CN105629669B - Lithographic equipment - Google Patents
Lithographic equipment Download PDFInfo
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- CN105629669B CN105629669B CN201410604047.9A CN201410604047A CN105629669B CN 105629669 B CN105629669 B CN 105629669B CN 201410604047 A CN201410604047 A CN 201410604047A CN 105629669 B CN105629669 B CN 105629669B
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- balance mass
- mass block
- drive device
- work stage
- mask platform
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- 230000033001 locomotion Effects 0.000 claims abstract description 60
- 230000001360 synchronised effect Effects 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
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Abstract
The present invention discloses a kind of lithographic equipment, it is characterised in that including：One basic platform, and work stage, mask platform, work stage drive device, mask platform drive device and balance mass on the basic platform, the balance mass connects the work stage drive device and mask platform drive device respectively, to realize the motion of the synchronous backward of the work stage and mask platform during the lithographic equipment scan exposure.
Description
Technical field
The present invention relates to a kind of integrated circuit equipment manufacturing field, more particularly to a kind of lithographic equipment.
Background technology
In super large-scale integration optical lithography, determine that the wide principal element of Micropicture extra fine wire is lithographic equipment
Photoetching resolution, and the synchronous scanning campaign of mask and substrate is to influence one of key factor of photolithography resolution.
With the raising of LSI devices integrated level, litho machine working resolution requires more and more high, it is ensured that photoetching point
Resolution, it must just improve be synchronized with the movement precision and the sweep speed for holding bed (mask platform) and wafer-supporting platform (base station/work stage).
In order to improve litho machine resolving power, on the one hand synchronous error can be moved by reducing two platforms；On the other hand to reduce as far as possible
During platform is synchronized with the movement, particularly accelerate, the influence in moderating process to complete machine framework.
At present, work stage and reticle stage system are typically all solved in platform motion process using balance weight technology, are particularly added
Influence in speed, moderating process to complete machine framework.So-called balance weight technology is exactly to utilize principle of conservation of momentum：By the stator of motor
On the balance weight larger installed in quality, mover is supported with air-bearing respectively with balance weight；In the phase interaction of mover and stator
Under, they are just moved in the opposite direction respectively.
Bed will be held and wafer-supporting platform is integrally formed by proposing in the prior art, thus can simultaneously be moved, be effectively reduced
Synchronous motion error.It is relatively simple but two sports platforms are integrated to change method, work stage is carrying out substrate measurement, right
In quasi- flow, mask platform will also move simultaneously, can increase the relative slip of mask, and this method realization and control difficulty compared with
It is high.
A kind of litho machine is also proposed in the prior art, work stage, mask platform and optical projection system are rotated by 90 °, and is realized
Work stage and mask platform reduce platform and move influence to complete machine framework in the motion of vertical plane.This method is realized obvious
Improve work stage and mask platform realizes difficulty and control difficulty, and cost is higher.
The content of the invention
In order to overcome defect present in prior art, the present invention provides a kind of lithographic equipment, can simplify current scanline
Photo-etching machine work-piece platform and mask platform structure, and effectively improve the net synchronization capability of alignment system during scan exposure.
In order to realize foregoing invention purpose, the present invention discloses a kind of lithographic equipment, it is characterised in that including：One basis is flat
Platform, the work stage on the basic platform, mask platform, work stage drive device, mask platform drive device and balance mass,
Wherein, the balance mass includes the first balance mass block, the second balance mass block and connection the first balance mass block
With the balance mass connector of the second balance mass block, the first balance mass block and the second balance mass block point
The work stage drive device and the mask platform drive device are not connected, and the balance mass connector makes first balance
Mass and the second balance mass block synchronous backward are moved so as to realize the institute during the lithographic equipment scan exposure
State work stage and mask platform synchronous backward motion.
Further, the first balance mass block is connected with the motor stator of the work stage drive device, described
Second balance mass block is connected with the motor stator of the mask platform drive device, when the motor of the work stage drive device
When subband moves work stage positive movement so that the motor stator of the work stage drive device drives the first balance mass block
Counter motion so that the second balance mass block drives the motor stator positive movement of the mask platform drive device so that
The electric mover of the mask platform drive device drives the mask platform counter motion.
Further, the first balance mass block is connected with the motor stator of the work stage drive device, described
Second balance mass block is connected with the motor stator of the mask platform drive device, when the motor of the mask platform drive device
When subband moves mask platform positive movement so that the motor stator of the mask platform drive device drives the second balance mass block
Counter motion so that the first balance mass block drives the motor stator positive movement of the work stage drive device so that
The electric mover of the work stage drive device drives the work stage counter motion.
Further, the balance mass connector includes the first firmware in the first balance mass block, is located at
The second firmware in the second balance mass block and the linking arm of connection first firmware and the second firmware, pass through described the
One balance mass block drives the first firmware motion so that the linking arm drives second firmware to transport in the opposite direction
It is dynamic, so as to drive the second balance mass block to move.
Further, first firmware and the second firmware include sliding block and slide rail, and the linking arm passes through described
Sliding block is connected with the first balance mass block and the second balance mass block respectively, and the slide rail edge is vertical with the balance mass direction of motion
Direction set, the sliding block can slide on the slide rail, so as to drive the linking arm to realize the first balance mass block
With the relative motion of the second balance mass block.
Further, the balance mass connector includes the first connector, the second connector and connection described the
The gear of a connection piece and the second connector, the other end of first connector are connected with the first balance mass block, institute
The other end for stating the second connector is connected with the second balance mass block.
Further, the balance mass also includes an air supporting module, and the air supporting module is used to make the balance matter
Air film is formed between amount and the basic platform.
Further, the work stage, mask platform are connected by guide rail with the basic platform respectively.
Further, the lithographic equipment also includes lighting unit, projection objective, speculum group one and speculum group
Two；During scan exposure, lighting unit sends the exposure figure on light beam irradiation mask below the mask, make its into
As at speculum group one, then light beam enters projection objective, then is imaged on workpiece by speculum group two, final exposure figure
In the substrate of platform.
Scan orientation system in conventional lithography machine, including the work stage of the mask platform of carrying mask and bearing basement,
The influence to complete machine framework in design balance weight technology solution platform motion process is respectively adopted.This patent feature is to change tradition
Litho machine is laid out, and will be only used for reducing the balance mass unit of work stage impulsive force originally, while drive as mask platform long stroke
Moving cell, realize the Scan orientation function in litho machine.
Compared with prior art, the present invention is by effectively utilize balance mass principle, raising mask platform, work stage it is same
Walk performance；Work stage in tradition scanning litho machine is simplified, mask platform separately designs driver element, the knot of balance mass unit
Structure；By realizing work stage in terms of driving force, mask platform synchronous scanning, the Scan orientation system in conventional lithography machine is reduced
Control difficulty.
Brief description of the drawings
It can be obtained further by following detailed description of the invention and appended diagram on the advantages and spirit of the present invention
Solution.
Fig. 1 is the structural representation of lithographic equipment involved in the present invention；
Fig. 2 is the connected mode schematic diagram of work stage drive device, balance mass unit and mask platform drive device；
Fig. 3 is one of structural representation of balance mass unit；
Fig. 4 is the two of the structural representation of balance mass unit.
Embodiment
The specific embodiment that the invention will now be described in detail with reference to the accompanying drawings.
The present invention relates to a kind of lithographic equipment, including a basic platform, the work stage on the basic platform, mask
Platform, work stage drive device, mask platform drive device and balance mass, wherein, the balance mass includes the first balance mass
Block, the second balance mass block and connection the first balance mass block connect with the balance mass of the second balance mass block
Part, the first balance mass block and the second balance mass block connect the work stage drive device and the mask respectively
Platform drive device, the balance mass connector make the first balance mass block and the second balance mass block synchronous backward
So as to realize, the work stage and the mask platform synchronous backward move during the lithographic equipment scan exposure for motion.
Alternatively, the first balance mass block is connected with the motor stator of the work stage drive device, and described second
Balance mass block is connected with the motor stator of the mask platform drive device, when the electric mover band of the work stage drive device
During dynamic work stage positive movement so that the motor stator of the work stage drive device drives the first balance mass block reverse
Motion so that the second balance mass block drives the motor stator positive movement of the mask platform drive device so that described
The electric mover of mask platform drive device drives the mask platform counter motion.
Alternatively, the first balance mass block is connected with the motor stator of the work stage drive device, and described second
Balance mass block is connected with the motor stator of the mask platform drive device, when the electric mover band of the mask platform drive device
During dynamic mask platform positive movement so that the motor stator of the mask platform drive device drives the second balance mass block reverse
Motion so that the first balance mass block drives the motor stator positive movement of the work stage drive device so that described
The electric mover of work stage drive device drives the work stage counter motion.
Fig. 1 is the structural representation of lithographic equipment involved in the present invention.As shown in figure 1, litho machine of the present invention include with
Lower part：Projection objective 11, speculum group 10, speculum group 12, work stage, work stage drive device 13, balance mass 14, cover
Die station, mask platform drive device 17, lighting unit 18, vibration absorption unit 15, basic platform 16.During scan exposure, mask
On exposure figure be imaged on first at speculum group 10 by lighting unit 18, by the effect of speculum group 10, make image
Into projection objective 11, the exposure figure after imaging is ultimately imaged the basal surface carried in work stage by speculum group 12,
Realize exposure.During the scan exposure, mainly moved by the synchronous backward of work stage and mask platform in the Y direction and form scanning exposure
Light.
Wherein, balance mass 14 connects including the first balance mass block 14a, the second balance mass block 14b with balance mass
Part 14c, and balance mass connector 14c is used to connect the first balance mass block 14a, the second balance mass block 14b.
As shown in Fig. 2 work stage drive device 13, balance mass 14 is (in the part figure that balance mass 14 extends to both sides
Be not shown) and the on-link mode (OLM) of mask platform drive device 17 it is as follows：By work stage drive device Y1 to illustrating exemplified by layout, workpiece
The Y1 of platform drive device 13 connects the first balance mass block 14a to motor stator 22, and the Y1 of work stage drive device 13 is to motor
Mover 21 is connected with work stage Chuck20, realizes motions of the work stage Chuck20 on work stage Y1 direction guiding rails 23, meanwhile,
Second balance mass block 14b is connected with the Y1 of mask platform drive device 17 to motor stator 32, mask platform drive device 17
Y1 is connected to electric mover 31 with mask platform Chuck30, realizes fortune of the mask platform Chuck30 on mask platform Y1 direction guiding rails 33
It is dynamic.According to this catenation principle and mass conservation law, when the Y1 in work stage drive device 13 moves to electric mover 21
When, Y1 to motor stator 22 by equal in magnitude to electric mover 21 with the Y1 in work stage drive device 13, it is in opposite direction
Active force, drive the first balance mass block 14a motion, meanwhile, the second balance mass block 14b by with the first balance mass block
14a is equal in magnitude, active force in opposite direction, drives the Y1 of mask platform drive device 17 to be moved to motor stator 32, similarly, covers
The Y1 of die station drive device 17 is equal in magnitude to motor stator 32 by the Y1 with mask platform drive device 17 to electric mover 31,
Active force in opposite direction, motions of the mask platform Chuck30 on mask platform Y1 direction guiding rails 33 is driven, realizes work stage
Chuck20 and mask platform Chuck30 reverse sync are moved.
Further, since mask platform Chuck30 and need not all realize at any time it is synchronous with work stage Chuck20's fortune
It is dynamic, only need to be synchronized with the movement in exposure process, therefore, as shown in Fig. 2 it is gentle also to include air supporting 14d in balance mass 14
Floating 14e, air film is formed between basic platform 16 and balance mass 14, realizes the balance matter of the first balance mass block 14a and second
Gauge block 14b motion, when needing synchronous scanning, then air supporting is opened, realize mask platform Chuck30 and work stage Chuck20's
Be synchronized with the movement, when work stage, which carries out substrate measurement and exposure field, to be switched, then close air supporting, make the first balance mass block 14a and
Second balance mass block 14b is fixed on basic platform, and mask platform is by fine motion motor closed-loop control.
As shown in figure 3, enumerating the design of a balance mass 14, it is identical that balance mass connector 14c includes mechanism
Upper-part 60, lower component 60 and centre linking arm 63, upper-part 60 and lower component 60 are moved along Y-direction jointly.In part 60
Portion designs guide rail 61, and guide rail 61 links top shoe 62 and sliding block 62, and sliding block 62 can realize the slip of Z-direction along guide rail 61, and two
Realized and linked by linking arm 63 between individual sliding block 62.When mask platform Chuck30 and work stage Chuck20 do not have relative motion
When, balance mass 14 is in A, B1, B2 states, when mask platform Chuck30 is along Y positive movements, the second balance mass block 14b by
Acted in mask platform opposite force, along Y negative movements, now, lower component 60 and sliding block 62 along Y negative movements to B2 ' positions, by
In the effect of linking arm 63 (moving to A '), the stress of top shoe 62 by B1 along Y positive movements to B1 ' positions, therefore the first balance
Mass 14a is realized along Y positive movements, work stage Chuck20 realizes mask platform Chuck30 and work along Y negative movements
Part platform Chuck20 counter motion, similarly, balance mass 14 are in A ", the process of B1 ' ', B2 " state, it is possible to achieve mask platform
The relative motion of Chuck30 and work stage Chuck20 along another direction of Y.
As shown in figure 4, the design of another balance mass 14 is enumerated, by gear inside balance mass connector 14c
74th, conveyer belt 73, connector 71, connector 72 form.First balance mass block 14a passes through connector 71 and work stage
Chuck20 connections, the second balance mass block 14b is linked by connector 72 and mask platform Chuck30, as mask platform Chuck30
During along Y positive movements, the second balance mass block 14b is because mask platform opposite force acts on, along Y negative movements, now, connector 72
Clockwise movement is produced with gear 74, meanwhile, band the first balance mass block 14a of connector 71 on gear 74 transports along Y is positive
Dynamic, work stage Chuck20 realizes mask platform Chuck30 and work stage Chuck20 counter motion along Y negative movements.
The preferred embodiment of the simply present invention described in this specification, above example is only illustrating the present invention
Technical scheme rather than limitation of the present invention.All those skilled in the art pass through logic analysis, reasoning under this invention's idea
Or the limited available technical scheme of experiment, all should be within the scope of the present invention.
Claims (9)
- A kind of 1. lithographic equipment, it is characterised in that including：One basic platform, the work stage on the basic platform, mask Platform, work stage drive device, mask platform drive device and balance mass, wherein, the balance mass includes the first balance mass Block, the second balance mass block and connection the first balance mass block connect with the balance mass of the second balance mass block Part, the first balance mass block and the second balance mass block connect the work stage drive device and the mask respectively Platform drive device, the balance mass connector make the first balance mass block and the second balance mass block synchronous backward So as to realize, the work stage and the mask platform synchronous backward move during the lithographic equipment scan exposure for motion.
- 2. lithographic equipment as claimed in claim 1, it is characterised in that the first balance mass block drives with the work stage The motor stator connection of device, the second balance mass block are connected with the motor stator of the mask platform drive device, work as institute When stating the electric mover drive work stage positive movement of work stage drive device so that the motor of the work stage drive device is determined Subband moves the first balance mass block counter motion so that the second balance mass block drives the mask platform drive device Motor stator positive movement so that the electric mover of the mask platform drive device drives the mask platform counter motion.
- 3. lithographic equipment as claimed in claim 1, it is characterised in that the first balance mass block drives with the work stage The motor stator connection of device, the second balance mass block are connected with the motor stator of the mask platform drive device, work as institute When stating the electric mover drive mask platform positive movement of mask platform drive device so that the motor of the mask platform drive device is determined Subband moves the second balance mass block counter motion so that the first balance mass block drives the work stage drive device Motor stator positive movement so that the electric mover of the work stage drive device drives the work stage counter motion.
- 4. lithographic equipment as claimed in claim 2 or claim 3, it is characterised in that the balance mass connector includes being located at first The first firmware in balance mass block, the second firmware in the second balance mass block and connection first firmware and The linking arm of second firmware, first firmware is driven to move by the first balance mass block so that the linking arm band Move second firmware to move in the opposite direction, so as to drive the second balance mass block to move.
- 5. lithographic equipment as claimed in claim 4, it is characterised in that first firmware and the second firmware include sliding block and Slide rail, the linking arm are connected with the first balance mass block and the second balance mass block respectively by the sliding block, the slide rail Set along the direction vertical with the balance mass direction of motion, the sliding block can slide on the slide rail, described so as to drive Linking arm realizes the relative motion of the first balance mass block and the second balance mass block.
- 6. lithographic equipment as claimed in claim 2 or claim 3, it is characterised in that the balance mass connector includes the first connection Part, the second connector and the gear of connection first connector and the second connector, the other end of first connector It is connected with the first balance mass block, the other end of second connector is connected with the second balance mass block.
- 7. lithographic equipment as claimed in claim 2 or claim 3, it is characterised in that the balance mass also includes an air supporting module, institute Air supporting module is stated to be used to make to form air film between the balance mass and the basic platform.
- 8. lithographic equipment as claimed in claim 1, it is characterised in that the work stage, mask platform pass through guide rail and institute respectively State basic platform connection.
- 9. lithographic equipment as claimed in claim 1, it is characterised in that the lithographic equipment also includes lighting unit, projection thing Mirror, speculum group one and speculum group two；During scan exposure, lighting unit sends light beam irradiation below mask and covered Exposure figure on masterplate, it is set to be imaged at speculum group one, then light beam enters projection objective, then by speculum group Two, final exposure figure is imaged in the substrate of work stage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410604047.9A CN105629669B (en) | 2014-11-03 | 2014-11-03 | Lithographic equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410604047.9A CN105629669B (en) | 2014-11-03 | 2014-11-03 | Lithographic equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105629669A CN105629669A (en) | 2016-06-01 |
| CN105629669B true CN105629669B (en) | 2017-12-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410604047.9A Active CN105629669B (en) | 2014-11-03 | 2014-11-03 | Lithographic equipment |
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| CN (1) | CN105629669B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119575765B (en) * | 2024-12-13 | 2025-09-09 | 哈尔滨工业大学 | Diaphragm moving device, scanning moving method thereof and exposure device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6894762B1 (en) * | 2002-09-17 | 2005-05-17 | Lsi Logic Corporation | Dual source lithography for direct write application |
| CN101526747A (en) * | 2009-01-07 | 2009-09-09 | 上海微电子装备有限公司 | Double workpiece platform device |
| CN102073219A (en) * | 2009-11-20 | 2011-05-25 | 上海微电子装备有限公司 | Balancing mass system and workbench |
| CN103765315A (en) * | 2011-07-01 | 2014-04-30 | 卡尔蔡司Smt有限责任公司 | Optical imaging arrangement with individually actively supported components |
| CN103809384A (en) * | 2012-11-12 | 2014-05-21 | 上海微电子装备有限公司 | Balance mass system shared by workpiece platform and mask platform, and photo-etching machine |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW448487B (en) * | 1997-11-22 | 2001-08-01 | Nippon Kogaku Kk | Exposure apparatus, exposure method and manufacturing method of device |
-
2014
- 2014-11-03 CN CN201410604047.9A patent/CN105629669B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6894762B1 (en) * | 2002-09-17 | 2005-05-17 | Lsi Logic Corporation | Dual source lithography for direct write application |
| CN101526747A (en) * | 2009-01-07 | 2009-09-09 | 上海微电子装备有限公司 | Double workpiece platform device |
| CN102073219A (en) * | 2009-11-20 | 2011-05-25 | 上海微电子装备有限公司 | Balancing mass system and workbench |
| CN103765315A (en) * | 2011-07-01 | 2014-04-30 | 卡尔蔡司Smt有限责任公司 | Optical imaging arrangement with individually actively supported components |
| CN103809384A (en) * | 2012-11-12 | 2014-05-21 | 上海微电子装备有限公司 | Balance mass system shared by workpiece platform and mask platform, and photo-etching machine |
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| CN105629669A (en) | 2016-06-01 |
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