CN104860549A - Electric heating conductive glass and manufacturing method thereof - Google Patents
Electric heating conductive glass and manufacturing method thereof Download PDFInfo
- Publication number
- CN104860549A CN104860549A CN201510188665.4A CN201510188665A CN104860549A CN 104860549 A CN104860549 A CN 104860549A CN 201510188665 A CN201510188665 A CN 201510188665A CN 104860549 A CN104860549 A CN 104860549A
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- CN
- China
- Prior art keywords
- glass
- conductive layer
- ito conductive
- sio
- ito
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- 239000011521 glass Substances 0.000 title claims abstract description 32
- 238000005485 electric heating Methods 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 239000005329 float glass Substances 0.000 claims abstract description 11
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000000746 purification Methods 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 abstract description 5
- 238000002834 transmittance Methods 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 12
- 229910052681 coesite Inorganic materials 0.000 abstract 6
- 229910052906 cristobalite Inorganic materials 0.000 abstract 6
- 239000000377 silicon dioxide Substances 0.000 abstract 6
- 235000012239 silicon dioxide Nutrition 0.000 abstract 6
- 229910052682 stishovite Inorganic materials 0.000 abstract 6
- 229910052905 tridymite Inorganic materials 0.000 abstract 6
- 230000008021 deposition Effects 0.000 abstract 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- 239000004973 liquid crystal related substance Substances 0.000 description 13
- 239000002253 acid Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 206010019133 Hangover Diseases 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
The invention provides an electric heating conductive glass and a manufacturing method thereof, and relates to the technical field of electric heating conductive glass plating. The glass comprises common float glass, an ITO conductive layer and a SiO2 film layer. The ITO conductive layer is plated on the surface of one side of the common float glass. The surface of the ITO conductive layer is covered by the SiO2 film layer. A zone with a width of 3-5mm on the edge of the ITO conductive layer is not covered by the SiO2 film layer, and the ITO conductive layer is exposed. The zone is used for manufacturing electrodes. According to the invention, the SiO2 film layer is prepared on the ITO conductive film layer, such that the ITO conductive film layer is not influenced by an application environment. With the combination of thicknesses of the film layers, an overall transmittance no lower than 80% is ensured; when the SiO2 film layer is being prepared, the periphery is shielded with a special shielding frame, such that no SiO2 deposition coverage is within the range of 3-5mm on the periphery, and the ITO conductive film layer on the edge is exposed for subsequent lead wire preparation processes.
Description
Technical field
The present invention relates to electrically heated conducting glass plated film technical field, particularly relate to a kind of electrically heated conductive glass and preparation method thereof.
Background technology
Liquid-crystal display obtains in recent years and develops fast, but envrionment temperature under the complex environments such as field scientific research, acid and alkali corrosion problems mandate are higher, all propose higher requirement to liquid crystal display product temperature profile, acid and alkali-resistance characteristic.Under the low-temperature condition of-30 DEG C, liquid crystal shows as crystal form, and the time of response of liquid crystal sharply increases, multidate information hangover is serious, this is due to when the temperature varies, and the movable energy of liquid crystal molecule changes, and the viscosity factor of corresponding liquid crystal material changes; When temperature height, the movable energy of liquid crystal molecule is high, and viscosity factor is little, and liquid crystal can press at a high speed direction of an electric field aligned twisted freely under electric field driven, and the response speed of indicating meter is accelerated; Equally, the movable energy dropoff of liquid crystal molecule when low temperature, viscosity factor becomes large, when applying electric field to liquid crystal molecule, the viscous resistance that liquid crystal molecule is subject to is comparatively large, need long time just can reach due distortion angle, therefore the response speed of indicating meter is slack-off.For ensureing that liquid crystal display can normally use, ITO conductive glass generally can be adopted to carry out heat treated to liquid crystal display.
Meanwhile, during field usage, environment is comparatively severe, and conductive layer to be easily subject in environment the impacts such as acid, alkali, and serious meeting causes film, affects heats.
Summary of the invention
The object of the present invention is to provide a kind of electrically heated conductive glass and preparation method thereof, to solve the problems of the technologies described above.For protection ITO conductive layer, the present invention covers one deck SiO on the ito layer
2, use shutter to retain 3-5mm region in edge simultaneously and do not cover, expose ITO conductive layer, for follow-up making electrode; Because ito film layer transmitance becomes Sine distribution with thickness increase, for ensureing heats, ITO resistance need lower than 5ohm, and light transmission need ensure that overall rete transmitance is greater than 80%, SiO
2sticking power>=5H.
Technical problem to be solved by this invention realizes by the following technical solutions:
A kind of electrically heated conductive glass, is characterized in that: comprise common float glass, ITO conductive layer and SiO
2rete, described ITO conductive layer is coated on a side surface of common float glass, described SiO
2rete covers ITO conductive layer surface, not by SiO in the region of the edge width 3-5mm of ITO conductive layer
2rete covers, and expose ITO conductive layer, this region is for making electrode.
ITO conductive layer and SiO
2the overall light transmission of rete is that transmitance is greater than 80%, ITO resistance conductive layer lower than 5ohm, SiO
2sticking power>=5H.
The thickness of ITO conductive layer is 4300 ±
siO
2rete is thick is 700 ±
A making method for electrically heated conductive glass, is characterized in that, concrete steps are as follows:
(1) on common float glass, ITO conductive layer is coated with, thicknesses of layers 4300 ±
substrate temperature 300-330 DEG C;
(2) glass being coated with ITO conductive layer is cleaned again, in environment purification, this glass is placed on backboard after cleaning, backboard and glass same size, thickness 2mm, material is stainless steel, and back plate edges and glass is contact part proper alignment magnet not, frame is blocked for fixing glass front portion, block size and glassy phase outside frame together, to block edge width 3-5mm, block frame is fixed on glass coating face edge by magnet;
(3) SiO is coated with
2rete, SiO
2thicknesses of layers 700 ±
substrate temperature 180-220 DEG C.
The invention has the beneficial effects as follows:
1) ITO conductive film layer makes one deck SiO
2rete, ensures that ITO conductive film layer does not affect by environment for use, and thicknesses of layers collocation simultaneously ensures overall permeation rate>=80%;
2) SiO is made
2during rete, surrounding uses the special frame that blocks to stop, ensures that edge 3-5mm is without SiO
2deposition covers, and spills edge ITO conductive film layer, for follow-up making lead-in wire.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
Fig. 2 is the transmittance curve figure of electrically heated conductive glass.
Embodiment
The technique means realized to make the present invention, creation characteristic, reaching object and effect is easy to understand, below in conjunction with specific embodiments and the drawings, set forth the present invention further, but following embodiment being only the preferred embodiments of the present invention, and not all.Based on the embodiment in embodiment, those skilled in the art under the prerequisite not making creative work obtain other embodiment, all belong to protection scope of the present invention.
A kind of electrically heated conductive glass and preparation method thereof,
As shown in Figure 1, electrically heated conductive glass comprises common float glass 1, ITO conductive layer 2 and SiO
2rete 3, ITO conductive layer 2 is coated on the surface of common float glass 1, SiO
2rete 3 covers ITO conductive layer 2 surface, not by SiO in the region of the edge width 3-5mm of ITO conductive layer 2
2rete 3 covers, and exposes ITO conductive layer 2, and this region is for making electrode.
The making method of electrically heated conductive glass,
1) first on float glass, make one deck ITO conductive layer, then be coated with one deck SiO on the surface being coated with ITO conductive layer
2rete, according to ITO conductive film layer 4300 ±
siO
2thickness 700 ±
carry out designing and being coated with, now transmitance can reach>=80% requirement, simultaneously SiO
2sticking power, shielding all can meet the demands, wherein ITO plated film time substrate temperature 300-330 DEG C, SiO
2plated film time substrate temperature 180-220 DEG C
2) SiO is made
2during rete, for making edge 3-5mm not by SiO
2cover, special frame (blocking frame) must be used in edge to stop, ensure that edge is without SiO
2deposition, spills ITO conductive layer and goes between for follow-up making.
As shown in Figure 2, electrically heated conductive glass 550nm place of the present invention transmitance can reach more than 80%.
More than show and describe ultimate principle of the present invention, principal character and advantage of the present invention.The technician of the industry should understand; the present invention is not restricted to the described embodiments; what describe in above-described embodiment and specification sheets is only preference of the present invention; be not used for limiting the present invention; without departing from the spirit and scope of the present invention; the present invention also has various changes and modifications, and these changes and improvements all fall in the claimed scope of the invention.Application claims protection domain is defined by appending claims and equivalent thereof.
Claims (4)
1. an electrically heated conductive glass, is characterized in that: comprise common float glass, ITO conductive layer and SiO
2rete, described ITO conductive layer is coated on a side surface of common float glass, described SiO
2rete covers ITO conductive layer surface, not by SiO in the region of the edge width 3-5mm of ITO conductive layer
2rete covers, and expose ITO conductive layer, this region is for making electrode.
2. electrically heated conductive glass according to claim 1, is characterized in that: ITO conductive layer and SiO
2the overall light transmission of rete is that transmitance is greater than 80%, ITO resistance conductive layer lower than 5ohm, SiO
2sticking power>=5H.
3. electrically heated conductive glass according to claim 1, is characterized in that: the thickness of ITO conductive layer is
siO
2rete is thick is
4. a making method for electrically heated conductive glass according to claim 1, it is characterized in that, concrete steps are as follows:
(1) on common float glass, ITO conductive layer is coated with, thicknesses of layers
substrate temperature 300-330 DEG C;
(2) glass being coated with ITO conductive layer is cleaned again, in environment purification, this glass is placed on backboard after cleaning, backboard and glass same size, thickness 2mm, material is stainless steel, and back plate edges and glass is contact part proper alignment magnet not, frame is blocked for fixing glass front portion, block size and glassy phase outside frame together, to block edge width 3-5mm, block frame is fixed on glass coating face edge by magnet;
(3) SiO is coated with
2rete, SiO
2thicknesses of layers
substrate temperature 180-220 DEG C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510188665.4A CN104860549A (en) | 2015-04-20 | 2015-04-20 | Electric heating conductive glass and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510188665.4A CN104860549A (en) | 2015-04-20 | 2015-04-20 | Electric heating conductive glass and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104860549A true CN104860549A (en) | 2015-08-26 |
Family
ID=53906792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510188665.4A Pending CN104860549A (en) | 2015-04-20 | 2015-04-20 | Electric heating conductive glass and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104860549A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105330174A (en) * | 2015-11-10 | 2016-02-17 | 东莞鑫泰玻璃科技有限公司 | A kind of conductive glass for kitchen that is convenient for degreasing and preparation method thereof |
| CN108901191A (en) * | 2018-07-17 | 2018-11-27 | 京东方科技集团股份有限公司 | Electromagnetic shielding component and display device |
| CN111455334A (en) * | 2020-04-23 | 2020-07-28 | 爱卓智能科技(上海)有限公司 | Method for manufacturing shielding layer conductive film for anti-glare rearview mirror |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070181249A1 (en) * | 2003-08-25 | 2007-08-09 | Casio Computer Co., Ltd. | Junction substrate and method of bonding substrates together |
| JP2008159534A (en) * | 2006-12-26 | 2008-07-10 | Nippon Electric Glass Co Ltd | Conductive frit material, transparent planar heater and electromagnetic wave shielding body |
| CN103281813A (en) * | 2013-05-20 | 2013-09-04 | Kmt纳米科技（香港）有限公司 | A nanocomposite microcrystalline electrothermal film and its preparation method |
| CN103570254A (en) * | 2012-07-31 | 2014-02-12 | 信义光伏产业(安徽)控股有限公司 | Conductive glass, as well as preparation method and application thereof |
-
2015
- 2015-04-20 CN CN201510188665.4A patent/CN104860549A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070181249A1 (en) * | 2003-08-25 | 2007-08-09 | Casio Computer Co., Ltd. | Junction substrate and method of bonding substrates together |
| JP2008159534A (en) * | 2006-12-26 | 2008-07-10 | Nippon Electric Glass Co Ltd | Conductive frit material, transparent planar heater and electromagnetic wave shielding body |
| CN103570254A (en) * | 2012-07-31 | 2014-02-12 | 信义光伏产业(安徽)控股有限公司 | Conductive glass, as well as preparation method and application thereof |
| CN103281813A (en) * | 2013-05-20 | 2013-09-04 | Kmt纳米科技（香港）有限公司 | A nanocomposite microcrystalline electrothermal film and its preparation method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105330174A (en) * | 2015-11-10 | 2016-02-17 | 东莞鑫泰玻璃科技有限公司 | A kind of conductive glass for kitchen that is convenient for degreasing and preparation method thereof |
| CN108901191A (en) * | 2018-07-17 | 2018-11-27 | 京东方科技集团股份有限公司 | Electromagnetic shielding component and display device |
| US10660247B2 (en) | 2018-07-17 | 2020-05-19 | Boe Technology Group Co., Ltd. | Electromagnetic shielding module and display device |
| CN111455334A (en) * | 2020-04-23 | 2020-07-28 | 爱卓智能科技(上海)有限公司 | Method for manufacturing shielding layer conductive film for anti-glare rearview mirror |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| EXSB | Decision made by sipo to initiate substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150826 |
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| RJ01 | Rejection of invention patent application after publication |