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CN105667085B - One kind realizes the fine barrier array of graphical inkjet printing and its manufacture method - Google Patents

One kind realizes the fine barrier array of graphical inkjet printing and its manufacture method Download PDF

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Publication number
CN105667085B
CN105667085B CN201610023109.6A CN201610023109A CN105667085B CN 105667085 B CN105667085 B CN 105667085B CN 201610023109 A CN201610023109 A CN 201610023109A CN 105667085 B CN105667085 B CN 105667085B
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ink
protective layer
inkjet printing
layer
printing
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CN105667085A (en
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张永爱
郭太良
周雄图
叶芸
李福山
胡海龙
林金堂
林志贤
彭玉颜
褚子航
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Fuzhou University
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00Inking and printing with a printer's forme
    • B41M1/26Printing on other surfaces than ordinary paper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0041Digital printing on surfaces other than ordinary paper
    • B41M5/0047Digital printing on surfaces other than ordinary paper by ink-jet printing

Abstract

本发明涉及一种实现图形化喷墨打印精细障壁阵列及其制造方法。该障壁阵列包括一基板,沿水平和垂直方向平行交错间隔排列设置于基板表面的储液槽阵列,以及设置于储液槽阵列底部的过渡层。本发明只需根据喷墨打印墨水的水性或油性设计加工形成所需的障壁阵列,将障壁阵列作为喷墨打印的基础点进行打印,从而实现图形化喷墨打印。该方法不仅可以有效地简化图形化喷墨打印的制作工艺,且可提高图形化喷墨打印的精度和降低图形化喷墨打印的成本。

The invention relates to a patterned inkjet printing fine barrier array and a manufacturing method thereof. The barrier rib array includes a substrate, an array of liquid storage tanks arranged in parallel and staggered intervals along the horizontal and vertical directions on the surface of the substrate, and a transition layer arranged at the bottom of the array of liquid storage tanks. The invention only needs to design and process the required barrier array according to the water-based or oil-based ink-jet printing ink, and use the barrier-rib array as the basic point of ink-jet printing to print, thereby realizing graphic ink-jet printing. The method can not only effectively simplify the manufacturing process of the graphic ink-jet printing, but also improve the precision of the graphic ink-jet printing and reduce the cost of the graphic ink-jet printing.

Description

一种实现图形化喷墨打印精细障壁阵列及其制造方法A patterned inkjet printing fine barrier array and its manufacturing method

技术领域technical field

本发明涉及印刷显示器件领域,尤其涉及一种实现图形化喷墨打印精细障壁阵列及其制造方法。The invention relates to the field of printed display devices, in particular to a patterned inkjet printing fine barrier array and a manufacturing method thereof.

背景技术Background technique

显示技术与产业在世纪之交经历了重大变革,即从阴极射线管显示(CRT)过渡到以TFT-LCD和PDP为代表的平板显示(FPD)。近十年来,显示技术与产业发生了渐进式变化,LCD产业得到了突飞猛进发展并成为了全球显示产业的霸主,有机发光显示(OLED)技术和产业逐渐成熟并发展壮大。OLED显示器件由于同时具备自发光,不需背光源、对比度高、厚度薄、视角广、反应速度快、可用于挠曲性面板等优点,被认为是下一代的平面显示器新兴应用技术。Display technology and industry experienced major changes at the turn of the century, that is, the transition from cathode ray tube display (CRT) to flat panel display (FPD) represented by TFT-LCD and PDP. In the past ten years, the display technology and industry have undergone gradual changes. The LCD industry has developed by leaps and bounds and has become the overlord of the global display industry. The organic light-emitting display (OLED) technology and industry have gradually matured and grown stronger. OLED display devices are considered to be the next-generation flat-panel display emerging application technology due to their advantages of self-illumination, no need for backlight, high contrast, thin thickness, wide viewing angle, fast response speed, and flexible panels.

目前,对于OLED显示器件的制备,通常采用真空蒸镀和印刷技术制备,这是当前国际主流的发展技术。小分子的真空蒸镀技术比较成熟,目前已经实现产业化,并有中小尺寸的全彩色显示屏批量推出。但是,该技术设备投资和维护费用高昂、材料浪费严重,难以实现大面积,且成本居高不下,面对残酷的市场环境,难以形成竞争优势。印刷技术被认为是解决OLED高成本和实现大面积的有效途径,具有广阔的发展前景,这种技术可结合液体功能性材料和先进的印刷设备来制作OLED显示屏,可提高材料的利用率和生产效率,降低制造成本,提高产能。At present, for the preparation of OLED display devices, vacuum evaporation and printing technologies are usually used to prepare, which is the current international mainstream development technology. The vacuum evaporation technology of small molecules is relatively mature and has been industrialized, and small and medium-sized full-color display screens have been launched in batches. However, the equipment investment and maintenance costs of this technology are high, material waste is serious, it is difficult to achieve a large area, and the cost remains high. Facing the cruel market environment, it is difficult to form a competitive advantage. Printing technology is considered to be an effective way to solve the high cost of OLED and realize large area, and has broad development prospects. This technology can combine liquid functional materials and advanced printing equipment to make OLED displays, which can improve the utilization rate of materials and Production efficiency, reduce manufacturing costs, increase production capacity.

最常见的印刷技术有喷墨印刷(inkjet printing)和丝网印刷(screenprinting)两种。喷墨技术是一种新型的无接触、无压力、无印版的打印技术,可将电子计算机中存储的信息输入喷墨打印机即可实现打印,它有许多优点,比如,分辨率相当高,具有灵活性,成本较低,并与几乎所有类型的基板兼容,被认作是未来制造有机发光平板显示器最具有前景的技术,但是,应用喷墨打印技术生产平板显示器还存在很多问题需要解决,如:(a)开发可印刷的高质量功能材料;(b)薄膜厚度均匀性及光电性能等需达到应用的要求;(c)Bank 技术需要进一步优化,以提高印刷器件的分辨率;(d)开发性能可靠、产量高的喷墨打印设备。这些难点中,开发出实现图形化喷墨打印的Bank技术是印刷显示技术的重中之重。The most common printing techniques are inkjet printing and screen printing. Inkjet technology is a new type of non-contact, pressure-free, and plateless printing technology. It can print the information stored in the computer into the inkjet printer. It has many advantages, for example, the resolution is quite high, With flexibility, low cost, and compatibility with almost all types of substrates, it is considered to be the most promising technology for manufacturing organic light-emitting flat-panel displays in the future. However, there are still many problems to be solved in the production of flat-panel displays using inkjet printing technology. For example: (a) develop high-quality functional materials that can be printed; (b) film thickness uniformity and photoelectric performance must meet the application requirements; (c) Bank technology needs to be further optimized to improve the resolution of printed devices; (d ) to develop inkjet printing equipment with reliable performance and high output. Among these difficulties, the development of Bank technology to realize graphic inkjet printing is the most important thing in printing and display technology.

在现代工艺中,图形化是常见的一种工艺优化手段,而目前图形化的方法有很多,如中国专利CN101640169A的图形化方法是在用于氮化物外延生长的衬底上沉积一层铝薄层,利用飞秒激光刻蚀铝薄层使其表面形成周期性的浅凹坑,之后采用电化学方法将制备的的铝薄层阳极氧化形成纳米级同学的多孔网状氧化铝层,利用氧化铝层做掩膜,通过刻蚀将氧化铝层上的纳米级图形转移到衬底,之后腐蚀掉氧化铝层得到带有纳米级图形的衬底,这个方法涉及到多个化学反应,过程中会出现太多的不确定因素影响到实验精度与结果;中国专利CN104037063A将具有与预设图形相同的镂空部分的掩膜板放置在基板上方后镀膜,从而在基板上形成图形化的薄膜,但是这个方法在移除掩膜板时会引起薄膜结构的变化,特别的,这个方法只适合于面积较大的图形化,而对于精细的图形化是达不到的。中国专利CN105070650A中提到采用两次两次曝光、显影和刻蚀处理,形成倒梯形像素区域,得到具有梯形Bank的梯形像素Bank结构,该技术采用两次倾斜光刻技术来制备Bank结构,不仅工艺复杂,而且制作成本高,不易大面积产业化。因此,获得一种工艺简单、制造成本低的精细图形化储液槽结构有利于溶液法制备像素均匀的印刷显示器件。基于此问题,本发明提出一种实现图形化喷墨打印精细储液槽阵列及其制造方法。In modern technology, patterning is a common method of process optimization, and there are many methods of patterning at present, such as the patterning method of Chinese patent CN101640169A, which is to deposit a thin layer of aluminum on the substrate used for nitride epitaxial growth. Layer, use femtosecond laser to etch the aluminum thin layer to form periodic shallow pits on the surface, and then electrochemically anodize the prepared aluminum thin layer to form a nano-scale porous network aluminum oxide layer. The aluminum layer is used as a mask, and the nanoscale pattern on the aluminum oxide layer is transferred to the substrate by etching, and then the aluminum oxide layer is etched away to obtain a substrate with nanoscale patterns. This method involves multiple chemical reactions. There will be too many uncertain factors affecting the accuracy and results of the experiment; Chinese patent CN104037063A places a mask plate with the same hollow part as the preset pattern on the substrate and then coats the film, thereby forming a patterned film on the substrate, but This method will cause changes in the film structure when the mask is removed. In particular, this method is only suitable for large-area patterning, but it cannot be achieved for fine patterning. Chinese patent CN105070650A mentions that two times of exposure, development and etching are used to form an inverted trapezoidal pixel area, and a trapezoidal pixel Bank structure with a trapezoidal Bank is obtained. This technology uses two oblique photolithography techniques to prepare the Bank structure, not only The process is complicated, and the production cost is high, so it is not easy to be industrialized on a large scale. Therefore, obtaining a finely patterned liquid storage tank structure with simple process and low manufacturing cost is conducive to the preparation of printed display devices with uniform pixels by solution method. Based on this problem, the present invention proposes a patterned inkjet printing fine liquid reservoir array and a manufacturing method thereof.

发明内容Contents of the invention

本发明的目的在于提供一种实现图形化喷墨打印精细障壁阵列及其制造方法,以克服现有技术中存在的缺陷。The object of the present invention is to provide a patterned inkjet printing fine barrier rib array and its manufacturing method, so as to overcome the defects in the prior art.

为实现上述目的,本发明的技术方案是:一种实现图形化喷墨打印精细障壁阵列,包括:若干个设置于一基板上表面且呈阵列分布的储液槽以及对应设置于所述储液槽底部的过渡层;所述储液槽之间的距离为10纳米至500微米。In order to achieve the above object, the technical solution of the present invention is: a patterned inkjet printing fine barrier array, including: a number of liquid storage tanks arranged on the upper surface of a substrate and distributed in an array, and correspondingly arranged on the liquid storage tanks. A transition layer at the bottom of the tanks; the distance between the reservoirs is 10 nm to 500 microns.

在本发明一实施例中,所述储液槽底面横截面的宽度a为10微米至2000微米,长度b为10微米至2000微米,所述储液槽深度h为10纳米至10微米。In an embodiment of the present invention, the width a of the cross section of the bottom surface of the liquid storage tank is 10 microns to 2000 microns, the length b is 10 microns to 2000 microns, and the depth h of the liquid storage tank is 10 nanometers to 10 microns.

在本发明一实施例中,所述储液槽内周侧面为平面,且内周侧面与所述基板的夹角为30度至90度。In one embodiment of the present invention, the inner peripheral side of the liquid storage tank is a plane, and the included angle between the inner peripheral side and the substrate is 30° to 90°.

在本发明一实施例中,所述储液槽内周侧面为弧面,且内周侧面的曲率半径r根据所述储液槽底面横截面的宽度a、长度b以及所述储液槽深度h确定取值范围;当宽度a>长度b时,所述曲率半径r取值范围为:深度h-长度b;当宽度a<长度b时,所述曲率半径r取值范围为:深度h-宽度a。In one embodiment of the present invention, the inner peripheral side of the storage tank is an arc surface, and the radius of curvature r of the inner peripheral side is based on the width a, length b, and depth of the storage tank bottom cross-section h determines the value range; when the width a>length b, the value range of the radius of curvature r is: depth h-length b; when the width a<length b, the value range of the radius of curvature r is: depth h - width a.

进一步的,还提供一种实现图形化喷墨打印精细障壁阵列的制造方法,按照如下步骤实现:Further, there is also provided a manufacturing method for patterned inkjet printing of fine barrier rib arrays, which is realized according to the following steps:

步骤S1:提供一基板;Step S1: providing a substrate;

步骤S2:在所述基板上涂覆一层保护层;Step S2: coating a protective layer on the substrate;

步骤S3:将所述保护层加工成图形化且呈阵列分布储液槽;Step S3: processing the protective layer into patterned and distributed liquid storage tanks in an array;

步骤S4:在所述储液槽阵列中储液槽的底部填充一层过渡层;所述过渡层所采用材料的化学特性与上所述保护层相反;Step S4: filling a layer of transition layer at the bottom of the liquid storage tanks in the liquid storage tank array; the chemical properties of the materials used in the transition layer are opposite to those of the above protective layer;

步骤S5:利用喷墨打印技术在所述过渡层表面填充可打印材料,实现打印层的图形化。Step S5: using inkjet printing technology to fill the surface of the transition layer with a printable material to realize the patterning of the printing layer.

在本发明一实施例中,所述喷墨打印墨水包括水性墨水以及油性墨水;所述水性墨水为由含有羧酸基、磺酸基、硫酸基与磷酸基亲水基团或由含氧基团组成的醚基、羟基、羧酸酯、嵌段聚醚及其他含有氨基、季铵基基团的材料;所述油性墨水为含有链烷烃基、环烷烃基、芳香烃基基团的材料;In one embodiment of the present invention, the inkjet printing ink includes water-based ink and oil-based ink; the water-based ink is composed of carboxylic acid groups, sulfonic acid groups, sulfuric acid Ether group, hydroxyl group, carboxylate, block polyether and other materials containing amino group and quaternary ammonium group; the oily ink is a material containing alkane group, cycloalkane group and aromatic hydrocarbon group;

在本发明一实施例中,根据所述喷墨打印墨水的水性或油性选择所述保护层疏水性或亲水性膜层;若所述喷墨打印墨水是水性墨水,则所述保护层为疏水性膜层;若所述喷墨打印墨水是油性墨水,则所述保护层为亲水性膜层;In one embodiment of the present invention, the hydrophobic or hydrophilic film layer of the protective layer is selected according to the water or oiliness of the inkjet printing ink; if the inkjet printing ink is water-based ink, the protective layer is Hydrophobic film layer; if the inkjet printing ink is oily ink, then the protective layer is a hydrophilic film layer;

在本发明一实施例中,所述保护层是一层厚度为10纳米至10微米的均匀膜层;所述保护层的制造方法包括印刷、旋涂、贴膜、物理气相沉积或化学气相沉积。In one embodiment of the present invention, the protective layer is a uniform film layer with a thickness of 10 nanometers to 10 microns; the manufacturing method of the protective layer includes printing, spin coating, film sticking, physical vapor deposition or chemical vapor deposition.

在本发明一实施例中,所述储液槽阵列的制造方法包含贴膜、镀膜、湿法刻蚀、喷砂、激光加工、喷墨打印、3D打印、丝网印刷和微接触印刷。In an embodiment of the present invention, the manufacturing method of the liquid storage tank array includes film sticking, coating, wet etching, sandblasting, laser processing, inkjet printing, 3D printing, screen printing and microcontact printing.

在本发明一实施例中,所述过渡层是一种与所述保护层化学性质相反的膜层;若所述保护层为疏水性膜层,则所述过渡层为亲水性膜层;反之,所述保护层为亲水性膜层,则所述过渡层为疏水性膜层。In one embodiment of the present invention, the transition layer is a film layer with opposite chemical properties to the protective layer; if the protective layer is a hydrophobic film layer, the transition layer is a hydrophilic film layer; On the contrary, if the protective layer is a hydrophilic film layer, then the transition layer is a hydrophobic film layer.

在本发明一实施例中,所述过渡层的厚度小于储液槽深度h,其厚度为1纳米至1微米;所述过渡层的制造方法包括贴膜、物理气相沉积或化学气相沉积、喷墨打印、3D打印、丝网印刷、微接触印刷。In one embodiment of the present invention, the thickness of the transition layer is less than the depth h of the liquid storage tank, and its thickness is 1 nanometer to 1 micron; the manufacturing method of the transition layer includes film sticking, physical vapor deposition or chemical vapor deposition, inkjet Printing, 3D printing, screen printing, microcontact printing.

在本发明一实施例中,所述喷墨打印墨水在喷墨打印机作用下填充在所述过渡层表面,从而实现图形化喷墨打印;所述图形化墨水的上表面低于所述保护层或与所述保护层同处一水平面。In an embodiment of the present invention, the inkjet printing ink is filled on the surface of the transition layer under the action of an inkjet printer, thereby realizing patterned inkjet printing; the upper surface of the patterned ink is lower than the protective layer Or be on the same level as the protective layer.

进一步的,本发明还提供另一种实现图形化喷墨打印精细障壁阵列的制造方法,按照如下步骤实现:Furthermore, the present invention also provides another manufacturing method for patterned inkjet printing of fine barrier rib arrays, which is realized according to the following steps:

步骤S1:提供一基板;Step S1: providing a substrate;

步骤S2:在所述基板上制作一层图形化的过渡层;根据喷墨打印墨水的水性或油性选择所述过渡层是亲水性膜层或疏水性膜层;Step S2: making a patterned transition layer on the substrate; selecting whether the transition layer is a hydrophilic film layer or a hydrophobic film layer according to the water or oiliness of the inkjet printing ink;

步骤S3:在所述过渡层表面涂覆一层保护层,所述保护层为与所述过渡层化学特性相反的材料;Step S3: coating a protective layer on the surface of the transition layer, the protective layer is a material opposite to that of the transition layer;

步骤S4:将所述保护层加工成图形化且呈阵列分布储液槽;Step S4: processing the protective layer into patterned and distributed liquid storage tanks in an array;

步骤S5:利用喷墨打印技术在所述过渡层表面填充可打印材料,实现打印层的图形化。Step S5: using inkjet printing technology to fill the surface of the transition layer with a printable material to realize the patterning of the printing layer.

在本发明一实施例中,所述喷墨打印墨水包括水性墨水以及油性墨水;所述水性墨水为由含有羧酸基、磺酸基、硫酸基与磷酸基亲水基团或由含氧基团组成的醚基、羟基、羧酸酯、嵌段聚醚及其他含有氨基、季铵基基团的材料;所述油性墨水为含有链烷烃基、环烷烃基、芳香烃基基团的材料;In one embodiment of the present invention, the inkjet printing ink includes water-based ink and oil-based ink; the water-based ink is composed of carboxylic acid groups, sulfonic acid groups, sulfuric acid Ether group, hydroxyl group, carboxylate, block polyether and other materials containing amino group and quaternary ammonium group; the oily ink is a material containing alkane group, cycloalkane group and aromatic hydrocarbon group;

在本发明一实施例中,根据所述喷墨打印墨水的水性或油性选择所述保护层疏水性或亲水性膜层;若所述喷墨打印墨水是水性墨水,则所述保护层为疏水性膜层;若所述喷墨打印墨水是油性墨水,则所述保护层为亲水性膜层;In one embodiment of the present invention, the hydrophobic or hydrophilic film layer of the protective layer is selected according to the water or oiliness of the inkjet printing ink; if the inkjet printing ink is water-based ink, the protective layer is Hydrophobic film layer; if the inkjet printing ink is oily ink, then the protective layer is a hydrophilic film layer;

在本发明一实施例中,所述保护层是一层厚度为10纳米至10微米的均匀膜层;所述保护层的制造方法包括印刷、旋涂、贴膜、物理气相沉积或化学气相沉积。In one embodiment of the present invention, the protective layer is a uniform film layer with a thickness of 10 nanometers to 10 microns; the manufacturing method of the protective layer includes printing, spin coating, film sticking, physical vapor deposition or chemical vapor deposition.

在本发明一实施例中,所述储液槽阵列的制造方法包含贴膜、镀膜、湿法刻蚀、喷砂、激光加工、喷墨打印、3D打印、丝网印刷和微接触印刷。In an embodiment of the present invention, the manufacturing method of the liquid storage tank array includes film sticking, coating, wet etching, sandblasting, laser processing, inkjet printing, 3D printing, screen printing and microcontact printing.

在本发明一实施例中,所述过渡层是一种与所述保护层化学性质相反的膜层;若所述保护层为疏水性膜层,则所述过渡层为亲水性膜层;反之,所述保护层为亲水性膜层,则所述过渡层为疏水性膜层。In one embodiment of the present invention, the transition layer is a film layer with opposite chemical properties to the protective layer; if the protective layer is a hydrophobic film layer, the transition layer is a hydrophilic film layer; On the contrary, if the protective layer is a hydrophilic film layer, then the transition layer is a hydrophobic film layer.

在本发明一实施例中,所述过渡层的厚度小于储液槽深度h,其厚度为1纳米至1微米;所述过渡层的制造方法包括贴膜、物理气相沉积或化学气相沉积、喷墨打印、3D打印、丝网印刷、微接触印刷。In one embodiment of the present invention, the thickness of the transition layer is less than the depth h of the liquid storage tank, and its thickness is 1 nanometer to 1 micron; the manufacturing method of the transition layer includes film sticking, physical vapor deposition or chemical vapor deposition, inkjet Printing, 3D printing, screen printing, microcontact printing.

在本发明一实施例中,所述喷墨打印墨水在喷墨打印机作用下填充在所述过渡层表面,从而实现图形化喷墨打印;所述图形化墨水的上表面低于所述保护层或与所述保护层同处一水平面。In an embodiment of the present invention, the inkjet printing ink is filled on the surface of the transition layer under the action of an inkjet printer, thereby realizing patterned inkjet printing; the upper surface of the patterned ink is lower than the protective layer Or be on the same level as the protective layer.

相较于现有技术,本发明具有以下有益效果:本发明所提处的一种实现图形化喷墨打印精细障壁阵列及其制造方法,只需根据喷墨打印墨水的水性或油性设计加工形成所需的障壁阵列,将障壁阵列作为喷墨打印的基础点进行打印,实现图形化喷墨打印。该方法不仅可以有效地简化图形化喷墨打印的制作工艺,且可提高图形化喷墨打印的精度和降低图形化喷墨打印的成本。Compared with the prior art, the present invention has the following beneficial effects: a patterned inkjet printing fine barrier array and its manufacturing method mentioned in the present invention only need to be designed and processed according to the water-based or oily ink-jet printing ink The required barrier array is printed by using the barrier array as the basic point of inkjet printing to realize graphic inkjet printing. The method can not only effectively simplify the manufacturing process of the graphic ink-jet printing, but also improve the precision of the graphic ink-jet printing and reduce the cost of the graphic ink-jet printing.

附图说明Description of drawings

图1为本发明实施例一中一种实现图形化喷墨打印精细障壁阵列的结构示意图。FIG. 1 is a schematic structural diagram of a fine barrier rib array for patterned inkjet printing in Embodiment 1 of the present invention.

图2为本发明实施例一中一种实现图形化喷墨打印精细障壁阵列的截面图。FIG. 2 is a cross-sectional view of a patterned inkjet printing fine barrier array in Embodiment 1 of the present invention.

图3为本发明实施例一中一种实现图形化喷墨打印精细障壁阵列的制造工艺流程图。FIG. 3 is a flow chart of a manufacturing process for patterned inkjet printing of fine barrier rib arrays in Embodiment 1 of the present invention.

图4 为本发明实施例一中在基板表面涂覆保护层的结构示意图。FIG. 4 is a schematic structural view of coating a protective layer on the surface of a substrate in Embodiment 1 of the present invention.

图5为本发明实施例一中将保护层加工为图形化储液槽整列后的结构示意图。FIG. 5 is a schematic diagram of the structure after the protective layer is processed into a patterned liquid storage tank in Embodiment 1 of the present invention.

图6为本发明实施例一中储液槽中填充过渡层后的结构示意图。FIG. 6 is a schematic structural view of the liquid storage tank filled with a transition layer in Embodiment 1 of the present invention.

图7为本发明实施例一中在过渡层表面填充打印材料后的结构示意图。FIG. 7 is a schematic structural view of filling printing material on the surface of the transition layer in Embodiment 1 of the present invention.

图8为本发明实施例二中一种实现图形化喷墨打印精细障壁阵列的结构示意图。FIG. 8 is a schematic structural diagram of a patterned inkjet printing fine barrier array in Embodiment 2 of the present invention.

图9为本发明实施例二中一种实现图形化喷墨打印精细障壁阵列的截面图。9 is a cross-sectional view of a patterned inkjet printing fine barrier array in Embodiment 2 of the present invention.

图10为本发明实施例二中一种实现图形化喷墨打印精细障壁阵列的制造工艺流程图。FIG. 10 is a flow chart of a manufacturing process for patterned inkjet printing of fine barrier rib arrays in Embodiment 2 of the present invention.

图11为本发明实施例二中在基板表面形成图形化过度层的结构示意图。FIG. 11 is a schematic structural view of forming a patterned transitional layer on the surface of a substrate in Embodiment 2 of the present invention.

图12 为本发明实施例二中在过渡层表面涂覆保护层的结构示意图。Fig. 12 is a schematic structural view of coating a protective layer on the surface of the transition layer in the second embodiment of the present invention.

图13为本发明实施例二中将保护层加工为图形化储液槽整列后的结构示意图。FIG. 13 is a schematic diagram of the structure after the protective layer is processed into a patterned liquid storage tank in the second embodiment of the present invention.

图14为本发明实施例二中在过渡层表面填充打印材料后的结构示意图。FIG. 14 is a schematic structural view of the second embodiment of the present invention after filling the printing material on the surface of the transition layer.

【标号说明】:11——基板,12——保护层,13——储液槽阵列,131——储液槽,14——过渡层,15——可打印材料。[Description of symbols]: 11—substrate, 12—protective layer, 13—reservoir array, 131—reservoir, 14—transition layer, 15—printable material.

具体实施方式detailed description

下面结合附图,对本发明的技术方案进行具体说明。The technical solution of the present invention will be specifically described below in conjunction with the accompanying drawings.

为使本发明的目的、技术方案及优点更加清楚明白,以下将通过具体实施例和相关附图,对本发明作进一步详细说明。在图中,为了清楚,放大了层与区域的厚度,但作为示意图不应该被认为严格反映了几何尺寸的比例关系。在此,参考图是本发明的理想化实施例示意图,本发明的实施例不应该被认为仅限于图中所示的区域的特定形状,而是包括所得到的形状,比如制造引起的偏差。在本实施例中均以矩形或圆表示,图中的表示是示意性的,但这不应该被认为限制本发明的范围。本实施例中障壁起伏图案的大小与起伏周期有一定范围,在实际生产中可以根据实际需要设计起伏图案大小及其起伏周期,实施例中起伏周期的数值只是示意值,但这不应该被认为限制本发明的范围。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below through specific embodiments and related drawings. In the drawings, the thicknesses of layers and regions are exaggerated for clarity, but as a schematic diagram, it should not be considered as strictly reflecting the proportional relationship of geometric dimensions. Here, the referenced figures are schematic diagrams of idealized embodiments of the present invention, and embodiments of the present invention should not be construed as limited to the particular shapes of regions shown in the figures, but to include resulting shapes, such as manufacturing-induced deviations. In this embodiment, they are all represented by rectangles or circles, and the representations in the figure are schematic, but this should not be considered as limiting the scope of the present invention. In this embodiment, the size of the undulation pattern and the undulation period of the barrier have a certain range. In actual production, the size of the undulation pattern and its undulation period can be designed according to actual needs. limit the scope of the invention.

图1和图2为本发明第一优选实施例的一种实现图形化喷墨打印精细障壁阵列的结构示意图和截面图。图3为本发明第一优选实施例的一种实现图形化喷墨打印精细障壁阵列的制造工艺流程图。图4-图7为本发明第一优选实施例的一种实现图形化喷墨打印精细障壁阵列的具体实施步骤示意图。FIG. 1 and FIG. 2 are a schematic structural view and a cross-sectional view of a fine barrier rib array for patterned inkjet printing according to the first preferred embodiment of the present invention. FIG. 3 is a flow chart of a manufacturing process for patterned inkjet printing of fine barrier rib arrays according to the first preferred embodiment of the present invention. 4-7 are schematic diagrams of specific implementation steps for realizing patterned inkjet printing of fine barrier rib arrays according to the first preferred embodiment of the present invention.

请参考图3,并结合图4-7,对本发明第一实施例提供的一种实现图形化喷墨打印精细障壁阵列的制造方法进行详细的说明,具体包括以下步骤:Please refer to FIG. 3, and in combination with FIGS. 4-7, a detailed description of a manufacturing method for patterned inkjet printing of a fine barrier barrier array provided by the first embodiment of the present invention is provided, which specifically includes the following steps:

(S11)提供一基板11,对所述的基板进行清洗。选取一块所需尺寸的基板11,置于按体积比为Win-10 : DI水 = 3 : 97清洗液中,利用频率为32KHz的超声机清洗15min,喷淋2min后,再置于体积比为Win-41 : DI水 = 5 : 95清洗液中,利用频率为40KHz的超声机清洗10min,经循环自来水喷淋漂洗2min后,再利用频率为28KHz的超声机在DI纯净水中清洗10min,经氮气枪吹干后置于50℃洁净烘箱中保温30min以上备用。(S11) Provide a substrate 11, and clean the substrate. Select a substrate 11 of required size, place it in a cleaning solution with a volume ratio of Win-10: DI water = 3: 97, use an ultrasonic machine with a frequency of 32KHz to clean it for 15 minutes, spray it for 2 minutes, and then place it in a volume ratio of Win-41 : DI water = 5 : 95 cleaning solution, use an ultrasonic machine with a frequency of 40KHz to clean for 10 minutes, spray and rinse with circulating tap water for 2 minutes, then use an ultrasonic machine with a frequency of 28KHz to clean in DI pure water for 10 minutes, and pass through nitrogen After drying the gun, place it in a clean oven at 50°C for at least 30 minutes for further use.

(S12)在所述基板上涂覆一层保护层,具体步骤如下:(S12) Coating a protective layer on the substrate, the specific steps are as follows:

(S121)保护层选择。保护层是根据喷墨打印墨水的水性或油性来选择疏水性或亲水性膜层。若喷墨打印墨水是水性墨水时,保护层为疏水性膜层;反之,喷墨打印墨水是油性墨水时,保护层为亲水性膜层。喷墨打印墨水包括含有羧酸基、磺酸基、硫酸基与磷酸基亲水基团或者由含氧基团组成的醚基和羟基与羧酸酯、嵌段聚醚及其他含有氨基、季铵基基团的水性墨水和含有链烷烃基、环烷烃基、芳香烃基基团的油性墨水。本实施例中优选环烷烃基的油性墨水作为打印墨水,则保护层优选含氧基团组成的醚基的水性膜层。(S121) Protection layer selection. The protective layer is to choose a hydrophobic or hydrophilic film layer according to the water or oiliness of the inkjet printing ink. If the inkjet printing ink is water-based ink, the protective layer is a hydrophobic film layer; otherwise, when the inkjet printing ink is oily ink, the protective layer is a hydrophilic film layer. Inkjet printing inks include hydrophilic groups containing carboxylic acid groups, sulfonic acid groups, sulfuric acid groups and phosphoric acid groups, or ether groups composed of oxygen-containing groups, hydroxyl groups and carboxylate, block polyethers and other groups containing amino groups and quaternary ammonium groups. Water-based inks with groups and oil-based inks containing alkane groups, cycloalkane groups, and aromatic hydrocarbon groups. In this embodiment, naphthene-based oily ink is preferred as the printing ink, and the protective layer is preferably an ether-based aqueous film layer composed of oxygen-containing groups.

(S122)保护层涂覆。保护层是一层厚度为10纳米-10微米的均匀水性膜层,其涂覆方法包括印刷、旋涂、贴膜、物理气相沉积或化学气相沉积。本实施例优选旋涂方法在基板11表面涂覆一层厚度为2微米的保护层12,如图3所示。(S122) Protective layer coating. The protective layer is a uniform water-based film layer with a thickness of 10 nanometers to 10 microns, and its coating method includes printing, spin coating, film sticking, physical vapor deposition or chemical vapor deposition. In this embodiment, the spin coating method is preferred to coat a protective layer 12 with a thickness of 2 microns on the surface of the substrate 11 , as shown in FIG. 3 .

(S123)保护层烘烤。将步骤(S122)得到的基板放置于85℃的烘烤箱内烘烤30min。(S123) Baking the protective layer. Place the substrate obtained in step (S122) in a baking oven at 85° C. and bake for 30 minutes.

(S13)将所述保护层12加工成图形化储液槽阵列13,如图4所示。所述储液槽阵列是由沿水平方向交错平行均匀分布在所述基板表面的若干个储液槽和垂直方向交错平行均匀分布在所述基板表面的若干个储液槽组成 ,相邻储液槽的距离为10纳米-500微米。储液槽的宽度a为10微米-2000微米,长度b为10微米-2000微米,深度h为10纳米-3微米,其结构可为长方形、正方形、圆形或其它不规则图形。所述储液槽可沿深度方向四周倾斜,储液槽倾斜面与基板水平面所构成的角为30°-90°。所述储液槽也可沿深度方向可加工成弧形,其曲率半径r范围在深度h-长度b(a>b)或深度h-宽度a(a<b)之间。制造方法包含贴膜、镀膜、湿法刻蚀、喷砂、激光加工、喷墨打印、3D打印、丝网印刷和微接触印刷。本实施例优选喷砂工艺对所述保护层12进行加工,通过控制喷砂工艺最后形成如图1所示和图4所示的储液槽阵列13。其中,水平与垂直方向的储液槽131相距为100 微米。每个储液槽131的长度a和宽度b都为250 微米、深度h为2 微米、储液槽倾斜面与基板11成60°的矩形储液槽阵列。( S13 ) Processing the protective layer 12 into a patterned reservoir array 13 , as shown in FIG. 4 . The array of liquid storage tanks is composed of several liquid storage tanks that are evenly distributed on the surface of the substrate along the horizontal direction and several liquid storage tanks that are uniformly distributed on the surface of the substrate in a vertical direction. The distance of the grooves is from 10 nanometers to 500 micrometers. The width a of the reservoir is 10 microns-2000 microns, the length b is 10 microns-2000 microns, the depth h is 10 nanometers-3 microns, and its structure can be rectangular, square, circular or other irregular figures. The liquid storage tank can be inclined around along the depth direction, and the angle formed by the inclined surface of the liquid storage tank and the horizontal plane of the substrate is 30°-90°. The liquid storage tank can also be processed into an arc along the depth direction, and the range of the curvature radius r is between depth h-length b (a>b) or depth h-width a (a<b). Manufacturing methods include lamination, coating, wet etching, sandblasting, laser processing, inkjet printing, 3D printing, screen printing, and microcontact printing. In this embodiment, the protective layer 12 is preferably processed by a sandblasting process, and the liquid storage tank array 13 as shown in FIG. 1 and FIG. 4 is finally formed by controlling the sandblasting process. Wherein, the distance between the horizontal and vertical liquid reservoirs 131 is 100 microns. The length a and width b of each reservoir 131 are 250 microns, the depth h is 2 microns, and the inclined surface of the reservoir 131 is a rectangular reservoir array formed at 60° to the substrate 11 .

(S14)在所述储液槽阵列底部填充一层过渡层14,如图5所示。所述过渡层14是与上所述保护层12化学特性相反的材料;其中,所述过渡层14的厚度小于所述储液槽131深度h,其厚度为1纳米-1微米之间。所述过渡层的制造方法包括贴膜、物理气相沉积或化学气相沉积、喷墨打印、3D打印、丝网印刷、微接触印刷。本实施中优选喷墨打印技术在所述储液槽阵列13底部制造一层厚度为200纳米的芳香烃基基团的过渡层14。(S14) Filling a transition layer 14 at the bottom of the reservoir array, as shown in FIG. 5 . The transition layer 14 is a material opposite in chemical properties to the protective layer 12; wherein, the thickness of the transition layer 14 is less than the depth h of the reservoir 131, and its thickness is between 1 nanometer and 1 micron. The manufacturing method of the transition layer includes film sticking, physical vapor deposition or chemical vapor deposition, inkjet printing, 3D printing, screen printing, and micro-contact printing. In this implementation, inkjet printing technology is preferred to manufacture a transition layer 14 of aromatic hydrocarbon groups with a thickness of 200 nanometers at the bottom of the reservoir array 13 .

(S15)往过渡层表面填充可打印材料15。利用喷墨打印技术在所述过渡层14表面填充可打印材料15,实现打印层的图形化。本实施例中优选利用喷墨打印设备(Jetlab2),通过控制打印参数,向涂覆有过渡层14的储液槽阵列13里填充环烷烃基打印材料15,其中图形化墨水的上表面低于所述保护层12或者与所述保护层12同处一水平面,从而实现图形化喷墨打印,如图6所示。(S15) Filling the surface of the transition layer with printable material 15 . The surface of the transition layer 14 is filled with a printable material 15 using inkjet printing technology to realize patterning of the printing layer. In this embodiment, an inkjet printing device (Jetlab2) is preferably used to fill the reservoir array 13 coated with the transition layer 14 with naphthene-based printing material 15 by controlling the printing parameters, wherein the upper surface of the patterned ink is lower than The protective layer 12 may be on the same level as the protective layer 12, so as to realize patterned inkjet printing, as shown in FIG. 6 .

至此,一种实现图形化喷墨打印精细障壁阵列的制造完成。So far, the manufacture of a patterned inkjet printing fine barrier array has been completed.

实施例二Embodiment two

下面结合图8-14对本发明第二实施例的一种实现图形化喷墨打印精细化障壁阵列及其制造方法进行详细介绍。其中,图8以及图9为本发明第二优选实施例的一种实现图形化喷墨打印精细障壁阵列的结构示意图和截面图。图10为本发明第二优选实施例的一种实现图形化喷墨打印精细障壁阵列的制造工艺流程图。图11-图14为本发明第二优选实施例的一种实现图形化喷墨打印精细障壁阵列的具体实施步骤示意图。A detailed barrier rib array for implementing patterned inkjet printing and a manufacturing method thereof according to the second embodiment of the present invention will be described in detail below with reference to FIGS. 8-14 . Among them, FIG. 8 and FIG. 9 are a schematic structural view and a cross-sectional view of a fine barrier rib array for patterned inkjet printing according to the second preferred embodiment of the present invention. FIG. 10 is a flow chart of a manufacturing process for patterned inkjet printing of fine barrier rib arrays according to the second preferred embodiment of the present invention. 11 to 14 are schematic diagrams of specific implementation steps for realizing patterned inkjet printing of fine barrier rib arrays according to the second preferred embodiment of the present invention.

请参考图10,并结合图11-14,对本发明第二实施例提供的一种实现图形化喷墨打印精细障壁阵列的制造方法进行详细的说明,具体包括以下步骤:Please refer to FIG. 10 , and in combination with FIGS. 11-14 , a detailed description of a manufacturing method for patterned inkjet printing fine barrier barrier array provided by the second embodiment of the present invention is provided, which specifically includes the following steps:

(S21)提供一基板11,对所述的基板进行清洗。选取一块所需尺寸的基板11,置于按体积比为Win-10 : DI水 = 3 : 97清洗液中,利用频率为32KHz的超声机清洗15min,喷淋2min后,再置于体积比为Win-41 : DI水 = 5 : 95清洗液中,利用频率为40KHz的超声机清洗10min,经循环自来水喷淋漂洗2min后,再利用频率为28KHz的超声机在DI纯净水中清洗10min,经氮气枪吹干后置于50℃洁净烘箱中保温30min以上备用。(S21) Provide a substrate 11, and clean the substrate. Select a substrate 11 of required size, place it in a cleaning solution with a volume ratio of Win-10: DI water = 3: 97, use an ultrasonic machine with a frequency of 32KHz to clean it for 15 minutes, spray it for 2 minutes, and then place it in a volume ratio of Win-41 : DI water = 5 : 95 cleaning solution, use an ultrasonic machine with a frequency of 40KHz to clean for 10 minutes, spray and rinse with circulating tap water for 2 minutes, then use an ultrasonic machine with a frequency of 28KHz to clean in DI pure water for 10 minutes, and pass through nitrogen After drying the gun, place it in a clean oven at 50°C for at least 30 minutes for further use.

(S22)在所述基板形成图形化的过渡层14,具体步骤如下:(S22) Forming a patterned transition layer 14 on the substrate, the specific steps are as follows:

(S221)过渡层选择。过渡层是根据喷墨打印墨水的水性或油性来选择亲水性或疏水性膜层。若喷墨打印墨水是水性墨水时,过渡层为亲水性膜层;反之,喷墨打印墨水是油性墨水时,过渡层为疏水性膜层。喷墨打印墨水包括含有羧酸基、磺酸基、硫酸基与磷酸基亲水基团或者由含氧基团组成的醚基和羟基与羧酸酯、嵌段聚醚及其他含有氨基、季铵基基团的水性墨水和含有链烷烃基、环烷烃基、芳香烃基基团的油性墨水。本实施例中优选环烷烃基的油性墨水作为打印墨水,则过渡层优选芳香烃基基团组成的油性膜层。(S221) Transition layer selection. The transition layer is to choose a hydrophilic or hydrophobic film layer according to the water or oiliness of the inkjet printing ink. If the inkjet printing ink is water-based ink, the transition layer is a hydrophilic film layer; otherwise, when the inkjet printing ink is oily ink, the transition layer is a hydrophobic film layer. Inkjet printing inks include hydrophilic groups containing carboxylic acid groups, sulfonic acid groups, sulfuric acid groups and phosphoric acid groups, or ether groups composed of oxygen-containing groups, hydroxyl groups and carboxylate, block polyethers and other groups containing amino groups and quaternary ammonium groups. Water-based inks with groups and oil-based inks containing alkane groups, cycloalkane groups, and aromatic hydrocarbon groups. In this embodiment, naphthene-based oily ink is preferred as the printing ink, and the transition layer is preferably an oily film layer composed of aromatic hydrocarbon-based groups.

(S222)图形化过渡层14制作。所述过渡层14的厚度小于所述储液槽131深度h,其厚度为1纳米-1微米之间。所述过渡层的制造方法包括贴膜、物理气相沉积或化学气相沉积、喷墨打印、3D打印、丝网印刷、微接触印刷。本实施中优选喷墨打印技术在所述储液槽阵列13底部制造一层厚度为200纳米的芳香烃基基团的过渡层14。( S222 ) Fabricate the patterned transition layer 14 . The thickness of the transition layer 14 is less than the depth h of the reservoir 131 , and its thickness is between 1 nanometer and 1 micrometer. The manufacturing method of the transition layer includes film sticking, physical vapor deposition or chemical vapor deposition, inkjet printing, 3D printing, screen printing, and micro-contact printing. In this implementation, inkjet printing technology is preferred to manufacture a transition layer 14 of aromatic hydrocarbon groups with a thickness of 200 nanometers at the bottom of the reservoir array 13 .

(S223)过渡层烘烤。将步骤(S222)得到的基板放置于105℃的烘烤箱内烘烤30min,形成图形化过渡层14,如图9所示。(S223) Baking the transition layer. Place the substrate obtained in step ( S222 ) in a baking oven at 105° C. and bake for 30 minutes to form a patterned transition layer 14 , as shown in FIG. 9 .

(S23)在过渡层表面涂覆一层保护层12。具体步骤如下:(S23) Coating a protective layer 12 on the surface of the transition layer. Specific steps are as follows:

(S231)保护层是根据喷墨打印墨水的水性或油性来选择疏水性或亲水性膜层。若喷墨打印墨水是水性墨水时,保护层为疏水性膜层;反之,喷墨打印墨水是油性墨水时,保护层为亲水性膜层。喷墨打印墨水包括含有羧酸基、磺酸基、硫酸基与磷酸基亲水基团或者由含氧基团组成的醚基和羟基与羧酸酯、嵌段聚醚及其他含有氨基、季铵基基团的水性墨水和含有链烷烃基、环烷烃基、芳香烃基基团的油性墨水。本实施例中优选环烷烃基的油性墨水作为打印墨水,则保护层优选含氧基团组成的醚基的水性膜层。(S231) The protective layer is a hydrophobic or hydrophilic film layer selected according to the water or oiliness of the inkjet printing ink. If the inkjet printing ink is water-based ink, the protective layer is a hydrophobic film layer; otherwise, when the inkjet printing ink is oily ink, the protective layer is a hydrophilic film layer. Inkjet printing inks include hydrophilic groups containing carboxylic acid groups, sulfonic acid groups, sulfuric acid groups and phosphoric acid groups, or ether groups composed of oxygen-containing groups, hydroxyl groups and carboxylate, block polyethers and other groups containing amino groups and quaternary ammonium groups. Water-based inks with groups and oil-based inks containing alkane groups, cycloalkane groups, and aromatic hydrocarbon groups. In this embodiment, naphthene-based oily ink is preferred as the printing ink, and the protective layer is preferably an ether-based aqueous film layer composed of oxygen-containing groups.

(S232)保护层涂覆。保护层是一层厚度为10纳米-10微米的均匀水性膜层,其涂覆方法包括印刷、旋涂、贴膜、物理气相沉积或化学气相沉积。本实施例优选旋涂方法在基板11表面涂覆一层厚度为2微米的保护层12,如图10所示。(S232) Protective layer coating. The protective layer is a uniform water-based film layer with a thickness of 10 nanometers to 10 microns, and its coating method includes printing, spin coating, film sticking, physical vapor deposition or chemical vapor deposition. In this embodiment, a protective layer 12 with a thickness of 2 microns is coated on the surface of the substrate 11 by the spin coating method, as shown in FIG. 10 .

(S223)保护层烘烤。将步骤(S222)得到的基板放置于85℃的烘烤箱内烘烤30min。(S223) Baking the protective layer. Place the substrate obtained in step (S222) in a baking oven at 85° C. and bake for 30 minutes.

(S24)将所述保护层12加工成图形化储液槽阵列13,如图11所示。所述储液槽阵列是由沿水平方向交错平行均匀分布在所述基板表面的若干个储液槽和垂直方向交错平行均匀分布在所述基板表面的若干个储液槽组成,相邻储液槽的距离为10纳米-500微米。储液槽的宽度a为10微米-2000微米,长度b为10微米-2000微米,深度h为10纳米-3微米,其结构可为长方形、正方形、圆形或其它不规则图形。所述储液槽可沿深度方向四周倾斜,储液槽倾斜面与基板水平面所构成的角为30°-90°。所述储液槽也可沿深度方向可加工成弧形,其曲率半径r范围在深度h-长度b(a>b)或深度h-宽度a(a<b)之间。制造方法包含贴膜、镀膜、湿法刻蚀、喷砂、激光加工、喷墨打印、3D打印、丝网印刷和微接触印刷。本实施例优选喷砂工艺对所述保护层12进行加工,通过控制喷砂工艺最后形成如图1所示和图4所示的储液槽阵列13。其中,水平与垂直方向的储液槽131相距为100 微米。每个储液槽131的长度a和宽度b都为250 微米、深度h为2 微米、曲率半径为180微米的弧形储液槽阵列。( S24 ) Process the protective layer 12 into a patterned reservoir array 13 , as shown in FIG. 11 . The array of liquid storage tanks is composed of several liquid storage tanks that are evenly distributed on the surface of the substrate along the horizontal direction and several liquid storage tanks that are uniformly distributed on the surface of the substrate in a vertical direction. The distance of the grooves is from 10 nanometers to 500 micrometers. The width a of the reservoir is 10 microns-2000 microns, the length b is 10 microns-2000 microns, the depth h is 10 nanometers-3 microns, and its structure can be rectangular, square, circular or other irregular figures. The liquid storage tank can be inclined around along the depth direction, and the angle formed by the inclined surface of the liquid storage tank and the horizontal plane of the substrate is 30°-90°. The liquid storage tank can also be processed into an arc along the depth direction, and the range of the curvature radius r is between depth h-length b (a>b) or depth h-width a (a<b). Manufacturing methods include lamination, coating, wet etching, sandblasting, laser processing, inkjet printing, 3D printing, screen printing, and microcontact printing. In this embodiment, the protective layer 12 is preferably processed by a sandblasting process, and the liquid storage tank array 13 as shown in FIG. 1 and FIG. 4 is finally formed by controlling the sandblasting process. Wherein, the distance between the horizontal and vertical liquid reservoirs 131 is 100 microns. Each storage tank 131 has a length a and a width b of 250 microns, a depth h of 2 microns, and an arc-shaped storage tank array with a radius of curvature of 180 microns.

(S25)往过渡层表面填充可打印材料15。利用喷墨打印技术在所述过渡层14表面填充可打印材料15,实现打印层的图形化。本实施例中优选利用喷墨打印设备(Jetlab2),通过控制打印参数,向涂覆有过渡层14的储液槽阵列13里填充环烷烃基打印材料15,其中图形化墨水的上表面低于所述保护层12或者与所述保护层12同处一水平面,从而实现图形化喷墨打印,如图12所示。(S25) Filling the surface of the transition layer with printable material 15 . The surface of the transition layer 14 is filled with a printable material 15 using inkjet printing technology to realize patterning of the printing layer. In this embodiment, an inkjet printing device (Jetlab2) is preferably used to fill the reservoir array 13 coated with the transition layer 14 with naphthene-based printing material 15 by controlling the printing parameters, wherein the upper surface of the patterned ink is lower than The protective layer 12 may be on the same level as the protective layer 12 , so as to realize patterned inkjet printing, as shown in FIG. 12 .

至此,一种实现图形化喷墨打印精细障壁阵列的制造完成。So far, the manufacture of a patterned inkjet printing fine barrier array has been completed.

本发明提供的一种用于喷墨打印精细图形化障壁阵列的制造方法不局限于上述实施例,上列较佳实施例,对本发明的目的、技术方案和优点进行了进一步详细说明,所应理解的是,以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。A manufacturing method for inkjet printing a finely patterned barrier rib array provided by the present invention is not limited to the above-mentioned embodiments. The above-listed preferred embodiments have further described the purpose, technical solutions and advantages of the present invention in detail. It is understood that the above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall include Within the protection scope of the present invention.

Claims (19)

1. one kind realizes the fine barrier array of graphical inkjet printing, it is characterised in that including:Several are arranged on a substrate Surface and reservoir in array distribution and it is correspondingly arranged in the transition zone of the liquid storage trench bottom;Between the reservoir Distance is 10 nanometers to 500 microns;Reservoir inner circumferential side is cambered surface, and inner circumferential side radius of curvature r according to Width a, the length b of liquid storage groove bottom cross section and the liquid storage groove depth h determine span;As width a>During length b, The radius of curvature r spans are:Depth h- length b;As width a<During length b, the radius of curvature r spans are: Depth h- width a.
2. one kind according to claim 1 realizes the fine barrier array of graphical inkjet printing, it is characterised in that the storage The width a of liquid bath bottom surface cross section is 10 microns to 2000 microns, and length b is 10 microns to 2000 microns, the liquid storage groove depth It is 10 nanometers to 10 microns to spend h.
3. one kind according to claim 1 realizes the fine barrier array of graphical inkjet printing, it is characterised in that the storage Liquid bath inner circumferential side is plane, and inner circumferential side and the angle of the substrate are 30 degree to 90 degree.
4. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing, it is characterised in that real in accordance with the following steps It is existing:
Step S1:One substrate is provided;
Step S2:Layer protective layer is coated on the substrate;
Step S3:The protective layer is processed into graphically and in array distribution reservoir;The reservoir adds along depth direction Work camber, its radius of curvature r scopes are between depth h- length b or depth h- width a;
Step S4:One layer of transition zone of the underfill of reservoir in the reservoir array;The transition zone uses material Chemical characteristic it is opposite with the upper protective layer;
Step S5:Using inkjet technology in the printable material of transition layer surface filling, the graphical of printable layer is realized.
5. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 4, its feature It is, the ink-jet printing ink includes water-base ink and oily ink;The water-base ink is by containing carboxylic acid group, sulfonic acid Base, sulfate and phosphate hydrophilic radical or the ether being made up of oxy radical, hydroxyl, carboxylate, block polyether and contain ammonia The material of base, quaternary ammonium group group;The oily ink be containing alkenyl group, cycloalkyl group, aryl radical group material.
6. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 4, its feature It is, the protective layer hydrophobicity or hydrophilic film is selected according to the aqueous or oiliness of the ink-jet printing ink;If described Ink-jet printing ink is water-base ink, then the protective layer is hydrophobic film layer;If the ink-jet printing ink is oily ink, Then the protective layer is hydrophilic film.
7. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 6, its feature It is, the protective layer is the uniform film layer that a layer thickness is 10 nanometers to 10 microns;The manufacture method of the protective layer includes Printing, spin coating, pad pasting, physical vapour deposition (PVD) or chemical vapor deposition.
8. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 4, its feature It is, the manufacture method of the reservoir array includes pad pasting, plated film, wet etching, sandblasting, Laser Processing, inkjet printing, 3D Printing, silk-screen printing and micro-contact printing.
9. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 4, its feature It is, the transition zone is a kind of film layer opposite with the protective layer chemical property;If the protective layer is hydrophobic film layer, Then the transition zone is hydrophilic film;Conversely, the protective layer is hydrophilic film, then the transition zone is hydrophobic film Layer.
10. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 9, its feature It is, the thickness of the transition zone is less than liquid storage groove depth h, and its thickness is 1 nanometer to 1 micron;The manufacturer of the transition zone Method includes pad pasting, physical vapour deposition (PVD) or chemical vapor deposition, inkjet printing, 3D printing, silk-screen printing, micro-contact printing.
11. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 4, its feature It is, the ink-jet printing ink is filled in the transition layer surface under ink-jet printer effect, so as to realize graphical spray Ink printing;The upper surface of the graphical ink exists together a horizontal plane less than the protective layer or with the protective layer.
12. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing, it is characterised in that real in accordance with the following steps It is existing:
Step S1:One substrate is provided;
Step S2:The transition zone of a layer pattern is made on the substrate;Selected according to the aqueous or oiliness of ink-jet printing ink It is hydrophilic film or hydrophobic film layer to select the transition zone;
Step S3:Layer protective layer is coated in the transition layer surface, the protective layer is and the transition zone chemical characteristic phase Anti- material;
Step S4:The protective layer is processed into graphically and in array distribution reservoir;The reservoir adds along depth direction Work camber, its radius of curvature r scopes are between depth h- length b or depth h- width a;
Step S5:Using inkjet technology in the printable material of transition layer surface filling, the graphical of printable layer is realized.
13. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 12, it is special Levy and be, the ink-jet printing ink includes water-base ink and oily ink;The water-base ink is by containing carboxylic acid group, sulphur Acidic group, sulfate and phosphate hydrophilic radical or the ether being made up of oxy radical, hydroxyl, carboxylate, block polyether and contain The material of amino, quaternary ammonium group group;The oily ink be containing alkenyl group, cycloalkyl group, aryl radical group material.
14. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 12, it is special Levy and be, the protective layer hydrophobicity or hydrophilic film are selected according to the aqueous or oiliness of the ink-jet printing ink;If institute It is water-base ink to state ink-jet printing ink, then the protective layer is hydrophobic film layer;If the ink-jet printing ink is oiliness ink Water, then the protective layer is hydrophilic film.
15. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 14, it is special Levy and be, the protective layer is the uniform film layer that a layer thickness is 10 nanometers to 10 microns;The manufacture method bag of the protective layer Include printing, spin coating, pad pasting, physical vapour deposition (PVD) or chemical vapor deposition.
16. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 12, it is special Levy and be, the manufacture method of the reservoir array comprising pad pasting, plated film, wet etching, sandblasting, Laser Processing, inkjet printing, 3D printing, silk-screen printing and micro-contact printing.
17. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 12, it is special Levy and be, the transition zone is a kind of film layer opposite with the protective layer chemical property;If the protective layer is hydrophobic film Layer, then the transition zone is hydrophilic film;Conversely, the protective layer is hydrophilic film, then the transition zone is hydrophobicity Film layer.
18. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 17, it is special Levy and be, the thickness of the transition zone is less than liquid storage groove depth h, and its thickness is 1 nanometer to 1 micron;The manufacture of the transition zone Method includes pad pasting, physical vapour deposition (PVD) or chemical vapor deposition, inkjet printing, 3D printing, silk-screen printing, micro-contact printing.
19. a kind of manufacture method for realizing the fine barrier array of graphical inkjet printing according to claim 12, it is special Levy and be, the ink-jet printing ink is filled in the transition layer surface under ink-jet printer effect, so as to realize graphical Inkjet printing;The upper surface of the graphical ink exists together a horizontal plane less than the protective layer or with the protective layer.
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