CN105579198A - Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk - Google Patents
Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk Download PDFInfo
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- CN105579198A CN105579198A CN201480053014.8A CN201480053014A CN105579198A CN 105579198 A CN105579198 A CN 105579198A CN 201480053014 A CN201480053014 A CN 201480053014A CN 105579198 A CN105579198 A CN 105579198A
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- Prior art keywords
- grinding
- glass substrate
- abrasive particle
- glass
- manufacture method
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
- B24B37/245—Pads with fixed abrasives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Surface Treatment Of Glass (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
The present invention provides a method whereby not only the machining speed can be improved during a grinding process utilizing a stationary grinding wheel, but stable grinding can also be enabled. In the present invention, during a grinding process for grinding a main surface of a glass substrate, the main surface of the glass substrate is ground by using a grinding tool that has grinding abrasive grains, a binding material for binding the grinding abrasive grains together, and dispersed grains that are harder than the binding material yet softer than the grinding abrasive grains, wherein the grinding abrasive grains and the dispersed grains are bound together in a dispersed state in the binding material.
Description
Technical field
The present invention relates to grinding tool applicable in the manufacture of the glass substrate for disc being equipped on the disk sets such as hard disk drive (HDD), employ the manufacture method of the glass substrate for disc of this grinding tool and the manufacture method of disk.
Background technology
As the one of information recording carrier being equipped on the disk sets such as hard disk drive (HDD), there is disk.Disk forms the films such as magnetosphere and forms on substrate, and as this substrate, the past uses aluminium base always.But recently, along with the requirement of the densification of record, glass substrate can make the interval between magnetic head and disk become narrower compared with aluminium base, and therefore the proportion of glass substrate uprises gradually.
In addition, grind to make the hoverheight of magnetic head to decline accurately to glass baseplate surface as far as possible, realize the densification recorded thus.In recent years, require larger recording capacity, low price more and more to HDD, in order to realize such object, glass substrate for disc also needs further high-quality, cost degradation.
As mentioned above, in order to the necessary low flying height of densification (suspension amount) for record is changed, magnetic disk surface must have high flatness.In order to obtain the high flatness of magnetic disk surface, result requires the substrate surface with high flatness, therefore needs to carry out high-precision grinding to glass baseplate surface.In order to make such glass substrate, carry out in grinding thickness of slab adjustment and after reducing flatness (flatness), reducing surface roughness or microrelief by carrying out milled processed further, realizing the high flatness at first type surface place thus.
In addition, in the past, in the grinding process (such as patent document 1 etc.) using free abrasive, the method for grinding (such as patent document 2 etc.) based on the bonded-abrasive employing diamond polishing pad was proposed.Diamond polishing pad uses the resin bond material such as (such as propylene resin etc.) diamond particles or some diamond particles to be fixed on material on sheet material by the condensation product (assembly abrasive particle) that the immobilization materials such as glass are fixing.In addition, also can be formed on sheet material and comprise the layer of adamantine resin after, form groove on the resin layer and make the material of overshooting shape.It should be noted that, in this so-called diamond polishing pad not necessarily usual address, be called " diamond polishing pad " for convenience of description in this manual.
For free abrasive in the past, the crooked abrasive particle of shape is entrained between price fixing and glass to be existed unevenly, therefore when the load applied to abrasive particle is non-constant, load is concentrated, disc setting surface is low elasticity because of cast iron, therefore on glass, produce darker crack, affected layer deepens and the machined surface roughness of glass also becomes large, therefore in the mirror ultrafinish operation of subsequent handling, need more removal amount, be therefore difficult to cut down processing cost.On the other hand, based on employing in the grinding of bonded-abrasive of diamond polishing pad, abrasive particle is present in sheet surface equably, therefore load is not concentrated, in addition because use resin to be fixed on sheet material by abrasive particle, even if therefore apply load to abrasive particle, by the high resiliency effect of resin that abrasive particle is fixed, also the crack of machined surface (affected layer) is likely made to shoal and reduce machined surface roughness, the load (allowance etc.) to subsequent handling can be reduced, and cut down processing cost.
Patent Document 2 discloses a kind of instrument utilizing the grinding of bonded-abrasive, abrasive composite (agglomerate) is scattered in organic resin inside with certain proportion and obtains by this bonded-abrasive, and diamond abrasive grain binding agent is combined into by this abrasive composite.
Prior art document
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2001-6161 publication
Patent document 2: Japanese Unexamined Patent Application Publication 2003-534137 publication
Summary of the invention
The problem that invention will solve
As described above, according to based on the method for grinding of bonded-abrasive employing diamond polishing pad, although the surface roughness of machined surface can be reduced, the load to mirror ultrafinish operation afterwards can be reduced, and cut down the processing cost of glass substrate, but find to there is problem as described below according to the research of the present inventor.
When use disclosed in above-mentioned patent document 2 utilize the grinding instrument of bonded-abrasive to carry out the grinding of glass substrate, need the agglomerate density selecting to conform to machining object, adjustment tonnage, controls fore-end (point of a knife) the institute applied pressure to diamond abrasive grain often.Particularly when processing is accelerated in hope, the low density grinding tool of agglomerate is selected to be favourable.In this case, because the interval of agglomerate is large, therefore process velocity accelerates, but the abrasion of instrument also accelerate.In addition, if agglomerate density is low, then disperseed agglomerate distance each other easily becomes uneven, easy uneven abrasion.If use so existing grinding tool to carry out the volume production of glass substrate, stage process speed is fast in the early stage, but repeatedly can there is the coming off of grinding abrasive particle, irregular wear, blocking etc., can fluctuating component be formed in tool surfaces, in the stage (through several batches from processing) relatively early, the reduction of process velocity and the quality reduction after processing can occur.Particularly, the quality reduction of flatness becomes remarkable.By the correction operation of removing in the fluctuating component of tool surfaces generation, the process velocity of reduction also can be made to recover, but need to carry out such correction operation continually, the load therefore produced is large.
In a word, in the prior art, be difficult to take into account process velocity and processing quality (particularly the flatness of substrate), good processing quality cannot be obtained long-term and stably with stable process velocity.
The present invention carries out to solve this existing problem, its object is to provide a kind of grinding tool, this grinding tool can realize taking into account process velocity and processing quality (particularly the flatness of substrate) in the grinding process using bonded-abrasive, is applicable to the grinding process obtaining the glass substrate of good processing quality with stable process velocity long-term and stably; And provide a kind of manufacture method of glass substrate for disc, this manufacture method comprises the grinding process using this grinding tool, can manufacture the glass substrate of high-quality; A kind of manufacture method that make use of the disk of the glass substrate obtained by this manufacture method is provided in addition.
For solving the scheme of problem
The present inventor is to improving process velocity and the solution of carrying out stable grinding is explored, and result completes the present invention.
That is, in order to solve above-mentioned problem, the present invention has following formation.
(forming 1)
A kind of manufacture method of glass substrate for disc, it is the manufacture method comprising the glass substrate for disc first type surface of glass substrate being carried out to the grinding process of grinding, it is characterized in that, in above-mentioned grinding process, grinding tool is used to carry out the grinding of glass substrate first type surface, this grinding tool possesses grinding abrasive particle, the bond material combined by this grinding abrasive particle and than this bond material firmly and than the dispersible granule of above-mentioned grinding abrasive particle softness, above-mentioned grinding abrasive particle and above-mentioned dispersible granule are to be scattered in the combinations of states in above-mentioned bond material.
(forming 2)
As formed the manufacture method of the glass substrate for disc as described in 1, it is characterized in that, above-mentioned bond material is resin material.
(forming 3)
As formed the manufacture method of the glass substrate for disc as described in 1 or 2, it is characterized in that, above-mentioned grinding abrasive particle is the assembly abrasive particle that the grinding abrasive particle of more than 2 is combined into by immobilization material.
(forming 4)
As formed the manufacture method of the glass substrate for disc according to any one of 1 ~ 3, it is characterized in that, above-mentioned grinding abrasive particle comprises diamond abrasive grain.
(forming 5)
As formed the manufacture method of the glass substrate for disc according to any one of 1 ~ 4, it is characterized in that, above-mentioned dispersible granule comprises aluminium oxide or zirconia.
(forming 6)
As formed the manufacture method of the glass substrate for disc according to any one of 1 ~ 4, it is characterized in that, above-mentioned dispersible granule comprises the glass more soft than the glass of institute grinding.
(forming 7)
As formed the manufacture method of the glass substrate for disc according to any one of 1 ~ 4, it is characterized in that, above-mentioned dispersible granule is the agglomerate that the dispersible granule of more than 2 is combined into by the glass more soft than the glass of institute grinding.
(forming 8)
As formed the manufacture method of the glass substrate for disc according to any one of 1 ~ 7, it is characterized in that, the above-mentioned dispersible granule in above-mentioned bond material is the scope of 0.1 times ~ 5 times relative to the ratio of above-mentioned grinding abrasive particle.
(forming 9)
A manufacture method for disk, is characterized in that, at least forms magnetic recording layer utilizing on the glass substrate for disc manufactured by the manufacture method of the glass substrate for disc according to any one of formation 1 ~ 8.
(forming 10)
A kind of grinding tool, it is for carrying out the grinding tool of grinding to glass baseplate surface used for electronic device, it is characterized in that, this grinding tool possesses grinding abrasive particle, the bond material combined by this grinding abrasive particle and than this bond material firmly and than the dispersible granule of above-mentioned grinding abrasive particle softness, above-mentioned grinding abrasive particle and above-mentioned dispersible granule are to be scattered in the combinations of states in above-mentioned bond material.
The effect of invention
According to the present invention, existing problem is solved by above-mentioned formation, a kind of grinding tool can be provided, this grinding tool can take into account process velocity and processing quality (particularly the flatness of substrate) in the grinding process using bonded-abrasive, is applicable to the grinding process obtaining the glass substrate of good processing quality with stable process velocity long-term and stably.In addition, comprise the grinding process using this grinding tool, the glass substrate of high-quality can be manufactured with low cost.In addition, utilize the glass substrate obtained by this manufacture method, the disk that reliability is high can be obtained.
Accompanying drawing explanation
Fig. 1 is the schematic sectional view of the structure that existing diamond polishing pad is shown.
Fig. 2 is the schematic diagram for illustration of state during grinding.
Detailed description of the invention
Below, embodiments of the present invention are described in detail.
Glass substrate for disc usually through shape processing, first type surface grinding, end surface grinding, first type surface grinding, chemical enhanced etc. to manufacture.
In the manufacture method of glass substrate for disc of the present invention, cut into prescribed level from the foliated glass by float glass process or glass tube down-drawing manufacture and obtain glass substrate.In addition, in addition, the sheet plate glass made by compacting by melten glass can also be used.The present invention is suitable for the situation using the glass substrate that first type surface is mirror-like when grinding starts.
Then, the grinding process for improving dimensional accuracy and form accuracy is carried out to this glass substrate.
This grinding usually uses double-sided grinding device and uses the hard abrasives such as diamond to carry out the grinding of glass substrate first type surface.Like this, be processed into thickness of slab, the flatness of regulation by carrying out grinding to glass substrate first type surface, and obtain the surface roughness of regulation.
The present invention relates to the improvement of this grinding process.Grinding process in the present invention is the grinding such as employing the grinding abrasive particle (bonded-abrasive) comprising diamond particles, in double-sided grinding device, make the glass substrate that kept by carrier closely sealed be such as pasted with diamond polishing pad as grinding tool up and down between price fixing, the upper and lower price fixing of further utilization clamps described glass substrate with authorized pressure, and glass substrate and upper and lower price fixing are relatively moved, side by side grinding is carried out to two first type surfaces of glass substrate thus.Now, lubricating fluid (cooling fluid) is supplied for cooling elaboration face or promoting processing.
The grinding tool (bonded-abrasive grinding stone) used in above-mentioned grinding process is such as diamond polishing pad, and the summary of its structure is shown in Fig. 1.Diamond polishing pad 1 shown in Fig. 1 is pasted with particle 4 on sheet material 2, this particle 4 uses the bond materials such as resin (such as acrylic resin etc.) fixedly to be formed by assembly abrasive particle 3, and this assembly abrasive particle 3 is that several diamond particles 5 (see Fig. 2) are fixedly formed by immobilization materials such as glass.Certainly, the structure shown in Fig. 1 is only an example, is not limited thereto.Such as, also can use following diamond polishing pad: formed on sheet material after comprising the layer of the resin of diamond particles, form groove at resin bed and make overshooting shape.
It should be noted that, in present embodiment, when being called bonded-abrasive or referred to as abrasive particle; only otherwise special declaration; then referring to the grinding abrasive particle of above-mentioned diamond particles and so on, in addition when being called the average grain diameter of abrasive particle, referring to the average grain diameter of above-mentioned grinding abrasive particle.
As described above, the present inventor finds out: utilize above-mentioned prior art to be difficult to take into account process velocity and processing quality (particularly the flatness of substrate), cannot obtain good processing quality long-term and stably with stable process velocity.
Therefore, the present inventor is to improving process velocity and the solution of carrying out stable grinding is explored, found that, by share grinding abrasive particle and the dispersible granule more soft than this grinding abrasive particle, use these grinding abrasive particles and dispersible granule to be scattered in the grinding tool of the combinations of states in bond material, above-mentioned problem can be solved.
In grinding tool of the present invention, when utilizing upper and lower price fixing clamping glass substrate, from price fixing, the power that grinding abrasive particle applies respectively is disperseed because of the existence of above-mentioned dispersible granule.That is, grinding abrasive grain density can be reduced reduce, increase the interval of grinding abrasive particle, improve process velocity, even and if grinding abrasive particle interval increase, owing to there is dispersible granule therebetween, thus can dispersion processing time from price fixing applied force, the abrasion of instrument can be suppressed.In addition, if grinding abrasive grain density is low, then the abrasive particle disperseed distance each other easily becomes uneven, in the present invention, as mentioned above, except grinding abrasive particle, also dispersible granule is dispersed with, its result, grinding abrasive particle also with uniform distance dispersion, is difficult to uneven abrasion each other.
Therefore, even if use this grinding tool of the present invention to carry out the volume production of glass substrate, also can suppress prior art such continuing to add man-hour and to be formed in tool surfaces the situation of fluctuating component, its result, process velocity and processing quality (particularly the flatness of substrate) can be taken into account, good processing quality can be obtained long-term and stably with stable process velocity.
Namely, in grinding process in the present invention the grinding tool that is suitable for be grinding tool glass baseplate surface being carried out to grinding, it is characterized in that, this grinding tool possesses grinding abrasive particle, the bond material combined by this grinding abrasive particle and than this bond material firmly and than the dispersible granule of above-mentioned grinding abrasive particle softness, above-mentioned grinding abrasive particle and above-mentioned dispersible granule are to be scattered in the combinations of states in above-mentioned bond material.
In addition, the invention is characterized in, carrying out in the grinding process of grinding to glass substrate, using above-mentioned grinding tool to carry out the grinding of glass substrate first type surface.
Above-mentioned grinding abrasive particle can be abrasive particle itself, but the assembly abrasive particle that the grinding abrasive particle being preferably more than 2 is combined into by immobilization material.The surface area of single abrasive particle is little, and thus held mechanical strength of resin is low, easily comes off.
In the present invention, above-mentioned grinding abrasive particle is preferably diamond abrasive grain.In this case, the average grain diameter of diamond abrasive grain is preferably the scope of 1.5 μm ~ about 10 μm.
If the average grain diameter of diamond abrasive grain is lower than above-mentioned scope, then the incision for mirror-like glass substrate shoals, and is likely difficult to be absorbed in glass substrate.On the other hand, if the average grain diameter of diamond abrasive grain is higher than above-mentioned scope, then because the roughness of finished product is thicker, the allowance load of subsequent handling is therefore likely made to become large.
In addition, when the assembly abrasive particle for diamond abrasive grain, the preferred cumulative mean particle diameter of particle diameter of this assembly abrasive particle is 30 μm ~ about 50 μm.
In addition, as the immobilization material that abrasive particle is fixed to one another, such as preferred glass material.
It should be noted that, in the present invention, above-mentioned average grain diameter refers to, when obtaining accumulation curve the cumulative volume of the powder group in the size distribution measured by laser diffractometry being set to 100%, its accumulation curve reaches the particle diameter (being called in " cumulative mean particle diameter (50% footpath) ") of the point of 50%.In the present invention, the value that cumulative mean particle diameter (50% footpath) specifically uses particle diameter/particle size distribution device etc. to measure.
As the bond material combined by grinding abrasive particle, such as, can enumerate metal, glass, resin material etc., glass not produced to the aspect of excessive infringement from having appropriate damping characteristics, being particularly preferably resin material.As resin material, acrylate, epoxy resin, Merlon, polyester etc. can be enumerated.
In the present invention, the above-mentioned dispersible granule be scattered in together with grinding abrasive particle in bond material is harder than this bond material and than the particle of grinding abrasive particle softness.Add when using lower price fixing clamping glass substrate man-hour, from price fixing, the existence of the above-mentioned dispersible granule of Li Keyin that grinding abrasive particle applies respectively is disperseed.The hardness of dispersible granule also depends on the material of bond material and grinding abrasive particle, is roughly about 6.5 ~ 9.5, therefore has the hardness than this hardness softness with Moh's hardness scale grinding abrasive particle.In addition, the glass used in particle is preferably the Mohs' hardness lower than abrasive particle.
As long as above-mentioned dispersible granule hardness meets above-mentioned condition, material is not particularly limited, from the viewpoint of Mohs' hardness, preferably comprise glass, aluminium oxide or zirconia.In addition, also can be the mixture of the particle that material is different.These materials appropriateness compared with diamond is soft, therefore wears away prior to diamond abrasive grain.Therefore adamantine processing can not be hindered.The scope of the average grain diameter of aluminium oxide or zirconic particle is preferably identical with the average grain diameter of diamond abrasive grain.
Above-mentioned dispersible granule can be particle itself, also can be the agglomerate that the dispersible granule of more than 2 is combined into by the immobilization material of glass as combined in such as vitrifying.Now the material of dispersible granule of more than 2 can be identical, also can be different.In addition, glass is now preferably the glass more soft than the glass substrate of institute grinding.
About the size of above-mentioned dispersible granule, preferably identical with the situation of agglomerate when particle itself.Thus, easily make both dispersed.
In addition, the size (being its size when assembling abrasive particle) of above-mentioned grinding abrasive particle is preferably roughly the same with the ratio of the size of dispersible granule, and particularly preferably both are identical size.About the ratio of grinding abrasive particle with the size of dispersible granule, in the ratio ((average grain diameter of dispersible granule)/(average grain diameter of grinding abrasive particle)) of the average grain diameter of dispersible granule relative to the average grain diameter of grinding abrasive particle, be preferably in the scope of 0.8 ~ 1.2.Thus, easily make both dispersed.
In addition, when using the fixative of the immobilization material of grinding abrasive particle and dispersible granule, preferably both bond materials are identical material.Thus, easily make both dispersed.
In addition, above-mentioned dispersible granule preferably also can for the particle be only made up of the glass more soft than the glass of institute grinding.
When the dispersible granule for being only made up of this glass, the size of dispersible granule and identical with the situation of the dispersible granules such as above-mentioned aluminium oxide with ratio of the size of grinding abrasive particle etc.
Concerning grinding tool of the present invention, above-mentioned grinding abrasive particle and above-mentioned dispersible granule, to be scattered in the combinations of states in above-mentioned bond material, specifically, such as can enumerate share of the non-diamond dispersible granules such as diamond grinding abrasive particle and aluminium oxide as embodiment; Diamond grinding abrasive particle share with the dispersible granule be made up of glass; Or the non-diamond dispersible granules such as diamond grinding abrasive particle, aluminium oxide, with the share of the dispersible granule to be made up of glass.
In the present invention, particularly preferably by embodiment Ru that diamond grinding abrasive particle share with the dispersible granule to be made up of glass.By this embodiment, the dispersion effect preventing fluctuating component from producing reaches the highest.
In the present invention, the ratio of the above-mentioned grinding abrasive particle in bond material and above-mentioned dispersible granule to be not particularly limited, from the viewpoint of action effect of the present invention can be given full play to, to be preferably following dispersion ratio.
When share the non-diamond dispersible granules such as diamond grinding abrasive particle and aluminium oxide, relative to grinding abrasive particle 1, dispersible granule is preferably the scope of 0.1 times ~ 3 times.
In addition, when share diamond grinding abrasive particle and by the dispersible granule that glass is formed, relative to grinding abrasive particle 1, dispersible granule is preferably the scope of 0.1 times ~ 5 times.
In addition, when share the non-diamond dispersible granules such as diamond grinding abrasive particle, aluminium oxide and by the dispersible granule that glass is formed, relative to grinding abrasive particle 1, the total amount of dispersible granule is preferably the scope of 0.1 times ~ 5 times.
In addition, in grinding face, the density being scattered in the total (when assembling abrasive particle or agglomerate, being can be regarded as 1) of the bonded-abrasive in the bond materials such as resin is preferably 10 ~ 40 (individual/mm
2) scope.In addition, the content of the bonded-abrasive in grinding tool is preferably 5 volume % ~ 80 volume %.If the content of bonded-abrasive departs from above-mentioned scope (exceed and include interior with deficiency), then cause the increase of process time all sometimes and cost is raised.
In the present invention, make to assemble together with abrasive particle with diamond than the abrasive particle of the material of diamond abrasive grain softness and agglomerate thereof to disperse, thus the abrasive particle spacing that diamond can be made to assemble abrasive particle extends equably.In addition, can prevent excessive pressure from concentrating on diamond and assemble abrasive particle.Thus, also stably can process at high processing speeds, good flatness can be maintained.
In grinding process in the present invention, the load adding man-hour is preferably 15g/cm in face pressure
2~ 200g/cm
2.
It should be noted that, such as, when grinding being carried out to the glass baseplate surface of mirror-like with diamond polishing pad, first, in order to make diamond abrasive grain be absorbed in glass baseplate surface, preferably glass surface is applied than load higher during common grinding.When high load capacity, the penetraction depth of abrasive particle correspondingly deepens, and the roughness of glass surface therefore can be made to become large (roughening).
Be roughened at this processing initial stage glass surface, for grinding, do not need high load capacity afterwards, preferably reduce load on the contrary, under the condition of penetraction depth reducing abrasive particle, carry out grinding.Fig. 2 is the schematic diagram for illustration of state during grinding, shows diamond abrasive grain 3 and is absorbed in glass substrate 10 and the state (imaginary drawing) of carrying out grinding.
In the present invention, the surface roughness of the glass substrate after terminating about grinding process, is preferably processed into the scope of 0.02 μm ~ 3.0 μm in Ra.By like this, the roughness of processing is suppressed, for lower, can reduce the machining load of subsequent handling.
In the present invention, glass (glass types) the preferably amorphous alumina silicate glass of glass substrate is formed.For such glass substrate, carry out mirror ultrafinish and can be formed as level and smooth minute surface by effects on surface, the intensity in addition after processing is good.As such alumina silicate glass, such as preferred with SiO
2the Al of less than 20 % by weight is comprised as main component
2o
3glass.And, more preferably with SiO
2the Al of less than 15 % by weight is comprised as main component
2o
3glass.Specifically, can use containing more than 62 % by weight and the SiO of less than 75 % by weight
2, more than 5 % by weight and the Al of less than 15 % by weight
2o
3, more than 4 % by weight and the Li of less than 10 % by weight
2o, more than 4 % by weight and the Na of less than 12 % by weight
2o, more than 5.5 % by weight and the ZrO of less than 15 % by weight
2as main component, and Na
2o/ZrO
2weight ratio be more than 0.5 and less than 2.0, Al
2o
3/ ZrO
2weight ratio be more than 0.4 and the amorphous alumina silicate glass not comprising phosphorous oxides of less than 2.5.
In addition, as the heat resistance glass of the disk for follow-on HAMR, can preferably use such as % by mole to represent the SiO containing 50% ~ 75%
2, 0% ~ 5% Al
2o
3, the BaO of 0% ~ 2%, the Li of 0% ~ 3%
2o, 0% ~ 5% ZnO, add up to 3% ~ 15% Na
2o and K
2o, add up to MgO, CaO, SrO and BaO of 14% ~ 35%, add up to the ZrO of 2% ~ 9%
2, TiO
2, La
2o
3, Y
2o
3, Yb
2o
3, Ta
2o
5, Nb
2o
5and HfO
2, the scope of mol ratio [(MgO+CaO)/(MgO+CaO+SrO+BaO)] 0.85 ~ 1 and mol ratio [Al
2o
3/ (MgO+CaO)] glass of scope 0 ~ 0.30.
In addition, also can be SiO containing 56 % by mole ~ 75 % by mole
2, the Al of 1 % by mole ~ 9 % by mole
2o
3, add up to 6 % by mole ~ 15 % by mole be selected from by Li
2o, Na
2o and K
2alkaline metal oxide in the group of O composition, add up to 10 % by mole ~ 30 % by mole be selected from alkaline earth oxide in the group be made up of MgO, CaO and SrO, add up to more than 0% and less than 10 % by mole be selected from by ZrO
2, TiO
2, Y
2o
3, La
2o
3, Gd
2o
3, Nb
2o
5and Ta
2o
5oxide glass in the group of composition.
In the present invention, the Al in glass ingredient
2o
3content be preferably less than 15 % by weight.Further, Al
2o
3content be more preferably less than 5 % by mole.
After grinding process described above terminates, carry out the mirror ultrafinish processing for obtaining high-precision plane.In the present invention, can stable processing be carried out in the grinding process utilizing bonded-abrasive, therefore can reduce the removal amount in the processing of follow-up mirror ultrafinish, reduce processing load, and can processing cost be cut down.
As the mirror ultrafinish method of glass substrate, the preferably slurry (lapping liquid) of the grinding-material of supply containing the metal oxide such as cerium oxide or colloidal silica, while use the grinding pad of the polishing materials such as polyurethane to grind.The glass substrate with high flatness can obtain in the following manner: use such as cerium oxide abrasives to carry out grinding rear (the 1st attrition process), then carries out polishing grinding (mirror ultrafinish) (the 2nd attrition process) employing colloidal silica abrasive particle.
In the present invention, the surface of the glass substrate after mirror ultrafinish processing preferably becomes to represent it is below 0.2nm, the minute surface being more preferably below 0.1nm with arithmetic mean surface roughness Ra.In addition, when mentioning arithmetic average roughness Ra in the present invention, be the roughness calculated according to Japanese Industrial Standards (JIS) B0601.
In addition, surface roughness (above-mentioned arithmetic average roughness Ra) practicality is in the present invention preferably the surface roughness of the surface configuration obtained when measuring with AFM (AFM).
In the present invention, chemical intensification treatment can be implemented.As the method for chemical intensification treatment, preference is as carried out the low form ion-exchange etc. of ion-exchange in the temperature province being no more than glass transition temperature.Chemical intensification treatment refers to following process: the chemical enhanced salt of melting is contacted with glass substrate, thus make the alkali metal little alkali metal generation ion-exchange relative to glass substrate Atom radius that chemical enhanced salt Atom radius is relatively large, make the large alkali metal of this ionic radius infiltrate into the top layer of glass substrate, produce compression stress on the surface of glass substrate.Through the excellent impact resistance of the glass substrate of chemical intensification treatment, be therefore particularly preferably equipped on the HDD such as moving purposes.As chemical enhanced salt, preferably the alkali nitrates such as potassium nitrate, sodium nitrate can be used.
In addition, the present invention also provides the manufacture method of the disk employing above-mentioned glass substrate for disc.
In the present invention, disk manufactures by least forming magnetic recording layer (magnetosphere) on glass substrate for disc of the present invention.As magnetospheric material, the CoCrPt system as hexagonal crystal system that anisotropy field can be used large or CoPt system strong magnetic alloy.As magnetospheric formation method, preferably use by sputtering method (such as DC magnetron sputtering method) on the glass substrate film forming go out magnetospheric method.
In addition, also protective layer, lubricating layer can be formed on above-mentioned magnetic recording layer.As the preferred amorphous-carbon-based protective layer of protective layer.In addition, the end that can be used in the main chain of per-fluoro polyether compound as lubricating layer has the lubricant of functional group.
By using the glass substrate for disc obtained by the present invention, the disk that reliability is higher can be obtained.
Embodiment
Below, enumerate embodiment to be specifically described embodiments of the present invention.In addition, the invention is not restricted to following examples.
(embodiment 1)
, (7) first type surface grinding (2nd grinding) chemical enhanced through the preparation of following (1) substrate, the processing of (2) shape, (3) end surface grinding, (4) first type surface grinding, (5) first type surface grinding (the 1st grinding), (6) has manufactured the glass substrate for disc of the present embodiment.
(1) substrate prepares
The thickness preparing to be manufactured by float glass process is the large glass sheet be made up of alumina silicate glass of 1mm, uses diamond cutter to be cut into the foursquare small pieces of 70mm × 70mm.Then, diamond cutter is used to be processed into the disc-shape that external diameter is 65mm, internal diameter is 20mm.As this alumina silicate glass, employ the SiO containing 62 % by weight ~ 75 % by weight
2, 5.5 % by weight ~ 15 % by weight ZrO
2, 5 % by weight ~ 15 % by weight Al
2o
3, 4 % by weight ~ 10 % by weight Li
2o, 4 % by weight ~ 12 % by weight Na
2o can be chemical enhanced glass.
The minute surface of to be surface roughness Ra be on the surface of the substrate obtained below 5nm.
(2) shape processing
Then, use ciamond grinder to get through hole at the middle body of glass substrate, and implement the chamfer machining of regulation at peripheral end face and inner circumferential end face.
(3) end surface grinding
Then, by scratch brushing grinding, glass substrate is rotated to grind the end face (inner circumferential, periphery) of glass substrate.
(4) first type surface grinding
Use double-sided grinding device in this first type surface grinding, be arranged through what be pasted with diamond polishing pad the glass substrate that carrier keeps up and down between price fixing, process thus.In the present embodiment, employ following diamond polishing pad as diamond polishing pad, this diamond polishing spacer is standby: by the diamond abrasive grain of more than 2 by glass assembly abrasive particle fixedly; By the alumina particle of more than 2 by glass agglomerate fixedly; With the resin this assembly abrasive particle of more than 2 and agglomerate combined, the mode that they are 1:0.5 according to the ratio that the average grain diameter of diamond abrasive grain is 4.0 μm, the average grain diameter of adamantine assembly abrasive particle is 40 μm, the average grain diameter of alumina particle is 4.0 μm, the average grain diameter of condensed alumina body is 40 μm, maximum particle diameter is 45 μm, diamond assembles abrasive particle and condensed alumina body is scattered in resin.The glass of fixing above-mentioned abrasive particle etc. employs the little glass of glass that hardness ratio processes.In addition, the density being aggregated in grinding face of above-mentioned bonded-abrasive is 20 (individual/mm
2).In addition, lubricating fluid is used to process.In addition, suitably adjust the rotating speed of price fixing, the load of glass substrate is processed.
(5) first type surface grinding (the 1st grinding)
Then, use double-side polishing apparatus carries out the 1st grinding for removing scar residual in above-mentioned grinding or distortion.In double-side polishing apparatus, between the price fixing of the grinding up and down glass substrate kept by carrier being close to be pasted with grinding pad, and make this carrier and central gear (sungear, sun gear) and internal gear (internalgear, inside engaged gear) engagement, and clamp above-mentioned glass substrate by upper and lower price fixing.Thereafter, to supplying lapping liquid between grinding pad and the abradant surface of glass substrate and making it rotate, glass substrate rotation on price fixing, while revolution, carries out attrition process to two-sided thus simultaneously.Specifically, utilize hard polishing material (hard foamed carbamate) as polishing material, implement the 1st grinding.The pure water disperseed as grinding agent by cerium oxide as lapping liquid, and suitably sets load, milling time.The glass substrate completing above-mentioned 1st grinding step is impregnated into successively in each rinse bath of neutral detergent, pure water, IPA (isopropyl alcohol), IPA (vapour seasoning), carries out Ultrasonic Cleaning and drying.
(6) chemical enhanced
Then, implement chemical enhanced to the glass substrate completing above-mentioned cleaning.In chemical enhanced, prepare chemical enhanced liquid potassium nitrate and sodium nitrate mixed, this chemical reinforcing solution is heated to 380 DEG C, and the glass substrate completing above-mentioned cleaning and drying is flooded about 4 hours, carry out chemical intensification treatment.
(7) first type surface grinding (the 2nd grinding)
Next, utilize with grind the above-mentioned 1st in the same double-side polishing apparatus of the lapping device that uses, polishing material is replaced with the grinding pad (polyurathamc) of soft polishing material (suede), thus enforcement the 2nd is ground.2nd grinding is mirror ultrafinish processing, to maintain in above-mentioned 1st grinding while the smooth surface that obtains, and the surface roughness Ra being polished to such as glass substrate first type surface is the following level and smooth minute surface of about 0.2nm.As lapping liquid, be set as the pure water being dispersed with colloidal silica, and suitably set load, milling time.The glass substrate completing above-mentioned 2nd grinding step is impregnated into successively in each rinse bath of neutral detergent, pure water, IPA, IPA (vapour seasoning), carries out Ultrasonic Cleaning and drying.
Utilize AFM (AFM) surface roughness to the first type surface of the glass substrate obtained through above-mentioned operation to measure, result obtains the glass substrate having super level and smooth surface of Rmax=1.53nm, Ra=0.13nm.
(embodiment 2)
In the first type surface grinding of embodiment 1, use following diamond polishing pad, this diamond polishing spacer is standby: by the diamond abrasive grain of more than 2 by glass assembly abrasive particle fixedly; The dispersible granule of more than 2 that are formed by glass; With the resin that this assembly abrasive particle of more than 2 and dispersible granule are combined, they according to the average grain diameter of diamond abrasive grain be about 4.0 μm, to assemble the average grain diameter of abrasive particle is 40 μm, the average grain diameter of glass dispersible grain is 4.0 μm, the maximum particle diameter of glass agglomerate is 45 μm, diamond assembles abrasive particle and glass agglomerate ratio be that the mode of 1:0.5 is scattered in resin to diamond, carry out grinding similarly to Example 1 in addition, produce glass substrate for disc.
(embodiment 3)
In the first type surface grinding of embodiment 1, use following diamond polishing pad, this diamond polishing spacer is standby: by the diamond abrasive grain of more than 2 by glass assembly abrasive particle fixedly, by the alumina particle of more than 2 by glass agglomerate fixedly, the dispersible granule agglomerate of more than 2 that are formed by glass, with by this assembly abrasive particle of more than 2, the resin that alumina particle agglomerate and glass dispersible grain agglomerate combine, they are about 4.0 μm according to the average grain diameter of diamond abrasive grain, the average grain diameter of alumina particle is about 1 μm ~ 4.0 μm, the average grain diameter of glass particle is about 1 μm ~ 4.0 μm, the maximum particle diameter of condensed alumina body and glass agglomerate is 45 μm, these diamonds assemble abrasive particle, the ratio of condensed alumina body and glass agglomerate is that the mode of 1:0.5:0.5 is scattered in resin, carry out grinding similarly to Example 1 in addition, produce glass substrate for disc.
(comparative example 1)
Existing diamond polishing pad is used in the first type surface grinding of embodiment 1, this diamond polishing pad is dispersed with the diamond abrasive grain of more than 2 by glass assembly abrasive particle fixedly (average grain diameter of diamond abrasive grain is about 4.0 μm) in resin, carry out grinding similarly to Example 1 in addition, produce glass substrate for disc.
(comparative example 2)
The total of bonded-abrasive (be only diamond in this example and assemble abrasive particle) is made to be 30 (individual/mm in the density of grinding face
2) diamond polishing pad, carry out grinding in addition in the same manner as comparative example 1, produce glass substrate for disc.
In the various embodiments described above and comparative example, about above-mentioned first type surface grinding, carry out Continuous maching in every 1 batch of 100 opening and closing 100 batches.
In above-described embodiment and comparative example, for the glass substrate after grinding, flatness measuring instrument is used to carry out the mensuration of flatness, using the benchmark (less than 3 μm) of regulation as certified products, calculate the incidence (flatness fraction defective) of the glass substrate not meeting this benchmark, show the result in table 1.In addition, the process velocity (the process velocity ratio relative to comparative example 1) during grinding is also shown in Table 1 in the lump.
[table 1]
By the known following content of the result of above-mentioned table 1.
1. using the existing diamond that only comprises to assemble in the comparative example 1 of the grinding tool (diamond polishing pad) of abrasive particle, if carry out the Continuous maching of 100 batches, then process velocity and processing quality reduce, and cannot carry out stable grinding.
On the other hand, in use, alumina particle agglomerate or glass dispersible grain or alumina particle agglomerate are assembled in the embodiment 1 ~ 3 of the grinding tool disperseed together with abrasive particle with glass dispersible grain and diamond, process velocity and processing quality (particularly the flatness of substrate) can be taken into account, good processing quality can be obtained long-term and stably with stable process velocity.Particularly, in the embodiment 2 share diamond assembly abrasive particle and glass dispersible grain, flatness fraction defective is 0%.
In addition, more known by comparative example 1,2, for existing diamond polishing pad, if reduce the grinding face density of bonded-abrasive, although process velocity improves, flatness fraction defective is deteriorated.This shows, merely reduces bonded-abrasive density and cannot carry out stable processing.
(manufacture of disk)
Following film formation process is implemented to the glass substrate for disc obtained in above-described embodiment 1, obtains perpendicular magnetic recording disk.
That is, on above-mentioned glass substrate, film forming goes out the adhesion layer be made up of Ti system alloy firm, the soft ferromagnetic layer be made up of CoTaZr alloy firm, the bottom be made up of Ru film, the perpendicular magnetic recording layer be made up of CoCrPt alloy, protective layer, lubricating layer successively.Protective layer is that film forming goes out hydrogenated carbon layer.In addition, lubricating layer is the fluid lubricant being defined alcohol modification PFPE by infusion process.
For obtained disk, embed and there is the HDD of DFH magnetic head, at 80 DEG C and the load/unload endurancing making performance DFH function carry out under the hot and humid environment of 80%RH 1 month, especially, there is no fault, obtain good result.
Symbol description
1 diamond polishing pad
2 sheet materials
3 assemble abrasive particle
4 particles
5 diamond particles
10 glass substrates
Claims (10)
1. a manufacture method for glass substrate for disc, it is the manufacture method comprising the glass substrate for disc first type surface of glass substrate being carried out to the grinding process of grinding, it is characterized in that,
In described grinding process, grinding tool is used to carry out the grinding of glass substrate first type surface, this grinding tool possesses grinding abrasive particle, the bond material combined by this grinding abrasive particle and than this bond material firmly and than the dispersible granule of described grinding abrasive particle softness, described grinding abrasive particle and described dispersible granule are to be scattered in the combinations of states in described bond material.
2. the manufacture method of glass substrate for disc as claimed in claim 1, it is characterized in that, described bond material is resin material.
3. the manufacture method of glass substrate for disc as claimed in claim 1 or 2, it is characterized in that, described grinding abrasive particle is the assembly abrasive particle that the grinding abrasive particle of more than 2 is combined into by immobilization material.
4. the manufacture method of the glass substrate for disc according to any one of claims 1 to 3, is characterized in that, described grinding abrasive particle comprises diamond abrasive grain.
5. the manufacture method of the glass substrate for disc according to any one of Claims 1 to 4, is characterized in that, described dispersible granule comprises aluminium oxide or zirconia.
6. the manufacture method of the glass substrate for disc according to any one of Claims 1 to 4, is characterized in that, described dispersible granule comprises the glass more soft than the glass of institute grinding.
7. the manufacture method of the glass substrate for disc according to any one of Claims 1 to 4, is characterized in that, described dispersible granule is the agglomerate that the dispersible granule of more than 2 is combined into by the glass more soft than the glass of institute grinding.
8. the manufacture method of the glass substrate for disc according to any one of claim 1 ~ 7, is characterized in that, the described dispersible granule in described bond material is the scope of 0.1 times ~ 5 times relative to the ratio of described grinding abrasive particle.
9. a manufacture method for disk, is characterized in that, at least forms magnetic recording layer utilizing on the glass substrate for disc manufactured by the manufacture method of the glass substrate for disc according to any one of claim 1 ~ 8.
10. a grinding tool, it is grinding tool glass baseplate surface used for electronic device being carried out to grinding, it is characterized in that,
This grinding tool possesses grinding abrasive particle, the bond material combined by this grinding abrasive particle and than this bond material firmly and than the dispersible granule of described grinding abrasive particle softness, described grinding abrasive particle and described dispersible granule are to be scattered in the combinations of states in described bond material.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810239795.XA CN108447507B (en) | 2013-09-28 | 2014-09-29 | Method for manufacturing glass substrate for magnetic disk, method for manufacturing magnetic disk, and grinding tool |
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| JP2013202843 | 2013-09-28 | ||
| JP2013-202843 | 2013-09-28 | ||
| PCT/JP2014/075966 WO2015046543A1 (en) | 2013-09-28 | 2014-09-29 | Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk |
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| CN105579198A true CN105579198A (en) | 2016-05-11 |
| CN105579198B CN105579198B (en) | 2018-04-27 |
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| CN201480053014.8A Active CN105579198B (en) | 2013-09-28 | 2014-09-29 | The manufacture method of glass substrate for disc and the manufacture method of disk and grinding tool |
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| JP (2) | JP6313314B2 (en) |
| CN (2) | CN108447507B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113808627A (en) * | 2017-09-29 | 2021-12-17 | Hoya株式会社 | Glass spacer and hard disk drive device |
Families Citing this family (5)
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| JP6313314B2 (en) * | 2013-09-28 | 2018-04-18 | Hoya株式会社 | Manufacturing method of glass substrate for magnetic disk, manufacturing method of glass substrate, manufacturing method of magnetic disk, and grinding tool |
| WO2016181751A1 (en) * | 2015-05-13 | 2016-11-17 | バンドー化学株式会社 | Polishing pad and method for manufacturing polishing pad |
| JP6279108B2 (en) * | 2016-01-06 | 2018-02-14 | バンドー化学株式会社 | Abrasive |
| JP7023829B2 (en) * | 2018-12-20 | 2022-02-22 | 本田技研工業株式会社 | Vitrified grindstone and its manufacturing method |
| JP7513985B2 (en) | 2020-10-19 | 2024-07-10 | ケヰテック株式会社 | Abrasive composition |
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Also Published As
| Publication number | Publication date |
|---|---|
| SG10202006113YA (en) | 2020-07-29 |
| JP6490842B2 (en) | 2019-03-27 |
| JP2018092697A (en) | 2018-06-14 |
| JPWO2015046543A1 (en) | 2017-03-09 |
| WO2015046543A1 (en) | 2015-04-02 |
| SG11201602379QA (en) | 2016-05-30 |
| JP6313314B2 (en) | 2018-04-18 |
| MY176672A (en) | 2020-08-19 |
| CN108447507B (en) | 2020-07-28 |
| CN108447507A (en) | 2018-08-24 |
| CN105579198B (en) | 2018-04-27 |
| WO2015046543A8 (en) | 2016-04-21 |
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