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CN105023867A - Transportation device and cutting device of plate-like object - Google Patents

Transportation device and cutting device of plate-like object Download PDF

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Publication number
CN105023867A
CN105023867A CN201510172448.6A CN201510172448A CN105023867A CN 105023867 A CN105023867 A CN 105023867A CN 201510172448 A CN201510172448 A CN 201510172448A CN 105023867 A CN105023867 A CN 105023867A
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China
Prior art keywords
plate
unit
shaped object
contact
warpage
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CN201510172448.6A
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Chinese (zh)
Inventor
茶野伦太郎
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Disco Corp
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Disco Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/005Feeding or manipulating devices specially adapted to grinding machines
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manipulator (AREA)
  • Dicing (AREA)

Abstract

本发明提供板状物的搬运装置和切削装置。搬运装置(1-1)具有保持板状物的保持单元(10)、和使保持单元(10)从规定的位置起移动至卡盘台的移动单元(20),保持单元(10)具有:连结于移动单元(20)的支撑基座部(11);非接触式吸附保持器(12),其配设于支撑基座部(11)的下表面(11b),喷出空气,生成负压,并以非接触的方式吸附保持板状物的上表面;限制单元(13),其在支撑基座部(11)的下表面(11b)配设于板状物的外周区域,限制保持于非接触式吸附保持器(12)上的板状物的水平移动;以及翘曲量检测单元(14),其检测所搬运的板状物的翘曲量,在板状物的翘曲量为规定的量以下的情况下,通过非接触式吸附保持器(12)吸附并搬运。

The invention provides a conveying device and a cutting device for a plate-shaped object. The handling device (1-1) has a holding unit (10) for holding a plate-shaped object, and a moving unit (20) for moving the holding unit (10) from a predetermined position to the chuck table, and the holding unit (10) has: Connected to the support base part (11) of the mobile unit (20); the non-contact adsorption holder (12), which is arranged on the lower surface (11b) of the support base part (11), ejects air to generate a negative press, and absorb and hold the upper surface of the plate in a non-contact manner; the limiting unit (13), which is arranged on the outer peripheral area of the plate on the lower surface (11b) of the support base part (11), limits and holds The horizontal movement of the plate on the non-contact adsorption holder (12); and the warpage detection unit (14), which detects the warpage of the transported plate, and the warpage of the plate If it is less than a predetermined amount, it is sucked and conveyed by a non-contact suction holder (12).

Description

板状物的搬运装置和切削装置Plate handling device and cutting device

技术领域technical field

本发明涉及板状物的搬运装置以及切削装置。The present invention relates to a conveying device and a cutting device for a plate-shaped object.

背景技术Background technique

为了获得抗折强度较高的芯片,需要通过被称作先切割(所谓的DBG(DicingBefore Grinding:先划片后减薄))的加工方法加工半导体晶片。在先切割时,从形成有板状的晶片(板状物)的器件的上表面(器件面)侧起实施半切断,然后磨削下表面(器件面的相反侧表面)侧并将其分离为芯片。用于半切断的切削装置(切片机)通过非接触式吸附保持器(所谓的伯努利吸盘)保持板状物的器件面,在不损伤器件的情况下吸附上表面(器件面)并搬运板状物(例如,参照专利文献1)。In order to obtain chips with high flexural strength, it is necessary to process semiconductor wafers by a processing method called dicing before (so-called DBG (Dicing Before Grinding: Dicing Before Grinding)). In the first dicing, half-cut is performed from the upper surface (device surface) side of the device on which the plate-shaped wafer (plate-shaped object) is formed, and then the lower surface (opposite side surface of the device surface) is ground and separated. for the chip. A cutting device (slicer) for half-cutting holds the device surface of a plate-shaped object with a non-contact suction holder (so-called Bernoulli suction cup), and transports the upper surface (device surface) by suction without damaging the device plate-shaped object (for example, refer to Patent Document 1).

专利文献1日本特开2004-119784号公报Patent Document 1 Japanese Patent Application Laid-Open No. 2004-119784

然而,例如在被称作WL-CSP(Wafer Level Chip Size Package:晶圆级晶片尺寸封装)的在板状物的上表面涂布有树脂的器件中,板状物可能会翘曲,或者相比上表面未涂布树脂的板状物而言重量增加,因而难以实现非接触式吸附保持器的稳定吸附。于是,在搬运发生了翘曲或重量较大的板状物时,使用接触板状物的上表面以进行吸附保持的接触式吸附保持器(所谓的真空吸盘)(由于在板状物的上表面涂布有树脂,因而即使真空吸盘接触也不会损坏器件)。因此,在使用切削装置加工上表面未涂布树脂的板状物、以及上表面涂布有树脂的板状物这两种板状物的情况下,需要设置各自对应的非接触式吸附保持器和接触式吸附保持器,按照不同加工对象的板状物而切换(即更换)各吸盘(即更换)需要较长时间,因而效率较差。此外,在使用非接触式吸附保持器对翘曲量在规定量以上的板状物(难以实现非接触式吸附保持器的稳定吸附的板状物)尝试搬运时,需要耗费时间而效率较差。However, for example, in the device called WL-CSP (Wafer Level Chip Size Package: Wafer Level Chip Size Package), the upper surface of the plate is coated with resin, the plate may be warped, or the corresponding The weight increases compared with a plate-like object that is not coated with resin on the upper surface, so it is difficult to achieve stable adsorption of the non-contact adsorption holder. Therefore, when transporting a warped or heavy plate-shaped object, a contact-type suction holder (so-called vacuum chuck) that contacts the upper surface of the plate-shaped object for suction and holding (since the upper surface of the plate-shaped object The surface is coated with resin so that the device will not be damaged even if the vacuum chuck touches it). Therefore, when using a cutting device to process two types of plate-shaped objects, the upper surface of which is not coated with resin and the upper surface of the plate-shaped object coated with resin, it is necessary to install a corresponding non-contact suction holder. Compared with the contact type adsorption holder, it takes a long time to switch (namely replace) each suction cup according to the plates of different processing objects (namely, replace) and thus is less efficient. In addition, when trying to transport a plate-shaped object with a warpage of more than a specified amount (a plate-shaped object that is difficult to achieve stable adsorption by a non-contact adsorption holder) using a non-contact suction holder, it takes time and is inefficient. .

发明内容Contents of the invention

本发明就是鉴于上述情况而完成的,其目的在于提供一种能够高效搬运板状物的板状物的搬运装置以及切削装置。The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a conveying device and a cutting device for a plate-shaped object that can efficiently convey the plate-shaped object.

为了解决上述课题,达成目的,本发明提供一种板状物的搬运装置,其具有保持板状物的保持单元、以及使保持单元从规定的位置起移动至卡盘台的移动单元,其特征在于,保持单元具有:支撑基座部,其与移动单元连结;非接触式吸附保持器,其配设于支撑基座部的下表面,喷出空气,从而生成负压,且以非接触的方式对板状物的上表面进行吸附保持;限制单元,其在支撑基座部的下表面配设于板状物的外周区域,对保持于非接触式吸附保持器上的板状物的水平移动进行限制;以及翘曲量检测单元,其检测所搬运的板状物的翘曲量,在板状物的翘曲量为规定的量以下的情况下,通过非接触式吸附保持器吸附并搬运。In order to solve the above-mentioned problems and achieve the purpose, the present invention provides a conveying device for a plate-shaped object, which has a holding unit for holding a plate-shaped object, and a moving unit for moving the holding unit from a predetermined position to a chuck table. That is, the holding unit has: a supporting base part, which is connected with the moving unit; a non-contact adsorption holder, which is arranged on the lower surface of the supporting base part, ejects air to generate negative pressure, and is non-contact. The upper surface of the plate is adsorbed and held by the method; the limiting unit is arranged on the outer peripheral area of the plate on the lower surface of the support base, and the level of the plate held on the non-contact adsorption holder The movement is restricted; and the warpage amount detection unit detects the warpage amount of the conveyed plate-shaped object, and when the warpage amount of the plate-shaped object is less than a predetermined amount, it is sucked by a non-contact adsorption holder and transport.

此外,上述搬运装置优选构成为,保持单元还具有:接触式吸附保持器,其配设于支撑基座部的下表面,且接触板状物的上表面而进行吸附保持;以及选择单元,其将接触式吸附保持器和非接触式吸附保持器中的一个定位于接近板状物的作用位置处,并将另一个定位于离开了板状物的非作用位置处。In addition, the above-mentioned transport device is preferably configured such that the holding unit further includes: a contact-type adsorption holder disposed on the lower surface of the support base portion, and contacts the upper surface of the plate-shaped object for adsorption and holding; and a selection unit that One of the contact suction holder and the non-contact suction holder is positioned at the active position close to the plate, and the other is positioned at the non-active position away from the plate.

此外,本发明还提供一种切削装置,其具有保持板状物的卡盘台、以及通过切削刀对保持于卡盘台上的板状物进行切削的切削单元,其特征在于,该切削装置还具有:盒载置台,其载置收容多个板状物的盒;清洗单元,其通过清洗台保持并清洗被切削后的板状物;保持手,其将板状物对于载置于盒载置台上的盒进行搬入搬出;以及搬运单元,其在保持手、卡盘台和清洗台之间搬运板状物,搬运单元是上述板状物的搬运装置。In addition, the present invention also provides a cutting device, which has a chuck table for holding a plate-shaped object, and a cutting unit for cutting the plate-shaped object held on the chuck table with a cutting blade, and is characterized in that the cutting device It also has: a box loading table, which places a box for accommodating a plurality of plate-shaped objects; a cleaning unit, which holds and cleans the cut plate-shaped objects through the cleaning table; The cassettes on the mounting table are carried in and out; and the conveying unit conveys the plate-shaped object between the holding hand, the chuck table, and the cleaning table, and the conveying unit is a conveying device for the above-mentioned plate-shaped object.

根据本发明,在由翘曲量检测单元检测的板状物的翘曲量为规定的量以下的情况下,通过非接触式吸附保持器吸附并搬运板状物,因此不必使用非接触式吸附保持器对翘曲量超过规定量的板状物尝试搬运即可工作。因此,根据本发明,可获得能够高效搬运板状物的效果。According to the present invention, when the warpage amount of the plate-shaped object detected by the warpage amount detection unit is less than a predetermined amount, the plate-shaped object is sucked and conveyed by the non-contact suction holder, so it is not necessary to use the non-contact suction The retainer can work by trying to carry a plate-shaped object whose warpage exceeds the specified amount. Therefore, according to this invention, the effect that a plate-shaped object can be conveyed efficiently is acquired.

附图说明Description of drawings

图1是表示第1实施方式的搬运装置的结构例的图。FIG. 1 is a diagram showing a configuration example of a transport device according to a first embodiment.

图2是表示通过第1实施方式的搬运装置的翘曲量检测单元检测板状物的翘曲量的状态的剖面图。2 is a cross-sectional view showing a state in which a warpage amount of a plate-shaped object is detected by a warpage amount detection unit of the conveyance device according to the first embodiment.

图3是表示通过第1实施方式的搬运装置的非接触式吸附保持器吸附保持板状物的状态的剖面图。3 is a cross-sectional view showing a state in which a plate-shaped object is sucked and held by the non-contact suction holder of the conveyance device according to the first embodiment.

图4是表示第1实施方式的搬运装置的动作的一例的流程图。FIG. 4 is a flowchart showing an example of the operation of the transport device according to the first embodiment.

图5是表示第2实施方式的搬运装置的结构例的图。Fig. 5 is a diagram showing a configuration example of a transport device according to a second embodiment.

图6是表示通过第2实施方式的搬运装置的翘曲量检测单元检测板状物的翘曲量的状态的剖面图。6 is a cross-sectional view showing a state in which a warpage amount of a plate-shaped object is detected by a warpage amount detection unit of a conveyance device according to a second embodiment.

图7是表示通过第2实施方式的搬运装置的接触式吸附保持器吸附保持板状物的状态的剖面图。7 is a cross-sectional view showing a state in which a plate-shaped object is sucked and held by a contact suction holder of a conveyance device according to a second embodiment.

图8是表示第2实施方式的搬运装置的动作的一例的流程图。FIG. 8 is a flowchart showing an example of the operation of the transport device according to the second embodiment.

图9是表示第3实施方式的切削装置的结构例的图。FIG. 9 is a diagram showing a configuration example of a cutting device according to a third embodiment.

标号说明Label description

1-1、1-2:搬运装置(板状物的搬运装置);10:保持单元;11:支撑基座部;11b:下表面;12:非接触式吸附保持器;13:限制单元;14:翘曲量检测单元;15:接触式吸附保持器;16:选择单元;20:移动单元;100:切削装置;110:盒载置台;111:盒;120:卡盘台;130:切削单元;131:切削刀;140:清洗单元;141:清洗台;150:保持手;160、170:搬运单元;W:板状物;Wa:上表面。1-1, 1-2: transfer device (transfer device for plate-like object); 10: holding unit; 11: support base; 11b: lower surface; 12: non-contact adsorption holder; 13: restricting unit; 14: warping detection unit; 15: contact adsorption holder; 16: selection unit; 20: moving unit; 100: cutting device; 110: box loading table; 111: box; 120: chuck table; 130: cutting Unit; 131: cutting blade; 140: cleaning unit; 141: cleaning table; 150: holding hand; 160, 170: carrying unit; W: plate; Wa: upper surface.

具体实施方式Detailed ways

下面参照附图详细说明用于实施本发明的方式(实施方式)。本发明并不限于在以下实施方式中叙述的内容。此外,以下所述的结构要素包括本领域普通技术人员能够容易想到的内容和实质相同的内容。进而,能够适当组合以下所述的结构。此外,可以在不脱离本发明主旨的范围内进行结构的各种省略、置换或变更。Hereinafter, modes (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited to the contents described in the following embodiments. In addition, the structural elements described below include those that can be easily conceived by those skilled in the art and those that are substantially the same. Furthermore, the configurations described below can be appropriately combined. In addition, various omissions, substitutions, or changes in the structure can be made without departing from the gist of the present invention.

〔第1实施方式〕[First Embodiment]

图1是表示第1实施方式的搬运装置的结构例的图。图2是表示通过第1实施方式的搬运装置的翘曲量检测单元检测板状物的翘曲量的状态的剖面图。图3是表示通过第1实施方式的搬运装置的非接触式吸附保持器吸附保持板状物的状态的剖面图。FIG. 1 is a diagram showing a configuration example of a transport device according to a first embodiment. 2 is a cross-sectional view showing a state in which a warpage amount of a plate-shaped object is detected by a warpage amount detection unit of the conveyance device according to the first embodiment. 3 is a cross-sectional view showing a state in which a plate-shaped object is sucked and held by the non-contact suction holder of the conveyance device according to the first embodiment.

图1所示的板状物的搬运装置1-1(以下简称为“搬运装置1-1”)用于以非接触的方式吸附保持板状物W,搬运板状物W。搬运装置1-1如图1所示,构成为具有保持单元10、移动单元20和控制单元30。A conveying device 1 - 1 for a plate-shaped object shown in FIG. 1 (hereinafter simply referred to as "conveying device 1 - 1 ") is used to absorb and hold a plate-shaped object W in a non-contact manner, and to convey the plate-shaped object W. The conveyance device 1 - 1 is configured to include a holding unit 10 , a moving unit 20 , and a control unit 30 as shown in FIG. 1 .

这里,如图3所示,板状物W是以与后述的非接触式吸附保持器12非接触的方式,被非接触式吸附保持器12吸附保持的搬运对象物。关于板状物W不做特别限定,例如可举出构成半导体元件的端子和配线等形成于上表面Wa,密封这些端子和配线等的密封树脂涂布于上表面Wa的所谓的WL-CSP(Wafer Level Chip Size Package:晶圆级晶片尺寸封装)、半导体器件和光器件形成于上表面Wa的半导体晶片和光器件晶片、无机材料基板、延性树脂材料基板、液晶显示器器件等的各种电子部件等各种加工材料。此外,板状物W形成为能够通过搬运装置1-1搬运的板状,在本实施方式中,形成为圆形状的平坦的平板状、即圆板状。另外,通常WL-CSP凭借涂布于上表面Wa的密封树脂,而随着从中心起而向外周逐渐朝铅直方向的上方翘起并弯曲。亦即,WL-CSP的中央向铅直方向的下方呈凸状弯曲,且翘曲量随着从中心起向外周逐渐变大。Here, as shown in FIG. 3 , the plate-shaped object W is an object to be transported that is suction-held by the non-contact suction holder 12 described later without being in contact with the non-contact suction holder 12 . The plate-shaped object W is not particularly limited, and for example, a so-called WL-WL in which terminals and wirings constituting a semiconductor element are formed on the upper surface Wa, and a sealing resin for sealing these terminals and wirings is applied to the upper surface Wa. Various electronic components such as CSP (Wafer Level Chip Size Package), semiconductor devices and optical devices formed on the upper surface Wa of semiconductor wafers and optical device wafers, inorganic material substrates, ductile resin material substrates, liquid crystal display devices, etc. And other processing materials. In addition, the plate-like object W is formed in a plate shape that can be conveyed by the conveyance device 1 - 1 , and in the present embodiment, it is formed in a circular flat plate shape, that is, a disc shape. In addition, generally, the WL-CSP warps and bends gradually upward in the vertical direction as it goes from the center to the outer periphery due to the sealing resin coated on the upper surface Wa. That is, the center of the WL-CSP is convexly curved downward in the vertical direction, and the amount of warping gradually increases from the center to the outer periphery.

保持单元10用于保持板状物W。如图1和图2所示,保持单元10具有支撑基座部11、非接触式吸附保持器12、限制单元13和翘曲量检测单元14。The holding unit 10 is used to hold the plate W. As shown in FIGS. 1 and 2 , the holding unit 10 has a support base portion 11 , a non-contact suction holder 12 , a restricting unit 13 , and a warpage amount detecting unit 14 .

支撑基座部11通过移动单元20而实现移动。支撑基座部11连结于移动单元20。支撑基座部11形成为平行于水平面的圆板状。在支撑基座部11的铅直方向上的上表面11a配设有移动单元20的后述的臂部21。在支撑基座部11的铅直方向上的下表面11b配设有非接触式吸附保持器12、限制单元13和翘曲量检测单元14。如图2所示,支撑基座部11在对应于翘曲量检测单元14的位置处形成有安装孔11c,在对应于非接触式吸附保持器12的位置处形成有安装孔11d和插通孔11e,在对应于限制单元13的位置处形成有装配孔11f。The support base part 11 is moved by the moving unit 20 . The support base part 11 is connected to the mobile unit 20 . The support base portion 11 is formed in a disk shape parallel to a horizontal plane. An arm 21 , which will be described later, of the moving unit 20 is arranged on the upper surface 11 a in the vertical direction of the support base 11 . On the lower surface 11 b in the vertical direction of the support base portion 11 , a non-contact suction holder 12 , a restricting unit 13 and a warpage amount detecting unit 14 are arranged. As shown in FIG. 2 , the support base portion 11 is formed with a mounting hole 11 c at a position corresponding to the warpage amount detection unit 14 , and a mounting hole 11 d and an insertion hole 11 d are formed at a position corresponding to the non-contact adsorption holder 12 . A hole 11 e is formed with a fitting hole 11 f at a position corresponding to the restricting unit 13 .

安装孔11c是供翘曲量检测单元14插通并安装的贯通孔。安装孔11c平行于铅直方向且贯通形成,形成为能够供翘曲量检测单元14插通的大小。安装孔11c在支撑基座部11上形成于比插通孔11e靠内周侧的位置处。在支撑基座部11的周方向上等间隔地形成3个安装孔11c。安装孔11d是使得用于固定非接触式吸附保持器12的螺纹部件等的固定单元S插通的贯通孔。安装孔11d平行于铅直方向且贯通地形成,形成为能够供固定单元S的轴部Sa插通,且固定单元S的头部Sb无法插通的大小。在以插通孔11e为中心的同心圆上的周方向上等间隔地形成3个安装孔11d。亦即,安装孔11d形成于插通孔11e的周围。插通孔11e是供后述的空气供给配管43插通的贯通孔。插通孔11e平行于铅直方向且贯通地形成,形成为能够供空气供给配管43插通的大小。插通孔11e在支撑基座部11上形成于比安装孔11c靠外周侧的位置处。在支撑基座部11的周方向上等间隔地形成3个插通孔11e。此外,插通孔11e被配置为不同于安装孔11c的配置的相位。装配孔11f是供限制单元13的后述的支撑轴部13c插通的贯通孔。装配孔11f平行于铅直方向且贯通地形成,形成为能够供支撑轴部13c插通,且限制单元13的后述的凸缘部13b无法插通的大小。装配孔11f在支撑基座部11上形成于比插通孔11e靠外周侧的位置处。在支撑基座部11的周方向上等间隔地形成3个装配孔11f。此外,装配孔11f被配置为不同于插通孔11e的配置的相位。The mounting hole 11c is a through hole through which the warpage detection unit 14 is inserted and mounted. The attachment hole 11 c is formed parallel to the vertical direction and penetrates through, and is formed in a size that allows the warpage amount detection unit 14 to pass therethrough. The attachment hole 11c is formed on the inner peripheral side of the insertion hole 11e in the support base portion 11 . Three attachment holes 11 c are formed at equal intervals in the circumferential direction of the support base portion 11 . The attachment hole 11 d is a through hole through which the fixing unit S for fixing the screw member or the like of the non-contact adsorption holder 12 is inserted. The attachment hole 11d is formed parallel to the vertical direction and penetrating, and is formed in such a size that the shaft portion Sa of the fixing unit S can be inserted therethrough and the head portion Sb of the fixing unit S cannot be inserted therethrough. Three mounting holes 11d are formed at equal intervals in the circumferential direction on a concentric circle centering on the insertion hole 11e. That is, the attachment hole 11d is formed around the insertion hole 11e. The insertion hole 11e is a through hole through which an air supply pipe 43 described later is inserted. The insertion hole 11 e is formed parallel to the vertical direction and penetrating, and is formed in a size that allows the air supply pipe 43 to pass therethrough. The insertion hole 11e is formed on the support base portion 11 at a position on the outer peripheral side of the attachment hole 11c. Three insertion holes 11 e are formed at equal intervals in the circumferential direction of the support base portion 11 . In addition, the insertion holes 11e are arranged in phases different from the arrangement of the attachment holes 11c. The fitting hole 11f is a through hole through which a support shaft portion 13c described later of the restricting unit 13 is inserted. The mounting hole 11f is formed parallel to the vertical direction and penetrating, and is formed in a size that allows the insertion of the support shaft portion 13c and prevents the insertion of the later-described flange portion 13b of the restricting unit 13 . The mounting hole 11f is formed on the support base portion 11 at a position closer to the outer peripheral side than the insertion hole 11e. Three mounting holes 11 f are formed at equal intervals in the circumferential direction of the support base portion 11 . In addition, the mounting holes 11f are arranged in phases different from the arrangement of the insertion holes 11e.

非接触式吸附保持器12通过喷出空气而生成负压,并且以非接触板状物W的上表面Wa的方式,吸附保持板状物W。非接触式吸附保持器12是通过伯努利的原理吸附保持板状物W的所谓的伯努利吸盘。如图2所示,非接触式吸附保持器12被固定单元S固定于支撑基座部11的下表面11b。亦即,非接触式吸附保持器12配设于支撑基座部11的下表面11b。在支撑基座部11的周方向上等间隔地配置有3个非接触式吸附保持器12。非接触式吸附保持器12形成为铅直方向的高度小于水平方向的宽度的扁平圆柱状。非接触式吸附保持器12的铅直方向上的下端面(下表面11b的相反侧的面)位于比翘曲量检测单元14的铅直方向上的下端部14a靠近下方的位置处。此外,非接触式吸附保持器12一体地具有安装孔12a、空气流入部12b、空气流路12c、空气喷出口12d、引导部12e和弹性部12f。The non-contact adsorption holder 12 generates negative pressure by blowing out air, and adsorbs and holds the plate-shaped object W without contacting the upper surface Wa of the plate-shaped object W. The non-contact adsorption holder 12 is a so-called Bernoulli suction cup that adsorbs and holds the plate W by Bernoulli's principle. As shown in FIG. 2 , the non-contact adsorption holder 12 is fixed to the lower surface 11 b of the support base portion 11 by the fixing unit S. As shown in FIG. That is, the non-contact adsorption holder 12 is arranged on the lower surface 11 b of the support base portion 11 . Three non-contact adsorption holders 12 are arranged at equal intervals in the circumferential direction of the support base portion 11 . The non-contact suction holder 12 is formed in a flat cylindrical shape whose height in the vertical direction is smaller than the width in the horizontal direction. The vertical lower end surface (the surface opposite to the lower surface 11 b ) of the non-contact adsorption holder 12 is located below the vertical lower end portion 14 a of the warpage detection unit 14 . Furthermore, the non-contact suction holder 12 integrally has a mounting hole 12a, an air inflow portion 12b, an air flow path 12c, an air ejection port 12d, a guide portion 12e, and an elastic portion 12f.

安装孔12a是与固定单元S的轴部Sa螺合的螺纹孔。安装孔12a形成于与支撑基座部11的下表面11b相对的面(铅直方向上的上端面)。空气流入部12b与空气供给配管43的空气通路部33a连通,供从图1所示的空气供给源40供给的空气流入。空气流入部12b形成于与支撑基座部11的下表面11b相对的面(铅直方向上的上端面)。空气流入部12b设置于铅直方向的上端面的中央部。空气流路12c连通空气流入部12b与空气喷出口12d。空气喷出口12d是将从空气流入部12b流入的空气向板状物W的上表面Wa喷射的喷射口。空气喷出口12d形成于面对板状物W的上表面Wa的表面(铅直方向的下端面)上。空气喷出口12d在从铅直方向观察时形成为圆形状,且随着从空气流路12c起而走向铅直方向的下端面、即随着从铅直方向的上方起走向下方,形成为直径逐渐扩大。空气喷出口12d设置于铅直方向上的下端面的中央部。空气喷出口12d在非接触式吸附保持器12吸附保持着板状物W时,如图3所示,在铅直方向的下端面与上表面Wa之间,沿着铅直方向的下端面呈放射状地将空气喷出到外部(该图所示的箭头d)。如图2所示,引导部12e将流入空气流路12c中的空气从空气喷出口12d中引导为呈放射状喷出到外部。引导部12e的铅直方向上的下端面平行于支撑基座部11的下表面11b且平坦地形成,在铅直方向上观察时,形成为小于空气喷出口12d的圆板状。引导部12e的铅直方向的下端面位于比非接触式吸附保持器12的铅直方向的下端面靠上方的位置处。弹性部12f构成非接触式吸附保持器12的铅直方向上的下端面。弹性部12f具有如下的弹性,使得例如在非接触式吸附保持器12吸附保持板状物W的瞬间,即使板状物W接触到非接触式吸附保持器12,也能够抑制板状物W的破损和形成于上表面Wa的器件的破损等。The mounting hole 12a is a threaded hole that is screwed into the shaft portion Sa of the fixing unit S. As shown in FIG. The mounting hole 12 a is formed on a surface (upper end surface in the vertical direction) opposing the lower surface 11 b of the support base portion 11 . The air inflow part 12b communicates with the air passage part 33a of the air supply pipe 43, and the air supplied from the air supply source 40 shown in FIG. 1 flows in. The air inflow portion 12b is formed on a surface (upper end surface in the vertical direction) opposing the lower surface 11b of the support base portion 11 . The air inflow part 12b is provided in the center part of the upper end surface in a vertical direction. The air flow path 12c communicates with the air inflow portion 12b and the air discharge port 12d. The air ejection port 12d is an ejection port for ejecting the air flowing in from the air inflow portion 12b toward the upper surface Wa of the plate-shaped object W. As shown in FIG. The air ejection port 12d is formed on the surface (lower end surface in the vertical direction) facing the upper surface Wa of the plate-shaped object W. As shown in FIG. The air ejection port 12d is formed in a circular shape when viewed from the vertical direction, and is formed in a diameter as it goes from the air flow path 12c to the lower end surface in the vertical direction, that is, as it goes from the upper side in the vertical direction to the lower end surface. Gradually expand. 12 d of air ejection ports are provided in the center part of the lower end surface in the vertical direction. When the non-contact adsorption holder 12 adsorbs and holds the plate-shaped object W, the air ejection port 12d has a vertical lower end surface formed between the vertical lower end surface and the upper surface Wa as shown in FIG. 3 . The air is ejected radially to the outside (arrow d shown in the figure). As shown in FIG. 2 , the guide portion 12 e guides the air flowing into the air flow path 12 c from the air ejection port 12 d so as to be radially ejected to the outside. The vertical lower end surface of the guide portion 12e is formed flat and parallel to the lower surface 11b of the support base portion 11, and is formed in a disk shape smaller than the air ejection port 12d when viewed in the vertical direction. The lower end surface in the vertical direction of the guide portion 12 e is located above the lower end surface in the vertical direction of the non-contact adsorption holder 12 . The elastic portion 12 f constitutes a lower end surface in the vertical direction of the non-contact adsorption holder 12 . The elastic portion 12f has such elasticity that, for example, at the moment when the non-contact suction holder 12 suction-holds the plate-shaped object W, even if the plate-shaped object W comes into contact with the non-contact suction holder 12, it can suppress the deformation of the plate-shaped object W. Breakage and breakage of devices formed on the upper surface Wa.

限制单元13用于对保持于非接触式吸附保持器12上的板状物W的水平移动进行限制。如图2所示,限制单元13在支撑基座部11的下表面11b上配设于在铅直方向观察时与板状物W的外周区域重叠的位置处。亦即,限制单元13在支撑基座部11的下表面11b配设于板状物W的外周区域。在支撑基座部11的周方向上等间隔地配置3个限制单元13。这里,外周区域指的是包括板状物W的上表面Wa的至少外周的区域,优选为还包括比外周靠近径向内侧的一部分(例如未形成器件的部分)的区域。此外,限制单元13具有块部13a、凸缘部13b和支撑轴部13c。The limiting unit 13 is used to limit the horizontal movement of the plate W held on the non-contact suction holder 12 . As shown in FIG. 2 , the restricting unit 13 is arranged on the lower surface 11 b of the support base portion 11 at a position overlapping the outer peripheral region of the plate W when viewed in the vertical direction. That is, the restricting unit 13 is disposed on the outer peripheral region of the plate W on the lower surface 11 b of the supporting base portion 11 . Three restricting units 13 are arranged at equal intervals in the circumferential direction of the support base portion 11 . Here, the outer peripheral region refers to a region including at least the outer periphery of the upper surface Wa of the plate W, and preferably also includes a part radially inner than the outer periphery (for example, a part where no device is formed). Furthermore, the restricting unit 13 has a block portion 13a, a flange portion 13b, and a support shaft portion 13c.

如图3所示,块部13a是与被非接触式吸附保持器12吸附保持的板状物W的上表面Wa相对,并接触板状物W的边缘(外周缘)的所谓的摩擦垫。块部13a的铅直方向的下端面是与板状物W的上表面Wa相对的相对面13d。相对面13d是随着从支撑基座部11的径向外侧起而走向内侧,其与支撑基座部11的下表面11b之间间隔逐渐变小的倾斜面。相对面13d具有如下的摩擦系数,使得在由非接触式吸附保持器12吸附保持板状物W时,例如能够限制板状物W在径向上移动,并且限制板状物W在周方向上移动。如图2和图3所示,在铅直方向观察时,凸缘部13b大于支撑基座部11的装配孔11f的孔径。凸缘部13b与支撑轴部13c形成为一体。凸缘部13b相对于支撑基座部11,以使得支撑轴部13c不会从装配孔11f脱落的方式,支撑着支撑轴部13c。支撑轴部13c从凸缘部13b起在铅直方向的下方延伸,且形成为小于装配孔11f的孔径的圆柱状。支撑轴部13c在铅直方向上以上下自由移动的方式插通于装配孔11f。块部13a插入固定于支撑轴部13c的铅直方向的下端部。亦即,限制单元13以能够上下移动的方式支撑于支撑基座部11。As shown in FIG. 3 , the block portion 13 a is a so-called friction pad that faces the upper surface Wa of the plate W held by the non-contact suction holder 12 and contacts the edge (outer periphery) of the plate W. The vertical lower end surface of the block part 13a is the opposing surface 13d which opposes the upper surface Wa of the plate-shaped object W. As shown in FIG. The opposing surface 13d is an inclined surface whose distance from the lower surface 11b of the support base portion 11 gradually decreases as it goes from the radially outer side of the support base portion 11 to the inside. The opposing surface 13d has a coefficient of friction such that when the plate W is sucked and held by the non-contact suction holder 12, for example, the movement of the plate W in the radial direction can be restricted, and the movement of the plate W in the circumferential direction can be restricted. . As shown in FIGS. 2 and 3 , the flange portion 13 b is larger than the diameter of the fitting hole 11 f of the support base portion 11 when viewed in the vertical direction. The flange portion 13b is integrally formed with the support shaft portion 13c. The flange portion 13b supports the support shaft portion 13c with respect to the support base portion 11 so that the support shaft portion 13c does not come off from the mounting hole 11f. The support shaft portion 13c extends downward in the vertical direction from the flange portion 13b, and is formed in a cylindrical shape smaller than the diameter of the fitting hole 11f. The support shaft portion 13c is inserted through the mounting hole 11f so as to be vertically movable. The block part 13a is inserted and fixed to the lower end part of the vertical direction of the support shaft part 13c. That is, the restriction unit 13 is supported by the support base portion 11 so as to be movable up and down.

翘曲量检测单元14用于检测所搬运的板状物W的翘曲量。如图2所示,翘曲量检测单元14插通于安装孔11c中,并且固定于支撑基座部11的下表面11b。翘曲量检测单元14在支撑基座部11的径向上配置于比非接触式吸附保持器12靠内侧的位置处,且在支撑基座部11的周方向上等间隔地配置有3个翘曲量检测单元14。翘曲量检测单元14在支撑基座部11的周方向上,等间隔配置于非接触式吸附保持器12。翘曲量检测单元14的铅直方向的下端部14a位于比非接触式吸附保持器12的铅直方向的下端面(即弹性部12f的下端部)靠上方的位置处。翘曲量检测单元14例如从铅直方向的下端部14a起对板状物W的上表面Wa照射来自未图示的激光光源或SLD(Super Luminescent Diode:超辐射激光二极管)光源等的光源的光线L,从而测定下端部14a与上表面Wa在铅直方向上的间隔D。翘曲量检测单元14与控制单元30电连接,并将对应于所测定的间隔D的信号(测定信号)输出给控制单元30。在本实施方式中,翘曲量检测单元14在作为搬运对象的板状物W载置于规定的位置上的未图示的载置台的铅直方向的上表面与下端部14a的间隔(基准间隔)为规定间隔的状态下,检测载置于载置台的铅直方向的上表面上的板状物W的上表面Wa与下端部14a之间的间隔D(测定间隔)。The warping amount detection unit 14 is used to detect the warping amount of the plate-shaped object W being conveyed. As shown in FIG. 2 , the warpage detection unit 14 is inserted into the mounting hole 11 c and fixed to the lower surface 11 b of the support base portion 11 . The warping amount detection unit 14 is arranged on the inner side of the non-contact adsorption holder 12 in the radial direction of the support base part 11, and three warp detection units are arranged at equal intervals in the circumferential direction of the support base part 11. Curvature detection unit 14. The warping amount detection units 14 are arranged at equal intervals in the non-contact adsorption holder 12 in the circumferential direction of the support base portion 11 . The vertical lower end portion 14a of the warpage amount detection unit 14 is located above the vertical lower end surface of the non-contact adsorption holder 12 (ie, the lower end portion of the elastic portion 12f). For example, the warping amount detection unit 14 irradiates the upper surface Wa of the plate-shaped object W with a light source such as a laser light source or a SLD (Super Luminescent Diode: Super Luminescent Diode) light source (not shown) from the lower end portion 14a in the vertical direction. The light L is used to measure the distance D between the lower end portion 14a and the upper surface Wa in the vertical direction. The warping amount detection unit 14 is electrically connected to the control unit 30 , and outputs a signal (measurement signal) corresponding to the measured distance D to the control unit 30 . In the present embodiment, the warping amount detection unit 14 determines the distance between the upper surface in the vertical direction and the lower end portion 14a of a mounting table (not shown) on which the plate-shaped object W to be conveyed is placed at a predetermined position (reference In a state where the interval) is a predetermined interval, the interval D (measurement interval) between the upper surface Wa of the plate-shaped object W placed on the upper surface in the vertical direction of the mounting table and the lower end portion 14a is detected.

这里,翘曲量指的是例如在载置台等的铅直方向上的上表面(与水平面平行的平面)上载置板状物W时,在从板状物W的中心起向外周的范围内,板状物W向铅直方向的上方翘起的量。超过规定的量的翘曲量指的是无法允许非接触式吸附保持器12以非接触的方式吸附保持板状物W的翘曲量。另外,翘曲量的规定量指的是能够允许非接触式吸附保持器12以非接触的方式吸附保持板状物W的翘曲量的最大值。基准间隔指的是作为用于检测板状物W的翘曲量的基准的间隔,是具有规定的量以上的翘曲量的板状物W载置于载置台的铅直方向的上表面时,也能够通过翘曲量检测单元14检测板状物W的上表面Wa与下端部14a的间隔D的间隔,还是预先确定的规定的间隔。Here, the amount of warpage refers to the range from the center of the plate W to the outer periphery when the plate W is placed on the upper surface (parallel to the horizontal plane) of the mounting table or the like in the vertical direction. The amount by which the plate W is lifted upward in the vertical direction. The amount of warping exceeding a predetermined amount means the amount of warping that cannot allow the non-contact adsorption holder 12 to adsorb and hold the plate-shaped object W in a non-contact manner. In addition, the predetermined amount of warpage refers to the maximum value of warpage that can allow the non-contact suction holder 12 to suction-hold the plate-shaped object W in a non-contact manner. The reference interval refers to the interval used as a reference for detecting the amount of warpage of the plate-shaped object W, and is when a plate-shaped object W having a predetermined amount of warpage or more is placed on the upper surface of the mounting table in the vertical direction. , it is also possible to detect whether the distance D between the upper surface Wa of the plate-shaped object W and the lower end portion 14a is a predetermined predetermined distance by the warpage detection unit 14 .

如图1所示,移动单元20使保持单元10平行于铅直方向而进行升降,并使保持单元10在水平面内回旋,从而使保持单元10从规定的位置起移动至卡盘台上。这里,移动单元20可以在对板状物W实施的加工处理中,使结束了前工序(例如,板状物W的取出工序、翘曲量检测工序、切削工序、磨削工序、研磨工序、定位工序等)的板状物W从前工序的区域移动至进行后工序(例如,清洗工序、干燥工序、板状物的收容工序等)的区域。亦即,移动单元20使板状物W从用于由保持单元10吸附保持板状物W的位置(搬入位置)起移动至目的位置(搬出位置)。在本实施方式中,移动单元20将完成了检测板状物W的翘曲量的翘曲量检测工序,且翘曲量在规定量以下的板状物W从载置台(搬入位置)起移动至搬出位置上。此外,移动单元20构成为具有臂部21、升降部22、回旋部23。As shown in FIG. 1 , the moving unit 20 moves the holding unit 10 from a predetermined position onto the chuck table by moving the holding unit 10 up and down parallel to the vertical direction and swiveling the holding unit 10 in the horizontal plane. Here, the moving unit 20 may complete the previous process (for example, the process of taking out the plate W, the process of detecting the amount of warpage, the process of cutting, the process of grinding, the process of grinding, The plate-shaped object W in the positioning process, etc.) is moved from the area of the previous process to the area where the subsequent process (eg, cleaning process, drying process, plate-shaped object storage process, etc.) is performed. That is, the moving unit 20 moves the plate-shaped object W from the position (carry-in position) where the plate-shaped object W is sucked and held by the holding unit 10 to a target position (carry-out position). In the present embodiment, the moving unit 20 moves the plate-shaped object W whose warpage amount is less than or equal to a predetermined amount after the warpage amount detection step of detecting the warpage amount of the plate-shaped object W from the mounting table (carry-in position). to the move-out position. Furthermore, the moving unit 20 is configured to have an arm portion 21 , a lift portion 22 , and a swivel portion 23 .

臂部21从升降部22的铅直方向的上端部侧起在水平方向上延伸。在臂部21的一端一体地设有安装于支撑基座部11的上表面11a上的连结部21a。臂部21支撑住支撑基座部11,并且支撑于升降部22。连结部21a安装并固定于支撑基座部11的上表面11a。连结部21a配置于支撑基座部11的中央。升降部22是能够沿着铅直方向升降(该图所示的箭头a)的例如空气活塞等。在升降部22的铅直方向的上端部侧设有臂部21。升降部22沿着铅直方向进行升降,从而使保持单元10进行升降。升降部22的升降动作是由控制单元30控制的。升降部22将保持单元10定位于在检测板状物W的翘曲量时,载置台的铅直方向的上表面与翘曲量检测单元14的下端部14a的间隔为规定的间隔(亦即基准间隔)的位置处。回旋部23具有电动机等的旋转驱动源等,通过使升降部22在水平面内旋转(该图所示的箭头b),从而使保持单元10绕回旋部23回旋。回旋部23的回旋动作是由控制单元30控制的。The arm portion 21 extends in the horizontal direction from the upper end side in the vertical direction of the elevating portion 22 . One end of the arm portion 21 is integrally provided with a connection portion 21 a attached to the upper surface 11 a of the support base portion 11 . The arm part 21 supports the support base part 11 and is supported by the lift part 22 . The connection part 21a is attached and fixed to the upper surface 11a of the support base part 11. As shown in FIG. The connecting portion 21 a is arranged at the center of the support base portion 11 . The raising and lowering unit 22 is, for example, an air piston or the like capable of moving up and down in the vertical direction (arrow a shown in the figure). An arm portion 21 is provided on the vertically upper end side of the lift portion 22 . The lifting unit 22 lifts up and down in the vertical direction to lift the holding unit 10 up and down. The lifting action of the lifting part 22 is controlled by the control unit 30 . The lifting unit 22 positions the holding unit 10 so that when detecting the warping amount of the plate-shaped object W, the distance between the upper surface in the vertical direction of the mounting table and the lower end portion 14a of the warping amount detecting unit 14 is a predetermined distance (that is, at the position of the reference interval). The swivel part 23 has a rotational drive source such as a motor, etc., and the holding unit 10 is swiveled around the swivel part 23 by rotating the elevating part 22 in the horizontal plane (arrow b shown in the figure). The swivel action of the swivel part 23 is controlled by the control unit 30 .

控制单元30用于控制搬运装置1-1的整体动作。控制单元30在功能方面概念性构成为具有翘曲量检测部31和翘曲量判定部32。控制单元30在由翘曲量判定部32判定为板状物W的翘曲量在规定的量以下时,开放空气供给通道41的空气控制阀42,将来自空气供给源40的空气供给给空气供给配管43,并从非接触式吸附保持器12的空气喷出口12d喷射空气。此外,控制单元30在由翘曲量判定部32判定为板状物W的翘曲量并非规定的量以下、亦即板状物W的翘曲量超过规定的量时,停止对板状物W的搬运。The control unit 30 is used to control the overall movement of the transport device 1-1. The control unit 30 is conceptually configured to have a warpage amount detection unit 31 and a warpage amount determination unit 32 in terms of functions. The control unit 30 opens the air control valve 42 of the air supply path 41 to supply the air from the air supply source 40 to the air when the warp amount determination unit 32 determines that the warp amount of the plate-shaped object W is equal to or less than a predetermined amount. The supply pipe 43 injects air from the air ejection port 12 d of the non-contact adsorption holder 12 . In addition, the control unit 30 stops processing the plate-shaped object when it is determined by the warpage amount determination unit 32 that the warpage amount of the plate-shaped object W is not less than a predetermined amount, that is, the warpage amount of the plate-shaped object W exceeds a predetermined amount. W's handling.

翘曲量检测部31用于检测板状物W的翘曲量。翘曲量检测部31根据从翘曲量检测单元14输出的测定信号,计算板状物W的上表面Wa与翘曲量检测单元14的下端部14a的间隔D(测定间隔)。翘曲量检测部31从载置台的铅直方向的上表面与翘曲量检测单元14的下端部14a的间隔(基准间隔)中,减去载置于载置台的上表面上的板状物W的上表面Wa与下端部14a的间隔D(测定间隔)以及预先测量或输入的板状物W的厚度(与上表面Wa正交的方向上的厚度),从而检测板状物W的翘曲量。The warping amount detection unit 31 is used to detect the warping amount of the plate-shaped object W. As shown in FIG. The warping amount detecting unit 31 calculates the distance D (measurement interval) between the upper surface Wa of the plate-shaped object W and the lower end portion 14a of the warping amount detecting unit 14 based on the measurement signal output from the warping amount detecting unit 14 . The warping amount detecting unit 31 subtracts the plate-shaped object placed on the upper surface of the mounting table from the distance (reference distance) between the upper surface of the mounting table in the vertical direction and the lower end portion 14a of the warping amount detecting unit 14. The distance D (measurement interval) between the upper surface Wa of W and the lower end portion 14a and the thickness of the plate W (thickness in the direction perpendicular to the upper surface Wa) measured or input in advance, thereby detecting the warping of the plate W. curvature.

翘曲量判定部32用于判定板状物W的翘曲量是否在规定的量以下。翘曲量判定部32对预先输入的板状物W的翘曲量的规定的量(规定翘曲量)与由翘曲量检测部31检测的板状物W的翘曲量(检测翘曲量)进行比较,从而判定板状物W的翘曲量是否在规定的量以下。翘曲量判定部32在检测翘曲量为规定的翘曲量以下时,判定为板状物W的翘曲量在规定的量以下。另外,作为板状物W的翘曲量的规定的量,例如既可以是通过使用搬运装置1-1或实体机的实验而求出的翘曲量,也可以是由作业人员输入的翘曲量。The warp amount determination unit 32 is used to determine whether the warp amount of the plate-shaped object W is equal to or less than a predetermined amount. The warping amount determination unit 32 compares the predetermined amount (predetermined warping amount) of the warping amount of the plate-shaped object W input in advance with the warping amount of the plate-shaped object W detected by the warping amount detecting unit 31 (detected warping amount). amount) to determine whether or not the amount of warpage of the plate-shaped object W is less than a predetermined amount. The warping amount determining unit 32 determines that the warping amount of the plate-shaped object W is not more than the predetermined amount when the detected warping amount is equal to or less than the predetermined warping amount. In addition, the predetermined amount of warpage of the plate-shaped object W may be, for example, a warpage obtained by an experiment using the conveyance device 1-1 or an actual machine, or may be a warpage input by a worker. quantity.

这里,空气供给源40用于将气体(空气)供给给非接触式吸附保持器12。如图1所示,空气供给源40构成为具有供给空气的空气供给通道41、控制空气的供给量的空气控制阀42和连接于非接触式吸附保持器12的空气供给配管43。空气控制阀42的开闭动作是由控制单元30控制的。空气供给配管43在凭借移动单元20而使得保持单元10的位置变化时,能够追随于该位置的变化,例如是挠性管等柔软的配管。如图2所示,空气供给配管43通过形成于前端的外周上的外螺纹与形成于空气流入部12b上的内螺纹螺合,从而连通空气通路部43a与空气流入部12b。Here, the air supply source 40 is used to supply gas (air) to the non-contact adsorption holder 12 . As shown in FIG. 1 , the air supply source 40 includes an air supply passage 41 for supplying air, an air control valve 42 for controlling the supply amount of air, and an air supply pipe 43 connected to the non-contact adsorption holder 12 . The opening and closing action of the air control valve 42 is controlled by the control unit 30 . The air supply pipe 43 can follow the change of the position of the holding unit 10 when the position of the holding unit 10 is changed by the moving unit 20 , and is a flexible pipe such as a flexible pipe, for example. As shown in FIG. 2 , the air supply pipe 43 communicates the air passage portion 43a and the air inflow portion 12b by screwing the male thread formed on the outer periphery of the front end with the female thread formed in the air inflow portion 12b.

接着,说明如上构成的搬运装置1-1的动作。图4是表示第1实施方式的搬运装置的动作的一例的流程图。另外,在本实施方式中,预先通过翘曲量检测单元14检测前工序中的载置台的铅直方向的上表面与翘曲量检测单元14的下端部14a的基准间隔。此外,在本实施方式中,预先计量板状物W的厚度,或由作业人员输入板状物W的厚度。Next, the operation of the conveying device 1-1 configured as above will be described. FIG. 4 is a flowchart showing an example of the operation of the transport device according to the first embodiment. In addition, in the present embodiment, the reference distance between the upper surface in the vertical direction of the mounting table in the previous process and the lower end portion 14a of the warpage detection unit 14 is detected by the warpage detection unit 14 in advance. In addition, in this embodiment, the thickness of the plate-shaped object W is measured in advance, or the thickness of the plate-shaped object W is input by an operator.

控制单元30通过回旋部23使保持单元10进行回旋,并且使保持单元10移动至前工序中的规定的位置(搬入位置)、例如在前工序中载置有板状物W的载置台的上方。这里,在搬运装置1-1的铅直方向上,保持单元10定位于载置台的上表面与翘曲量检测单元14的下端部14a的间隔为基准间隔(亦即规定的间隔)的位置处。此外,在搬运装置1-1中,板状物W的上表面Wa与支撑基座部11的下表面11b相对,在铅直方向上,保持单元10与板状物W重叠。The control unit 30 rotates the holding unit 10 through the turning portion 23 and moves the holding unit 10 to a predetermined position (carry-in position) in the previous process, for example, above the mounting table on which the plate-like object W was placed in the previous process. . Here, the holding unit 10 is positioned at a position where the distance between the upper surface of the mounting table and the lower end portion 14a of the warpage detection unit 14 is a reference distance (that is, a predetermined distance) in the vertical direction of the conveyance device 1-1. In addition, in the conveyance device 1 - 1 , the upper surface Wa of the plate-shaped object W faces the lower surface 11 b of the support base portion 11 , and the holding unit 10 overlaps the plate-shaped object W in the vertical direction.

接着,控制单元30通过翘曲量检测单元14检测板状物W的翘曲量(步骤S1)。这里,在搬运装置1-1中,在支撑基座部11的周方向上等间隔地配置有3个翘曲量检测单元14,测定信号分别从3个翘曲量检测单元14中被输出给控制单元30。此外,在控制单元30中,根据从翘曲量检测单元14输出的3个测定信号,通过翘曲量检测部31计算出3个板状物W的上表面Wa与翘曲量检测单元14的下端部14a的间隔D。此外,在控制单元30中,通过翘曲量检测部31从预先检测的基准间隔中,减去计算的3个间隔D和被测量或输入的板状物的厚度,从而检测出板状物W的3个翘曲量(检测翘曲量)。Next, the control unit 30 detects the warpage amount of the plate-shaped object W by the warpage amount detection unit 14 (step S1 ). Here, in the transport device 1-1, three warpage detection units 14 are arranged at equal intervals in the circumferential direction of the support base portion 11, and measurement signals are output from the three warpage detection units 14 to control unit 30. In addition, in the control unit 30, based on the three measurement signals output from the warpage detection unit 14, the warpage detection unit 31 calculates the upper surface Wa of the three plate-shaped objects W and the warpage detection unit 14. The interval D of the lower end portion 14a. In addition, in the control unit 30, the warp amount detection unit 31 subtracts the calculated three intervals D and the measured or input thickness of the plate-shaped object from the previously detected reference interval to detect the plate-shaped object W. The 3 warpage amount (detection warpage amount).

接着,控制单元30判定翘曲量是否在规定的量以下(步骤S2)。这里,控制单元30通过翘曲量判定部32,比较3个检测翘曲量中的最大翘曲量与规定的翘曲量。Next, the control unit 30 determines whether or not the amount of warping is equal to or less than a predetermined amount (step S2). Here, the control unit 30 compares the maximum warpage amount among the three detected warpage amounts with a predetermined warpage amount by the warpage amount determination unit 32 .

接着,控制单元30在判定为板状物W的翘曲量在规定的量以下(步骤S2:Yes)时,通过非接触式吸附保持器12保持板状物W(步骤S3)。这里,搬运装置1-1通过升降部22使保持单元10下降,保持单元10接近板状物W的上表面Wa,而限制单元13接触板状物W,从而限制板状物W在水平方向的移动。Next, when the control unit 30 determines that the warpage amount of the plate-shaped object W is equal to or less than a predetermined amount (step S2: Yes), the plate-shaped object W is held by the non-contact suction holder 12 (step S3). Here, the conveying device 1-1 lowers the holding unit 10 through the lifting part 22, the holding unit 10 approaches the upper surface Wa of the plate-shaped object W, and the restricting unit 13 contacts the plate-shaped object W, thereby restricting the movement of the plate-shaped object W in the horizontal direction. move.

此外,搬运装置1-1通过升降部22使保持单元10进一步下降,在限制单元13接触板状物W的外周的状态下,非接触式吸附保持器12接近板状物W的上表面Wa。此外,在搬运装置1-1中,空气从空气喷出口12d中呈放射状喷射(图3所示的箭头d)到外部,在引导部12e的铅直方向的下端面的下方产生(图3所示的箭头e)负压。此外,搬运装置1-1通过所产生的负压,使得板状物W被拉向非接触式吸附保持器12。此外,在板状物W被负压拉向非接触式吸附保持器12时,由于在非接触式吸附保持器12的下端面于板状物W的上表面Wa之间流动的空气而形成的空气层会作为反作用力而作用于搬运装置1-1,从而阻止非接触式吸附保持器12与上表面Wa的接触。因此,搬运装置1-1通过非接触式吸附保持器12以非接触的方式吸附保持板状物W。Furthermore, the conveyance device 1 - 1 further lowers the holding unit 10 by the elevating unit 22 , and the non-contact adsorption holder 12 approaches the upper surface Wa of the plate W while the restricting unit 13 is in contact with the outer periphery of the plate W. In addition, in the conveyance device 1-1, air is ejected radially from the air ejection port 12d (arrow d shown in FIG. Arrow shown e) Negative pressure. In addition, the conveyance device 1 - 1 pulls the plate W toward the non-contact adsorption holder 12 by the generated negative pressure. In addition, when the plate W is pulled toward the non-contact adsorption holder 12 by negative pressure, due to the air flowing between the lower end surface of the non-contact adsorption holder 12 and the upper surface Wa of the plate W, The air layer acts on the conveyance device 1 - 1 as a reaction force, thereby preventing the non-contact adsorption holder 12 from coming into contact with the upper surface Wa. Therefore, the conveyance device 1 - 1 sucks and holds the plate-shaped object W in a non-contact manner by the non-contact suction holder 12 .

接着,控制单元30将板状物W移动至卡盘台上。这里,在搬运装置1-1中,通过升降部22使得保持单元10上升,从而板状物W上升,并且通过回旋部23使得保持单元10回旋,从而板状物W移动至后工序的搬出位置、例如在后工序中保持板状物W的卡盘台的上方。此外,在搬运装置1-1中,板状物W与卡盘台相对地进行配置。Next, the control unit 30 moves the plate W onto the chuck table. Here, in the conveyance device 1-1, the lifting unit 22 raises the holding unit 10 to raise the plate-shaped object W, and the turning portion 23 turns the holding unit 10 so that the plate-shaped object W moves to the delivery position of the subsequent process. , For example, above the chuck table that holds the plate-shaped object W in a post-process. Moreover, in the conveyance apparatus 1-1, the plate-shaped object W is arrange|positioned facing a chuck table.

接着,控制单元30将板状物W载置于卡盘台上。这里,在搬运装置1-1中,通过升降部22使得保持单元10下降至使得板状物W接触卡盘台之后,通过控制单元30关闭空气控制阀42。此外,在搬运装置1-1中,切断从空气供给源40向非接触式吸附保持器12的空气供给,引导部12e的下方的负压消失,解除了非接触式吸附保持器12对板状物W的吸附保持,板状物W载置于卡盘台上。Next, the control unit 30 places the plate W on the chuck table. Here, in the transfer device 1 - 1 , the control unit 30 closes the air control valve 42 after the holding unit 10 is lowered by the elevating unit 22 so that the plate-shaped object W contacts the chuck table. In addition, in the conveyance device 1-1, the air supply from the air supply source 40 to the non-contact suction holder 12 is cut off, and the negative pressure below the guide part 12e disappears, and the non-contact suction holder 12 releases the pressure on the plate-shaped suction holder 12. Adsorption and holding of the object W, the plate-shaped object W is placed on the chuck table.

此外,控制单元30在判定为板状物W的翘曲量并非规定的量以下(步骤S2:No)时,中止搬运(步骤S4)。另外,为了与预定搬运的板状物W加以区分,搬运装置1-1的搬运中止的板状物W通过未图示的搬入搬出单元而返回到盒的下段侧,或收容于其他盒中。Moreover, when the control unit 30 determines that the amount of warpage of the plate-shaped object W is not equal to or less than a predetermined amount (step S2: No), it stops conveyance (step S4). In addition, in order to distinguish from plate-shaped objects W to be conveyed, plate-shaped objects W whose conveyance by the conveyance device 1 - 1 is suspended are returned to the lower stage side of the cassette by a loading/unloading unit not shown, or are stored in other cassettes.

如上,根据第1实施方式的板状物的搬运装置1-1,通过翘曲量检测部31检测板状物W的上表面Wa与翘曲量检测单元14的下端部14a的间隔D(亦即板状物的翘曲量),在翘曲量判定部32判定为间隔D在规定的量以下的情况下,亦即板状物的翘曲量在规定的量以下的情况下,通过非接触式吸附保持器12以非接触的方式吸附保持板状物W并搬运。因此,根据第1实施方式的板状物的搬运装置1-1,能够在不必对于翘曲量超过规定量的板状物W,尝试进行非接触式吸附保持器12的吸附保持的情况下,运转板状物的搬运装置1-1。亦即,根据第1实施方式的板状物的搬运装置1-1,能够省略对于不优选使用非接触式吸附保持器12的吸附保持的板状物W(翘曲量超过规定量的板状物W)尝试搬运的时间。因此,根据第1实施方式的板状物的搬运装置1-1,可获得能够高效搬运板状物W的效果。As described above, according to the conveying device 1-1 of the plate-like object of the first embodiment, the distance D between the upper surface Wa of the plate-shaped object W and the lower end 14a of the warp amount detecting unit 14 is detected by the warpage detection unit 31 (also That is, the amount of warpage of the plate-shaped object), when the warpage amount determination unit 32 determines that the distance D is less than or equal to the predetermined amount, that is, when the warpage of the plate-shaped object is less than the predetermined amount, the The contact suction holder 12 suction-holds and conveys the plate-shaped object W in a non-contact manner. Therefore, according to the conveyance device 1 - 1 of the plate-shaped object of the first embodiment, it is not necessary to try to suction and hold the plate-shaped object W whose warpage exceeds a predetermined amount by the non-contact suction holder 12 . A conveying device 1-1 for running a plate-shaped object. That is, according to the conveying device 1 - 1 of the plate-shaped object of the first embodiment, it is possible to omit the need for absorbing and holding the plate-shaped object W (the plate-shaped object whose warping amount exceeds a predetermined amount) that is not preferable to use the non-contact suction holder 12 . Object W) time to try to carry. Therefore, according to the conveyance apparatus 1-1 of a plate-shaped object which concerns on 1st Embodiment, the effect that the plate-shaped object W can be conveyed efficiently is acquired.

〔第2实施方式〕[Second Embodiment]

接着,参照附图说明第2实施方式的板状物的搬运装置1-2。图5是表示第2实施方式的搬运装置的结构例的图。图6是表示通过第2实施方式的搬运装置的翘曲量检测单元检测板状物的翘曲量的状态的剖面图。图7是表示通过第2实施方式的搬运装置的接触式吸附保持器吸附保持板状物的状态的剖面图。Next, a conveyance device 1-2 of a plate-like object according to a second embodiment will be described with reference to the drawings. Fig. 5 is a diagram showing a configuration example of a transport device according to a second embodiment. 6 is a cross-sectional view showing a state in which a warpage amount of a plate-shaped object is detected by a warpage amount detection unit of a conveyance device according to a second embodiment. 7 is a cross-sectional view showing a state in which a plate-shaped object is sucked and held by a contact suction holder of a conveyance device according to a second embodiment.

第2实施方式的板状物的搬运装置1-2与上述第1实施方式的板状物的搬运装置1-1的不同之处在于,按照板状物W的翘曲量,通过选择单元16切换非接触式吸附保持器12与接触式吸附保持器15。另外,关于与上述第1实施方式共通的结构、作用、效果,尽量省略重复描述(在以下说明的其他实施方式中亦同)。The plate-shaped article conveyance device 1 - 2 of the second embodiment is different from the plate-shaped article conveyance device 1 - 1 of the above-mentioned first embodiment in that, according to the amount of warping of the plate-shaped article W, the selection unit 16 The non-contact suction holder 12 and the contact suction holder 15 are switched. In addition, redundant descriptions of configurations, functions, and effects common to those of the first embodiment described above will be omitted as much as possible (the same applies to other embodiments described below).

图5所示的板状物的搬运装置1-2(以下简称为“搬运装置1-2”)在板状物W的翘曲量在规定量以下的情况下,以非接触的方式吸附保持板状物W,而在板状物W的翘曲量超过规定量的情况下,以接触的方式吸附保持板状物W,从而搬运板状物W。搬运装置1-2如图5所示,构成为具有保持单元10、移动单元20和控制单元30。The conveying device 1-2 for a plate-like object shown in FIG. 5 (hereinafter simply referred to as "transporting device 1-2") sucks and holds the plate-shaped object W in a non-contact manner when the warpage amount of the plate-shaped object W is less than a predetermined amount. When the warpage of the plate-shaped object W exceeds a predetermined amount, the plate-shaped object W is sucked and held in a contact manner, and the plate-shaped object W is conveyed. The conveyance device 1 - 2 is configured to include a holding unit 10 , a moving unit 20 , and a control unit 30 as shown in FIG. 5 .

如图5和图6所示,保持单元10具有支撑基座部11、非接触式吸附保持器12、限制单元13和翘曲量检测单元14,且还具有接触式吸附保持器15和选择单元16。As shown in FIGS. 5 and 6 , the holding unit 10 has a support base portion 11, a non-contact suction holder 12, a restriction unit 13, and a warpage detection unit 14, and also has a contact suction holder 15 and a selection unit. 16.

接触式吸附保持器15接触板状物W的上表面Wa,从而吸附保持板状物W。如图6和图7所示,接触式吸附保持器15通过选择单元16而以能够平行于铅直方向地进行上下移动的方式支撑于支撑基座部11的下表面11b。亦即,接触式吸附保持器15配设于支撑基座部11的下表面11b。在支撑基座部11的周方向上,等间隔地配置有3个接触式吸附保持器15,并且等间隔地配置于翘曲量检测单元14。此外,接触式吸附保持器15在支撑基座部11上配置于比翘曲量检测单元14靠中央侧的位置处。亦即,接触式吸附保持器15在支撑基座部11上配置于比非接触式吸附保持器12靠中央侧的位置处。接触式吸附保持器15一体地具有吸盘15a和连结部15b。The contact suction holder 15 contacts the upper surface Wa of the plate-shaped object W so as to suction-hold the plate-shaped object W. As shown in FIG. As shown in FIGS. 6 and 7 , the contact suction holder 15 is supported on the lower surface 11 b of the support base portion 11 by the selection unit 16 so as to be movable up and down parallel to the vertical direction. That is, the contact suction holder 15 is arranged on the lower surface 11 b of the support base portion 11 . Three contact suction holders 15 are arranged at equal intervals in the circumferential direction of the support base portion 11 , and are also arranged at equal intervals in the warpage detection unit 14 . In addition, the contact suction holder 15 is arranged on the support base portion 11 at a position closer to the center than the warpage detection unit 14 . That is, the contact suction holder 15 is arranged on the support base portion 11 at a position closer to the center than the non-contact suction holder 12 . The contact suction holder 15 integrally has a suction pad 15a and a connection portion 15b.

吸盘15a形成为从铅直方向的上方起向下方直径逐渐扩大的圆锥梯形状、即所谓的吸盘状。连结部15b以能够自由拆装的方式安装于选择单元16的后述的轴部16d的铅直方向上的下端部。连结部15b与轴部16d的后述的空气通路部16f连通,并与吸盘15a连通,还将空气通路部16f与吸盘15a连通。连结部15b在铅直方向观察时,大于轴部16d的外径、即支撑基座部11的插通孔11g的孔径。亦即,连结部15b形成为无法插通于支撑基座部11的插通孔11g中的大小。The suction pad 15a is formed in a conical trapezoidal shape whose diameter gradually expands downward from above in the vertical direction, that is, a so-called suction cup shape. The connection part 15b is detachably attached to the lower end part in the vertical direction of the shaft part 16d mentioned later of the selection unit 16 in a detachable manner. The connection part 15b communicates with the air passage part 16f mentioned later of the shaft part 16d, and communicates with the suction pad 15a, and also communicates with the air passage part 16f and the suction pad 15a. The coupling portion 15b is larger than the outer diameter of the shaft portion 16d , that is, the diameter of the insertion hole 11g of the support base portion 11 when viewed in the vertical direction. That is, the connection part 15b is formed in the size which cannot be inserted into the insertion hole 11g of the support base part 11. As shown in FIG.

选择单元16将接触式吸附保持器15以能够平行于铅直方向上下移动(亦即能够升降)的方式支撑于支撑基座部11。选择单元16在板状物W的翘曲量为规定的量以下的情况下,如图6所示,将接触式吸附保持器15定位于比非接触式吸附保持器12靠铅直方向的上方的位置处,从而将非接触式吸附保持器12定位于接近板状物W的上表面Wa的作用位置上,并将接触式吸附保持器15定位于离开板状物W的上表面Wa的非作用位置上。另一方面,选择单元16在板状物W的翘曲量超过规定的量的情况下,如图7所示,将接触式吸附保持器15定位于比非接触式吸附保持器12靠铅直方向的下方的位置处,从而将接触式吸附保持器15定位于接近板状物W的上表面Wa的作用位置处,并将非接触式吸附保持器12定位于离开板状物W的上表面Wa的非作用位置处。亦即,选择单元16将非接触式吸附保持器12和接触式吸附保持器15中的一个定位于接近板状物W的作用位置处,并将另一个定位于离开板状物W的非作用位置处。选择单元16构成为具有升降部16a和支撑部16b。The selection unit 16 supports the contact suction holder 15 on the support base portion 11 so as to be able to move up and down parallel to the vertical direction (that is, to be able to lift up and down). The selection unit 16 positions the contact suction holder 15 vertically above the non-contact suction holder 12 as shown in FIG. position, so that the non-contact adsorption holder 12 is positioned at the action position close to the upper surface Wa of the plate W, and the contact adsorption holder 15 is positioned at a non-contact position away from the upper surface Wa of the plate W. position of action. On the other hand, when the amount of warpage of the plate-shaped object W exceeds a predetermined amount, the selection unit 16 positions the contact suction holder 15 more vertically than the non-contact suction holder 12 as shown in FIG. 7 . direction, so that the contact adsorption holder 15 is positioned at the action position close to the upper surface Wa of the plate W, and the non-contact adsorption holder 12 is positioned away from the upper surface of the plate W. At the non-active position of Wa. That is, the selection unit 16 positions one of the non-contact suction holder 12 and the contact suction holder 15 at an active position close to the plate W, and positions the other at an inactive position away from the plate W. location. The selection unit 16 is configured to have a lift portion 16a and a support portion 16b.

升降部16a以能够平行于铅直方向上下移动的方式支撑于支撑基座部11。升降部16a一体地具有限制部16c、从限制部16c起在铅直方向的下方延伸,并在外周形成有外螺纹的轴部16d、从限制部16c起在铅直方向的上方延伸,并与图5所示的后述的空气吸附配管53连接的连接部16e。此外,升降部16a形成为具有与图5所示的空气吸附通道51连通的空气通路部16f的圆筒状。限制部16c形成为在铅直方向上观察时,大于支撑基座部11的插通孔11g的孔径且小于支撑部16b的六边形状。轴部16d以能够平行于铅直方向上下移动的方式,插通于支撑部16b的后述的插通孔16g和支撑基座部11的插通孔11g中。吸盘15a经由连结部15b而连结于轴部16d的铅直方向的下端部。The lift part 16a is supported by the support base part 11 so that it can move up and down parallel to the vertical direction. The elevating portion 16a integrally has a restricting portion 16c extending downward in the vertical direction from the restricting portion 16c, and has an externally threaded shaft portion 16d extending from the restricting portion 16c upward in the vertical direction. The connection part 16e to which the air adsorption piping 53 mentioned later shown in FIG. 5 is connected. In addition, the ascending and descending portion 16a is formed in a cylindrical shape having an air passage portion 16f communicating with the air adsorption passage 51 shown in FIG. 5 . The restricting portion 16c is formed in a hexagonal shape that is larger than the diameter of the insertion hole 11g of the supporting base portion 11 and smaller than the supporting portion 16b when viewed in the vertical direction. The shaft portion 16d is inserted through a later-described insertion hole 16g of the support portion 16b and an insertion hole 11g of the support base portion 11 so as to be movable up and down parallel to the vertical direction. The suction pad 15a is coupled to the lower end portion in the vertical direction of the shaft portion 16d via the coupling portion 15b.

支撑部16b形成为具有在铅直方向上平行地贯通的插通孔16g的圆环状。支撑部16b在铅直方向上观察时,大于支撑基座部11的插通孔11g的孔径,且大于限制部16c。支撑部16b在插通孔16g于支撑基座部11的插通孔11g连通的位置上,固定于支撑基座部11的上表面11a。The support portion 16b is formed in an annular shape having an insertion hole 16g penetrating in parallel in the vertical direction. The supporting portion 16b is larger than the hole diameter of the insertion hole 11g of the supporting base portion 11 and larger than the restricting portion 16c when viewed in the vertical direction. The support portion 16b is fixed to the upper surface 11a of the support base portion 11 at a position where the insertion hole 16g communicates with the insertion hole 11g of the support base portion 11 .

这里,选择单元16通过例如以电磁铁等作为驱动力,并能够沿着铅直方向伸缩的未图示的致动器,使轴部16d向铅直方向的下方移动,并使吸盘15a进行下降,直到限制部16c与支撑部16b对接为止。选择单元16的伸缩动作是由控制单元30控制的。选择单元16通过致动器使得限制部16c与支撑部16b对接,从而如图7所示,限制升降部16a下降,并将吸盘15a定位于作用位置处(亦即将接触式吸附保持器15定位于作用位置处)。此外,选择单元16通过致动器使轴部16d向铅直方向的上方移动,并使吸盘15a上升,直到接触式吸附保持器15的连结部15b与支撑基座部11的下表面11b对接为止。选择单元16通过致动器使接触式吸附保持器15的连结部15b与支撑基座部11的下表面11b对接,从而如图6所示,限制升降部16a上升,将吸盘15a定位于非作用位置上(亦即将接触式吸附保持器15定位于非作用位置上)。亦即,选择单元16将接触式吸附保持器15定位于作用位置处,从而将非接触式吸附保持器12定位于非作用位置处,并且将接触式吸附保持器15定位于非作用位置处,从而将非接触式吸附保持器12定位于作用位置处。Here, the selection unit 16 moves the shaft portion 16d downward in the vertical direction and lowers the suction pad 15a by using, for example, an electromagnet as a driving force and an unillustrated actuator that can expand and contract in the vertical direction. , until the limiting portion 16c abuts against the supporting portion 16b. The telescoping action of the selection unit 16 is controlled by the control unit 30 . The selection unit 16 makes the restricting part 16c dock with the supporting part 16b through the actuator, so as shown in FIG. position of action). In addition, the selection unit 16 moves the shaft portion 16d upward in the vertical direction by the actuator, and raises the suction pad 15a until the connection portion 15b of the contact suction holder 15 abuts against the lower surface 11b of the support base portion 11. . The selection unit 16 makes the connection part 15b of the contact suction holder 15 abut against the lower surface 11b of the support base part 11 through the actuator, so as shown in FIG. position (that is, the contact adsorption holder 15 is positioned in the non-active position). That is, the selection unit 16 positions the contact type adsorption holder 15 at the active position, thereby positions the non-contact type adsorption retainer 12 at the inactive position, and positions the contact type adsorption retainer 15 at the inactive position, Thereby, the non-contact suction holder 12 is positioned at the active position.

控制单元30用于控制搬运装置1-2的整体动作。控制单元30在功能方面概念性地构成为具有翘曲量检测部31和翘曲量判定部32,且构成为还具有切换部33。控制单元30在由翘曲量判定部32判定为板状物W的翘曲量在规定的量以下时,关闭空气供给源40的空气控制阀47,开放空气控制阀42,从非接触式吸附保持器12的空气喷出口12d中喷射空气供给源40的空气。此外,控制单元30在由翘曲量判定部32判定为板状物W的翘曲量并非规定的量以下、亦即板状物W的翘曲量超过规定的量时,关闭空气供给源40的空气控制阀42,开放空气控制阀47,使真空吸附源50的负压作用于吸盘15a上。The control unit 30 is used to control the overall movement of the conveying device 1-2. The control unit 30 conceptually includes a warpage amount detection unit 31 and a warpage amount determination unit 32 in terms of functions, and further includes a switching unit 33 . The control unit 30 closes the air control valve 47 of the air supply source 40 and opens the air control valve 42 when the warp amount determination unit 32 determines that the warp amount of the plate-shaped object W is equal to or less than a predetermined amount. The air from the air supply source 40 is injected into the air ejection port 12d of the holder 12 . In addition, the control unit 30 shuts off the air supply source 40 when it is determined by the warp amount determination unit 32 that the warp amount of the plate-shaped object W is not less than a predetermined amount, that is, the warp amount of the plate-shaped object W exceeds a predetermined amount. Open the air control valve 42 and open the air control valve 47 to make the negative pressure of the vacuum suction source 50 act on the suction cup 15a.

切换部33用于将接触式吸附保持器15的位置切换为作用位置和非作用位置。切换部33在由翘曲量判定部32判定的板状物W的翘曲量在规定的量以下的情况下,通过选择单元16将接触式吸附保持器15的位置切换为非作用位置(图6所示的位置),而在由翘曲量判定部32判定的板状物W的翘曲量超过规定的量的情况下,通过选择单元16将接触式吸附保持器15的位置切换为作用位置(图7所示的位置)。亦即,切换部33控制选择单元16的伸缩动作。另外,在本实施方式中,板状物W的翘曲量超过规定量指的是,无法允许非接触式吸附保持器12以非接触的方式吸附保持板状物W的翘曲量,并且能够允许接触式吸附保持器15以接触的方式吸附保持板状物W的翘曲量。The switching portion 33 is used to switch the position of the contact suction holder 15 between an active position and a non-active position. The switching unit 33 switches the position of the contact suction holder 15 to the non-operating position through the selection unit 16 when the warping amount of the plate-shaped object W determined by the warping amount judging unit 32 is equal to or less than a predetermined amount (Fig. 6), and when the warpage of the plate W determined by the warpage determination unit 32 exceeds a predetermined amount, the selection unit 16 switches the position of the contact suction holder 15 to the active position. location (the location shown in Figure 7). That is, the switching unit 33 controls the telescopic operation of the selection unit 16 . In addition, in the present embodiment, the warpage amount of the plate-shaped object W exceeding a predetermined amount means that the non-contact adsorption holder 12 cannot allow the warpage amount of the plate-shaped object W to be adsorbed and held in a non-contact manner, and can The warping amount of the plate-shaped object W is allowed to be sucked and held by the contact suction holder 15 in a contact manner.

这里,如图5所示,空气供给源40构成为具有空气供给通道41、空气控制阀42和空气供给配管43,且构成为还具有将空气供给给真空吸附源50的空气供给通道44、将空气分配给空气供给通道41、44的空气分配器45、控制对于空气分配器45的空气供给量的空气控制阀46和控制对于真空吸附源50的空气供给量的空气控制阀47。各空气控制阀42、46、47的开闭动作是由控制单元30控制的。Here, as shown in FIG. 5 , the air supply source 40 is configured to have an air supply passage 41 , an air control valve 42 , and an air supply pipe 43 , and is configured to further include an air supply passage 44 for supplying air to the vacuum suction source 50 . An air distributor 45 that distributes air to the air supply passages 41 , 44 , an air control valve 46 that controls the air supply amount to the air distributor 45 , and an air control valve 47 that controls the air supply amount to the vacuum suction source 50 . The opening and closing operations of the air control valves 42 , 46 , 47 are controlled by the control unit 30 .

真空吸附源50是通过从空气供给通道44供给的空气而生成负压的所谓的喷射器。真空吸附源50具有空气吸附通道51、载置空气逆流的逆止阀52、连接于接触式吸附保持器15的空气吸附配管53。空气吸附配管53与空气供给配管43同样地为柔软的配管。空气吸附配管53中插入有连接部16e,在插入有连接部16e的部分的空气吸附配管53的外周紧缚捆束带等,从而使得空气吸附通道51与空气通路部16f连通。亦即,空气吸附配管53经由连接部16e而与吸盘15a连通。The vacuum suction source 50 is a so-called ejector that generates negative pressure by air supplied from the air supply passage 44 . The vacuum suction source 50 has an air suction passage 51 , a check valve 52 through which air is flowed backward, and an air suction pipe 53 connected to the contact suction holder 15 . The air suction pipe 53 is a flexible pipe like the air supply pipe 43 . The connection part 16e is inserted into the air suction pipe 53, and the outer periphery of the air suction pipe 53 where the connection part 16e is inserted is fastened with a band, so that the air suction channel 51 communicates with the air passage part 16f. That is, the air suction pipe 53 communicates with the suction pad 15a via the connection portion 16e.

接着,说明如上构成的搬运装置1-2的动作。图8是表示第2实施方式的搬运装置的动作的一例的流程图。这里,在本实施方式中,翘曲量超过规定量的板状物W例如是WL-CSP等能够实现接触式吸附保持器15的吸附保持的板状物。Next, the operation of the conveying device 1-2 configured as above will be described. FIG. 8 is a flowchart showing an example of the operation of the transport device according to the second embodiment. Here, in the present embodiment, the plate-shaped object W whose warpage exceeds a predetermined amount is, for example, a plate-shaped object that can be sucked and held by the contact suction holder 15 such as WL-CSP.

控制单元30通过回旋部23使保持单元10进行回旋,例如使保持单元10移动至在前工序中载置有板状物W的载置台的上方。这里,在搬运装置1-2的铅直方向上,保持单元10定位于载置台的上表面与翘曲量检测单元14的下端部14a的间隔为基准间隔(亦即规定间隔)的位置处。The control unit 30 swivels the holding unit 10 through the swivel part 23 , and moves the holding unit 10 above the mounting table on which the plate-like object W was placed in the previous process, for example. Here, the holding unit 10 is positioned at a position where the distance between the upper surface of the mounting table and the lower end portion 14a of the warpage detection unit 14 is a reference distance (that is, a predetermined distance) in the vertical direction of the conveyance device 1-2.

接着,控制单元30通过翘曲量检测单元14检测板状物W的翘曲量(步骤S11)。接着,控制单元30判定翘曲量是否在规定的量以下(步骤S12)。接着,控制单元30在判定为板状物W的翘曲量在规定的量以下(步骤S12:Yes)时,如图6所示,将接触式吸附保持器15定位于非作用位置处(步骤S13)。接着,控制单元30通过非接触式吸附保持器12保持板状物W(步骤S14)。接着,控制单元30将板状物W移动至卡盘台上,然后将板状物W载置于卡盘台上。Next, the control unit 30 detects the warpage amount of the plate-shaped object W by the warpage amount detection unit 14 (step S11 ). Next, the control unit 30 determines whether or not the amount of warping is equal to or less than a predetermined amount (step S12). Next, when the control unit 30 determines that the warpage amount of the plate-shaped object W is equal to or less than a predetermined amount (step S12: Yes), as shown in FIG. S13). Next, the control unit 30 holds the plate W by the non-contact suction holder 12 (step S14 ). Next, the control unit 30 moves the plate W to the chuck table, and then places the plate W on the chuck table.

此外,控制单元30在判定为板状物W的翘曲量并非规定的量以下(步骤S12:No)时,如图7所示,将接触式吸附保持器15定位于作用位置处(步骤S15)。接着,控制单元30通过接触式吸附保持器15保持板状物W(步骤S16)。这里,在搬运装置1-2中,接触式吸附保持器15在支撑基座部11上设置于比非接触式吸附保持器12靠内侧的位置处,因而板状物W的翘曲量小于外周侧的内周侧被吸盘15a吸附保持。In addition, when the control unit 30 determines that the amount of warping of the plate W is not equal to or less than the predetermined amount (step S12: No), as shown in FIG. ). Next, the control unit 30 holds the plate W by the contact suction holder 15 (step S16). Here, in the conveyance device 1-2, the contact suction holder 15 is provided on the support base portion 11 on the inner side of the non-contact suction holder 12, so the amount of warping of the plate W is smaller than that of the outer periphery. The inner peripheral side of the side is adsorbed and held by the suction pad 15a.

接着,控制单元30在将板状物W移动至卡盘台后,将板状物W载置于卡盘台上。这里,搬运装置1-2在通过升降部22将保持单元10下降至使得板状物W接触卡盘台之后,通过控制单元30关闭空气控制阀47。此外,在搬运装置1-2中,切断从空气供给源40对真空吸附源50的空气供给,作用于接触式吸附保持器15上的负压消失,解除接触式吸附保持器15对板状物W的吸附保持,板状物W被载置于卡盘台上。Next, the control unit 30 places the plate-shaped object W on the chuck table after moving the plate-shaped object W to the chuck table. Here, the transfer device 1 - 2 closes the air control valve 47 by the control unit 30 after the lifting unit 22 lowers the holding unit 10 so that the plate-shaped object W contacts the chuck table. In addition, in the transport device 1-2, the air supply from the air supply source 40 to the vacuum suction source 50 is cut off, the negative pressure acting on the contact suction holder 15 disappears, and the contact suction holder 15 releases the pressure on the plate-shaped object. W is adsorbed and held, and the plate-shaped object W is placed on the chuck table.

如上,根据第2实施方式的板状物的搬运装置1-2,在交替地搬运各个盒中的平坦的板状物(翘曲量在规定量以下的板状物(例如一般的半导体晶片等))和弯曲的板状物(翘曲量超过规定量的板状物(例如WL-CSP等)),或者在同一盒内混合存在该两种板状物的情况下,按照板状物W的翘曲量,由选择单元16将接触式吸附保持器15的位置切换为作用位置和非作用位置,因此能够不停滞地搬运板状物W。因此,根据第2实施方式的板状物的搬运装置1-2,能够实现板状物W的高效搬运,并且能够对应于种类广泛的板状物W。As above, according to the conveying device 1-2 of the plate-shaped object of the second embodiment, the flat plate-shaped objects (the plate-shaped objects with the amount of warping less than a predetermined amount (for example, general semiconductor wafers, etc.) in each cassette are alternately conveyed. )) and bent plates (plates whose warpage exceeds the specified amount (such as WL-CSP, etc.)), or when the two kinds of plates are mixed in the same box, the plate W The position of the contact suction holder 15 is switched between the active position and the non-active position by the selection unit 16, so that the plate-shaped object W can be conveyed without stagnation. Therefore, according to the conveyance apparatus 1-2 of a plate-shaped object which concerns on 2nd Embodiment, efficient conveyance of the plate-shaped object W can be realized, and it can cope with a wide variety of plate-shaped objects W.

此外,根据第2实施方式的板状物的搬运装置1-2,通过选择单元16,能够切换基于非接触式吸附保持器12的吸附保持和基于接触式吸附保持器15的吸附保持。亦即,根据第2实施方式的板状物的搬运装置1-2,不必进行用于更换非接触式吸附保持器12与接触式吸附保持器15的作业(更换作业),就能够切换非接触式吸附保持器12和接触式吸附保持器15。因此,根据第2实施方式的板状物的搬运装置1-2,能够提升更换(即切换)非接触式吸附保持器12与接触式吸附保持器15时的效率。In addition, according to the conveying device 1 - 2 of the plate-like object of the second embodiment, the selection unit 16 can switch between suction and holding by the non-contact suction holder 12 and suction and holding by the contact suction holder 15 . That is, according to the conveying device 1-2 of the plate-like object of the second embodiment, it is possible to switch the non-contact suction holder 12 and the contact suction holder 15 without performing an operation (replacement operation). Type adsorption holder 12 and contact type adsorption holder 15. Therefore, according to the conveyance apparatus 1 - 2 of the plate-shaped object of 2nd Embodiment, the efficiency at the time of exchanging (that is, switching) the non-contact type adsorption|suction holder 12 and the contact type adsorption|suction holder 15 can be improved.

〔第3实施方式〕[Third embodiment]

接着,参照附图说明第3实施方式的切削装置100。图9是表示第3实施方式的切削装置的结构例的图。Next, a cutting device 100 according to a third embodiment will be described with reference to the drawings. FIG. 9 is a diagram showing a configuration example of a cutting device according to a third embodiment.

切削装置100是对板状物W实施切削加工的装置。如图9所示,切削装置100构成为具有盒载置台110、卡盘台120、切削单元130、清洗单元140、保持手150、第一搬运单元160和第二搬运单元170。The cutting device 100 is a device for cutting a plate-shaped object W. As shown in FIG. As shown in FIG. 9 , cutting device 100 is configured to include cartridge mounting table 110 , chuck table 120 , cutting unit 130 , cleaning unit 140 , holding hand 150 , first conveying unit 160 , and second conveying unit 170 .

盒载置台110用于载置收容多个板状物的盒111。盒载置台110是将盒111以能够在铅直方向上升降的方式支撑于装置主体101上的所谓的盒升降机。The cassette mounting table 110 is used to mount a cassette 111 for accommodating a plurality of plate-shaped objects. The cassette mounting table 110 is a so-called cassette lifter that supports the cassette 111 on the apparatus main body 101 so as to be vertically movable.

卡盘台120使用保持面120a保持板状物W。卡盘台120支撑于X轴移动基座121上。保持面120a为卡盘台120的铅直方向上的上端面,且相对于水平面平坦地形成。保持面120a与未图示的真空吸附源连通,并凭借真空吸附源的负压吸附保持板状物。X轴移动基座121通过构成为具有脉冲电动机和滚珠丝杠等的X轴移动单元,能够相对于装置主体101在X轴方向(相当于加工进给方向)上相对移动。The chuck table 120 holds the plate W using the holding surface 120a. The chuck table 120 is supported on the X-axis moving base 121 . The holding surface 120a is an upper end surface in the vertical direction of the chuck table 120, and is formed flat with respect to the horizontal plane. The holding surface 120a communicates with an unillustrated vacuum suction source, and sucks and holds the plate-shaped object by the negative pressure of the vacuum suction source. The X-axis moving base 121 can relatively move in the X-axis direction (corresponding to the machining feed direction) with respect to the apparatus main body 101 by being configured as an X-axis moving unit including a pulse motor, a ball screw, and the like.

切削单元130使用切削刀131而对保持于卡盘台120上的板状物W进行切削。切削单元130具有切削刀131、主轴132和外壳133。切削刀131是形成为极薄的圆板状且呈环状的切削磨石。主轴132以能够拆装的方式装配切削刀131。外壳133具有电动机等的驱动源,且以能够绕Y轴方向的旋转轴自由旋转的方式支撑主轴132。外壳133被Y轴移动基座134和Z轴移动基座135支撑。Y轴移动基座134通过构成为具有脉冲电动机和滚珠丝杠等的Y轴移动单元,而能够相对于装置主体101在Y轴方向(相对于分度进给方向)上相对移动。Y轴移动基座134支撑于从装置主体101起直立设置的门型的支撑基座102上,其支撑着Z轴移动基座135。Z轴移动基座135通过构成为具有脉冲电动机和滚珠丝杠等的Z轴移动单元,能够相对于装置主体101在Z轴方向(相当于切入进给方向)上相对移动。Z轴移动基座135支撑于Y轴移动基座134上,其支撑着外壳133。The cutting unit 130 cuts the plate W held on the chuck table 120 using the cutting blade 131 . The cutting unit 130 has a cutting blade 131 , a spindle 132 and a housing 133 . The cutting blade 131 is a circular cutting grindstone formed in an extremely thin disk shape. The main shaft 132 is detachably attached to the cutting blade 131 . The casing 133 has a driving source such as a motor, and supports the main shaft 132 so as to be rotatable around a rotation axis in the Y-axis direction. The casing 133 is supported by a Y-axis movement base 134 and a Z-axis movement base 135 . The Y-axis moving base 134 can relatively move in the Y-axis direction (with respect to the index feed direction) with respect to the apparatus main body 101 by being configured as a Y-axis moving unit including a pulse motor, a ball screw, and the like. The Y-axis movement base 134 is supported on the door-shaped support base 102 erected from the apparatus main body 101 , and supports the Z-axis movement base 135 . The Z-axis moving base 135 can move relative to the apparatus body 101 in the Z-axis direction (corresponding to the cutting feed direction) by being configured as a Z-axis moving unit including a pulse motor, a ball screw, and the like. The Z-axis moving base 135 is supported on the Y-axis moving base 134 , which supports the housing 133 .

清洗单元140使用清洗台141保持并清洗被切削单元130切削的板状物W。清洗单元140具有与卡盘台120同样地吸附保持板状物W的清洗台141、以及在清洗时对板状物W喷射纯水等清洗水,而在干燥时对板状物W喷射空气等的未图示的喷射喷嘴。The cleaning unit 140 holds and cleans the plate-shaped object W cut by the cutting unit 130 using the cleaning table 141 . The cleaning unit 140 has a cleaning table 141 that absorbs and holds the plate-shaped object W similarly to the chuck table 120, sprays cleaning water such as pure water on the plate-shaped object W during cleaning, and sprays air or the like on the plate-shaped object W during drying. unillustrated spray nozzles.

保持手150将板状物W对于在盒载置台110上载置的盒111进行搬入搬出。保持手150支撑板状物W的下表面Wb,从而保持板状物W。保持手150将从盒111拉出的(搬出的)板状物W转交给第一搬运单元160,并从第二搬运单元170收取板状物W(清洗、干燥后的板状物W)并收容(搬入)到盒111中。The holding hand 150 carries the plate W into and out of the cassette 111 placed on the cassette mounting table 110 . The holding hand 150 supports the lower surface Wb of the plate W so that the plate W is held. The holding hand 150 transfers the (exported) plate W pulled out from the box 111 to the first conveying unit 160, and picks up the plate W (cleaned and dried plate W) from the second conveying unit 170, and It is accommodated (carried in) in the box 111 .

第一搬运单元160在切削装置100中构成与第二搬运单元170一起搬运板状物W的搬运单元,其是与第二搬运单元170一起工作(协作),从而在保持手150与卡盘台120与清洗台141之间搬运板状物W的板状物的搬运装置。在本实施方式中,第一搬运单元160吸附保持从保持手150收取的板状物W并将其搬运至卡盘台120的保持面120a上。第一搬运单元160是具有保持板状物W的保持单元161、以及移动保持单元161的移动单元162的板状物的搬运装置。亦即,第一搬运单元160是与第1实施方式的搬运装置1-1或第2实施方式的搬运装置1-2同样构成的搬运装置。The first conveying unit 160 constitutes a conveying unit that conveys the plate-shaped object W together with the second conveying unit 170 in the cutting device 100, and it works (cooperates) with the second conveying unit 170, so that 120 and the cleaning table 141 is a conveying device for conveying the plate-shaped object W. In this embodiment, the first transport unit 160 absorbs and holds the plate-shaped object W picked up from the holding hand 150 and transports it to the holding surface 120 a of the chuck table 120 . The first conveyance unit 160 is a conveyance device for a plate-shaped object including a holding unit 161 for holding the plate-shaped object W and a moving unit 162 for moving the holding unit 161 . That is, the first conveyance unit 160 is a conveyance device configured similarly to the conveyance device 1 - 1 of the first embodiment or the conveyance device 1 - 2 of the second embodiment.

保持单元161是与第1实施方式的搬运装置1-1的保持单元10或第2实施方式的搬运装置1-2的保持单元10同样构成的保持单元。保持单元161与第1实施方式的搬运装置1-1的保持单元10同样构成的情况下,具有支撑基座部11、非接触式吸附保持器12、限制单元13、翘曲量检测单元14,而与第2实施方式的搬运装置1-2同样构成的情况下,还具有接触式吸附保持器15、选择单元16。保持单元161对于从盒111中拉出且保持于保持手150上的板状物W,使用翘曲量检测单元14检测翘曲量检测单元14的下端部14a与板状物W的上表面Wa的间隔D。移动单元162具有未图示的电动机等的驱动源,使保持单元161相对于装置主体101在Y轴方向和Z轴方向上相对移动。移动单元162支撑于从装置主体101起直立设置的支撑基座103上,其支撑保持单元161。移动单元162具有连接于保持单元161的臂部162a。臂部162a从移动单元162起在铅直方向的下方延伸。在臂部162a的铅直方向的下端,一体地设有安装于支撑基座部11的上表面11a上的连结部21a(参照图1或图5)。The holding unit 161 is a holding unit configured similarly to the holding unit 10 of the conveyance device 1 - 1 of the first embodiment or the holding unit 10 of the conveyance device 1 - 2 of the second embodiment. When the holding unit 161 has the same configuration as the holding unit 10 of the conveying device 1-1 of the first embodiment, it includes the support base portion 11, the non-contact suction holder 12, the restricting unit 13, and the warpage detection unit 14, On the other hand, when configured in the same manner as the conveyance device 1 - 2 of the second embodiment, a contact suction holder 15 and a selection unit 16 are further provided. The holding unit 161 detects the lower end portion 14 a of the warping amount detecting unit 14 and the upper surface Wa of the plate W on the plate W pulled out from the cassette 111 and held on the holding hand 150 using the warpage detection unit 14 . The interval D. The moving unit 162 has a driving source such as a motor (not shown), and moves the holding unit 161 relative to the device main body 101 in the Y-axis direction and the Z-axis direction. The moving unit 162 is supported on a support base 103 standing upright from the device main body 101 , which supports the holding unit 161 . The moving unit 162 has an arm portion 162 a connected to the holding unit 161 . The arm portion 162 a extends vertically downward from the moving unit 162 . A connecting portion 21a attached to the upper surface 11a of the support base portion 11 is integrally provided at the lower end in the vertical direction of the arm portion 162a (see FIG. 1 or FIG. 5 ).

第二搬运单元170在切削装置100中与第一搬运单元160一起构成搬运板状物W的搬运单元,其是与第一搬运单元160一起工作(协作),从而在保持手150与卡盘台120与清洗台141之间搬运板状物W的板状物的搬运装置。在本实施方式中,第二搬运单元170从卡盘台120起吸附保持被切削的板状物W并将其搬运至清洗台141上,并且从清洗台141起吸附保持被清洗、干燥的板状物W并将其搬运至保持手150。第二搬运单元170是具有保持板状物W的保持单元171、以及移动保持单元171的移动单元172的板状物的搬运装置。亦即,第二搬运单元170是与第1实施方式的搬运装置1-1或第2实施方式的搬运装置1-2同样构成的搬运装置。The second conveying unit 170 constitutes a conveying unit for conveying the plate-shaped object W together with the first conveying unit 160 in the cutting device 100, and it works (cooperates) with the first conveying unit 160 so that the holding hand 150 and the chuck table 120 and the cleaning table 141 is a conveying device for conveying the plate-shaped object W. In this embodiment, the second transfer unit 170 absorbs and holds the cut plate-shaped object W from the chuck table 120 and transports it to the cleaning table 141 , and absorbs and holds the cleaned and dried plate from the cleaning table 141 . The object W is transported to the holding hand 150. The second conveyance unit 170 is a conveyance device for a plate-shaped object including a holding unit 171 for holding the plate-shaped object W and a moving unit 172 for moving the holding unit 171 . That is, the second conveyance unit 170 is a conveyance device configured similarly to the conveyance device 1 - 1 of the first embodiment or the conveyance device 1 - 2 of the second embodiment.

保持单元171是与第1实施方式的搬运装置1-1的保持单元10或第2实施方式的搬运装置1-2的保持单元10同样构成的保持单元。保持单元171与第1实施方式的搬运装置1-1的保持单元10同样构成的情况下,具有支撑基座部11、非接触式吸附保持器12、限制单元13、翘曲量检测单元14,而与第2实施方式的搬运装置1-2同样构成的情况下,还具有接触式吸附保持器15和选择单元16。移动单元172具有未图示的电动机等的驱动源,使保持单元171相对于装置主体101在Y轴方向和Z轴方向上相对移动。移动单元172支撑于支撑基座103,其支撑保持单元171。移动单元172具有连接于保持单元171上的臂部172a。臂部172a从移动单元172起在铅直方向的下方延伸。在臂部172a的铅直方向的下端,一体地设有安装于支撑基座部11的上表面11a上的连结部21a(参照图1或图5)。另外,在本实施方式中,保持单元171搬运被切削单元130切削而平坦化的板状物W(例如翘曲量在规定量以下的板状物W),因而可以按照需要设置翘曲量检测单元14。The holding unit 171 is a holding unit configured similarly to the holding unit 10 of the conveying device 1 - 1 of the first embodiment or the holding unit 10 of the conveying device 1 - 2 of the second embodiment. When the holding unit 171 has the same configuration as the holding unit 10 of the transport device 1-1 of the first embodiment, it includes the support base portion 11, the non-contact suction holder 12, the limiting unit 13, and the warpage detection unit 14, On the other hand, when configured in the same manner as the conveyance device 1 - 2 of the second embodiment, the contact suction holder 15 and the selection unit 16 are further provided. The moving unit 172 has a driving source such as a motor (not shown), and moves the holding unit 171 relative to the apparatus main body 101 in the Y-axis direction and the Z-axis direction. The moving unit 172 is supported on the supporting base 103 , which supports the holding unit 171 . The moving unit 172 has an arm portion 172 a connected to the holding unit 171 . The arm portion 172a extends vertically downward from the moving unit 172 . A connecting portion 21a attached to the upper surface 11a of the support base portion 11 is integrally provided at the lower end in the vertical direction of the arm portion 172a (see FIG. 1 or FIG. 5 ). In addition, in the present embodiment, the holding unit 171 transports the flattened plate-shaped object W (for example, a plate-shaped object W whose warpage amount is less than or equal to a predetermined amount) cut by the cutting unit 130 , so warpage detection can be provided as necessary. Unit 14.

接着,说明如上构成的切削装置100的动作。另外,在本实施方式中,预先通过翘曲量检测单元14,检测保持手150与翘曲量检测单元14的基准间隔,并测量收容于盒111中的板状物W的厚度,或由作业人员输入板状物W的厚度。此外,在本实施方式中,翘曲量超过规定量的板状物W是例如WL-CSP等能够实现接触式吸附保持器15的吸附保持的板状物。Next, the operation of the cutting device 100 configured as above will be described. In addition, in the present embodiment, the reference distance between the holding hand 150 and the warpage detection unit 14 is detected in advance by the warpage detection unit 14, and the thickness of the plate-shaped object W accommodated in the box 111 is measured, or the thickness of the plate-shaped object W stored in the box 111 is measured. The person inputs the thickness of the sheet W. In addition, in the present embodiment, the plate-shaped object W whose warpage exceeds a predetermined amount is, for example, a plate-shaped object that can be sucked and held by the contact-type suction holder 15 such as WL-CSP.

切削装置100根据例如作业人员对切削加工的指示输入,由保持手150从盒111中拉出板状物W,并转交给第一搬运单元160。这里,在切削装置100中,通过翘曲量检测单元14检测翘曲量检测单元14的下端部14a与板状物W的上表面Wa之间的间隔D,如果板状物W的翘曲量在规定的量以下则通过非接触式吸附保持器12吸附保持板状物W,而如果板状物W的翘曲量超过规定的量则通过接触式吸附保持器15吸附保持板状物W。The cutting device 100 pulls out the plate-like object W from the cassette 111 by the holding hand 150 according to, for example, an operator's instruction input for cutting processing, and transfers it to the first conveying unit 160 . Here, in the cutting device 100, the distance D between the lower end portion 14a of the warpage detection unit 14 and the upper surface Wa of the plate-shaped object W is detected by the warpage amount detection unit 14. If the warpage amount of the plate-shaped object W The non-contact adsorption holder 12 absorbs and holds the plate W below a predetermined amount, and the contact type adsorption holder 15 absorbs and holds the plate W if the warpage of the plate W exceeds a predetermined amount.

切削装置100在通过第一搬运单元160将板状物W搬运至卡盘台120之后,将板状物W载置于卡盘台120上。这里,切削装置100通过保持面120a将板状物W吸附保持于卡盘台120上。In the cutting device 100 , the plate-shaped object W is placed on the chuck table 120 after the plate-shaped object W is conveyed to the chuck table 120 by the first conveying unit 160 . Here, the cutting device 100 suction-holds the plate-shaped object W on the chuck table 120 via the holding surface 120a.

切削装置100对切削刀131喷射切削水,在吸附保持于卡盘台120上的板状物W上,使切削刀131在预先设定的切削部位上切入,从而实施切削加工。The cutting device 100 jets cutting water to the cutting blade 131 , and cuts the cutting blade 131 into a predetermined cutting portion on the plate-shaped object W adsorbed and held on the chuck table 120 to perform cutting.

切削装置100通过第二搬运单元170从卡盘台120上吸附保持被实施了切削加工的板状物W,在将板状物W搬运至清洗台141之后,将板状物W载置于清洗台141上。这里,在切削装置100中,如果被实施切削加工而平坦化的板状物W例如具有重量而能够接触上表面Wa的情况下,通过接触式吸附保持器15吸附保持板状物W。The cutting device 100 absorbs and holds the cut plate W from the chuck table 120 by the second conveying unit 170 , and after transporting the plate W to the cleaning station 141 , places the plate W on the cleaning table 141 . On stage 141. Here, in the cutting device 100 , if the plate-shaped object W that has been cut and flattened has weight and can contact the upper surface Wa, the plate-shaped object W is sucked and held by the contact suction holder 15 .

清洗单元140通过清洗台141吸附保持板状物W并使其高速地进行旋转,在对板状物W喷射清洗水进行清洗之后,对板状物W喷射空气使其进行干燥,并停止清洗台141的旋转。The cleaning unit 140 absorbs and holds the plate-shaped object W by the cleaning table 141 and rotates it at a high speed. After cleaning the plate-shaped object W by spraying washing water, it dries the plate-shaped object W by spraying air and stops the cleaning table. 141 spins.

切削装置100通过第二搬运单元170从清洗台141上吸附保持被清洗、干燥后的板状物W,在将板状物W搬运至保持手150之后,将板状物W转交给保持手150。The cutting device 100 absorbs and holds the cleaned and dried plate-shaped object W from the cleaning table 141 through the second conveying unit 170 , and transfers the plate-shaped object W to the holding hand 150 after conveying the plate-shaped object W to the holding hand 150 .

切削装置100使用保持手150将被转交的板状物W收容于盒111中,从而结束对板状物W的加工动作。The cutting device 100 uses the holding hand 150 to store the transferred plate-shaped object W in the box 111, and ends the processing operation on the plate-shaped object W.

如上,根据第3实施方式的切削装置100,除了上述第1实施方式的搬运装置1-1的效果和第2实施方式的搬运装置1-2的效果之外,还能够通过第一搬运单元160和第二搬运单元170,搬运翘曲量不同的板状物W,因此在混合存在翘曲量不同的板状物W时,可获得能够对板状物W实施切削加工的效果。As described above, according to the cutting device 100 of the third embodiment, in addition to the effects of the conveying device 1 - 1 of the first embodiment and the effect of the conveying device 1 - 2 of the second embodiment, the first conveying unit 160 can Since the plate-shaped objects W with different warpage amounts are conveyed with the second conveying unit 170 , when the plate-shaped objects W with different warpage amounts are mixed, the effect of cutting the plate-shaped objects W can be obtained.

另外,在上述第1、第2实施方式中,作为用于检测板状物W的翘曲量的基准,将载置台的铅直方向上的上表面与翘曲量检测单元14的下端部14a之间的间隔作为基准间隔,然而不限于此,例如也可以是其他搬运单元、盒等作为基准的结构。In addition, in the above-mentioned first and second embodiments, as a reference for detecting the amount of warpage of the plate-shaped object W, the distance between the upper surface in the vertical direction of the mounting table and the lower end portion 14a of the warpage amount detection unit 14 is set as a reference. The distance between them is used as a reference distance, but it is not limited to this, and for example, other conveyance units, boxes, etc. may be used as a reference structure.

此外,在上述第2实施方式中,通过选择单元16的致动器将接触式吸附保持器15的位置定位于作用位置和非作用位置处,然而也可以在轴部16d的外周形成外螺纹,在插通孔16g形成与外螺纹螺合的内螺纹,使选择单元16绕轴部16d的铅直方向的轴线旋转,从而将接触式吸附保持器15定位于作用位置和非作用位置处。这种情况下,空气吸附通道51优选具有旋转机构,该旋转机构以不会随着轴部16d的旋转而扭转的方式,追随轴部16d的旋转而进行旋转。In addition, in the above-mentioned second embodiment, the position of the contact suction holder 15 is positioned at the active position and the non-active position by the actuator of the selection unit 16, but an external thread may be formed on the outer periphery of the shaft portion 16d, An internal thread screwed with an external thread is formed in the insertion hole 16g, and the selector unit 16 is rotated around the vertical axis of the shaft portion 16d to position the contact adsorption holder 15 at the active position and the non-active position. In this case, the air adsorption duct 51 preferably has a rotation mechanism that follows the rotation of the shaft portion 16d so as not to be twisted as the shaft portion 16d rotates.

此外,在上述第2、第3实施方式中,在板状物W的翘曲量超过规定的量的情况下,通过接触式吸附保持器15吸附保持板状物W并搬运,而例如在超过了允许通过接触式吸附保持器15吸附保持板状物W的翘曲量的情况下,可以中止板状物W的搬运。这种情况下,优选使翘曲量超过规定的量的板状物W返回到盒的下段,或收容于其他的盒中,从而易于与其他板状物W区分。In addition, in the above-mentioned second and third embodiments, when the amount of warping of the plate-shaped object W exceeds a predetermined amount, the plate-shaped object W is sucked and held by the contact suction holder 15 and transported. When the amount of warping of the plate-shaped object W is allowed to be sucked and held by the contact suction holder 15, the conveyance of the plate-shaped object W may be stopped. In this case, it is preferable to return the plate-shaped object W whose warpage exceeds a predetermined amount to the lower stage of the box or store it in another box so that it can be easily distinguished from other plate-shaped objects W.

此外,在上述第3实施方式中,在板状物W的翘曲量超过规定量的情况下,通过接触式吸附保持器15吸附保持板状物W并搬运,而例如也可以对不优选采用基于切削单元130的切削加工的翘曲量的板状物W中止切削加工。这种情况下,通过中止不优选的切削加工,从而能够高效运用切削装置100。In addition, in the above-mentioned third embodiment, when the warping amount of the plate-shaped object W exceeds a predetermined amount, the plate-shaped object W is sucked and held by the contact suction holder 15 and transported, but for example, it is also possible to use The cutting process of the plate-shaped object W due to the amount of warpage of the cutting process by the cutting unit 130 is stopped. In this case, the cutting device 100 can be efficiently operated by stopping the unfavorable cutting process.

此外,在上述第3实施方式中,具有板状物的搬运装置(搬运装置1-1或1-2)的加工装置是对板状物W的上表面Wa实施切削加工的切削装置100,然而不限于此,例如,既可以是切削板状物W的边缘(周缘)的所谓的实施边缘修整加工的边缘修整切片机,也可以是通过切削装置100实施边缘修整的结构。In addition, in the above-mentioned third embodiment, the processing device having the conveying device (conveying device 1-1 or 1-2) of the plate-shaped object is the cutting device 100 for performing cutting processing on the upper surface Wa of the plate-shaped object W, however Not limited thereto, for example, a so-called edge trimming slicer that cuts the edge (peripheral edge) of the plate W may be used, or may be configured to perform edge trimming by the cutting device 100 .

此外,在上述第1~第3实施方式3中,针对的是板状物W的翘曲从中心侧起朝向外周侧且在铅直方向的上方凸出的翘曲,而例如也可以是从外周侧起朝向中心侧且在铅直方向的上方凸出的翘曲。In addition, in the above-mentioned first to third embodiments 3, the warping of the plate-shaped object W is directed toward the outer peripheral side from the center side and the warpage is convex upward in the vertical direction, and for example, it may be from the The outer peripheral side is warped toward the center side and protrudes upward in the vertical direction.

此外,在上述第1~第3实施方式中,在支撑基座部11的周方向上配置了3个翘曲量检测单元14,而只要能够检测板状物W的上表面Wa的周方向上的多个翘曲量即可,因此不限于上述情况,例如可以将1个翘曲量检测单元14设置于支撑基座部11上,使支撑基座部11绕铅直方向的轴线旋转,并检测板状物W的翘曲量。这种情况下,能够连续检测板状物W的上表面Wa的周方向的翘曲量。此外,翘曲量检测单元14可以设置于非接触式吸附保持器12的外周侧。这种情况下,能够以翘曲量较大的板状物W的外周附近作为对象测定翘曲量。In addition, in the above-mentioned first to third embodiments, the three warpage detection units 14 are arranged in the circumferential direction of the support base part 11, and as long as the detection means can detect the upper surface Wa of the plate-shaped object W in the circumferential direction It is not limited to the above-mentioned cases. For example, one warpage detection unit 14 may be provided on the support base part 11, and the support base part 11 may be rotated around the axis in the vertical direction, and The amount of warping of the plate W is detected. In this case, the amount of warpage in the circumferential direction of the upper surface Wa of the plate-shaped object W can be continuously detected. In addition, the warpage amount detection unit 14 may be provided on the outer peripheral side of the non-contact suction holder 12 . In this case, the amount of warping can be measured for the vicinity of the outer periphery of the plate-shaped object W having a large amount of warping.

Claims (3)

1.一种板状物的搬运装置,该搬运装置具有:保持板状物的保持单元;以及使所述保持单元从规定的位置起移动至卡盘台的移动单元,其中,1. A conveying device for a plate-shaped object, the conveying device having: a holding unit for holding a plate-shaped object; and a moving unit for moving the holding unit from a predetermined position to a chuck table, wherein, 所述保持单元具有:The holding unit has: 支撑基座部,其与所述移动单元连结;a support base portion coupled to the mobile unit; 非接触式吸附保持器,其配设于所述支撑基座部的下表面,喷出空气,从而生成负压,且该非接触式吸附保持器以非接触的方式对板状物的上表面进行吸附保持;A non-contact adsorption holder is arranged on the lower surface of the support base, blows out air to generate a negative pressure, and the non-contact adsorption holder acts on the upper surface of the plate in a non-contact manner. Carry out adsorption and retention; 限制单元,其在所述支撑基座部的下表面配设于所述板状物的外周区域,对保持于所述非接触式吸附保持器上的所述板状物的水平移动进行限制;以及a restricting unit disposed on the outer peripheral region of the plate on the lower surface of the support base portion, and restricts the horizontal movement of the plate held on the non-contact adsorption holder; as well as 翘曲量检测单元,其检测所搬运的板状物的翘曲量,a warpage detection unit that detects the warpage of the conveyed plate, 在板状物的翘曲量为规定的量以下的情况下,该搬运装置通过所述非接触式吸附保持器吸附并搬运。When the amount of warpage of the plate-shaped object is less than or equal to a predetermined amount, the conveying device absorbs and conveys the plate-shaped object by the non-contact adsorption holder. 2.根据权利要求1所述的板状物的搬运装置,其中,2. The conveying device for a plate-shaped object according to claim 1, wherein: 所述保持单元还具有:The holding unit also has: 接触式吸附保持器,其配设于所述支撑基座部的下表面,且接触板状物的上表面而吸附保持该板状物;以及a contact-type adsorption holder, which is arranged on the lower surface of the support base part, and contacts the upper surface of the plate-shaped object to absorb and hold the plate-shaped object; and 选择单元,其将所述接触式吸附保持器和所述非接触式吸附保持器中的一个定位于接近板状物的作用位置处,将另一个定位于离开了板状物的非作用位置处。a selection unit that positions one of the contact suction holder and the non-contact suction holder at an active position close to the plate, and positions the other at an inactive position away from the plate . 3.一种切削装置,其具有:保持板状物的卡盘台;以及通过切削刀对保持于所述卡盘台上的板状物进行切削的切削单元,其中,3. A cutting device comprising: a chuck table for holding a plate; and a cutting unit for cutting the plate held on the chuck table with a cutting blade, wherein, 该切削装置还具有:盒载置台,其对收容多个板状物的盒进行载置;清洗单元,其通过清洗台保持并清洗被切削后的板状物;保持手,其对于载置到所述盒载置台上的所述盒进行板状物的搬入搬出;以及搬运单元,其在所述保持手、所述卡盘台和所述清洗台之间搬运板状物,The cutting device also has: a box loading table, which places a box containing a plurality of plate-shaped objects; a cleaning unit, which holds and cleans the plate-shaped objects after being cut by the cleaning table; the cassette on the cassette mounting table carries out loading and unloading of the plate-shaped object; and a conveying unit that conveys the plate-shaped object between the holding hand, the chuck table, and the cleaning table, 所述搬运单元是权利要求1或2所述的板状物的搬运装置。The conveying unit is a conveying device for a plate-like object according to claim 1 or 2.
CN201510172448.6A 2014-04-15 2015-04-13 Transportation device and cutting device of plate-like object Pending CN105023867A (en)

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