CN105665377B - A kind of gas circuit purging system and cleaning method - Google Patents
A kind of gas circuit purging system and cleaning method Download PDFInfo
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- CN105665377B CN105665377B CN201610023789.1A CN201610023789A CN105665377B CN 105665377 B CN105665377 B CN 105665377B CN 201610023789 A CN201610023789 A CN 201610023789A CN 105665377 B CN105665377 B CN 105665377B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 98
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000010926 purge Methods 0.000 title claims description 20
- 238000010790 dilution Methods 0.000 claims abstract description 46
- 239000012895 dilution Substances 0.000 claims abstract description 46
- 238000001514 detection method Methods 0.000 claims abstract description 22
- 239000007789 gas Substances 0.000 claims description 358
- 239000003085 diluting agent Substances 0.000 claims description 6
- 238000012360 testing method Methods 0.000 claims description 6
- 239000012159 carrier gas Substances 0.000 claims description 2
- 238000007865 diluting Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 8
- 230000005540 biological transmission Effects 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 238000009826 distribution Methods 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000001035 drying Methods 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 210000003437 trachea Anatomy 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
- B08B9/027—Cleaning the internal surfaces; Removal of blockages
- B08B9/032—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
- B08B9/0321—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing using pressurised, pulsating or purging fluid
- B08B9/0328—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing using pressurised, pulsating or purging fluid by purging the pipe with a gas or a mixture of gas and liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2209/00—Details of machines or methods for cleaning hollow articles
- B08B2209/02—Details of apparatuses or methods for cleaning pipes or tubes
- B08B2209/027—Details of apparatuses or methods for cleaning pipes or tubes for cleaning the internal surfaces
- B08B2209/032—Details of apparatuses or methods for cleaning pipes or tubes for cleaning the internal surfaces by the mechanical action of a moving fluid
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
本发明提供一种气路清洗系统包括以下部件：待测气源、稀释气源、清洗气源、气体混合装置、气体检测装置、多个阀门以及用于各部件间气体传输的气体管路；各待测气源连接于所述气体混合装置，气体混合装置有至少三个进气口和至少一个出气口，出气口与气体检测装置连接，第一进气口通过阀门与待测气源以及稀释气源连接，第二进气口通过阀门与稀释气源连接，第三进气口通过阀门和清洗气源连接。本发明还提供一种所述清洗系统的气路清洗方法，用于解决现有技术中不能使用较大流速的气体进行清洗，导致清洗时间较长、清洗效果欠佳的问题。
The present invention provides a gas path cleaning system comprising the following components: a gas source to be tested, a dilution gas source, a cleaning gas source, a gas mixing device, a gas detection device, a plurality of valves, and a gas pipeline for gas transmission between the components; Each gas source to be tested is connected to the gas mixing device, the gas mixing device has at least three gas inlets and at least one gas outlet, the gas outlet is connected to the gas detection device, the first gas inlet is connected to the gas source to be tested and the The dilution gas source is connected, the second air inlet is connected with the dilution air source through a valve, and the third air inlet is connected with the cleaning gas source through a valve. The present invention also provides a gas path cleaning method of the cleaning system, which is used to solve the problems in the prior art that a gas with a relatively high flow rate cannot be used for cleaning, resulting in long cleaning time and poor cleaning effect.
Description
技术领域technical field
本发明涉及一种气路清洗系统及清洗方法，特别是涉及一种用于动态配气气路的二级清洗系统及清洗方法。The invention relates to a gas path cleaning system and a cleaning method, in particular to a secondary cleaning system and a cleaning method for a dynamic gas distribution gas path.
背景技术Background technique
气体检测实验，例如气敏传感器测试、气体吸附剂测试、汽车尾气或轮船尾气模拟等，通常需要配备动态配气气路。在测定一个样品后或实验结束后，气路需要进行清理，以便进行下一个样品测试或下一次实验；另外，很多实验涉及腐蚀性气体，如硫化氢、氯化氢等，出于对设备使用寿命的考虑，尤其是高精度的质量流量计，清洗气路、保持干燥都是非常有必要的。Gas detection experiments, such as gas sensor testing, gas adsorbent testing, vehicle exhaust or ship exhaust simulation, etc., usually require a dynamic gas distribution circuit. After measuring a sample or after the experiment is over, the gas path needs to be cleaned in order to carry out the next sample test or the next experiment; in addition, many experiments involve corrosive gases, such as hydrogen sulfide, hydrogen chloride, etc., for the sake of equipment life Considering, especially for high-precision mass flow meters, it is very necessary to clean the gas circuit and keep it dry.
通常采用的气路清洗方法是：直接使用稀释气，通常为氮气或干燥空气，对整套设备进行清洗，但是该方法必然会经过流量计等不适合用较大流速的气体进行清洗的部件，导致清洗时间较长、清洗效果欠佳。由于清洗流量受到限制，导致传感器脱附气体速度慢，不适合大量采集样本数据。因此，也有实验者将流量计等部件卸下，加大载气流量，对气路管路和流量计等部件分开清洗，但该方法操作繁琐，且频繁拆卸流量计等部件易造成损坏和潮湿引起的腐蚀。The commonly used gas path cleaning method is: directly use diluent gas, usually nitrogen or dry air, to clean the entire set of equipment, but this method will inevitably pass through parts such as flow meters that are not suitable for cleaning with a large flow rate of gas, resulting in The cleaning time is longer and the cleaning effect is not good. Due to the limited cleaning flow rate, the gas desorption speed of the sensor is slow, which is not suitable for collecting a large number of sample data. Therefore, some experimenters remove the flowmeter and other components, increase the flow rate of the carrier gas, and clean the gas pipeline and flowmeter and other components separately. caused corrosion.
因此，开发出一套高效的动态配气气路清洗系统，既能保证清洗工作的的快速便捷，又能维护仪器设备的长期稳定，对气体检测实验的发展具有十分重要的意义。Therefore, it is of great significance for the development of gas detection experiments to develop an efficient dynamic gas distribution gas path cleaning system, which can not only ensure the fast and convenient cleaning work, but also maintain the long-term stability of the equipment.
发明内容Contents of the invention
鉴于以上所述现有技术的缺点，本发明的目的在于提供一种气路清洗系统及清洗方法，用于解决现有技术中不能使用较大流速的气体进行清洗，导致清洗时间较长、清洗效果欠佳的问题。In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a gas path cleaning system and cleaning method, which is used to solve the problem that the gas with a relatively large flow rate cannot be used for cleaning in the prior art, resulting in long cleaning time and poor cleaning efficiency. Problems with poor performance.
为实现上述目的及其他相关目的，本发明提供一种气路清洗系统包括以下部件：待测气源、稀释气源、清洗气源、气体混合装置、气体检测装置、多个阀门以及用于各部件间气体传输的气体管路。各待测气源连接于所述气体混合装置，所述气体混合装置有至少三个进气口和至少一个出气口，所述出气口与所述气体检测装置连接，第一进气口通过阀门与待测气源以及稀释气源连接，第二进气口通过阀门与稀释气源连接，第三进气口通过阀门和清洗气源连接。In order to achieve the above purpose and other related purposes, the present invention provides a gas path cleaning system including the following components: a gas source to be tested, a dilution gas source, a cleaning gas source, a gas mixing device, a gas detection device, multiple valves and various Gas lines for gas transfer between components. Each gas source to be tested is connected to the gas mixing device, the gas mixing device has at least three gas inlets and at least one gas outlet, the gas outlet is connected to the gas detection device, and the first gas inlet passes through a valve It is connected with the gas source to be tested and the dilution gas source, the second inlet is connected with the dilution gas source through a valve, and the third inlet is connected with the cleaning gas source through a valve.
优选地，第一阀门设置于所述稀释气源以及待测气源之间的气体管路，第二阀门设置于所述待测气源以及气体混合装置第一进气口之间的气体管路，第三阀门设置于所述稀释气源以及气体混合装置第二进气口之间的气体管路，第四阀门设置于所述清洗气源以及气体混合装置第三进气口之间的气体管路。Preferably, the first valve is set on the gas line between the dilution gas source and the gas source to be tested, and the second valve is set on the gas line between the gas source to be tested and the first air inlet of the gas mixing device. The third valve is set in the gas pipeline between the dilution gas source and the second gas inlet of the gas mixing device, and the fourth valve is set in the gas pipeline between the cleaning gas source and the third gas inlet of the gas mixing device gas lines.
优选地，还包括多个气体流量控制装置，第一气体流量控制装置设置于所述待测气源以及所述气体混合装置第一进气口之间的气体管路，第二气体流量控制装置设置于所述稀释气源以及所述气体混合装置第二进气口之间的气体管路。Preferably, it also includes a plurality of gas flow control devices, the first gas flow control device is arranged on the gas pipeline between the gas source to be tested and the first air inlet of the gas mixing device, and the second gas flow control device A gas pipeline arranged between the dilution gas source and the second gas inlet of the gas mixing device.
优选地，气体检测装置通过可拆卸接头与气泵连接。Preferably, the gas detection device is connected to the gas pump through a detachable joint.
优选地，气体流量控制装置为带流量控制功能的质量流量计。Preferably, the gas flow control device is a mass flow meter with flow control function.
优选地，清洗气源与稀释气源的气源相同。Preferably, the purge gas source is the same as the dilution gas source.
优选地，所述阀门为多个手动阀门和多个自动阀门的组合。Preferably, the valve is a combination of multiple manual valves and multiple automatic valves.
本发明还提供一种所述清洗系统的气路清洗方法：步骤一，关闭第四阀门，其余阀门开启，打开稀释气源，稀释气源释放稀释气体，稀释气体通过第一阀门、第二阀门和第三阀门进入气体管路进行清洗；步骤二，停止稀释气体通入，关闭第一阀门、第二阀门和第三阀门，打开第四阀门，打开清洗气源，清洗气源释放清洗气体，清洗气体通过第四阀门进入气体管路进行清洗。The present invention also provides a gas path cleaning method of the cleaning system: step 1, close the fourth valve, open the other valves, open the dilution gas source, the dilution gas source releases the dilution gas, and the dilution gas passes through the first valve and the second valve and the third valve enter the gas pipeline for cleaning; step 2, stop the dilution gas feeding, close the first valve, the second valve and the third valve, open the fourth valve, open the cleaning gas source, and release the cleaning gas from the cleaning gas source, The cleaning gas enters the gas pipeline through the fourth valve for cleaning.
优选地，步骤二中，打开清洗气源前，还包括通过可拆卸接头连接气泵的步骤。Preferably, in step 2, before turning on the cleaning gas source, a step of connecting an air pump through a detachable joint is also included.
优选地，气路清洗步骤之前，还包括气体检测步骤，关闭第一阀门和第四阀门，其余阀门开启，释放稀释气体和待测气体；待测气体通过第二阀门进入气体混合装置；稀释气源释放稀释气体，稀释气体通过第三阀门进入气体混合装置和待测气体混合形成混合气体，所述混合气体进入气体检测装置检测和传感器反应，产生电信号输出。Preferably, before the gas path cleaning step, a gas detection step is also included, the first valve and the fourth valve are closed, and the remaining valves are opened to release the dilution gas and the gas to be tested; the gas to be tested enters the gas mixing device through the second valve; the dilution gas The source releases the diluted gas, and the diluted gas enters the gas mixing device through the third valve and mixes with the gas to be measured to form a mixed gas, and the mixed gas enters the gas detection device for detection and sensor reaction, and generates an electrical signal output.
如上所述，本发明的一种气路清洗系统及清洗方法，具有以下有益效果：As mentioned above, a gas path cleaning system and cleaning method of the present invention has the following beneficial effects:
1)本发明的气路清洗装置可以大幅度减少清洗时间，清洗气体清洗过程持续不超过10分钟即可实现对配气气路的清洗，与通常半小时以上的清洗时间相比，清洗时间缩短至1/3甚至更少。1) The gas circuit cleaning device of the present invention can greatly reduce the cleaning time, and the cleaning process of the gas cleaning process lasts no more than 10 minutes to realize the cleaning of the gas distribution gas circuit. Compared with the usual cleaning time of more than half an hour, the cleaning time is shortened to 1/3 or even less.
2)本发明先用稀释气体对连接有气体流量控制装置的气路进行小流量清洗，即一级清洗；再用清洗气体对其余气路和腔室进行大流量快速清洗，即二级清洗。本发明大幅度减少清洗时间的同时，可以避免流量过大对设备造成影响甚至损坏。2) In the present invention, the gas circuit connected with the gas flow control device is firstly cleaned with a small flow rate, i.e. primary cleaning; and then the rest of the gas channels and chambers are quickly cleaned with a large flow rate, i.e. secondary cleaning. The invention greatly reduces the cleaning time, and at the same time, can avoid the influence or even damage of the equipment caused by the excessive flow rate.
3)本发明通过大流量的清洗气体气流冲击，使得管路和腔室内壁的残余气体被冲洗的更加彻底。3) In the present invention, the residual gas in the pipeline and the inner wall of the chamber is washed more thoroughly through the impact of a large flow of cleaning gas flow.
附图说明Description of drawings
图1显示为本发明的一种气路清洗系统示意图。Fig. 1 shows a schematic diagram of an air path cleaning system of the present invention.
元件标号说明Component designation description
1 稀释气源1 Dilution gas source
2 待测气源2 Gas source to be tested
301 第一气体流量控制装置301 First gas flow control device
302 第二气体流量控制装置302 Second gas flow control device
4 四通管4 cross pipe
5 气体混合装置5 Gas mixing device
6 清洗气源6 Purge air source
7 气体检测装置7 Gas detection device
8 可拆卸接头8 detachable joints
9 气泵9 air pump
101-103 第一阀门101-103 First valve
104-106 第二阀门104-106 Second valve
109 第三阀门109 third valve
107 第四阀门107 Fourth valve
具体实施方式Detailed ways
以下由特定的具体实施例说明本发明的实施方式，熟悉此技术的人士可由本说明书所揭露的内容轻易地了解本发明的其他优点及功效。The implementation of the present invention will be illustrated by specific specific examples below, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification.
请参阅图1。须知，本说明书所附图式所绘示的结构、比例、大小等，均仅用以配合说明书所揭示的内容，以供熟悉此技术的人士了解与阅读，并非用以限定本发明可实施的限定条件，故不具技术上的实质意义，任何结构的修饰、比例关系的改变或大小的调整，在不影响本发明所能产生的功效及所能达成的目的下，均应仍落在本发明所揭示的技术内容得能涵盖的范围内。同时，本说明书中所引用的如“上”、“下”、“左”、“右”、“中间”及“一”等的用语，亦仅为便于叙述的明了，而非用以限定本发明可实施的范围，其相对关系的改变或调整，在无实质变更技术内容下，当亦视为本发明可实施的范畴。See Figure 1. It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification, for those who are familiar with this technology to understand and read, and are not used to limit the implementation of the present invention. Limiting conditions, so there is no technical substantive meaning, any modification of structure, change of proportional relationship or adjustment of size, without affecting the effect and purpose of the present invention, should still fall within the scope of the present invention. The disclosed technical content must be within the scope covered. At the same time, terms such as "upper", "lower", "left", "right", "middle" and "one" quoted in this specification are only for the convenience of description and are not used to limit this specification. The practicable scope of the invention and the change or adjustment of its relative relationship shall also be regarded as the practicable scope of the present invention without any substantial change in the technical content.
实施例一Embodiment one
如图1所示，本发明提供一种气路清洗系统包括：待测气源2、稀释气源1、清洗气源6、气体混合装置5、气体检测装置7、多个阀门以及用于各部件间气体传输的气体管路。其中，待测气源2、稀释气源1和清洗气源6中的一种或多种采用高压气体钢瓶储存，钢瓶自带减压阀门。稀释气体1和清洗气体6均为高纯氮气，待测气体2为浓度在1～1000ppm的以氮气作为平衡气的三种标准气体二氧化硫、二氧化氮和一氧化氮。清洗气源6与稀释气源1的气体种类相同。清洗气体除本实施例中所采用的氮气，还可以为纯净空气、氩气，或者其它的惰性气体，但应保证气体的洁净和干燥，可以通过加装气体干燥装置保证气体干燥。As shown in Figure 1, the present invention provides a gas path cleaning system including: a gas source to be tested 2, a dilution gas source 1, a cleaning gas source 6, a gas mixing device 5, a gas detection device 7, a plurality of valves and various Gas lines for gas transfer between components. Among them, one or more of the gas source 2 to be tested, the dilution gas source 1 and the cleaning gas source 6 are stored in high-pressure gas cylinders, and the cylinders have their own decompression valves. The dilution gas 1 and the cleaning gas 6 are high-purity nitrogen, and the gas to be tested 2 is three standard gases sulfur dioxide, nitrogen dioxide and nitrogen monoxide with a concentration of 1-1000 ppm and nitrogen as a balance gas. The gas type of the cleaning gas source 6 is the same as that of the dilution gas source 1 . In addition to the nitrogen used in this embodiment, the cleaning gas can also be pure air, argon, or other inert gases, but the cleanness and dryness of the gas should be ensured, and the gas drying can be ensured by installing a gas drying device.
各待测气源2连接于气体混合装置5，气体混合装置5有至少三个进气口和至少一个出气口，气体混合装置5的出气口与气体检测装置7连接，第一进气口通过阀门与待测气源2以及稀释气源1连接，第二进气口通过阀门与稀释气源1连接，第三进气口通过阀门和清洗气源6连接。Each gas source 2 to be tested is connected to a gas mixing device 5, the gas mixing device 5 has at least three gas inlets and at least one gas outlet, the gas outlet of the gas mixing device 5 is connected to the gas detection device 7, and the first gas inlet passes through The valve is connected to the gas source 2 to be tested and the dilution gas source 1 , the second air inlet is connected to the dilution air source 1 through the valve, and the third air inlet is connected to the cleaning gas source 6 through the valve.
其中，三个第一阀门(阀门101、阀门102、阀门103)设置于稀释气源1以及待测气源2之间的气体管路，三个第二阀门(阀门104、阀门105和阀门106)设置于待测气源2以及气体混合装置5第一进气口之间的气体管路，一个第三阀门109设置于稀释气源1以及气体混合装置5第二进气口之间的气体管路，一个第四阀门107设置于清洗气源6以及气体混合装置5第三进气口之间的气体管路。Among them, three first valves (valve 101, valve 102, valve 103) are arranged in the gas pipeline between the dilution gas source 1 and the gas source 2 to be tested, and three second valves (valve 104, valve 105 and valve 106 ) is arranged on the gas pipeline between the gas source 2 to be measured and the first air inlet of the gas mixing device 5, and a third valve 109 is arranged on the gas line between the dilution gas source 1 and the second air inlet of the gas mixing device 5 In the pipeline, a fourth valve 107 is arranged in the gas pipeline between the cleaning gas source 6 and the third air inlet of the gas mixing device 5 .
进一步，还包括多个气体流量控制装置，三个第一气体流量控制装置301设置于待测气源2以及气体混合装置5第一进气口之间的气体管路，一个第二气体流量控制装置302设置于稀释气源1以及气体混合装置5第二进气口之间的气体管路。所述第二气体流量控制装置302的量程大于等于第一气体流量控制装置301的量程。具体的，第一气体流量控制装置301量程为0～10sccm，第二气体流量控制装置302量程为0～3slm。气体流量控制装置为带流量控制功能的质量流量控制装置。Further, it also includes a plurality of gas flow control devices, three first gas flow control devices 301 are arranged in the gas pipeline between the gas source 2 to be tested and the first air inlet of the gas mixing device 5, and one second gas flow control device The device 302 is arranged in the gas pipeline between the dilution gas source 1 and the second gas inlet of the gas mixing device 5 . The range of the second gas flow control device 302 is greater than or equal to the range of the first gas flow control device 301 . Specifically, the range of the first gas flow control device 301 is 0-10 sccm, and the range of the second gas flow control device 302 is 0-3 slm. The gas flow control device is a mass flow control device with flow control function.
具体的，气体混合装置5出气口、阀门、气体检测装置7、阀门依次相连构成第一气体输出气路。稀释气源1、第一阀门、第一气体流量控制装置301、第二阀门、气体混合装置5第一进气口依次相连构成第一气路输入气路；待测气源2、第一气体流量控制装置301、第二阀门、气体混合装置5第一进气口依次相连构成第二气体输入气路；稀释气源1、第二气体流量控制装置302、第三阀门109、气体混合装置5第二进气口依次相连构成第三气体输入气路；清洗气源6、第四阀门107、气体混合装置5第三进气口依次相连构成第四气路输入气路。Specifically, the gas outlet of the gas mixing device 5, the valve, the gas detection device 7, and the valve are sequentially connected to form the first gas output gas path. The dilution gas source 1, the first valve, the first gas flow control device 301, the second valve, and the first air inlet of the gas mixing device 5 are sequentially connected to form the first gas circuit input gas circuit; the gas source to be tested 2, the first gas The flow control device 301, the second valve, and the first air inlet of the gas mixing device 5 are sequentially connected to form the second gas input gas path; the dilution gas source 1, the second gas flow control device 302, the third valve 109, and the gas mixing device 5 The second air inlets are connected in sequence to form the third gas input gas path; the cleaning gas source 6, the fourth valve 107, and the third air inlet of the gas mixing device 5 are connected in sequence to form the fourth gas path input gas path.
进一步，阀门为多个手动阀门和多个自动阀门的组合。自动阀门可以为电磁阀门，电磁阀门可以由一个开关统一控制，便于快速切换气体。手动阀门可以为普通旋钮式阀门，安全可靠。Further, the valve is a combination of multiple manual valves and multiple automatic valves. The automatic valve can be an electromagnetic valve, and the electromagnetic valve can be uniformly controlled by a switch, which is convenient for switching gases quickly. The manual valve can be an ordinary knob valve, which is safe and reliable.
值得一提的是，气体混合装置5第一进气口通过四通管4连接待测气体2的混合气体，待测气体先进入四通管预混合，再进入气体混合装置与稀释气体混合，能减少气体浓度的波动，有助于混合更快速，更均匀。It is worth mentioning that the first air inlet of the gas mixing device 5 is connected to the mixed gas of the gas to be measured 2 through the four-way pipe 4, and the gas to be measured first enters the four-way pipe for pre-mixing, and then enters the gas mixing device to mix with the diluted gas. It can reduce the fluctuation of gas concentration and help to mix faster and more uniformly.
进一步，气体检测装置7还可以通过可拆卸接头8与气泵9连接。气泵9采用无油静音真空气泵9，气泵9前端设有可拆卸接头8，可根据洗气的需要选择使用。Further, the gas detection device 7 can also be connected with the gas pump 9 through the detachable joint 8 . The air pump 9 adopts an oil-free silent vacuum air pump 9, and the front end of the air pump 9 is provided with a detachable joint 8, which can be selected and used according to the needs of air washing.
进一步，清洗气路管路中还可以根据用户需要加装其它部件(例如干燥器、加湿器、紫外线等)，对气体进行其它处理(例如干燥化、湿化、杀菌等等)，以便于达到更好的清洗效果。Further, other components (such as dryers, humidifiers, ultraviolet rays, etc.) can be added to the cleaning gas pipeline according to user needs, and other treatments (such as drying, humidification, sterilization, etc.) can be performed on the gas, so as to achieve Better cleaning effect.
进一步，本实施中还可以包括气体检测装置7，对于清洗效果直接进行分析，确保清洗效果，更精确的控制清洗程度。此外，本实施例中的动态配气系统均采用不锈钢材质，包括气体混合装置5、气体检测装置7、阀门、四通管4以及气路管路等，能够有效地防止腐蚀性气体对装置的腐蚀。Further, in this implementation, a gas detection device 7 may also be included to directly analyze the cleaning effect to ensure the cleaning effect and control the cleaning degree more accurately. In addition, the dynamic gas distribution system in this embodiment is made of stainless steel, including gas mixing device 5, gas detection device 7, valves, four-way pipe 4, and gas pipelines, etc., which can effectively prevent corrosive gases from affecting the device. corrosion.
实施例二Embodiment two
如图1所示，本发明提供一种气路清洗方法。As shown in FIG. 1 , the present invention provides a gas path cleaning method.
步骤一，气体检测，关闭第一阀门(阀门101、阀门102、阀门103)和第四阀门107，其余阀门开启，打开待测气源2和稀释气源1，释放稀释气体和待测气体。待测气体通过第一气体流量控制装置301、第二阀门(阀门104、阀门105和阀门106)、最后经过四通管4汇成一股后进入气体混合装置5；稀释气体通过第二气体流量控制装置302、第三阀门109、进入气体混合装置5和预混合后的待测气体混合形成特定浓度的混合气体，混合气体之后通过阀门108进入气体检测装置和传感器反应，产生电信号输出。最后，混合气体通过阀门110和尾气处理装置排出，气体检测实验结束后，停止待测气体2和稀释气体1的通入。Step 1, gas detection, close the first valve (valve 101, valve 102, valve 103) and the fourth valve 107, open the other valves, open the gas source 2 to be tested and the gas source for dilution 1, and release the dilution gas and the gas to be tested. The gas to be measured passes through the first gas flow control device 301, the second valve (valve 104, valve 105 and valve 106), and finally enters the gas mixing device 5 through the four-way pipe 4; the dilution gas passes through the second gas flow rate The control device 302, the third valve 109, the incoming gas mixing device 5 and the pre-mixed gas to be tested are mixed to form a mixed gas with a specific concentration, and then the mixed gas enters the gas detection device through the valve 108 and reacts with the sensor to generate an electrical signal output. Finally, the mixed gas is discharged through the valve 110 and the tail gas treatment device. After the gas detection experiment is over, the gas to be tested 2 and the dilution gas 1 are stopped.
步骤二，气体一级清洗，将第一气体流量控制装置301和第二气体流量控制装置302调到量程的最大值，关闭第四阀门107，其余阀门开启。打开稀释气源1，稀释气源1释放稀释气体，稀释气体通过第一阀门、第二阀门和第三阀门109进入气体管路进行清洗。该过程持续不超过5分钟，即可将第一气体输入气路和第三气体输入支路，冲洗干净。一级清洗结束后，关闭第一阀门、第二阀门(阀门104、阀门105、阀门106)和第三阀门109，然后，停止稀释气体1通入。Step 2, primary gas cleaning, adjust the first gas flow control device 301 and the second gas flow control device 302 to the maximum value of the measuring range, close the fourth valve 107, and open other valves. The dilution gas source 1 is turned on, the dilution gas source 1 releases the dilution gas, and the dilution gas enters the gas pipeline through the first valve, the second valve and the third valve 109 for cleaning. This process lasts for no more than 5 minutes, and then the first gas is input into the gas circuit and the third gas is input into the branch circuit, and they are washed clean. After the primary cleaning is completed, the first valve, the second valve (valve 104, valve 105, valve 106) and the third valve 109 are closed, and then the dilution gas 1 is stopped.
步骤三，气体二级清洗，通过可拆卸接头8接上气泵9，打开第四阀门107。打开清洗气源，清洗气源释放清洗气体，清洗气体通过第四气体输入气路进入气体混合装置和气体检测装置进行大流量清洗，可以将一级清洗时没洗净的第一气体输出气路快速彻底洗净。值得一提的是，通过第四阀门的流量大于通过第一阀门、第二阀门和第三阀门中任一种阀门的流量。本实施例中，清洗气体6可使用大于5slm的流量，大流量气流有助于脱去气管和腔室中的残余气体，该过程持续不超过5分钟，即可使系统快速恢复到干燥的氮气氛围中。此时第二阀门(阀门104、阀门105、阀门106)和第三阀门109处于关闭状态，可以保护气体流量控制装置，避免大流量气体的冲击引起倒流或者损坏。本实施例中，气瓶阀门全打开是10slm，也就说气瓶阀门旋钮开到一半以上，可达到5slm以上。Step 3, gas secondary cleaning, connect the air pump 9 through the detachable joint 8, and open the fourth valve 107 . Open the cleaning gas source, the cleaning gas source releases the cleaning gas, and the cleaning gas enters the gas mixing device and the gas detection device through the fourth gas input gas path for large-scale cleaning, and the first gas that is not cleaned during the first-level cleaning can be output to the gas path Rinse off quickly and thoroughly. It is worth mentioning that the flow through the fourth valve is greater than the flow through any one of the first valve, the second valve and the third valve. In this embodiment, the cleaning gas 6 can use a flow rate greater than 5 slm, and the large flow rate helps to remove the residual gas in the trachea and chamber. This process lasts no more than 5 minutes, and the system can be quickly restored to dry nitrogen. atmosphere. At this time, the second valve (valve 104, valve 105, valve 106) and the third valve 109 are in the closed state, which can protect the gas flow control device and avoid backflow or damage caused by the impact of large flow gas. In this embodiment, the full opening of the gas cylinder valve is 10 slm, that is to say, the gas cylinder valve knob is opened to more than half, which can reach more than 5 slm.
进一步，本实施中的气体混合装置还包括第二出气口，可以在一级清洗时将阀门108关闭，稀释气体直接通过第二出气口、阀门和尾气处理装置排出，缩短稀释气路的排出路程，加快清洗速度。Further, the gas mixing device in this implementation also includes a second gas outlet, the valve 108 can be closed during the primary cleaning, and the diluted gas is directly discharged through the second gas outlet, the valve and the tail gas treatment device, shortening the discharge distance of the diluted gas path , to speed up cleaning.
本发明通过微电脑控制系统，对装置的关键参数，如温度、压力和流量进行全自动监控，操作方便。In the present invention, through a microcomputer control system, the key parameters of the device, such as temperature, pressure and flow, are fully automatic monitored, and the operation is convenient.
综上所述，本发明的一种气路清洗系统及清洗方法，具有以下有益效果：In summary, an air path cleaning system and cleaning method of the present invention has the following beneficial effects:
1)本发明的气路清洗装置可以大幅度减少清洗时间，清洗气体清洗过程持续不超过10分钟即可实现对配气气路的清洗，与通常半小时以上的清洗时间相比，清洗时间缩短至1/3甚至更少。1) The gas circuit cleaning device of the present invention can greatly reduce the cleaning time, and the cleaning process of the gas cleaning process lasts no more than 10 minutes to realize the cleaning of the gas distribution gas circuit. Compared with the usual cleaning time of more than half an hour, the cleaning time is shortened to 1/3 or even less.
2)本发明先用稀释气体对连接有气体流量控制装置的气路进行小流量清洗，即一级清洗；再用清洗气体对其余气路和腔室进行大流量快速清洗，即二级清洗。本发明大幅度减少清洗时间的同时，可以避免流量过大对设备造成影响甚至损坏。2) In the present invention, the gas circuit connected with the gas flow control device is firstly cleaned with a small flow rate, i.e. primary cleaning; and then the rest of the gas channels and chambers are quickly cleaned with a large flow rate, i.e. secondary cleaning. The invention greatly reduces the cleaning time, and at the same time, can avoid the influence or even damage of the equipment caused by the excessive flow rate.
3)本发明通过大流量的清洗气体气流冲击，使得管路和腔室内壁的残余气体被冲洗的更加彻底。3) In the present invention, the residual gas in the pipeline and the inner wall of the chamber is washed more thoroughly through the impact of a large flow of cleaning gas flow.
所以，本发明有效克服了现有技术中的种种缺点而具高度产业利用价值。Therefore, the present invention effectively overcomes various shortcomings in the prior art and has high industrial application value.
上述实施例仅例示性说明本发明的原理及其功效，而非用于限制本发明。任何熟悉此技术的人士皆可在不违背本发明的精神及范畴下，对上述实施例进行修饰或改变。因此，举凡所属技术领域中具有通常知识者在未脱离本发明所揭示的精神与技术思想下所完成的一切等效修饰或改变，仍应由本发明的权利要求所涵盖。The above-mentioned embodiments only illustrate the principles and effects of the present invention, but are not intended to limit the present invention. Anyone skilled in the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or changes made by those skilled in the art without departing from the spirit and technical ideas disclosed in the present invention should still be covered by the claims of the present invention.
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