CN106086886B - A kind of self-lubricating titanium diboride/diamond-like carbon coating and its preparation method and application - Google Patents
A kind of self-lubricating titanium diboride/diamond-like carbon coating and its preparation method and application Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 63
- 239000011248 coating agent Substances 0.000 title claims abstract description 62
- 229910033181 TiB2 Inorganic materials 0.000 title claims abstract description 59
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 title claims abstract description 36
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 238000002360 preparation method Methods 0.000 title claims abstract description 21
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000000151 deposition Methods 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 17
- 239000000919 ceramic Substances 0.000 claims abstract description 16
- 230000008021 deposition Effects 0.000 claims abstract description 11
- 230000008569 process Effects 0.000 claims abstract description 8
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 20
- 238000004544 sputter deposition Methods 0.000 claims description 15
- 238000005530 etching Methods 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 13
- 229910002804 graphite Inorganic materials 0.000 claims description 13
- 239000010439 graphite Substances 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 claims description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- 229910052786 argon Inorganic materials 0.000 claims description 10
- 238000010884 ion-beam technique Methods 0.000 claims description 10
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 8
- 230000000737 periodic effect Effects 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000008367 deionised water Substances 0.000 claims description 5
- 229910021641 deionized water Inorganic materials 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 239000002052 molecular layer Substances 0.000 claims 1
- 238000004377 microelectronic Methods 0.000 abstract description 4
- 238000009776 industrial production Methods 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000005461 lubrication Methods 0.000 abstract 1
- 239000011159 matrix material Substances 0.000 description 32
- 239000000463 material Substances 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229960000935 dehydrated alcohol Drugs 0.000 description 3
- 239000011253 protective coating Substances 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- 230000017105 transposition Effects 0.000 description 3
- 229910009043 WC-Co Inorganic materials 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 241000208340 Araliaceae Species 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/046—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with at least one amorphous inorganic material layer, e.g. DLC, a-C:H, a-C:Me, the layer being doped or not
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of self-lubricating titanium diboride (TiB2)/Diamond-like Carbon (DLC) hard coat and preparation method thereof.The TiB2/ DLC hard coat is to use bipolar pulse magnetron sputtered deposition technology in substrate by TiB2Ceramic layer is periodically overlapped mutually with DLC layer, TiB2The modulation period of/DLC hard coat is 15~60nm, and total coating thickness is 1.2~1.4 μm.TiB of the present invention2/ DLC hard coat combines TiB2With the advantage of DLC respectively, with excellent hardness and lubrication property, and there is good electric conductivity, the pulsed magnetron sputtering deposition technique used simultaneously is easy to operate, simple process, short preparation period are at low cost, convenient for large-scale industrial production, it can be widely applied to the fields such as cutter, mold, microelectronics, protection.
Description
Technical field
The invention belongs to surface protection technique and related coatings technical fields, are related to a kind of laminated coating of self-lubricating, more
In particular it relates to a kind of titanium diboride (TiB with high rigidity, the periodic multilayer structure of low-friction coefficient2)/diamond-like
(DLC) coating and its preparation method and application.
Background technique
With the development of society and the progress of industrial technology, industrial circle proposes higher and higher want to the performance of material
It asks, there is excellent comprehensive performance in many engineer application application requirements materials;It is not required nothing more than with high hardness, corrosion-resistant
Performance also requires it with low coefficient of friction, good high-temperature stability etc..To meet increasingly complicated and diversified engineering need
It asks, coats one layer of hard coat on the surface of the material, come into being with improving the protective coating of comprehensive performance of material.Hard applies
Layer can improve the surface property of material, reduce the friction and wear with workpiece, the effective material surface hardness, toughness, resistance to of improving
Mill property and high-temperature stability, increase substantially the service life of coating product.Hard coat is improve material surface property one
The economical and practical means of kind, are being machined at present, are especially occupying an important position in metal cutting.Its development adapts to
High-tech requirement of the modern manufacturing industry to metal cutting tool, causes the great change of cutter material and performance, can be widely used
In fields such as machine-building, auto industry, textile industry, geological drilling, mould industry, aerospaces.
Titanium diboride (TiB2) it is used as magnesium-yttrium-transition metal boride, there is high rigidity, high-melting-point, high wearability and corrosion resistant
Corrosion, good conductivity and a series of excellent physicochemical properties such as thermal conductivity, chemical stability be excellent, be it is a kind of have it is excellent
Structural behaviour and functional performance advanced ceramics material.Diamond-like coating (DLC) is that one kind contains gold in microstructure
The coating of hard rock ingredient.The element for constituting DLC is carbon, with sp between carbon atom and carbon atom3And sp2Strong form combines, due to
Containing diamond components, DLC has many excellent characteristics, such as: high rigidity, low-friction coefficient, fabulous film layer compactness,
Good chemical stability and good optical property etc..The property shown applied to the DLC coating on cutter
Far more than other hard coats.
Titanium diboride is easy to produce crackle when being impacted and the failure that falls off since toughness is poor, causes it as protection
The service efficiency and application field of coating are restricted.Currently used hard coat toughening mode has multilayered structure toughening and soft
Matter Xiang Zengren.Due to being limited by structure and doping content, making coating performance is in periodically to change and unstable, Huo Zheren
Property improve while hardness decline it is very big.Therefore, it explores and can be realized the hard and tough coating skill urgently to be resolved as this field
Art problem.
Summary of the invention
The purpose of the invention is to overcome the deficiencies of the prior art and provide a kind of high rigidity, low stress, low friction system
Excellent toughness is counted and had, can apply to the multilayer hard protective coating of the product surfaces such as component of machine, knife mold.Adopt
Use TiB2With the combination of DLC, by TiB2What layer and DLC layer alternating deposit were formed on matrix has high rigidity and high friction resistance
The hard coat of the periodic multilayer structure of energy.
Another mesh of the invention is to provide above-mentioned self-lubricating titanium diboride TiB2The system of/diamond-like DLC hard coat
Preparation Method, the preparation method have easy to operate, simple process, and short preparation period is at low cost, are convenient for large-scale industrial production
The advantages that.
Still a further object of the present invention is to provide above-mentioned self-lubricating titanium diboride TiB2/ diamond-like DLC hard coat cutter,
Application in mold, microelectronics and protection field.
Above-mentioned purpose of the present invention is to be achieved by the following technical programs:
A kind of self-lubricating titanium diboride TiB2/ diamond-like DLC coating, the TiB2/ DLC coating is with TiB2Ceramic target
It is raw material with graphite target, replaces sputtering sedimentation on matrix by multi-target magnetic control sputtering and formed by TiB2Nano-ceramic layer and DLC
Nanometer layer is periodically overlapped mutually.
Preferably, the TiB2Ceramic target is flat target, and the atomic ratio of Ti and B are 1:2, purity 99.99%;Graphite target
For Style Columu Talget, purity 99.99%.
Preferably, described matrix is one of hard alloy, monocrystalline silicon piece, alumina wafer or glass.
Preferably, described matrix and TiB2Nanometer layer contact, the DLC nanometer layer are outermost layer, TiB2/ DLC hard coat
Overall thickness is 1.2~1.4 μm.
Preferably, the DLC layer with a thickness of 5~10nm/ layers, TiB2Layer with a thickness of 10~50nm/ layers, the TiB2/
DLC and TiB in DLC hard coat2Total number of plies be 20~80 layers.
A kind of above-mentioned self-lubricating TiB2The preparation method of/DLC hard coat, comprises the following specific steps that:
S1. it cleans matrix: polished treated matrix being sent into supersonic wave cleaning machine, successively uses acetone, dehydrated alcohol
10~20min of ultrasonic cleaning is carried out respectively with 15~30kHz, is then cleaned with deionized water, then with the nitrogen of purity >=99.5%
Air-blowing is dry;
S2. it vacuumizes and cleans plated film cavity with ion beam etching: the matrix after ultrasonic cleaning is placed in the workpiece of vacuum chamber
On bracket, it is evacuated to vacuum degree 5.0 × 10-3Pa is passed through 80~100sccm argon gas to ion source hereinafter, later on ion source, if
The power for setting ion source is 0.9kW, and the bias that work support is arranged is -300~-500V, etch cleaner process continues 20~
30min;
S3. ion beam etching matrix: by matrix as in front of ion source, setting bias is -300~-500V, working time
For 15~20min;
S4.TiB2The preparation of/DLC hard coat: using the method for bipolar pulse magnetron sputtering, matrix and bracket ginseng are set
Number, target are passed through 80~100sccm of argon gas at a distance from matrix, control 0.5~0.6Pa of gas pressure in vacuum, open and electricity is arranged
Source parameter, wherein TiB2Ceramic target is A target, and graphite target is B target, by sample baffle transposition in TiB2Before ceramic target and graphite target, rise
Brightness after 10~15min of pre-sputtering, opens sample baffle, starts sputtering sedimentation TiB2/ DLC hard coat, sputtering time 3h.
S5. deposition terminates, and closes power supply, is down to room temperature to vacuum room temperature, fills atmosphere toward vacuum chamber, opens vacuum chamber and takes
Sample out forms TiB in matrix surface2/ DLC hard coat.
Preferably, matrix described in step S4 and support parameter are as follows: substrate bias -100~-300V, bracket rotation 3rpm/
Min, revolve 2~5rpm/min, is arranged 300 DEG C of depositing temperature.
Preferably, power parameter described in step S4 are as follows: frequency 40kHz, 3~4kW of power, the A target pulse power account for
Sky is than being 25~75%.
Preferably, target described in step S4 is 6~10cm at a distance from matrix.
Above-mentioned self-lubricating titanium diboride/diamond-like hard coat is in the surfacecti proteon field of cutter, mold and microelectronics
In application it is also within the scope of the present invention.
Compared with prior art, the invention has the following advantages:
1. TiB of the invention2/ DLC hard coat has periodic multilayered structure, has not only had high rigidity but also has had good
Toughness, while anti-friction, polishing machine, electric conductivity and resistance to chemical corrosion show good TiB2/ DLC hard applies
Layer.Wherein, TiB2With hexagonal crystallographic texture and (001) preferred orientation;DLC layer contains a certain number of SP3Key.Due to being added
DLC layer makes TiB2/ DLC coating has high rigidity and lower coefficient of friction, is lower than with the coefficient of friction of GCr15 steel ball
0.30, to show excellent crocking resistance, can be used as protective coating for high friction resistance energy and high rigidity
Engineering applications, can be used for the surfacecti proteon field of cutter, mold, microelectronics.
2. the TiB that present invention preparation has nanometer laminated structure2/ DLC hard coat, easy to operate, simple process, preparation
Period is short, at low cost, is convenient for large-scale industrial production.
Detailed description of the invention
Fig. 1 is TiB prepared by embodiment 12/ DLC coating structure schematic diagram.
Fig. 2 is TiB prepared by embodiment 12/ DLC coating XRD diagram.
Fig. 3 is TiB prepared by embodiment 12The surface SEM of/DLC coating schemes.
Fig. 4 is TiB prepared by embodiment 12The scratch shape appearance figure of/DLC coating.
Specific embodiment
The contents of the present invention are further illustrated with specific embodiment with reference to the accompanying drawings of the specification, but should not be construed as to this
The limitation of invention.Unless otherwise specified, the conventional hand that technological means used in embodiment is well known to those skilled in the art
Section.Unless stated otherwise, the present invention uses reagent, method and apparatus is the art conventional reagents, method and apparatus.
Embodiment 1
1. preparation:
S1. it cleans matrix: polished treated WC-Co hard alloy matrix being sent into supersonic wave cleaning machine, is successively used
Acetone, dehydrated alcohol carry out ultrasonic cleaning 10min with 30kHz respectively, are then cleaned with deionized water, then with purity >=99.5%
Be dried with nitrogen.
S2. vacuumize and ion beam etching cleaning chamber and matrix: ion plating equipment installs TiB2Flat target and graphite column
Shape target cleans coating chamber with high power dust catcher.Matrix after ultrasonic cleaning is placed on the work support of vacuum chamber, is evacuated to true
Reciprocal of duty cycle 5.0 × 10-3Pa is passed through 80sccm argon gas to ion source, ion source power 0.9kW is arranged hereinafter, later on ion source,
Work support bias -300V is set, this etching cleaning process continues 20min.
S3. ion beam etching matrix: rotation pivoted frame, by matrix as in front of ion source, being arranged bias -500V, when work
Between be 20min.
S4. it is passed through argon gas 80sccm, controls gas pressure in vacuum 0.56Pa, using the method for bipolar pulse magnetron sputtering,
TiB2Ceramic target is A target, and graphite target is B target, and target is 10cm at a distance from matrix, matrix and support parameter is arranged are as follows: matrix
Bias -100V, bracket rotation 3rpm/min, revolve 2rpm/min, is arranged 300 DEG C of depositing temperature.It opens and power parameter is set
Are as follows: frequency 40kHz, power 4kW, A target pulse power duty ratio be 75%.By sample baffle transposition in two sputtering targets
Before, build-up of luminance after carrying out pre-sputtering 10min, opens sample baffle, starts formal sputtering depositing Ti B2/ DLC laminated coating, deposition
Time is 3h.
S5. deposition terminates, and closes power supply, is down to room temperature to vacuum room temperature, fills atmosphere toward vacuum chamber, opens vacuum chamber and takes
Sample out forms the TiB of periodic multilayer structure in WC-Co hard alloy matrix surface2/ DLC coating.
2. performance test:
Fig. 1 is TiB2/ DLC coating structure schematic diagram.Wherein, DLC layer with a thickness of 5~10nm/ layers, TiB2The thickness of layer
It is 10~50nm/ layers, TiB2DLC and TiB in/DLC hard coat2Total number of plies be 20~80 layers.Fig. 2 is TiB2/ DLC coating
XRD diagram, it can be seen that TiB2Well-crystallized has 001 preferred orientation, and DLC is amorphous state.Fig. 3 is TiB2/ DLC coating
Surface SEM figure, it can be seen that coating surface is smooth, without apparent particle agglomeration, the results showed that coating surface growth is good
It is good, dense uniform.
By the TiB of preparation2/ DLC coating sample carries out analysis test, with Anton Paar NHT2 type nano-hardness tester testing coating
Hardness and elastic modulus, the results showed that, TiB2/ DLC coating shows good toughness, and elastic resilience is up to 50%;It measures
Coating hardness reaches 35Gpa;Measuring coefficient of friction with HSR-2M coating friction wear testing machine is 0.19, after sample wears 1h,
Have no failure, it is seen that TiB2/ DLC coating has good wear Characteristics.It is residual that coating is measured with the general membrane stress instrument of speed
Overbottom pressure stress 0.5Gpa;With Anton Paar MST type nano impress instrument, test results are shown in figure 4, Fig. 4 TiB2/ DLC coating is drawn
Trace shape appearance figure.There it can be seen that scratch increases with load, scratch gradually broadens, and load increases depth and increases, around scratch
Without film layer obscission, and without cracked in scoring groove, the more smooth groove of appearance, the results showed that in Hardness loss
TiB in the case where less2/ DLC coating shows preferable toughness.Coated film base junction closes critical load and reaches 10GPa, coating attachment
It has excellent performance;Finally by obtained TiB2/ DLC coating carries out acid-fast alkali-proof corrosion test at normal temperature, the results showed that, TiB2/
DLC coating has good chemical stability.
Embodiment 2
S1. it cleans matrix: the polished single crystal silicon substrate that treated (100) is orientated is sent into supersonic wave cleaning machine, according to
It is secondary that ultrasonic cleaning 10min is carried out respectively with 30kHz with acetone, dehydrated alcohol, then rinsed with deionized water, then with purity >=
99.5% is dried with nitrogen.
S2. vacuumize and ion beam etching cleaning chamber and matrix: ion plating equipment installs TiB2Flat target and graphite column
Shape target cleans coating chamber with high power dust catcher.Matrix after ultrasonic cleaning is placed on the work support of vacuum chamber, vacuum chamber
It vacuumizes, until vacuum 5.0 × 10-3Pa is passed through 80sccm argon gas to ion source, ion source is arranged hereinafter, later on ion source
Work support bias 300V is arranged in power 0.9kW, this etching cleaning process continues 20min.
S3. ion beam etching matrix: rotation pivoted frame, by matrix as in front of ion source, being arranged bias -500V, when work
Between be 20min.
S4. it is passed through argon gas 80sccm, controls gas pressure in vacuum 0.56Pa, using the method for bipolar pulse magnetron sputtering,
TiB2Ceramic target is A target, and graphite target is B target, and target is 6cm at a distance from matrix, matrix and support parameter is arranged are as follows: matrix is inclined
Pressure -300V, bracket rotation 3rpm/min, revolve 5rpm/min, is arranged 300 DEG C of depositing temperature.It opens and power parameter is set are as follows:
Frequency 40kHz, power 4kW, A target pulse power duty ratio be 25%.By sample baffle transposition before two sputtering targets, rise
Brightness after carrying out pre-sputtering 15min, opens sample baffle, starts formal sputtering depositing Ti B2/ DLC laminated coating, sedimentation time
3h。
S5. deposition terminates, and closes power supply, is down to room temperature to vacuum room temperature, inflates toward vacuum chamber, opens vacuum chamber and takes out
Sample forms the TiB of periodic multilayer structure on the single crystal silicon substrate surface of (100) orientation2/ DLC coating.
The above embodiment of the present invention only to clearly illustrate example of the present invention, and is not to reality of the invention
Apply the restriction of mode.For those of ordinary skill in the art, it can also make on the basis of the above description other
Various forms of variations.There is no necessity and possibility to exhaust all the enbodiments.It is all in the spirit and principles in the present invention
Within made any modifications, equivalent replacements, and improvements etc., should all be included in the scope of protection of the claims of the present invention.
Claims (10)
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CN106756820B (en) * | 2016-12-01 | 2019-04-05 | 深圳先进技术研究院 | Containing diamond-like composite coating and preparation method thereof |
CN106835133A (en) * | 2016-12-21 | 2017-06-13 | 中国科学院深圳先进技术研究院 | A kind of workpiece with titanium diboride diamond composite coating and preparation method thereof |
CN109136839B (en) * | 2017-06-28 | 2024-01-26 | 深圳先进技术研究院 | Workpiece with aluminum-doped titanium diboride coating and preparation method thereof |
CN109750291A (en) * | 2017-11-07 | 2019-05-14 | 深圳先进技术研究院 | A kind of boron-doped diamond electrode and preparation method thereof |
CN107937873B (en) * | 2017-12-22 | 2023-11-14 | 深圳先进技术研究院 | Carbon-doped transition metal boride coating, carbon-transition metal boride composite coating, preparation method and application thereof, and cutting tool |
CN108300967A (en) * | 2018-03-29 | 2018-07-20 | 武汉大学 | High temperature resistant low friction DLC/AlTiSiN multi-layer composite coatings and preparation method thereof |
CN113529031B (en) * | 2020-04-13 | 2023-09-08 | 季华实验室 | Diamond-like film and preparation method thereof |
CN112458399A (en) * | 2020-11-24 | 2021-03-09 | 创隆实业(深圳)有限公司 | TiB2Preparation method of DLC coating |
CN114033799B (en) * | 2021-11-29 | 2024-02-27 | 江苏科技大学 | Method for processing composite lubrication structure of sliding bearing based on electron beam curing |
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