl sulphate 22g, aluminium polychlorid 22, benzophenone 12g, polyoxyethylene 12g, tri-chlorination Ammonium 12g, remaining is deionized water.
Beneficial effect: the present invention compared with prior art, has the advantage that plating solution stable in properties, it is possible to protect for a long time Holding limpid the most turbid, coating crystallization refinement, uniformity is good.
Detailed description of the invention
Below in conjunction with specific embodiment, the present invention is described in detail, but protection scope of the present invention is described also simultaneously Being not limited to the concrete scope of the present embodiment, based on the embodiment in the present invention, those of ordinary skill in the art are not making The every other embodiment obtained under creative work premise, broadly falls into the scope of protection of the invention.
Embodiment 1
Every kilogram of additive of the present embodiment contain following component: tetren 30g, diethanolamine 1g, pyrovinic acid 20g, Vanillin 0.1g, saccharin sodium 1g, polyacrylamide 20g, diethylhexyl sodium sulfate 10g, sodium sulfite 1g, lauryl sulphate acid Sodium 20g, aluminium polychlorid 15g, benzophenone 10g, polyoxyethylene 10g, tri-chlorination ammonium 10g, remaining is deionized water.
Embodiment 2
Every kilogram of additive of the present embodiment contain following component: tetren 60g, diethanolamine 5g, pyrovinic acid 30g, Vanillin 1g, saccharin sodium 3g, polyacrylamide 30g, diethylhexyl sodium sulfate 20g, sodium sulfite 5g, sodium lauryl sulphate 30g, aluminium polychlorid 25g, benzophenone 20g, polyoxyethylene 20g, tri-chlorination ammonium 20g, remaining is deionized water.
Embodiment 3
Every kilogram of additive of the present embodiment is containing following component: tetren 46g, diethanolamine 3.8g, pyrovinic acid 22g, vanillin 0.6g, saccharin sodium 2.7g, polyacrylamide 26g, diethylhexyl sodium sulfate 19g, sodium sulfite 4g, dodecane Base sodium sulfate 24g, aluminium polychlorid 19g, benzophenone 14g, polyoxyethylene 14g, tri-chlorination ammonium 14g, remaining is deionization Water.
Embodiment 4
Every kilogram of additive of the present embodiment is containing following component: tetren 52g, diethanolamine 4.8g, pyrovinic acid 27g, vanillin 0.4g, saccharin sodium 2.7g, polyacrylamide 22g, diethylhexyl sodium sulfate 12g, sodium sulfite 2g, dodecane Base sodium sulfate 22g, aluminium polychlorid 22, benzophenone 12g, polyoxyethylene 12g, tri-chlorination ammonium 12g, remaining is deionized water.

Claims (5)

1. a high temperature resistant type electroplate liquid additive, it is characterised in that: every kilogram of additive is containing following component: tetren 30-60g, diethanolamine 1-5g, pyrovinic acid 20-30g, vanillin 0.1-1g, saccharin sodium 1-3g, polyacrylamide 20-30g, Diethylhexyl sodium sulfate 10-20g, sodium sulfite 1-5g, sodium lauryl sulphate 20-30g, aluminium polychlorid 15-25g, two Benzophenone 10-20g, polyoxyethylene 10-20g, tri-chlorination ammonium 10-20g, remaining is deionized water.
A kind of high temperature resistant type electroplate liquid additive the most according to claim 1, it is characterised in that: under every kilogram of additive contains Row component: tetren 30g, diethanolamine 1g, pyrovinic acid 20g, vanillin 0.1g, saccharin sodium 1g, polyacrylamide 20g, diethylhexyl sodium sulfate 10g, sodium sulfite 1g, sodium lauryl sulphate 20g, aluminium polychlorid 15g, benzophenone 10g, polyoxyethylene 10g, tri-chlorination ammonium 10g, remaining is deionized water.
A kind of high temperature resistant type electroplate liquid additive the most according to claim 1, it is characterised in that: under every kilogram of additive contains Row component: tetren 60g, diethanolamine 5g, pyrovinic acid 30g, vanillin 1g, saccharin sodium 3g, polyacrylamide 30g, diethylhexyl sodium sulfate 20g, sodium sulfite 5g, sodium lauryl sulphate 30g, aluminium polychlorid 25g, benzophenone 20g, polyoxyethylene 20g, tri-chlorination ammonium 20g, remaining is deionized water.
A kind of high temperature resistant type electroplate liquid additive the most according to claim 1, it is characterised in that: under every kilogram of additive contains Row component: tetren 46g, diethanolamine 3.8g, pyrovinic acid 22g, vanillin 0.6g, saccharin sodium 2.7g, polypropylene Amide 26g, diethylhexyl sodium sulfate 19g, sodium sulfite 4g, sodium lauryl sulphate 24g, aluminium polychlorid 19g, hexichol Ketone 14g, polyoxyethylene 14g, tri-chlorination ammonium 14g, remaining is deionized water.
A kind of high temperature resistant type electroplate liquid additive the most according to claim 1, it is characterised in that: under every kilogram of additive contains Row component: tetren 52g, diethanolamine 4.8g, pyrovinic acid 27g, vanillin 0.4g, saccharin sodium 2.7g, polypropylene Amide 22g, diethylhexyl sodium sulfate 12g, sodium sulfite 2g, sodium lauryl sulphate 22g, aluminium polychlorid 22, hexichol first Ketone 12g, polyoxyethylene 12g, tri-chlorination ammonium 12g, remaining is deionized water.
CN201610653364.9A 2016-08-11 2016-08-11 A kind of high temperature resistant type electroplate liquid additive Pending CN106086948A (en)

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Application Number Priority Date Filing Date Title
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CN106086948A true CN106086948A (en) 2016-11-09

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110205659A (en) * 2019-07-17 2019-09-06 广州三孚新材料科技股份有限公司 Electrotinning additive and preparation method thereof

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB191509957A (en) * 1915-07-08 1916-03-30 Pascal Marino Improvements in the Preparation of Electrolytes for use in the Electrolytic Deposition of Metals.
CN1094765A (en) * 1994-01-24 1994-11-09 厦门大学 Basic plating method for bright Zn-Ni alloy
CN101240437A (en) * 2008-03-20 2008-08-13 北京航空航天大学 A method of electroplating zinc-nickel alloy in alkaline plating solution
CN101942684A (en) * 2010-10-09 2011-01-12 济南德锡科技有限公司 Alkaline electroplating Zn-Ni alloy additive, electroplating solution and preparation method
CN104789998A (en) * 2015-05-05 2015-07-22 广东达志环保科技股份有限公司 Bright-type alkaline cyanide-free galvanization electroplating solution and preparation method
CN104988544A (en) * 2015-06-26 2015-10-21 吕小方 Electrolytic tinning annexing agent
CN105780070A (en) * 2016-04-25 2016-07-20 广州博泉环保材料科技有限公司 Alkaline zinc-nickel alloy electroplating technology and serial additives thereof

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB191509957A (en) * 1915-07-08 1916-03-30 Pascal Marino Improvements in the Preparation of Electrolytes for use in the Electrolytic Deposition of Metals.
CN1094765A (en) * 1994-01-24 1994-11-09 厦门大学 Basic plating method for bright Zn-Ni alloy
CN101240437A (en) * 2008-03-20 2008-08-13 北京航空航天大学 A method of electroplating zinc-nickel alloy in alkaline plating solution
CN101942684A (en) * 2010-10-09 2011-01-12 济南德锡科技有限公司 Alkaline electroplating Zn-Ni alloy additive, electroplating solution and preparation method
CN104789998A (en) * 2015-05-05 2015-07-22 广东达志环保科技股份有限公司 Bright-type alkaline cyanide-free galvanization electroplating solution and preparation method
CN104988544A (en) * 2015-06-26 2015-10-21 吕小方 Electrolytic tinning annexing agent
CN105780070A (en) * 2016-04-25 2016-07-20 广州博泉环保材料科技有限公司 Alkaline zinc-nickel alloy electroplating technology and serial additives thereof

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
张允诚等主编: "《电镀手册》", 31 January 2007 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110205659A (en) * 2019-07-17 2019-09-06 广州三孚新材料科技股份有限公司 Electrotinning additive and preparation method thereof
CN110205659B (en) * 2019-07-17 2020-06-16 广州三孚新材料科技股份有限公司 Electrotinning additive and preparation method thereof

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