CN105700203A - Planar waveguide type near-and-mid infrared light modulator based on graphene-chalcogenide glass - Google Patents
Planar waveguide type near-and-mid infrared light modulator based on graphene-chalcogenide glass Download PDFInfo
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- 239000005387 chalcogenide glass Substances 0.000 title claims abstract description 27
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 138
- 229910021389 graphene Inorganic materials 0.000 claims abstract description 136
- 230000003287 optical effect Effects 0.000 claims abstract description 106
- 239000000463 material Substances 0.000 claims description 52
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 229910052582 BN Inorganic materials 0.000 claims description 5
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 150000001450 anions Chemical class 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910021476 group 6 element Inorganic materials 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 125000006850 spacer group Chemical group 0.000 claims 13
- 229910017000 As2Se3 Inorganic materials 0.000 claims 1
- NCMAYWHYXSWFGB-UHFFFAOYSA-N [Si].[N+][O-] Chemical class [Si].[N+][O-] NCMAYWHYXSWFGB-UHFFFAOYSA-N 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 229910052958 orpiment Inorganic materials 0.000 claims 1
- 238000002955 isolation Methods 0.000 abstract description 29
- 239000000758 substrate Substances 0.000 abstract 2
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- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000005371 ZBLAN Substances 0.000 description 2
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- 229910002804 graphite Inorganic materials 0.000 description 2
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- 229910052755 nonmetal Inorganic materials 0.000 description 2
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- 239000010703 silicon Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
- G02F1/035—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect in an optical waveguide structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12038—Glass (SiO2 based materials)
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12133—Functions
- G02B2006/12142—Modulator
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- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
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- Crystallography & Structural Chemistry (AREA)
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Abstract
Description
技术领域technical field
一种基于石墨烯‐硫系玻璃平面波导型近中红外光调制器,用于集成光子器件调制、解调1.55~3μm近中红外的光学信号,属于电光调制器,尤其涉及基于石墨烯‐硫系玻璃平面波导型近中红外光调制器技术领域。A near-mid-infrared optical modulator based on graphene-chalcogenide glass planar waveguide, used for integrated photonic devices to modulate and demodulate 1.55-3μm near-mid-infrared optical signals, belonging to electro-optic modulators, especially related to graphene-sulfur based The invention relates to the technical field of glass planar waveguide near-mid infrared light modulators.
背景技术Background technique
光子代替电子作为信息的载体是历史发展的必然趋势,现代集成光学的研究主要集中于近红外通信波段,随着20世纪70年代低损耗光纤和半导体激光器的出现以及80年代掺铒光纤放大器的发明和实用化,集成光学研究的波段逐渐从第一代的0.85μm转移到第二代的1.31μm以及到现在最主流的1.555μm波长。各种光学器件,包括光波导、光耦合器、光开关、光调制器、滤波器、模‐数转换器、探测器,都已经得到广泛的研究并制作成功。集成光学已经成为全世界研究的热点并在迅速发展,这对光纤通信、光信号处理以及与集成电路之间的光电混合集成都有着非常重要的意义。到目前为止,集成光学在0.8‐1.55μm的近红外光波段工作的各种材料和器件已然引领光通信高新技术走上了产业化,成为当下信息产业的重要支柱。It is an inevitable trend of historical development that photons replace electrons as the carrier of information. The research of modern integrated optics mainly focuses on the near-infrared communication band. With practical application, the wavelength band of integrated optics research has gradually shifted from the first-generation 0.85μm to the second-generation 1.31μm and to the most mainstream 1.555μm wavelength. Various optical devices, including optical waveguides, optical couplers, optical switches, optical modulators, filters, analog-to-digital converters, and detectors, have been extensively studied and fabricated successfully. Integrated optics has become a research hotspot all over the world and is developing rapidly, which is of great significance to optical fiber communication, optical signal processing, and photoelectric hybrid integration with integrated circuits. So far, various materials and devices of integrated optics working in the near-infrared light band of 0.8-1.55 μm have led the industrialization of high-tech optical communication and become an important pillar of the current information industry.
中红外波段(2‐20μm)是太阳辐射光中一个重要的波段,其在各个科技领域有着十分重要的应用,包括传感、环境监测、生物医学应用、热成像、军事应用等等。虽然中红外光在各个领域都有巨大的应用潜力,近红外波段的研究也吸引了足够多的关注度,然而集成光子学在中红外波段进展却非常缓慢,多年来一直面临着巨大的困难和挑战,远远不及近红外通信波段的研究发展。首先是光源的问题,早期一个连续的中红外光源通常体积非常大,而且价格非常昂贵,有些还需要低温冷却。其次是传输的问题,受限于光源的困难,传输中红外信号的波导、光纤的研究也是困难重重。The mid-infrared band (2‐20μm) is an important band in solar radiation, and it has very important applications in various scientific and technological fields, including sensing, environmental monitoring, biomedical applications, thermal imaging, military applications, etc. Although the mid-infrared light has great application potential in various fields, and the research in the near-infrared band has attracted enough attention, the progress of integrated photonics in the mid-infrared band has been very slow, and it has been facing great difficulties and difficulties for many years. The challenges are far less than the research and development of the near-infrared communication band. The first is the problem of the light source. In the early days, a continuous mid-infrared light source was usually very large in size and very expensive, and some of them required cryogenic cooling. The second is the problem of transmission, limited by the difficulty of the light source, the research on waveguides and optical fibers for transmitting mid-infrared signals is also full of difficulties.
近年来,随着量子级联激光器的发展,中红外光源的问题得到一定程度上的解决。据文献报导,许多课题组已经研制出了基于不同中红外波长的量子级联激光器,这些激光器不仅解决了之前成本过高、体积大的问题,而且波长范围很大,最长可以到9μm(见文献MuJ.Soref,etal.Silicon‐on‐nitridestructuresformid‐infraredgap‐plasmonwaveguiding[J].AppliedPhysicsLetters,2014,104(3)),同时已经可以进行商业生产。同样,中红外光纤也已经得到发展,以美国的IRphotonics公司为例,他们生产的氟化物光纤如ZBLAN(ZrF4‐BaF2‐LaF3‐AlF3‐NaF)等重金属氟化物光纤具有很稳定的中红外光波段的传输特性,在300nm到4500nm波段内的传输损耗可以做到小于0.2dB/cm。此外,IRphotonics公司还可以提供中红外单模光纤、中红外多模光纤、中红外大功率光纤、中红外掺杂光纤等。因此,中红外激光器和光纤的发展推动了中红外集成光电子学的研究,使得中红外波段的研究也有可能像近红外波段一样得到快速的发展。但目前总体来说,基于中红外的光学器件包括对中红外光调制器的研究还比较滞后,特别是基于1.55~3μm近中红外的光学信号的集成光子器件调制和解调的难题。In recent years, with the development of quantum cascade lasers, the problem of mid-infrared light sources has been solved to a certain extent. According to literature reports, many research groups have developed quantum cascade lasers based on different mid-infrared wavelengths. These lasers not only solve the previous problems of high cost and large volume, but also have a wide range of wavelengths, up to 9 μm (see Literature MuJ.Soref, et al.Silicon‐on‐nitridestructuresformid‐infraredgap‐plasmonwaveguiding[J].AppliedPhysicsLetters, 2014, 104(3)), and commercial production is already available. Similarly, mid-infrared optical fibers have also been developed. Taking IRphotonics in the United States as an example, their heavy metal fluoride optical fibers such as ZBLAN (ZrF4‐BaF2‐LaF3‐AlF3‐NaF) have very stable mid-infrared light bands. Excellent transmission characteristics, the transmission loss in the 300nm to 4500nm band can be less than 0.2dB/cm. In addition, IRphotonics can also provide mid-infrared single-mode fiber, mid-infrared multimode fiber, mid-infrared high-power fiber, mid-infrared doped fiber, etc. Therefore, the development of mid-infrared lasers and optical fibers has promoted the research of mid-infrared integrated optoelectronics, making it possible for the research in the mid-infrared band to develop as rapidly as the near-infrared band. But generally speaking, research on mid-infrared optical devices, including mid-infrared optical modulators, is still lagging behind, especially the modulation and demodulation of integrated photonic devices based on 1.55-3 μm near-mid-infrared optical signals.
发明内容Contents of the invention
本发明针对上述不足之处提供了一种基于石墨烯‐硫系玻璃平面波导型近中红外光调制器,解决基于1.55~3μm近中红外的光学信号的集成光子器件调制和解调的难题。The present invention provides a graphene-chalcogenide glass planar waveguide-based near-mid-infrared optical modulator to solve the problem of modulation and demodulation of integrated photonic devices based on near-mid-infrared optical signals of 1.55-3 μm.
为了实现上述目的,本发明采用的技术方案为:In order to achieve the above object, the technical scheme adopted in the present invention is:
一种基于石墨烯‐硫系玻璃平面波导型近中红外光调制器,其特征在于:包括基底层、设置在基底层上的脊形光波导层、第一支柱和第二支柱,第一支柱和第二支柱分别设置在脊形光波导层的两侧,在脊形光波导层上设置有第一石墨烯层和第二石墨烯层,第一石墨烯层延伸至第一支柱的上表面,第二石墨烯层延伸至第二支柱的上表面,在脊形光波导层与第一石墨烯层和第二石墨烯层、第一石墨烯层与第二石墨烯层、第一石墨烯层与第一支柱、第二石墨烯层与第二支柱之间分别设置有隔离介质层,第一支柱上的第一石墨烯层上设置有第一电极,第二支柱上的第二石墨烯层上设置有第二电极。A near-mid-infrared optical modulator based on graphene-chalcogenide glass planar waveguide, characterized in that it includes a base layer, a ridge-shaped optical waveguide layer arranged on the base layer, a first pillar and a second pillar, and the first pillar The first graphene layer and the second graphene layer are arranged on the ridge-shaped optical waveguide layer, and the first graphene layer extends to the upper surface of the first pillar , the second graphene layer extends to the upper surface of the second pillar, between the ridge-shaped optical waveguide layer and the first graphene layer and the second graphene layer, the first graphene layer and the second graphene layer, the first graphene layer layer and the first pillar, the second graphene layer and the second pillar are respectively provided with an isolation dielectric layer, the first graphene layer on the first pillar is provided with a first electrode, and the second graphene layer on the second pillar A second electrode is disposed on the layer.
进一步,所述脊形光波导层分为第一脊形光波导层和设置在第一脊形光波导层上的第二脊形光波导层,所述第一石墨烯层、第二石墨烯层从下到上依次设置在第一脊形光波导层与第二脊形光波导层之间;所述第一脊形光波导层与第一石墨烯层、第一石墨烯层与第一支柱之间的隔离介质层为第一隔离介质层;所述第一石墨烯层与第二石墨烯层、第二石墨烯层与第二支柱之间的隔离介质层为第二隔离介质层;所述第二石墨烯层与第二脊形光波导层之间的隔离介质层为第三隔离介质层。Further, the ridge optical waveguide layer is divided into a first ridge optical waveguide layer and a second ridge optical waveguide layer arranged on the first ridge optical waveguide layer, the first graphene layer, the second graphene The layers are sequentially arranged between the first ridge optical waveguide layer and the second ridge optical waveguide layer from bottom to top; the first ridge optical waveguide layer and the first graphene layer, the first graphene layer and the first The isolation dielectric layer between the pillars is the first isolation dielectric layer; the isolation dielectric layer between the first graphene layer and the second graphene layer, the second graphene layer and the second pillar is the second isolation dielectric layer; The isolation dielectric layer between the second graphene layer and the second ridge optical waveguide layer is a third isolation dielectric layer.
进一步,所述第一石墨烯层、第二石墨烯层从下到上依次设置在脊形光波导层的上表面,所述脊形光波导层与第一石墨烯层、第一石墨烯层与第一支柱之间的隔离介质层为第一隔离介质层;所述第一石墨烯层与第二石墨烯层、第二石墨烯层与第二支柱之间的隔离介质层为第二隔离介质层。Further, the first graphene layer and the second graphene layer are sequentially arranged on the upper surface of the ridge-shaped optical waveguide layer from bottom to top, and the ridge-shaped optical waveguide layer is connected with the first graphene layer and the first graphene layer. The isolation dielectric layer between the first pillar is the first isolation dielectric layer; the isolation dielectric layer between the first graphene layer and the second graphene layer, the second graphene layer and the second pillar is the second isolation medium layer.
进一步,所述基底层的材料为二氧化硅。Further, the material of the base layer is silicon dioxide.
进一步,所述脊形光波导层的材料为硫系玻璃材料。Further, the material of the ridge-shaped optical waveguide layer is a chalcogenide glass material.
进一步,所述硫系玻璃材料是由除O外的第VI族元素作为阴离子与其他金属和非金属元素形成的化合物玻璃,可以是Ge23Sb7S70、As2Se3、As2S3材料之一。Further, the chalcogenide glass material is a compound glass formed of Group VI elements other than O as anions and other metal and non-metal elements, which may be Ge 23 Sb 7 S 70 , As 2 Se 3 , As 2 S 3 one of the materials.
进一步,所述第一支柱、第二支柱和基底层形成凹槽结构,脊形光波导层设置在凹槽结构内。Further, the first pillar, the second pillar and the base layer form a groove structure, and the ridge-shaped optical waveguide layer is arranged in the groove structure.
进一步,所述隔离介质层的厚度为5~60nm。Further, the thickness of the isolation dielectric layer is 5-60 nm.
进一步,所述隔离介质层是硅氧化物、硅氮氧化物、硼氮化物等绝缘材料之一。Further, the isolation dielectric layer is one of insulating materials such as silicon oxide, silicon oxynitride, and boron nitride.
进一步,所述第一电极和第二电极由两层材料构成,第一层为与第一石墨烯层和第二石墨烯层相接触的材料,第二层为设置在第一层上的材料,第一层的材料为钛、镍、钴、钯中的一种,第二层的材料为金、银、铂、铜材料中的一种。Further, the first electrode and the second electrode are composed of two layers of materials, the first layer is a material in contact with the first graphene layer and the second graphene layer, and the second layer is a material arranged on the first layer The material of the first layer is one of titanium, nickel, cobalt and palladium, and the material of the second layer is one of gold, silver, platinum and copper.
与现有技术相比,本发明的优点在于:Compared with the prior art, the present invention has the advantages of:
一、本发明中红外光调制器将脊形光波导层和支柱之间的石墨烯悬空设置,可以提高石墨烯载流子迁移率,可提升器件的操作速率,调制速率可高达122GHz/bit;1. The mid-infrared light modulator of the present invention places the graphene between the ridge-shaped optical waveguide layer and the pillars in the air, which can improve the mobility of graphene carriers, increase the operating speed of the device, and the modulation rate can be as high as 122GHz/bit;
二、本发明中红外光调制器中的脊形光波导层材料为硫系玻璃材料,对中红外光谱具有较宽且平坦的透过率,可实现对1.55~3.0μm中红外光波信号进行调制;2. The ridge-shaped optical waveguide layer material in the mid-infrared light modulator of the present invention is a chalcogenide glass material, which has a wide and flat transmittance to the mid-infrared spectrum, and can realize modulation of 1.55-3.0 μm mid-infrared light wave signals ;
三、本发明中红外光调制器具有尺寸小、调制速率高、消光比高,制备工艺可与传统的CMOS工艺相兼容,易于集成。3. The mid-infrared light modulator of the present invention has small size, high modulation rate and high extinction ratio, and its preparation process is compatible with traditional CMOS process, and it is easy to integrate.
附图说明Description of drawings
图1是本发明实施例中近中红外光调制器将石墨烯嵌入在脊形光波导层中间的横截面结构示意图;Fig. 1 is a schematic diagram of a cross-sectional structure of a near-mid-infrared light modulator embedding graphene in the middle of a ridge-shaped optical waveguide layer in an embodiment of the present invention;
图2是本发明实施例中近中红外光调制器将石墨烯放置在脊形光波导层上表面的横截面结构示意图;Fig. 2 is a cross-sectional schematic diagram of placing graphene on the upper surface of a ridge-shaped optical waveguide layer in a near-mid-infrared light modulator in an embodiment of the present invention;
图3是本发明实施例中近中红外光调制器在入射光波长分别为1.55μm、2μm、2.5μm、3μm时,脊形光波导层中TM模的光吸收系数随着石墨烯化学势能的变化曲线图;Fig. 3 shows that the light absorption coefficient of the TM mode in the ridge optical waveguide layer varies with the graphene chemical potential energy when the incident light wavelengths are 1.55 μm, 2 μm, 2.5 μm, and 3 μm in the near-middle infrared light modulator in the embodiment of the present invention. change curve;
图4是本发明实施例中近中红外光调制器在入射光波长分别为1.55μm、2μm、2.5μm、3μm时,脊形光波导层中TM模分别在“ON”和“OFF”状态时随着传输距离的归一化功率变化曲线图。Fig. 4 shows the TM modes in the ridge optical waveguide layer in the "ON" and "OFF" states when the incident light wavelengths of the near-mid-infrared light modulator in the embodiment of the present invention are 1.55 μm, 2 μm, 2.5 μm, and 3 μm respectively Plot of normalized power variation with transmission distance.
图中:1、基底层,2、脊形光波导层,21、第一脊形光波导层,22、第二脊形光波导层,31、第一支柱,32、第二支柱,41、第一石墨烯层,42、第二石墨烯层,51、第一隔离介质层,52、第二隔离介质层,51、第三隔离介质层,61、第一电极,62、第二电极。In the figure: 1. base layer, 2. ridge-shaped optical waveguide layer, 21. first ridge-shaped optical waveguide layer, 22. second ridge-shaped optical waveguide layer, 31. first pillar, 32. second pillar, 41, First graphene layer, 42, second graphene layer, 51, first isolation dielectric layer, 52, second isolation dielectric layer, 51, third isolation dielectric layer, 61, first electrode, 62, second electrode.
具体实施方式detailed description
下面结合附图和实施例对本发明作进一步的说明。The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
一种基于石墨烯‐硫系玻璃平面波导型近中红外光调制器,包括基底层、设置在基底层上的脊形光波导层、第一支柱和第二支柱,第一支柱和第二支柱分别设置在脊形光波导层的两侧,在脊形光波导层上设置有第一石墨烯层和第二石墨烯层,第一石墨烯层延伸至第一支柱的上表面,第二石墨烯层延伸至第二支柱的上表面,在脊形光波导层与第一石墨烯层和第二石墨烯层、第一石墨烯层与第二石墨烯层、第一石墨烯层与第一支柱、第二石墨烯层与第二支柱之间分别设置有隔离介质层,第一支柱上的第一石墨烯层上设置有第一电极,第二支柱上的第二石墨烯层上设置有第二电极。A near-mid-infrared optical modulator based on graphene-chalcogenide glass planar waveguide, including a base layer, a ridge-shaped optical waveguide layer disposed on the base layer, a first pillar and a second pillar, and the first pillar and the second pillar They are respectively arranged on both sides of the ridge-shaped optical waveguide layer, and a first graphene layer and a second graphene layer are arranged on the ridge-shaped optical waveguide layer, the first graphene layer extends to the upper surface of the first pillar, and the second graphite The ene layer extends to the upper surface of the second pillar, between the ridge optical waveguide layer and the first graphene layer and the second graphene layer, the first graphene layer and the second graphene layer, the first graphene layer and the first graphene layer An isolation dielectric layer is respectively arranged between the pillar, the second graphene layer and the second pillar, the first electrode is arranged on the first graphene layer on the first pillar, and the second graphene layer on the second pillar is provided with second electrode.
作为优选,所述基底层的材料为二氧化硅。Preferably, the material of the base layer is silicon dioxide.
作为优选,所述脊形光波导层的材料为硫系玻璃材料。Preferably, the material of the ridge optical waveguide layer is a chalcogenide glass material.
作为优选,所述硫系玻璃材料是由除O外的第VI族元素作为阴离子与其他金属和非金属元素形成的化合物玻璃,可以是Ge23Sb7S70、As2Se3、As2S3材料之一。Preferably, the chalcogenide glass material is a compound glass formed of Group VI elements other than O as anions and other metal and non-metal elements, which may be Ge 23 Sb 7 S 70 , As 2 Se 3 , As 2 S One of 3 materials.
作为优选,所述第一支柱、第二支柱和基底层形成凹槽结构,脊形光波导层设置在凹槽结构内。Preferably, the first pillar, the second pillar and the base layer form a groove structure, and the ridge-shaped optical waveguide layer is arranged in the groove structure.
作为优选,所述隔离介质层的厚度为5~60nm。Preferably, the thickness of the isolation dielectric layer is 5-60 nm.
作为优选,所述隔离介质层是硅氧化物、硅氮氧化物、硼氮化物等绝缘材料之一。Preferably, the isolation dielectric layer is one of insulating materials such as silicon oxide, silicon oxynitride, and boron nitride.
作为优选,所述第一电极和第二电极由两层材料构成,第一层为与第一石墨烯层和第二石墨烯层相接触的材料,第二层为设置在第一层上的材料,第一层的材料为与石墨烯材料的附着性较好的钛、镍、钴、钯中的一种,第二层的材料为金、银、铂、铜材料中的一种,作为引出电极。Preferably, the first electrode and the second electrode are composed of two layers of materials, the first layer is a material in contact with the first graphene layer and the second graphene layer, and the second layer is a material arranged on the first layer Material, the material of the first layer is a kind of in titanium, nickel, cobalt, palladium with good adhesion with graphene material, the material of the second layer is a kind of in gold, silver, platinum, copper material, as Extract the electrodes.
作为优选,第一石墨烯层和第二石墨烯层在脊形光波导层中完全重叠设置。Preferably, the first graphene layer and the second graphene layer are completely overlapped in the ridge optical waveguide layer.
本发明的光调制器工作原理为:光调制器的脊形光波导材料采用硫系玻璃材料,对1.55~3μm近中红外光谱具有较低的波导损耗,石墨烯材料是一个对宽光谱(包括1.55~3μm近中红外光谱)吸收的二维材料,并且其光学响应特性可由外加偏置电压进行调控。将两层石墨烯置于脊形光波导层的上表面或嵌于光波导层的中间并分别向脊形光波导层的两侧延伸出来至第一支柱和第二支柱上分别连接第一电极和第二电极,通过外加偏置电压调制石墨烯的费米能级从而调控其光学响应特性,改变脊形光波导的复有效折射率,复有效折射率的实部对应光相位的改变,复有效折射率的虚部对应光的吸收。不同的入射波长,在不同的特定偏置电压点对应的脊形光波导的复有效折射率的虚部值会比较大,即脊形光波导的光损耗会较大,光信号几乎无法通过,可作为“OFF”状态;而在其他偏置电压点,该脊形光波导层的光损耗会较小,光信号几乎可以无损耗的通过,可作为“ON”状态,这样也就实现了对1.55~3μm近中红外光谱信号的调制功能。由于石墨烯材料具有超快的载流子迁移率,再加上将脊形光波导层和支柱之间的石墨烯悬空设置可提高石墨烯载流子迁移率,可进一步提高器件的操作速率,本发明调制器制备工艺与传统的SOICMOS工艺兼容,具有易于集成的优点。The working principle of the optical modulator of the present invention is as follows: the ridge optical waveguide material of the optical modulator adopts chalcogenide glass material, which has lower waveguide loss for the near-mid infrared spectrum of 1.55-3 μm, and the graphene material is a material for wide spectrum (including 1.55 ~ 3μm near-mid-infrared spectrum) absorbing two-dimensional material, and its optical response characteristics can be adjusted by external bias voltage. Place two layers of graphene on the upper surface of the ridge-shaped optical waveguide layer or embedded in the middle of the optical waveguide layer and extend to both sides of the ridge-shaped optical waveguide layer to connect the first electrodes to the first pillar and the second pillar respectively and the second electrode, by applying a bias voltage to modulate the Fermi level of graphene to adjust its optical response characteristics, change the complex effective refractive index of the ridge optical waveguide, the real part of the complex effective refractive index corresponds to the change of the optical phase, and the complex The imaginary part of the effective refractive index corresponds to the absorption of light. For different incident wavelengths, the imaginary part of the complex effective refractive index of the ridge optical waveguide corresponding to different specific bias voltage points will be relatively large, that is, the optical loss of the ridge optical waveguide will be large, and the optical signal can hardly pass through. It can be used as the "OFF" state; at other bias voltage points, the optical loss of the ridge-shaped optical waveguide layer will be small, and the optical signal can pass through almost without loss, and it can be used as the "ON" state. 1.55 ~ 3μm near-mid-infrared spectral signal modulation function. Since the graphene material has ultra-fast carrier mobility, and the suspension of graphene between the ridge-shaped optical waveguide layer and the pillar can improve the graphene carrier mobility, the operating rate of the device can be further improved, The preparation process of the modulator of the present invention is compatible with the traditional SOICMOS process and has the advantage of easy integration.
实施例1Example 1
基于石墨烯‐硫系玻璃平面波导型近中红外光调制器三维结构示意图如图1所示;采用1.55~3μm近中红外光波长,包括基底层1、设置在基底层1上的脊形光波导层2、第一支柱31和第二支柱32,第一支柱31和第二支柱32设置在脊形光波导层2的左右两侧,所述脊形光波导层2分为第一脊形光波导层21和设置在第一脊形光波导层21上的第二脊形光波导层22,所述第一石墨烯层41、第二石墨烯层42从下到上依次设置在第一脊形光波导层21与第二脊形光波导层22之间;第一石墨烯层41延伸至第一支柱31的上表面,第二石墨烯层42延伸至第二支柱32的上表面,所述第一脊形光波导层21与第一石墨烯层41、第一石墨烯层41与第一支柱31之间设置有第一隔离介质层51;所述第一石墨烯层41与第二石墨烯层42、第二石墨烯层42与第二支柱32之间设置有第二隔离介质层52;所述第二石墨烯层42与第二脊形光波导层22之间设置有第三隔离介质层53,第一支柱31上的第一石墨烯层41上设置有第一电极61,第二支柱32上的第二石墨烯层42上设置有第二电极62。所述基底层1的材料为SiO2;脊形光波导层2的宽度和高度分别为0.6μm和0.4μm,采用As2S3材料;第一隔离介质层51、第二隔离介质层52和第三隔离介质层53的材料为氮化硼hBN;第二隔离介质层52的厚度为15nm;第一电极61和第二电极62材料是由在Pa(钯材料)上镀一层Au(金材料)构成。The three-dimensional structural diagram of the near-mid-infrared light modulator based on graphene-chalcogenide glass planar waveguide is shown in Figure 1; the near-mid-infrared light wavelength is 1.55-3 μm, including the base layer 1 and the ridge light set on the base layer 1 The waveguide layer 2, the first pillar 31 and the second pillar 32, the first pillar 31 and the second pillar 32 are arranged on the left and right sides of the ridge-shaped optical waveguide layer 2, and the ridge-shaped optical waveguide layer 2 is divided into first ridge-shaped The optical waveguide layer 21 and the second ridge optical waveguide layer 22 arranged on the first ridge optical waveguide layer 21, the first graphene layer 41 and the second graphene layer 42 are sequentially arranged on the first ridge optical waveguide layer 21 from bottom to top. Between the ridge-shaped optical waveguide layer 21 and the second ridge-shaped optical waveguide layer 22; the first graphene layer 41 extends to the upper surface of the first pillar 31, and the second graphene layer 42 extends to the upper surface of the second pillar 32, A first isolation dielectric layer 51 is arranged between the first ridge optical waveguide layer 21 and the first graphene layer 41, the first graphene layer 41 and the first pillar 31; the first graphene layer 41 and the first A second isolation medium layer 52 is arranged between the two graphene layers 42, the second graphene layer 42 and the second pillar 32; Three isolating dielectric layers 53 , the first electrode 61 is disposed on the first graphene layer 41 on the first pillar 31 , and the second electrode 62 is disposed on the second graphene layer 42 on the second pillar 32 . The material of the base layer 1 is SiO 2 ; the width and height of the ridge optical waveguide layer 2 are 0.6 μm and 0.4 μm respectively, and the material As 2 S 3 is used; the first isolation dielectric layer 51, the second isolation dielectric layer 52 and The material of the third isolation dielectric layer 53 is boron nitride hBN; the thickness of the second isolation dielectric layer 52 is 15nm; material) composition.
实施例2Example 2
基于石墨烯‐硫系玻璃平面波导型近中红外光调制器三维结构示意图如图2所示;采用1.55~3μm近中红外光波长,包括基底层1、设置在基底层1上的脊形光波导层2、第一支柱31和第二支柱32,第一支柱31和第二支柱32设置在脊形光波导层2的左右两侧,所述第一石墨烯层41、第二石墨烯层42从下到上依次设置在脊形光波导层2的上表面;第一石墨烯层41延伸至第一支柱31的上表面,第二石墨烯层42延伸至第二支柱32的上表面,所述脊形光波导层2与第一石墨烯层41、第一石墨烯层41与第一支柱31之间设置有第一隔离介质层51;所述第一石墨烯层41与第二石墨烯层42、第二石墨烯层42与第二支柱32之间设置有第二隔离介质层52;第一支柱31上的第一石墨烯层41上设置有第一电极61,第二支柱32上的第二石墨烯层42上设置有第二电极62。所述基底层1的材料为SiO2;脊形光波导层2的宽度和高度分别为0.6μm和0.4μm,采用As2S3材料;第一隔离介质层51和第二隔离介质层52的材料为氮化硼hBN;第二隔离介质层52的厚度为15nm;第一电极61和第二电极62材料是由在Pa(钯材料)上镀一层Au(金材料)构成。The three-dimensional structural diagram of the near-mid-infrared light modulator based on graphene-chalcogenide glass planar waveguide is shown in Figure 2; the near-mid-infrared light wavelength is 1.55-3 μm, including the base layer 1 and the ridge light set on the base layer 1 The waveguide layer 2, the first pillar 31 and the second pillar 32, the first pillar 31 and the second pillar 32 are arranged on the left and right sides of the ridge optical waveguide layer 2, the first graphene layer 41, the second graphene layer 42 are sequentially arranged on the upper surface of the ridge-shaped optical waveguide layer 2 from bottom to top; the first graphene layer 41 extends to the upper surface of the first pillar 31, and the second graphene layer 42 extends to the upper surface of the second pillar 32, A first isolation dielectric layer 51 is arranged between the ridge optical waveguide layer 2 and the first graphene layer 41, the first graphene layer 41 and the first pillar 31; the first graphene layer 41 and the second graphite A second insulating dielectric layer 52 is arranged between the ene layer 42, the second graphene layer 42 and the second pillar 32; a first electrode 61 is arranged on the first graphene layer 41 on the first pillar 31, and the second pillar 32 A second electrode 62 is disposed on the second graphene layer 42 on the top. The material of the base layer 1 is SiO 2 ; the width and height of the ridge optical waveguide layer 2 are 0.6 μm and 0.4 μm respectively, and the material As 2 S 3 is used; the first isolation dielectric layer 51 and the second isolation dielectric layer 52 are The material is boron nitride hBN; the thickness of the second insulating dielectric layer 52 is 15nm; the material of the first electrode 61 and the second electrode 62 is composed of a layer of Au (gold material) plated on Pa (palladium material).
图3是本发明实施例近中红外光调制器在入射光波长分别为1.55μm、2μm、2.5μm、3μm时,脊形光波导层中TM模的光吸收系数随着石墨烯化学势能的变化曲线图。从图中可见,不同入射光波长的吸收峰值对应着不同的偏置电压点,1.55μm、2μm、2.5μm、3μm入射波长对应的光吸收系数(负有效折射率的虚部)峰值分别为0.06467、0.01652、0.003623、0.001565,相对应的石墨烯化学势能分别为0.51eV、0.39eV、0.31eV、0.25eV,可作为相应波长的“OFF”状态。在石墨烯化学势能为0.7eV时,本发明光调制器对1.55~3μm入射光的吸收系数均很小,在10‐5量级,通过调制器时光衰减较小,可作为“ON”状态。Fig. 3 shows the variation of the optical absorption coefficient of the TM mode in the ridge optical waveguide layer with the chemical potential energy of graphene when the incident light wavelengths are 1.55 μm, 2 μm, 2.5 μm, and 3 μm for the near-mid-infrared light modulator according to the embodiment of the present invention. Graph. It can be seen from the figure that the absorption peaks of different incident light wavelengths correspond to different bias voltage points, and the peak values of the light absorption coefficient (the imaginary part of the negative effective refractive index) corresponding to the incident wavelengths of 1.55 μm, 2 μm, 2.5 μm, and 3 μm are 0.06467 respectively . When the graphene chemical potential energy is 0.7eV, the optical modulator of the present invention has a very small absorption coefficient for incident light of 1.55-3 μm, on the order of 10-5 , and the light attenuation is small when passing through the modulator, which can be regarded as the "ON" state.
图4是本发明实施例近中红外光调制器在入射光波长分别为1.55μm、2μm、2.5μm、3μm时,脊形光波导层中TM模分别在“ON”和“OFF”状态时随着传输距离的归一化功率变化曲线图。从图中可见,在“OFF”状态时,1.55μm、2μm入射光波长在经过100μm的传输距离时就衰减至非常小的值,对2.5μm、3μm入射光波长则需要更长的传输长度才能达到较理想的光衰减。计算结果显示,在入射光波长分别为1.55μm、2μm、2.5μm、3μm时,400μm长度的石墨烯‐硫系玻璃光调制器可实现的消光比分别为:>30dB、>30dB、26dB、11.3dB。Fig. 4 shows how the TM modes in the ridge optical waveguide layer are in the "ON" and "OFF" states respectively when the incident light wavelengths are 1.55 μm, 2 μm, 2.5 μm, and 3 μm in the near-mid-infrared light modulator according to the embodiment of the present invention. The graph of normalized power variation with transmission distance. It can be seen from the figure that in the "OFF" state, the incident light wavelengths of 1.55 μm and 2 μm attenuate to a very small value after passing through a transmission distance of 100 μm, and the incident light wavelengths of 2.5 μm and 3 μm require a longer transmission length to achieve To achieve a more ideal light attenuation. The calculation results show that when the incident light wavelengths are 1.55 μm, 2 μm, 2.5 μm, and 3 μm, the achievable extinction ratios of the graphene-chalcogenide glass optical modulator with a length of 400 μm are: >30dB, >30dB, 26dB, 11.3 dB.
本发明的光调制器的调制速率主要是受限于RC常数,可表达为f3dB=1/2πRC,由于石墨烯本身具有超高的载流子迁移,再加上脊形光波导层和支柱之间的石墨烯悬空设置可进一步提高石墨烯的载流子迁移率,因而本发明光调制器的RC常数是一个非常小的值,约为1.3×10‐12,计算结果显示本发明光调制器的调制速率可高达122GHz/bit。The modulation rate of the optical modulator of the present invention is mainly limited by the RC constant, which can be expressed as f 3dB = 1/2πRC, because graphene itself has ultra-high carrier mobility, coupled with the ridge-shaped optical waveguide layer and pillars The graphene suspended between them can further improve the carrier mobility of graphene, so the RC constant of the light modulator of the present invention is a very small value, about 1.3×10 -12 , the calculation results show that the light modulation of the present invention The modulation rate of the device can be as high as 122GHz/bit.
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CN115185109A (en) * | 2022-07-06 | 2022-10-14 | 浙江大学 | A mid-infrared phase shifter |
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