CN105865389B - A kind of micro-and nanoscale standard and its tracking method - Google Patents
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Abstract
本发明为一种微纳米标准样板及其循迹方法，其特征在于：所述的微纳米标准样板包括A区域、B区域和C区域三个工作区域；所述的A区域设有向上的箭头形状的循迹标识；所述的B区域设有不同计量尺寸的第一矩阵阵列光栅和第二矩阵阵列光栅；所述的C区域设有不同计量尺寸的第一横向刻度尺、第二横向刻度尺、第三横向刻度尺和第四横向刻度尺，所述的C区域还设有四个等腰直角三角形形状的循迹标识。所述A区域的向上的箭头形状的循迹标识实现了在测量前快速定位微纳米标准样板并确定样板的正交扫描方向，便于快速定位B区域和C区域，并通过坐标关系实现重复性测量。
The present invention is a micro-nano standard template and its tracking method, which is characterized in that: the micro-nano standard template includes three working areas of A area, B area and C area; the A area is provided with an upward arrow Shape tracking mark; the B area is provided with the first matrix array grating and the second matrix array grating of different measurement sizes; the C area is provided with the first horizontal scale and the second horizontal scale of different measurement sizes Ruler, the third horizontal scale and the fourth horizontal scale, the C area is also provided with four tracking marks in the shape of isosceles right triangles. The upward arrow-shaped tracking mark in the A area realizes the rapid positioning of the micro-nano standard sample and determines the orthogonal scanning direction of the sample before the measurement, which facilitates the rapid positioning of the B area and the C area, and realizes repeatable measurement through the coordinate relationship .
Description
技术领域technical field
本发明涉及一种微纳米标准样板及其循迹方法，特别是公开一种集成跨尺度计量尺寸、多参数校准功能的微纳米标准样板及其循迹方法。The invention relates to a micro-nano standard template and a tracking method thereof, in particular to a micro-nano standard template integrated with cross-scale measurement and multi-parameter calibration functions and a tracking method thereof.
背景技术Background technique
随着微纳米领域的快速发展，对日趋小型化的产品以及相应的生产设备、测量仪器提出了更高的准确性和精度要求。1997年9月长度咨询委员会CCL确定了在几何度量领域的几个关键特征的比对，分别为线宽标准样板（Nano1），台阶高度标准样板（Nano2），线标度标准样板（Nano3），一维光栅标准样板（Nano4），二维光栅标准样板（Nano5）。在质量体系中，为了实现量值的统一与标准化，保证几何量值传递的准确性与溯源性，越来越多的微纳米标准样板被用于测量仪器的校准与溯源性的工作中。With the rapid development of the micro-nano field, higher accuracy and precision requirements are put forward for increasingly miniaturized products and corresponding production equipment and measuring instruments. In September 1997, the Length Advisory Committee CCL determined the comparison of several key features in the field of geometric measurement, namely line width standard template (Nano1), step height standard template (Nano2), line scale standard template (Nano3), One-dimensional grating standard template (Nano4), two-dimensional grating standard template (Nano5). In the quality system, in order to achieve the unification and standardization of the quantity value and ensure the accuracy and traceability of the geometric value transmission, more and more micro-nano standard templates are used in the calibration and traceability of measuring instruments.
针对各国计量院或是相关领域的公司已生产的标准样板研究，目前微纳米标准样板由于受到制备工艺或是操作方式的限制，每个样板尺度基本局限于微米或是纳米，关键特征也相对简单，导致测量功能单一。同时标准样板缺少合理的标识记号，不利于操作人员在初始测量时对被测结构区域的准准确、快速的定位，难以实现坐标重复性测量。Based on the research on the standard samples that have been produced by national metrology institutes or companies in related fields, the current micro-nano standard samples are limited by the preparation process or operation mode. The size of each sample is basically limited to microns or nanometers, and the key features are relatively simple. , resulting in a single measurement function. At the same time, the standard template lacks reasonable identification marks, which is not conducive to the accurate and fast positioning of the measured structure area by the operator during the initial measurement, and it is difficult to achieve coordinate repeatability measurement.
发明内容Contents of the invention
本发明的目的是解决现有技术的缺陷，提供一种可循迹、集成跨尺度计量尺寸、多参数校准功能的微纳米标准样板及其循迹方法。The purpose of the present invention is to solve the defects of the prior art, and provide a traceable, integrated cross-scale measurement size, multi-parameter calibration function micro-nano standard template and its tracking method.
本发明是这样实现的：一种微纳米标准样板及其循迹方法，其特征在于：所述的微纳米标准样板包括A区域、B区域和C区域三个工作区域；所述的A区域设有向上的箭头形状的循迹标识；所述的B区域设有不同计量尺寸的第一矩阵阵列光栅和第二矩阵阵列光栅；所述的C区域设有不同计量尺寸的第一横向刻度尺、第二横向刻度尺、第三横向刻度尺和第四横向刻度尺，所述的C区域还设有四个等腰直角三角形形状的循迹标识。The present invention is achieved in this way: a micro-nano standard template and its tracking method, characterized in that: the micro-nano standard template includes three working areas of A area, B area and C area; the A area is set There is an upward arrow-shaped tracking mark; the B area is provided with a first matrix array grating and a second matrix array grating of different measurement sizes; the C area is provided with a first horizontal scale of different measurement sizes, For the second horizontal scale, the third horizontal scale and the fourth horizontal scale, the area C is also provided with four tracking marks in the shape of isosceles right triangles.
所述A区域和B区域的长和宽都为3mm，所述三个工作区域的边框宽度均为0.125mm，三个工作区域的边框以及三个工作区域中的结构高度均为100nm。所述A区域的向上的箭头形状的循迹标识由三个特征结构组成，三个特征结构的线宽均为10μm、对称夹角为60度。所述的第一矩阵阵列光栅每行的节距（二维栅）为1μm、每列的节距为1μm，第一矩阵阵列光栅的长和宽都为600μm；所述的第二矩阵阵列光栅每行的节距为1.5μm、每列的节距为1.5μm。所述的第一横向刻度尺每一刻度的线宽均为200nm，所述的第二横向刻度尺每一刻度的线宽均为2μm，所述的第三横向刻度尺每一刻度的线宽均为20μm，所述的第四横向刻度尺每一刻度的线宽均为200μm。The length and width of the regions A and B are both 3mm, the border widths of the three working regions are all 0.125mm, and the borders of the three working regions and the structure heights in the three working regions are all 100nm. The upward arrow-shaped tracking mark in the A region is composed of three characteristic structures, the line width of the three characteristic structures is 10 μm, and the symmetrical angle is 60 degrees. The pitch of each row (two-dimensional grating) of the first matrix array grating is 1 μm, the pitch of each column is 1 μm, and the length and width of the first matrix array grating are both 600 μm; the second matrix array grating The pitch of each row is 1.5 μm, and the pitch of each column is 1.5 μm. The line width of each scale of the first horizontal scale is 200nm, the line width of each scale of the second horizontal scale is 2 μm, and the line width of each scale of the third horizontal scale Both are 20 μm, and the line width of each scale of the fourth horizontal scale is 200 μm.
所述A区域的向上的箭头形状的循迹标识实现了在测量前快速定位微纳米标准样板并确定样板的正交扫描方向，便于快速定位B区域和C区域，并通过三个工作区域的坐标关系与标准结构的平行或正交关系，实现微纳米标准样板的可循迹、快速与重复性测量。所述的B区域为扫描探针显微镜等微纳米测量仪器的平面横向扫描的放大倍率、图形畸变的校准提供了两种不同计量尺寸的矩阵阵列光栅。所述C区域的四个等腰直角三角形形状的循迹标识实现了在测量时快速准确地定位到测量区域、正交测量和定位起始测量点，所述的四个等腰直角三角形形状的循迹标识等腰直角三角形顶点指向方向为测量方向。所述的C区域为扫描探针显微镜等微纳米测量仪器的水平测试精度的校准提供了四种不同计量尺寸的横向刻度尺，省去了更换不同计量尺寸的长度标准样板和重新校验的过程，提高了测量效率和准确度，并且，同一状态下的测量有助于保证测量结果的一致性。The upward arrow-shaped tracking mark in the A area realizes the rapid positioning of the micro-nano standard sample and determines the orthogonal scanning direction of the sample before the measurement, which is convenient for quickly locating the B area and the C area, and through the coordinates of the three working areas The parallel or orthogonal relationship between the relationship and the standard structure realizes the traceable, fast and repeatable measurement of the micro-nano standard template. The B area provides two matrix array gratings with different measurement sizes for the calibration of the magnification and graphic distortion of the plane transverse scanning of micro-nano measuring instruments such as scanning probe microscopes. The four isosceles right triangle-shaped tracking marks in the C area realize fast and accurate positioning to the measurement area, orthogonal measurement and positioning of the initial measurement point during measurement, and the four isosceles right triangle shapes The pointing direction of the apex of the isosceles right triangle of the tracking mark is the measurement direction. The C area provides four horizontal scales of different measurement sizes for the calibration of the horizontal test accuracy of micro-nano measuring instruments such as scanning probe microscopes, which saves the process of replacing length standard templates of different measurement sizes and re-calibration , which improves the measurement efficiency and accuracy, and the measurement under the same state helps to ensure the consistency of the measurement results.
本发明的有益效果是：本发明能够校准微纳米测量仪器纵向高度、长度及放大倍率等。本发明A区域的向上的箭头形状的循迹标识有利于测量前实现正交扫描方向的确认，并且有助于测量时对标准结构实现快速、准确定位，通过坐标关系实现重复性测量，大大提高了测量效率和评价精度。本发明在C区域设置了四种不同计量尺寸的横向刻度尺，能够同时满足多种微纳米测量仪器跨尺度、多参数的长度计量校准需求，使得微纳米测量仪器的校准更高效、便捷，测量结果更准确。The beneficial effects of the invention are: the invention can calibrate the longitudinal height, length and magnification of the micro-nano measuring instrument. The upward arrow-shaped tracking mark in the A area of the present invention is conducive to the confirmation of the orthogonal scanning direction before measurement, and helps to realize fast and accurate positioning of the standard structure during measurement, and realizes repeatable measurement through coordinate relations, greatly improving Improve the measurement efficiency and evaluation accuracy. The present invention sets four horizontal scales with different measurement sizes in the C area, which can meet the cross-scale and multi-parameter length measurement and calibration requirements of various micro-nano measuring instruments at the same time, making the calibration of micro-nano measuring instruments more efficient and convenient. The result is more accurate.
附图说明Description of drawings
图1是本发明微纳米标准样板的结构示意图。Fig. 1 is a schematic diagram of the structure of the micro-nano standard template of the present invention.
图2是本发明微纳米标准样板的A区域的结构示意图。Fig. 2 is a schematic diagram of the structure of area A of the micro-nano standard template of the present invention.
图3是本发明微纳米标准样板的B区域的平面结构示意图。Fig. 3 is a schematic plan view of the B area of the micro-nano standard template of the present invention.
图4是本发明微纳米标准样板的C区域的平面结构示意图。Fig. 4 is a schematic plan view of the C region of the micro-nano standard template of the present invention.
图5是本发明通过求取A区域向上的箭头形状的循迹标识的平均线宽的扫描方式来确定正交扫描方向的实施示意图。Fig. 5 is a schematic diagram of the implementation of determining the orthogonal scanning direction by calculating the average line width of the arrow-shaped tracking mark in the A area according to the present invention.
图6是本发明通过扫描A 区域特征结构来确定正交扫描方向的实施示意图。FIG. 6 is a schematic diagram of the present invention for determining the orthogonal scanning direction by scanning the characteristic structure in the A region.
在图中：1、A区域； 2、B区域； 3、C区域； 4、向上的箭头形状的循迹标识； 5、第一矩阵阵列光栅； 6、第二矩阵阵列光栅； 7、第一横向刻度尺； 8、第二横向刻度尺； 9、第三横向刻度尺； 10、第四横向刻度尺； 11、等腰直角三角形形状的循迹标识； 12、第一扫描方向； 13、第二扫描方向； 14、正交扫描方向。In the figure: 1. Area A; 2. Area B; 3. Area C; 4. The tracking mark in the shape of an upward arrow; 5. The first matrix array grating; 6. The second matrix array grating; 7. The first Horizontal scale; 8. The second horizontal scale; 9. The third horizontal scale; 10. The fourth horizontal scale; 11. The tracking mark in the shape of an isosceles right triangle; 12. The first scanning direction; 13. The first 2. Scanning direction; 14. Orthogonal scanning direction.
具体实施方式Detailed ways
根据附图1～4，本发明微纳米标准样板的结构包括A区域1、B区域2和C区域3三个工作区域；所述的A区域1设有向上的箭头形状的循迹标识4；所述的B区域2设有不同计量尺寸的第一矩阵阵列光栅5和第二矩阵阵列光栅6；所述的C区域3设有不同计量尺寸的第一横向刻度尺7、第二横向刻度尺8、第三横向刻度尺9和第四横向刻度尺10，所述的C区域3还设有四个等腰直角三角形形状的循迹标识11。According to accompanying drawings 1 to 4, the structure of the micro-nano standard template of the present invention includes three working areas of A area 1, B area 2 and C area 3; said A area 1 is provided with an upward arrow-shaped tracking mark 4; The B area 2 is provided with a first matrix array grating 5 and a second matrix array grating 6 of different measurement sizes; the C area 3 is provided with a first horizontal scale 7 and a second horizontal scale of different measurement sizes. 8. The third horizontal scale 9 and the fourth horizontal scale 10 , the area C 3 is also provided with four tracking marks 11 in the shape of isosceles right triangles.
所述A区域1和B区域2的长和宽都为3mm，所述三个工作区域的边框宽度均为0.125mm，三个工作区域的边框以及三个工作区域中的结构高度均为100nm。所述A区域1的向上的箭头形状的循迹标识4由三个特征结构组成，三个特征结构的线宽均为10μm、对称夹角为60度。所述的第一矩阵阵列光栅5每行的节距（二维栅）为1μm、每列的节距为1μm，第一矩阵阵列光栅5的长和宽都为600μm；所述的第二矩阵阵列光栅6每行的节距为1.5μm、每列的节距为1.5μm。所述的第一横向刻度尺7每一刻度的线宽均为200nm，所述的第二横向刻度尺8每一刻度的线宽均为2μm，所述的第三横向刻度尺9每一刻度的线宽均为20μm，所述的第四横向刻度尺10每一刻度的线宽均为200μm。The length and width of the A region 1 and the B region 2 are both 3mm, the border widths of the three working regions are all 0.125mm, and the borders of the three working regions and the structure heights in the three working regions are all 100nm. The upward arrow-shaped tracking mark 4 of the A region 1 is composed of three characteristic structures, the line width of the three characteristic structures is 10 μm, and the symmetrical angle is 60 degrees. The pitch of each row (two-dimensional grating) of the first matrix array grating 5 is 1 μm, the pitch of each column is 1 μm, and the length and width of the first matrix array grating 5 are both 600 μm; the second matrix array grating 5 The pitch of each row of the array grating 6 is 1.5 μm, and the pitch of each column is 1.5 μm. The line width of each scale of the first horizontal scale 7 is 200nm, the line width of each scale of the second horizontal scale 8 is 2 μm, and each scale of the third horizontal scale 9 is The line width of each scale is 20 μm, and the line width of each scale of the fourth horizontal scale 10 is 200 μm.
所述A区域1的向上的箭头形状的循迹标识4实现了在测量前快速定位微纳米标准样板并确定样板的正交扫描方向，便于快速定位B区域2和C区域3，并通过三个工作区域的坐标关系与标准结构的平行或正交关系，实现微纳米标准样板的可循迹、快速与重复性测量。所述的B区域2为扫描探针显微镜等微纳米测量仪器在平面横向扫描的放大倍率、图形畸变的校准提供了两种不同计量尺寸的矩阵阵列光栅。所述C区域3的四个等腰直角三角形形状的循迹标识11实现了在测量时快速准确地定位到测量区域、正交测量和定位起始测量点，所述的四个等腰直角三角形形状的循迹标识11等腰直角三角形顶点指向方向为测量方向。所述的C区域3为扫描探针显微镜等微纳米测量仪器的水平测试精度的校准提供了四种不同计量尺寸的横向刻度尺，省去了更换不同计量尺寸的标准样板和重新校验的过程，提高了测量效率和准确度，并且，同一状态下的测量有助于保证测量结果的一致性。The upward arrow-shaped tracking mark 4 of the A area 1 realizes the rapid positioning of the micro-nano standard sample and determines the orthogonal scanning direction of the sample before the measurement, which facilitates the rapid positioning of the B area 2 and the C area 3, and through three The coordinate relationship of the working area and the parallel or orthogonal relationship of the standard structure realize the traceable, fast and repeatable measurement of the micro-nano standard template. The B area 2 provides two kinds of matrix array gratings with different measurement sizes for the calibration of the magnification and graphic distortion of the scanning probe microscope and other micro-nano measuring instruments in the horizontal scanning of the plane. The four isosceles right triangle-shaped tracking marks 11 in the C area 3 realize fast and accurate positioning to the measurement area, orthogonal measurement and positioning of the initial measurement point during measurement, and the four isosceles right triangles The shape of the tracking mark 11 points to the direction of the apex of the isosceles right triangle as the measurement direction. The C area 3 provides four horizontal scales with different measurement sizes for the calibration of the horizontal test accuracy of micro-nano measuring instruments such as scanning probe microscopes, which saves the process of replacing standard templates with different measurement sizes and re-calibration , which improves the measurement efficiency and accuracy, and the measurement under the same state helps to ensure the consistency of the measurement results.
本发明可以通过两种方式来确定正交扫描方向，下面结合具体实施例来进一步阐述本发明。The present invention can determine the orthogonal scanning direction in two ways, and the present invention will be further described below in conjunction with specific embodiments.
实施例1：Example 1:
根据附图5，本发明通过具有夹角θ的非正交的第一扫描方向12和第二扫描方向13，通过平均线宽p 1 和p 2 ，基于两次偏角的余弦关系，确定向上的箭头形状的循迹标识的正交方向，即正交扫描方向14。According to accompanying drawing 5, the present invention uses the non-orthogonal first scanning direction 12 and the second scanning direction 13 with included angle θ , through the average line width p 1 and p 2 , based on the cosine relationship of the two deflection angles, determine the upward The orthogonal direction of the arrow-shaped tracking mark, that is, the orthogonal scanning direction 14 .
实施例2：Example 2:
根据附图6，本发明通过适当的采样间距和包含五条有效扫描轮廓线的扫描方式测量A区域向上的箭头形状的循迹标识的轮廓形貌，图中带箭头的直线为有效的测量数据，箭头所指方向为扫描方向，图中的虚线为完成某阶段扫描线后快速移动至下一阶段起始点时的路径；将测量数据采用图像处理技术进行处理，得到五条轮廓线的平均线宽，根据最小线宽原则，确定正交扫描方向。According to accompanying drawing 6, the present invention measures the contour shape of the arrow-shaped tracking mark upward in the A region through an appropriate sampling interval and a scanning method comprising five effective scanning contour lines, and the straight line with the arrow in the figure is effective measurement data, The direction pointed by the arrow is the scanning direction, and the dotted line in the figure is the path when the scanning line of a certain stage is completed and quickly moved to the starting point of the next stage; the measured data is processed by image processing technology to obtain the average line width of the five contour lines, According to the principle of minimum line width, determine the orthogonal scanning direction.
本发明能够校准微纳米测量仪器纵向高度、长度及放大倍率等。本发明A区域的向上的箭头形状的循迹标识有利于测量前实现正交扫描方向的确认，并且有助于测量时对标准结构实现快速、准确定位，通过坐标关系实现重复性测量，大大提高了测量效率和评价精度。本发明在C区域设置了四种不同计量尺寸的横向刻度尺，能够同时满足多种微纳米测量仪器跨尺度、多参数的长度计量校准需求，使得微纳米测量仪器的校准更高效、便捷，测量结果更准确。The invention can calibrate the longitudinal height, length, magnification and the like of the micro-nano measuring instrument. The upward arrow-shaped tracking mark in the A area of the present invention is conducive to the confirmation of the orthogonal scanning direction before measurement, and helps to realize fast and accurate positioning of the standard structure during measurement, and realizes repeatable measurement through coordinate relations, greatly improving The measurement efficiency and evaluation accuracy are improved. The present invention sets four horizontal scales with different measurement sizes in the C area, which can meet the cross-scale and multi-parameter length measurement and calibration requirements of various micro-nano measuring instruments at the same time, making the calibration of micro-nano measuring instruments more efficient and convenient. The result is more accurate.
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| CN107993956B (en) * | 2017-11-29 | 2020-07-07 | 中国电子科技集团公司第十三研究所 | Preparation method of line spacing standard sample wafer |
| CN109444473B (en) * | 2018-12-24 | 2021-06-15 | 中国电子科技集团公司第十三研究所 | Line width standard sample and tracking method of standard lines in line width standard sample |
| CN110793433B (en) * | 2019-09-26 | 2021-11-19 | 西安交通大学 | On-line calibration wafer micro-nano step height standard template and tracking method thereof |
| CN110986846B (en) * | 2019-12-10 | 2022-04-29 | 中国计量科学研究院 | Multi-value measurement standard device and preparation method of multi-value measurement standard device |
| CN113237446B (en) * | 2021-04-17 | 2024-08-23 | 上海市计量测试技术研究院 | Composite nanometer film thickness standard template and tracking method thereof |
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