CN105425471B - A kind of array substrate and preparation method thereof, display device - Google Patents
A kind of array substrate and preparation method thereof, display device Download PDFInfo
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- 238000002360 preparation method Methods 0.000 title 1
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- 239000002184 metal Substances 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 238000010586 diagram Methods 0.000 description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 4
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- 229910052802 copper Inorganic materials 0.000 description 1
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- 150000002739 metals Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133605—Direct backlight including specially adapted reflectors
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133606—Direct backlight including a specially adapted diffusing, scattering or light controlling members
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133606—Direct backlight including a specially adapted diffusing, scattering or light controlling members
- G02F1/133607—Direct backlight including a specially adapted diffusing, scattering or light controlling members the light controlling member including light directing or refracting elements, e.g. prisms or lenses
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- Optical Elements Other Than Lenses (AREA)
Abstract
本发明提供一种阵列基板及其制作方法、显示装置,涉及显示技术领域,该显示装置可以利用射到阵列基板的不透明图案的光线,从而提高背光源的利用率,进而改善因开口率低导致背光源利用率低的问题。一种阵列基板,包括:衬底、以及设置在所述衬底出光侧的不透明图案,还包括:与所述不透明图案对应、且设置在所述衬底入光侧的透明微结构,所述透明微结构用于通过折射改变照在其背光侧表面上的光线的路径。本发明适用于阵列基板、包括该阵列基板的显示装置的制作。
The invention provides an array substrate, a manufacturing method thereof, and a display device, and relates to the field of display technology. The display device can use the light of an opaque pattern incident on the array substrate, thereby improving the utilization rate of the backlight source, and further improving the performance caused by the low aperture ratio. The problem of low backlight utilization. An array substrate, comprising: a substrate, and an opaque pattern arranged on the light-emitting side of the substrate, and further comprising: a transparent microstructure corresponding to the opaque pattern and arranged on the light-incoming side of the substrate, the The transparent microstructures are used to change the path of light striking its backlit side surface by refraction. The present invention is applicable to the fabrication of array substrates and display devices including the array substrates.
Description
技术领域technical field
本发明涉及显示技术领域,尤其涉及一种阵列基板及其制作方法、显示装置。The present invention relates to the field of display technology, in particular to an array substrate, a manufacturing method thereof, and a display device.
背景技术Background technique
LCD(Liquid Crystal Display,液晶显示器)已经广泛应用于显示领域中。LCD一般包括显示面板和背光源,其中,显示面板包括:对盒的彩膜基板和阵列基板、以及位于阵列基板和彩膜基板之间的液晶。由于液晶本身不发光,LCD需要背光源提供光线以实现显示。LCD (Liquid Crystal Display, liquid crystal display) has been widely used in the field of display. The LCD generally includes a display panel and a backlight source, wherein the display panel includes: a color filter substrate and an array substrate in a box, and a liquid crystal located between the array substrate and the color filter substrate. Since the liquid crystal itself does not emit light, the LCD needs a backlight source to provide light for display.
随着LCD行业不断向前发展,高分辨率LCD需求激增。高分辨率LCD中,阵列基板上的信号线(例如:数据线和栅线)排布非常密集。信号线一般由金属材料制成,而金属材料具有极强的反光能力,那么,当背光源发出的光垂直射向显示面板时,射到信号线上的光线会在背光源的反射片与信号线之间来回往返,这样,该部分光线不能用于显示,导致背光源的利用率较低。而当LCD的分辨率越高,如数据线和栅线等信号线排布越密集,那么LCD中不能透过光线的区域越大,即LCD的开口率越低,这样会进一步降低背光源的利用率。As the LCD industry continues to move forward, there is a surge in demand for high-resolution LCDs. In a high-resolution LCD, signal lines (such as data lines and gate lines) on the array substrate are arranged very densely. The signal line is generally made of metal material, and the metal material has a strong reflective ability. Then, when the light emitted by the backlight is perpendicular to the display panel, the light that hits the signal line will be reflected on the reflector of the backlight and the signal. Back and forth between the lines, like this, this part of the light can not be used for display, resulting in low utilization of the backlight. And when the resolution of the LCD is higher, the denser the signal lines such as data lines and gate lines are arranged, the larger the area in the LCD that cannot transmit light, that is, the lower the aperture ratio of the LCD, which will further reduce the backlight. utilization rate.
发明内容Contents of the invention
本发明的实施例提供一种阵列基板及其制作方法、显示装置,该显示装置可以利用射到阵列基板的不透明图案的光线,从而提高背光源的利用率,进而改善因开口率低导致背光源利用率低的问题。Embodiments of the present invention provide an array substrate, a manufacturing method thereof, and a display device. The display device can utilize the light rays incident on the opaque pattern of the array substrate, thereby improving the utilization rate of the backlight source, and further improving the backlight source caused by the low aperture ratio. The problem of low utilization.
为达到上述目的,本发明的实施例采用如下技术方案:In order to achieve the above object, embodiments of the present invention adopt the following technical solutions:
一方面,提供了一种阵列基板,包括:衬底、以及设置在所述衬底出光侧的不透明图案,还包括:与所述不透明图案对应、且设置在所述衬底入光侧的透明微结构,所述透明微结构用于通过折射改变照在其背光侧表面上的光线的路径。In one aspect, an array substrate is provided, including: a substrate, and an opaque pattern arranged on the light-emitting side of the substrate, and also includes: a transparent pattern corresponding to the opaque pattern and arranged on the light-incoming side of the substrate. A microstructure, the transparent microstructure is used to change the path of light irradiated on its backlight side surface by refraction.
可选的,所述阵列基板还包括:设置在所述衬底和所述透明微结构之间的反射层。Optionally, the array substrate further includes: a reflective layer disposed between the substrate and the transparent microstructure.
可选的,所述透明微结构为微棱镜或微透镜。Optionally, the transparent microstructures are microprisms or microlenses.
可选的,所述阵列基板还包括:设置在所述衬底的入光侧且覆盖所述透明微结构的透明层,其中,所述透明层的折射率和所述透明微结构的折射率不同。Optionally, the array substrate further includes: a transparent layer disposed on the light incident side of the substrate and covering the transparent microstructure, wherein the refractive index of the transparent layer and the refractive index of the transparent microstructure different.
可选的,在所述透明微结构为凸透镜的情况下,所述透明微结构的折射率小于所述透明层的折射率;在所述透明微结构为凹透镜的情况下,所述透明微结构的折射率大于所述透明层的折射率。Optionally, when the transparent microstructure is a convex lens, the refractive index of the transparent microstructure is smaller than that of the transparent layer; when the transparent microstructure is a concave lens, the transparent microstructure The refractive index is greater than the refractive index of the transparent layer.
可选的,所述不透明图案为栅线和数据线,所述透明微结构与所述栅线和/或所述数据线对应。Optionally, the opaque pattern is a gate line and a data line, and the transparent microstructure corresponds to the gate line and/or the data line.
可选的,所述反射层的材料为金属,所述透明微结构和所述透明层的材料均为光阻。Optionally, the reflective layer is made of metal, and the transparent microstructure and the transparent layer are made of photoresist.
本发明的实施例提供了一种阵列基板,包括:衬底、以及设置在衬底出光侧的不透明图案,该阵列基板还包括:与不透明图案对应、且设置在衬底入光侧的透明微结构,透明微结构用于通过折射改变照在其背光侧表面上的光线的路径。这样,该阵列基板应用到显示装置时,该阵列基板的透明微结构可以通过折射改变照在其背光侧表面上的光线的路径,那么,该部分光线射到不透明图案的角度也随之改变,进而在经过不透明图案的反射后,可以重新利用该部分光线,使得该部分光线用于显示,从而提高背光源的利用率,进而改善因开口率低导致背光源利用率低的问题。An embodiment of the present invention provides an array substrate, including: a substrate, and an opaque pattern arranged on the light-emitting side of the substrate; Structures, transparent microstructures are used to change the path of light shining on its backlit side surface by refraction. In this way, when the array substrate is applied to a display device, the transparent microstructure of the array substrate can change the path of light shining on its backlight side surface through refraction, and then the angle at which this part of light hits the opaque pattern also changes accordingly. Furthermore, after being reflected by the opaque pattern, this part of the light can be reused, so that this part of the light can be used for display, thereby improving the utilization rate of the backlight source, and further improving the problem of low utilization rate of the backlight source due to low aperture ratio.
另一方面,提供了一种显示装置,包括:背光源和显示面板,所述背光源包括:发光组件和反射片,其中,所述反射片位于所述发光组件中远离所述显示面板的一侧,所述显示面板包括:上述任一项所述的阵列基板。该显示装置可以利用射到阵列基板的不透明图案的光线,从而提高背光源的利用率,进而改善因开口率低导致背光源利用率低的问题。In another aspect, a display device is provided, including: a backlight source and a display panel, the backlight source includes: a light-emitting component and a reflective sheet, wherein the reflective sheet is located at a side of the light-emitting component that is far away from the display panel On the other hand, the display panel includes: the array substrate described in any one of the above. The display device can utilize the light incident on the opaque pattern of the array substrate, so as to improve the utilization rate of the backlight source, and further improve the problem of low utilization rate of the backlight source due to the low aperture ratio.
再一方面,提供了一种阵列基板的形成方法,所述方法包括:In another aspect, a method for forming an array substrate is provided, the method comprising:
在衬底上形成透明微结构,所述透明微结构与所述衬底上的不透明图案对应、且设置在所述衬底入光侧,所述透明微结构用于通过折射改变照在其背光侧表面上的光线的路径。A transparent microstructure is formed on the substrate, the transparent microstructure corresponds to the opaque pattern on the substrate and is arranged on the light-incident side of the substrate, and the transparent microstructure is used to change the backlight illuminated by it through refraction The path of the ray on the side surface.
可选的,在衬底上形成透明微结构之后,所述方法还包括:Optionally, after forming the transparent microstructure on the substrate, the method further includes:
在所述衬底的入光侧形成覆盖所述透明微结构的透明层,其中,所述透明层的折射率和所述透明微结构的折射率不同。A transparent layer covering the transparent microstructure is formed on the light incident side of the substrate, wherein the refractive index of the transparent layer is different from that of the transparent microstructure.
本发明的实施例提供了一种阵列基板的形成方法,通过该方法形成的阵列基板设置有透明微结构,该阵列基板应用到显示装置时,该阵列基板的透明微结构可以通过折射改变照在其背光侧表面上的光线的路径,那么,该部分光线射到不透明图案的角度也随之改变,进而在经过不透明图案的反射后,可以重新利用该部分光线,使得该部分光线用于显示,从而提高背光源的利用率,进而改善因开口率低导致背光源利用率低的问题。An embodiment of the present invention provides a method for forming an array substrate. The array substrate formed by the method is provided with a transparent microstructure. When the array substrate is applied to a display device, the transparent microstructure of the array substrate can be changed by refraction. The path of light on the backlight side surface, then, the angle at which this part of light hits the opaque pattern also changes accordingly, and then after being reflected by the opaque pattern, this part of light can be reused, so that this part of light can be used for display. Therefore, the utilization rate of the backlight source is improved, and the problem of low utilization rate of the backlight source due to the low aperture ratio is improved.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.
图1为本发明实施例提供的一种阵列基板的结构示意图一;FIG. 1 is a first structural schematic diagram of an array substrate provided by an embodiment of the present invention;
图2a为本发明实施例提供的一种阵列基板的结构示意图二;FIG. 2a is a second structural schematic diagram of an array substrate provided by an embodiment of the present invention;
图2b为沿图2a的C-D方向的剖面图;Figure 2b is a sectional view along the C-D direction of Figure 2a;
图3为本发明实施例提供的一种阵列基板的结构示意图三;FIG. 3 is a schematic structural diagram III of an array substrate provided by an embodiment of the present invention;
图4为本发明实施例提供的一种阵列基板的结构示意图四;FIG. 4 is a structural schematic diagram 4 of an array substrate provided by an embodiment of the present invention;
图5为本发明实施例提供的一种阵列基板的结构示意图五;FIG. 5 is a schematic structural diagram five of an array substrate provided by an embodiment of the present invention;
图6为本发明实施例提供的一种阵列基板的结构示意图六;FIG. 6 is a sixth structural schematic diagram of an array substrate provided by an embodiment of the present invention;
图7为沿图6的A-B方向的剖面图;Fig. 7 is a sectional view along the A-B direction of Fig. 6;
图8为本发明实施例提供的一种显示装置的结构示意图;FIG. 8 is a schematic structural diagram of a display device provided by an embodiment of the present invention;
图9为本发明实施例提供的一种阵列基板的形成方法的流程示意图。FIG. 9 is a schematic flowchart of a method for forming an array substrate according to an embodiment of the present invention.
附图标记:Reference signs:
1-阵列基板;100-不透明图案;10-透明微结构;11-衬底;12-反射层;14-凸透镜;15-凹透镜;16-透明层;17-栅线;18-数据线;2-背光源;21-发光组件;22-反射片;3-显示面板;4-彩膜基板;5-液晶;300- 光线。1-array substrate; 100-opaque pattern; 10-transparent microstructure; 11-substrate; 12-reflective layer; 14-convex lens; 15-concave lens; 16-transparent layer; 17-grid line; 18-data line; 2 - backlight; 21 - light-emitting components; 22 - reflector; 3 - display panel; 4 - color film substrate; 5 - liquid crystal; 300 - light.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
需要说明的是,在本发明的描述中,“背光侧”是指靠近背光源的一侧,例如,不透明图案背光侧是指不透明图案靠近背光源的一侧。It should be noted that, in the description of the present invention, "backlight side" refers to the side close to the backlight, for example, the backlight side of the opaque pattern refers to the side of the opaque pattern close to the backlight.
实施例一Embodiment one
本发明实施例提供了一种阵列基板,参考图1所示,该阵列基板包括:衬底11、以及设置在衬底11出光侧的不透明图案100,该阵列基板还包括:与不透明图案100对应、且设置在衬底11入光侧的透明微结构10,透明微结构10用于通过折射改变照在其背光侧表面上的光线的路径。An embodiment of the present invention provides an array substrate, as shown in FIG. , and the transparent microstructure 10 disposed on the light-incident side of the substrate 11, the transparent microstructure 10 is used to change the path of the light irradiated on the backlight side surface by refraction.
上述阵列基板的不透明图案是指光线不能透过的薄膜或者层结构,当然,上述阵列基板还包括透明图案(即光线可以透过的薄膜或者层结构)。本领域技术人员根据公知常识以及现有技术可以获知,阵列基板可以包括栅线、数据线、公共电极线等信号线,进一步的,还可以包括薄膜晶体管和像素电极等,由于栅线、数据线、公共电极线和薄膜晶体管均采用不透光材料制作,因此,栅线、数据线、公共电极线和薄膜晶体管均可以是上述的不透明图案;而像素电极一般采用透明的ITO(Indium Tin Oxide,氧化铟锡)制作,其可以是上述的透明图案。本发明实施例对于不透明图案和透明图案的结构不做限定,具体根据实际情况而定。The opaque pattern of the above-mentioned array substrate refers to a thin film or layer structure that cannot pass through light. Of course, the above-mentioned array substrate also includes a transparent pattern (ie, a thin film or layer structure through which light can pass). Those skilled in the art can know based on the common knowledge and the prior art that the array substrate may include signal lines such as gate lines, data lines, and common electrode lines, and further, may also include thin film transistors and pixel electrodes. Since the gate lines, data lines , common electrode lines and thin film transistors are all made of opaque materials, therefore, gate lines, data lines, common electrode lines and thin film transistors can all be the above-mentioned opaque patterns; and pixel electrodes are generally made of transparent ITO (Indium Tin Oxide, Indium tin oxide), which can be the above-mentioned transparent pattern. The embodiment of the present invention does not limit the structure of the opaque pattern and the transparent pattern, and it depends on the actual situation.
上述阵列基板中,透明微结构与不透明图案对应是指:透明微结构在衬底上的投影的边界不超出不透明图案在衬底上的投影的边界。具体的,透明微结构在衬底上的投影的边界可以与不透明图案在衬底上的投影的边界重合,或者,透明微结构在衬底上的投影的边界可以位于不透明图案在衬底上的投影的边界以内。为了可以利用更多的射向不透明图案的光线,以进一步地提高背光源的利用率,可以选择前者,本发明实施例以及附图均以此为例进行说明。In the above array substrate, the correspondence between the transparent microstructure and the opaque pattern means that the boundary of the projection of the transparent microstructure on the substrate does not exceed the boundary of the projection of the opaque pattern on the substrate. Specifically, the boundary of the projection of the transparent microstructure on the substrate can coincide with the boundary of the projection of the opaque pattern on the substrate, or the boundary of the projection of the transparent microstructure on the substrate can be located at the boundary of the opaque pattern on the substrate. within the boundaries of the projection. In order to utilize more light directed to the opaque pattern to further improve the utilization rate of the backlight source, the former can be selected, and the embodiments of the present invention and the drawings are described as an example.
上述阵列基板中,不透明图案例如:栅线、数据线、公共电极线等信号线的线宽非常细,那么对应设置的透明结构的尺寸也非常小,因此称为透明微结构。In the above-mentioned array substrate, the opaque patterns such as signal lines such as gate lines, data lines, and common electrode lines have very thin line widths, and the size of the corresponding transparent structures is also very small, so they are called transparent microstructures.
由于衬底的出光侧会设置栅线、数据线、薄膜晶体管和像素电极等,为了降低对于上述膜层的影响,将上述透明微结构设置在衬底的入光侧。Since gate lines, data lines, thin film transistors, and pixel electrodes are arranged on the light-emitting side of the substrate, in order to reduce the influence on the above-mentioned film layers, the above-mentioned transparent microstructures are arranged on the light-incoming side of the substrate.
本发明的实施例提供了一种阵列基板,包括:衬底、以及设置在衬底出光侧的不透明图案,该阵列基板还包括:与不透明图案对应、且设置在衬底入光侧的透明微结构,透明微结构用于通过折射改变照在其背光侧表面上的光线的路径。这样,该阵列基板应用到显示装置时,该阵列基板的透明微结构可以通过折射改变照在其背光侧表面上的光线的路径,那么,该部分光线射到不透明图案的角度也随之改变,进而在经过不透明图案的反射后,可以重新利用该部分光线,使得该部分光线用于显示,从而提高背光源的利用率,进而改善因开口率低导致背光源利用率低的问题。An embodiment of the present invention provides an array substrate, including: a substrate, and an opaque pattern arranged on the light-emitting side of the substrate; Structures, transparent microstructures are used to change the path of light shining on its backlit side surface by refraction. In this way, when the array substrate is applied to a display device, the transparent microstructure of the array substrate can change the path of light shining on its backlight side surface through refraction, and then the angle at which this part of light hits the opaque pattern also changes accordingly. Furthermore, after being reflected by the opaque pattern, this part of the light can be reused, so that this part of the light can be used for display, thereby improving the utilization rate of the backlight source, and further improving the problem of low utilization rate of the backlight source due to low aperture ratio.
可选的,为了增强对于射到不透明图案的光线的反射能力,阵列基板还包括:设置在衬底和透明微结构之间的反射层,以透明微结构为凹透镜为例,参考图2b所示,阵列基板还包括:设置在衬底11和凹透镜15之间的反射层12。Optionally, in order to enhance the ability to reflect light incident on the opaque pattern, the array substrate further includes: a reflective layer disposed between the substrate and the transparent microstructure, taking the transparent microstructure as a concave lens as an example, as shown in FIG. 2b , the array substrate further includes: a reflective layer 12 disposed between the substrate 11 and the concave lens 15 .
可选的,上述透明微结构可以为微棱镜或微透镜。示例的,微棱镜可以是三棱镜、四棱镜等。微透镜可以是图2b所示的凹透镜15,还可以是图 3所示的凸透镜14。为了降低制作难度,可以采用微透镜。本发明实施例以及附图均以透明微结构为微透镜为例说明。Optionally, the above-mentioned transparent microstructures may be microprisms or microlenses. Exemplarily, the microprisms may be triangular prisms, quadrangular prisms and the like. The microlens can be the concave lens 15 shown in Figure 2b, or the convex lens 14 shown in Figure 3 . In order to reduce the manufacturing difficulty, microlenses can be used. The embodiments of the present invention and the accompanying drawings are described by taking the transparent microstructure as a microlens as an example.
进一步的,若不透明图案为多条栅线,则每条栅线可以对应设置如图2b和图2a所示的一排透明微结构,当然还可以对应设置多排透明微结构,由于栅线的线宽较细,为了降低制作难度,设置一排透明微结构即可。透明微结构可以是如图2a所示连续分布形成一排,当然,还可以是间断分布,考虑到利用更多射向不透明图案的光线,选择前者。Further, if the opaque pattern is a plurality of grid lines, each grid line can be provided with a row of transparent microstructures as shown in Figure 2b and Figure 2a, of course, it can also be provided with multiple rows of transparent microstructures. The line width is thinner. In order to reduce the difficulty of production, it is enough to set up a row of transparent microstructures. The transparent microstructures can be continuously distributed to form a row as shown in FIG. 2 a , of course, they can also be discontinuously distributed, and the former is chosen in consideration of utilizing more light directed to the opaque pattern.
下面以图2b所示的透明微结构为例说明透明微结构是如何通过折射改变照在其背光侧表面上的光线的路径。The following takes the transparent microstructure shown in FIG. 2b as an example to illustrate how the transparent microstructure changes the path of light irradiated on its backlight side surface through refraction.
参考图2b所示,光线300穿过空气射到凹透镜15后经过折射射向反射层12,后再经反射层12将其反射,并最终射出凹透镜15重新进入到空气中。当然,光线300也可以是穿过其他介质射到凹透镜15的,这里仅以光线300穿过空气射到凹透镜15为例进行说明。图2b中以空气的折射率小于凹透镜的折射率为例进行说明。这样,凹透镜通过折射改变照在其背光侧表面上的光线的路径,那么,该部分光线射到反射层的角度也随之改变,进而在经过反射层的反射后,可以重新利用该部分光线,使得该部分光线用于显示,从而提高背光源的利用率。该结构简单易实现,制作成本低。Referring to FIG. 2b, the light 300 passes through the air and hits the concave lens 15, then is refracted and directed to the reflective layer 12, and then reflected by the reflective layer 12, and finally exits the concave lens 15 and enters the air again. Of course, the light 300 may also pass through other media and strike the concave lens 15 , and here only the light 300 passes through the air and strikes the concave lens 15 as an example for illustration. In FIG. 2 b , the refractive index of air is lower than that of the concave lens for illustration. In this way, the concave lens changes the path of light shining on its backlight side surface through refraction, so the angle at which this part of light hits the reflective layer also changes accordingly, and then after being reflected by the reflective layer, this part of light can be reused. This part of the light is used for display, thereby improving the utilization rate of the backlight source. The structure is simple and easy to realize, and the manufacturing cost is low.
可选的,参考图4和图5所示,阵列基板还包括:设置在衬底11的入光侧且覆盖透明微结构的透明层16,其中,不透明层的折射率和透明微结构的折射率不同。这样,透明层可以起到保护透明微结构和反射层的作用,同时可以起到平坦化的作用,以利于后续工艺。Optionally, as shown in FIG. 4 and FIG. 5, the array substrate further includes: a transparent layer 16 disposed on the light incident side of the substrate 11 and covering the transparent microstructure, wherein the refractive index of the opaque layer and the refractive index of the transparent microstructure Rates are different. In this way, the transparent layer can play the role of protecting the transparent microstructure and the reflective layer, and can also play the role of planarization, so as to facilitate subsequent processes.
可选的,参考图4所示,在透明微结构为凸透镜14的情况下,透明微结构的折射率小于不透明层的折射率,这样反射层反射出的光线射到透明层上时,有利于进一步改变光线的出射角度;参考图5所示,在透明微结构为凹透镜15的情况下,透明微结构的折射率大于不透明层的折射率,这样反射层反射出的光线射到透明层上时,有利于进一步改变光线的出射角度。Optionally, as shown in FIG. 4, when the transparent microstructure is a convex lens 14, the refractive index of the transparent microstructure is smaller than that of the opaque layer, so that when the light reflected from the reflective layer hits the transparent layer, it is beneficial Further change the outgoing angle of the light; as shown in Fig. 5, in the case where the transparent microstructure is a concave lens 15, the refractive index of the transparent microstructure is greater than that of the opaque layer, so that when the light reflected by the reflective layer hits the transparent layer , which is beneficial to further change the outgoing angle of the light.
可选的,参考图6和图7所示,上述不透明图案为栅线17和数据线 18,透明微结构10与栅线17和/或数据线18对应。Optionally, as shown in FIG. 6 and FIG. 7, the above-mentioned opaque patterns are gate lines 17 and data lines 18, and the transparent microstructure 10 corresponds to the gate lines 17 and/or data lines 18.
需要说明的是,上述透明微结构与栅线和/或数据线对应是指:透明微结构可以仅与栅线对应,透明微结构在衬底上的投影的边界不超出栅线在衬底上的投影的边界;或者,透明微结构还可以仅与数据线对应,透明微结构在衬底上的投影的边界不超出数据线在衬底上的投影的边界;或者,透明微结构可以与栅线和数据线均对应,透明微结构在衬底上的投影的边界不超出栅线和数据线在衬底上的投影的边界。这里的“对应”与上述透明微结构与不透明图案对应的含义相同,具体不再赘述。栅线和数据线所占面积较大,射向栅线和数据线的光线较多,将透明微结构与栅线和 /或数据线对应,可以利用更多射向不透明图案的光线,更进一步地提高背光源的利用率。It should be noted that the above-mentioned transparent microstructure corresponding to the grid line and/or data line means that the transparent microstructure can only correspond to the grid line, and the boundary of the projection of the transparent microstructure on the substrate does not exceed the grid line on the substrate. The boundary of the projection; or, the transparent microstructure can also only correspond to the data line, and the boundary of the projection of the transparent microstructure on the substrate does not exceed the boundary of the projection of the data line on the substrate; or, the transparent microstructure can be connected to the grid Both the lines and the data lines correspond, and the boundary of the projection of the transparent microstructure on the substrate does not exceed the boundary of the projection of the grid line and the data line on the substrate. The meaning of "corresponding" here is the same as that of the above-mentioned correspondence between the transparent microstructure and the opaque pattern, and details will not be repeated here. The area occupied by the grid lines and data lines is larger, and more light rays are emitted to the grid lines and data lines. By corresponding the transparent microstructures to the grid lines and/or data lines, more light rays directed to the opaque patterns can be used to further improve To improve the utilization of backlight.
可选的,反射层的材料为金属,示例的,反射层的材料可以是铝、铜、银等金属;为了降低制作难度,透明微结构和不透明层的材料均为光阻。Optionally, the material of the reflective layer is metal. For example, the material of the reflective layer may be metals such as aluminum, copper, silver, etc.; in order to reduce manufacturing difficulty, the material of the transparent microstructure and the opaque layer are photoresist.
实施例二Embodiment two
本发明实施例提供了一种显示装置,参考图8所示,显示装置包括:背光源2和显示面板3,背光源2包括:发光组件21和反射片22,其中,反射片22位于发光组件21中远离显示面板3的一侧,显示面板3包括:实施例一提供的任一项的阵列基板1。An embodiment of the present invention provides a display device, as shown in FIG. 8 , the display device includes: a backlight 2 and a display panel 3, the backlight 2 includes: a light-emitting component 21 and a reflective sheet 22, wherein the reflective sheet 22 is located on the light-emitting assembly On the side of 21 away from the display panel 3 , the display panel 3 includes: the array substrate 1 provided in the first embodiment.
需要说明的是,本发明实施例仅介绍与发明点相关的结构,根据现有技术可以获知:参考图8所示,上述显示面板3还可以包括彩膜基板4,若显示装置为液晶显示装置,则显示面板3还可以包括位于阵列基板1和彩膜基板4之间的液晶5等。上述显示装置可以是液晶显示装置,当然还可以是其他显示装置,这里不作限定。根据发光组件的位置,可以将上述显示装置中分为侧入式和直下式。若上述显示装置为直下式,则发光组件可以包括光源和扩散板;若上述显示装置为侧入式,则发光组件可以包括光源和导光板。发光组件射向不透明图案的光线经过透明微结构折射射向反射层,后再经反射层将其反射,接着经过透明层的折射后射到反射片上,最终经过反射片的反射射向可以实现显示的区域。该显示装置可以利用射到阵列基板的不透明图案的光线,从而提高背光源的利用率,进而改善因开口率低导致背光源利用率低的问题。It should be noted that the embodiment of the present invention only introduces the structure related to the invention point. According to the prior art, as shown in FIG. 8, the above-mentioned display panel 3 may also include a color filter substrate 4. , the display panel 3 may further include liquid crystal 5 and the like located between the array substrate 1 and the color filter substrate 4 . The above-mentioned display device may be a liquid crystal display device, and of course may also be other display devices, which are not limited here. According to the position of the light-emitting components, the above-mentioned display devices can be divided into side-type and direct-type. If the above-mentioned display device is a direct-type display device, the light-emitting component may include a light source and a diffusion plate; if the above-mentioned display device is a side-type display device, the light-emitting component may include a light source and a light guide plate. The light emitted by the light-emitting component to the opaque pattern is refracted by the transparent microstructure and directed to the reflective layer, and then reflected by the reflective layer, then refracted by the transparent layer, and then shot to the reflective sheet, and finally reflected by the reflective sheet to realize the display Area. The display device can utilize the light incident on the opaque pattern of the array substrate, so as to improve the utilization rate of the backlight source, and further improve the problem of low utilization rate of the backlight source due to the low aperture ratio.
实施例三Embodiment Three
本发明实施例提供了一种阵列基板的形成方法,该阵列基板的结构可以如图1所示,该方法包括:An embodiment of the present invention provides a method for forming an array substrate. The structure of the array substrate can be shown in FIG. 1, and the method includes:
S01、在衬底11上形成透明微结构10,透明微结构10与衬底11上的不透明图案100对应、且设置在衬底11入光侧,透明微结构10用于通过折射改变照在其背光侧表面上的光线的路径。S01. Form a transparent microstructure 10 on the substrate 11. The transparent microstructure 10 corresponds to the opaque pattern 100 on the substrate 11 and is arranged on the light-incident side of the substrate 11. The transparent microstructure 10 is used to change the light on it by refraction. The path of light rays on the backlit side surface.
本发明的实施例提供了一种阵列基板的形成方法,通过该方法形成的阵列基板设置有透明微结构,该阵列基板应用到显示装置时,该阵列基板的透明微结构可以通过折射改变照在其背光侧表面上的光线的路径,那么,该部分光线射到不透明图案的角度也随之改变,进而在经过不透明图案的反射后,可以重新利用该部分光线,使得该部分光线用于显示,从而提高背光源的利用率,进而改善因开口率低导致背光源利用率低的问题。An embodiment of the present invention provides a method for forming an array substrate. The array substrate formed by the method is provided with a transparent microstructure. When the array substrate is applied to a display device, the transparent microstructure of the array substrate can be changed by refraction. The path of light on the backlight side surface, then, the angle at which this part of light hits the opaque pattern also changes accordingly, and then after being reflected by the opaque pattern, this part of light can be reused, so that this part of light can be used for display. Therefore, the utilization rate of the backlight source is improved, and the problem of low utilization rate of the backlight source due to the low aperture ratio is improved.
可选的,S01、在衬底11上形成透明微结构10具体包括:通过一次构图工艺在衬底上形成透明微结构。上述一次构图工艺包括掩膜、曝光、显影、刻蚀和剥离等工艺。透明微结构可以采用HTM(Half Tone Mask,半色调掩膜)、SSM(Single Slit Mask,单狭缝掩膜)或者GTM(Grey Tone Mask,灰色调掩膜)通过一次构图工艺形成。该方法简单易实现。Optionally, S01, forming the transparent microstructure 10 on the substrate 11 specifically includes: forming a transparent microstructure on the substrate through a patterning process. The above-mentioned one-time patterning process includes processes such as masking, exposure, development, etching and stripping. The transparent microstructure can be formed by one patterning process by using HTM (Half Tone Mask, half tone mask), SSM (Single Slit Mask, single slit mask) or GTM (Grey Tone Mask, gray tone mask). The method is simple and easy to implement.
可选的,参考图2b所示,S01、在衬底11上形成透明微结构10之前,参考图9所示,方法还包括:Optionally, referring to what is shown in FIG. 2b, S01, before forming the transparent microstructure 10 on the substrate 11, referring to what is shown in FIG. 9, the method further includes:
S02、在衬底11的入光侧形成反射层12,反射层12位于衬底11和透明微结构10之间。S02 , forming a reflective layer 12 on the light-incident side of the substrate 11 , and the reflective layer 12 is located between the substrate 11 and the transparent microstructure 10 .
可选的,参考图4和图5所示,S01、在衬底11上形成透明微结构 10之后,参考图9所示,方法还包括:Optionally, as shown in Figure 4 and Figure 5, S01, after forming the transparent microstructure 10 on the substrate 11, as shown in Figure 9, the method also includes:
S03、在衬底11的入光侧形成覆盖透明微结构10的透明层16,其中,透明层的折射率和透明微结构的折射率不同。透明层可以起到保护透明微结构和反射层的作用,同时可以起到平坦化的作用,以利于后续工艺。S03 , forming a transparent layer 16 covering the transparent microstructure 10 on the light incident side of the substrate 11 , wherein the refractive index of the transparent layer is different from that of the transparent microstructure. The transparent layer can protect the transparent microstructure and the reflective layer, and at the same time can planarize, so as to facilitate subsequent processes.
以上,仅为本发明的具体实施方式,但本发明的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本发明揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本发明的保护范围之内。因此,本发明的保护范围应以权利要求的保护范围为准。The above is only a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Anyone familiar with the technical field can easily think of changes or replacements within the technical scope disclosed in the present invention, and should cover all Within the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.
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