CN105693105A - Thinning method for display panel - Google Patents
Thinning method for display panel Download PDFInfo
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- CN105693105A CN105693105A CN201610050937.9A CN201610050937A CN105693105A CN 105693105 A CN105693105 A CN 105693105A CN 201610050937 A CN201610050937 A CN 201610050937A CN 105693105 A CN105693105 A CN 105693105A
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- display floater
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- 238000000034 method Methods 0.000 title claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 146
- 230000007547 defect Effects 0.000 claims abstract description 68
- 239000000463 material Substances 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 10
- 230000008439 repair process Effects 0.000 claims description 17
- 238000001182 laser chemical vapour deposition Methods 0.000 claims description 9
- 238000001514 detection method Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 5
- 239000011368 organic material Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 abstract description 3
- 238000005530 etching Methods 0.000 description 26
- 230000008569 process Effects 0.000 description 12
- 239000011521 glass Substances 0.000 description 8
- 239000004973 liquid crystal related substance Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229940099259 vaseline Drugs 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/112—Deposition methods from solutions or suspensions by spraying
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The invention provides a thinning method for a display panel. The method comprises the following steps: providing a display panel, wherein the display panel comprises at least one substrate with a first thickness; placing the display panel on a repairing device; coating or depositing a repairing material in a surface defect of the at least one substrate by using the repairing device; thinning the at least one substrate of the display panel in order that the at least one substrate has a second thickness being smaller than the first thickness.
Description
Technical field
The present invention relates to the thinning method of a kind of display floater, particularly relate to a kind of by first the substrate surface of display floater being carried out pretreatment with the defect on repairing substrate surface, carry out the thinning method of the display floater of thinning technique afterwards again。
Background technology
In recent years, along with development and progressive and in response to market the demand of science and technology, the manufacturing process of display floater is except developing towards large-sized direction, and also the direction simultaneously towards lightweight and slimming is developed。Especially, again to adopt low temperature polycrystalline silicon (LowTemperaturePoly-Silicon, LTPS) being most widely used as display floater material in numerous undersized electronic installations。The Chief affecting final finished thickness in a display device is the substrate adopted in display floater。Therefore, in the manufacturing technology of display device, by the substrate attenuation in display floater can be obtained more frivolous display device。
Specifically, in the display floater manufacture process of conventional display device, when the two substrates up and down of display floater being carried out thinning technique after the step completing liquid crystal and becoming box。Described thinning technique comprises the method realization adopting physical property or chemical, and wherein chemical thinning technique is to utilize Fluohydric acid. (HF) solution to be etched by the substrate of display floater。
But, owing to Wet-type etching is a kind of isotropic etching (isotropicetching), say, that etching solution not only can carry out longitudinal etching on substrate, and has horizontal etch effect。Therefore, if the substrate surface of display floater has the little defect such as slight crack or pothole, when carrying out thinning technique by hydrofluoric acid solution, hydrofluoric acid solution can carry out isotropic etching in the position of substrate surface defects so that undersized slight crack or pothole can become large-sized groove after by the thinning technique of substrate originally。For example, refer to shown in Fig. 1, in its display prior art, the operating process schematic diagram of the thinning method of display floater 10, comprises step S11 to S13。Described display floater 10 comprises first substrate 11, second substrate 13 and the liquid crystal layer 12 being arranged between described first substrate 11 and described second substrate 13。As shown in step S11, when described first substrate 11 and the described second substrate 13 of display floater 10 described before carrying out thinning technique have one first thickness t1, and there is on the surface of described first substrate 11 the defect D of a narrow dimension。Then, as shown in step S12, when using HF solution, as etching solution, described display floater 10 is carried out Wet-type etching, etching solution can carry out isotropic etching on the surface of the described first substrate 11 of described display floater 10 and described second substrate 13, especially also the inner surface of described defect D can be carried out isotropic etching。Finally, as shown in step S13, after carrying out thinning technique, the described first substrate 11 of described display floater 10 and described second substrate 13 have one less than the second thickness t2 of described first thickness t1。Further, on described first substrate 11, original described defect D for narrow dimension can become the defect D ' of wide size, causes that described display floater 10 does not meet the standard of Product checking。
Therefore, for avoiding producing above-mentioned technical problem, publication number is the thining method that the Chinese patent application of 103253868A discloses a kind of LCDs, it is by before carrying out chemical reduction by glass substrate with HF solution, first glass substrate is soaked in a thinning pretreatment fluid of LCDs, and then the problem preventing from amplifying at the crackle carried out in chemical reduction process on glass substrate with HF solution。But, said method must configure the substantial amounts of thinning pretreatment fluid of described LCDs and just can be soaked in the inner by glass substrate, and also must expend effect that glass substrate is soaked in man-hour the fine crack that just can reach filling glass surface in the thinning pretreatment fluid of described LCDs of at least 0.5 to 2 hour。Therefore, said method exists that production cost is high and the problem of production hour length。
In view of this, it is necessary to provide the thinning method of a kind of display floater, to solve the problem existing for prior art。
Summary of the invention
For solving above-mentioned technical problem, it is an object of the invention to provide the thinning method of a kind of display floater, by first the substrate surface of display floater being carried out pretreatment with the defect on repairing substrate surface, described display floater is carried out thinning technique afterwards again, and then avoids the problem that described display floater scraps because of bad order。
For reaching above-mentioned purpose, the present invention provides the thinning method of a kind of display floater, comprises: provide a display floater, described display floater to comprise at least one substrate with one first thickness；Described display floater is placed on a prosthetic device；Described prosthetic device is used to be coated with a repair materials in a surface defect of described at least one substrate；And described at least one substrate of described display floater is carried out thinning technique so that described at least one substrate has one less than the second thickness of described first thickness。
In the middle of a present invention preferred embodiment therein, before described display floater is placed on a prosthetic device, also comprise: adopt the described surface defect of described at least one substrate of a detecting device described display floater of detecting, and record described surface defect coordinate position on described at least one substrate。
In the middle of a present invention preferred embodiment therein, described prosthetic device is coated with described repair materials according to described coordinate position in the described surface defect of described at least one substrate。
In the middle of a present invention preferred embodiment therein, described detecting device comprises automatization's optical detection apparatus。
In the middle of a present invention preferred embodiment therein, described prosthetic device comprises an ink jet type apparatus for coating, and described ink jet type apparatus for coating fills up an organic material according to described coordinate position in the described surface defect of described at least one substrate。
The present invention also provides for the thinning method of a kind of display floater, comprises: provide a display floater, described display floater to comprise at least one substrate with one first thickness；Described display floater is placed on a prosthetic device；Described prosthetic device is used to deposit a repair materials in a surface defect of described at least one substrate；And described at least one substrate of described display floater is carried out thinning technique so that described at least one substrate has one less than the second thickness of described first thickness。
In the middle of a present invention preferred embodiment therein, described prosthetic device comprises a laser chemical vapor deposition device, and described laser chemical vapor deposition device deposits a rete according to described coordinate position in the described surface defect of described at least one substrate。
Accompanying drawing explanation
Fig. 1 shows the operating process schematic diagram of the thinning method of display floater in prior art。
Fig. 2 shows the operating process schematic diagram of the thinning method of display floater according to the first advantageous embodiment of the invention。
Fig. 3 shows the operating process schematic diagram of the thinning method of display floater according to the second, preferred embodiment of the present invention。
Detailed description of the invention
In order to the above-mentioned and other purpose of the present invention, feature, advantage can be become apparent, hereafter especially exemplified by the preferred embodiment of the present invention, and accompanying drawing will be coordinated, be described in detail below。
Refer to Fig. 2, the operating process schematic diagram of the thinning method of its display display floater according to the first advantageous embodiment of the invention, comprise step S210 to S250。First, as shown in step S210, it is provided that a display floater 100, described display floater 100 comprises first substrate 110, second substrate 130 and the liquid crystal layer 120 being arranged between described first substrate 110 and described second substrate 130。Described first substrate 110 and described second substrate 130 have one first thickness t1。It is said that in general, described first substrate 110 and described second substrate 130 are to adopt glass material, therefore are transporting or the process of gripping is easily causing on the surface of described first substrate 110 and described second substrate 130 scratch or small hole。In order to avoid the problem that described display floater 100 causes producing to scrap after carrying out subsequent fabrication steps because of the defect of substrate surface, it is necessary to the surface defect of described first substrate 110 and described second substrate 130 is carried out pretreatment。
Therefore, as shown in step S220, in the thinning method of first preferred embodiment of the present invention, after described display floater 100 completes the step that liquid crystal becomes box, whether the surface being detected the described first substrate 110 of described display floater 100 and described second substrate 130 by a detecting device 200 is defective。Preferably, described detecting device 200 is automatization's optical detection apparatus。When judging that the described first substrate 110 of described display floater 100 and the surface of described second substrate 130 do not have defect after detection, described display floater 100 can be continued and carry out a thinning technique, with by thinning for the thickness of described first substrate 110 and described second substrate 130。But, when described detecting device 200 detects described first substrate 110 and/or described second substrate 130 has a surface defect D, described detecting device 200 can obtain and record the described surface defect D coordinate position relative to place substrate further。For example, as shown in step S220, when described detecting device 200 detects and has a surface defect D on described first substrate 110, described detecting device 200 can obtain and record described surface defect D relative to the coordinate position on described first substrate 110。
After described detecting device 200 detects that the described first substrate 110 of described display floater 100 has described surface defect D, as shown in step S230, described display floater 100 can be placed on a prosthetic device。In first preferred embodiment of the present invention, described prosthetic device is ink jet type apparatus for coating 300, and its precision can reach every 10-4Mg (milligram)。Described ink jet type apparatus for coating 300 and described detecting device 200 are electrically connected, for receive that described detecting device 200 obtains about the described surface defect D data relative to the described coordinate position on described first substrate 110。It is a kind of organic material that described ink jet type apparatus for coating 300 is coated with a repair materials R, wherein said repair materials R according to described coordinate position above the described surface defect D of described first substrate 110, for instance vaseline。Then, described repair materials R can pile up formation in the described surface defect D of described first substrate 110, and then fully fill up and cover described surface defect D。
After the described surface defect D on the described first substrate 110 of described display floater 100 having been filled up by described ink jet type apparatus for coating 300, as shown in step S240, when using HF solution, as etching solution, described display floater 100 is carried out Wet-type etching, etching solution can carry out isotropic etching on the surface of the described first substrate 110 of described display floater 100 and described second substrate 130。It is understood that owing to the described surface defect D on described first substrate 110 is filled up by described repair materials R, so described first substrate 110 only can be carried out longitudinal etching by described etching solution。
Finally, as shown in step S250, when described display floater 100 by above-mentioned employing HF solution as the chemical thinning technique of etching solution after, the described first substrate 110 of described display floater 100 and the thickness of described second substrate 130 can be thinned to t2 from original t1, and then obtain the display floater 100 with comparatively frivolous size。
In sum, in first preferred embodiment of the present invention, after described display floater 100 completes liquid crystal molding process, first the surface of the described first substrate 110 of described display floater 100 and described second substrate 130 is detected by described detecting device 200, and when detect at least one substrate (such as first substrate 110) has surface defect D time, further described display floater 100 is placed on described ink jet type apparatus for coating 300, so that described surface defect D is filled up, the last thinning technique again through a chemical is by thinning to the described first substrate 110 of described display floater 100 and the thickness of described second substrate 130。Therefore, owing to first described surface defect D being filled up before the thinning technique carrying out described chemical, and then avoid etching solution, by the inside of described surface defect D, described first substrate 110 is carried out unexpected lateral etches, cause that the size of described surface defect D increases the problem causing product rejection。Furthermore, due to before described surface defect D is filled up, first pass through described detecting device 200 and obtain the accurate coordinate position of described surface defect D, be then coated with described repair materials R further according to described coordinate position, therefore the waste of described repair materials R can be effectively prevented from。
Refer to Fig. 3, the operating process schematic diagram of the thinning method of its display display floater according to the second, preferred embodiment of the present invention, comprise step S310 to S350。First, as shown in step S310, it is provided that a display floater 100, described display floater 100 comprises first substrate 110, second substrate 130 and the liquid crystal layer 120 being arranged between described first substrate 110 and described second substrate 130。Described first substrate 110 and described second substrate 130 have one first thickness t1。It is said that in general, described first substrate 110 and described second substrate 130 are to adopt glass material, therefore are transporting or the process of gripping is easily causing on the surface of described first substrate 110 and described second substrate 130 scratch or small hole。In order to avoid the problem that described display floater 100 causes producing to scrap after carrying out subsequent fabrication steps because of the defect of substrate surface, it is necessary to the surface defect of described first substrate 110 and described second substrate 130 is carried out pretreatment。
Therefore, as shown in step S320, in the thinning method of second preferred embodiment of the present invention, after described display floater 100 completes the step that liquid crystal becomes box, whether the surface being detected the described first substrate 110 of described display floater 100 and described second substrate 130 by a detecting device 200 is defective。Preferably, described detecting device 200 is automatization's optical detection apparatus。When judging that the described first substrate 110 of described display floater 100 and the surface of described second substrate 130 do not have defect after detection, described display floater 100 can be continued and carry out a thinning technique, with by thinning for the thickness of described first substrate 110 and described second substrate 130。But, when described detecting device 200 detects described first substrate 110 and/or described second substrate 130 has a surface defect D, described detecting device 200 can obtain and record the described surface defect D coordinate position relative to place substrate further。For example, as shown in step S320, when described detecting device 200 detects and has a surface defect D on described first substrate 110, described detecting device 200 can obtain and record described surface defect D relative to the coordinate position on described first substrate 110。
After described detecting device 200 detects that the described first substrate 110 of described display floater 100 has described surface defect D, as shown in step S330, described display floater 100 can be placed on a prosthetic device。In second preferred embodiment of the present invention, described prosthetic device is laser chemical vapor deposition (chemicalvapordeposition, CVD) device 400, the thickness of its film deposition can be accurately controlled between 2 to 3 μm, but the thickness of actual deposition is not limited to this, for instance more than 3 μm or less than 2 μm。Described laser chemical vapor deposition device 400 and described detecting device 200 are electrically connected, for receive that described detecting device 200 obtains about the described surface defect D data relative to the described coordinate position on described first substrate 110。Described laser chemical vapor deposition device 400 is according to described coordinate position formation of deposits one repair materials R ' in the described surface defect D of described first substrate 110, and then piles up a rete in the described surface defect D of described first substrate 110 fully to fill up and to cover described surface defect D。
After the described surface defect D on the described first substrate 110 of described display floater 100 having been filled up by described laser chemical vapor deposition device 400, as shown in step S340, when using HF solution, as etching solution, described display floater 100 is carried out Wet-type etching, etching solution can carry out isotropic etching on the surface of the described first substrate 110 of described display floater 100 and described second substrate 130。It is understood that owing to the described surface defect D on described first substrate 110 is filled up by described repair materials R ', so described first substrate 110 only can be carried out longitudinal etching by described etching solution。
Finally, as shown in step S350, when described display floater 100 by above-mentioned employing HF solution as the chemical thinning technique of etching solution after, the described first substrate 110 of described display floater 100 and the thickness of described second substrate 130 can be thinned to t2 from original t1, and then obtain the display floater 100 with comparatively frivolous size。
In sum, in second preferred embodiment of the present invention, after described display floater 100 completes liquid crystal molding process, first the surface of the described first substrate 110 of described display floater 100 and described second substrate 130 is detected by described detecting device 200, and when detect at least one substrate (such as first substrate 110) has surface defect D time, further described display floater 100 is placed on described laser chemical vapor deposition device 400, so that described surface defect D is filled up, the last thinning technique again through a chemical is by thinning to the described first substrate 110 of described display floater 100 and the thickness of described second substrate 130。Therefore, owing to first described surface defect D being filled up before the thinning technique carrying out described chemical, and then avoid etching solution, by the inside of described surface defect D, described first substrate 110 is carried out unexpected lateral etches, cause that the size of described surface defect D increases the problem causing product rejection。Furthermore, due to before described surface defect D is filled up, first pass through described detecting device 200 and obtain the accurate coordinate position of described surface defect D, then deposit described repair materials R ' further according to described coordinate position, therefore the waste of described repair materials R ' can be effectively prevented from。
Although the present invention is disclosed above with preferred embodiment; so it is not limited to the present invention; persond having ordinary knowledge in the technical field of the present invention; without departing from the spirit and scope of the present invention; when being used for a variety of modifications and variations, therefore protection scope of the present invention is when being as the criterion depending on as defined in claim。
Claims (10)
1. the thinning method of a display floater, it is characterised in that described thinning method comprises:
A display floater, described display floater is provided to comprise at least one substrate with one first thickness；
Described display floater is placed on a prosthetic device；
Described prosthetic device is used to be coated with a repair materials in a surface defect of described at least one substrate；And
Described at least one substrate of described display floater is carried out thinning technique so that described at least one substrate has one less than the second thickness of described first thickness。
2. the thinning method of display floater as claimed in claim 1, it is characterized in that, before described display floater is placed on a prosthetic device, also comprise: adopt the described surface defect of described at least one substrate of a detecting device described display floater of detecting, and record described surface defect coordinate position on described at least one substrate。
3. the thinning method of display floater as claimed in claim 2, it is characterised in that described prosthetic device is coated with described repair materials according to described coordinate position in the described surface defect of described at least one substrate。
4. the thinning method of display floater as claimed in claim 2, it is characterised in that described detecting device comprises automatization's optical detection apparatus。
5. the thinning method of display floater as claimed in claim 2, it is characterized in that, described prosthetic device comprises an ink jet type apparatus for coating, and described ink jet type apparatus for coating fills up an organic material according to described coordinate position in the described surface defect of described at least one substrate。
6. the thinning method of a display floater, it is characterised in that described thinning method comprises:
A display floater, described display floater is provided to comprise at least one substrate with one first thickness；
Described display floater is placed on a prosthetic device；
Described prosthetic device is used to deposit a repair materials in a surface defect of described at least one substrate；And
Described at least one substrate of described display floater is carried out thinning technique so that described at least one substrate has one less than the second thickness of described first thickness。
7. the thinning method of display floater as claimed in claim 6, it is characterized in that, before described display floater is placed on a prosthetic device, also comprise: adopt the described surface defect of described at least one substrate of a detecting device described display floater of detecting, and record described surface defect coordinate position on described at least one substrate。
8. the thinning method of display floater as claimed in claim 7, it is characterised in that described prosthetic device deposits described repair materials according to described coordinate position in the described surface defect of described at least one substrate。
9. the thinning method of display floater as claimed in claim 7, it is characterised in that described detecting device comprises automatization's optical detection apparatus。
10. the thinning method of display floater as claimed in claim 7, it is characterized in that, described prosthetic device comprises a laser chemical vapor deposition device, and described laser chemical vapor deposition device deposits a rete according to described coordinate position in the described surface defect of described at least one substrate。
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|---|---|---|---|
| CN201610050937.9A CN105693105A (en) | 2016-01-26 | 2016-01-26 | Thinning method for display panel |
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| CN201610050937.9A CN105693105A (en) | 2016-01-26 | 2016-01-26 | Thinning method for display panel |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108072989A (en) * | 2017-07-28 | 2018-05-25 | 武汉华星光电技术有限公司 | The processing method of liquid crystal display panel |
| CN108303424A (en) * | 2018-01-02 | 2018-07-20 | 京东方科技集团股份有限公司 | Display panel testing and its detection method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102503179A (en) * | 2011-11-04 | 2012-06-20 | 成都禅德太阳能电力有限公司 | Solar energy power station electricity mirror field and photovoltaic component glass restoration system |
| CN103253868A (en) * | 2012-02-17 | 2013-08-21 | 江西沃格光电科技有限公司 | Liquid crystal display screen thinning pretreatment liquid and liquid crystal display screen thinning method |
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2016
- 2016-01-26 CN CN201610050937.9A patent/CN105693105A/en active Pending
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| CN102503179A (en) * | 2011-11-04 | 2012-06-20 | 成都禅德太阳能电力有限公司 | Solar energy power station electricity mirror field and photovoltaic component glass restoration system |
| CN103253868A (en) * | 2012-02-17 | 2013-08-21 | 江西沃格光电科技有限公司 | Liquid crystal display screen thinning pretreatment liquid and liquid crystal display screen thinning method |
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