CN105244384A - Vacuum packaging structure of infrared imaging chip - Google Patents
Vacuum packaging structure of infrared imaging chip Download PDFInfo
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- CN105244384A CN105244384A CN201510534150.5A CN201510534150A CN105244384A CN 105244384 A CN105244384 A CN 105244384A CN 201510534150 A CN201510534150 A CN 201510534150A CN 105244384 A CN105244384 A CN 105244384A
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- 238000003331 infrared imaging Methods 0.000 title claims abstract description 35
- 238000009461 vacuum packaging Methods 0.000 title claims abstract description 28
- 125000006850 spacer group Chemical group 0.000 claims abstract 5
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910000679 solder Inorganic materials 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 238000004806 packaging method and process Methods 0.000 abstract description 15
- 230000005855 radiation Effects 0.000 abstract description 4
- 238000007789 sealing Methods 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 5
- 238000005457 optimization Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000001931 thermography Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000007812 deficiency Effects 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000004297 night vision Effects 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/50—Encapsulations or containers
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Abstract
本发明公开了一种红外成像芯片真空封装结构,包括红外窗口、红外成像芯片、两个垫片、吸气剂、可见光窗口;其中,垫片键合在可见光窗口的上表面,形成用于真空封装的腔体,所述红外成像芯片和吸气剂设置在腔体内,吸气剂位于红外成像芯片与可见光窗口的上表面之间,红外窗口键合到腔体上,形成真空密封腔体。本发明可以选择性增透波长8~14μm的红外辐射,有效地保护内部脆弱的芯片结构,封闭性能好;该真空封装结构的空气漏率低;本发明封装结构简单、功耗低且成本低。
The invention discloses a vacuum packaging structure for an infrared imaging chip, comprising an infrared window, an infrared imaging chip, two spacers, a getter, and a visible light window; wherein, the spacer is bonded on the upper surface of the visible light window to form a The packaged cavity, the infrared imaging chip and the getter are arranged in the cavity, the getter is located between the infrared imaging chip and the upper surface of the visible light window, and the infrared window is bonded to the cavity to form a vacuum-sealed cavity. The present invention can selectively anti-transmit infrared radiation with a wavelength of 8-14 μm, effectively protect the fragile internal chip structure, and has good sealing performance; the air leakage rate of the vacuum packaging structure is low; the packaging structure of the present invention is simple, low power consumption and low cost .
Description
技术领域 technical field
本发明涉及半导体光电子技术领域,特别是一种红外成像芯片真空封装结构。 The invention relates to the technical field of semiconductor optoelectronics, in particular to a vacuum packaging structure for an infrared imaging chip.
背景技术 Background technique
红外成像技术越来越广泛地应用于工业传感、图象监测、汽车工业、消防搜救、甚至军事上的导航与夜视等领域。红外焦平面探测器制作技术是热成像实现技术的核心,而红外焦平面阵列探测器芯片密封封装技术是实现红外探测器成像的关键环节,红外焦平面阵列探测器芯片需要在真空下的密封环境中工作,否则无法发挥其测辐射热计的成像功能。一般而言,红外焦平面阵列探测器高真空封装技术采用金属壳体作为密封腔。 Infrared imaging technology is more and more widely used in industrial sensing, image monitoring, automobile industry, fire search and rescue, and even military navigation and night vision. Infrared focal plane detector manufacturing technology is the core of thermal imaging technology, and infrared focal plane array detector chip sealing packaging technology is the key link to realize infrared detector imaging. Infrared focal plane array detector chip needs to be in a sealed environment under vacuum Otherwise, the imaging function of its bolometer cannot be exerted. Generally speaking, the high-vacuum packaging technology of infrared focal plane array detector uses a metal shell as a sealed cavity.
真空封装对于红外焦平面阵列(infraredfocalplanearray,IRFPA)芯片是必不可少的。IRFPA需要封装来保护内部脆弱的微结构免于外界水汽、灰尘等造成的损坏;更重要的是需要真空环境来确保芯片的正常工作。迄今为止,已有多种针对电读出IRFPA的真空封装方案,可以分为芯片级封装、圆片级封装和像素级封装。芯片级真空封装是研发最早且目前仍被广泛使用的一种真空封装方法,但是其封装效率比较低。圆片级真空封装提高了封装效率,但该方法对IRFPA芯片的成品率要求较高,否则,将会封装相当比例的废片,从而浪费昂贵的红外滤波片。由CEA-LETI研发的,其创新之处是在圆片上用半导体薄膜对像素进行真空封装;然而,方案中使用薄膜作为封装盖板,比较脆弱,难以有效保护内部脆弱的像素结构;且没有光读出红外焦平面阵列芯片所需的可见光窗口。 Vacuum packaging is essential for infrared focal plane array (IRFPA) chips. IRFPA needs encapsulation to protect the internal fragile microstructure from damage caused by external water vapor, dust, etc.; more importantly, it needs a vacuum environment to ensure the normal operation of the chip. So far, there have been many vacuum packaging schemes for electrical readout IRFPA, which can be divided into chip-level packaging, wafer-level packaging and pixel-level packaging. Chip-level vacuum packaging is the earliest vacuum packaging method developed and is still widely used, but its packaging efficiency is relatively low. Wafer-level vacuum packaging improves packaging efficiency, but this method requires a high yield of IRFPA chips, otherwise, a considerable proportion of waste chips will be packaged, thereby wasting expensive infrared filters. Developed by CEA-LETI, its innovation is to vacuum-encapsulate the pixels with a semiconductor film on the wafer; however, the film is used as the package cover in the scheme, which is relatively fragile and difficult to effectively protect the fragile internal pixel structure; and there is no light The visible window required to read out the infrared focal plane array chip.
现有的这种封装结构内部元件多,体积大,而随着红外热成像技术的发展,市场要求红外热成像设备体积尽量小一些,尤其一些便携式红外热成像设备,现有封装结构无法满足紧凑结构的要求,而且这种封装结构元件多、功耗高、成本高昂和制作工艺困难。而且对于一些红外焦平面探测器芯片,有些情况下,需要在与外界热绝缘较好环境下工作,上述现有封装结构难以满足应用要求。 The existing packaging structure has many internal components and is large in volume. With the development of infrared thermal imaging technology, the market requires that the volume of infrared thermal imaging equipment be as small as possible. Especially for some portable infrared thermal imaging equipment, the existing packaging structure cannot meet the requirements of compactness. The requirements of the structure, and this package has many structural components, high power consumption, high cost and difficult manufacturing process. Moreover, for some infrared focal plane detector chips, in some cases, they need to work in an environment with good thermal insulation from the outside world, and the above-mentioned existing packaging structure cannot meet the application requirements.
如何解决现有技术的不足以成为现有半导体光电子技术领域亟需解决的重要难题之一。 How to solve the deficiencies of the existing technology has become one of the important problems that need to be solved urgently in the field of semiconductor optoelectronic technology.
发明内容 Contents of the invention
本发明所要解决的技术问题是克服现有技术的不足而提供一种红外成像芯片真空封装结构,本发明可以选择性增透波长8~14μm的红外辐射,有效地保护内部的像素结构,封闭性能好。 The technical problem to be solved by the present invention is to provide a vacuum packaging structure for infrared imaging chips by overcoming the deficiencies in the prior art. it is good.
本发明为解决上述技术问题采用以下技术方案: The present invention adopts the following technical solutions for solving the problems of the technologies described above:
根据本发明提出的一种红外成像芯片真空封装结构,包括红外窗口、红外成像芯片、两个垫片、吸气剂、可见光窗口;其中,垫片键合在可见光窗口的上表面,形成用于真空封装的腔体,所述红外成像芯片和吸气剂设置在腔体内,吸气剂位于红外成像芯片与可见光窗口的上表面之间,红外窗口键合到腔体上,形成真空密封腔体。 A vacuum packaging structure for an infrared imaging chip proposed according to the present invention includes an infrared window, an infrared imaging chip, two gaskets, a getter, and a visible light window; wherein, the gasket is bonded on the upper surface of the visible light window to form a A vacuum-encapsulated cavity, the infrared imaging chip and the getter are arranged in the cavity, the getter is located between the infrared imaging chip and the upper surface of the visible light window, and the infrared window is bonded to the cavity to form a vacuum-sealed cavity .
作为本发明所述的一种红外成像芯片真空封装结构进一步优化方案,所述垫片为硅垫片。 As a further optimization scheme of the infrared imaging chip vacuum packaging structure described in the present invention, the gasket is a silicon gasket.
作为本发明所述的一种红外成像芯片真空封装结构进一步优化方案,所述可见光窗口的材质为玻璃。 As a further optimization scheme of the infrared imaging chip vacuum packaging structure described in the present invention, the material of the visible light window is glass.
作为本发明所述的一种红外成像芯片真空封装结构进一步优化方案,所述红外成像芯片是通过焊料键合在可见光窗口的上表面。 As a further optimization scheme of the infrared imaging chip vacuum packaging structure described in the present invention, the infrared imaging chip is bonded to the upper surface of the visible light window by solder.
作为本发明所述的一种红外成像芯片真空封装结构进一步优化方案,所述吸气剂为电激活式吸气剂。 As a further optimization scheme of the infrared imaging chip vacuum packaging structure described in the present invention, the getter is an electrically activated getter.
作为本发明所述的一种红外成像芯片真空封装结构进一步优化方案,所述红外窗口的材质为硅片。 As a further optimization scheme of the infrared imaging chip vacuum packaging structure described in the present invention, the material of the infrared window is a silicon wafer.
本发明采用以上技术方案与现有技术相比,具有以下技术效果: Compared with the prior art, the present invention adopts the above technical scheme and has the following technical effects:
(1)本发明可以选择性增透波长8~14μm的红外辐射,有效地保护内部脆弱的芯片结构,封闭性能好; (1) The present invention can selectively enhance infrared radiation with a wavelength of 8-14 μm, effectively protect the fragile internal chip structure, and have good sealing performance;
(2)该真空封装结构的空气漏率低; (2) The air leakage rate of the vacuum packaging structure is low;
(3)本发明封装结构简单、功耗低且成本低。 (3) The present invention has a simple packaging structure, low power consumption and low cost.
附图说明 Description of drawings
图1是本发明结构示意图。 Fig. 1 is a schematic diagram of the structure of the present invention.
图中的附图标记解释为:1-红外窗口,2-红外成像芯片,3-垫片,4-吸气剂,5-可见光窗口。 The reference signs in the figure are explained as: 1-infrared window, 2-infrared imaging chip, 3-gasket, 4-getter, 5-visible light window.
具体实施方式 detailed description
下面结合附图对本发明的技术方案做进一步的详细说明: Below in conjunction with accompanying drawing, technical scheme of the present invention is described in further detail:
如图1所示,一种红外成像芯片真空封装结构,包括红外窗口1、红外成像芯片2、两个垫片3、吸气剂4、可见光窗口5;其中,垫片键合在可见光窗口的上表面,形成用于真空封装的腔体,所述红外成像芯片和吸气剂设置在腔体内,吸气剂位于红外成像芯片与可见光窗口的上表面之间,红外窗口键合到腔体上,形成真空密封腔体。 As shown in Figure 1, a vacuum packaging structure for an infrared imaging chip includes an infrared window 1, an infrared imaging chip 2, two gaskets 3, a getter 4, and a visible light window 5; wherein, the gasket is bonded to the visible light window The upper surface forms a cavity for vacuum packaging, the infrared imaging chip and the getter are arranged in the cavity, the getter is located between the infrared imaging chip and the upper surface of the visible light window, and the infrared window is bonded to the cavity , forming a vacuum-tight cavity.
所述垫片为硅垫片。 The gasket is a silicon gasket.
所述可见光窗口的材质为玻璃。 The visible light window is made of glass.
所述红外成像芯片是通过焊料键合在可见光窗口的上表面。 The infrared imaging chip is bonded on the upper surface of the visible light window through solder.
所述吸气剂为电激活式吸气剂。 The getter is an electro-active getter.
所述红外窗口的材质为硅片。 The infrared window is made of silicon wafer.
硅垫片和可见光窗口通过阳极键合形成用来放置芯片的封装腔体;红外窗口不仅对波长8~14μm的红外辐射进行选择性增透,而且用来作为封装盖板,可以较好地保护内部脆弱的芯片结构。 The silicon gasket and the visible light window are anodically bonded to form a package cavity for placing the chip; the infrared window not only performs selective anti-reflection for infrared radiation with a wavelength of 8-14 μm, but also serves as a package cover, which can better protect Internal fragile chip structure.
真空封装结构制作流程为: The manufacturing process of the vacuum packaging structure is as follows:
1)使用湿法腐蚀工艺制作硅垫片; 1) Using a wet etching process to make a silicon gasket;
2)硅垫片和可见光窗口阳极键合,形成封装腔体; 2) The silicon gasket and the visible light window are anodically bonded to form a packaging cavity;
3)在封装腔体上制作Au并图形化,形成Au粘附层; 3) Au is fabricated and patterned on the package cavity to form an Au adhesion layer;
4)将芯片焊料键合到封装腔体内; 4) bonding the chip solder into the package cavity;
5)使用普通硅片作为红外窗口,在上面溅射Au并图形化,形成粘附层; 5) Use a common silicon wafer as an infrared window, sputter Au on it and pattern it to form an adhesion layer;
6)红外窗口在真空环境下焊料键合到封装腔体片上,完成真空封装。 6) The infrared window is solder-bonded to the package cavity chip in a vacuum environment to complete the vacuum package.
硅垫片和可见光窗口(玻璃)通过阳极键合形成封装腔体,用于放置芯片;红外窗口不仅选择性增透8~14μm波段的红外辐射,且作为封装盖板;封装腔体和红外窗口在真空室内通过焊料键合完成真空封装。该封装结构通过了气密检测,并测试得到了200℃电烙铁热像图。该真空封装后的红外成像芯片可以对180℃的电烙铁清晰成像,表明了该真空封装方法是有效的。 The silicon gasket and the visible light window (glass) are anodically bonded to form a packaging cavity for placing chips; the infrared window not only selectively prevents infrared radiation in the 8-14 μm band, but also acts as a packaging cover; the packaging cavity and infrared window Vacuum packaging is accomplished by solder bonding within the vacuum chamber. The packaging structure has passed the airtight test, and the thermal image of a 200°C soldering iron has been obtained from the test. The vacuum-encapsulated infrared imaging chip can clearly image an electric soldering iron at 180° C., which shows that the vacuum-encapsulation method is effective.
以上实施例仅为说明本发明的技术思想,不能为此限定本发明的保护范围,凡是按照本发明提出的技术思想,在技术方案基础上所做的任何改动,均落入本发明保护范围之内。 The above embodiments are only to illustrate the technical ideas of the present invention, and cannot limit the scope of protection of the present invention for this reason. Any changes made on the basis of technical solutions according to the technical ideas proposed in the present invention all fall within the scope of protection of the present invention. Inside.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111370498A (en) * | 2020-03-23 | 2020-07-03 | 中国科学院长春光学精密机械与物理研究所 | A small permanent high-vacuum cavity of a detector and preparation method thereof |
CN112556847A (en) * | 2020-11-27 | 2021-03-26 | 云南昆物新跃光电科技有限公司 | InGaAs multi-line photosensitive chip and application thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1630531A1 (en) * | 2004-08-24 | 2006-03-01 | Ulis | Component for the detection of electromagnetic radiation, in particular infrared, optical block for infrared imaging integrating said component and fabrication procedure thereof |
CN102956662A (en) * | 2012-11-22 | 2013-03-06 | 烟台睿创微纳技术有限公司 | Vacuum sealing packaging structure and packaging method for infrared focal plane detector chip |
CN104003352A (en) * | 2014-06-13 | 2014-08-27 | 中国科学院上海微系统与信息技术研究所 | Mixed wafer level vacuum packaging method and structure based on getter film |
-
2015
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1630531A1 (en) * | 2004-08-24 | 2006-03-01 | Ulis | Component for the detection of electromagnetic radiation, in particular infrared, optical block for infrared imaging integrating said component and fabrication procedure thereof |
CN102956662A (en) * | 2012-11-22 | 2013-03-06 | 烟台睿创微纳技术有限公司 | Vacuum sealing packaging structure and packaging method for infrared focal plane detector chip |
CN104003352A (en) * | 2014-06-13 | 2014-08-27 | 中国科学院上海微系统与信息技术研究所 | Mixed wafer level vacuum packaging method and structure based on getter film |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111370498A (en) * | 2020-03-23 | 2020-07-03 | 中国科学院长春光学精密机械与物理研究所 | A small permanent high-vacuum cavity of a detector and preparation method thereof |
CN112556847A (en) * | 2020-11-27 | 2021-03-26 | 云南昆物新跃光电科技有限公司 | InGaAs multi-line photosensitive chip and application thereof |
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Application publication date: 20160113 |