CN105063684A - Preparing method for surface conducting layer of carbon fiber epoxy resin matrix composite - Google Patents
Preparing method for surface conducting layer of carbon fiber epoxy resin matrix composite Download PDFInfo
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- 229920000049 Carbon (fiber) Polymers 0.000 title claims abstract description 45
- 239000004917 carbon fiber Substances 0.000 title claims abstract description 45
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 title claims abstract description 42
- 239000002131 composite material Substances 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 32
- 239000003822 epoxy resin Substances 0.000 title abstract description 28
- 229920000647 polyepoxide Polymers 0.000 title abstract description 28
- 239000011159 matrix material Substances 0.000 title abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 42
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 37
- 229910052802 copper Inorganic materials 0.000 claims abstract description 37
- 239000010949 copper Substances 0.000 claims abstract description 37
- 238000004140 cleaning Methods 0.000 claims abstract description 24
- 230000008569 process Effects 0.000 claims abstract description 17
- 239000011248 coating agent Substances 0.000 claims abstract description 13
- 238000000576 coating method Methods 0.000 claims abstract description 13
- 229920005989 resin Polymers 0.000 claims abstract description 5
- 239000011347 resin Substances 0.000 claims abstract description 5
- 238000005530 etching Methods 0.000 claims abstract description 4
- 238000005498 polishing Methods 0.000 claims abstract 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- 239000011259 mixed solution Substances 0.000 claims description 21
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 15
- 239000000243 solution Substances 0.000 claims description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 14
- 239000000835 fiber Substances 0.000 claims description 8
- 238000002360 preparation method Methods 0.000 claims description 8
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 7
- 230000004913 activation Effects 0.000 claims description 6
- PDQAZBWRQCGBEV-UHFFFAOYSA-N Ethylenethiourea Chemical compound S=C1NCCN1 PDQAZBWRQCGBEV-UHFFFAOYSA-N 0.000 claims description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 5
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 5
- 239000004327 boric acid Substances 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 5
- 235000006408 oxalic acid Nutrition 0.000 claims description 5
- 239000012286 potassium permanganate Substances 0.000 claims description 5
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052708 sodium Inorganic materials 0.000 claims description 5
- 239000011734 sodium Substances 0.000 claims description 5
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 claims description 5
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims description 5
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 4
- 238000006386 neutralization reaction Methods 0.000 claims description 4
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 claims description 4
- 239000001488 sodium phosphate Substances 0.000 claims description 3
- 229910000162 sodium phosphate Inorganic materials 0.000 claims description 3
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 claims description 3
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims description 2
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims description 2
- 229910000160 potassium phosphate Inorganic materials 0.000 claims description 2
- 235000011009 potassium phosphates Nutrition 0.000 claims description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 2
- 235000011150 stannous chloride Nutrition 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims 5
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 229910000366 copper(II) sulfate Inorganic materials 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 241000370738 Chlorion Species 0.000 claims 1
- 229910003803 Gold(III) chloride Inorganic materials 0.000 claims 1
- 239000004141 Sodium laurylsulphate Substances 0.000 claims 1
- 239000012670 alkaline solution Substances 0.000 claims 1
- 150000004683 dihydrates Chemical class 0.000 claims 1
- RJHLTVSLYWWTEF-UHFFFAOYSA-K gold trichloride Chemical compound Cl[Au](Cl)Cl RJHLTVSLYWWTEF-UHFFFAOYSA-K 0.000 claims 1
- 229940076131 gold trichloride Drugs 0.000 claims 1
- -1 polydithio-dipropyl Polymers 0.000 claims 1
- 229940093916 potassium phosphate Drugs 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 239000001509 sodium citrate Substances 0.000 claims 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 claims 1
- 238000009713 electroplating Methods 0.000 abstract description 23
- 238000007747 plating Methods 0.000 abstract description 15
- 230000007797 corrosion Effects 0.000 abstract description 10
- 238000005260 corrosion Methods 0.000 abstract description 10
- 239000000126 substance Substances 0.000 abstract description 3
- 239000003513 alkali Substances 0.000 abstract description 2
- 230000003472 neutralizing effect Effects 0.000 abstract description 2
- 230000003213 activating effect Effects 0.000 abstract 1
- 230000009286 beneficial effect Effects 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 13
- 239000000523 sample Substances 0.000 description 12
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 8
- 229910052737 gold Inorganic materials 0.000 description 8
- 239000010931 gold Substances 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 230000008859 change Effects 0.000 description 5
- 229910000365 copper sulfate Inorganic materials 0.000 description 5
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 4
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 4
- RHYBFKMFHLPQPH-UHFFFAOYSA-N N-methylhydantoin Chemical compound CN1CC(=O)NC1=O RHYBFKMFHLPQPH-UHFFFAOYSA-N 0.000 description 3
- 206010070834 Sensitisation Diseases 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008313 sensitization Effects 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- YIROYDNZEPTFOL-UHFFFAOYSA-N 5,5-Dimethylhydantoin Chemical compound CC1(C)NC(=O)NC1=O YIROYDNZEPTFOL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- FDWREHZXQUYJFJ-UHFFFAOYSA-M gold monochloride Chemical compound [Cl-].[Au+] FDWREHZXQUYJFJ-UHFFFAOYSA-M 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
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- Laminated Bodies (AREA)
Abstract
Description
技术领域technical field
本发明属于材料表面处理技术领域,特别是涉及一种结合力好、低电阻、耐腐蚀的碳纤维环氧树脂基复合材料表面导电层制备方法。The invention belongs to the technical field of material surface treatment, and in particular relates to a method for preparing a conductive layer on the surface of a carbon fiber epoxy resin-based composite material with good bonding force, low resistance and corrosion resistance.
背景技术Background technique
碳纤维环氧树脂基复合材料具有比强度和比模量高、抗疲劳性好、可设计性强等优点,在航空航天、风力发电等领域得到了广泛应用。然而,服役过程中雷击、冲击等载荷会对该材料造成损伤,降低其力学性能,威胁结构安全。另外,由于碳纤维环氧树脂基复合材料具有一定的导电性,当其受到损伤时电阻可能发生变化,因此可通过实时监测电阻变化对材料的损伤状态进行一定程度的评估。为了测量各监测点间的电阻变化,需要在复合材料表面制备与内部纤维连接的导电层。有些研究者采用表面涂覆导电胶方法,该方法存在导电层易磨损、厚度无法精确控制、电阻不稳定以及成本偏高等问题;有些研究者采用化学镀镍的方法,该方法的缺点是电阻偏大;还有一些研究者采用电镀铜或化学镀铜的方法,存在镀铜表面易氧化、电镀铜的镀层结合力较低、化学镀铜的效率低等问题。因此,若能发明一种能够同时满足低成本、低电阻、耐腐蚀、具有较高结合力的碳纤维环氧树脂基复合材料表面导电层制备方法具有重要意义。Carbon fiber epoxy resin-based composite materials have the advantages of high specific strength and specific modulus, good fatigue resistance, and strong designability, and have been widely used in aerospace, wind power and other fields. However, loads such as lightning strikes and impacts during service will cause damage to the material, reduce its mechanical properties, and threaten structural safety. In addition, since carbon fiber epoxy resin-based composites have certain conductivity, the resistance may change when they are damaged. Therefore, the damage state of the material can be evaluated to a certain extent by monitoring the resistance change in real time. In order to measure the resistance change between monitoring points, it is necessary to prepare a conductive layer on the surface of the composite material connected with the internal fibers. Some researchers use the method of surface coating conductive glue, which has the problems of easy wear of the conductive layer, inaccurate control of thickness, unstable resistance and high cost; some researchers use the method of electroless nickel plating, the disadvantage of which is that the resistance is biased. There are also some researchers who use copper electroplating or electroless copper plating, but there are problems such as easy oxidation of the copper plating surface, low adhesion of electroplating copper plating, and low efficiency of electroless copper plating. Therefore, it is of great significance to invent a method for preparing a conductive layer on the surface of a carbon fiber epoxy resin-based composite material that can simultaneously meet the requirements of low cost, low resistance, corrosion resistance, and high bonding force.
发明内容Contents of the invention
为了解决上述问题,本发明的目的在于提出一种结合力高、耐蚀性好、低电阻、低成本、工艺稳定性好、环保的碳纤维环氧树脂基复合材料表面导电层制备方法。In order to solve the above problems, the object of the present invention is to propose a method for preparing a conductive layer on the surface of a carbon fiber epoxy resin-based composite material with high bonding force, good corrosion resistance, low resistance, low cost, good process stability, and environmental protection.
为了达到上述目的,本发明提供的碳纤维环氧树脂复合材料的表面导电层制备方法包括按顺序进行的下列步骤:In order to achieve the above object, the preparation method of the surface conductive layer of the carbon fiber epoxy resin composite material provided by the invention comprises the following steps carried out in order:
1)首先将碳纤维环氧树脂基复合材料上需要制备导电层的部位依次用粗砂纸和细砂纸进行抛光,直到该部位表面的碳纤维露出为止;1) First, the parts on the carbon fiber epoxy resin-based composite material that need to be prepared with a conductive layer are polished with coarse sandpaper and fine sandpaper in sequence until the carbon fibers on the surface of the part are exposed;
2)用50~60℃且每升中含60g氢氧化钠、15g碳酸钠和30g磷酸钠的热碱溶液对上述抛光表面除油20~30分钟;2) Use a hot alkali solution at 50-60°C and containing 60g sodium hydroxide, 15g sodium carbonate and 30g sodium phosphate per liter to degrease the above-mentioned polished surface for 20-30 minutes;
3)用水清洗上述除油后的表面;3) Clean the above-mentioned degreased surface with water;
4)对清洗后欲制备导电层的部位先用70℃微蚀溶液处理5~8分钟,再用50℃中和溶液处理3~5分钟以去除包覆碳纤维的树脂,使碳纤维尽可能暴露在表面;4) Treat the part where the conductive layer is to be prepared after cleaning with a 70°C microetching solution for 5-8 minutes, and then treat it with a 50°C neutralizing solution for 3-5 minutes to remove the resin covering the carbon fiber, so that the carbon fiber is exposed to as much as possible surface;
5)用水清洗上述处理后的表面;5) Clean the surface after the above treatment with water;
6)在20~30℃的温度下用每升中含10g氯化亚锡和10ml盐酸的混合液对上述清洗后的表面进行敏化处理10~15分钟;6) Under the temperature of 20~30 ℃, carry out sensitization treatment to the surface after above-mentioned cleaning with the mixed solution of 10g stannous chloride and 10ml hydrochloric acid in every liter for 10~15 minutes;
7)用水清洗上述敏化处理后的表面;7) washing the surface after the above-mentioned sensitization treatment with water;
8)在20~30℃的温度下用每升中含0.5g氯化钯和10ml浓盐酸的混合液对上述清洗后的表面进行活化处理10~15分钟;8) at a temperature of 20 to 30°C, use a mixed solution containing 0.5g of palladium chloride and 10ml of concentrated hydrochloric acid per liter to carry out activation treatment on the surface after the above cleaning for 10 to 15 minutes;
9)用水清洗上述活化处理后的表面;9) washing the surface after the above-mentioned activation treatment with water;
10)在68~72℃的温度下用每升中含6~8g无水硫酸铜、28~32g次亚磷酸钠、80~85g二水柠檬酸钠、29~31g硼酸和4~6mg2,2'-联吡啶,pH值为9~10的混合液对上述清洗后的表面进行化学镀铜处理,直到达到预定的镀层厚度;10) At a temperature of 68-72°C, use 6-8g anhydrous copper sulfate, 28-32g sodium hypophosphite, 80-85g sodium citrate dihydrate, 29-31g boric acid and 4-6mg2,2 per liter. '-Bipyridyl, the mixed solution with a pH value of 9 to 10 performs electroless copper plating on the surface after cleaning, until the predetermined thickness of the coating is reached;
11)用水清洗上述化学镀铜处理后的表面;11) Clean the surface after the above-mentioned electroless copper plating with water;
12)在20~25℃的温度下用每升中含180~240g无水硫酸铜、25~50mL质量分数为98%的浓硫酸、80~100mg氯离子、0.5~1.0mg2-巯基苯并咪唑、0.3~0.8mg乙撑硫脲和10~20mg聚二硫二丙烷磺酸钠的混合液对上述水清洗后的表面进行电镀铜处理,电流密度为0.5~1.5A/dm2,镀层厚度为50~300μm;12) At a temperature of 20-25°C, use 180-240g of anhydrous copper sulfate per liter, 25-50mL of concentrated sulfuric acid with a mass fraction of 98%, 80-100mg of chloride ions, and 0.5-1.0mg of 2-mercaptobenzimidazole , 0.3 ~ 0.8mg ethylene thiourea and 10 ~ 20mg sodium polydithiodipropane sulfonate mixed solution on the surface after the above water cleaning, electroplating copper treatment, the current density is 0.5 ~ 1.5A/dm 2 , the coating thickness is 50~300μm;
13)用水清洗上述电镀铜处理后的表面;13) Cleaning the above-mentioned electroplated copper-treated surface with water;
14)在45~50℃的温度下用每升中含9~11g氯化金、78~82g磷酸钾、79~81g5,5-二甲基乙内酰脲、0.08~0.12g丁炔二醇、0.09~0.1g糖精钠和9~10mg十二烷基硫酸钠的混合液对上述电镀铜处理后的表面进行电镀金处理,电流密度为1.5~1.8A/dm2,镀层厚度为1~3μm,pH值为9~10;14) At a temperature of 45-50°C, use 9-11g of gold chloride, 78-82g of potassium phosphate, 79-81g of 5,5-dimethylhydantoin, and 0.08-0.12g of butynediol per liter. , 0.09~0.1g sodium saccharin and 9~10mg sodium lauryl sulfate mixed solution to electroplate gold on the surface after electroplating copper treatment, the current density is 1.5~1.8A/dm 2 , and the coating thickness is 1~3μm , the pH value is 9-10;
15)用水清洗上述电镀金处理后的表面,由此在碳纤维环氧树脂基复合材料表面获得低电阻的导电层。15) Washing the above-mentioned electroplated gold-plated surface with water, thereby obtaining a low-resistance conductive layer on the surface of the carbon fiber epoxy resin-based composite material.
所述的步骤4)中的微蚀溶液每升中含60g高锰酸钾和30g氢氧化钠,中和溶液每升中含28g草酸晶体和100毫升质量分数为98%的浓硫酸。The microetching solution in step 4) contains 60g potassium permanganate and 30g sodium hydroxide per liter, and the neutralization solution contains 28g oxalic acid crystals and 100 milliliters of concentrated sulfuric acid with a mass fraction of 98% per liter.
所述的步骤10)中镀层的厚度为1~2μm。The thickness of the coating in the step 10) is 1-2 μm.
本发明提供的碳纤维环氧树脂基复合材料的表面导电层制备方法是先利用机械和化学粗化手段使碳纤维环氧树脂基复合材料上欲制备导电层部位的表面碳纤维端部向外露出,然后采用活化、化学镀铜工艺来制备与碳纤维及树脂基体具有较高结合力的导电层,再采用电镀铜工艺增加导电层厚度,最后通过电镀金使镀层具有较好的耐腐蚀能力。本方法制备的导电层具有电阻低、结合力高、耐腐蚀、成本低、工艺稳定性好、效率较高等优点。The preparation method of the surface conductive layer of the carbon fiber epoxy resin-based composite material provided by the present invention is to first utilize mechanical and chemical roughening means to expose the carbon fiber end of the surface of the carbon fiber epoxy resin-based composite material to be prepared for the conductive layer, and then The activation and electroless copper plating process is used to prepare the conductive layer with high bonding force with the carbon fiber and resin matrix, and then the electroplating copper process is used to increase the thickness of the conductive layer, and finally the electroplating gold is used to make the plating layer have better corrosion resistance. The conductive layer prepared by the method has the advantages of low resistance, high binding force, corrosion resistance, low cost, good process stability, high efficiency and the like.
附图说明Description of drawings
图1为四探针法测量电阻值用试验装置结构示意图。Figure 1 is a schematic diagram of the structure of the test device for measuring the resistance value by the four-probe method.
其中:1:试验机上压头2:聚四氟乙烯板Among them: 1: Indenter on the testing machine 2: PTFE plate
3:铜电极4:碳纤维环氧树脂基复合材料3: copper electrode 4: carbon fiber epoxy resin matrix composite material
5:铜电极6:聚四氟乙烯板5: Copper electrode 6: PTFE plate
7:力传感器8:试验机下压头7: Force sensor 8: Lower pressure head of testing machine
9:试验机立柱9: Testing machine column
具体实施方式Detailed ways
下面结合附图和具体实施例对本发明提供的碳纤维环氧树脂基复合材料的表面导电层制备方法进行详细说明。The method for preparing the surface conductive layer of the carbon fiber epoxy resin-based composite material provided by the present invention will be described in detail below in conjunction with the accompanying drawings and specific examples.
实施例1Example 1
选用T300/914碳纤维环氧树脂复合材料层压板作为试件,铺层方式[(0/90)4]s,试样尺寸为200mm×10mm×2mm。将上述T300/914碳纤维环氧树脂复合材料的表面依次用粒度为200、400、600的砂纸抛光,然后用水清洗表面后作为对比样备用。The T300/914 carbon fiber epoxy resin composite laminate is selected as the specimen, and the layering method is [(0/90) 4 ] s , and the specimen size is 200mm×10mm×2mm. The surface of the above-mentioned T300/914 carbon fiber epoxy resin composite material was polished successively with sandpaper with a particle size of 200, 400, and 600, and then the surface was washed with water and used as a comparison sample for later use.
实施例2Example 2
将上述T300/914碳纤维环氧树脂复合材料的表面依次用粒度为200、400、600的砂纸抛光;然后用50℃且每升中含60g氢氧化钠、15g碳酸钠和30g磷酸钠的热碱溶液除油30分钟;之后用水清洗表面;将上述清洗后欲制备导电层部位的表面先用70℃每升中含60g高锰酸钾和30g氢氧化钠的微蚀溶液处理5分钟,再用50℃每升中含28g草酸晶体和100毫升质量分数为98%的浓硫酸的中和溶液处理5分钟;用水清洗表面;在25℃的温度下用每升中含10g氯化亚锡和10ml盐酸的混合液对上述清洗后的表面进行敏化处理10分钟;用水清洗表面;在25℃的温度下用每升中含0.5g氯化钯和10ml浓盐酸的混合液对上述清洗后欲制备导电层部位的表面进行活化处理10分钟;用水清洗表面;在70℃的温度下用每升中含8g无水硫酸铜、28g次亚磷酸钠、80g二水柠檬酸钠、29g硼酸和5mg2,2'-联吡啶,pH值为9的混合液对上述欲制备导电层部位的表面进行60分钟化学镀铜处理;用水清洗表面;在20℃的温度下用每升中含220g无水硫酸铜、30mL质量分数为98%的浓硫酸、80mg氯离子、0.5mg2-巯基苯并咪唑、0.3mg乙撑硫脲和10mg聚二硫二丙烷磺酸钠的混合液对上述清洗后欲制备导电层的表面进行电镀铜处理,电流密度为1.0A/dm2,电镀时间2小时;用水清洗表面;在45℃的温度下用每升中含10g氯化金、80g磷酸钾、80g5,5-二甲基乙内酰脲、0.1g丁炔二醇、0.1g糖精钠和10mg十二烷基硫酸钠,pH值为9的混合液对上述电镀铜处理后的表面进行电镀金处理,电流密度为1.5A/dm2,电镀时间3分钟;用水溶液清洗上述电镀金后的表面,由此在碳纤维环氧树脂基复合材料表面获得导电层。Polish the surface of the above-mentioned T300/914 carbon fiber epoxy resin composite material with sandpaper with a particle size of 200, 400, and 600; The solution was degreased for 30 minutes; then the surface was cleaned with water; the surface of the conductive layer to be prepared after the above cleaning was first treated with a microetching solution containing 60g potassium permanganate and 30g sodium hydroxide per liter at 70°C for 5 minutes, and then used 50 DEG C containing 28g of oxalic acid crystals per liter and 100 milliliters of concentrated sulfuric acid with a mass fraction of 98% for 5 minutes; wash the surface with water; The mixed solution of hydrochloric acid was used to sensitize the cleaned surface for 10 minutes; the surface was washed with water; The surface of the conductive layer was activated for 10 minutes; the surface was cleaned with water; at a temperature of 70°C, 8g of anhydrous copper sulfate, 28g of sodium hypophosphite, 80g of sodium citrate dihydrate, 29g of boric acid and 5mg2 were used per liter. 2'-Bipyridyl, the mixed solution with a pH value of 9 is used to perform electroless copper plating treatment on the surface of the above-mentioned part where the conductive layer is to be prepared for 60 minutes; wash the surface with water; , 30mL mass fraction is the mixed solution of the concentrated sulfuric acid of 98%, 80mg chloride ion, 0.5mg2-mercaptobenzimidazole, 0.3mg ethylene thiourea and 10mg sodium polydithiodipropane sulfonate to prepare conductive layer after above-mentioned cleaning Electroplated copper on the surface, the current density is 1.0A/dm 2 , and the electroplating time is 2 hours; the surface is cleaned with water; Methylhydantoin, 0.1g butynediol, 0.1g sodium saccharin and 10mg sodium lauryl sulfate, the mixed solution of pH value is 9 carries out electroplating gold treatment to the surface after above-mentioned electroplating copper treatment, and current density is 1.5A/dm 2 , electroplating time is 3 minutes; the above-mentioned electroplated surface is washed with an aqueous solution, thereby obtaining a conductive layer on the surface of the carbon fiber epoxy resin-based composite material.
实施例3Example 3
将上述T300/914碳纤维环氧树脂复合材料的表面依次用粒度为200、400、600的砂纸抛光;然后用55℃且每升中含60g氢氧化钠、15g碳酸钠和30g磷酸钠的热碱溶液除油20分钟;之后用水清洗表面;将上述清洗后欲制备导电层部位的表面先用70℃每升中含60g高锰酸钾和30g氢氧化钠的微蚀溶液处理6分钟,再用50℃每升中含28g草酸晶体和100毫升质量分数为98%的浓硫酸的中和溶液处理5分钟;用水清洗表面;在28℃的温度下用每升中含10g氯化亚锡和10ml盐酸的混合液对上述清洗后的表面进行敏化处理10分钟;用水清洗表面;在25℃的温度下用每升中含0.5g氯化钯和10ml浓盐酸的混合液对上述清洗后欲制备导电层部位的表面进行活化处理15分钟;用水清洗表面;在71℃的温度下用每升中含8g无水硫酸铜、30g次亚磷酸钠、85g二水柠檬酸钠、30g硼酸和5mg2,2'-联吡啶,pH值为9的混合液对上述欲制备导电层部位的表面进行90分钟化学镀铜处理;用水清洗表面;在23℃的温度下用每升中含220g无水硫酸铜、40mL质量分数为98%的浓硫酸、80mg氯离子、0.5mg2-巯基苯并咪唑、0.3mg乙撑硫脲和10mg聚二硫二丙烷磺酸钠的混合液对上述清洗后欲制备导电层的表面进行电镀铜处理,电流密度为1.0A/dm2,电镀时间1.5小时;用水清洗表面;在50℃的温度下用每升中含10g氯化金、80g磷酸钾、80g5,5-二甲基乙内酰脲、0.1g丁炔二醇、0.1g糖精钠和10mg十二烷基硫酸钠,pH值为9.5的混合液对上述电镀铜处理后的表面进行电镀金处理,电流密度为1.6A/dm2,电镀时间2分钟;用水溶液清洗上述电镀金后的表面,由此在碳纤维环氧树脂基复合材料表面获得导电层。Polish the surface of the above-mentioned T300/914 carbon fiber epoxy resin composite material with sandpaper with a particle size of 200, 400, and 600; The solution was degreased for 20 minutes; then the surface was cleaned with water; the surface of the conductive layer to be prepared after the above cleaning was first treated with a microetching solution containing 60g potassium permanganate and 30g sodium hydroxide per liter at 70°C for 6 minutes, and then used 50 DEG C containing 28g of oxalic acid crystals per liter and 100 milliliters of concentrated sulfuric acid with a mass fraction of 98% for 5 minutes; wash the surface with water; The mixed solution of hydrochloric acid was used to sensitize the cleaned surface for 10 minutes; the surface was washed with water; The surface of the conductive layer was activated for 15 minutes; the surface was cleaned with water; at a temperature of 71°C, 8g of anhydrous copper sulfate, 30g of sodium hypophosphite, 85g of sodium citrate dihydrate, 30g of boric acid and 5mg2 were used per liter. 2'-Bipyridyl, the mixed solution with a pH value of 9 is used to perform electroless copper plating on the surface of the above-mentioned conductive layer to be prepared for 90 minutes; wash the surface with water; , 40mL mass fraction is the mixed solution of the concentrated sulfuric acid of 98%, 80mg chloride ion, 0.5mg2-mercaptobenzimidazole, 0.3mg ethylene thiourea and 10mg sodium polydithiodipropane sulfonate to prepare conductive layer after above-mentioned cleaning Electroplating copper treatment on the surface, the current density is 1.0A/dm 2 , and the electroplating time is 1.5 hours; the surface is washed with water; Methylhydantoin, 0.1g butynediol, 0.1g sodium saccharin and 10mg sodium lauryl sulfate, the mixed solution of pH value is 9.5 carries out electroplating gold treatment to the surface after above-mentioned electroplating copper treatment, and current density is 1.6A/dm 2 , electroplating time is 2 minutes; the above-mentioned surface after electroplating gold is washed with an aqueous solution, thereby obtaining a conductive layer on the surface of the carbon fiber epoxy resin-based composite material.
实施例4Example 4
将上述T300/914碳纤维环氧树脂复合材料的表面依次用粒度为200、400、600的砂纸抛光;然后用60℃的每升中含60g氢氧化钠、15g碳酸钠和30g磷酸钠的热碱溶液除油25分钟;之后用水清洗表面;将上述清洗后欲制备导电层部位的表面先用70℃每升中含60g高锰酸钾和30g氢氧化钠的微蚀溶液处理8分钟,再用50℃每升中含28g草酸晶体和100毫升质量分数为98%的浓硫酸的中和溶液处理5分钟;用水清洗表面;在30℃的温度下用每升中含10g氯化亚锡和10ml盐酸的混合液对上述清洗后的表面进行敏化处理12分钟;用水清洗表面;在28℃的温度下用每升中含0.5g氯化钯和10ml浓盐酸的混合液对上述清洗后欲制备导电层部位的表面进行活化处理15分钟;用水清洗表面;在72℃的温度下用每升中含7g无水硫酸铜、32g次亚磷酸钠、80g二水柠檬酸钠、30g硼酸和5mg2,2'-联吡啶,pH值为9的混合液对上述欲制备导电层部位的表面进行120分钟化学镀铜处理;用水清洗表面;在25℃的温度下用每升中含240g无水硫酸铜、40mL质量分数为98%的浓硫酸、90mg氯离子、0.5mg2-巯基苯并咪唑、0.5mg乙撑硫脲和12mg聚二硫二丙烷磺酸钠的混合液对上述清洗后欲制备导电层的表面进行电镀铜处理,电流密度为1.0A/dm2,电镀时间2小时;用水清洗表面;在50℃的温度下用每升中含10g氯化金、80g磷酸钾、80g5,5-二甲基乙内酰脲、0.1g丁炔二醇、0.1g糖精钠和10mg十二烷基硫酸钠,pH值为10的混合液对上述电镀铜处理后的表面进行电镀金处理,电流密度为1.8A/dm2,电镀时间2分钟;用水溶液清洗上述电镀金后的表面,由此在碳纤维环氧树脂基复合材料表面获得导电层。Polish the surface of the above-mentioned T300/914 carbon fiber epoxy resin composite material with sandpaper with a particle size of 200, 400, and 600; The solution was degreased for 25 minutes; then the surface was cleaned with water; the surface of the conductive layer to be prepared after the above cleaning was first treated with a microetching solution containing 60g potassium permanganate and 30g sodium hydroxide per liter at 70°C for 8 minutes, and then used 50 DEG C containing 28g of oxalic acid crystals per liter and 100 milliliters of concentrated sulfuric acid with a mass fraction of 98% for 5 minutes; wash the surface with water; A mixture of hydrochloric acid was used to sensitize the surface after cleaning for 12 minutes; the surface was washed with water; The surface of the conductive layer was activated for 15 minutes; the surface was cleaned with water; at a temperature of 72°C, 7g of anhydrous copper sulfate, 32g of sodium hypophosphite, 80g of sodium citrate dihydrate, 30g of boric acid and 5mg2 were used per liter. 2'-Bipyridine, the mixed solution with a pH value of 9 is used for 120 minutes to perform electroless copper plating treatment on the surface of the part where the conductive layer is to be prepared; the surface is cleaned with water; , 40mL mass fraction is the mixed solution of the concentrated sulfuric acid of 98%, 90mg chloride ion, 0.5mg2-mercaptobenzimidazole, 0.5mg ethylene thiourea and 12mg sodium polydithiodipropane sulfonate to prepare conductive layer after above-mentioned cleaning Electroplated copper on the surface, the current density is 1.0A/dm 2 , and the electroplating time is 2 hours; the surface is cleaned with water; Methylhydantoin, 0.1g butynediol, 0.1g sodium saccharin and 10mg sodium lauryl sulfate, the mixed solution of pH value is 10 carries out electroplating gold treatment to the surface after above-mentioned electroplating copper treatment, and current density is 1.8A/dm 2 , electroplating time is 2 minutes; the above-mentioned surface after electroplating gold is washed with an aqueous solution, thereby obtaining a conductive layer on the surface of the carbon fiber epoxy resin-based composite material.
为了验证本发明提供的碳纤维环氧树脂基复合材料表面导电层制备方法的效果,本发明人进行了如下实验:In order to verify the effect of the carbon fiber epoxy resin-based composite material surface conductive layer preparation method provided by the invention, the inventor has carried out the following experiments:
1)对上述由实施例2-4制备的试件进行热震试验,以此来验证镀层的结合力。将试件放入温度为150℃的电热恒温箱内,保温1小时后迅速放入10℃水槽中瞬间冷却,10分钟后取出吹干,重复上述过程50次。结果表明,经50次热震试验后镀层均无裂纹、脱落等现象产生,表明镀层具有较高的结合力。1) Carry out a thermal shock test on the above-mentioned test pieces prepared by Examples 2-4, so as to verify the binding force of the coating. Put the test piece in an electric thermostat with a temperature of 150°C, keep it warm for 1 hour, then quickly put it into a water tank at 10°C for instant cooling, take it out after 10 minutes and blow it dry, and repeat the above process 50 times. The results show that after 50 thermal shock tests, the coating has no cracks or peeling off, indicating that the coating has a high bonding force.
2)为了验证上述制备的导电层的耐腐蚀性能,进行了硝酸酸雾试验。把质量百分比浓度为70%的硝酸500ml倒入体积为9L的干燥器中静置30分钟后,将制备好的具有导电层的试件放入25℃干燥器中静置75分钟,然后把试件迅速放入125℃高温箱中15分钟,取出冷却至室温,1小时内在光学显微镜下观察不到鼓包、腐蚀黑点等发生,说明制备的导电层具有良好的耐腐蚀能力。2) In order to verify the corrosion resistance of the conductive layer prepared above, a nitric acid mist test was carried out. Pour 500ml of nitric acid with a mass percentage concentration of 70% into a desiccator with a volume of 9L and let it stand for 30 minutes. Put the prepared test piece with a conductive layer in a 25°C desiccator and let it stand for 75 minutes. The parts were quickly placed in a 125°C high-temperature box for 15 minutes, taken out and cooled to room temperature, and no bulges or corrosion black spots were observed under an optical microscope within 1 hour, indicating that the prepared conductive layer has good corrosion resistance.
3)对上述实施例1制成的对比件及实施例2-4制成的试件利用图1所示的装置测量电阻值。3) Use the device shown in FIG. 1 to measure the resistance value of the comparison piece made in the above-mentioned embodiment 1 and the test pieces made in the examples 2-4.
如图1所示,测量电阻Rm主要包括导线电阻RL、试样电阻RS、铜电极电阻Re以及碳纤维环氧树脂基复合材料与金属铜电极间的接触电阻Rc,若将导线电阻RL忽略不计,则:As shown in Figure 1, the measured resistance R m mainly includes the wire resistance R L , the sample resistance R S , the copper electrode resistance Re and the contact resistance R c between the carbon fiber epoxy resin matrix composite material and the metal copper electrode. Resistor RL is negligible, then:
Rm=RS+Re+Rc(1)R m =R S +R e +R c (1)
试样电阻可表示为:The sample resistance can be expressed as:
其中ρf为纤维的电阻率,Lx为试样长度,Vf为纤维体积分数,Ly为试样宽度,e0为00铺层总厚度。实施例中选用的ToraycaT300碳纤维的电阻率约为1.7×10-2Ω·mm,纤维方向上试样的长度为200mm,纤维体积分数约为0.6,试样宽度为20mm,0°铺层总厚度约为1.0mm,由式(2)得试样电阻RS约为0.28Ω。通过上述试验装置施加的接触压力为10N,外加电流1A,通电时间5分钟。随着电流作用时间的增加,试样温度升高,此时试样电阻会发生变化,由于通电时间较短,电阻值变化可忽略。铜的电阻率约为1.7×10-5Ω·mm,故铜电极电阻Re也可忽略不计。因此,测量的电阻Rm主要由试件电阻RS及接触电阻Rc构成。Where ρ f is the resistivity of the fiber, L x is the length of the sample, V f is the fiber volume fraction, Ly is the width of the sample, and e 0 is the total thickness of the 0 0 ply. The resistivity of the ToraycaT300 carbon fiber selected in the examples is about 1.7×10 -2 Ω·mm, the length of the sample in the fiber direction is 200 mm, the fiber volume fraction is about 0.6, the sample width is 20 mm, and the total thickness of the 0° layup It is about 1.0mm, and the sample resistance R S is about 0.28Ω from the formula (2). The contact pressure applied by the above test device is 10N, the applied current is 1A, and the electrification time is 5 minutes. As the current action time increases, the temperature of the sample rises, and the resistance of the sample will change at this time. Due to the short energization time, the change in resistance value can be ignored. The resistivity of copper is about 1.7×10 -5 Ω·mm, so the resistance R e of the copper electrode can also be ignored. Therefore, the measured resistance R m is mainly composed of the specimen resistance R S and the contact resistance R c .
经测试,实施例1中对比试件测量电阻Rm为30.68Ω,实施例2-4中表面制备导电层后测量电阻Rm均为0.40Ω。这是由于实施例1中与铜电极接触部位的纤维未充分露出,参与导电的纤维接触面积小,从而测量电阻值大;而实施例2-4中制备过程中经过化学粗化(微蚀、中和)处理后使碳纤维环氧树脂基复合材料表面包覆碳纤维的环氧树脂被去除,碳纤维充分暴露并通过敏化、活化、化学镀铜等工艺与铜紧密结合,最终在表面形成一层致密的导电层,导电层光滑平整且铜、金的电阻率很低,因此测量的电阻Rm较低且由于导电层厚度不同造成的电阻差别可忽略。After testing, the measured resistance R m of the comparative sample in Example 1 was 30.68Ω, and the measured resistance R m after the conductive layer was prepared on the surface in Examples 2-4 was all 0.40Ω. This is due to the fact that the fiber at the contact position with the copper electrode in Example 1 is not fully exposed, and the fiber contact area participating in the conduction is small, so that the measured resistance value is large; and in the preparation process of Examples 2-4, chemical roughening (micro-etching, After the neutralization) treatment, the epoxy resin covering the carbon fiber on the surface of the carbon fiber epoxy resin matrix composite material is removed, the carbon fiber is fully exposed and closely combined with copper through sensitization, activation, electroless copper plating and other processes, and finally forms a layer on the surface The dense conductive layer, the conductive layer is smooth and flat, and the resistivity of copper and gold is very low, so the measured resistance R m is low and the difference in resistance due to the different thickness of the conductive layer is negligible.
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