CN105372941A - Multifunctional exposure machine capable of exposing glass substrate edge - Google Patents
Multifunctional exposure machine capable of exposing glass substrate edge Download PDFInfo
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- CN105372941A CN105372941A CN201410429450.2A CN201410429450A CN105372941A CN 105372941 A CN105372941 A CN 105372941A CN 201410429450 A CN201410429450 A CN 201410429450A CN 105372941 A CN105372941 A CN 105372941A
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- exposure
- module
- edge
- glass substrate
- light source
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- 239000000758 substrate Substances 0.000 title claims abstract description 53
- 239000011521 glass Substances 0.000 title claims abstract description 43
- 230000003287 optical effect Effects 0.000 claims abstract description 21
- 238000009434 installation Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 description 8
- 239000005357 flat glass Substances 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides a multifunctional exposure machine capable of exposing a glass substrate edge. The multifunctional exposure machine is characterized by comprising a framework, and an exposure light source module, a mask table module, a lens cone and objective lens module, a substrate exposure carrying table module, a pre-alignment module, a mechanical arm module and an edge exposure module that are arranged on the framework; the substrate exposure carrying table module and the pre-alignment module are arranged side by side and spaced from each other; the lens cone and objective lens module is positioned above the substrate exposure carrying table module; the mask table module is positioned above the lens cone and objective lens module; the exposure light source module is arranged above the mask table module; the edge exposure module is positioned above the pre-alignment module; the edge exposure module comprises an edge exposure light source, an optical lens group and an adjusting apparatus; and the edge of the substrate is exposed by the edge exposure module when the glass substrate is pre-aligned.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, particularly, relate to a kind of Multifunctional exposure apparatus providing glass substrate edge to expose.
Background technology
TFT(ThinFilmTransistor in flat pannel display: thin film transistor (TFT)) panel manufactures in processing procedure, exposure machine is used for the making of TFT component graphics, and the limit machine that exposes to the sun is for removing the substrate edges photoresistance beyond exposure machine exposure field, can pollute the microscope carrier of follow-up equipment or cavity because these residual photoresistances are not removed, simultaneously, LTPS(Lowtemperaturepolysilicon for current processing procedure complexity: low temperature polycrystalline silicon) TFT processing procedure, the exposure number of plies is more, the accumulation of excess margins photoresistance remains the pollution that also can cause subsequent product, affect quality, so edge exposure removes more aobvious particularly important of the photoresistance of excessive residual.
Current LTPS produces line and builds, and the market demand of exposure machine and the limit machine that exposes to the sun is very large, and the function of two equipment is very single, and the division of labor is very clear and definite, but the cost of two equipment is all very expensive.
Summary of the invention
The object of the invention is to propose a kind of Multifunctional exposure apparatus providing glass substrate edge to expose, while exposure a slice glass substrate, the edge exposure of first-class next the sheet glass substrate to be exposed of prealignment platform can be provided.
The present invention discloses a kind of Multifunctional exposure apparatus providing glass substrate edge to expose, and it is characterized in that: comprise framework and setting exposure light source module, mask stage module, lens barrel and objective lens module on said frame, base plate exposure microscope carrier module, prealignment platform module, manipulator and edge exposure module; Described base plate exposure microscope carrier module and prealignment platform module spacing side by side are placed; Described lens barrel and objective lens module are positioned at above described base plate exposure microscope carrier; Described mask stage module is positioned at the top of described lens barrel and objective lens module; Described exposure light source module installation is above described mask stage module; Described edge exposure module is positioned at the top of described prealignment platform module; Described edge exposure module comprises edge exposure light source, optical frames group and adjusting gear; While glass substrate prealignment, edge exposure module carries out edge exposure to substrate.
Further, described edge exposure light source and described exposure light source module same light source.
Further, also comprise software systems, for realizing the adjustment of prealignment and glass substrate, the position of edge exposure and the setting of size and input, and the field scan exposure of glass substrate.
Further, described optical frames group comprises galvanometer, is rotated the direction changing light path by galvanometer.
Further, also comprise light splitting optical mirror group, by described same light source beam splitting to described exposure light source module and edge exposure light source, described light splitting optical mirror group comprises catoptron and semi-transparent semi-reflecting lens.
Further, the end of described lens barrel and objective lens module is installed and is controlled baffle plate.
Further, described edge exposure adopts mask or baffle plate to realize.
The Multifunctional exposure apparatus of the provided glass substrate edge exposure that the present invention proposes, prealignment microscope carrier before glass substrate enters exposure microscope carrier just can realize edge exposure, an equipment is made not increase microscope carrier, when not increasing volume, realize two kinds of functions, greatly can reduce flat pannel display and produce the equipment cost of line and save workshop appliance area occupied; Meanwhile, while last sheet glass base plate exposure, a rear sheet glass also achieves edge exposure simultaneously, has greatly saved product line processing time, obviously can shorten processing procedure, improves productive rate.
Accompanying drawing explanation
Can be further understood by following detailed Description Of The Invention and institute's accompanying drawings about the advantages and spirit of the present invention.
Fig. 1 is the Multifunctional exposure apparatus structural representation that the invention provides glass substrate edge exposure;
Fig. 2 is the Multifunctional exposure apparatus vertical view that the invention provides glass substrate edge exposure;
Fig. 3 is edge exposure system schematic diagram of the present invention;
Fig. 4 is another embodiment of the present invention structural representation.
Embodiment
Specific embodiments of the invention are described in detail below in conjunction with accompanying drawing.
As shown in Figure 1, the Multifunctional exposure apparatus that the invention provides glass substrate edge exposure comprises the exposure system be made up of light source 1, mask 2, object lens 3, substrate 4 and work stage 5, for photolithographic exposure.Pre-alignment system comprises prealignment microscope carrier 6, prealignment light source and sensor, and substrate position means for correcting 9 and mechanical arm 17, for the prealignment of glass substrate.Also comprise and be positioned at above prealignment microscope carrier 6, by edge exposure light source 8, the edge exposure system of optical frames group and optical path adjustment device 7 and prealignment microscope carrier 6 composition, for edge exposure.While glass substrate prealignment, edge exposure system carries out edge exposure.
Be illustrated in figure 2 the vertical view of the Multifunctional exposure apparatus that the invention provides glass substrate edge exposure, prealignment baseplate carrier 6 is on the side of exposure work stage 5, edge exposure device is above prealignment microscope carrier 6, and edge exposure device comprises light source 8, and optical frames group and optical path adjustment device 7.
Figure 3 shows that edge exposure device structural representation of the present invention, comprise edge exposure light source 8, optical frames group and optical path adjustment device 7 and prealignment microscope carrier 6.Light source 8 in edge exposure device can preferred LASER Light Source, and other also can be selected to comprise the lamp source of mercury lamp.After light path sends from lamp source, through refraction or the reflection arrival optical path adjustment device galvanometer 11 of optical frames group 10, galvanometer 11 can carry out angular turn by the driving of self and adjusting gear 18, like this, light source and optical system are when motionless, light path can change direction with the rotation of galvanometer, thus reaches the effect carrying out exposed edge according to desired location and size.
The Multifunctional exposure apparatus that the invention provides glass substrate edge exposure also comprises software systems, for realizing the adjustment of prealignment and glass substrate, and the position of edge exposure and the setting of size and input, and the field scan exposure of photoresistance on glass substrate.
Prealignment, the technological process of edge exposure and field exposure: when a slice glass substrate enters exposure machine, after glass carries out prealignment contraposition and adjustment, glass substrate waits for that field exposes on prealignment microscope carrier, and the edge exposure device at this moment above prealignment microscope carrier starts to carry out edge exposure to this glass substrate.During edge exposure, light source incides on galvanometer by optical frames group, and galvanometer carries out angle rotation by the control system of self, like this can when microscope carrier does not move, and light path scanning is mobile carries out edge exposure.After edge exposure completes, mechanical arm is sent into field exposure microscope carrier, and now exposure light source is opened, by light path and lens by the graph exposure on mask on glass substrate, the glass substrate that the exposure of such field and edge exposure all complete can enter next processing procedure.
In another embodiment of the present invention, edge exposure and field expose and adopt same light source, as shown in Figure 4.Light source 1 is through light splitting optical mirror group 12 beam splitting, and wherein light beam is as edge exposure light source.Light splitting optical mirror group 12 comprises catoptron 13 and semi-transparent semi-reflecting lens 14.When using same light source, the end of field exposure light path is installed and is controlled baffle plate 15, so that the time controling of field exposure.Edge exposure adopts mask or baffle plate 16 to realize.
In exposure process, edge exposure light source is field exposure light source beam splitting gained, and when glass substrate enters prealignment microscope carrier, after glass substrate carries out prealignment contraposition and adjustment, light source is opened.Now carry out by mask or baffle plate the edge exposure that size is set in prealignment platform light path.But now the end of field exposure light source needs to open retaining device, in case when not needing field to expose, light is on microscope carrier and substrate.Then field exposure microscope carrier sent into by glass substrate by mechanical arm, and after completing normal contraposition, baffle plate is opened, and light path and lens are by the graph exposure on mask on glass substrate, and the glass substrate that the exposure of such field and edge exposure all complete can enter next processing procedure.
Just preferred embodiment of the present invention described in this instructions, above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (7)
1. the Multifunctional exposure apparatus providing glass substrate edge to expose, is characterized in that: comprise framework and setting exposure light source module, mask stage module, lens barrel and objective lens module on said frame, base plate exposure microscope carrier module, prealignment platform module, manipulator and edge exposure module; Described base plate exposure microscope carrier module and prealignment platform module spacing side by side are placed; Described lens barrel and objective lens module are positioned at above described base plate exposure microscope carrier; Described mask stage module is positioned at the top of described lens barrel and objective lens module; Described exposure light source module installation is above described mask stage module; Described edge exposure module is positioned at the top of described prealignment platform module; Described edge exposure module comprises edge exposure light source, optical frames group and adjusting gear; While glass substrate prealignment, edge exposure module carries out edge exposure to substrate.
2. the Multifunctional exposure apparatus providing glass substrate edge to expose as claimed in claim 1, is characterized in that: described edge exposure light source and described exposure light source module same light source.
3. the Multifunctional exposure apparatus that glass substrate edge exposes is provided as claimed in claim 1, it is characterized in that: also comprise software systems, for realizing the adjustment of prealignment and glass substrate, the position of edge exposure and the setting of size and input, and the field scan exposure of glass substrate.
4. the Multifunctional exposure apparatus providing glass substrate edge to expose as claimed in claim 1, is characterized in that: described optical frames group comprises galvanometer, is rotated the direction changing light path by galvanometer.
5. the Multifunctional exposure apparatus that glass substrate edge exposes is provided as claimed in claim 2, it is characterized in that: also comprise light splitting optical mirror group, by described same light source beam splitting to described exposure light source module and edge exposure light source, described light splitting optical mirror group comprises catoptron and semi-transparent semi-reflecting lens.
6. the Multifunctional exposure apparatus providing glass substrate edge to expose as claimed in claim 5, is characterized in that: the end of described lens barrel and objective lens module is installed and controlled baffle plate.
7. the Multifunctional exposure apparatus providing glass substrate edge to expose as claimed in claim 2, is characterized in that: described edge exposure adopts mask or baffle plate to realize.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410429450.2A CN105372941A (en) | 2014-08-28 | 2014-08-28 | Multifunctional exposure machine capable of exposing glass substrate edge |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410429450.2A CN105372941A (en) | 2014-08-28 | 2014-08-28 | Multifunctional exposure machine capable of exposing glass substrate edge |
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| CN105372941A true CN105372941A (en) | 2016-03-02 |
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| CN201410429450.2A Pending CN105372941A (en) | 2014-08-28 | 2014-08-28 | Multifunctional exposure machine capable of exposing glass substrate edge |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018001347A1 (en) * | 2016-06-30 | 2018-01-04 | 上海微电子装备（集团）股份有限公司 | Edge exclusion device and method |
| WO2018196838A1 (en) * | 2017-04-28 | 2018-11-01 | 上海微电子装备（集团）股份有限公司 | Silicon wafer processing device and method |
| CN109375472A (en) * | 2018-10-23 | 2019-02-22 | 武汉华星光电技术有限公司 | Expose the method when machine and substrate expose |
| CN110308619A (en) * | 2019-05-09 | 2019-10-08 | 京东方科技集团股份有限公司 | Edge exposure device, method, display substrate, display device |
| CN113141718A (en) * | 2021-04-21 | 2021-07-20 | 广东科视光学技术股份有限公司 | Method for forming connection line on glass substrate through single photoetching head |
| WO2021233121A1 (en) * | 2020-05-19 | 2021-11-25 | 长鑫存储技术有限公司 | Wafer edge exposure apparatus and method, and lithographic device |
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| WO2001082001A1 (en) * | 2000-04-26 | 2001-11-01 | Advanced Micro Devices, Inc. | Lithography system with device for exposing the periphery of a wafer |
| CN101369102A (en) * | 2007-08-15 | 2009-02-18 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| CN101498897A (en) * | 2008-12-17 | 2009-08-05 | 上海微电子装备有限公司 | Edge exposure device and its control method |
| US20110194086A1 (en) * | 2010-02-09 | 2011-08-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wafer edge exposure module |
-
2014
- 2014-08-28 CN CN201410429450.2A patent/CN105372941A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001082001A1 (en) * | 2000-04-26 | 2001-11-01 | Advanced Micro Devices, Inc. | Lithography system with device for exposing the periphery of a wafer |
| CN101369102A (en) * | 2007-08-15 | 2009-02-18 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| CN101498897A (en) * | 2008-12-17 | 2009-08-05 | 上海微电子装备有限公司 | Edge exposure device and its control method |
| US20110194086A1 (en) * | 2010-02-09 | 2011-08-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wafer edge exposure module |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018001347A1 (en) * | 2016-06-30 | 2018-01-04 | 上海微电子装备（集团）股份有限公司 | Edge exclusion device and method |
| US10782614B2 (en) | 2016-06-30 | 2020-09-22 | Shanghai Micro Electronics Equipment (Group) Co., Ltd. | Edge exposure device and method |
| WO2018196838A1 (en) * | 2017-04-28 | 2018-11-01 | 上海微电子装备（集团）股份有限公司 | Silicon wafer processing device and method |
| US10782615B2 (en) | 2017-04-28 | 2020-09-22 | Shanghai Micro Electronics Equipment (Group) Co., Ltd. | Silicon wafer processing device and method |
| CN109375472A (en) * | 2018-10-23 | 2019-02-22 | 武汉华星光电技术有限公司 | Expose the method when machine and substrate expose |
| WO2020082717A1 (en) * | 2018-10-23 | 2020-04-30 | 武汉华星光电技术有限公司 | Edge exposure machine and substrate edge exposure method |
| CN110308619A (en) * | 2019-05-09 | 2019-10-08 | 京东方科技集团股份有限公司 | Edge exposure device, method, display substrate, display device |
| CN110308619B (en) * | 2019-05-09 | 2022-03-01 | 京东方科技集团股份有限公司 | Edge exposure device and method, display substrate and display device |
| WO2021233121A1 (en) * | 2020-05-19 | 2021-11-25 | 长鑫存储技术有限公司 | Wafer edge exposure apparatus and method, and lithographic device |
| CN113759654A (en) * | 2020-05-19 | 2021-12-07 | 长鑫存储技术有限公司 | Wafer edge exposure device and method and photoetching equipment |
| US11822261B2 (en) | 2020-05-19 | 2023-11-21 | Changxin Memory Technologies, Inc. | Wafer edge exposure apparatus, wafer edge exposure method and photolithography device |
| CN113141718A (en) * | 2021-04-21 | 2021-07-20 | 广东科视光学技术股份有限公司 | Method for forming connection line on glass substrate through single photoetching head |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant before: Shanghai Micro Electronics Equipment Co., Ltd. |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160302 |
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| RJ01 | Rejection of invention patent application after publication |