CN105093839B - Exposure platform of exposure machine - Google Patents

Abstract

The invention discloses an exposure platform of an exposure machine, which comprises an exposure frame, a carrying platform, a plurality of lifting units and a light-transmitting plate, wherein the carrying platform is arranged on the exposure frame; the carrying platform can be close to or far away from the exposure frame, the upper surface of the carrying platform is provided with an accommodating area, and the accommodating area is used for placing the substrate and enabling incident light of the exposure light source to be projected to the substrate; the lifting unit is arranged on the exposure frame; the light transmission plate is combined with the clamp of the lifting unit, and the light transmission plate is driven by the lifting unit to move towards or away from the accommodating area of the carrying platform; the light-transmitting plate of the exposure platform is fixed on the bottom surface of the exposure frame through the fixture and the lifting unit, and when the vacuum pumping is carried out in the exposure step of the circuit board manufacturing process, the light-transmitting plate can be driven by the lifting unit and attached to the substrate and deforms along with the flatness of the substrate, so that the attaching tightness of the light-transmitting plate and the substrate is improved, and the exposure resolution is further improved.

Description

Exposure platform of exposure machine

technical field

The invention relates to an exposure platform of an exposure machine, in particular to an exposure platform in an exposure machine used for circuit board manufacturing process.

Background technique

In the existing exposure machine used in the circuit board manufacturing process, an exposure platform is used to align the exposure light source, the substrate and the mask, so as to facilitate the precise exposure of the exposure light source to the unshielded area on the substrate. Wherein, the existing exposure platform has a stage and an exposure frame, the stage is used to carry the substrate, the exposure frame has a rectangular frame and a light-transmitting plate arranged in the frame, the light-transmitting plate is used for After setting the photomask and pressing it on the surface of the substrate, in the circuit board manufacturing process, use the vacuum device connected to the stage to vacuumize between the stage and the exposure frame, so that the exposure frame and the transparent After the mask on the bottom surface of the light plate is closely attached to the surface of the substrate, the exposure light source is turned on for exposure.

However, when the vacuum device vacuumizes between the stage and the exposure frame, the suction force of the vacuum gradually increases, because the surface of the substrate is not completely flat, and the surrounding edges of the light-transmitting plate are covered by the frame. Fixed, the light-transmitting plate cannot be deformed according to the flatness of the substrate surface, resulting in that the exposure frame and the mask on the exposure frame cannot be completely tightly attached to the substrate surface, thereby reducing the exposure resolution.

Contents of the invention

The main purpose of the present invention is to provide an exposure platform of an exposure machine, which is used to align the exposure light source, the substrate and the mask. The exposure platform can be deformed according to the flatness of the substrate surface so that the mask can be closely attached to the substrate surface. , and has the effect of improving the exposure resolution.

In order to achieve the above purpose and other purposes, the present invention provides an exposure platform of an exposure machine, which is used to carry a substrate and be positioned under an exposure light source, including an exposure frame, a stage, a plurality of lifting units and a light-transmitting plate ; Wherein, the stage can be close to or far away from the exposure frame, the upper surface of the stage has an accommodating area, and the accommodating area is used to place the substrate and project the incident light of the exposure light source to the substrate; The lifting unit is arranged on the exposure frame; the light-transmitting plate is combined with the lifting units, and the light-transmitting plate is driven by the lifting units to move toward or away from the accommodating area of the stage.

The above-mentioned exposure platform of the exposure machine, wherein each of the lifting units has a base, a piston and a clamp, the base is fixed on the exposure frame, and the piston can be reciprocally moved in a housing of the base. The groove has a reciprocating stroke, and one end of the piston passes through the notch of the accommodating groove and is combined with the clamp, and the clamp clamps the light-transmitting plate.

In the above-mentioned exposure platform of the exposure machine, the notch of the accommodating groove of the base has a first positioning portion, and the clamp has a second positioning portion corresponding to the first positioning portion.

The above-mentioned exposure platform of the exposure machine, wherein the reciprocating stroke is 3.5±0.5 mm.

The above-mentioned exposure platform of the exposure machine, wherein the exposure platform has a vacuum gauge for detecting the air pressure on the upper surface of the stage.

The above-mentioned exposure platform of the exposure machine, wherein the lifting unit is electrically connected to a main control computer, for when the air pressure detected by the vacuum gauge reaches a predetermined value, the main control computer controls the movement of the lifting units to make the transparent The light board moves towards the accommodating area of the carrier and adheres to the substrate on the upper surface of the carrier.

The above-mentioned exposure platform of the exposure machine, wherein the piston has a sealing ring near one end, and the base has a loosening air inlet and a clamping air inlet, and the sealing ring is between the loosening air inlet and the clamping The air intake holes are reciprocated and the accommodation groove of the base is isolated to form a loose air intake chamber and a clamping air intake chamber. The hole communicates with the clamping air intake chamber, the loosening air intake hole and the clamping air intake hole are respectively connected to an air intake device, and the air intake device is electrically connected to the main control computer.

In the above-mentioned exposure platform of the exposure machine, the number of these lifting units is at least four or more.

Accordingly, the exposure platform of the present invention is applied in the exposure step of the circuit board manufacturing process. The light-transmitting plate of the exposure platform is fixed to the bottom surface of the exposure frame through the clamps and the lifting units, so the exposure platform between the stage and the exposure frame After being relatively close and vacuuming, the light-transmitting plate can be driven by the lifting units and attached to the surface of the substrate, and the light-transmitting plate can be deformed according to the flatness of the substrate during the vacuuming process, thereby improving the The tightness of the light-transmitting plate and the substrate can improve the defect that the light-transmitting plate of the exposure frame in the prior art cannot be deformed with the flatness of the substrate when vacuuming, so the exposure platform of the present invention can improve the performance of the light-transmitting plate. It is closely attached to the substrate when vacuuming, thereby improving the exposure resolution.

Description of drawings

FIG. 1 is a schematic diagram of an exposure platform according to an embodiment of the present invention.

FIG. 2 is a schematic structural diagram of an exposure frame in an exposure platform according to an embodiment of the present invention.

3A and 3B are structural schematic diagrams of the lifting unit in the exposure platform according to the embodiment of the present invention.

[Description of main component symbols]

1 Exposure platform

10 exposure frames

20 stages

21 upper surface

30 lifting unit

31 base

31A upper cover

31B lower cover

314 First Positioning Department

311 storage tank

311A Relax Intake Chamber

311B clamping inlet chamber

312 Loose air intake

313 clamp air inlet

314 First Positioning Department

32 pistons

321 sealing ring

33 Fixtures

331 Second Positioning Department

40 transparent board

50 vacuum gauge

100 substrates

200 exposure light sources

201 Incident light

detailed description

In order to fully understand the purpose, features and effects of the present invention, now through the following specific embodiments, and in conjunction with the accompanying drawings, the present invention is described in detail, as follows:

The exposure platform 1 of the embodiment of the present invention is applied to an exposure machine for manufacturing circuit boards. The exposure machine has an internal space and an exposure light source 200 is disposed therein. Please refer to FIG. 1 first. The exposure platform 1 of the embodiment of the present invention is used to carry a The substrate 100 is located below the exposure light source 200. The exposure platform 1 includes an exposure frame 10, a stage 20, a plurality of lifting units 30 and a light-transmitting plate 40; as shown in FIG. 2, the exposure frame 10 is a Rectangular frame body; the stage 20 can approach or move away from the exposure frame 10, the upper surface 21 of the stage 20 has an accommodating area, and the accommodating area is used to place the substrate 100 and make the exposure light source 200 incident Light 201 is projected onto the substrate 100; the lifting units 30 are arranged on the exposure frame 20; the light-transmitting plate 40 is combined with the lifting units 30, and the light-transmitting plate 40 is driven by the lifting units 30 toward or away from the stage 20 containment zone moves.

The exposure platform 1 of the embodiment of the present invention is connected with a vacuum device (not shown), which is used to form a vacuum between the exposure frame 10 and the stage 20, so that the photomask at the bottom of the light-transmitting plate 40 ( (not shown in the figure) can closely adhere to the substrate 200 on the upper surface of the stage 20 . Wherein, the stage 20 can be provided with a sealing strip (not shown) adjacent to the surrounding area of the accommodating area, so that the stage 20 and the light-transmitting plate 40 can form an airtight space after adjoining to avoid the outside Insufficient vacuum due to gas ingress.

Accordingly, when the stage 20 carrying the substrate 100 to be exposed is relatively close to and close to the light-transmitting plate 40 provided with a photomask, the vacuuming device performs vacuuming, and the lifting unit 30 drives the light-transmitting plate 40 toward The accommodating area of the stage 20 moves, and the light-transmitting plate 40 is attached to the substrate 200 on the upper surface of the stage 20. Therefore, unlike the prior art, the surrounding edges of the light-transmitting plate are fixed on the exposure frame. In the exposure platform 1 of the embodiment of the present invention, the light-transmitting plate 40 is fixed to the exposure frame 10 through the clamps 33 and the lifting units 30, so when vacuuming, the light-transmitting plate 40 can be deformed according to the flatness of the substrate. Furthermore, the bonding tightness between the transparent plate 40 and the substrate 100 is improved.

Please refer to Fig. 3A and 3B, it is the structural diagram of lifting unit 30 in the embodiment of the present invention, in this embodiment, each this lifting unit 30 has a base 31, a piston 32 and a clamp 33, and this base 31 Fixed on the exposure frame 10, the piston 32 is reciprocally accommodated in a housing groove 311 of the base 31 and has a reciprocating stroke, one end of the piston 32 passes through the notch of the housing groove 311 and Combined with the clamp 33 , the clamp 33 clamps the light-transmitting plate 40 , as shown in the figure, the clamp 33 of each lifting unit 30 clamps the edge of the light-transmitting plate 40 . Wherein, the reciprocating stroke may be 3.5±0.5 mm, that is, when the piston 32 moves from the position shown in FIG. 3A to the position shown in FIG. 3B , it drives the transparent plate 40 down by 3.5±0.5 mm.

Specifically, in the lifting unit 30 of this embodiment, as shown in Figure 3A and Figure 3B, the piston 32 has a sealing ring 321 adjacent to one end, and the base 31 has a loose air inlet 312 and a clamping Air intake hole 313, wherein, the base 31 can have an upper cover body 31A and a lower cover body 31B, the upper cover body 31A and the lower cover body 31B are assembled to form the accommodation groove 311, and the loosening step The air hole 312 is located on the upper cover 31A and is adjacent to the top of the upper cover 31A, and the clamping air hole 313 is located on the upper cover 31B and is adjacent to the upper cover 31A and the lower cover 31B. joint.

The sealing ring 321 of the piston 32 reciprocates between the loosening air inlet 312 and the clamping air inlet 313 and isolates the accommodating groove 311 of the base 31 to form a loosening air inlet chamber 311A and a clamping Hold air intake chamber 311B, the release air intake hole 312 communicates with the release air intake chamber 311A, the clamp air intake hole 313 communicates with the clamp intake air chamber 311B, the release air intake hole 312 and the clamp air intake hole 313 They are respectively connected to an air intake device (not shown in the figure), and the air intake device can be electrically connected to a main control computer (not shown in the figure) of the exposure machine. When the air intake device sends gas from the clamping intake hole 313, the piston 32 is pushed to a position adjacent to the loosening intake hole 312 as shown in Figure 3A, which is the top dead center of the reciprocating stroke, At this moment, the volume of the clamping air intake chamber 311B is greater than that of the relaxation air intake chamber 311A; when the air intake device sends gas through the relaxation air intake hole 312, the piston 32 is pushed to the adjacent position as shown in Figure 3B. The position of the clamping air intake hole 313 is the bottom dead center of the reciprocating stroke. At this time, the volume of the loosening air intake chamber 311A is larger than that of the clamping intake air chamber 311B.

In this embodiment, the notch of the receiving groove 311 of the base 31 has a first positioning portion 314 , and the clamp 33 has a second positioning portion 331 corresponding to the first positioning portion 314 . As shown in Fig. 3A and Fig. 3B, the first positioning part 314 is the inclined tapered surface of the notch of the receiving groove 311, which gradually expands from the inside of the receiving groove 311 to the outside, and the second positioning part 331 is the upper part of the clamp. 33 has a protrusion corresponding to the oblique tapered surface of the first positioning part 314. When the piston 32 is in the state of FIG. 3B to FIG. The second positioning portion 331 is compliantly abutting against the first positioning portion 314 . At this moment, the clamp 33 is positioned relative to the base 31 , and the piston 32 returns to the top dead center position of the reciprocating stroke.

In this embodiment, the exposure platform 1 can have a vacuum gauge 50 for detecting the vacuum of the exposure platform 1 after the stage 20 is relatively close to the exposure frame 10 and the transparent plate 40 is bonded to the substrate 100. Vacuum degree (also known as vacuum pressure), to monitor the vacuum degree of the airtight space between the stage 20 and the exposure frame 10 .

In this embodiment, the exposure platform 1 is connected to the main control computer of the exposure machine, and the main control computer controls the lifting unit 30 according to the air pressure value detected by the vacuum gauge 50. The air pressure detected by the vacuum gauge 50 When it reaches a predetermined value, in this embodiment, the predetermined value is 200mmHg, the main control computer controls the lifting units 30 to move the light-transmitting plate 40 toward the accommodating area of the stage 20 and fit the The substrate 100 on the upper surface 21 of the stage 20 . In addition, the exposure machine can have a user interface, which is electrically connected to the main control computer and used to set process parameters (such as exposure time, exposure intensity, vacuum degree, etc.), and the user can input and set the process parameters through the user interface. The predetermined value is set according to the type and size of the exposure target.

Accordingly, the embodiment of the present invention is applied to the automatic process of manufacturing circuit boards. Before starting, the initial position of the light-transmitting plate 40 of the exposure platform 1 is that the pistons 32 in the lifting units 30 are at the top dead center position of the reciprocating stroke. (as shown in FIG. 3A ), that is, the light-transmitting plate 40 is located at the position closest to the exposure frame 10 in the entire reciprocating stroke; 20 is relatively close to the exposure frame 10 (the stage 20 can be raised to approach the exposure frame 10 through the configuration of the transmission mechanism, or the exposure frame 10 can be lowered to approach the stage 20, or the exposure frame 10 can be lowered at the same time and the stage 20 rises), the vacuum device starts to evacuate, and the vacuum gauge 50 detects the air pressure on the upper surface of the stage 20. When the detected air pressure reaches a predetermined value of 200mmHg, the main control The computer controls the air intake device connected to these lifting units 30, so that the gas is sent in from the relaxation air intake hole 312 of each lifting unit 30, and the piston 32 is pushed to adjacent to the clamping inlet as shown in FIGS. 3A to 3B. The position of the air hole 313 reaches the bottom dead center of the reciprocating stroke. At the same time, the light-transmitting plate 40 approaches the stage 20 and is attached to the substrate 100 on the upper surface of the stage 20 . Therefore, during the continuous vacuuming process of the vacuum pumping device, the transparent plate 40 is gradually attached to the surface of the substrate 100 until the space between the transparent plate 40 and the substrate 100 reaches a vacuum state and is completely bonded. Turn on the exposure light source 200 to perform an exposure step on the substrate 100 .

After the exposure step is completed, the internal space of the exposure machine gradually returns to the normal pressure state, and the main control computer controls the air intake device connected to these lifting units 30, so that the gas is sent from the clamping air intake hole 313 of each lifting unit 30. 3B to 3A, the piston 32 is pushed to a position adjacent to the relaxation air inlet 312, which is the top dead center of the reciprocating stroke. At the same time, the light-transmitting plate 40 is opposite to the stage 20 is far away from the substrate 100 on its upper surface, and finally, the stage 20 is relatively far away from the exposure frame 10 .

In this embodiment, the number of these lifting units 30 is eight, and two are respectively arranged on each side of the rectangular exposure frame 10, but the number of these lifting units 30 is not limited to this embodiment and the accompanying drawings, and it can be Configure according to the size of the exposure frame 10. For example, it is applicable to an exposure machine for small board substrates. The number of these lifting units 30 can be four, that is, one is arranged on each side of the rectangular exposure frame 10 to provide Give the light-transmitting plate 40 enough supporting force and driving force.

In summary, the exposure platform 1 of the embodiment of the present invention is applied in the exposure step of the circuit board manufacturing process. The light-transmitting plate 40 of the exposure platform 1 is fixed to the bottom surface of the exposure frame 10 through the clamps 33 and the lifting units 30. Therefore, when the stage 20 is relatively close to the exposure frame 10 and vacuuming is performed, the light-transmitting plate 40 can be driven by the lifting units 30 and attached to the substrate 100, and the light-transmitting plate 40 can be It can be deformed according to the flatness of the surface of the substrate, thereby improving the bonding tightness between the light-transmitting plate 40 and the substrate 100, and can improve the flatness of the light-transmitting plate of the exposure frame in the prior art that cannot follow the flatness of the substrate 100 when vacuuming. Due to the defect of being deformed and unable to fit tightly, the exposure platform 1 of the embodiment of the present invention can improve the tight fit between the light-transmitting plate 40 and the substrate 100 during vacuuming, thereby improving the exposure resolution.

The present invention has been disclosed above with preferred embodiments, but those skilled in the art should understand that the embodiments are only used to describe the present invention, and should not be construed as limiting the scope of the present invention. It should be noted that all changes and substitutions equivalent to this embodiment should be included in the scope of the present invention. Therefore, the protection scope of the present invention should be defined by the claims.

Claims (8)

1. An exposure platform of an exposure machine, which is used to carry a substrate and is positioned under an exposure light source, is characterized in that it includes: an exposure frame; a stage, which can approach or move away from the exposure frame, the upper surface of the stage has an accommodating area, and the accommodating area is used to place the substrate and project the incident light of the exposure light source to the substrate; a plurality of lifting units arranged on the exposure frame; and A light-transmitting plate is combined with the lifting units, and the light-transmitting plate is driven by the lifting units to move toward or away from the accommodating area of the carrier. 2. The exposure platform of an exposure machine according to claim 1, wherein each lifting unit has a base, a piston and a clamp, the base is fixed on the exposure frame, and the piston can move back and forth Accommodated in an accommodating groove of the base and has a reciprocating stroke, one end of the piston passes through the notch of the accommodating groove and is combined with the clamp, and the clamp clamps the light-transmitting plate. 3. The exposure platform of an exposure machine according to claim 2, wherein the notch of the accommodating groove of the base has a first positioning portion, and the jig has a second positioning portion corresponding to the first positioning portion. positioning department. 4. The exposure platform of an exposure machine according to claim 2 or 3, wherein the reciprocating stroke is 3.5±0.5 mm. 5. The exposure platform of the exposure machine according to claim 2 or 3, characterized in that the exposure platform has a vacuum gauge for detecting the degree of vacuum. 6. The exposure platform of an exposure machine as claimed in claim 5, wherein the lifting unit is electrically connected to a main control computer for when the air pressure detected by the vacuum gauge reaches a predetermined value, the main control The computer controls the lifting units to move the light-transmitting plate toward the accommodating area of the stage and adhere to the substrate on the upper surface of the stage. 7. The exposure platform of an exposure machine as claimed in claim 6, wherein the piston is provided with a sealing ring near one end, and the base has a loosening air inlet and a clamping air inlet, and the sealing ring Move back and forth between the loosening air inlet and the clamping air inlet and isolate the accommodation groove of the base to form a loosening air inlet chamber and a clamping air inlet chamber, and the loosening air inlet communicates with the Loosen the air intake chamber, the clamping air intake hole communicates with the clamping air intake chamber, the loosening air intake hole and the clamping air intake hole are respectively connected to an air intake device, and the air intake device is electrically connected to the master computer. 8. The exposure platform of an exposure machine according to claim 1, wherein the number of the lifting units is at least four or more.