CN105659119B - Polarizing film, polarizing film substrate and light orientation device - Google Patents
Polarizing film, polarizing film substrate and light orientation device Download PDFInfo
- Publication number
- CN105659119B CN105659119B CN201480055919.9A CN201480055919A CN105659119B CN 105659119 B CN105659119 B CN 105659119B CN 201480055919 A CN201480055919 A CN 201480055919A CN 105659119 B CN105659119 B CN 105659119B
- Authority
- CN
- China
- Prior art keywords
- light
- film
- polarizing film
- range
- mentioned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3075—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state for use in the UV
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Liquid Crystal (AREA)
- Polarising Elements (AREA)
Abstract
The main purpose of the present invention is to provide a kind of polarizing films for being easy to assign optical alignment film orientation restraining force.The present invention reaches above-mentioned purpose by a kind of polarizing film is provided, which is characterized in that: with a plurality of filament linearly configured side by side, above-mentioned filament has the polarizing material containing polarized material, and the extinction ratio of the light of wavelength 250nm is 40 or more.
Description
Technical field
The present invention relates to a kind of polarizing films for being easy to assign optical alignment film orientation restraining force.
Background technique
Liquid crystal display device usually has the following structure: the opposite substrate for being formed with driving element and colour filter opposite direction are matched
It sets and seals surrounding, and be filled with liquid crystal material in gap therebetween.Moreover, liquid crystal material has refractive anisotrop, it can
By in the way of along the direction of the voltage applied to liquid crystal material between the state of proper alignment and the state of no applied voltage
Difference, switching opening and closing and display pixel.Herein, it on the substrate of clamping liquid crystal material, is set to be orientated liquid crystal material
It is equipped with alignment films.
In addition, also using alignment films as the phase difference film or 3D display phase difference film for being used for liquid crystal display device
Material.
As alignment films, such as it has been known that there is using using polyimides as the alignment films of the high molecular material of representative, and by
It carries out the friction treatment for utilizing cloth etc. to rub the high molecular material and there is orientation restraining force.
However, there are cloth etc. to be used as foreign matter in such alignment films for being endowed orientation restraining force by friction treatment
And the problem of residual etc.
In contrast, if alignment films, the i.e. optical alignment film for showing orientation restraining force by irradiation linearly polarized light, then not
Orientation restraining force can be assigned by carrying out such as above-mentioned friction treatment using cloth, therefore there is no cloth etc. to remain as foreign matter
Unfavorable condition, thus the alignment films attract attention in recent years.
As to such optical alignment film assign orientation restraining force linearly polarized light illuminating method, usually using via
The method that polarizing film is exposed.It is thin as constituting using the polarizing film of a plurality of filament with configured in parallel as polarizing film
The material of line uses aluminium or titanium oxide (patent document 1 etc.).
Existing technical literature
Patent document
Patent document 1: Japanese Patent No. 4968165
Summary of the invention
Problems to be solved by the invention
However, existing the short-wavelength light such as ultraviolet range in having the polarizing film such as the filament of above-mentioned material
In the case of, the ratio of extinction ratio (P wave transmissivity/S wave transmissivity) is lower, efficiently can not assign orientation about to optical alignment film
The problem of beam force；Above-mentioned extinction ratio, as, through the polarized component (P wave) vertical relative to above-mentioned filament of above-mentioned filament
Transmissivity (the P wave component in P wave component/incident light in emergent light, hereinafter, sometimes referred to simply as P wave transmissivity), relative to flat
Row in above-mentioned filament polarized component (S wave) transmissivity (the S wave component in S wave component/incident light in emergent light, hereinafter,
Sometimes referred to simply as S wave transmissivity) ratio.
The present invention is completed in view of above-mentioned actual conditions, and main purpose is to provide a kind of be easy to optical alignment film
Assign the polarizing film of orientation restraining force.
Technical means to solve problem
Research is repeated in the inventors of the present invention to solve the above-mentioned problems, as a result, it has been found that, constitute the folding of the material of filament
Penetrating rate and extinction coefficient influences extinction ratio, and when the use of refractive index and extinction coefficient being the material of prescribed limit, even
In the case where the light of short wavelength, extinction ratio can also be made excellent, so as to complete the present invention.
That is, the present invention provides a kind of polarizing film, it is characterised in that: there is a plurality of filament linearly configured side by side, on
Filament is stated with the polarizing material containing polarized material, and the extinction ratio of the light of wavelength 250nm is 40 or more.
According to the present invention, since the extinction ratio of the light of short wavelength is excellent, thus for example easily optical alignment film can be assigned
It is orientated restraining force.
In the present invention, it is preferred to which above-mentioned polarizing film is used to assign optical alignment film orientation restraining force, and ultraviolet for generating
The linearly polarized light of the light of the wavelength in line region.
The reason is that effect also excellent in terms of the extinction ratio of the light of short wavelength of the invention can be played more effectively
Fruit.
In the present invention, it is preferred to: the refractive index of above-mentioned polarized material is above-mentioned extinction coefficient in the range of 2.0~3.2
It is in the range of 2.7~3.5.The reason is that being easy to be set as above-mentioned extinction ratio.In addition, which is because, it is above-mentioned by making
Refractive index and extinction coefficient within the above range, can make in the wider wave-length coverage of range delustring when P wave transmissivity two
Person is excellent.
In the present invention, it is preferred to: the refractive index of above-mentioned polarized material is above-mentioned polarized material in the range of 2.3~2.8
Extinction coefficient be in the range of 1.4~2.4.The reason is that by making above-mentioned refractive index and extinction coefficient in above-mentioned model
In enclosing, for being incident to the light of polarizing film with various angles, can make the polarization axle rotation amount for the polarised light being emitted from polarizing film compared with
It is small, in turn, extinction ratio can be made excellent.
In the present invention, it is preferred to: above-mentioned polarized material is molybdenum silicide based material.The reason is that being easy to be set as above-mentioned to disappear
Light ratio.
In the present invention, it is preferred to: the film thickness of above-mentioned polarizing material is 40nm or more, the spacing of above-mentioned polarized material interlayer
For 150nm or less.The reason is that being easy to be set as above-mentioned extinction ratio.
The present invention provides a kind of polarizing film substrate, it is characterised in that: comprising transparent substrate and is formed in above-mentioned transparent base
The polarized material film containing polarized material on plate, the refractive index of above-mentioned polarized material film are disappeared in the range of 2.0~3.2
Backscatter extinction logarithmic ratio is in the range of 2.7~3.5.
In addition, the present invention provides a kind of polarizing film substrate, it is characterised in that: comprising transparent substrate and be formed in above-mentioned
The polarized material film containing polarized material on transparent substrate, the refractive index of above-mentioned polarized material film are the ranges 2.3~2.8
Interior, extinction coefficient is in the range of 1.4~2.4.
According to the present invention, by with above-mentioned polarized material film, it can easily form the excellent polarizing film of extinction ratio.
In the present invention, it is preferred to: above-mentioned polarized material is molybdenum silicide based material.The reason is that by for above-mentioned material,
It can be more suitable for forming the excellent polarizing film of extinction ratio.
The present invention provides a kind of light orientation device, is the light orientation dress for making ultraviolet light polarization and exposing to optical alignment film
It sets, it is characterised in that: have above-mentioned polarizing film, and the illumination polarized by above-mentioned polarizing film is incident upon above-mentioned optical alignment film.
According to the present invention, by above-mentioned polarizing film is used, orientation restraining force easily can be assigned to optical alignment film.
In the present invention, it is preferred to: have the mechanism for keeping above-mentioned optical alignment film mobile, in the moving direction of above-mentioned optical alignment film
And with have multiple above-mentioned polarizing films on the two directions of the orthogonal thereto direction of the moving direction of above-mentioned optical alignment film, and with
Interface on the orthogonal thereto direction of the moving direction of above-mentioned optical alignment film between adjacent above-mentioned multiple polarizing films is not in above-mentioned light
The continuously coupled mode of the moving direction of alignment films configures above-mentioned multiple polarizing films.Friendship is able to suppress the reason is that can be made into
Portion of boundary dysgenic polarizing film caused by optical alignment film.
The effect of invention
In the present invention, following effect is played, that is, can provide the polarization for being easy that orientation restraining force is assigned to optical alignment film
Piece.
Detailed description of the invention
Fig. 1 is the approximate vertical view for indicating polarizing film an example of the invention.
Fig. 2 is the line A-A sectional view of Fig. 1.
The step of Fig. 3 (a) to (d) is the manufacturing method an example for indicating polarizing film of the invention figure.
Fig. 4 is the figure for indicating light orientation device configuration example of the invention.
Fig. 5 is the figure for indicating another configuration example of light orientation device of the invention.
Fig. 6 (a) to (d) is the figure for indicating the configuration example of polarizing film in light orientation device of the invention.
Fig. 7 is the curve graph for indicating the measurement result of polarizing film polarization characteristic of embodiment 8.
Fig. 8 (a) and be (b) explanatory diagram for illustrating the simulation model of embodiment 9.
Fig. 9 is the curve graph for indicating the analog result of embodiment 9.
Figure 10 is the explanatory diagram for illustrating the simulation model of embodiment 10.
Figure 11 is the curve graph for indicating the analog result of embodiment 10.
Figure 12 is the curve graph for indicating the analog result of 11~embodiment of embodiment 13.
Figure 13 is the curve graph for indicating the measurement result of polarizing film polarization characteristic of embodiment 14.
Specific embodiment
The present invention relates to a kind of polarizing films.
Hereinafter, being illustrated to polarizing film of the invention.
Polarizing film of the invention is characterized in that: with a plurality of filament linearly configured side by side, above-mentioned filament has
Polarizing material containing polarized material, and the extinction ratio of the light of wavelength 250nm is 40 or more.
Such polarizing film of the invention is illustrated referring to figure.Fig. 1 be indicate polarizing film of the invention an example it is general
Slightly top view, Fig. 2 is the line A-A sectional view of Fig. 1.As illustrated in Fig. 1 and 2, polarizing film 10 of the invention has a plurality of in straight
The filament 2 that threadiness configures side by side, above-mentioned filament 2 have the molybdenum silicide based material layer for containing molybdenum silicide based material as polarization material
The bed of material 3, and the extinction ratio of the light of wavelength 250nm is 40 or more.
In addition, in this example, above-mentioned filament 2 has the molybdenum silicide based material layer being formed in as above-mentioned polarizing material 3
On the silicon oxide layer 4 containing silica, and filament 2 is formed on the transparent substrate 1 being made of synthetic quartz glass.
According to the present invention, the extinction ratio of the light of short wavelength is excellent, therefore easily can assign orientation constraint to optical alignment film
Power.The extinction ratio of the light of short wavelength especially such as the wavelength of ultraviolet range is excellent, therefore can assign and fill in a short time
The orientation restraining force divided, so as to keep production efficiency excellent.
Polarizing film of the invention has filament.
Hereinafter, each composition to polarizing film of the invention is described in detail.
1. filament
Filament in the present invention is formed as linearly, and configures in parallel, and has polarizing material.
(1) polarizing material
Above-mentioned polarizing material contains polarized material.
As such polarized material, it is not particularly limited as long as the polarized material to can get required extinction ratio, though
It is different because of shapes such as the film thickness of above-mentioned polarizing material, but such as refractive index and extinction coefficient as defined in meet
It is selected in polarized material.
In addition, refractive index and extinction coefficient in the present invention are 250nm's in the case where not specifically mentioned restriction wavelength
Value when wavelength.
As the refractive index of above-mentioned polarized material and the value of extinction coefficient, preferably: refractive index is the range 2.0~3.2
Interior, Bees Wax is in the range of 2.7~3.5.The reason is that extinction ratio can be made excellent.Wherein, preferably: refractive index
In the range of 2.0~2.8, Bees Wax is in the range of 2.9~3.5, particularly preferably: refractive index be 2.0~
In the range of 2.6, Bees Wax is in the range of 3.1~3.5.The reason is that can UV light region, that is, 200nm~
Making delustring in the wider wave-length coverage of the range of the wavelength region of 400nm, when both P wave transmissivities are excellent.The reason is that
Especially extinction ratio can be made excellent with transmissivity in the range of the wavelength region of 250nm~370nm.
In addition, above-mentioned refractive index and extinction coefficient are excellent from the lesser viewpoint of polarization axle rotation amount that can make polarised light
Be selected as: refractive index is in the range of 2.3~2.8, and Bees Wax is in the range of 1.4~2.4.Wherein, preferably are as follows: folding
The rate of penetrating is in the range of 2.3~2.8, and Bees Wax is in the range of 1.7~2.2, particularly preferably are as follows: refractive index be
In the range of 2.4~2.8, Bees Wax is in the range of 1.8~2.1.The reason is that extinction ratio can be made good
Value, and also make polarization axle rotation amount smaller.
The reason is that especially extinction ratio can be made excellent with transmissivity in the range of the wavelength region of 240nm~280nm
It is different, and the polarization axle rotation amount of polarised light can be made smaller.
In addition, being not particularly limited as refractive index and the measuring method of extinction coefficient, can enumerate according to dichroic reflection light
It composes the method calculated, use ellipsometer method for measuring and Abbe method.As ellipsometer, Jobin Yvon can be enumerated
The UVSEL of company's manufacture.In addition, the refractive index of this case is to measure resulting value using the VUV-VASE of Woollam company manufacture.
As the polarized material for meeting such refractive index and extinction coefficient, specifically, can enumerate containing molybdenum (Mo) and silicon
(Si) molybdenum silicide based material (hereinafter, sometimes referred to as MoSi based material) or nitridation is molybden silicide material etc., wherein preferably
Molybdenum silicide based material.The reason is that being easy containing by elements such as Mo and Si, nitrogen, oxygen included in molybdenum silicide based material
Amount adjusts the value of refractive index and extinction coefficient, and is easy to meet above-mentioned refractive index and delustring system under the wavelength of ultraviolet range
Number.In addition, which is because, also having the light resistance to the short wavelength of ultraviolet range, it is suitable for liquid crystal display device use
The orientation of optical alignment film is used.
In addition, which is because, by molybdenum silicide based material is used, can so that the relatively thin design of the film thickness of filament keep compared with
High extinction ratio, and machining accuracy is also excellent, can also realize further graph thinning, thin space.
It is excellent to the patience of acid or alkali in turn, which is because, compared with the aluminium for being known to be used as previous polarized material
It is different, rear Reusability can be cleaned, the orientation for being suitable for the optical alignment film of liquid crystal display device use etc. is used.
As above-mentioned molybdenum silicide based material, as long as comprising molybdenum (Mo) and silicon (Si) and can meet and can obtain required extinction ratio
Refractive index and extinction coefficient, then be not particularly limited, such as can enumerate: molybdenum silicide (MoSi), molybdenum silicide oxide
(MoSiO), molybdenum silicide nitride object (MoSiN), molybdenum silicide nitrogen oxides (MoSiON) etc..The reason is that by for above-mentioned material
Material, can make extinction ratio excellent.
Above-mentioned polarized material is the primary raw material as polarizing material and contains.
Herein, so-called to contain as primary raw material, specifically refer to the polarized material in above-mentioned polarizing material
Content be 70 mass % or more, wherein in the present invention, it is preferred to be 90 mass % or more, particularly preferably 100 mass %, i.e.,
Above-mentioned polarizing material is made of above-mentioned polarized material.The reason is that can be easily set at by for above-mentioned content
State extinction ratio.
In addition, the measuring method as above-mentioned content, has no spy as long as being the method that can precisely measure content
It does not limit, such as can enumerate and x-ray photoelectron spectroscopy (XPS, X-ray are carried out to the section of above-mentioned filament
Photoelectron Spectroscopy) surface analysis method.
It as the type of polarized material included in above-mentioned polarizing material, both can only be constituted by a kind, and can also be combination
Two or more.In addition, polarizing material may be either single layer, can also wrap using polarized material of more than two kinds
Containing multiple layers, the layer comprising each polarized material is combined in multiple layer.
In the present invention, wherein polarizing material is preferably the single layer for including a kind of polarized material.By being single
Layer, and be easy to be manufactured, process, can steadily manufacture high-precision polarizing film.
As content of the above-mentioned polarizing material in above-mentioned filament, special limit is had no as long as the extinction ratio needed for it can get
It is fixed.
Specifically, above-mentioned polarizing material is preferably 80 mass % or more in the content in above-mentioned filament, wherein preferably
For 90 mass % or more, particularly preferably 100 mass %, i.e., above-mentioned filament only includes above-mentioned polarizing material.The reason is that
By for above-mentioned content, it is easy to be set as above-mentioned extinction ratio.
In addition, above-mentioned content refers to polarizing material mass ratio shared by the section of the width direction of above-mentioned filament,
It as its measuring method, is not particularly limited, such as can be used as long as being the method that can precisely measure above-mentioned content
Method identical with the measuring method of the content of above-mentioned polarized material.
Section as above-mentioned polarizing material observes shape, is not particularly limited as long as the extinction ratio needed for it can get,
Such as the quadrilateral shape such as square or rectangular can be set as etc..
(2) filament
Filament in the present invention at least has above-mentioned polarizing material, though can also only have above-mentioned polarizing material,
Can optionally have the unpolarized material layer comprising the other materials in addition to above-mentioned polarized material as primary raw material.
As other materials included in above-mentioned unpolarized material layer, had no especially as long as the extinction ratio needed for it can get
It limits, for example, silica etc. can be enumerated in the case where using molybdenum silicide based material as above-mentioned polarized material.Its reason exists
In being formed with comprising silica conduct on comprising molybdenum silicide based material layer of the molybdenum silicide based material as above-mentioned polarized material
In the case where the silicon oxide layer of unpolarized material, it can be obtained by the method for carrying out dry-etching to molybdenum silicide based material film above-mentioned
The filament of structure, the filament easy to form comprising above-mentioned molybdenum silicide based material layer and also functions as protective film.
It is the molybdenum silicide based material layer comprising molybdenum silicide based material as polarized material in above-mentioned polarizing material, and above-mentioned
Forming portion in the case that unpolarized material layer is the silicon oxide layer containing silica as unpolarized material, as silicon oxide layer
Position, can be formed on above-mentioned molybdenum silicide based material layer, be formed in the feelings on above-mentioned transparent substrate in above-mentioned molybdenum silicide based material layer
Under condition, the shape preferably in a manner of all surface in addition to above-mentioned transparent substrate side surface for covering above-mentioned molybdenum silicide based material layer
At the silicon oxide layer.The reason is that the filament easy to form comprising above-mentioned molybdenum silicide based material layer.
It as the film thickness of said silicon oxide, is not particularly limited as long as the extinction ratio needed for it can get, but from being set as high
From the perspective of extinction ratio, then more Bao Yuehao, for example, it is preferable to be 10nm hereinafter, being wherein preferably 6nm hereinafter, particularly preferably
4nm or less.The reason is that extinction ratio can be made excellent by for above-mentioned film thickness.In addition, the lower limit about above-mentioned film thickness, due to
More Bao Yuehao, thus be not particularly limited, but from aspect easy to manufacture, preferably 2nm or more.
It being explained, the film thickness of said silicon oxide is the maximum gauge of the thickness of the above-mentioned polarized material layer surface of span,
Specifically refer to thickness represented by the d in Fig. 2.
In addition, the measuring method as film thickness, can be used the common measuring method in polarizing film field, such as available
Atomic force microscope (AFM, Atomic Force Microscope) measures the shape on film surface layer, and oval partially using transmission-type
Vibration meter measurement polarization characteristic, obtains the composition and respective film thickness for constituting film whereby.
As the film thickness of above-mentioned filament, as long as the film thickness with required extinction ratio may make then to be not particularly limited, but
Due to having the tendency that the more thick then extinction ratio of film thickness is higher and the more thin then P wave transmissivity of film thickness is higher, thus be contemplated that extinction ratio with
The balance of P wave transmissivity is set.
In the present invention, above-mentioned film thickness is preferably in the range of 60nm~180nm.It wherein, is preferably in 80nm
It is particularly preferably the range in 100nm~150nm in the range of~160nm.
In addition, inhibiting lower by by film thickness, when forming photoresist pattern using photoetching process or method for imprint lithography etc., etch
Precision when processing improves, so as to make the higher polarizing film of precision.In addition, to the ultrasonic cleaning for using hyperfrequency sound wave
The patience of equal physical cleanings also improves.
In addition, the film thickness of above-mentioned filament refers to thickness of the filament on the direction perpendicular with length direction and width direction
In maximum gauge refer to also in the case where filament has unpolarized material layer comprising the film thickness including unpolarized material layer.Tool
For body, refer to thickness represented by a in Fig. 2.
In addition, the film thickness of above-mentioned filament can also include different film thickness in a polarizing film, but usually with identical film thickness shape
At.
As the width of above-mentioned filament, as long as the width with required extinction ratio may make then to be not particularly limited, by
In having the tendency that the more wide then extinction ratio of width is higher and the more wide then P wave transmissivity of width is lower, thus it is contemplated that the saturating of P wave
It penetrates the balance of rate and extinction ratio and is set as in the range of such as 30nm~80nm.
In addition, the width of above-mentioned filament refers to length of the filament on the direction perpendicular to length direction, include in filament
In the case where unpolarized material layer, refer to also comprising the width including unpolarized material layer.Specifically, referring to the b institute table in Fig. 2
The length shown.
In addition, the width of above-mentioned filament can also include different width in a polarizing film, but usually with same widths shape
At.
As the duty ratio of above-mentioned filament, i.e. ratio (width/spacing) of the width relative to spacing of filament, as long as that can make
There must be the duty ratio of required extinction ratio to be then not particularly limited, for example, can be set as in the range of 0.25~0.70, wherein it is preferred that
For in the range of 0.30~0.50, particularly preferably in the range of 0.30~0.40.The reason is that being by duty ratio
Both extinction ratio and P wave transmissivity can be set as good value by above range.
As the spacing of above-mentioned filament, it is not particularly limited as long as to may make the spacing with required extinction ratio, though
Wavelength according to the light for generating linearly polarized light etc. and it is different, but can be set as above-mentioned light wavelength less than half.More
Specifically, above-mentioned spacing can be for example set as in the range of 80nm~150nm in the case where above-mentioned light is ultraviolet light, wherein
It is particularly preferably in the range of 100nm~110nm preferably in the range of 100nm~120nm.The reason is that by
By may make that, even for wavelength 300nm light below, extinction ratio is also excellent for above-mentioned spacing.
In addition, the spacing of above-mentioned filament refers to the maximum width of the spacing between filament adjacent in the direction of the width, thin
In the case that line includes unpolarized material layer, including the spacing of above-mentioned filament also includes unpolarized material layer.Specifically, referring to
Width represented by c in Fig. 2.
In addition, the spacing of above-mentioned filament can also include different spacing in a polarizing film, but usually with identical spacing shape
At.
As the item number and length of above-mentioned filament, had no as long as to may make with the item number and length of required extinction ratio
It is particularly limited to, the purposes etc. of polarizing film according to the present invention is appropriately configured.
2. transparent substrate
It is usually with the transparent substrate for forming above-mentioned filament although polarizing film of the invention has above-mentioned filament
Polarizing film.
As above-mentioned transparent substrate, as long as above-mentioned filament can be supported steadily, translucency is excellent, and can make by exposing
Deterioration caused by light is less, then is not particularly limited, for example, synthetic quartz glass, fluorite, fluorination through optical grinding can be used
Calcium etc. can usually enumerate common and stable quality synthetic quartz glass.In the present invention, wherein preferably use compound stone
English glass.The reason is that quality is stablized, in addition, being easy to use the situation of the light of the exposure of the light, i.e. high-energy of short wavelength
Under, it deteriorates also less.
As the thickness of above-mentioned transparent substrate, can polarizing film according to the present invention purposes or size etc. suitably selected
It selects.
3. polarizing film
Polarizing film of the invention has above-mentioned filament, and the extinction ratio of the light of wavelength 250nm is 40 or more.
The extinction ratio (P wave transmissivity/S wave transmissivity) of light as above-mentioned wavelength 250nm has no as long as being 40 or more
It is particularly limited to, preferably 50 or more, wherein preferably 60 or more.The reason is that by for above range, it can be to light redirecting layer
Steadily assign orientation restraining force.
In addition, since above-mentioned extinction ratio is the bigger the better, thus the upper limit is not particularly limited.
In addition, the common measuring method in polarizing film field can be used in the measuring method of above-mentioned extinction ratio, for example, can be by
By the VUV- for using the transmission-type ellipsometer that can measure the polarization characteristic of ultraviolet light, such as Woollam company manufacture
The transmission-types ellipsometer such as VASE is measured.
As the P wave transmissivity (the P wave component in P wave component/incident light in emergent light) of above-mentioned polarizing film, as long as can
Obtain needed for extinction ratio be then not particularly limited, the light for wavelength 250nm is preferably 0.3 or more, wherein preferably 0.4 with
On, particularly preferably 0.6 or more.The reason is that can efficiently be assigned to light redirecting layer by for above-mentioned P wave transmissivity
It is orientated restraining force.
In addition, the measuring method as P wave transmissivity, can be used the common measuring method in polarizing film field, for example,
Can by use the transmission-type ellipsometer that can measure the polarization characteristic of ultraviolet light, for example Woollam company manufacture
The transmission-types ellipsometer such as VUV-VASE is measured.
As the purposes of above-mentioned polarizing film, it is preferably used for generating the linear polarization of the light of the short wavelength such as ultraviolet range
Light, wherein be preferably used for the linearly polarized light of the light in the range of generation wavelength 200nm~400nm.
Material as optical alignment film, it is known to which the material that is orientated using the light of wavelength 260nm or so is utilized
Material that the light of 300nm or so is orientated, the material being orientated using the light of 365nm or so, using corresponding with material
The illuminator of wavelength.Include above-mentioned molybdenum silicide based material layer the reason is that can use in the orientation of these optical alignment films
Polarizing film.
In addition, in the range of the refractive index of above-mentioned polarized material is 2.0~3.2, and the delustring of above-mentioned polarized material
Coefficient be in the range of 2.7~3.5 in the case where, above-mentioned polarizing film be preferably used for generate 200nm~400nm in the range of
Light linearly polarized light, wherein be preferably used for generate 240nm~400nm in the range of light linearly polarized light, particularly preferably
For the linearly polarized light for generating the light in the range of 240nm~370nm.The reason is that in the feelings for above-mentioned polarized material
Under condition, it can show the wavelength of above-mentioned light within the above range and the delustring when excellent characteristic of both P wave transmissivities.
The reason is that in ultraviolet range, it is good in a wide range of interior extinction ratio and P wave transmissivity, whereby for sense
The polarizing film of identical material can also be used in the material of the different a variety of optical alignment films of luminosity wavelength.
In addition, in the range of the refractive index of above-mentioned polarized material is 2.3~2.8, and the delustring of above-mentioned polarized material
Coefficient be in the range of 1.4~2.4 in the case where, above-mentioned polarizing film be preferably used for generate 200nm~350nm in the range of
Light linearly polarized light, wherein be preferably used for generate 240nm~300nm in the range of light linearly polarized light, it is especially excellent
It is selected as the linearly polarized light for generating the light in the range of 240nm~280nm.The reason is that for above-mentioned polarized material
In the case of, it can show the wavelength of above-mentioned light within the above range and the delustring when excellent characteristic of both P wave transmissivities, in addition,
The polarization axle rotation amount of polarised light can be made smaller.It is especially applicable for the optical alignment film being orientated with the wavelength of 260nm or so
Material.
In addition, it is so-called for generating the linearly polarized light of the light of defined wave-length coverage, as long as exposing to polarization of the invention
The light of piece includes the light of above-mentioned defined wave-length coverage, wherein and it preferably mainly include the light of defined wave-length coverage,
That is, the energy of the light of defined wave-length coverage be expose to the light of polarizing film gross energy 50% or more, particularly preferably always
70% or more of energy, wherein particularly preferably 90% or more of gross energy.
In addition, in the present invention, it is preferred to for for the liquid crystal display device for clamping liquid crystal material in liquid crystal display device
Orientation restraining force is assigned with optical alignment film.The reason is that orientation restraining force effectively can be assigned to optical alignment film.
The manufacturing method of polarizing film of the invention is illustrated.
Fig. 3 is figure the step of indicating an example of the manufacturing method of polarizing film of the invention.As illustrated in fig. 3, firstly, right
In the above-mentioned polarized material that the extinction ratio of the light of the wavelength 250nm of above-mentioned polarizing film can be set as to 40 or more, determined by simulation
Refractive index and extinction coefficient, and select the polarized material (not shown) for meeting the refractive index and extinction coefficient.Next, preparing saturating
Bright substrate 1 (Fig. 3 (a)) forms the polarized material comprising selected polarized material using sputtering method on above-mentioned transparent substrate
Film 3 ', forms polarizing film substrate whereby, which has transparent substrate and be formed on transparent substrate and contain
The polarized material film (Fig. 3 (b)) of polarized material.
In addition, can also be covered in the hard that polarized material processing is above arranged in polarized material film 3 ' as polarizing film substrate
Film (not shown).
Then, pattern-like photoresist 11 is formed using photoetching process, and pattern-like photoresist 11 is etched (Fig. 3 as exposure mask
(c)) filament 2 (Fig. 3 (d)) comprising polarizing material 3, is formed whereby.
In addition, can also be formed by oxidation film is formed on the surface of the molybdenum silicide based material layer 3 as polarizing material
Silicon oxide film 4.
In addition, in the case where polarizing film substrate has the hard mask being formed on polarized material film, it can be by photoresist
11 as etching masks and hard mask is etched, and the hard mask to be etched into pattern-like as etching mask and
Polarized material film is etched.
By so as by hard mask be used as etching mask, have can with higher precision carry out polarized material film it is fine
The advantages of pattern is processed.
Thereafter, required polarizing film is obtained by removing hard mask.It can also in the state of remaining hard mask
In the case where performance needed for obtaining, hard mask can also be remained.
Chromium system can be used in the case where polarized material film is molybdenum silicide based material about the material of above-mentioned hard mask
Material.Chromium based material is to function in the etching of molybdenum silicide based material as etching mask.
As chromium based material, chromium, chromated oxide, chromium nitride, chromium nitrogen oxides etc. can be enumerated.
The thickness of hard mask is preferably the thickness for being amenable to the etching of polarized material film, is 100nm in polarized material film
In the case where left and right, the preferably thickness of 5nm~15nm or so.
Hard mask is formed on polarized material film using sputtering method etc..
Fig. 4 is the figure for indicating the configuration example of light orientation device of the invention.
Light orientation device 20 shown in Fig. 4 includes the polarizer unit 21 and ultraviolet light for containing polarizing film 10 of the invention
Lamp 22 makes the ultraviolet light polarization irradiated from ultraviolet lamp 22 by the polarizing film 10 for being contained in polarizer unit 21, and partially by this
Light (polarised light 24) after vibration exposes to the optical alignment film 25 being formed on workpiece 26, assigns orientation about to optical alignment film 25 whereby
Beam force.
In addition, have the mobile mechanism of workpiece 26 for making to be formed with optical alignment film 25 in light orientation device 20, by making work
Part 26 is mobile, and polarised light 24 can be exposed to the entire surface of optical alignment film 25.For example, workpiece 26 is court in example shown in Fig. 4
Right direction (arrow direction in Fig. 4) is mobile in figure.
In addition, workpiece 26 is expressed as to rectangular-shaped plate, but in the present invention in example shown in Fig. 4, workpiece 26
Form is not particularly limited as long as irradiating for polarised light 24, for example, workpiece 26 can also be membranaceous form, in addition, can also
In band-like (netted) form that can be batched.
In the present invention, ultraviolet lamp 22 preferably can illumination wavelength be 240nm or more and 400nm ultraviolet light below, separately
Outside, optical alignment film 25 is preferably 240nm or more to wavelength and 400nm ultraviolet light below has sensitivity.The reason is that light
Aligning device 20 has the sheet of P wave transmissivity excellent for the extinction ratio of the ultraviolet light of above-mentioned wave-length coverage and with higher
The polarizing film 10 of invention, thus can efficiency well to the ultraviolet light to above-mentioned wave-length coverage have sensitivity optical alignment film
Orientation restraining force is assigned, so that productivity can be improved.
In addition, in order to which the light efficiency from ultraviolet lamp 22 is exposed to polarizing film well, light orientation device 20 is preferred
There is the reflecting mirror 23 of reflection ultraviolet light in the back side (being opposite side with polarizer unit 21) or side of ultraviolet lamp 22.
In addition, in order to which 25 efficiency of optical alignment film to large area assigns orientation restraining force well, preferably in the following manner
Constitute light orientation device 20, that is, as shown in figure 4, using rodlike lamp to ultraviolet lamp 22, be radiated at the shifting relative to workpiece 26
Dynamic direction (arrow direction in Fig. 4) orthogonal side is upwardly formed the polarised light 24 of longer irradiation area.
In this case, polarizer unit 21 also becomes the shape for being suitable for that polarised light 24 is irradiated to the optical alignment film 25 of large area
State, due to manufacturing the having difficulties property of polarizing film of large area, thus in technical aspect and economic aspect preferably in polarizing film list
The case where multiple polarizing films are configured in member 21.
In addition, light orientation device of the invention can also be the composition for having multiple ultraviolet lamps.
Fig. 5 is the figure for indicating another configuration example of light orientation device of the invention.
As shown in figure 5, light orientation device 30 has 2 ultraviolet lamps 32, and between each ultraviolet lamp 32 and workpiece 36
Has the polarizer unit 31 for containing polarizing film 10 of the invention respectively.In addition, each ultraviolet lamp 32 has reflecting mirror respectively
33。
In this way, compared with having the case where 1 ultraviolet lamp 32, irradiation can be increased by having multiple ultraviolet lamps 32
To the exposure of the polarised light 34 for the optical alignment film 35 being formed on workpiece 36.Therefore, with have the case where 1 ultraviolet lamp 32
It compares, the movement speed of workpiece 36 can be made to become larger, as a result, productivity can be improved.
In addition, illustrating and matching side by side in the moving direction (arrow direction in Fig. 5) of workpiece 36 in example shown in Fig. 5
It is equipped with the composition of 2 ultraviolet lamps 32, but the present invention is not limited to this, for example, can also be in the moving direction with workpiece 36
Orthogonal direction be configured with multiple ultraviolet lamps composition, in turn, can also for workpiece 36 moving direction and with its side of movement
The composition of multiple ultraviolet lamps is configured with to the two directions of orthogonal direction.
In addition, the composition for 1 ultraviolet lamp 32 being arranged 1 polarizer unit 31 is illustrated in example shown in Fig. 5,
But the present invention is not limited to this, for example, can also be the composition that multiple ultraviolet lamps are equipped with 1 polarizer unit.The feelings
Under condition, as long as size of 1 polarizer unit with the irradiation area that can include multiple ultraviolet lamps.
Fig. 6 is the figure for indicating the example of configuration of the polarizing film in light orientation device of the invention.In addition, Fig. 6 (a)
Polarizing film configuration shown in~(d) is indicated the film surface opposite direction ground level of flat polarizing film 10 and optical alignment film
The form of arrangement.
For example, in light orientation device 20 shown in Fig. 4, in the court direction orthogonal thereto relative to the moving direction of workpiece 26
It is efficient to be in the case where irradiating band-like polarised light 24, in polarizer unit 21, relative to work as shown in Fig. 6 (a)
The orthogonal thereto direction of the moving direction (arrow direction) of part 26 configures multiple polarizing films 10.The reason is that can be by polarizing film 10
Quantity inhibit less.
On the other hand, have the feelings of multiple ultraviolet lamps in the lesser situation of area or light orientation device of polarizing film 10
Under condition, preferably as shown in Fig. 6 (b), in addition to matching in the orthogonal thereto direction of the moving direction (arrow direction) relative to workpiece
It sets other than multiple polarizing films 10, is also configuring multiple polarizing films 10 along the direction of moving direction (arrow direction).The reason is that
Light from ultraviolet lamp can lavishly not exposed to optical alignment film, so that productivity can be improved.
Herein, in the present invention, it is preferred to as shown in Fig. 6 (c) and Fig. 6 (d), not along the moving direction (arrow of workpiece
Direction) alignment mode in a row configures multiple polarizing films, and make the position of adjacent polarizing film be in the moving direction with workpiece
Orthogonal direction (up and down direction in figure) offset ground configuration.
In other words, in the present invention, it is preferred to: with adjacent more on the direction orthogonal thereto with the moving direction of optical alignment film
Mode continuously coupled on the moving direction of optical alignment film does not configure multiple polarizing films to interface between a polarizing film.
The reason is that the interface between polarizing film does not generate polarised light usually, therefore the interface is inhibited to take light
To adverse effect caused by film.
Herein, configuration shown in Fig. 6 (c) is following configuration: the multiple polarizing films configured all have identical
Shape, identical size, and the position of polarizing film adjacent in the lateral direction in the up-down direction is with polarizing film up and down direction
The scale of 1/2 size of size deviates in the up-down direction.
In addition, configuration shown in Fig. 6 (d) is following configuration: the multiple polarizing films configured all have identical
Shape, identical size, and the position of polarizing film adjacent in the lateral direction in the up-down direction is compared with polarizing film up and down direction
1/2 small scale of size deviate in the up-down direction.
Above situation is described in detail.
In the configuration shown in Fig. 6 (c), the polarizing film 10a and polarizing film 10b that are configured adjacently in the up-down direction
The extension to left and right direction of interface 41 be configured in the polarizing film 10c and polarizing film 10d of left and right directions and hindered.
That is, preventing the friendship between the polarizing film being configured adjacently in the up-down direction in the configuration shown in Fig. 6 (c)
Portion of boundary is continuously coupled in the lateral direction.
Therefore, in the case where irradiating polarised light to optical alignment film using configuration shown in Fig. 6 (c), can inhibit because
Adverse effect caused by interface between above-mentioned polarizing film continuously involves the case where optical alignment film.
Similarly, in the configuration shown in Fig. 6 (d), the polarizing film being configured adjacently in the up-down direction is also prevented
Between interface it is continuously coupled in the lateral direction.
Therefore, in the case where irradiating polarised light to optical alignment film using configuration shown in Fig. 6 (d), can inhibit because
Adverse effect caused by interface between above-mentioned polarizing film continuously involves the case where optical alignment film.
In addition, in the configuration shown in Fig. 6 (c), due to the rank of 1/2 size of the size of polarizing film up and down direction
Difference deviates in the up-down direction, thus in left and right directions on (moving direction of workpiece) every 2 polarizing films, interface 41 it is upper
The position in lower direction is just aligned.
On the other hand, in the configuration shown in Fig. 6 (d), due to small with 1/2 of the size compared with polarizing film up and down direction
Scale deviate in the up-down direction, thus the position of interface 42 in the up-down direction becomes more difficult to be aligned.
Therefore, in the configuration shown in Fig. 6 (d), caused by capable of more inhibiting because of the interface between above-mentioned polarizing film not
The case where good influence continuously involves optical alignment film.
In addition, each polarizing film is matched in such a way that its side contacts with each other in the example shown in Fig. 6 (a)~Fig. 6 (d)
Set, but the present invention is not limited to the form, can also the interface between adjacent polarizing film there is the form in gap.
In addition, can also be set as producing the interface between polarizing film not by the end of adjacent polarizing film is overlapped
The form in raw gap.
In addition, the present invention is not limited to above embodiment.Above embodiment is to illustrate, and is had and power of the invention
Technical idea documented by sharp claim it is substantially the same composition and play identical function and effect embodiment no matter be
Which kind of mode is all contained in technical scope of the invention.
[embodiment]
The present invention is further concretely demonstrated in following presentation embodiment.
[embodiment 1]
It is 80nm for film thickness, width and spacing are 72nm and the only polarization material comprising being made of polarized material of 120nm
The filament model of the bed of material, based on " numeric value analysis of diffraction optical element and its application " (ball is kind to be published, chop house's perfume (or spice) vertebra chief editor)
Documented rigorous couple-wave analysis (RCWA, Rigorous Coupled Wave Analysis), relative to refractive index and disappears
Backscatter extinction logarithmic ratio carries out the simulation of the extinction ratio of the light of wavelength 250nm.Show the result in following table 1.
According to table 1, in the range of can be 2.0~3.0 by the refractive index that MoSi based material is realized, Bees Wax
Be in the range of 2.7~3.5 in the case where, extinction ratio shows as the value of 40 or more (in the range of 200.4~1203.8).
[embodiment 2]
It is 80nm in addition to filament model to be set as to film thickness, other than width and spacing are 60nm and the filament model of 120nm, into
Row simulation same as Example 1.Show the result in following table 2.
According to table 2, in the range of can be 2.0~3.0 by the refractive index that MoSi based material is realized, Bees Wax
Be in the range of 2.7~3.5 in the case where, extinction ratio shows as 40 or more (in the range of 72.9~263.9).
[embodiment 3]
It is 80nm in addition to filament model to be set as to film thickness, other than width and spacing are 48nm and the filament model of 120nm, into
Row simulation same as Example 1.Show the result in following Table 3.
According to table 3, in the range of can be 2.7~3.1 by the extinction coefficient that MoSi based material is realized and refractive index
The case where being in the range of 2.2~3.0 (condition 3-1)；Extinction coefficient be in the range of 3.2~3.3 and refractive index be
The case where in the range of 2.1~3.0 (condition 3-2)；Or extinction coefficient be in the range of 3.4~3.5 and refractive index be
Under the case where in the range of 2.0~3.0 (condition 3-3), extinction ratio shows as 40 or more.In addition, as specific extinction ratio,
It is in the range of 41.8~85.1 under condition 3-1, is in the range of 40.9~79.7, at condition 3-3 at condition 3-2
It is the value of extinction ratio in the range of 40.0~80.1, as this filament model entirety, shows as 40.0~85.1 range
It is interior.
[embodiment 4]
It is 60nm in addition to filament model to be set as to film thickness, other than width and spacing are 72nm and the filament model of 120nm, into
Row simulation same as Example 1.Show the result in following table 4.
According to table 4, in the range of can be 2.0~3.0 by the refractive index that MoSi based material is realized, Bees Wax
Be in the range of 2.7~3.5 in the case where, extinction ratio shows as 40 or more (in the range of 52.8~309.6).
[embodiment 5]
It is 60nm in addition to filament model to be set as to film thickness, other than width and spacing are 60nm and the filament model of 120nm, into
Row simulation same as Example 1.Show the result in following table 5.
According to table 5, in the range of can be 2.7~2.9 by the extinction coefficient that MoSi based material is realized and refractive index
Be in the range of 2.4~3.0 in the case where (condition 5-1)；Extinction coefficient is in the range of 3.0~3.3 and refractive index is
In the case where in the range of 2.3~3.0 (condition 5-2)；Or extinction coefficient is in the range of 3.4~3.5 and refractive index is
Under the case where in the range of 2.2~3.0 (condition 5-3), extinction ratio shows as 40 or more.In addition, as specific extinction ratio,
It is in the range of 43.4~85.1 at condition 5-1, is in the range of 40.2~78.1, in condition 5-3 at condition 5-2
Under be in the range of 41.2~76.9, whole as this filament model, the value of extinction ratio shows as 40.2~85.1 value.
[embodiment 6]
It is 60nm in addition to filament model to be set as to film thickness, other than width and spacing are 48nm and the filament model of 120nm, into
Row simulation same as Example 1.Show the result in following table 6.
According to table 6, in the range of can be 2.0~3.0 by the refractive index that MoSi based material is realized, Bees Wax
Be in the range of 2.7~3.5 in the case where, there is no the regions that extinction ratio is 40 or more, but extinction coefficient be 1.5~
In the range of 2.4 and refractive index be in the range of 2.6~3.0 in a part under conditions of, extinction ratio shows as 40 or more
(in the range of 41.7~493.0).
[embodiment 7]
It is 40nm in addition to filament model to be set as to film thickness, other than width and spacing are 72nm and the filament model of 120nm, into
Row simulation same as Example 1.Show the result in following table 7.
According to table 7, in the range of can be 3.0~3.5 by the extinction coefficient that MoSi based material is realized and refractive index
In the case where 3.0, extinction ratio shows as 40 or more (in the range of 40.0~42.4).
[reference example 1]
It is 40nm in addition to filament model to be set as to film thickness, other than width and spacing are 60nm and the filament model of 120nm, into
Row simulation same as Example 1.Show the result in following table 8.
According to table 8, the condition that extinction ratio is 40 or more that shows is not obtained.
[reference example 2]
It is 40nm in addition to filament model to be set as to film thickness, other than width and spacing are 48nm and the filament model of 120nm, into
Row simulation same as Example 1.Show the result in following table 9.
According to table 9, the condition that extinction ratio is 40 or more that shows is not obtained.
[table 1]
[table 2]
[table 3]
[table 4]
[table 5]
[table 6]
[table 7]
[table 8]
[table 9]
(simulation summarizes)
According to the table of the correlativity of the expression refractive index and extinction coefficient of table 1~9 and extinction ratio, can confirm by from yin
Extinction ratio can be set as 40 or more by the range of shadow part selective refraction rate and extinction coefficient.
For example, filament (polarizing material) of embodiment 1 (86 μm of film thickness, 72 μm of width, 120 μm of spacing) the case where
Under, can confirm can be set as 40 or more for extinction ratio in the range of making 2 or more refractive index, extinction coefficient 1.5~3.5.
[embodiment 8]
Prepare the synthetic quartz glass of film thickness 6.35mm as transparent substrate, and uses the hybrid target (Mo: Si=of molybdenum and silicon
1: 2mol%) molybdenum silicide of the via nitride of film thickness 120nm is formed by reactive sputtering method in the mixed-gas environment of argon nitrogen
Film is as molybdenum silicide based material film.In addition, the amount of nitrogen is the half of content or so of Mo.
In turn, on molybdenum silicide film, the nitrogen oxidation chromium film of 7nm is formed as hard mask using sputtering method.
Next, forming the pattern-like photoresist of the line and space pattern that have that spacing is 100nm on hard mask.Its
Afterwards, the mixed gas of chlorine and oxygen is used to carry out dry-etching as hard mask of the etching gas to chromium based material, next, making
Use SF6Dry-etching is carried out to molybdenum silicide based material film, hard mask is removed thereafter, obtains polarizing film whereby.
Utilize the SEM measurement device LWM9000 of Vistec company manufacture and the AFM device of VEECO company manufacture
After DIMENSION-X3D measures the width, thickness and spacing of the filament of polarizing film obtained, respectively 34nm, 120nm and
100nm。
(structure evaluation of filament)
For the filament of the polarizing film of embodiment 8, the transmission-type ellipsometer (VUV- of Woollam company manufacture is utilized
VASE) structure is evaluated.
As a result, can confirm that above-mentioned filament has width and thickness is respectively 29.8nm and 115.8nm comprising molybdenum silicide
The film thickness of the upper surface of the molybdenum silicide based material layer of based material and above-mentioned molybdenum silicide based material layer and the film thickness of side, respectively
The oxidation film comprising silica of 4.2nm and 4.2nm.
In addition, using transmission-type ellipsometer (VUV-VASE of Woollam company manufacture) measurement molybdenum silicide based material
After the refractive index and extinction coefficient, the i.e. refractive index of molybdenum silicide based material (Mo: Si=1: 2mol%) and extinction coefficient of layer, wave
Refractive index n when long 250nm is 2.30, and extinction coefficient k when wavelength 250nm is 3.24.In addition, refraction when wavelength 365nm
Rate n is 3.94, and extinction coefficient k is 2.85.
(measurement of P wave transmissivity and S wave transmissivity)
For the polarizing film of embodiment 8, surveyed using transmission-type ellipsometer (VUV-VASE of Woollam company manufacture)
P wave transmissivity (the P wave in P wave component/incident light in emergent light of ultraviolet light in the range of the long 200nm~700nm of standing wave
Component) and S wave transmissivity (the S wave component in S wave component/incident light in emergent light), and calculate extinction ratio (P wave transmissivity/
S wave transmissivity).Show the result in table 10 and Fig. 7.
As shown in table 10 and Fig. 7, in the range of wavelength 240nm~400nm, the P wave transmissivity of polarizing film is 70.5%
More than, extinction ratio is 79.5% or more.
In addition, the P wave transmissivity of polarizing film is 70.5% or more, extinction ratio in the range of wavelength 240nm~260nm
It is 79.5 or more.
In addition, the P wave transmissivity of polarizing film is 73.7% or more, and extinction ratio is in the range of 280~320nm of wavelength
More than 208.5.
In addition, the P wave transmissivity of polarizing film is 79.6% or more, extinction ratio in the range of wavelength 355nm~375nm
It is 346.5 or more.
Material as optical alignment film, it is known that the material that is orientated with the light of wavelength 260nm or so, with 300nm or so
The light material being orientated, the material that is orientated with the light of 365nm or so, various light orientations can be used for according to the above performance
Film can especially confirm the material that can be suitably employed in the optical alignment film being orientated with the light of 365nm or so.
In addition, more than wavelength 200nm and in the range of 600nm or less, the S wave transmissivity of the polarizing film of embodiment 8 is
8.44% hereinafter, extinction ratio is 10.9 or more.
In addition, more than wavelength 220nm and in the range of 500nm or less, the S wave transmissivity of the polarizing film of embodiment 8 is
2.69% hereinafter, extinction ratio is 33.5 or more.
It can confirm that the polarizing film of embodiment 8 keeps 10 or more extinction ratio in wavelength 200nm to 600nm or so.
It is known that, conventionally, the absorption spectrum of optical alignment film has wave crest in specific wave-length coverage, but in wider wavelength
Light is absorbed in range.
Therefore, in previous polarizing film, the light of the low wave-length coverage of bandpass filter truncation extinction ratio is utilized.For example,
In the polarizing film for having the filament being made of aluminium, the light of 300nm wave-length coverage below is truncated, is made of having titanium oxide
Filament polarizing film in, be truncated 300nm or more wave-length coverage light.
However, in the above-mentioned methods, there is the efficiency for leading to assign orientation restraining force to optical alignment film because of the truncation of light
Also the unfavorable condition reduced.
On the other hand, polarizing film of the invention can as above ensure more than a certain amount of delustring in biggish wave-length coverage
Than, therefore can confirm, the light of wider wave-length coverage can be efficiently used for light orientation without using bandpass filter
Film assigns orientation restraining force.
[table 10]
| Wavelength (nm) | P wave transmissivity | S wave transmissivity | Extinction ratio | Wavelength (nm) | P wave transmissivity | S wave transmissivity | Extinction ratio |
| 200 | 62.9% | 3.47% | 18.1 | 455 | 88.2% | 1.22% | 72.1 |
| 205 | 64.4% | 2.84% | 22.7 | 460 | 88.3% | 1.35% | 65.3 |
| 210 | 65.7% | 2.34% | 28.1 | 465 | 88.9% | 1.49% | 59.8 |
| 215 | 66.9% | 1.96% | 34.2 | 470 | 88.9% | 1.62% | 54.7 |
| 220 | 67.9% | 1.64% | 41.3 | 475 | 89.0% | 1.77% | 50.2 |
| 225 | 68.5% | 1.39% | 49.3 | 480 | 89.3% | 1.94% | 46.0 |
| 230 | 69.4% | 1.19% | 58.6 | 485 | 89.7% | 2.11% | 42.6 |
| 235 | 70.0% | 1.02% | 68.6 | 490 | 89.8% | 2.30% | 39.0 |
| 240 | 70.5% | 0.89% | 79.5 | 495 | 90.1% | 2.49% | 36.2 |
| 245 | 71.0% | 0.78% | 91.5 | 500 | 90.2% | 2.69% | 33.5 |
| 250 | 71.6% | 0.68% | 105.3 | 505 | 90.3% | 2.90% | 31.1 |
| 255 | 71.9% | 0.60% | 119.5 | 510 | 90.3% | 3.12% | 28.9 |
| 260 | 72.4% | 0.53% | 135.4 | 515 | 90.7% | 3.36% | 27.0 |
| 265 | 72.8% | 0.48% | 152.5 | 520 | 91.0% | 3.60% | 25.3 |
| 270 | 73.0% | 0.43% | 169.5 | 525 | 91.3% | 3.84% | 23.8 |
| 275 | 73.4% | 0.39% | 188.7 | 530 | 91.2% | 4.10% | 22.2 |
| 280 | 73.7% | 0.35% | 208.5 | 535 | 91.4% | 4.38% | 20.9 |
| 285 | 74.2% | 0.33% | 228.2 | 540 | 91.5% | 4.65% | 19.7 |
| 290 | 74.4% | 0.30% | 250.1 | 545 | 91.5% | 4.92% | 18.6 |
| 295 | 74.9% | 0.27% | 273.9 | 550 | 91.7% | 5.20% | 17.6 |
| 300 | 75.5% | 0.25% | 297.1 | 555 | 91.9% | 5.50% | 16.7 |
| 305 | 75.7% | 0.24% | 319.8 | 560 | 91.9% | 5.81% | 15.8 |
| 310 | 76.4% | 0.22% | 345.2 | 565 | 92.2% | 6.12% | 15.1 |
| 315 | 75.6% | 0.21% | 363.9 | 570 | 92.3% | 6.43% | 14.4 |
| 320 | 76.9% | 0.21% | 374.4 | 575 | 92.1% | 6.75% | 13.6 |
| 325 | 77.4% | 0.20% | 392.7 | 580 | 92.3% | 7.10% | 13.0 |
| 330 | 77.9% | 0.19% | 406.7 | 585 | 92.2% | 7.40% | 12.5 |
| 335 | 78.2% | 0.19% | 419.2 | 590 | 92.4% | 7.74% | 11.9 |
| 340 | 78.7% | 0.18% | 425.9 | 595 | 92.0% | 8.07% | 11.4 |
| 345 | 79.0% | 0.19% | 426.8 | 600 | 92.3% | 8.44% | 10.9 |
| 350 | 79.5% | 0.19% | 422.9 | 605 | 92.3% | 8.77% | 10.5 |
| 355 | 79.6% | 0.19% | 417.8 | 610 | 92.5% | 9.11% | 10.2 |
| 360 | 80.4% | 0.20% | 408.2 | 615 | 92.7% | 9.45% | 9.8 |
| 365 | 80.4% | 0.21% | 387.9 | 620 | 92.5% | 9.83% | 9.4 |
| 370 | 81.1% | 0.22% | 369.6 | 625 | 92.6% | 10.16% | 9.1 |
| 375 | 81.4% | 0.23% | 346.5 | 630 | 92.4% | 10.55% | 8.8 |
| 380 | 82.3% | 0.26% | 320.5 | 635 | 92.7% | 10.92% | 8.5 |
| 385 | 82.8% | 0.28% | 297.1 | 640 | 92.6% | 11.26% | 8.2 |
| 390 | 82.9% | 0.31% | 269.9 | 645 | 92.7% | 11.63% | 8.0 |
| 395 | 83.6% | 0.34% | 246.0 | 650 | 92.8% | 12.01% | 7.7 |
| 400 | 84.0% | 0.38% | 223.5 | 655 | 93.1% | 12.35% | 7.5 |
| 405 | 84.4% | 0.42% | 201.9 | 660 | 93.1% | 12.72% | 7.3 |
| 410 | 84.9% | 0.47% | 182.1 | 665 | 93.3% | 13.08% | 7.1 |
| 415 | 85.0% | 0.52% | 164.3 | 670 | 93.3% | 13.46% | 6.9 |
| 420 | 85.7% | 0.58% | 147.9 | 675 | 93.2% | 13.79% | 6.8 |
| 425 | 85.9% | 0.65% | 132.4 | 680 | 93.5% | 14.14% | 6.6 |
| 430 | 86.1% | 0.72% | 119.4 | 685 | 93.5% | 14.48% | 6.5 |
| 435 | 86.5% | 0.81% | 107.4 | 690 | 93.5% | 14.84% | 6.3 |
| 440 | 87.0% | 0.89% | 97.3 | 695 | 93.5% | 15.20% | 6.1 |
| 445 | 87.2% | 0.99% | 87.7 | 700 | 93.6% | 15.55% | 6.0 |
| 450 | 87.6% | 1.10% | 79.5 |
[embodiment 9]
For polarizing film 10 shown in Fig. 8, from the side for being formed with filament with 60 degree of 45 degree of azimuth, incidence angle incident wavelengths
In the case where the light of 250nm, based on " numeric value analysis of diffraction optical element and its application ", (ball is kind to be published, chop house's perfume (or spice) vertebra for production
Son chief editor) documented by RCWA (Rigorous Coupled Wave Analysis) simulation model, and calculate polarized material
Refractive index n and extinction coefficient k with from polarizing film be emitted polarised light polarization axle rotation amount (°) relationship.Result is shown
In following table 11 and Fig. 9.
In addition, in order to be easy to calculate, the filament of polarizing film 10 shown in Fig. 8 is set as in the simulation model of the embodiment 9
The filament model for the polarizing material (single layer structure) being made of polarized material.The thickness of the filament of polarizing film 10 is set as 100nm,
Width is set as 33nm, and spacing is set as 100nm.
In addition, polarization axle rotation amount by the incidence angle of incident light be 0 degree situation polarization axis direction on the basis of, expression from this
The rotation amount (rotation angle) that direction is risen.
In curve graph shown in Fig. 9, the difference of the range of refractive index n and extinction coefficient k represented by m, n, o, p, q and r
Indicate 45 degree of azimuth and polarization axle rotation amount at 60 degree of incidence angle be+6 degree to+9 degree ,+3 degree to+6 degree, 0 degree extremely+3 spend ,-
3 degree to 0 degree, -6 degree extremely -3 degree and -9 are spent to the range of -6 degree.Therefore, in curve graph shown in Fig. 9, by azimuth 45
Degree and polarization axle rotation amount at 60 degree of incidence angle are the Range Representations of the refractive index n and extinction coefficient k of -3.0 degree to+3.0 degree
For white area.In addition, indicating that polarization axle rotation amount is 0 degree of refractive index by the black line of the substantial middle of above-mentioned white area
N and extinction coefficient k.
On the other hand, polarization axle rotation amount be -6.0 degree to -3.0 degree refractive index n and extinction coefficient k ranges and partially
The rotation amount of vibration axis is table in the range of the refractive index n and extinction coefficient k of+3.0 degree to+6.0 degree curve graph shown in Fig. 9
It is shown as light gray areas.
[table 11]
As shown in table 11 and Fig. 9, can confirm, by properly select constitute filament 2 polarized material refractive index n and
The range of extinction coefficient k, even if also can inhibit the inclined of polarised light in the case where being incident to the incidence angle of light of polarizing film and becoming larger
The rotation of vibration axis.
[embodiment 10]
Then, for polarizing film 10 shown in Fig. 10, from the side for being formed with filament with 0 degree of 0 degree of azimuth, incidence angle incidence
In the case where the light of wavelength 250nm, based on " numeric value analysis of diffraction optical element and its application ", (ball is kind to be published, chop house for production
Fragrant vertebra chief editor) documented by RCWA (Rigorous Coupled Wave Analysis) simulation model, and calculate composition
The refractive index n of the polarized material of filament and the relationship of extinction coefficient k and extinction ratio.Show the result in following table 12 and Figure 11.
In addition, in order to be easy to calculate, the filament of polarizing film 10 shown in Fig. 10 is set in the simulation model of the embodiment 10
For the filament model for the polarizing material (single layer structure) being made of polarized material.The thickness of the filament of polarizing film 10 is set as
100nm, width are set as 33nm, and spacing is set as 100nm.
[table 12]
In Figure 11, the range of refractive index n and extinction coefficient k represented by s, t, u and v respectively indicate 0 degree of azimuth and
Extinction ratio at 0 degree of incidence angle is 104To 105、103To 104、102To 103, 10 to 102And 1 to 10 range.
In addition, if each refractive index and each extinction coefficient and polarization axle are rotated based on table 11 and table 12 and Fig. 9 and Figure 11
The relationship of amount and each refractive index and each extinction coefficient are compared with the relationship of extinction ratio, if can then confirm, refractive index is phase
Same or similar value is then used as polarization compared with the material for making the smallest extinction coefficient of polarization axle rotation amount high by by extinction coefficient
Extinction ratio can be improved in material.
Using molybdenum silicide (MoSi) based material, by the adjusting of composition or the tune of the content of oxygen or nitrogen
The range of section, refractive index n and extinction coefficient k when can be by wavelength 250nm is set as 2.2≤n≤3.0 and 0.7≤k≤3.5 or so
Range.It can confirm wherein the refractive index and extinction coefficient that can be realized higher extinction ratio also while inhibiting polarization axle rotation amount
It is in the range of 2.3~2.8 for refractive index, Bees Wax is in the range of 1.4~2.4.
It can confirm that being wherein especially preferably refractive index is that Bees Wax is 1.7~2.2 in the range of 2.3~2.8
In the range of, especially when refractive index is that Bees Wax is in the range of 1.8~2.1 in the range of 2.4~2.8,
Effect becomes more significant.
[embodiment 11]
The refractive index n and extinction coefficient k of polarized material when by wavelength 250nm are set to 2.66 and 1.94, and will be thin
The thickness of line is set as 150nm, in addition to this, is made in mode same as Example 9 based on RCWA (Rigorous Coupled
Wave Analysis) simulation model, and calculate the polarization axle rotation amount of polarised light that be emitted from polarizing film and incidence angle (0 °,
10 °, 20 °, 30 °, 40 ° and 50 °) relationship.Show the result in Figure 12.
[embodiment 12]
About the refractive index n and extinction coefficient k of polarized material, respectively by 250nm wavelength when refractive index n be set as 2.66,
And extinction coefficient k is set as 1.94, and the thickness of filament is set as 170nm, in addition to this, in a manner of identical with embodiment 11
Calculate the polarization axle rotation amount for the polarised light being emitted from polarizing film and the pass of incidence angle (0 °, 10 °, 20 °, 30 °, 40 ° and 50 °)
System.Show the result in Figure 12.
[embodiment 13]
About the refractive index n and extinction coefficient k of polarized material, respectively by 250nm wavelength when refractive index n be set as 2.29,
And extinction coefficient k is set as 3.24, and the thickness of filament is set as 100nm, in addition to this, in a manner of identical with embodiment 11
Calculate the polarization axle rotation amount for the polarised light being emitted from polarizing film and the pass of incidence angle (0 °, 10 °, 20 °, 30 °, 40 ° and 50 °)
System.Show the result in Figure 12.
It can be confirmed according to Figure 12, even if polarized material is molybdenum silicide based material, also be caused because of refractive index and extinction coefficient
It is different to the disturbance degree of polarization axle rotation amount, i.e. axle offset.
Can confirm, if refractive index n is set as 2.66 and extinction coefficient k is set as 1.94 material, then relative to range
The axle offset of the incident light of wider incident angle, polarization axle is less.
[embodiment 14]
Prepare the synthetic quartz glass of film thickness 6.35mm as transparent substrate, and uses the hybrid target (Mo: Si=of molybdenum and silicon
1mol%: 2mol%), argon, nitrogen, oxygen mixed-gas environment under by reactive sputtering method formed molybdenum silicide based material film.
Compared with the film forming of the film of embodiment 8, increase nitrogen in order to adjust refractive index, a little oxygen is imported to adjust extinction coefficient.
Film thickness is set as 100nm.
In turn, on molybdenum silicide based material film, the nitrogen oxidation chromium film of 7nm is formed as hard mask using sputtering method.
Thereafter, in mode same as Example 8, polarizing film is obtained by being etched.
Width, thickness and the spacing of the filament of polarizing film obtained are respectively 36nm, 100nm and 100nm.
(structure evaluation of filament)
For the filament of the polarizing film of embodiment 14, the transmission-type ellipsometer (VUV- of Woollam company manufacture is utilized
VASE) structure is evaluated.
As a result, can confirm that above-mentioned filament has width and thickness is respectively 31.8nm and 95.8nm comprising silication molybdenum system
The upper surface film thickness and side film thickness of the molybdenum silicide based material layer of material and above-mentioned molybdenum silicide based material layer, respectively 4.2nm and
The oxidation film comprising silica of 4.2nm.
In addition, the refractive index and extinction coefficient of molybdenum silicide based material layer, i.e. molybdenum silicide based material (Mo: Si=1mol%:
2mol%) the refractive index n in 250nm wavelength is 2.66, and extinction coefficient k is 1.94.
(measurement of P wave transmissivity and S wave transmissivity)
P wave transmissivity and S wave transmissivity are measured in mode same as Example 8, calculates extinction ratio.Show the result in table
13 and Figure 13.
As shown in table 13 and Figure 13, in the range of wavelength 200nm~350nm, the P wave transmissivity of polarizing film be 48% with
On, extinction ratio is 40 or more.Wherein, in the range of 240nm~300nm, the P wave transmissivity of polarizing film is 61% or more, is disappeared
Light ratio is 142 or more.Especially in the range of 240nm~280nm, the P wave transmissivity of polarizing film is 61% or more, extinction ratio
It is 220 or more.
It can confirm that the polarizing film of the present embodiment can be suitably employed in wavelength 260nm or so optical alignment film being orientated
Material.
[table 13]
| Wavelength (nm) | P wave transmissivity | S wave transmissivity | Extinction ratio |
| 200 | 48% | 1% | 83.8 |
| 210 | 52% | 0% | 116.9 |
| 220 | 55% | 0% | 150.9 |
| 230 | 58% | 0% | 187.7 |
| 240 | 61% | 0% | 224.4 |
| 250 | 64% | 0% | 253.0 |
| 260 | 66% | 0% | 263.7 |
| 270 | 68% | 0% | 251.3 |
| 280 | 70% | 0% | 220.2 |
| 290 | 72% | 0% | 180.8 |
| 300 | 74% | 1% | 142.6 |
| 310 | 76% | 1% | 110.2 |
| 320 | 78% | 1% | 84.9 |
| 330 | 80% | 1% | 65.7 |
| 340 | 81% | 2% | 51.4 |
| 350 | 83% | 2% | 40.8 |
| 360 | 84% | 3% | 32.9 |
| 370 | 85% | 3% | 26.9 |
| 380 | 86% | 4% | 22.3 |
| 390 | 87% | 5% | 18.8 |
| 400 | 88% | 6% | 16.0 |
Symbol description
1 transparent substrate
2 filaments
3 polarizing materials
3 ' polarized material films
4 unpolarized material layers
10,10a, 10b, 10c, 10d polarizing film
11 pattern-like photoresists
20,30 light orientation device
21,31 polarizer unit
22,32 ultraviolet lamp
23,33 reflecting mirror
24,34 polarised light
25,35 optical alignment film
26,36 workpiece
41,42 interface.
Claims (9)
1. a kind of polarizing film, it is characterised in that: with a plurality of filament linearly configured side by side, the filament has containing inclined
Shake material polarizing material, the polarized material be molybdenum silicide based material, and the extinction ratio of the light of wavelength 250nm be 40 with
On.
2. polarizing film as described in claim 1, wherein the polarizing film is to be orientated restraining force for assigning to optical alignment film,
And the linearly polarized light of the light of the wavelength for generating ultraviolet range.
3. polarizing film as claimed in claim 1 or 2, wherein the refractive index of the light of the wavelength 250nm of the polarized material be
In the range of 2.0~3.2, and the extinction coefficient of the light of the wavelength 250nm of the polarized material is in the range of 2.7~3.5.
4. polarizing film as claimed in claim 1 or 2, wherein the refractive index of the light of the wavelength 250nm of the polarized material be
In the range of 2.3~2.8, and the extinction coefficient of the light of the wavelength 250nm of the polarized material is in the range of 1.4~2.4.
5. polarizing film as claimed in claim 1 or 2, wherein the film thickness of the polarizing material is 40nm or more, and described inclined
The spacing of vibration material interlayer is 150nm or less.
6. a kind of polarizing film substrate, it is characterised in that: include
Transparent substrate；And
The polarized material film containing polarized material being formed on the transparent substrate,
The polarized material is molybdenum silicide based material,
The refractive index of the light of the wavelength 250nm of the polarized material film be in the range of 2.0~3.2, the light of wavelength 250nm
Extinction coefficient is in the range of 2.7~3.5.
7. a kind of polarizing film substrate, it is characterised in that: include
Transparent substrate；And
The polarized material film containing polarized material being formed on the transparent substrate,
The polarized material is molybdenum silicide based material,
The refractive index of the light of the wavelength 250nm of the polarized material film be in the range of 2.3~2.8, the light of wavelength 250nm
Extinction coefficient is in the range of 1.4~2.4.
8. a kind of light orientation device is the light orientation device for making ultraviolet light polarization and exposing to optical alignment film, it is characterised in that:
Have polarizing film according to any one of claims 1 to 5, and the illumination polarized by the polarizing film is incident upon the light
Alignment films.
9. light orientation device as claimed in claim 8, wherein
Have the mechanism for keeping the optical alignment film mobile,
Moving direction and the two sides of the direction orthogonal thereto with the moving direction of the optical alignment film in the optical alignment film
To having multiple polarizing films, and
Not with the interface between the multiple polarizing film adjacent with the orthogonal thereto direction of the moving direction of the optical alignment film
The multiple polarizing film is configured in the mode that the moving direction of the optical alignment film is continuously connected.
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013234673 | 2013-11-13 | ||
| JP2013-234673 | 2013-11-13 | ||
| JP2013-263571 | 2013-12-20 | ||
| JP2013263571 | 2013-12-20 | ||
| JP2014053913A JP6409295B2 (en) | 2013-12-20 | 2014-03-17 | Polarizer and optical alignment device |
| JP2014-053913 | 2014-03-17 | ||
| JP2014-226345 | 2014-11-06 | ||
| JP2014226345A JP6428171B2 (en) | 2013-11-13 | 2014-11-06 | Polarizer, polarizer substrate and optical alignment apparatus |
| PCT/JP2014/079961 WO2015072482A1 (en) | 2013-11-13 | 2014-11-12 | Polarizer, polarizer substrate, and optical alignment device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105659119A CN105659119A (en) | 2016-06-08 |
| CN105659119B true CN105659119B (en) | 2019-02-15 |
Family
ID=54198196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480055919.9A Active CN105659119B (en) | 2013-11-13 | 2014-11-12 | Polarizing film, polarizing film substrate and light orientation device |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101827658B1 (en) |
| CN (1) | CN105659119B (en) |
| TW (2) | TWI625559B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018002205A1 (en) * | 2016-06-29 | 2018-01-04 | Koninklijke Philips N.V. | Light guides with coating to be used in water |
| CN106918947A (en) * | 2017-04-10 | 2017-07-04 | 惠科股份有限公司 | Display panel and method for manufacturing the same |
| EP3876001B1 (en) * | 2018-11-02 | 2024-05-22 | LG Chem, Ltd. | Circular polarizing plate |
| KR102395170B1 (en) | 2018-11-02 | 2022-05-10 | 주식회사 엘지화학 | Circularly polarizing plate |
| CN111679512A (en) * | 2020-06-05 | 2020-09-18 | Tcl华星光电技术有限公司 | Photo-alignment device and photo-alignment method |
| EP4208744A1 (en) * | 2020-09-03 | 2023-07-12 | Nil Technology ApS | Diffractive optical elements and master tools for producing the diffractive optical elements |
| CN117350020B (en) * | 2023-09-08 | 2025-03-21 | 常州工学院 | Optical engine polarization balance optimization method and system |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1520524A (en) * | 2001-04-26 | 2004-08-11 | 日本板硝子株式会社 | Polarizing device, and method for mfg. same |
| CN101566762A (en) * | 2008-04-24 | 2009-10-28 | 优志旺电机株式会社 | Polarized light irradiation device for light aligning |
| JP2010048999A (en) * | 2008-08-21 | 2010-03-04 | Asahi Kasei E-Materials Corp | Wire grid polarizer and display using the same |
| WO2013085284A1 (en) * | 2011-12-05 | 2013-06-13 | 주식회사 엘지화학 | Polarization separation element |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4815995B2 (en) * | 2005-10-24 | 2011-11-16 | ウシオ電機株式会社 | Polarized light irradiation device for photo-alignment |
| JP4488033B2 (en) * | 2007-02-06 | 2010-06-23 | ソニー株式会社 | Polarizing element and liquid crystal projector |
| JP5430126B2 (en) * | 2008-11-13 | 2014-02-26 | キヤノン株式会社 | Polarizer |
| KR101991521B1 (en) * | 2012-04-20 | 2019-06-20 | 이와사키 덴끼 가부시키가이샤 | Polarizer unit, jig for adjusting, lamp replacement stage and irradiation apparatus |
-
2014
- 2014-11-12 KR KR1020167010603A patent/KR101827658B1/en active Active
- 2014-11-12 CN CN201480055919.9A patent/CN105659119B/en active Active
- 2014-11-13 TW TW105143346A patent/TWI625559B/en active
- 2014-11-13 TW TW103139348A patent/TWI570461B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1520524A (en) * | 2001-04-26 | 2004-08-11 | 日本板硝子株式会社 | Polarizing device, and method for mfg. same |
| CN101566762A (en) * | 2008-04-24 | 2009-10-28 | 优志旺电机株式会社 | Polarized light irradiation device for light aligning |
| JP2010048999A (en) * | 2008-08-21 | 2010-03-04 | Asahi Kasei E-Materials Corp | Wire grid polarizer and display using the same |
| WO2013085284A1 (en) * | 2011-12-05 | 2013-06-13 | 주식회사 엘지화학 | Polarization separation element |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI625559B (en) | 2018-06-01 |
| CN105659119A (en) | 2016-06-08 |
| TWI570461B (en) | 2017-02-11 |
| TW201527808A (en) | 2015-07-16 |
| KR101827658B1 (en) | 2018-02-08 |
| KR20160085755A (en) | 2016-07-18 |
| TW201719206A (en) | 2017-06-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105659119B (en) | Polarizing film, polarizing film substrate and light orientation device | |
| CN105388551B (en) | Inorganic polarizing plate and method for manufacturing same | |
| TWI575305B (en) | Mask blanks, phase shift mask, and manufacturing method of phase shift mask | |
| JP6320944B2 (en) | Mask blank substrate, mask blank, transfer mask, manufacturing method thereof, and manufacturing method of semiconductor device | |
| TWI497191B (en) | Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device | |
| JP4961990B2 (en) | Mask blank and gradation mask | |
| TW201801148A (en) | Phase-shift mask blank for display device manufacture, phase-shift mask for display device manufacture and its manufacturing method, and method for manufacturing display device | |
| TW201712792A (en) | Device for semiconductor fabrication | |
| KR101991216B1 (en) | Polarizer, polarizer manufacturing method, optical alignment device and mounting method of polarizer | |
| CN110673436A (en) | Photomask, method for manufacturing photomask, and method for manufacturing display device | |
| JP6915280B2 (en) | Reflective photomask and reflective photomask blank | |
| JP6428171B2 (en) | Polarizer, polarizer substrate and optical alignment apparatus | |
| TW201019045A (en) | Multi-tone photomask, pattern transfer method and method of producing a display device using the multi-tone photomask | |
| JP6554768B2 (en) | Polarizer, laminated substrate, and photo-alignment apparatus | |
| WO2015072482A1 (en) | Polarizer, polarizer substrate, and optical alignment device | |
| JP6372205B2 (en) | Polarizer, method for manufacturing polarizer, and optical alignment apparatus | |
| JP6136675B2 (en) | Polarizer | |
| KR102559836B1 (en) | Polarizer, optical apparatus comprising the polarizer, display apparus comprising the polarizer and method for preparing the polarizer | |
| JP6266286B2 (en) | Mask blank substrate manufacturing method, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method | |
| JP6199115B2 (en) | Mask blank substrate manufacturing method, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method | |
| JP5668745B2 (en) | Gradation mask | |
| TWI664455B (en) | Polarizer and photo alignment device | |
| JP6409295B2 (en) | Polarizer and optical alignment device | |
| KR20090032802A (en) | Blank mask and photomask with back laminated film and manufacturing method | |
| JP6731441B2 (en) | Photomask and display device manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |