[go: up one dir, main page]

CN105802582A - Rare earth grinding fluid - Google Patents

Rare earth grinding fluid Download PDF

Info

Publication number
CN105802582A
CN105802582A CN201610339932.8A CN201610339932A CN105802582A CN 105802582 A CN105802582 A CN 105802582A CN 201610339932 A CN201610339932 A CN 201610339932A CN 105802582 A CN105802582 A CN 105802582A
Authority
CN
China
Prior art keywords
rare earth
lapping liquid
liquid according
surfactant
organic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610339932.8A
Other languages
Chinese (zh)
Inventor
顾健元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KUNSHAN JINCHENG REAGENT CO Ltd
Original Assignee
KUNSHAN JINCHENG REAGENT CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KUNSHAN JINCHENG REAGENT CO Ltd filed Critical KUNSHAN JINCHENG REAGENT CO Ltd
Priority to CN201610339932.8A priority Critical patent/CN105802582A/en
Publication of CN105802582A publication Critical patent/CN105802582A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1454Abrasive powders, suspensions and pastes for polishing
    • C09K3/1472Non-aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The invention relates to rare earth grinding fluid.The rare earth grinding fluid is mainly prepared from, by weight, 2%-5% of rare earth, 1%-2% of a softener, 0.1%-5% of a chelating agent, 1%-15% of a surfactant and the balance organic solvent.The rare earth grinding fluid produced through the technical scheme is simple in production technology and free of mechanical impurities, has the high dispersity and adsorptivity and can keep the state stable for a long time; meanwhile, the softener in the components can soften an oxidation film on the surface of a workpiece to enable the oxidation film to be easily removed through grinding, the material on the surface of the workpiece can be converted into a chelate by the chelating agent after being ground off to be inhibited from being attached to the metal surface again, and therefore the grinding precision is improved.

Description

Rare earth lapping liquid
Technical field
The present invention relates to field of surface treatment, specifically rare earth lapping liquid.
Background technology
The mankind are very close with the relation of chemical industry, in the modern life, almost all be unable to do without chemical products whenever and wherever possible, from material lifes such as clothing, food, shelter, row to the cultural life such as culture and arts, amusement, are required for chemical products and service for it.Some chemical products, in human development history, plays epoch-making important function.Their production and application, even represent certain historical stage of human civilization.
Ultra-precision Turning is the production technology that modern sophisticated industry is important, and it does not require nothing more than high accuracy, high-quality, and requires low cost and high repeatability.And ultraprecision grinding polishing is owing to having the process principle of uniqueness and to features such as process equipment, environmental factors are less demanding, the nanoscale even processing of atom level can be realized, become a pith in Ultraprecision Machining, it is achieved the critical material of ultraprecision grinding polishing is precise finiss goods.At present, the removal unit removing material with abrasive particle has reached nanometer or even sub-nanometer scale, reach so high surface smoothness, the lapping liquid containing abrasive material can be used, or use abrasive material to be fixed on the polished film on thin film, the number steps such as corase grind, middle mill, fine grinding, polishing are divided to carry out, it is also possible to lapping liquid and polished film are combined cross-reference.
Polishing refers to and utilizes mechanical, chemical or electrochemical effect, makes workpiece surface roughness reduce, with the processing method obtaining light, flat surface.It is the modification processing utilizing flexible polishing instrument and abrasive grain or other polishing mediums that surface of the work is carried out.Loading steel ball and fur fragment when essence is thrown in wooden barrel, rotation a few hours can obtain the surface of dazzling light continuously.Finished surface is immersed in polishing fluid to carry out by the polishing of precision scale, and polishing fluid is mixed by the chromium oxide micropowder that granularity is W5~W0.5 and emulsion.In addition with methods such as electrobrightenings.Tradition polishing powder complex manufacturing, it is easy to environment is impacted, and the production cycle is long.
There is presently no a kind of production technology simple, what will not environment be impacted can the rare earth lapping liquid that be specifically designed to polishing of mass production.
Summary of the invention
The present invention is just for above technical problem, it is provided that a kind of production technology is simple, and what will not environment be impacted can the rare earth lapping liquid that be specifically designed to polishing of mass production.
The present invention is achieved through the following technical solutions.
Rare earth lapping liquid, is mainly made up of rare earth, softening agent, chelating agen, surfactant, organic solvent, and each Ingredients Weight percentage composition is: rare earth 2%~5%;Softening agent 1%~2%;Chelating agen 0.1%~5%;Surfactant 1%~15%, surplus is organic solvent.Essential element content in rare earth meets claimed below: CaO+MgO≤3%, CeO >=60%, Nd2O3≥0.2%,La2O3≥28%,Pr2O3≥5%.Softening agent is the one in tartaric acid, stearic acid, pyridine, triethylamine.Chelating agen is NTA or EDTA.Surfactant is one or more the mixture in alkylphenol polyoxyethylene, high-carbon fatty alcohol polyoxyethylene ether, polyoxyethylene carboxylate, fatty acid methyl ester ethyl oxide, sorbitan ester.Organic solvent is mainly alkane solvents.
Adopt the rare earth lapping liquid production technology that technical scheme of the present invention produces simple, without mechanical admixture, there is higher dispersibility and adsorptivity, can keeping in stable condition for a long time, meanwhile, the softening agent in component can make surface of the work oxide-film soften, so as to be easily removed, and the agent that can be chelated after being ground by the material of surface of the work is converted into chelate, thus suppressing it to be attached to metal surface again, improves grinding precision.
Detailed description of the invention
Below in conjunction with specific embodiment, the invention will be further described.
Embodiment 1:
First sorbitan ester 50g is added in 1Kg white oil, it is sufficiently stirred for, add 30g rare earth, it is sufficiently stirred for also ultrasonic disperse 10 minutes, then being continuously added into tartaric acid 15g and EDTA10g under stirring and ultrasonic disperse state, in the end namely a component obtains rare earth lapping liquid of the present invention after adding 15 minutes.
Embodiment 2:
First alkylphenol polyoxyethylene 30g is added in 1Kg white oil, it is sufficiently stirred for, add 40g rare earth, it is sufficiently stirred for also ultrasonic disperse 10 minutes, then being continuously added into stearic acid 15g and NTA20g under stirring and ultrasonic disperse state, in the end namely a component obtains rare earth lapping liquid of the present invention after adding 15 minutes.
Adopt the rare earth lapping liquid production technology that technical scheme of the present invention produces simple, without mechanical admixture, there is higher dispersibility and adsorptivity, can keeping in stable condition for a long time, meanwhile, the softening agent in component can make surface of the work oxide-film soften, so as to be easily removed, and the agent that can be chelated after being ground by the material of surface of the work is converted into chelate, thus suppressing it to be attached to metal surface again, improves grinding precision.
Above-described embodiment only for technology design and the feature of the present invention are described, its object is to allow person skilled in the art will appreciate that present disclosure and to implement according to this, can not limit the scope of the invention with this.All equivalences made according to spirit of the invention change or modify, and all should be encompassed within protection scope of the present invention.

Claims (6)

1. rare earth lapping liquid, is mainly made up of rare earth, softening agent, chelating agen, surfactant, organic solvent, and each Ingredients Weight percentage composition is: rare earth 2%~5%;Softening agent 1%~2%;Chelating agen 0.1%~5%;Surfactant 1%~15%, surplus is organic solvent.
2. rare earth lapping liquid according to claim 1, it is characterised in that the essential element content in rare earth meets claimed below: CaO+MgO≤3%, CeO >=60%, Nd2O3≥0.2%,La2O3≥28%,Pr2O3≥5%。
3. rare earth lapping liquid according to claim 1, it is characterised in that softening agent is the one in tartaric acid, stearic acid, pyridine, triethylamine.
4. rare earth lapping liquid according to claim 1, it is characterised in that chelating agen is NTA or EDTA.
5. rare earth lapping liquid according to claim 1, it is characterised in that surfactant is one or more the mixture in alkylphenol polyoxyethylene, high-carbon fatty alcohol polyoxyethylene ether, polyoxyethylene carboxylate, fatty acid methyl ester ethyl oxide, sorbitan ester.
6. rare earth lapping liquid according to claim 1, it is characterised in that organic solvent is mainly alkane solvents.
CN201610339932.8A 2016-05-23 2016-05-23 Rare earth grinding fluid Pending CN105802582A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610339932.8A CN105802582A (en) 2016-05-23 2016-05-23 Rare earth grinding fluid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610339932.8A CN105802582A (en) 2016-05-23 2016-05-23 Rare earth grinding fluid

Publications (1)

Publication Number Publication Date
CN105802582A true CN105802582A (en) 2016-07-27

Family

ID=56452622

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610339932.8A Pending CN105802582A (en) 2016-05-23 2016-05-23 Rare earth grinding fluid

Country Status (1)

Country Link
CN (1) CN105802582A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106675518A (en) * 2016-11-30 2017-05-17 安徽电气集团股份有限公司 Rare earth grinding fluid
CN107022311A (en) * 2017-05-19 2017-08-08 南通华兴石油仪器有限公司 A kind of oil instrument rare earth lapping liquid
CN107118743A (en) * 2017-05-19 2017-09-01 南通华兴石油仪器有限公司 A kind of oil instrument polishing special-purpose grinding fluid
CN107216813A (en) * 2017-05-19 2017-09-29 南通华兴石油仪器有限公司 A kind of polishing fluid of oil instrument
CN113308310A (en) * 2021-05-20 2021-08-27 上海珑灵洁净科技有限公司 Wax removing water composition, application and preparation method thereof
CN116352511A (en) * 2023-04-10 2023-06-30 南通军盛机械模具有限公司 Novel roller sanding process for container side plate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1735671A (en) * 2002-12-10 2006-02-15 高级技术材料公司 Passivative chemical mechanical polishing composition for copper film planarization
CN105368324A (en) * 2015-12-07 2016-03-02 苏州博洋化学股份有限公司 Oily diamond grinding lubricant

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1735671A (en) * 2002-12-10 2006-02-15 高级技术材料公司 Passivative chemical mechanical polishing composition for copper film planarization
CN105368324A (en) * 2015-12-07 2016-03-02 苏州博洋化学股份有限公司 Oily diamond grinding lubricant

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
刘光华: "《稀土材料与应用技术》", 31 July 2005, 北京:化学工业出版社 *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106675518A (en) * 2016-11-30 2017-05-17 安徽电气集团股份有限公司 Rare earth grinding fluid
CN107022311A (en) * 2017-05-19 2017-08-08 南通华兴石油仪器有限公司 A kind of oil instrument rare earth lapping liquid
CN107118743A (en) * 2017-05-19 2017-09-01 南通华兴石油仪器有限公司 A kind of oil instrument polishing special-purpose grinding fluid
CN107216813A (en) * 2017-05-19 2017-09-29 南通华兴石油仪器有限公司 A kind of polishing fluid of oil instrument
CN113308310A (en) * 2021-05-20 2021-08-27 上海珑灵洁净科技有限公司 Wax removing water composition, application and preparation method thereof
CN113308310B (en) * 2021-05-20 2023-12-19 上海珑灵洁净科技有限公司 Wax removing water composition, application and preparation method thereof
CN116352511A (en) * 2023-04-10 2023-06-30 南通军盛机械模具有限公司 Novel roller sanding process for container side plate

Similar Documents

Publication Publication Date Title
CN105802582A (en) Rare earth grinding fluid
CN101864247B (en) Abrasive material-free polishing fluid for chemical mechanical polishing of rigid fragile material
CN106112791B (en) Titanium alloy grinding and cmp method
CN105368324A (en) Oily diamond grinding lubricant
CN103937414B (en) Fine polishing solution for computer hard disk substrate
CN105970228A (en) Aluminum alloy polishing solution and preparation method thereof
CN104593776A (en) Chemical mechanical polishing liquid for titanium
CN105647394A (en) Water-based diamond polishing solution and preparation method thereof
CN112080251B (en) Wafer grinding fluid and preparation method thereof
CN111100559A (en) A kind of water-based magnetorheological polishing liquid and preparation method thereof
CN109988676A (en) A kind of cleaning solution, preparation method and application
JP5036374B2 (en) Paste material
TW201623559A (en) CMP slurry
CN104084849B (en) The magnetic rheological polishing method of deliquescent crystal
CN111534234A (en) Intermediate polishing additive, intermediate polishing composition and polishing method
CN105925389A (en) Cleaning agent special for rare-earth grinding fluid
Chen et al. Effects of hydrogen peroxide and alumina on surface characteristics of copper chemical–mechanical polishing in citric acid slurries
CN109096924A (en) A kind of glass free curve surface polishing liquid and its preparation method and application
CN110846665B (en) Stainless steel polishing agent and preparation method and application thereof
CN103695915A (en) Emulsion-type antirust liquid and preparation method thereof
CN107604370A (en) A kind of metal-derusting liquid and preparation method thereof
CN108728849A (en) A kind of stainless steel material polishing agent and preparation method thereof
CN106675518A (en) Rare earth grinding fluid
CN111534233A (en) Rough polishing additive, rough polishing composition and polishing method
CN105176659A (en) Grinding fluid and preparation method and application thereof

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20160727