CN106014916B

CN106014916B - Cryogenic pump

Info

Publication number: CN106014916B
Application number: CN201610194298.3A
Authority: CN
Inventors: 及川健
Original assignee: Sumitomo Heavy Industries Ltd
Current assignee: Sumitomo Heavy Industries Ltd
Priority date: 2015-03-31
Filing date: 2016-03-31
Publication date: 2018-07-03
Anticipated expiration: 2036-03-31
Also published as: CN106014917B; CN106014916A; CN106014917A

Abstract

The present invention provides a kind of cryogenic pump of the occlusion limit that can improve cryogenic pump.The cryogenic pump (10) of the present invention has top low temperature plate (41), which is divided into shielding part cavity top (33a) and shielding part cavity lower part (33b) by shielding part cavity (33).Radiation barrier part (30) have make the main slit of shielding part (36) that shielding part lateral gap (20) is connected with shielding part cavity lower part (33b).Radiation barrier part (30) can have shielding part auxiliary slit (37), shielding part auxiliary slit (37) is formed in the position different from the main slit of shielding part (36), and shielding part lateral gap (20) is made to be connected with shielding part cavity lower part (33b) in the axial direction of cryogenic pump (10).Shielding part auxiliary slit (37) can be formed in the axial direction between top low temperature plate (41) and the main slit of shielding part (36).

Description

Cryogenic pump

This application claims based on Japanese patent application 2015-073196,2015- filed in 31 days March in 2015 The priority of No. 073197.The entire content of this Japanese application is incorporated by reference in this manual.

Technical field

The present invention relates to a kind of cryogenic pumps.

Background technology

Cryogenic pump is to be captured gas in the vacuum pump for the cryopanel for being cooled to ultralow temperature by condensing or adsorbing.In this way, The vacuum chamber for being equipped with cryogenic pump is exhausted in cryogenic pump.

Cryogenic pump typically is provided with being cooled to the 1st cryopanel of a certain temperature and is cooled to the temperature lower than the 1st cryopanel The 2nd cryopanel.1st cryopanel includes radiation barrier part.With the use of cryogenic pump, the condensation of the gas on the 2nd cryopanel Layer can grow up.Certain part of condensate layer eventually with radiation barrier part or the 1st cryopanel contacts.Thus, in the contact Position gas can gasify and the pressure inside cryogenic pump is caused to rise again.Later, cryogenic pump is just unable to give full play to vacuum This original effect is exhausted in chamber.Therefore, the hold-up of gas at the time of condensate layer is contacted with the 1st cryopanel is determined Determine the occlusion limit of cryogenic pump.

Patent document 1：International Publication No. 2005/050018

Invention content

The illustrative first purpose of one embodiment of the present invention is to improve the occlusion limit of cryogenic pump.

A kind of embodiment according to the present invention, provides a kind of cryogenic pump, has：Low temperature pump receptacle has cryogenic pump Air entry；Refrigeration machine has and is contained in the High-temperature cooling platform of the low temperature pump receptacle and sub-cooled platform；Radiation barrier part, The cryogenic pump air entry has shielding part main opening, and the radiation barrier part delimitation connects in an axial direction from the shielding part main opening Continuous shielding part cavity, the radiation barrier part is thermally connected with the High-temperature cooling platform and the sub-cooled platform is contained in institute Shielding part cavity is stated, shielding part lateral gap is formed between the radiation barrier part and the low temperature pump receptacle；It is and multiple Cryopanel is thermally connected with the sub-cooled platform and is disposed in a manner of not contacted with the radiation barrier part described respectively In shielding part cavity, the multiple cryopanel includes top low temperature plate, and the top low temperature plate separates the shielding part cavity For shielding part cavity top and shielding part cavity lower part, also there is the radiation barrier part the main slit of shielding part and shielding part to assist Slit, the main slit of shielding part make the shielding part lateral gap be connected with the shielding part cavity lower part, the shielding part Auxiliary slit is formed in the position different from the main slit of the shielding part in the axial direction and makes the shield lateral gap It is connected with the shielding part cavity lower part.

A kind of embodiment according to the present invention, provides a kind of cryogenic pump, has：Low temperature pump receptacle has cryogenic pump Air entry；Refrigeration machine has and is contained in the High-temperature cooling platform of the low temperature pump receptacle and sub-cooled platform；Radiation barrier part, The cryogenic pump air entry has shielding part main opening, and the radiation barrier part delimitation connects in an axial direction from the shielding part main opening Continuous shielding part cavity, the radiation barrier part is thermally connected with the High-temperature cooling platform and the sub-cooled platform is contained in institute Shielding part cavity is stated, shielding part lateral gap is formed between the radiation barrier part and the low temperature pump receptacle；It is and multiple Cryopanel is thermally connected with the sub-cooled platform and is disposed in a manner of not contacted with the radiation barrier part described respectively In shielding part cavity, the multiple cryopanel includes：The shielding part cavity is divided on shielding part cavity by top low temperature plate Portion and shielding part cavity lower part；And the 1st lower section cryopanel, the shielding part cavity lower part is disposed in, the radiation barrier part is also With the main slit of shielding part, the main slit of shielding part makes the shielding part lateral gap connect with the shielding part cavity lower part It is logical, it is formed with radial clearance between the top low temperature plate and the radiation barrier part, the 1st lower section cryopanel has the 1 lower section cryopanel outer circumference end is formed with the 1st radially below the described 1st between cryopanel outer circumference end and the radiation barrier part Interval, the 1st spaced radial are wider than the radial clearance.

In addition, the skill that the constitutive requirements of the present invention or the form of expression are replaced mutually between method, apparatus and system etc. The mode that art also serves as the present invention is effective.

In accordance with the invention it is possible to improve the occlusion limit of cryogenic pump.

Description of the drawings

Fig. 1 is the vertical view for the major part for showing schematically the cryogenic pump involved by one embodiment of the present invention.

Fig. 2 is the line A-A sectional view for showing schematically cryogenic pump shown in FIG. 1.

Fig. 3 is a kind of part for the structure feature for showing schematically the cryogenic pump involved by one embodiment of the present invention Sectional view.

Fig. 4 is a kind of part for the structure feature for showing schematically the cryogenic pump involved by one embodiment of the present invention Sectional view.

Fig. 5 is a kind of part for the structure feature for showing schematically the cryogenic pump involved by one embodiment of the present invention Sectional view.

In figure：10- cryogenic pumps, 12- air entries, 16- refrigeration machines, 18- low temperature pump receptacles, 20- shielding part lateral gaps, The 1st cooling benches of 22-, the 2nd cooling benches of 24-, 30- radiation barrier parts, 31- shielding part main openings, 32- board members, 33- shielding parts are empty Chamber, 33a- shielding part cavitys top, 33b- shielding part cavitys lower part 34- shielding parts bottom, the main slit of 36- shielding parts, 37- shieldings Part assists slit, 38- shielding parts top, 40- shielding parts lower part, 41- top low temperature plates, 41a- top low temperature plate outer circumference ends, 42- 1st lower section cryopanel, the 1st lower section cryopanel outer circumference ends of 42a-, the 1st lower section cryopanel side surfaces of 42b-, the 2nd lower section low temperature of 43- Plate, the 2nd lower section cryopanel outer circumference ends of 43a-, the 2nd lower section cryopanel side surfaces of 43b-, 44- bottoms cryopanel, 44a- bottoms low temperature Plate outer circumference end, 44b- bottoms cryopanel central opening, 45- connection cryopanels, 50- radial clearances, the 1st spaced radials of 52-, 54- 2nd spaced radial, 56- central spaces portion, 58- bottom gaps, 60- annuluses portion, 62- axial direction cryopanels interval.

Specific embodiment

Hereinafter, detailed description of embodiments of the present invention for refer to the attached drawing.In addition, in explanation, to identical important document Identical symbol is marked, and suitably omits repeated explanation.Also, structure described below is example, not to the model of the present invention It encloses and does any restriction.

First, the process for completing one embodiment of the present invention is illustrated with its summary.

In the cryogenic pump with multiple 2nd cryopanels, the condensate layer growth rate on each 2nd cryopanel is because of each The configuration position of 2 cryopanels is different and different.If the configuration of some the 2nd cryopanel enters close to gases such as cryogenic pump air entries The position of mouth, then many gases can reach the 2nd cryopanel from gas access, therefore be deposited in the condensation of the 2nd cryopanel Layer being capable of Fast Growth.On the contrary, be deposited in far from gas access another the 2nd cryopanel condensate layer then can slowly into It is long.

Multiple 2nd cryopanels can include the top low temperature plate opposite with cryogenic pump air entry.Top low temperature plate can be The cavity in radiation barrier part to be divided into the cavity lower part on the cavity top of cryogenic pump air entry side and its opposite side Mode is disposed in the large flat component in the cavity.But in order to maintain temperature difference, top low temperature plate especially top low temperature The periphery of plate is not contacted with radiation barrier part.Cavity top directly receives gas from air entry, therefore in top low temperature plate Front surface, condensate layer can Fast Growths.On the other hand, portion, condensate layer are slowly grown up under the cavity.Therefore, cavity top into When long condensate layer touches radiation barrier part, portion under the cavity may also there are spare spaces around condensate layer.

In this way, when the condensate block of a certain position growth touches 1 cryopanel, at other positions, condensate layer and the 1st It may also there are spare space (that is, can accommodate the volume of condensate layer) between cryopanel.This shows that cryogenic pump occludes pole at it Still there is potential surplus energy in limit.

The utilization rate of cryogenic pump inner space is improved by reducing unemployed spare space, cryogenic pump can be improved The occlusion limit.It is preferable that if condensate is contacted in all sites with the 1st cryogenic pump simultaneously, do not have completely at this time There is unemployed spare space (that is, the layer that is condensed completely in cryogenic pump fills up), the occlusion limit of cryogenic pump becomes maximum.

In order to reduce spare space, it is desirable that reduce the difference of the condensate layer growth rate of each 2nd cryopanel, i.e. requirement makes Condensate layer growth rate equalization.At the same time it or replaces, it is desirable that according to the condensate layer growth rate of each 2nd cryopanel The adjustment condensate adjacent with the 2nd cryopanel accommodates volume.

Determine that the principal element of the condensate layer growth rate of some the 2nd cryopanel is, relative to the 2nd cryopanel The opening area of gas access.For example, if gas access is big, condensate layer can Fast Growth.Also, condensate layer growth rate The relative position relation between gas access and the 2nd cryopanel is also suffered from (for example, between gas access and the 2nd cryopanel Distance and/or relative to gas access the 2nd cryopanel angle position) influence.If for example, the 2nd cryopanel and gas Entrance is near, then condensate layer can Fast Growth.If the angle position of the 2nd cryopanel is condensed close to the normal of gas access Layer can Fast Growth.

In this regard, a kind of embodiment according to the present invention, design of cryopumps into, condensate layer some the 2nd cryopanel with Grown up on another the 2nd cryopanel with a certain substantially impartial speed.For example, make top low temperature plate and be configured at shielding part sky Some the 2nd cryopanel of chamber lower part has impartial condensate layer growth rate.Alternatively, make to be configured at shielding part cavity lower part Some the 2nd cryopanel has impartial condensate layer growth rate with another the 2nd cryopanel.For example, in a kind of embodiment In, it will be designed towards the configuration of the cryopanel in the gas access path of shielding part cavity lower part and/or shielding part cavity lower part Into the growth rate for making condensate layer is impartial.

It, can be in the week of the 2nd cryopanel also, if the condensate layer growth rate of some the 2nd cryopanel is larger It encloses to form wider condensate layer receiving volume.The 2nd cryopanel and other can be determined in a manner of it can realize the above situation Geometry relative position between cryopanel (the 1st cryopanel, and/or another the 2nd cryopanel) is (for example, between cryopanel Institute is angled between distance, and/or cryopanel).

Thus, the unemployed surplus energy of cryogenic pump can be actually used, so as to improve inside cryogenic pump The utilization rate in space.Therefore, it is possible to improve the occlusion limit of cryogenic pump.

Fig. 1 is the vertical view for the part for showing schematically the cryogenic pump 10 involved by one embodiment of the present invention, Fig. 2 is the line A-A sectional view for showing schematically cryogenic pump 10 shown in FIG. 1.

Cryogenic pump 10 is for example installed on the vacuum chamber of vacuum treatment installation, and is used for the vacuum degree inside vacuum chamber It improves to the level required by desirable technique.The vacuum treatment installation of installation cryogenic pump 10 for example has sputter equipment.

Cryogenic pump 10 has the air entry 12 for receiving gas.Gas to be discharged is from the vacuum for being equipped with cryogenic pump 10 Chamber enters the inner space of cryogenic pump 10 by air entry 12.

In addition, below for the ease of understanding the position relationship of the constitutive requirements of cryogenic pump 10, " axial direction ", " diameter are used sometimes To " etc. terms.The axial direction (along the direction for the single dotted broken line for representing center line C in Fig. 2) represented through air entry 12, radially It represents along the direction (direction vertical with center line C) of air entry 12.It for convenience's sake, sometimes will be relatively close in the axial direction The side of air entry 12 be referred to as " on ", be relatively distant from air entry 12 side be referred to as " under ".That is, it will be relatively distant from cryogenic pump sometimes The side of 10 bottoms be referred to as " on ", the side of relatively close 10 bottom of cryogenic pump be referred to as " under ".About radially, will be close to inhale sometimes The side at the center (axis C centered in Fig. 2) of gas port 12 is referred to as " interior ", and the side that will be close to the periphery of air entry 12 is referred to as " outer ".In addition, this configuration expressed when vacuum chamber is installed on cryogenic pump 10 is unrelated.For example, cryogenic pump 10 can also be with Air entry 12 is made to be installed on vacuum chamber along vertical direction mode directed downwardly.

Also, it will be referred to as " circumferential direction " around axially direction sometimes.It is circumferential be along the 2nd direction of air entry 12, and for Radially orthogonal tangential direction.

Cryogenic pump 10 has refrigeration machine 16, at least one 1st cryopanel, at least one 2nd cryopanel and low temperature pump receptacle 18。

Refrigeration machine 16 is, for example, the ultra-low temperature refrigerating devices such as Ji Fude-McMahon formula refrigeration machine (so-called GM refrigeration machines). Refrigeration machine 16 is the two-stage type refrigeration machine for having the 1st cooling bench 22, the 1st cylinder body 23, the 2nd cooling bench 24 and the 2nd cylinder body 25.1st The room temperature portion of refrigeration machine 16 is connected to the 1st cooling bench 22 by cylinder body 23.2nd cylinder body 25 is cold for the 1st cooling bench 22 is connected to the 2nd But the coupling part of platform 24.

The cryogenic pump 10 of diagram is pumped for so-called horizontal low temperature.Horizontal low temperature pump typically refer to refrigeration machine 16 be arranged to it is low The central shaft C of temperature pump 10 intersects the cryogenic pump of (usually orthogonal).In refrigeration machine 16, the 1st cylinder body 23, the 1st cooling bench the 22, the 2nd 25 and the 2nd cooling bench 24 of cylinder body is successively along the arranged radially of cryogenic pump 10.

In addition, the present invention may be equally applicable for so-called vertical low temperature pump.Vertical low temperature pump refers to refrigeration machine along low temperature The cryogenic pump being axially arranged of pump.

Refrigeration machine 16 is configured to, and the 1st cooling bench 22 is cooled to the 1st cooling temperature, and the 2nd cooling bench 24 is cooled to the 2nd Cooling temperature.2nd cooling temperature is less than the 1st cooling temperature.Therefore, the 1st cooling bench 22 can be known as High-temperature cooling platform, by the 2 cooling benches 24 are known as sub-cooled platform.

1st cooling bench 22 and the 1st cryopanel are thermally connected, thus the 1st cryopanel is cooled to the 1st cooling temperature.2nd cooling bench 24 and the 2nd cryopanel is thermally connected, thus the 2nd cryopanel is cooled to the 2nd cooling temperature.1st cooling bench 22 and the 1st cryopanel are cold But to such as 65K~120K or so, 80K~100K is preferably cooled to, the 2nd cooling bench 24 and the 2nd cryopanel are cooled to example Such as 10K~20K or so.

Low temperature pump receptacle 18 is the framework for the cryogenic pump 10 for accommodating the 1st cryopanel and the 2nd cryopanel.Also, cryogenic pump holds Device 18 accommodates the low temperature portion of refrigeration machine 16, i.e. the 1st cylinder body 23, the 1st cooling bench 22, the 2nd cylinder body 25 and the 2nd cooling bench 24.Low temperature Pump receptacle 18 is the vacuum tank for airtightly keeping its inner space.Low temperature pump receptacle 18 is installed on the room temperature portion of refrigeration machine 16.

Low temperature pump receptacle 18 has the air entry flange 19 for delimiting air entry 12.Air entry flange 19 is from low temperature pump receptacle 18 Front end throughout complete cycle to radial outside extend.Cryogenic pump 10 is installed on vacuum chamber using air entry flange 19.

1st cryopanel has radiation barrier part 30 and entrance cryopanel (such as board member 32).Radiation barrier part 30 has Shielding part main opening 31.When looking down, shielding part main opening 31 is included in air entry 12.Radiation barrier part 30 is drawn inside it Surely there is shielding part cavity 33.Shielding part cavity 33 from shielding part main opening 31 continuously in axial direction.In the axial direction of radiation barrier part 30 The upper side opposite with shielding part main opening 31 has shielding part bottom 34.Shielding part cavity 33 is terminated in shielding part bottom 34. The detailed content of radiation barrier part 30 will be aftermentioned.

In order to which from the 2nd cryopanel of radiation Thermal protection outside cryogenic pump 10, entrance cryopanel is disposed in shielding part main opening 31.The external heat source of cryogenic pump 10 is, for example, the indoor heat source of vacuum chamber for being equipped with cryogenic pump 10.Moreover, in the 1st cooling temperature The lower gas (such as water) condensed of degree is captured in the surface of entrance cryopanel.

Entrance cryopanel also limits entrance of the gas molecule into shielding part cavity 33 other than radiant heat.Entrance is low Warm plate occupies a part (such as most of) for the opening area of air entry 12, to be flowed by shielding part main opening 31 Gas in shielding part cavity 33 is limited to desirable amount.

Entrance cryopanel has the apertured members that entrance opening portion is formed in shielding part main opening 31.Entrance opening portion is At least one opening (such as aperture 32a) being formed on apertured members.Apertured members may be covering shielding part main opening 31 single board member 32.Entrance cryopanel, which can also for example have multiple platelets or can also have, is formed as concentric Round shape or grid-like shutter or laciniation, so as to replace single board member 32.

Radiation barrier part 30 extends beyond air entry flange 19, therefore entrance cryopanel is in the axial direction towards axial top Positioned at the top of air entry flange 19.Therefore, the front end of radiation barrier part 30 and entrance cryopanel are located at low temperature pump receptacle 18 It is external.In this way, radiation barrier part 30 extends towards the vacuum chamber for being equipped with cryogenic pump 10.By making radiation barrier part 30 upward Fang Yanshen can expand shielding part cavity 33 (that is, receiving volume of condensate layer) in the axial direction.But the axis of the extension It is set as not interfering the size of vacuum chamber (or do not interfere gate valve) between vacuum chamber and cryogenic pump 10 degree to length.

Board member 32 is a tablet (such as plectane) across shielding part main opening 31.Board member 32 size (such as Diameter) it is almost the same with the size of shielding part main opening 31.Between the front end of radiation barrier part 30 and board member 32, in axial direction And/or can radially have minim gap.

The front surface of board member 32 is exposed to the exterior space of cryogenic pump 10.In board member 32 through have allow gas from The outside of cryogenic pump 10 is towards multiple aperture 32a of the internal flow of cryogenic pump 10.The board member 32 of diagram has in central part Aperture 32a, and do not have aperture 32a then in peripheral part.But the peripheral part in board member 32 can also form aperture 32a.It is small Hole 32a is arranged regularly.Aperture 32a is set at equal intervals along two orthogonal rectilinear directions respectively, so as to form aperture The grid of 32a.As alternative scheme, aperture 32a can also be radially and equally circumferentially spaced respectively.

The shape of aperture 32a is, for example, circle, but not limited to this, aperture 32a may be with rectangle and other shapes Be open, the slit of linear or curvilinear extension or be formed in board member 32 peripheral part notch.Aperture 32a's is big The small size for being significantly less than shielding part main opening 31.

The peripheral part of board member 32 is installed on connector block 29.Connector block 29 is inside from the front end of radiation barrier part towards diameter The protrusion that side protrudes, circumferentially (such as every 90 °) are formed at equal intervals.Board member 32 is fixed on connector by appropriate method Block 29.For example, connector block 29 and board member 32 have bolt hole (not shown), board member 32 is fastened by bolts in connector block 29。

It can implement the surface treatment example of raising radiance in the inner surface of the back side of board member 32 and radiation barrier part 30 Such as black matrix processing.The radiance of the inner surface of the back side of board member 32 and radiation barrier part 30 is no better than 1 as a result,.Black table Face can for example be formed by plating black chrome on the surface of Copper base material, can also be formed by black application.This black Surface helps to be absorbed into the heat of cryogenic pump 10.

It on the other hand, can be real in the front surface of board member 32 and the 2nd cryopanel in order to reflect from external radiant heat Applying reduces the surface treatment of radiance.The surface of this low-E for example can by Copper base material plating nickel on surface and shape Into.

The detailed content of 2nd cryopanel will be aftermentioned, but the 2nd cryopanel has top low temperature plate 41, the 1st lower section cryopanel 42nd, the 2nd lower section cryopanel 43, bottom cryopanel 44 and connection cryopanel 45.These the 2nd cryopanels are warm with the 2nd cooling bench 24 Connection, and be disposed in shielding part cavity 33 in a manner of not contacted with radiation barrier part 30 and board member 32.Top low temperature plate Shielding part cavity 33 is divided into shielding part cavity top 33a and shielding part cavity lower part 33b by 41.

1st cooling bench 22 of refrigeration machine 16 is directly mounted at the outer surface of 30 side of radiation barrier part.In this way, radiation barrier Part 30 is thermally connected with the 1st cooling bench 22, therefore radiation barrier part 30 is cooled to the 1st cooling temperature.In addition, radiation barrier part 30 The 1st cooling bench 22 can also be installed on via appropriate conducting-heat elements.Also, the 2nd cooling bench 24 of refrigeration machine 16 and the 2nd cylinder body 25 are inserted into from the side of radiation barrier part 30 in shielding part cavity 33.In this way, radiation barrier part 30 accommodates the 2nd cooling bench 24 In shielding part cavity 33.

Radiation barrier part 30 is set from the 2nd cryopanel of radiation Thermal protection of low temperature pump receptacle 18.Radiation barrier part 30 between 18 and the 2nd cryopanel of low temperature pump receptacle, and surrounds the 2nd cryopanel.The diameter of radiation barrier part 30 is slightly small In the diameter of low temperature pump receptacle 18.Therefore, between being formed on the outside of shielding part between radiation barrier part 30 and low temperature pump receptacle 18 Gap 20, radiation barrier part 30 are not contacted with low temperature pump receptacle 18.

Radiation barrier part 30 has at least one secondary opening in its side.Pair opening makes shielding part lateral gap 20 and shielding Part cavity 33 connects.For example, radiation barrier part 30 has the main slit 36 of shielding part and at least one shielding part auxiliary slit 37.Screen Shield auxiliary slit 37 is formed in the position different from the main slit of shielding part in the axial direction.The main slit 36 of shielding part and shielding part are auxiliary Help slit 37 that shielding part lateral gap 20 is individually made to be connected with shielding part cavity lower part 33b.These multiple gas inflow entrances have Help the equalization of the condensate layer growth rate in shielding part cavity lower part 33b.

The main slit 36 of shielding part can be formed at 1 or more on a certain axial position of radiation barrier part 30 along week To elongated opening.In addition, multiple elongated openings can be formed discretely in the circumferential.Equally, shielding part auxiliary slit 37 The circumferentially elongated opening of 1 or more that can also be formed on a certain axial position of radiation barrier part 30.

Shielding part auxiliary slit 37 is formed in the axial direction between top low temperature plate 41 and the main slit 36 of shielding part.It is this auxiliary The gas inflow entrance of helping property guides gas from shielding part lateral gap 20 vacant immediately below top low temperature plate 41 to being formed in Space (that is, upper area in shielding part cavity lower part 33b).Shielding part auxiliary slit 37 contributes to shielding part cavity lower part The equalization of condensate layer growth rate in 33b.

Radiation barrier part 30 is formed by multiple parts and entirety is cylindrical in shape.Radiation barrier part 30 have shielding part top 38 and Shielding part lower part 40.Shielding part top 38 is the cylinder of both ends open, surrounds shielding part cavity top 33a.Shielding part lower part 40 be the round-ended cylinder that has with shielding part bottom 34, surrounds shielding part cavity lower part 33b.In addition, radiation barrier part 30 also may be used That thinks with the main slit 36 of shielding part single has round-ended cylinder component.

The main slit 36 of shielding part delimited between the upper end of the lower end on shielding part top 38 and shielding part lower part 40.Shielding part Main slit 36 is located at axial central portion, and it circumferentially surrounds the 2nd cooling bench 24 of refrigeration machine 16.

The main slit 36 of shielding part has main slit width, and shielding part auxiliary slit 37 has auxiliary slit width.Main slit Width is wider than auxiliary slit width.Here, slit width refers to the size with the slit on circumferential orthogonal direction (for example, Fig. 2 In the slit width that is represented with four-headed arrow).For example, main slit width may be lower end and the shielding part on shielding part top 38 The distance between upper end of lower part 40.Auxiliary slit width may be the axial dimension of shielding part auxiliary slit 37.

The diameter on shielding part top 38 is slightly less than the diameter of shielding part lower part 40.Also, the lower end on shielding part top 38 It is presented axially in the top of the upper end of shielding part lower part 40.The main slit 36 of shielding part is exposed to air entry 12 as a result,.Therefore, The gas for entering the main slit 36 of shielding part by shielding part lateral gap 20 from air entry 12 can be increased.Thus, it is possible to plus The growth of condensate layer in fast shielding part cavity lower part 33b, therefore the condensate layer in shielding part cavity lower part 33b can be made to grow up Speed is close to the condensate layer growth rate in shielding part cavity top 33a.

In addition, the diameter on shielding part top 38 can also be identical with the diameter of shielding part lower part 40, and shielding part top 38 diameter can also be more than the diameter of shielding part lower part 40.Also, shielding part top 38 can also enter shielding part lower part 40, so as to which the lower end for making shielding part top 38 is presented axially in the lower section of 40 upper end of shielding part lower part.The main slit 36 of shielding part It can be located above or below refrigeration machine 16 in the axial direction.

Shielding part top 38 is divided into two components, i.e. shielding part upper body 38a and shielding part endless member 38b.Screen Shield endless member 38b is installed on the lower end of shielding part upper body 38a in the axial direction, and circumferentially.Shielding part ring Shape component 38b is the connecting component that shielding part upper body 38a is connected to shielding part lower part 40 in the axial direction.Shielding part assists Slit 37 is disposed through shielding part endless member 38b.The advantages of this segmenting structure can be brought in manufacture.For example, pass through Installation shielding part endless member 38b can add shielding part auxiliary on the radiation barrier part without shielding part auxiliary slit 37 Slit 37.

In addition, shielding part top 38 or single component.Shielding part auxiliary slit 37 can also be formed in shielding Part lower part 40.Can also multiple auxiliary slits 37 be set in at least one party of shielding part top 38 and shielding part lower part 40.

Top low temperature plate 41 be by with it is axially vertical in a manner of the disk-shaped component that is configured.The preceding table of top low temperature plate 41 Face is opposite across shielding part cavity top 33a and the back side of board member 32.The central part of top low temperature plate 41 is directly mounted at system The upper surface of 2nd cooling bench 24 of cold 16.2nd cooling bench 24 is located at the central part of the shielding part cavity 33 of cryogenic pump 10.By This, shielding part cavity top 33a provides larger condensate layer and accommodates volume.Top low temperature plate 41 front surface and be not provided with living The adsorbents such as property charcoal.Furthermore it is possible to adsorbent is set at the back side of top low temperature plate 41.

Top low temperature plate 41 is bigger.Diameter until the center of top low temperature plate 41 to top low temperature plate outer circumference end 41a To more than 70% for the radial distance until the center of shielding part main opening 31 to the front end of radiation barrier part 30 of distance 46. That is, the radius of top low temperature plate 41 is more than 70% radius of shielding part main opening 31.Also, the diameter of top low temperature plate 41 Less than 98% diameter for shielding part main opening 31.As a result, top low temperature plate 41 can reliably not with radiation barrier part 30 Contact.The axial projective area of top low temperature plate 41 can be 50% to 95% area of 31 area of shielding part main opening, excellent It is selected as 73% to 90% area.

Radial clearance 50 is formed between top low temperature plate 41 and radiation barrier part 30.Radial clearance 50 is formed in top Between cryopanel outer circumference end 41a and shielding part top 38 (for example, shielding part upper body 38a).Top low temperature plate outer circumference end 41a It is presented axially in the top of the main slit 36 of shielding part.Top low temperature plate 41 is and axially vertical tablet, therefore entire top Cryopanel 41 is presented axially in the top of the main slit 36 of shielding part.

Other the 2nd cryopanels other than top low temperature plate 41 are (that is, the 1st lower section cryopanel 42, the 2nd lower section cryopanel 43rd, bottom cryopanel 44 and connection cryopanel 45) it is disposed in shielding part cavity lower part 33b.

Top low temperature plate 41, the 1st lower section cryopanel 42, the 2nd lower section cryopanel 43 and bottom cryopanel 44 the equal position in center In on the central shaft C of cryogenic pump 10.Top low temperature plate 41, the 1st lower section cryopanel 42, the 2nd lower section cryopanel 43 and bottom low temperature Plate 44 is coaxially arranged.Cryopanel 45 is connected to be arranged along central shaft C in the both sides of central shaft C.

1st lower section cryopanel 42 and the 2nd lower section cryopanel 43 are arranged in the lower section of top low temperature plate 41.1st lower section low temperature Plate 42 is disposed in the axial direction between top low temperature plate 41 and bottom cryopanel 44.2nd lower section cryopanel 43 is arranged in the axial direction Between the 1st lower section cryopanel 42 and bottom cryopanel 44 (or shielding part bottom 34).

The shape of the two cryopanels is different from the shape of top low temperature plate 41.1st lower section cryopanel 42 has the frustum of a cone The shape (that is, shape of so-called umbrella) of side.2nd lower section cryopanel 43 is similarly umbrella.The low temperature below the two Plate is equipped with the adsorbents such as activated carbon.Adsorbent is for example adhered to the back side of lower section cryopanel.Therefore, the preceding table of lower section cryopanel Face plays a role as cryosurface, and the back side plays a role as adsorption plane.

1st lower section cryopanel 42 has the 1st radius 47, and the 2nd lower section cryopanel 43 has the 2nd radius 48.2nd radius 48 is big In the 1st radius 47.That is, the 2nd lower section cryopanel 43 is the umbrella cryopanel more than the 1st lower section cryopanel 42.

But the diameter of the 1st lower section cryopanel 42 and the 2nd lower section cryopanel 43 is respectively less than the diameter of top low temperature plate 41. The tangent line parallel with axial direction that 1st lower section cryopanel 42 is disposed in top low temperature plate outer circumference end 41a radially is (parallel with axial direction Top low temperature plate 41 projection line) 66 inside (with reference to figure 4).It is low that 2nd lower section cryopanel 43 is disposed in top radially The inside with axial parallel tangent line 66 of warm plate outer circumference end 41a.Equally, the 1st lower section cryopanel 42 and the 2nd lower section cryopanel 43 Diameter be respectively less than the diameter of bottom cryopanel 44.

The 1st spaced radial 52 is formed between cryopanel and radiation barrier part 30 below the 1st.1st spaced radial, 52 shape Between 1 lower section cryopanel outer circumference end 42a of Cheng Yu and shielding part top 38 (for example, shielding part endless member 38b).1st radially Interval 52 is wider than radial clearance 50.Wider cyclic annular condensate layer accommodates the axial direction that volume is formed in top low temperature plate 41 as a result, On underface.The volume is a part of shielding part cavity lower part 33b.

The spare space is connected, and with shielding part cavity top 33a in the space at an upper portion thereof by radial clearance 50 Axial central portion assists slit 37 to be connected with shielding part lateral gap 20, and pass through shielding in the lower part in the space by shielding part The main slit 36 of part is connected with shielding part lateral gap 20.Also, the top of the space in the axial direction and the back of the body of top low temperature plate 41 Face is adjacent, and adjacent with shielding part top 38 in radial outside, and below radially inner side and the 1st cryopanel side surface 42b It is adjacent.

1st lower section cryopanel side surface 42b is coniform inclined surface, and the radial direction of the 1st lower section cryopanel side surface 42b is most Outside is the 1st lower section cryopanel outer circumference end 42a.1st lower section cryopanel outer circumference end 42a is also the axial direction of the 1st lower section cryopanel 42 On lower end.In addition, the 1st lower section cryopanel side surface 42b can also be formed as barrel surface.The cryopanel side surface below the 1st The radially inner side of upper end in the axial direction of 42b has the 1st lower section cryopanel central part 42c.1st lower section cryopanel central part 42c The upper surface of the 2nd cooling bench 24 of refrigeration machine 16 is directly mounted at, so as to be thermally connected with the 2nd cooling bench 24.

1st lower section cryopanel outer circumference end 42a is covered by top low temperature plate 41, thus can not be from shielding part main opening 31 To the 1st lower section cryopanel outer circumference end 42a.In this way, the 1st lower section cryopanel outer circumference end 42a is relative to top low temperature plate outer circumference end 41a Positioned at the position for quite leaning on radially inner side.Thereby, it is possible to the spaces immediately below enlarged top portion cryopanel 41.

1st lower section cryopanel outer circumference end 42a is presented axially between top low temperature plate 41 and the main slit 36 of shielding part.Cause This, identical with shielding part auxiliary slit 37, the 1st lower section cryopanel 42 also is located at the top of the main slit 36 of shielding part.As a result, the 1st Lower section cryopanel 42 can be efficiently received the gas entered from shielding part auxiliary slit 37.Also, from the main slit 36 of shielding part The major part of the gas entered obliquely towards shielding part cavity lower part 33b is by under the 1st lower section cryopanel outer circumference end 42a Side.Therefore, it is possible to make the 2nd lower section cryopanel 43 of gas flow.

The 2nd spaced radial 54 is formed between cryopanel 43 and radiation barrier part 30 below the 2nd.2nd spaced radial 54 It is formed between the 2nd lower section cryopanel outer circumference end 43a and shielding part lower part 40.2nd spaced radial 54 is wider than radial clearance 50.By This, forms wider cricoid condensate layer and accommodates volume.The volume is a part of shielding part cavity lower part 33b, and with Space immediately below top low temperature plate 41 is formed together annulus portion 60.

The spare space is connected at an upper portion thereof by the main slit 36 of shielding part with the shielding part lateral gap 20 of radial outside, And it is connected on the top in the space with the central space portion 56 of radially inner side, and connect in the lower part in the space and bottom gap 58 It is logical.The space is adjacent with shielding part lower part 40 in radial outside, and below radially inner side and the 2nd cryopanel side surface 43b and It is adjacent to connect cryopanel 45, and lower section in the axial direction is adjacent with bottom cryopanel 44 and shielding part bottom 34.

2nd lower section cryopanel side surface 43b is coniform inclined surface, and the radial direction of the 2nd lower section cryopanel side surface 43b is most Outside is the 2nd lower section cryopanel outer circumference end 43a.The radially inner side of upper end below the 2nd in the axial direction of cryopanel side surface 43b With the 2nd lower section cryopanel central part 43c.2nd lower section cryopanel central part 43c is in the axial direction of the 2nd lower section cryopanel 43 again Upper end.2nd lower section cryopanel central part 43c is installed on connection cryopanel 45.2nd lower section cryopanel 43 is via connection cryopanel 45 are thermally connected with the 2nd cooling bench 24.

Bottom cryopanel 44 be by with it is axially vertical in a manner of the disk-like member that is configured.Bottom cryopanel 44 is on its two sides Can have adsorbent.Bottom gap 58 is formed between bottom cryopanel 44 and shielding part bottom 34.

Bottom cryopanel 44 has the bottom cryopanel outer circumference end for the lower section for being presented axially in the main slit 36 of shielding part 44a.Bottom cryopanel 44 is close to shielding part bottom 34.(such as shield from bottom cryopanel outer circumference end 44a to radiation barrier part 30 Shield bottom 34) the slit 36 main with shielding part of distance 65 width it is roughly the same (for example, within 2 times).Thereby, it is possible to by one The gas for determining degree is guided to bottom gap 58.Also, bottom cryopanel 44 has bottom cryopanel central opening 44b.

Connection cryopanel 45 extends, and bottom cryopanel 44 is thermally connected from the 2nd cooling bench 24 to bottom cryopanel 44 In the 2nd cooling bench 24.The upper end of connection cryopanel 45 is installed on the 2nd cooling bench 24, and lower end is installed on bottom cryopanel 44.

Connection cryopanel 45 is the one group of elongated plate-like component axially extended from the radially opposite sides of the 2nd cooling bench 24. Central space portion 56 is formed between the inner surface toward each other of these plate-shaped members.Central space portion 56 is radially with connecting The inner surface for connecing cryopanel 45 is adjacent and adjacent with the lower section of the 2nd cooling bench 24 in the axial direction.Also, central space portion 56 also may be used Volume is accommodated for use as condensate layer.

Other than above description, cryogenic pump 10 also has some significant structure features.Also, these features also help The limit is occluded in improving.Then, with reference to figure 3 to Fig. 5, these features are illustrated.

As shown in figure 3, lower end in the axial direction of the 1st lower section cryopanel 42 with it is upper in the axial direction of the 2nd lower section cryopanel 43 Axial cryopanel interval 62 between end is the radial direction until the center of top low temperature plate 41 to top low temperature plate outer circumference end 41a More than 40% distance.That is, axial cryopanel interval 62 is more than 20% diameter of top low temperature plate 41.It separates by doing so Two cryopanels can give shielding part cavity lower part 33b to provide condensate layer wider in axial direction and accommodate volume.

Annulus portion 60 is formed between top low temperature plate outer circumference end 41a and bottom cryopanel outer circumference end 44a.Top is low Warm plate outer circumference end 41a is directly opposite across annulus portion 60 and bottom cryopanel outer circumference end 44a.Due to top low temperature plate 41 In the top of the main slit 36 of shielding part, therefore annulus portion 60 provides and is extended in the axial direction to the both sides of the main slit 36 of shielding part Wider condensate layer accommodate volume.

Axial gap 63 until top low temperature plate outer circumference end 41a to bottom cryopanel outer circumference end 44a is low from top It is more than the radial distance (such as radius of top low temperature plate 41) until the center of warm plate 41 to top low temperature plate outer circumference end 41a. This helps to expand annulus 60.Also, axial gap 63 is shorter than from top low temperature plate outer circumference end 41a to shielding part bottom 34 Until axial distance.Thereby, it is possible to be configured to not contact with shielding part bottom 34 by bottom cryopanel 44.

Central space portion 56 passes through the axial cryopanel interval between the 1st lower section cryopanel 42 and the 2nd lower section cryopanel 43 62 and connected with annulus portion 60.Since central space portion 56 can receive gas from annulus portion 60, can have Central space portion 56 is accommodated volume as condensate layer and utilized by effect ground.

Also, central space portion 56 is connected by bottom cryopanel central opening 44b with bottom gap 58.This is also helped In inflow of the gas to central space portion 56.

As shown in figure 4, annulus portion 60 includes the non-configuring area of cryopanel (cryopanel-less zone) 64. Radially, the non-configuring area 64 of cryopanel delimit the tangent line 67 parallel with axial direction of cryopanel outer circumference end 43a and top below the 2nd Between the tangent line 66 parallel axial direction of portion cryopanel outer circumference end 41a.In the axial direction, the non-configuring area 64 of cryopanel, which delimited, is pushing up Between portion's cryopanel 41 and bottom cryopanel 44 (or the 2nd lower section cryopanel 43).The non-configuring area 64 of cryopanel is circumferentially The annular section of extension.

Radially, the 1st lower section cryopanel outer circumference end 42a is located at the inside of the non-configuring area 64 of cryopanel, therefore, the 1st Lower section cryopanel 42 is located at the position that configuring area 64 more non-than cryopanel more leans on radially inner side.Also, connect the also position of cryopanel 45 The position of radially inner side is more leaned in configuring area 64 more non-than cryopanel.In cryogenic pump 10, there is no be not configured into cryopanel The cryopanel in region 64.

In typical cryogenic pump, in order to increase gas hold-up, most cryopanels are closely aligned.At this point, low temperature Gap between plate becomes to be rather narrow.Condensate layer is easily concentrated when growing up on cryopanel and is condensate in low temperature sheet separation Entrance.If entrance is condensed, layer blocks, and spare space can be remained in the deep of low temperature sheet separation.Therefore, by will be most low The design for the common-sense that warm plate is closely aligned is can not fully to improve the utilization ratio of cryogenic pump inner space.

In contrast, in cryogenic pump 10, in order to ensure the non-configuring area 64 of cryopanel, a small number of 2nd cryopanels are configured Except the non-configuring area 64 of cryopanel.Thereby, it is possible to improve the utilization rate of cryogenic pump inner space, and low temperature can be improved The occlusion limit of pump 10.

In addition, the non-configuring area 64 of cryopanel can also delimit below the 1st cryopanel outer circumference end 42a with it is axial parallel Tangent line 68 and top low temperature plate outer circumference end 41a between axial parallel tangent line 66.2nd lower section cryopanel outer circumference end 43a The position that configuring area 64 more non-than cryopanel more leans on radially inner side can be located at.

The condensate layer growth rate of some the 2nd cryopanel is big with the gas inflow entrance near the 2nd cryopanel Small (such as slit width) is associated.It is and cold on the 2nd cryopanel of the slit jaw pair for example, if slit width is larger Solidifying layer can Fast Growth.Also, condensate layer growth rate also suffers from the shadow of the distance between gas inflow entrance and the 2nd cryopanel It rings.If in small distance, gas concentration is condensate in the 2nd cryopanel, and condensate layer can Fast Growth.

Therefore, it is adjusted until the gas inflow entrance to the 2nd cryopanel by the size according to a certain gas inflow entrance Distance, the condensate layer growth rate on the 2nd cryopanel can be adjusted.For example, it will face with wider gas inflow entrance The configuration of 2nd cryopanel is from the wider gas inflow entrance remote position, and by the gas inflow entrance face relatively narrow with another To another the 2nd cryopanel be configured in the position nearer with the relatively narrow gas inflow entrance.As a result, by the big of gas inflow entrance The difference of the condensate layer growth rate of two the 2nd cryopanels caused by small difference and by the difference apart from caused condensate layer growth rate It cancels out each other.Thereby, it is possible to make the condensate layer growth rate equalization of two the 2nd cryopanels.

The 2nd distance until the main slit 36 to the 2nd lower section cryopanel 43 of shielding part is (for example, shielding part master shown in Fig. 3 The normal 70 of slit 36) be longer than from shielding part assist slit 37 to the 1st lower section cryopanel 42 until the 1st distance (for example, Fig. 2 The 1st shown spaced radial 52).In addition to this, as described above, the width of the main slit 36 of shielding part is wider than shielding part auxiliary slit 37 width.Thereby, it is possible to reduce the difference of the condensate layer growth rate on the 1st lower section cryopanel 42 and the 2nd lower section cryopanel 43.

Also, relative to the angle position of the 2nd cryopanel of gas inflow entrance can also influence the condensate layer of the 2nd cryopanel into Long speed.If for example, the 2nd cryopanel is located on the normal of slit (that is, cryopanel with slit jaw to), condensate layer can be quick Growth.If on the contrary, the 2nd cryopanel is located off the position of the normal of slit, condensate layer can slowly grow up.

As shown in figure 3, the normal 70 that the 2nd lower section cryopanel 43 is arranged to slit 36 main with shielding part intersects.As a result, the 2nd Lower section cryopanel 43 is configured at the front of the main slit 36 of shielding part.The gas that this is peomoted on the 2nd lower section cryopanel 43 is cold It is solidifying.In addition, the 1st lower section cryopanel 42 can also be arranged to intersect with the normal of shielding part auxiliary slit 37.

Relative to radial direction shielding part auxiliary slit 37 normal angle (in embodiment illustrated, normal with radially Unanimously, angle zero) less than the main slit 36 of shielding part relative to radial direction normal 70 angle.Shielding part auxiliary is narrow as a result, The normal of seam 37 towards radially or the direction close to radial direction, the normal 70 of the main slit 36 of shielding part be directed away from radial direction direction or It is axial.The 1st lower section cryopanel 42 of gas flow that thereby, it is possible to make to enter from shielding part auxiliary slit 37, makes from shielding part master The 2nd lower section cryopanel 43 of gas flow that slit 36 enters.

Also, the angle between the normal of 70 and the 2nd lower section cryopanel side surface 43b of normal of the main slit 36 of shielding part The normal 70 that (in embodiment illustrated, the two is consistent, angle zero) can be less than the main slit 36 of shielding part is low with the 1st lower section Angle between the normal of warm plate side surface 42b.Also, shielding part assists the normal and the 1st lower section cryopanel side table of slit 37 Angle between the normal of face 42b can be less than the normal and the 2nd lower section cryopanel side surface 43b of shielding part auxiliary slit 37 Angle between normal (in embodiment illustrated, the normal 70 of the main slit 36 of shielding part).Thus, it is possible to it is assisted in shielding part The 1st lower section cryopanel 42 of front configuration of slit 37, the cryopanel 43 below the front configuration the 2nd of the main slit 36 of shielding part.

The parameter of so-called " occluding limiting value (gas capacity limit value) " may be used to cryopanel each other Between condensate layer growth rate equalization design.Occlude limiting value be based on the distance between slit and cryopanel and relatively It is calculated in the angle position of the cryopanel of slit.

Some cryopanel and the occlusion limiting value of the combination of some gas inflow entrance can be calculated by following formula.

Occlude limiting value=L/ (Scos θ)

Wherein, L represents slit width, and S represents the distance between representative point of slit and cryopanel, and θ is represented relative to narrow The angle position of the representative point of the cryopanel of seam.

If the occlusion limiting value is larger, the condensate layer growth rate on the cryopanel is larger.If each cryopanel Occlusion limiting value is roughly the same, then condensate is equably grown up on each cryopanel.

As an example, main 36 and the 2nd lower section cryopanel 43 of slit of shielding part is calculated with reference to figure 5 and using following step Combination in the 2nd main slit occlude limiting value.First, with the section both ends of the line segment L connection main slits 36 of shielding part.From line segment Draw normal R (that is, normal of the main slit 36 of shielding part) in the center (that is, center of the main slit 36 of shielding part) of L.Draw out center Both ends and the circle P tangent with the 2nd lower section cryopanel 43 on straight line R and by line segment L.By the 2nd lower section cryopanel 43 with " the representing a little " of the point of contact of circle P as the 2nd lower section cryopanel 43.Draw center and the 2nd lower section cryopanel 43 of connection line segment L Represent the line segment S of point.

At this point it is possible to being defined by the formula the 2nd main slit occludes limiting value.

2nd main slit occludes limiting value=l/ (scos θ)

Wherein, l represents the length (that is, main slit width) of line segment L, and s represents the length of line segment S (that is, the main slit of shielding part The distance between representative point of 36 and the 2nd lower section cryopanel 43), θ represent line segment L and line segment S between angle (that is, relative to The angle position of the representative point of 2nd lower section cryopanel 43 of the main slit 36 of shielding part).In addition, in Fig. 5, line segment S and normal R mono- It causes, therefore θ=90 °.

In addition, any positions such as endpoint or central point of " the representing a little " of some cryopanel or the cryopanel.

In the combination of the main slit 36 of shielding part and the 1st lower section cryopanel 42 can also be calculated using same method 1 main slit occludes limiting value.At this point, the center of drafting be located on straight line R and by the both ends of line segment L and with the 1st lower section cryopanel 42 tangent circle P '.Using the point of contact of the 1st lower section cryopanel 42 and circle P ' as " the representing a little " of the 1st lower section cryopanel 42.It draws Link the line segment S ' of the center of line segment L and the representative point of the 1st lower section cryopanel 42.In the illustrated embodiment, represent point with 1st lower section cryopanel outer circumference end 42a is consistent.The 1st main slit can be calculated by following formula and occludes limiting value.

1st main slit occludes limiting value=l/ (s ' cos θ ')

Wherein, s ' represent line segment S ' length (that is, the representative point of main 36 and the 1st lower section cryopanel 42 of slit of shielding part it Between distance), θ ' represent line segment L and line segment S ' between angle (that is, the 1st lower section low temperature relative to the main slit 36 of shielding part The angle position of the representative point of plate 42).In addition, to simplify the explanation, the diagram of round P ' and line segment S ' are omitted in Figure 5.

Equally, according to the width of auxiliary slit, the distance until shielding part assists slit 37 to the 1st lower section cryopanel 42 And relative to shielding part auxiliary slit 37 the 1st lower section cryopanel 42 angle position come calculate shielding part auxiliary slit 37 with The 1st auxiliary seam in the combination of 1st lower section cryopanel 42 occludes limiting value.It is assisted according to the width of auxiliary slit, from shielding part The angle of 2nd lower section cryopanel 43 of the slit 37 to the distance of the 2nd lower section cryopanel 43 and relative to shielding part auxiliary slit 37 Position occludes limiting value come the 2nd auxiliary slit calculated in the combination of shielding part auxiliary 37 and the 2nd lower section cryopanel 43 of slit.

In cryogenic pump 10, the 1st total limiting value that occludes is essentially equal with the 2nd total limiting value that occludes.1st total suction Limiting value is stayed to occlude limiting value for the 1st auxiliary slit and occludes the sum of limiting value with the 1st main slit.2nd total limiting value that occludes is 2nd auxiliary slit occludes limiting value and occludes the sum of limiting value with the 2nd main slit.In this way, by by design of cryopumps into each low temperature The sum of the occlusion limiting value of plate is equal, can make the equalization between cryopanel of condensate layer growth rate.

1st total occlusion limiting value and the 2nd total difference for occluding limiting value can be for the 1st total occlusion limiting values for example Within 5%, within 3% or within 1%.

Hereinafter, the action of the cryogenic pump 10 of above structure is illustrated.When cryogenic pump 10 is started to work, first, Before start-up operation slightly such as 1Pa or so will be evacuated to other appropriate roughing vacuum pumps inside vacuum chamber.Later, make cryogenic pump 10 Work.1st cooling bench 22 and the 2nd cooling bench 24 by the driving of refrigeration machine 16 and cooled, it is and the hot linked 1st low with them Warm plate and the 2nd cryopanel are also cooled.1st cryopanel and the 2nd cryopanel are cooled to the 1st cooling temperature and the 2nd cooling respectively Temperature.

The part and board member 32 that the gas of cryogenic pump 10 is flowed to from vacuum chamber are collided, and other a part of gases are then Shielding part cavity top 33a is entered by the aperture 32a of board member 32.Also, another part gas is around board member 32 Shielding part lateral gap 20 slit 37 is assisted to enter shielding part cavity lower part by the main slit 36 of shielding part or shielding part 33b。

The 1st kind of gas (such as water) that vapour pressure fully reduces under the 1st cooling temperature is condensate in the table of the 1st cryopanel Face.The 2nd kind of gas (such as argon) that vapour pressure fully reduces under the 2nd cooling temperature is condensate in the surface of the 2nd cryopanel. The 3rd kind of gas (such as hydrogen) that vapour pressure does not also reduce fully under 2 cooling temperatures is by the cooled adsorbent on the 2nd cryopanel Absorption.Cryogenic pump 10 can be vented vacuum chamber as a result, realize desirable vacuum degree.

In cryogenic pump 10, by installing various structure features, make the condensate layer growth rate equalization of the 2nd kind of gas. Therefore, it is possible to which the 2nd kind of gas is avoided to concentrate condensation on specific cryopanel (such as top low temperature plate 41).2nd kind of gas is equal Etc. ground condensation on each cryopanel, the utilization rate of cryogenic pump inner space becomes high.When the 2nd kind of gas condensate layer growth and When being contacted with the 1st cryopanel, the hardly surplus spare space of shielding part cavity 33.Therefore, it is possible to improve the occlusion pole of cryogenic pump 10 Limit.

More than, according to embodiment, the present invention is described.But the present invention is not limited to the above embodiment, abilities Field technique personnel are appreciated that various design alterations can be implemented, and there may be various modifications example, and this variation It is intended to be included within the scope of the present invention.

For example, at least one 2nd cryopanel of setting can be added between top low temperature plate and entrance cryopanel.It can be It is additional between bottom cryopanel and shielding part bottom that at least one 2nd cryopanel is set.The 2nd additional cryopanel can be less than Small-sized (such as path) cryopanel of top low temperature plate and/or bottom cryopanel.

Top low temperature plate and at least one 2nd cryopanel (such as 1st lower section cryopanel) adjacent with the top low temperature plate It can be created as integrated low temperature board member.Bottom cryopanel and at least one 2nd low temperature adjacent with the bottom cryopanel Plate (such as the 2nd lower section cryopanel) can be created as integrated low temperature board member.

At least one of bottom cryopanel and the 2nd lower section cryopanel can not also be set.2nd lower section cryopanel can be simultaneous Make bottom cryopanel.Alternatively, both bottom cryopanel and the 2nd lower section cryopanel can not also be set.At the same time or take and Instead of, the 1st lower section cryopanel can not also be set.

The 1st cryopanel of 30 grade of radiation barrier part, and/or the 2nd cryopanel of 41 grade of top low temperature plate are cut with axially vertical Face may be non-circular, such as can be polygonals or the ellipses such as rectangle.

Embodiments of the present invention can show as follows.

1. a kind of cryogenic pump, which is characterized in that have：

Low temperature pump receptacle has cryogenic pump air entry；

Refrigeration machine has and is contained in the High-temperature cooling platform of the low temperature pump receptacle and sub-cooled platform；

Radiation barrier part has shielding part main opening in the cryogenic pump air entry, and the radiation barrier part delimited from institute State the axially continuous shielding part cavity of shielding part main opening, the radiation barrier part be thermally connected with the High-temperature cooling platform and The sub-cooled platform is contained in the shielding part cavity, is formed between the radiation barrier part and the low temperature pump receptacle Shielding part lateral gap；And

Multiple cryopanels, respectively with the sub-cooled platform be thermally connected and with not with the non-contacting side of the radiation barrier Formula is disposed in the shielding part cavity,

The multiple cryopanel includes top low temperature plate, and the shielding part cavity is divided into shielding by the top low temperature plate Part cavity top and shielding part cavity lower part,

The radiation barrier part also has the main slit of shielding part and shielding part auxiliary slit, and the main slit of shielding part makes institute It states shielding part lateral gap to connect with the shielding part cavity lower part, the shielding part auxiliary slit is formed in the axial direction The position different from the main slit of the shielding part and the shield lateral gap is made to be connected with the shielding part cavity lower part.

2. the cryogenic pump described in 1 according to embodiment, which is characterized in that

The shielding part auxiliary slit is formed in the top low temperature plate and the main slit of the shielding part in the axial direction Between.

3. the cryogenic pump described in 2 according to embodiment, which is characterized in that

The radiation barrier part, which has, to be surrounded the shielding part top on the shielding part cavity top, surrounds the shielding part sky The shielding part lower part of chamber lower part,

The main slit of shielding part delimited between the upper end of the lower end on the shielding part top and the shielding part lower part,

The shielding part auxiliary slit is disposed through the lower end on the shielding part top.

4. the cryogenic pump in 1 to 3 described in any embodiment according to embodiment, which is characterized in that

Radial clearance is formed between the top low temperature plate and the radiation barrier part,

The multiple cryopanel further includes the 1st lower section cryopanel for being disposed in the shielding part cavity lower part,

The 1st lower section cryopanel has the 1st lower section cryopanel outer circumference end, cryopanel outer circumference end and institute below the 1st It states and is formed with the 1st spaced radial, and the 1st spaced radial is wider than the radial clearance between radiation barrier part.

5. the cryogenic pump described in 4 according to embodiment, which is characterized in that

1st lower section cryopanel outer circumference end is covered by the top low temperature plate, so as to be opened from the shielding part master Mouth observes the 1st lower section cryopanel outer circumference end.

6. the cryogenic pump described in 4 or 5 according to embodiment, which is characterized in that

1st lower section cryopanel outer circumference end is located axially at the top low temperature plate and the shielding part master is narrow described Between seam.

7. the cryogenic pump in 4 to 6 described in any embodiment according to embodiment, which is characterized in that

With the shielding part main opening opposite side of the radiation barrier part in the axial direction has shielding part bottom Portion,

The multiple cryopanel further includes the 2nd lower section cryopanel, and the 2nd lower section cryopanel is disposed in institute in the axial direction It states between the 1st lower section cryopanel and the shielding part bottom.

8. the cryogenic pump described in 7 according to embodiment, which is characterized in that

The main slit of shielding part has main slit width, and the shielding part auxiliary slit has auxiliary slit width, institute It states main slit width and is wider than the auxiliary slit width,

The 2nd distance until the main slit of the shielding part to the 2nd lower section cryopanel is longer than auxiliary from the shielding part The 1st distance until helping slit to the 1st lower section cryopanel.

9. the cryogenic pump described in 8 according to embodiment, which is characterized in that

1st adds up to occlusion limiting value for the sum of the 1st auxiliary slit occlusion limiting value and the 1st main slit occlusion limiting value, and the 2nd Total limiting value that occludes occludes the sum of limiting value, and the described 1st closes for the 2nd main slit occlusion limiting value with the 2nd auxiliary slit Meter occludes limiting value and the 2nd total limiting value that occludes is equal, wherein, the 1st auxiliary slit occludes limiting value and is based on institute State the angle of auxiliary slit width, the 1st distance and the 1st lower section cryopanel relative to shielding part auxiliary slit Position, the 1st main slit occlude limiting value be based on the main slit width, from the main slit of the shielding part to the described 1st under The angle position of distance until square cryopanel and the 1st lower section cryopanel relative to the main slit of the shielding part, it is described 2nd main slit occludes limiting value based on the main slit width, the 2nd distance and institute relative to the main slit of the shielding part State the angle position of the 2nd lower section cryopanel, the 2nd auxiliary slit occludes limiting value and is based on the auxiliary slit width, from institute It states the distance until shielding part assists slit to the 2nd lower section cryopanel and is assisted described in slit relative to the shielding part The angle position of 2nd lower section cryopanel.

10. the cryogenic pump in 7 to 9 described in any embodiment according to embodiment, which is characterized in that

The 1st lower section cryopanel has the 1st diameter, and the 2nd lower section cryopanel has the 2nd diameter, the 2nd diameter More than the 1st diameter.

11. the cryogenic pump in 7 to 10 described in any embodiment according to embodiment, which is characterized in that

The 2nd lower section cryopanel is arranged to intersect with the normal of the main slit of the shielding part.

12. the cryogenic pump in 7 to 11 described in any embodiment according to embodiment, which is characterized in that

The 1st lower section cryopanel has the 1st lower section cryopanel side surface, and the 2nd lower section cryopanel has the 2nd lower section Cryopanel side surface,

Angle between the normal of the main slit of shielding part and the normal of the 2nd lower section cryopanel side surface is less than institute The angle between the normal of the main slit of shielding part and the normal of the 1st lower section cryopanel side surface is stated,

Angle between the normal of the shielding part auxiliary slit and the normal of the 1st lower section cryopanel side surface is less than Angle between the normal of the shielding part auxiliary slit and the normal of the 2nd lower section cryopanel side surface.

13. the cryogenic pump in 1 to 12 described in any embodiment according to embodiment, which is characterized in that

It is less than the shielding part relative to radial direction relative to the angle of the normal of the shielding part auxiliary slit of radial direction The angle of the normal of main slit.

14. a kind of cryogenic pump, which is characterized in that have：

Low temperature pump receptacle has cryogenic pump air entry；

Multiple cryopanels, are thermally connected with the sub-cooled platform and side not contacted with the radiation barrier part respectively Formula is disposed in the shielding part cavity,

The multiple cryopanel includes：Top low temperature plate, by the shielding part cavity be divided into shielding part cavity top with Shielding part cavity lower part；1st lower section cryopanel is disposed in the shielding part cavity lower part,

The radiation barrier part also has the main slit of shielding part, and the main slit of shielding part makes the shielding part lateral gap It is connected with the shielding part cavity lower part,

The 1st lower section cryopanel has the 1st lower section cryopanel outer circumference end, cryopanel outer circumference end and institute below the 1st It states and is formed with the 1st spaced radial between radiation barrier part, the 1st spaced radial is wider than the radial clearance.

15. the cryogenic pump described in 14 according to embodiment, which is characterized in that

16. the cryogenic pump described in 14 or 15 according to embodiment, which is characterized in that

17. the cryogenic pump in 14 to 16 described in any embodiment according to embodiment, which is characterized in that

Also there is the radiation barrier part shielding part to assist slit, and shielding part auxiliary slit is formed in the axial direction The position different from the main slit of the shielding part, and the shielding part lateral gap is made to connect with the shielding part cavity lower part It is logical.

18. the cryogenic pump described in 17 according to embodiment, which is characterized in that

19. the cryogenic pump described in 18 according to embodiment, which is characterized in that

20. the cryogenic pump in 17 to 19 described in any embodiment according to embodiment, which is characterized in that

21. the cryogenic pump in 17 to 20 described in any embodiment according to embodiment, which is characterized in that

22. the cryogenic pump described in 21 according to embodiment, which is characterized in that

23. the cryogenic pump described in 22 according to embodiment, which is characterized in that

1st adds up to occlusion limiting value for the sum of the 1st auxiliary slit occlusion limiting value and the 1st main slit occlusion limiting value, and the 2nd Total limiting value that occludes occludes the sum of limiting value, and the 1st total suction for the 2nd main slit occlusion limiting value and the 2nd auxiliary slit Stay limiting value and the 2nd total limiting value that occludes equal, wherein, it is narrow based on the auxiliary that the 1st auxiliary slit occludes limiting value The angle position of slit width degree, the 1st distance and the 1st lower section cryopanel relative to shielding part auxiliary slit, institute It states the 1st main slit occlusion limiting value and is based on the main slit width, from the main slit of the shielding part to the 1st lower section cryopanel Until distance and the 1st lower section cryopanel relative to the main slit of the shielding part angle position, the 2nd main slit Limiting value is occluded based on the main slit width, the 2nd distance and the 2nd lower section relative to the main slit of the shielding part The angle position of cryopanel, the 2nd auxiliary slit occlude limiting value and are based on the auxiliary slit width, auxiliary from the shielding part Distance until helping slit to the 2nd lower section cryopanel and low relative to the 2nd lower section of shielding part auxiliary slit The angle position of warm plate.

24. the cryogenic pump in 21 to 23 described in any embodiment according to embodiment, which is characterized in that

25. the cryogenic pump in 21 to 24 described in any embodiment according to embodiment, which is characterized in that

26. the cryogenic pump in 21 to 25 described in any embodiment according to embodiment, which is characterized in that

27. the cryogenic pump in 1 to 26 described in any embodiment according to embodiment, which is characterized in that

The top low temperature plate has the top low temperature plate in the top for being located axially at the main slit of the shielding part Outer circumference end,

The multiple cryopanel further includes bottom cryopanel, which has is located axially at the screen described The bottom cryopanel outer circumference end of the lower section of the main slit of shield,

Annulus portion is formed between the top low temperature plate outer circumference end and the bottom cryopanel outer circumference end, it is described Top low temperature plate outer circumference end is directly opposite across the annulus portion and the bottom cryopanel outer circumference end.

28. the cryogenic pump described in 27 according to embodiment, which is characterized in that

Axial distance until the top low temperature plate outer circumference end to the bottom cryopanel outer circumference end is from the top It is more than the radial distance until the center of portion's cryopanel to the top low temperature plate outer circumference end.

29. the cryogenic pump described in 27 or 28 according to embodiment, which is characterized in that

The radiation barrier part has the shielding part front end for delimiting the shielding part main opening,

Radial distance until the center of the top low temperature plate to the top low temperature plate outer circumference end is from the screen More than 70% radial distance until the center of shield main opening to the shielding part front end.

30. the cryogenic pump in 27 to 29 described in any embodiment according to embodiment, which is characterized in that

Distance until the bottom cryopanel outer circumference end to the radiation barrier part is the main slit of the shielding part Within 2 times of width.

31. the cryogenic pump in 27 to 30 described in any embodiment according to embodiment, which is characterized in that

The multiple cryopanel further includes the 1st lower section cryopanel and the 2nd lower section cryopanel, and the 1st lower section cryopanel exists It is disposed in the axial direction between the top low temperature plate and the bottom cryopanel, the 2nd lower section cryopanel is in the axis It is disposed in upwards between the 1st lower section cryopanel and the bottom cryopanel,

Between lower end in the axial direction of the 1st lower section cryopanel and the upper end in the axial direction of the 2nd lower section cryopanel Axial cryopanel between be divided into radial distance until the center of the top low temperature plate to the top low temperature plate outer circumference end More than 40%.

32. the cryogenic pump described in 31 according to embodiment, which is characterized in that

The 1st lower section cryopanel is covered by the top low temperature plate, thus can not be from the shielding part main opening To the 1st lower section cryopanel.

33. the cryogenic pump described in 31 or 32 according to embodiment, which is characterized in that

The 2nd lower section cryopanel is disposed in more leans on diameter than the top low temperature plate outer circumference end with axial parallel tangent line Inside side position.

34. the cryogenic pump in 27 to 33 described in any embodiment according to embodiment, which is characterized in that

The refrigeration machine is radially arranged,

The multiple cryopanel further includes connection cryopanel, and the connection cryopanel is from the sub-cooled platform described in Bottom cryopanel extension, and the bottom cryopanel is thermally connected to the sub-cooled platform,

And be formed with radially with it is described connection cryopanel inner surface it is adjacent and in the axial direction with it is described low The adjacent central space portion in the lower section of warm cooling bench.

35. the cryogenic pump described in 34 according to embodiment, which is characterized in that

The lower end that the central space portion passes through the 1st lower section cryopanel in axial direction and the 2nd lower section cryopanel Axial direction on upper end between axial cryopanel interval connected with the annulus.

36. the cryogenic pump described in 34 or 35 according to embodiment, which is characterized in that

The bottom cryopanel has bottom cryopanel central opening,

The central space portion is low with the shielding part bottom and the bottom by the bottom cryopanel central opening Bottom gap connection between warm plate.

37. the cryogenic pump in 27 to 36 described in any embodiment according to embodiment, which is characterized in that

Radial clearance is formed between the top low temperature plate outer circumference end and the radiation barrier part,

The 1st lower section cryopanel has the 1st lower section cryopanel outer circumference end, cryopanel outer circumference end and institute below the 1st It states and is formed with the 1st spaced radial for being wider than the radial clearance between radiation barrier part, the 2nd lower section cryopanel has the 2nd Lower section cryopanel outer circumference end is formed between cryopanel outer circumference end and the radiation barrier part below the 2nd and is wider than the diameter To the 2nd spaced radial in gap,

The annulus portion includes the non-configuring area of cryopanel, and the non-configuring area of the cryopanel delimited under the described 1st Square cryopanel outer circumference end and the tangent line parallel with the axial direction of one in the cryopanel outer circumference end of the 2nd lower section and the top Between the tangent line parallel with the axial direction of portion's cryopanel outer circumference end,

1st lower section cryopanel outer circumference end in the cryopanel outer circumference end of the 2nd lower section another be located at than described The non-configuring area of cryopanel more leans on radially inner side position.

Claims

1. a kind of cryogenic pump, which is characterized in that have：

Low temperature pump receptacle has cryogenic pump air entry；

Radiation barrier part has shielding part main opening in the cryogenic pump air entry, and the radiation barrier part delimited from the screen The axially continuous shielding part cavity of shield main opening, the radiation barrier part are thermally connected and described with the High-temperature cooling platform Sub-cooled platform is contained in the shielding part cavity, and shielding is formed between the radiation barrier part and the low temperature pump receptacle Part lateral gap；And

Multiple cryopanels are thermally connected with the sub-cooled platform and are matched in a manner of not contacted with the radiation barrier part respectively In the shielding part cavity,

The multiple cryopanel includes top low temperature plate, and the shielding part cavity is divided into shielding part sky by the top low temperature plate Chamber top and shielding part cavity lower part,

The radiation barrier part also has the main slit of shielding part and shielding part auxiliary slit, and the main slit of shielding part makes the screen Shield lateral gap is connected with the shielding part cavity lower part, and the shielding part auxiliary slit is formed in the axial direction and institute It states the different position of the main slit of shielding part and the shield lateral gap is made to be connected with the shielding part cavity lower part,

The 1st lower section cryopanel has the 1st lower section cryopanel outer circumference end, below the described 1st cryopanel outer circumference end with it is described The 1st spaced radial is formed between radiation barrier part, and the 1st spaced radial is wider than the radial clearance,

With the shielding part main opening opposite side of the radiation barrier part in the axial direction has shielding part bottom,

The multiple cryopanel further includes the 2nd lower section cryopanel, and the 2nd lower section cryopanel is disposed in described in the axial direction Between 1st lower section cryopanel and the shielding part bottom,

The main slit of shielding part has main slit width, and the shielding part auxiliary slit has auxiliary slit width, the master Slit width is wider than the auxiliary slit width,

The 2nd distance until the main slit of the shielding part to the 2nd lower section cryopanel is longer than narrow from shielding part auxiliary It is sewn to the 1st distance until the 1st lower section cryopanel.

2. cryogenic pump according to claim 1, which is characterized in that

The shielding part auxiliary slit is formed in the axial direction between the top low temperature plate and the main slit of the shielding part.

3. cryogenic pump according to claim 2, which is characterized in that

The radiation barrier part, which has, to be surrounded the shielding part top on the shielding part cavity top, surrounds under the shielding part cavity The shielding part lower part in portion,

4. cryogenic pump according to claim 1, which is characterized in that

1st lower section cryopanel outer circumference end is covered by the top low temperature plate, so as to be seen from the shielding part main opening Observe the 1st lower section cryopanel outer circumference end.

5. cryogenic pump according to claim 1 or 2, which is characterized in that

1st lower section cryopanel outer circumference end it is described be located axially at the top low temperature plate and the main slit of the shielding part it Between.

6. cryogenic pump according to claim 1 or 2, which is characterized in that

1st total limiting value that occludes occludes the sum of limiting value for the 1st auxiliary slit occlusion limiting value with the 1st main slit, and the 2nd is total It occludes limiting value and occludes the sum of limiting value, and the described 1st total suction for the 2nd main slit occlusion limiting value and the 2nd auxiliary slit Stay limiting value and the 2nd total limiting value that occludes equal, wherein, the 1st auxiliary slit occludes limiting value based on described auxiliary Help the angle position of slit width, the 1st distance and the 1st lower section cryopanel relative to shielding part auxiliary slit It puts, the 1st main slit occludes limiting value and is based on the main slit width, from the main slit of the shielding part to the described 1st lower section The angle position of distance until cryopanel and the 1st lower section cryopanel relative to the main slit of the shielding part, the described 2nd Main slit occludes limiting value based on the main slit width, the 2nd distance and relative to described in the main slit of the shielding part The angle position of 2nd lower section cryopanel, the 2nd auxiliary slit occlude limiting value and are based on the auxiliary slit width, from described Distance until shielding part auxiliary slit to the 2nd lower section cryopanel and assist described the of slit relative to the shielding part The angle position of 2 lower section cryopanels.

7. cryogenic pump according to claim 1 or 2, which is characterized in that

The 1st lower section cryopanel has the 1st diameter, and the 2nd lower section cryopanel has the 2nd diameter, and the 2nd diameter is more than 1st diameter.

8. a kind of cryogenic pump, which is characterized in that have：

Low temperature pump receptacle has cryogenic pump air entry；

9. a kind of cryogenic pump, which is characterized in that have：

Low temperature pump receptacle has cryogenic pump air entry；

The multiple cryopanel further includes the 2nd lower section cryopanel, and the 2nd lower section cryopanel is disposed in described in the axial direction Between 1st lower section cryopanel and the shielding part bottom, the 1st lower section cryopanel has the 1st lower section cryopanel side surface, institute Stating the 2nd lower section cryopanel has the 2nd lower section cryopanel side surface,

Angle between the normal of the main slit of shielding part and the normal of the 2nd lower section cryopanel side surface is less than the screen Angle between the normal of the main slit of shield and the normal of the 1st lower section cryopanel side surface,

Angle between the normal of the shielding part auxiliary slit and the normal of the 1st lower section cryopanel side surface is less than described Angle between the normal of shielding part auxiliary slit and the normal of the 2nd lower section cryopanel side surface.

10. a kind of cryogenic pump, which is characterized in that have：

Low temperature pump receptacle has cryogenic pump air entry；

It is less than relative to the angle of the normal of the shielding part auxiliary slit of radial direction narrow relative to the shielding part master of radial direction The angle of the normal of seam.

11. a kind of cryogenic pump, which is characterized in that have：

Low temperature pump receptacle has cryogenic pump air entry；

The multiple cryopanel includes：The shielding part cavity is divided into shielding part cavity top and shielding by top low temperature plate Part cavity lower part；And the 1st lower section cryopanel, the shielding part cavity lower part is disposed in,

The radiation barrier part also has the main slit of shielding part, and the main slit of shielding part makes the shielding part lateral gap and institute The connection of shielding part cavity lower part is stated,

The 1st lower section cryopanel has the 1st lower section cryopanel outer circumference end, below the described 1st cryopanel outer circumference end with it is described The 1st spaced radial is formed between radiation barrier part, the 1st spaced radial is wider than the radial clearance,

Also there is the radiation barrier part shielding part to assist slit, shielding part auxiliary slit be formed in the axial direction with The different position of the main slit of shielding part, and the shielding part lateral gap is made to be connected with the shielding part cavity lower part,

12. cryogenic pump according to claim 11, which is characterized in that

13. the cryogenic pump according to claim 11 or 12, which is characterized in that

14. cryogenic pump according to claim 11, which is characterized in that

15. cryogenic pump according to claim 11, which is characterized in that

16. cryogenic pump according to claim 11, which is characterized in that

The multiple cryopanel further includes the 2nd lower section cryopanel, and the 2nd lower section cryopanel is disposed in described in the axial direction Between 1st lower section cryopanel and the shielding part bottom.

17. cryogenic pump according to claim 16, which is characterized in that

18. cryogenic pump according to claim 17, which is characterized in that

1st total limiting value that occludes occludes the sum of limiting value for the 1st auxiliary slit occlusion limiting value with the 1st main slit, and the 2nd is total It occludes limiting value and occludes the sum of limiting value, and the 1st total occlusion pole for the 2nd main slit occlusion limiting value and the 2nd auxiliary slit Limit value and the 2nd total limiting value that occludes are equal, wherein, it is wide based on the auxiliary slit that the 1st auxiliary slit occludes limiting value The angle position of degree, the 1st distance and the 1st lower section cryopanel relative to shielding part auxiliary slit, the described 1st Main slit occludes limiting value and is based on the main slit width, until the main slit of the shielding part to the 1st lower section cryopanel Distance and the 1st lower section cryopanel relative to the main slit of the shielding part angle position, the 2nd main slit occludes Limiting value is based on the main slit width, the 2nd distance and the 2nd lower section low temperature relative to the main slit of the shielding part The angle position of plate, the 2nd auxiliary slit occlusion limiting value assist narrow based on the auxiliary slit width, from the shielding part The distance being sewn to until the 2nd lower section cryopanel and the 2nd lower section cryopanel relative to shielding part auxiliary slit Angle position.

19. cryogenic pump according to claim 16, which is characterized in that

20. cryogenic pump according to claim 16, which is characterized in that

21. cryogenic pump according to claim 16, which is characterized in that

The 1st lower section cryopanel has the 1st lower section cryopanel side surface, and the 2nd lower section cryopanel has the 2nd lower section low temperature Plate side surface,