CN105319614A - Anti-reflection structure and electronic device - Google Patents

Abstract

The invention discloses an anti-reflection structure and an electronic device. The anti-reflection structure comprises: a substrate, comprising a flat portion and a protruding portion arranged on the flat portion, wherein the protruding portion and the flat portion are integrally formed; and a coating, arranged on the substrate, conformably covering the protruding portion and the flat portion.

Description

Anti-reflection structure and electronic device

technical field

The present invention relates to an optical structure, and in particular to an anti-reflection structure, which is suitable for applications in various electronic devices such as displays and solar cells, for providing anti-reflection and anti-fouling. smudge) and other functions.

Background technique

When an electronic device such as a mobile phone is used in a bright ambient light environment, the reflection of the ambient light on the screen is very disruptive, making it difficult for the user to read the content on the screen. In addition to the above-mentioned situations, the reflection of ambient light can occur on the light-receiving surfaces of many other electronic devices, such as the surfaces of other electronic devices such as TVs, monitors or solar cells, thereby causing inconvenient reading for users or worse. Degrade the electrical performance of electronic devices.

Therefore, in conventional technologies, an anti-reflection coating (anti-reflection coating) technology is generally used to solve the above-mentioned reflection problem of ambient light. Anti-reflection coating technology usually coats one or more layers of anti-reflection film coating on the surface of a light-transmitting substrate in a vacuum chamber to reduce the destructive interference of light reflection. However, since the anti-reflection coating is usually formed on the surface of a substrate exposed to the external environment, the anti-reflection coating usually has poor mechanical properties, so it is susceptible to dirt in the environment and users after a long period of use. The impact of the operation of the anti-reflective coating will cause damage and contamination of the anti-reflective coating and other adverse situations, which will affect the service life of the overall device. Therefore, an anti-reflection structure with strong mechanical strength and anti-smudge is required.

Contents of the invention

In order to solve the above problems, the present invention provides an anti-reflection structure, comprising: a substrate, including a flat part and a protruding part arranged on the flat part, wherein the protruding part and the flat part are integrally formed and a coating, disposed on the substrate, conformably covering the protruding portion and the flat portion.

According to yet another embodiment, the present invention provides an electronic device, comprising: a first substrate; a second substrate disposed on the first substrate; and a liquid crystal layer, a touch sensing layer or a photoelectric conversion The component is disposed between the first substrate and the second substrate, wherein the second substrate includes the aforementioned anti-reflection structure.

In order to make the above-mentioned purpose, features and advantages of the present invention more comprehensible, a preferred embodiment is exemplified below and described in detail in conjunction with the accompanying drawings.

Description of drawings

1-4 are a series of schematic cross-sectional views showing a method for manufacturing an anti-reflection structure according to an embodiment of the present invention;

5 is a schematic cross-sectional view showing an anti-reflection structure according to another embodiment of the present invention;

FIG. 6 is a schematic cross-sectional view showing an anti-reflection structure according to another embodiment of the present invention;

FIG. 7 is a schematic cross-sectional view showing an electronic device according to an embodiment of the present invention, which uses the anti-reflection structure shown in FIG. 4;

FIG. 8 is a schematic cross-sectional view showing an electronic device according to another embodiment of the present invention, which uses the anti-reflection structure shown in FIG. 4;

FIG. 9 is a schematic cross-sectional view showing an electronic device according to another embodiment of the present invention, which uses the anti-reflection structure shown in FIG. 4; and

FIG. 10 is a schematic cross-sectional view showing an electronic device according to another embodiment of the present invention, which uses the anti-reflection structure shown in FIG. 4 .

Symbol Description

100～substrate

100'～substrate

100a～flat part

100b～Protruding part

101a～the first protrusion

101b～second protrusion

101c～the third protrusion

102～sphere

104～Etching process

106～coating

200, 300, 400, 500～electronic device

210～the first substrate

220～LCD layer

230～Color filter layer

240～second substrate

310～the first substrate

320～LCD layer

330～touch components

340～color filter layer

350～third substrate

360～second substrate

380～space

402～second substrate

404～transparent conductive layer

406～p-type amorphous silicon layer

408～Intrinsic amorphous silicon layer

410～n-type amorphous silicon layer

412～electrode layer

414～the first substrate

450～Photoelectric conversion components

502～the first substrate

504～Touch sensing layer

506～second substrate

D1～diameter/width

D2～diameter/width

D3～diameter/width

H1～height

H2～Height

H3～height

detailed description

Please refer to a series of cross-sectional diagrams of FIGS. 1-4 , which illustrate a method of manufacturing an anti-reflection structure according to an embodiment of the present invention.

Referring to FIG. 1, a substrate 100 is first provided, which may include, for example, glass, polymethylmethacrylate (polymethylmethacrylate, PMMA), polyethylene terephthalate (Polyethyleneterephthalate, PET), polyimide (Polyimide, PI) and other light-transmitting materials. Then adopt methods such as LB coating (Langmuir-Blodgettcoating, LBcoating), LS coating (Langmuir-Schaefercoating, LScoating), dip coating (DipCoating), self-assembly monolayers (self-assembly monolayers, SAMs), etc. The inventive method is not limited here, and several spheres 102 with the same diameter D1 are disposed on the surface of the substrate 100 . As shown in FIG. 1 , the diameter D1 of these spheres 102 can be between 200 nanometers and 400 nanometers, and can include polystyrene (polystyrene, PS), polyethylene (polyethylene, PE), polyvinyl chloride (polyvinylchloride, etc.). PVC), silicon dioxide (SiO ₂ ) and other materials, and the spheres 102 formed on the substrate 100 are closely adjacent to each other, so there is no distance between the spheres 102 .

Next, referring to FIG. 2 , an etching process 104 is performed on the structure shown in FIG. 1 . The etching process 104 is, for example, a dry etching process of plasma etching, and the etching chemicals (not shown) used in the etching process 104 can be adjusted according to the material of the spherical body 102 used. In one embodiment, when the material of the sphere 102 is polystyrene, the etching process 104 may use an etching chemical such as fluoromethane (CHF ₃ ) or carbon tetrafluoride (CF ₄ ). During the implementation of the etching process 104, the etching chemicals can not only penetrate through the gaps between the spheres 102 and anisotropically etch several parts of the substrate 100 below the spheres 102, but also anisotropically A portion of the ball 102 is removed by etching.

Please refer to FIG. 3 , after the etching process 104 shown in FIG. 2 , another etching process (not shown), such as a wet etching process, is performed to remove the balls remaining on the substrate 100 after the etching process 104 is performed. 102 (not shown) and clean the substrate 100. In one embodiment, when the material of the sphere 102 is polystyrene, etching chemicals such as sulfuric acid and hydrogen peroxide can be used to remove the portion (not shown) of the sphere 102 remaining on the substrate 100 and clean the substrate 100 .

As shown in FIG. 3 , the substrate 100 is formed into a substrate 100 ′ after undergoing the above-mentioned etching process, and a protruding portion 100 b and a flat portion 100 a located below the protruding portion 100 b are formed on the surface thereof, wherein the protruding The portion 100b includes a plurality of first protruding portions 101a, and the protruding portions 100b and the flat portion 100a below the protruding portions 100b are formed of the same light-transmitting material and integrally formed. These first protrusions 101a may have a hemispherical or semi-hemispherical cross-sectional profile that is generally similar to the partial surface of the sphere 102, and have a width (also similar to the diameter D1 of the sphere 102) between 195-400 nanometers. Shown as D1) and a height H1 between 50-250 nm. It should be noted that the first protruding portions 101a are closely and adjacently arranged, and no space is formed between the first protruding portions 101a.

Referring to FIG. 4 , a coating 106 is then formed on the structure shown in FIG. 3 , wherein the coating 106 is an anti-smudge layer. In one embodiment, the coating 106 may include materials such as perfluoropolyether (Per-FluorinatedPolyEthers, PFPE), fluorocarbon, haloalkane, etc., and may adopt such as dip coating (DipCoating), spray coating (SprayCoating), etc. ) and vaporization (Evaporation) film-forming methods are conformably formed on the exposed surfaces of the raised portion 100 b and the flat portion 100 a of the substrate 100 ′ shown in FIG. 3 . In addition, the coating 106 may have a thickness ranging from 1 nm to 100 nm.

Therefore, as shown in FIGS. 1-4 , the fabrication of the anti-reflection structure according to an embodiment of the present application is basically completed. FIG. 4 shows an anti-reflection structure according to an embodiment of the present invention, in which a plurality of adjacent first protrusions 101a formed on a substrate 100' comprising a light-transmitting material compose and form a moth-eye structure ( moth-eyestructure) anti-reflection structure, so that it can have the optical performance of suppressing reflected light in the visible light band, and it can have a reflectivity (reflectivity) of not more than 0.65% in the visible light wavelength range (400nm-800nm) Performance.

In addition, in the anti-reflection structure shown in FIG. 4, through the setting of the coating 106, its surface can exhibit contact angles greater than 110° and greater than 55° for liquids such as water and n-hexane. ) performance, so it has the characteristics of anti-fouling and self-cleaning.

Furthermore, since in the anti-reflection structure shown in FIG. 4 , the convex portion 100b and the flat portion 100a of the substrate 100 ′ are integrally formed of the same material, the combination and mechanical properties of the convex portion 100b and the flat portion 100a It is extremely good, and superior to the mechanical properties of the traditional anti-reflection structure composed of the light-transmitting substrate and the anti-reflection coating of different materials formed on the light-transmitting substrate, so it has the characteristics of wear resistance and wear resistance.

Please refer to a schematic cross-sectional view of FIG. 5 , which shows an anti-reflection structure according to another embodiment of the present invention. The anti-reflection structure shown in FIG. 5 is obtained by modifying the anti-reflection structure shown in FIG. 4 , and for the purpose of simplification, only the differences between the anti-reflection structures shown in FIGS. 4-5 are explained below.

As shown in FIG. 5 , the flat part 100a of the substrate 100' in the anti-reflection structure is provided with a protrusion 100b in the anti-reflection structure, wherein the protrusion 100b includes a plurality of first protrusions 101a and a plurality of second protrusions. The protrusions 101b, wherein the second protrusions 101b have a height H2 and a width D2 greater than the first protrusions 101a. And these second protruding parts 101b are made in the manufacturing method as shown in Fig. 1-Fig. - a first sphere (not shown) of diameter D1 of 400 nm, and a number of second spheres (not shown) of diameter D2 between 280-400 nm, produced by repeating the manufacturing method of FIGS. 2-4 The anti-reflection structure shown in Fig. 5 is obtained. These first protrusions 101a may have a hemispherical or semi-hemispherical cross-sectional profile that is generally similar to a part of the surface of the first sphere (not shown), and have a sectional profile similar to the first sphere (not shown). A width (also shown as D1) of 195-400 nm and a height H1 between 50-250 nm, and these second protrusions 101b may have a part of the surface substantially similar to the second sphere (not shown) Hemispherical or semi-hemispherical cross-sectional profile, and has a width (also shown as D2) between 280-400 nm and a height H2 between 50-250 nm similar to the second sphere (not shown) . It is worth noting that the first protrusions 101a and the second protrusions 101b are closely and adjacently arranged, and there is no gap between the first protrusions 101a and the second protrusions 101b .

In one embodiment, as shown in FIG. 5 , the number of the first type of spheres used in the anti-reflection structure accounts for 0.1% to 99% of the total amount, and the amount of the second type of spheres accounts for 0.1% to 99% of the total amount. 99%, so that the first protrusions 101a in the formed antireflection structure account for 0.1% to 99.9% of the total area, and the second protrusions 101b account for 0.1% to 99.9% of the total area %.

Please refer to a schematic cross-sectional view of FIG. 6 , which shows an anti-reflection structure according to another embodiment of the present invention. The anti-reflection structure shown in FIG. 6 is obtained by modifying the anti-reflection structure shown in FIG. 4 , and for the purpose of simplification, only the differences between the anti-reflection structures shown in FIG. 4 and FIG. 6 are explained below.

As shown in FIG. 6 , on the flat portion 100 a of the substrate 100 ′ in the anti-reflection structure, a protrusion 100 b of the anti-reflection structure is provided, wherein the protrusion 100 b includes a plurality of first protrusions 101 a, a plurality of second protrusions portion 101b and a plurality of third protruding portions 101c, wherein these third protruding portions 101c have a height H3 and a width D3 greater than those of these first protruding portions 101a and these second protruding portions 101b, and these The second protruding portion 101b has a height H2 and a width D2 greater than those of the first protruding portions 101a. These protruding parts 101a-c are produced in the manufacturing method as shown in Fig. 1-Fig. A first type of sphere (not shown) with a diameter D1 of 245 nm, a number of second type spheres (not shown) with a diameter D2 between 280 nm and 330 nm, and a number of spheres with a diameter D3 between 350 nm and 400 nm The third kind of sphere (not shown), and the anti-reflection structure shown in FIG. 6 is obtained by repeating the manufacturing method of FIG. 2-FIG. 4 . These first protrusions 101a may have a hemispherical or semi-hemispherical cross-sectional profile that is generally similar to a part of the surface of the first sphere (not shown), and have a sectional profile similar to the first sphere (not shown). A width (also shown as D1) of 195-245 nm and a height H1 between 50-250 nm, and these second protrusions 101b may have a part of the surface substantially similar to the second sphere (not shown) Hemispherical or semi-hemispherical cross-sectional profile, and has a width (also shown as D2) between 280-330 nm and a height H2 between 50-250 nm similar to the second sphere (not shown) , and these third protrusions 101c may have a hemispherical or semi-hemispherical cross-sectional profile that is generally similar to a part of the surface of a third sphere (not shown), and has a profile similar to that of a third sphere (not shown). A width (also shown as D3) between 350-400 nm and a height H3 between 50-250 nm. It is worth noting that the first protrusions 101a, the second protrusions 101b and the third protrusions 101c are closely and adjacently arranged, and the first protrusions 101a, the second protrusions 101b and the third protrusions There is no space between the three protrusions 101c. In one embodiment, as shown in FIG. 6 , the number of the first type of spheres used in the anti-reflection structure accounts for 60% to 98% of the total amount, and the number of these second type of spheres accounts for 1% to 20% of the total amount. %, and the number of these third spheres accounts for 1% to 20% of the total, so that the first protrusions 101a forming the anti-reflection structure account for 60% to 98% of the total area, and the second The protruding portion 101b accounts for 1%˜20% of the total area, and the third protruding portions 101c account for 1%˜20% of the total area.

Similarly, the anti-reflection structure shown in FIGS. 5-6 also has the low reflectivity, anti-fouling and self-cleaning properties of the anti-reflection structure shown in FIG. The mechanical properties of traditional anti-reflection structures based on anti-reflection coatings of different materials on light-transmitting substrates.

Please refer to FIG. 7 , which is a schematic cross-sectional view showing an electronic device 200 according to an embodiment of the present invention, in which the anti-reflection structure shown in FIG. 4 is applied.

As shown in FIG. 7, the electronic device 200 is suitable for applications such as a display device, which includes: a first substrate 210; a second substrate 240; a liquid crystal layer disposed between the first substrate 210 and the second substrate 240 220 ; and a color filter layer 230 disposed on the surface of the second substrate 240 adjacent to the liquid crystal layer 220 . In this embodiment, the second substrate 240 can be a light-transmitting substrate exposed to the external environment, and it can have an anti-reflection structure as shown in FIG. The low reflectivity, anti-fouling and self-cleaning properties of the anti-reflection structure, as well as the mechanical properties superior to the traditional anti-reflection structure formed on the light-transmitting substrate and including anti-reflection coatings of different materials from the light-transmitting substrate. Here, for the purpose of simplification, the components in the second substrate 240 are not described in detail, and its implementation is shown in FIG. Therefore, its implementation situation will not be described in detail here.

FIG. 8 is a schematic cross-sectional view showing an electronic device 300 according to another embodiment of the present invention, in which the anti-reflection structure shown in FIG. 4 is applied.

As shown in FIG. 8 , the electronic structure 300 is suitable for applications such as touch-sensitive display devices, and includes: a first substrate 310; a second substrate 360; A third substrate 350; a liquid crystal layer 320 disposed between the first substrate 310 and the third substrate 350; a plurality of touch components 330 disposed on the surface of the first substrate 310 adjacent to the liquid crystal layer 320; and A color filter layer 340 is formed on the surface of the third substrate 350 adjacent to the liquid crystal layer 320 . A space 380 between the second substrate 360 and the third substrate 350 is filled with air or optical glue for separating the second substrate 360 and the third substrate 350 . In this embodiment, the second substrate 360 can be a light-transmitting substrate exposed to the external environment, and it can have an anti-reflection structure as shown in FIG. The low reflectivity, anti-fouling and self-cleaning properties of the reflective structure, and the mechanical properties superior to the traditional anti-reflective structure formed on the light-transmitting substrate and including anti-reflective coatings of different materials than the light-transmitting substrate. Here, for the purpose of simplification, other components in the third substrate 360 are not described in detail, and their implementation can be as shown in FIG. The implementation situation of the device, so its implementation situation will not be described in detail here.

FIG. 9 is a schematic cross-sectional view showing an electronic device 400 according to another embodiment of the present invention, in which the anti-reflection structure shown in FIG. 4 is applied.

As shown in Figure 9, this electronic device 400 is applicable to the application such as solar cell device, and it comprises: a first substrate 414; A second substrate 402; An electrode layer 412 , a photoelectric conversion element 450 and a transparent conductive layer 404 are disposed between the substrate 402 . In one embodiment, the photoelectric conversion element 450 includes an n-type amorphous silicon layer 410 , an intrinsic (intrinsic) amorphous silicon layer 408 and a p-type amorphous silicon layer 406 stacked on the electrode layer 412 in sequence. and other components. In this embodiment, the second substrate 402 can be a light-transmitting substrate exposed to the external environment, and it has an anti-reflection structure as shown in FIG. The low reflectivity, antifouling and self-cleaning properties of the structure, as well as the mechanical properties superior to the traditional antireflection structure formed on the transparent substrate and including the antireflective coating of different materials from the transparent substrate. Here, for the purpose of simplification, other components in the second substrate 402 are not described in detail, and their implementation can be as shown in FIG. , so its implementation will not be described in detail here.

FIG. 10 is a schematic cross-sectional view showing an electronic device 500 according to yet another embodiment of the present invention, in which the anti-reflection structure shown in FIG. 4 is applied.

As shown in FIG. 10, the electronic device 500 is suitable for applications such as a touch module, which includes: a first substrate 502; a second substrate 506; disposed on the first substrate 502 and located between the first substrate 502 and the second A touch sensing (touch sensing) layer 504 between the substrates 506 . In this embodiment, the second substrate 506 can be a light-transmitting substrate exposed to the external environment, and it has an anti-reflection structure as shown in FIG. The low reflectivity, antifouling and self-cleaning properties of the structure, as well as the mechanical properties superior to the traditional antireflection structure formed on the transparent substrate and including the antireflective coating of different materials from the transparent substrate. Here, for the purpose of simplification, other components in the second substrate 506 are not described in detail, and their implementation can be as shown in FIG. , so its implementation will not be described in detail here.

The anti-reflection structures used in the electronic devices 200, 300, 400, and 500 shown in FIGS. 7-10 are not limited to the anti-reflection structures shown in FIG. 4. In other embodiments, they may also include Figure 5-Figure 6 shows the anti-reflection structure.

Although the present invention has been disclosed in conjunction with the above preferred embodiments, it is not intended to limit the present invention. Anyone familiar with the art can make changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection of the present invention The scope should be defined by the appended claims.

Claims (10)

1. An anti-reflection structure comprising: a substrate having a flat portion and a protruding portion disposed on the flat portion, wherein the protruding portion is integrally formed with the flat portion; and The coating is arranged on the substrate and covers the protruding part and the flat part. 2. The anti-reflection structure as claimed in claim 1, wherein the protruding portion has a hemispherical or semi-hemispherical cross-sectional profile. 3. The anti-reflection structure as claimed in claim 2, wherein the protruding portion comprises a plurality of first protruding portions, and the first protruding portions have the same width and height, and the width is about 195˜400 nanometers, and the height is about 50-250 nanometers. 4. The anti-reflection structure as claimed in claim 2, wherein the protrusions comprise at least two different protrusions. 5. The anti-reflection structure as claimed in claim 4, wherein the protruding portion comprises a plurality of first protruding portions and a plurality of second protruding portions, wherein the first protruding portions have a thickness between about 195˜400 The width of nanometers and the height of about 50-250 nanometers, the second protrusions have a width of about 280-400 nanometers and a height of about 50-250 nanometers. 6. The anti-reflection structure as claimed in claim 4, wherein the protrusions comprise a plurality of first protrusions, a plurality of second protrusions and a plurality of third protrusions, wherein the first protrusions the protrusions have a width of approximately 195-245 nm and a height of 50-250 nm, the second protrusions have a width of approximately 280-330 nm and a height of 50-250 nm, and The third protrusions have a width approximately between 350-400 nm and a height approximately between 50-250 nm. 7. The anti-reflection structure according to claim 6, wherein the first protrusions account for 60%-98% of the total area, and the second protrusions account for 1%-20% of the total area, And the third part accounts for 1%-20% of the total area. 8. The anti-reflection structure as claimed in claim 1, wherein the substrate comprises glass, polymethyl methacrylate, polyethylene terephthalate or polyimide. 9. The anti-reflection structure as claimed in claim 1, wherein the coating comprises perfluoropolyether, haloalkane or haloalkane. 10. An electronic device comprising: first substrate; a second substrate disposed on the first substrate; and The liquid crystal layer, the touch sensing layer or the photoelectric conversion component are disposed between the first substrate and the second substrate, wherein the second substrate comprises the anti-reflection structure as claimed in claim 1 .