CN104911642B - RE‑Ni‑Mo/GO纳米复合沉积液及制备方法和用途 - Google Patents
RE‑Ni‑Mo/GO纳米复合沉积液及制备方法和用途 Download PDFInfo
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- CN104911642B CN104911642B CN201510314625.XA CN201510314625A CN104911642B CN 104911642 B CN104911642 B CN 104911642B CN 201510314625 A CN201510314625 A CN 201510314625A CN 104911642 B CN104911642 B CN 104911642B
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- 230000008021 deposition Effects 0.000 title claims abstract description 58
- 229910003296 Ni-Mo Inorganic materials 0.000 title claims abstract description 35
- 239000002114 nanocomposite Substances 0.000 title claims abstract description 32
- 239000007788 liquid Substances 0.000 title claims abstract description 17
- 238000002360 preparation method Methods 0.000 title claims description 8
- 229910001209 Low-carbon steel Inorganic materials 0.000 claims abstract description 35
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910021389 graphene Inorganic materials 0.000 claims abstract description 20
- 239000012153 distilled water Substances 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 13
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims abstract description 11
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims abstract description 11
- 239000001509 sodium citrate Substances 0.000 claims abstract description 11
- 239000011684 sodium molybdate Substances 0.000 claims abstract description 11
- 235000015393 sodium molybdate Nutrition 0.000 claims abstract description 11
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 claims abstract description 11
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 claims abstract description 11
- 229940038773 trisodium citrate Drugs 0.000 claims abstract description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 9
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims description 9
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 239000000725 suspension Substances 0.000 claims description 5
- 238000002604 ultrasonography Methods 0.000 claims description 3
- 229910000831 Steel Inorganic materials 0.000 claims 4
- 229910052799 carbon Inorganic materials 0.000 claims 4
- 239000010959 steel Substances 0.000 claims 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- RZYKUPXRYIOEME-UHFFFAOYSA-N CCCCCCCCCCCC[S] Chemical compound CCCCCCCCCCCC[S] RZYKUPXRYIOEME-UHFFFAOYSA-N 0.000 claims 1
- 241000521257 Hydrops Species 0.000 claims 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 1
- 206010030113 Oedema Diseases 0.000 claims 1
- 239000004141 Sodium laurylsulphate Substances 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 239000011734 sodium Substances 0.000 claims 1
- 238000000151 deposition Methods 0.000 abstract description 52
- 239000002131 composite material Substances 0.000 abstract description 19
- 238000005260 corrosion Methods 0.000 abstract description 10
- 230000007797 corrosion Effects 0.000 abstract description 10
- RCEAADKTGXTDOA-UHFFFAOYSA-N OS(O)(=O)=O.CCCCCCCCCCCC[Na] Chemical compound OS(O)(=O)=O.CCCCCCCCCCCC[Na] RCEAADKTGXTDOA-UHFFFAOYSA-N 0.000 abstract 1
- 239000011859 microparticle Substances 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 25
- 150000002910 rare earth metals Chemical class 0.000 description 15
- 238000004070 electrodeposition Methods 0.000 description 10
- 238000000576 coating method Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- DDTIGTPWGISMKL-UHFFFAOYSA-N molybdenum nickel Chemical compound [Ni].[Mo] DDTIGTPWGISMKL-UHFFFAOYSA-N 0.000 description 7
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 6
- 235000011114 ammonium hydroxide Nutrition 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 235000019263 trisodium citrate Nutrition 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- HWGNBUXHKFFFIH-UHFFFAOYSA-I pentasodium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O HWGNBUXHKFFFIH-UHFFFAOYSA-I 0.000 description 3
- 235000019832 sodium triphosphate Nutrition 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000005518 electrochemistry Effects 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 230000036314 physical performance Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- -1 rare earth RE Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000011232 storage material Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
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CN105420775A (zh) * | 2015-12-31 | 2016-03-23 | 上海应用技术学院 | 一种在碳钢基体上制备La-Ni-Mo-W/GO复合沉积层的方法 |
CN105543912B (zh) * | 2016-02-15 | 2018-03-09 | 上海应用技术学院 | 一种在铜基体上制备复配表面活性剂/La‑Ni‑Mo‑W共沉积镀层的方法 |
CN106637158B (zh) * | 2016-12-27 | 2019-03-15 | 上海应用技术大学 | 一种Nd-Ni-Mo-P/Go化学复合沉积层及其制备方法 |
CN106906498A (zh) * | 2017-04-06 | 2017-06-30 | 上海电力学院 | 一种氧化石墨烯锌复合电镀溶液及其制备方法和应用 |
CN107630244B (zh) * | 2017-08-24 | 2020-06-19 | 南京理工大学 | 一种镍-改性石墨烯耐磨复合镀层的制备方法 |
CN109208044B (zh) * | 2018-11-05 | 2020-06-09 | 山东科技大学 | 一种层状仿生耐磨耐蚀减摩涂层及制备方法和应用 |
CN110629266B (zh) * | 2019-10-30 | 2020-10-16 | 贵州民族大学 | 一种具有自修复特性的超疏水不锈钢表面的制备方法 |
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KR20140092447A (ko) * | 2012-12-28 | 2014-07-24 | 주식회사 포스코 | 그래핀―금속 화합물의 코팅 방법 |
CN103938255A (zh) * | 2014-05-09 | 2014-07-23 | 浙江大学 | 一种镍-石墨烯复相的制备方法 |
CN103943226A (zh) * | 2014-05-09 | 2014-07-23 | 浙江大学 | 一种具有镍-石墨烯复相护层的电线电缆及其制备方法 |
CN104499032A (zh) * | 2014-12-30 | 2015-04-08 | 广西师范大学 | 一种用于在基材表面电镀形成Ni/石墨烯复合导热薄膜的镀液 |
CN104911652A (zh) * | 2015-04-16 | 2015-09-16 | 西南石油大学 | 一种镍钨石墨烯复合镀液、镀膜及其制备方法 |
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"Graphene–nickel composites";Da Kuang,et al.;《Applied Surface Science》;20130224;第273卷;第484-490页 * |
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Effective date of registration: 20190121 Address after: Room 3270, Building 1, 215 Union North Road, Fengxian District, Shanghai, 201417 Patentee after: Shanghai wisdom Medical Technology Service Co.,Ltd. Address before: 200235 No. 120, Xuhui District, Shanghai, Caobao Road Patentee before: Shanghai Institute of Technology |
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Effective date of registration: 20201204 Address after: No. 99, Lianhe North Road, Fengxian District, Shanghai, 201417 Patentee after: Kaihui Pharmaceutical (Shanghai) Co.,Ltd. Address before: 201417 Shanghai, United North Road, No. first, building 3270, Room 215, No. Patentee before: Shanghai wisdom Medical Technology Service Co.,Ltd. |
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Address after: Building 3, No. 99 Lianhe North Road, Fengxian District, Shanghai, 2014 Patentee after: Shanghai Boteng Zhituo Pharmaceutical Technology Co.,Ltd. Address before: No. 99, Lianhe North Road, Fengxian District, Shanghai, 201417 Patentee before: Kaihui Pharmaceutical (Shanghai) Co.,Ltd. |
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CP03 | Change of name, title or address |