CN104808236A - Real-time monitoring device and method for injection dose of small-area ion beam radiation small sample - Google Patents
Real-time monitoring device and method for injection dose of small-area ion beam radiation small sample Download PDFInfo
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Abstract
本发明公开了一种小面积离子束辐照小样品注入剂量的实时监测装置及方法。本发明的监测装置包括：测束金属接收筒筒底、金属样品台、待辐照材料样品、测束金属接收筒、绝缘隔离圈、抑制电极、接线柱、束流积分仪和离子束调控装置。本发明将金属样品台与测束金属接收筒筒底有机结合为一体，实现了对小面积离子束辐照小样品注入剂量的实时在线准确监测；既避免了产生的二次电子对测量准确性的影响，又克服了拦截式测量不能实时在线监测辐照剂量的缺陷；抑制电极内的通束孔与金属样品台直径关联，可做成多种规格成对使用；入射离子束的束流强度在辐照过程中的起伏变化，不会影响到对最终辐照注入剂量的准确测量；方法简单明了，成本低，使用可靠。
The invention discloses a real-time monitoring device and method for small-area ion beam irradiation and small-sample injection dosage. The monitoring device of the present invention includes: the bottom of the beam measuring metal receiving cylinder, the metal sample table, the sample of the material to be irradiated, the measuring beam metal receiving cylinder, the insulating isolation ring, the suppression electrode, the terminal, the beam integrator and the ion beam control device . The invention organically combines the metal sample stage and the bottom of the metal beam receiving cylinder into one body, realizes the real-time online and accurate monitoring of the injection dose of small samples irradiated with ion beams in a small area; it also avoids the secondary electrons generated to measure the accuracy The influence of interception measurement can overcome the defect of real-time online monitoring of radiation dose; the beam hole in the suppression electrode is related to the diameter of the metal sample stage, and can be used in pairs of various specifications; the beam intensity of the incident ion beam The ups and downs in the irradiation process will not affect the accurate measurement of the final irradiation injection dose; the method is simple and clear, low in cost and reliable in use.
Description
技术领域technical field
本发明涉及材料辐照技术，尤其涉及一种对小面积离子束辐照小样品时注入剂量的实时在线准确监测装置及其监测方法。The invention relates to material irradiation technology, in particular to a real-time on-line accurate monitoring device and a monitoring method for the injection dose when a small-area ion beam irradiates a small sample.
背景技术Background technique
在用兆伏级加速器产生的高能离子束对材料进行辐照损伤研究的过程中，通常会遇到两个问题：(1)入射离子束强度弱，几百离子nA就已经算比较强的入射离子束，而高电荷态的入射离子束密度就更小，通常会为几十离子nA/cm2；(2)材料辐照需要的离子注入总剂量比较大，常常为2～3E16P/cm2，如此要完成对材料的离子束辐照总剂量，需要的辐照时间就会比较长，有时甚至达上百小时，与此同时，辐照时间的延长也会导致与离子束辐照有关的各种费用的增加。所以，为了节省辐照成本，提高束流利用率，受辐照材料样品一般均选取小样品，同时通过对加速器输出离子束的调试，使离子束的束斑面积恰能覆盖受辐照材料小样品为好。因此如何实现对小面积入射离子束辐照小样品注入剂量的实时在线准确监测就成为一个不可避免的非常重要的问题。In the process of using high-energy ion beams generated by megavolt accelerators to study radiation damage to materials, two problems are usually encountered: (1) The intensity of the incident ion beam is weak, and a few hundred ions nA is already considered relatively strong incident Ion beam, and the incident ion beam density of high-charge state is even smaller, usually dozens of ions nA/cm 2 ; (2) The total ion implantation dose required for material irradiation is relatively large, usually 2-3E16P/cm 2 , in order to complete the total ion beam irradiation dose to the material, the required irradiation time will be relatively long, sometimes even up to hundreds of hours. At the same time, the prolongation of the irradiation time will also lead to Increases in various fees. Therefore, in order to save the irradiation cost and improve the utilization rate of the beam current, the irradiated material samples are generally selected as small samples. At the same time, through the adjustment of the ion beam output by the accelerator, the beam spot area of the ion beam can just cover the small area of the irradiated material. Samples as well. Therefore, how to realize the real-time on-line accurate monitoring of the injection dose of a small sample irradiated by a small area incident ion beam has become an inevitable and very important problem.
现有技术中，对于小面积入射离子束辐照小样品注入剂量的监测通常采用两种方法：(1)利用安装在受辐照材料样品前数米距离的束流输运线上已有的法拉第杯对入射离子束进行拦截测量，拦截测量期间，离子束对样品的辐照自动停止，然后用所测的离子束强度与辐照时间的乘积来确定辐照总剂量；(2)将受辐照材料样品与地绝缘，测试其在受离子束辐照时对地的泄漏电流并对该泄漏电流进行积分测量以确定辐照总剂量。以上两种对离子束辐照注入剂量的监测方法均存在不同程度的缺陷，第一种方法为拦截式测量，测量时材料样品不能得到辐照，同时长时间辐照时，由加速器提供的入射离子束强度不可避免的会发生变化；再考虑到束流的传输效率等因素影响，使得法拉第杯测量到的离子束强度未必完全等同于辐照在材料样品上的离子束强度，所以该方法不能实现对辐照总剂量的实时在线准确监测。第二种方法虽为实时在线监测，但却不能对辐照剂量进行准确地监测，因为入射离子束轰击材料样品表面时，必然会产生大量的二次电子，这些二次电子会发射到周围空间，如何扣除这些二次电子对泄漏电流的影响是一个非常复杂的问题，因为随着材料表面情况的变化和辐照时间的延长，二次电子的发射率也在发生着相应的没有规律的变化，这样二次电子发射与泄漏电流之间的量化关系就难以确定，因此该方法无法实现对辐照剂量的准确监测。In the prior art, two methods are usually used for monitoring the injection dose of a small sample irradiated by a small-area incident ion beam: (1) using the existing beam transport line installed at a distance of several meters in front of the irradiated material sample; The Faraday cup intercepts and measures the incident ion beam. During the interception measurement, the irradiation of the ion beam to the sample is automatically stopped, and then the product of the measured ion beam intensity and the irradiation time is used to determine the total irradiation dose; (2) The irradiated material sample is insulated from the ground, and the leakage current to the ground is tested when it is irradiated by the ion beam, and the leakage current is integrally measured to determine the total irradiation dose. The above two monitoring methods for ion beam irradiation implantation dose have defects in varying degrees. The first method is interception measurement, and the material sample cannot be irradiated during the measurement. The intensity of the ion beam will inevitably change; considering the influence of factors such as the transmission efficiency of the beam, the intensity of the ion beam measured by the Faraday cup may not be completely equal to the intensity of the ion beam irradiated on the material sample, so this method cannot Realize real-time online and accurate monitoring of the total radiation dose. Although the second method is real-time online monitoring, it cannot accurately monitor the radiation dose, because when the incident ion beam bombards the surface of the material sample, a large number of secondary electrons will inevitably be generated, and these secondary electrons will be emitted to the surrounding space. , how to deduct the influence of these secondary electrons on the leakage current is a very complicated problem, because with the change of the surface condition of the material and the prolongation of the irradiation time, the emission rate of the secondary electrons also changes irregularly. , so the quantitative relationship between secondary electron emission and leakage current is difficult to determine, so this method cannot realize accurate monitoring of radiation dose.
发明内容Contents of the invention
针对现有技术中对小面积入射离子束辐照材料小样品时较大辐照注入剂量的实时在线准确监测中存在的问题和不足，本发明提出一种兆伏级加速器产生的小面积高能离子束对材料小样品进行大剂量辐照时注入剂量的监测方法及监测装置，从而实现对小面积离子束辐照小样品注入剂量的实时在线准确监测。Aiming at the existing problems and deficiencies in the real-time online and accurate monitoring of large irradiation implantation doses when small-area incident ion beams irradiate materials with small samples, the present invention proposes a small-area high-energy ion beam produced by a megavolt accelerator. The implantation dose monitoring method and monitoring device when the beam irradiates a small material sample with a large dose, so as to realize the real-time online and accurate monitoring of the implantation dose of a small sample irradiated by a small area ion beam.
本发明的一个目的在于提供一种对小面积离子束辐照小样品时注入剂量的实时在线准确监测装置。An object of the present invention is to provide a device for real-time on-line accurate monitoring of implant dose when a small area ion beam irradiates a small sample.
本发明的小面积离子束辐照小样品注入剂量的实时监测装置包括：测束金属接收筒筒底、金属样品台、待辐照材料样品、测束金属接收筒、绝缘隔离圈、抑制电极、接线柱、束流积分仪和离子束调控装置；其中，金属样品台安装固定在测束金属接收筒筒底的中心上，二者有机结合为一体，并可拆卸，金属样品台在测束金属接收筒筒底上形成圆形凸台；待辐照材料样品安装固定在金属样品台上；测束金属接收筒筒底安装在测束金属接收筒的底部；在测束金属接收筒的侧壁上设置有接线柱；接线柱连接至束流积分仪；在测束金属接收筒的离子束入口端固定绝缘隔离圈；在绝缘隔离圈上固定抑制电极，测束金属接收筒与抑制电极间为电绝缘；抑制电极的中心设置有通束孔，通束孔的孔径和金属样品台的直径尺寸一致，并同轴，待辐照材料样品的放置不越过金属样品台的周边；离子束的入射方向与测束金属接收筒的中心轴方向保持一致；在抑制电极之前3～5米设置离子束调控装置，通过对入射离子束进行调控，使得入射离子束的束斑能完全覆盖抑制电极内的通束孔。The real-time monitoring device for small-area ion beam irradiation and injection dose of small samples of the present invention includes: the bottom of the beam-measuring metal receiving cylinder, the metal sample table, the sample of the material to be irradiated, the measuring beam metal receiving cylinder, the insulating isolation ring, the suppression electrode, Terminal post, beam integrator and ion beam control device; among them, the metal sample stage is installed and fixed on the center of the bottom of the metal beam receiving cylinder, and the two are organically combined and detachable. A circular boss is formed on the bottom of the receiving cylinder; the sample of the material to be irradiated is installed and fixed on the metal sample platform; the bottom of the beam-measuring metal receiving cylinder is installed on the bottom of the beam-measuring metal receiving cylinder; The terminal is provided with a terminal; the terminal is connected to the beam integrator; the insulating isolation ring is fixed at the entrance end of the ion beam of the metal receiving tube of the measuring beam; the suppression electrode is fixed on the insulating isolation ring, and the metal receiving tube of the measuring beam and the suppression electrode are Electrical insulation; the center of the suppression electrode is provided with a beam hole, the aperture of the beam hole is consistent with the diameter of the metal sample stage, and is coaxial, and the sample of the material to be irradiated does not cross the periphery of the metal sample stage; the incidence of the ion beam The direction is consistent with the central axis direction of the beam measuring metal receiving cylinder; an ion beam control device is set 3 to 5 meters before the suppression electrode, and by regulating the incident ion beam, the beam spot of the incident ion beam can completely cover the inside of the suppression electrode. Through hole.
本发明的巧妙之处在于将放置待辐照材料样品的金属样品台与测束金属接收筒筒底有机结合为一体，使得测束金属接收筒筒底既作为入射离子束接收测量装置的一部分，同时又作为安放待辐照材料样品及金属样品台的支撑体，这样受辐照材料样品就完全沉浸在入射离子束的测束金属接收筒中。金属样品台可从测束金属接收筒筒底上拆卸下来，其与测束金属接收筒筒底之间的连接通过螺丝固定的方式连接。金属样品台与测束金属接收筒筒底之间保证有良好的电导通连接；测束金属接收筒筒底采用金属材料，可从测束金属接收筒上拆卸下来。测束金属接收筒筒底与测束金属接收筒之间的连接既可采用螺纹方式进行连接，也可采用螺丝固定的方式实现连接。测束金属接收筒筒底与测束金属接收筒筒底之间的连接一定要确保有良好的电导通连接。根据待辐照材料样品的尺寸，选择金属样品台的尺寸，金属样品台的尺寸不小于待辐照材料样品的尺寸。金属样品台与测束金属接收筒筒底的有机结合，使得入射离子束轰击样品时表面上产生的二次电子在抑制电极产生的电场力作用下又返回到测束金属接收筒与测束金属接收筒筒底构成的监测装置中，如此既避免了以入射离子束泄漏流方式测量辐照剂量时因入射离子束打到样品上产生的二次电子对测量准确性的影响，又克服了拦截式测量辐照剂量时不能实时在线监测辐照剂量的缺陷。The ingenuity of the present invention is that the metal sample table for placing the material sample to be irradiated is organically combined with the bottom of the beam-measuring metal receiving cylinder, so that the bottom of the beam-measuring metal receiving cylinder serves as a part of the incident ion beam receiving and measuring device, At the same time, it is also used as a support for placing the material sample to be irradiated and the metal sample stage, so that the irradiated material sample is completely immersed in the beam-measuring metal receiving cylinder of the incident ion beam. The metal sample stage can be disassembled from the bottom of the metal beam receiving cylinder, and the connection between it and the bottom of the metal beam receiving cylinder is fixed by screws. There is a good electrical connection between the metal sample stage and the bottom of the metal beam receiving cylinder; the bottom of the metal beam receiving cylinder is made of metal material, which can be disassembled from the metal beam receiving cylinder. The connection between the bottom of the measuring beam metal receiving cylinder and the measuring beam metal receiving cylinder can be connected by thread or by screw fixing. The connection between the bottom of the beam-measuring metal receiving cylinder and the bottom of the metal beam-receiving cylinder must ensure a good electrical connection. According to the size of the material sample to be irradiated, the size of the metal sample table is selected, and the size of the metal sample table is not smaller than the size of the material sample to be irradiated. The organic combination of the metal sample stage and the bottom of the metal receiving cylinder makes the secondary electrons generated on the surface when the incident ion beam bombards the sample return to the metal receiving cylinder and the metal under the action of the electric field force generated by the inhibiting electrode. In the monitoring device composed of the bottom of the receiving cylinder, this not only avoids the influence of the secondary electrons generated by the incident ion beam hitting the sample on the measurement accuracy when measuring the radiation dose in the way of incident ion beam leakage flow, but also overcomes the interception There is a defect that the radiation dose cannot be monitored on-line in real time when the radiation dose is measured by the traditional method.
抑制电极上的通束孔与金属样品台同轴，且直径相同，以避免样品因安放位置不当而影响辐照结果；抑制电极上的通束孔的直径大小与金属样品台的直径尺寸相互关联，可做成多种规格，抑制电极与金属样品台必需成对使用。抑制电极既作为抑制二次电子的辅助装置，同时又作为测量入射离子束的束斑大小的限制装置；通过离子束调控装置对离子束进行相应的调控，使得入射离子束的束斑能完全覆盖抑制电极上的通束孔，且二者越接近越好。The beam hole on the suppression electrode is coaxial with the metal sample stage and has the same diameter, so as to avoid the influence of the irradiation result due to improper placement of the sample; the diameter of the beam hole on the suppression electrode is related to the diameter of the metal sample stage , can be made into a variety of specifications, and the suppression electrode and the metal sample stage must be used in pairs. The suppression electrode is not only an auxiliary device for suppressing secondary electrons, but also a limiting device for measuring the beam spot size of the incident ion beam; the ion beam is regulated accordingly by the ion beam control device, so that the beam spot of the incident ion beam can completely cover Suppress the beam hole on the electrode, and the closer the two, the better.
进一步，如在监测装置的外层设置一层金属屏蔽层，金属屏蔽层与其内部的结构绝缘并且接地，这样可以去除可能存在的杂散离子等外界因素带来的对辐照注入总剂量准确监测的影响，从而实现对辐照总剂量更加精确的监测。Further, if a metal shielding layer is provided on the outer layer of the monitoring device, the metal shielding layer is insulated from its internal structure and grounded, which can remove the possible presence of stray ions and other external factors to accurately monitor the total dose of radiation implantation. , so as to achieve more accurate monitoring of the total radiation dose.
本发明的另一个目的在于提供一种小面积离子束辐照小样品注入剂量的实时监测方法。Another object of the present invention is to provide a real-time monitoring method for the implantation dose of a small sample irradiated by a small area ion beam.
本发明的小面积离子束辐照小样品注入剂量的实时监测方法，包括以下步骤：The real-time monitoring method of the implantation dose of a small-area ion beam irradiating a small sample of the present invention comprises the following steps:
1)根据待辐照材料样品的大小选取与之对应的金属样品台的直径尺寸，将金属样品台安装固定在测束金属接收筒筒底的中心，形成圆形凸台，将待辐照材料样品安装固定在测束金属接收筒筒底的金属样品台上，确保待辐照材料样品不越过金属样品台的周边；1) Select the diameter of the corresponding metal sample table according to the size of the material sample to be irradiated, and install and fix the metal sample table at the center of the bottom of the beam-measuring metal receiving cylinder to form a circular boss, place the material to be irradiated The sample is installed and fixed on the metal sample stage at the bottom of the metal receiving cylinder to ensure that the sample of the material to be irradiated does not cross the periphery of the metal sample stage;
2)将安装有待辐照材料样品的测束金属接收筒筒底与测束金属接收筒的底部连接固定，确保二者之间为良好的电导通；2) Connect and fix the bottom of the beam-measuring metal receiving cylinder where the material sample to be irradiated is installed, and the bottom of the beam-measuring metal receiving cylinder to ensure good electrical conduction between the two;
3)选取抑制电极，使得抑制电极上的通束孔的孔径与金属样品台的直径一致，然后将抑制电极与绝缘隔离圈安装固定在测束金属接收筒的离子束入口端，确保抑制电极与测束金属接收筒之间有良好的电绝缘；3) Select the suppression electrode so that the aperture of the beam hole on the suppression electrode is consistent with the diameter of the metal sample stage, and then install and fix the suppression electrode and the insulating spacer on the ion beam entrance end of the metal receiving cylinder to ensure that the suppression electrode and the ion beam There is good electrical insulation between the metal receiving cylinders of the measuring beam;
4)通过离子束调控装置对入射离子束进行调试，使得入射离子束的束斑能完全覆盖抑制电极上的通束孔，并且束斑的大小越接近通束孔的大小越好；4) The incident ion beam is adjusted by the ion beam control device, so that the beam spot of the incident ion beam can completely cover the beam passage hole on the suppression electrode, and the closer the beam spot size is to the beam passage hole, the better;
5)将安装有待辐照材料样品的监测装置放置在离子束的通道上，使入射离子束的束斑能完全覆盖抑制电极上的通束孔，并确保离子束的入射方向与测束金属接收筒的中心轴线方向一致；5) Place the monitoring device with the sample of the material to be irradiated on the channel of the ion beam, so that the beam spot of the incident ion beam can completely cover the beam passage hole on the suppression electrode, and ensure that the incident direction of the ion beam is consistent with the reception of the measuring beam metal. The direction of the central axis of the barrel is the same;
6)施加抑制电源，开始对待辐照材料样品进行辐照，入射离子束轰击待辐照材料样品的表面，其产生的二次电子在抑制电极产生的电场力的作用下返回到测束金属接收筒中，将泄露电流通过接线柱输出至束流积分仪，对入射离子束的辐照注入剂量进行实时在线准确的积分测量。6) Apply the suppression power supply, start to irradiate the material sample to be irradiated, the incident ion beam bombards the surface of the material sample to be irradiated, and the secondary electrons generated by it return to the metal receiving beam under the action of the electric field force generated by the suppression electrode. In the barrel, the leakage current is output to the beam integrator through the terminal, and the real-time online and accurate integral measurement of the radiation implantation dose of the incident ion beam is performed.
本发明的优点：Advantages of the present invention:
(1)实现了对小面积离子束辐照小样品注入剂量的实时在线准确监测；(1) The real-time online and accurate monitoring of the injection dose of small samples irradiated with ion beams in a small area is realized;
(2)本发明巧妙的将放置待辐照材料样品的金属样品台与测束金属接收筒筒底有机地结合为一体，既实现了对材料小样品的辐照，又实现了对辐照注入剂量的实时在线准确监测；(2) The present invention cleverly combines the metal sample platform for placing the material samples to be irradiated with the bottom of the metal beam receiving cylinder, which not only realizes the irradiation of small material samples, but also realizes the irradiation injection Real-time online accurate monitoring of dosage;
(3)抑制电极上的通束孔与金属样品台同轴，且直径相同，以避免样品因安放位置不当而影响辐照结果；(3) The beam-through hole on the suppression electrode is coaxial with the metal sample stage and has the same diameter, so as to avoid affecting the irradiation results due to improper placement of the sample;
(4)抑制电极上的通束孔与金属样品台直径关联，二者可做成多种规格，规格尺寸必需相互对应，使用时抑制电极与金属样品台相互对应，成对使用；(4) The beam hole on the suppression electrode is related to the diameter of the metal sample stage. The two can be made into various specifications, and the specifications and sizes must correspond to each other. When used, the suppression electrode and the metal sample stage correspond to each other and are used in pairs;
(5)抑制电极既作为抑制二次电子的辅助装置，同时又作为测量入射离子束束斑大小的限制测试装置，对辐照注入剂量的计算与监测具有非常重要的作用，通过离子束调控装置对离子束进行调试，使得入射离子束的束斑能完全覆盖抑制电极上的通束孔，且二者越接近越好；(5) The suppression electrode is not only an auxiliary device for suppressing secondary electrons, but also a limiting test device for measuring the size of the incident ion beam spot, which plays a very important role in the calculation and monitoring of the radiation implantation dose. Through the ion beam control device Adjust the ion beam so that the beam spot of the incident ion beam can completely cover the beam hole on the suppression electrode, and the closer the two are, the better;
(6)对入射离子束的束流强度是否长时间保持稳定没有限制，束流强度在辐照过程中的起伏变化，不会影响到对最终辐照注入剂量的准确测量；(6) There is no limit to whether the beam intensity of the incident ion beam remains stable for a long time, and the fluctuation of the beam intensity during the irradiation process will not affect the accurate measurement of the final irradiation implantation dose;
(7)金属样品台与测束金属接收筒筒底的有机结合，既避免了以入射离子束泄漏流方式测量时因入射离子束打到样品上产生的二次电子对辐照注入剂量测量准确性的影响，又克服了拦截式测量不能实时在线对辐照注入剂量进行监测的缺陷；(7) The organic combination of the metal sample table and the bottom of the beam receiving metal tube avoids the accurate measurement of the radiation injection dose due to the secondary electrons generated by the incident ion beam hitting the sample when the incident ion beam leakage flow is measured. It also overcomes the defect that the interception measurement cannot monitor the radiation injection dose online in real time;
(8)方法简单明了，成本低，使用可靠。(8) The method is simple and clear, low in cost and reliable in use.
附图说明Description of drawings
图1为本发明的小面积离子束辐照小样品注入剂量的实时监测装置的一个实施例的示意图。Fig. 1 is a schematic diagram of an embodiment of a real-time monitoring device for a small-area ion beam irradiating a small sample implantation dose of the present invention.
具体实施方式Detailed ways
下面结合附图，通过实施例对本发明做进一步说明。The present invention will be further described through the embodiments below in conjunction with the accompanying drawings.
如图1所示，在本实施例中，小面积入射离子束辐照小样品注入剂量的实时监测装置包括：测束金属接收筒筒底1、金属样品台2、待辐照材料样品3、测束金属接收筒4、绝缘隔离圈5、抑制电极6、接线柱7、束流积分仪和离子束调试装置，8为入射离子束；其中，金属样品台2安装固定在测束金属接收筒筒底1的中心上，二者有机结合为一体，在测束金属接收筒筒底形成凸台；待辐照材料样品3固定在金属样品台2上；测束金属接收筒筒底1安装在测束金属接收筒4的底部；在测束金属接收筒的侧壁上设置有接线柱7；接线柱7连接至束流积分仪；在测束金属接收筒4的离子束入口端固定绝缘隔离圈5；在绝缘隔离圈5上固定抑制电极6；抑制电极6的中心设置有通束孔，通束孔的孔径和金属样品台的直径的尺寸一致，并同轴，其尺寸大小由待辐照材料样品的大小决定；离子束的入射方向与测束金属接收筒的中心轴方向一致；在抑制电极之前设置离子束调试装置，对入射离子束8进行调控，使得离子束束斑的大小可以完全覆盖抑制电极的通束孔，二者越接近越好。离子束调试装置采用四极透镜或光阑。As shown in Figure 1, in the present embodiment, the real-time monitoring device for the injection dose of a small sample irradiated by a small-area incident ion beam includes: the bottom 1 of the beam-measuring metal receiving cylinder, the metal sample stage 2, the material sample 3 to be irradiated, Measuring beam metal receiving cylinder 4, insulating isolation ring 5, suppressing electrode 6, terminal 7, beam integrator and ion beam debugging device, 8 is the incident ion beam; wherein, metal sample stage 2 is installed and fixed on the measuring beam metal receiving cylinder At the center of the tube bottom 1, the two are organically combined to form a boss at the bottom of the beam-measuring metal receiving tube; the sample 3 of the material to be irradiated is fixed on the metal sample platform 2; the tube bottom 1 of the beam-measuring metal receiving tube is installed on the The bottom of the beam-measuring metal receiving cylinder 4; the side wall of the beam-measuring metal receiving cylinder is provided with a terminal 7; the terminal 7 is connected to the beam integrator; the ion beam entrance end of the beam-measuring metal receiving cylinder 4 is fixed and insulated ring 5; fixed suppression electrode 6 on the insulating spacer ring 5; the center of suppression electrode 6 is provided with a beam-through hole, the aperture of the beam-through hole is consistent with the size of the diameter of the metal sample stage, and is coaxial, and its size is determined by the radiation to be radiated Determined according to the size of the material sample; the incident direction of the ion beam is consistent with the central axis direction of the beam measuring metal receiving cylinder; an ion beam debugging device is set before the suppression electrode, and the incident ion beam 8 is regulated so that the size of the ion beam spot can be Completely cover the beam opening of the suppression electrode, as close as possible. The ion beam debugging device adopts a quadrupole lens or an aperture.
金属样品台与测束金属接收筒筒底可拆卸，二者之间的连接通过螺丝固定的方式连接，在金属样品台的圆盘中心加工一M4的半透螺纹孔，在测束金属接收筒筒底的中心加工一直径为4.5mm的通孔，用M4的螺丝即可将金属样品台固定在测束金属接收筒筒底上。测束金属接收筒筒底与测束金属接收筒之间的连接采用螺丝固定，测束金属接收筒上4个螺丝孔，测束金属接收筒筒底上对应位置4个通孔。The metal sample stage and the bottom of the beam-measuring metal receiving cylinder are detachable, and the connection between the two is fixed by screws. A M4 semi-transparent threaded hole is processed in the center of the disc of the metal sample stage, and the beam-measuring metal receiving cylinder A through hole with a diameter of 4.5mm is processed in the center of the bottom of the cylinder, and the metal sample stage can be fixed on the bottom of the beam-measuring metal receiving cylinder with M4 screws. The connection between the bottom of the measuring beam metal receiving cylinder and the measuring beam metal receiving cylinder is fixed by screws. There are 4 screw holes on the measuring beam metal receiving cylinder, and 4 through holes at the corresponding positions on the bottom of the measuring beam metal receiving cylinder.
在本实施例中，采用能量为20MeV的C3+离子辐照面积为1cm*1cm的碳化硅SiC材料。要求离子辐照注入总剂量为2E16P/cm2。实时监测方法包括以下步骤：In this embodiment, C 3+ ions with an energy of 20 MeV are used to irradiate a silicon carbide SiC material with an area of 1 cm*1 cm. The total dose of ion irradiation implantation is required to be 2E16P/cm 2 . The real-time monitoring method includes the following steps:
1)根据待辐照材料样品的大小选区金属样品台的直径为1.5cm，将金属样品台安装在测束金属接收筒筒底上形成凸台，保证二者间有良好的电接触；将待辐照材料样品固定在金属样品台上，确保待辐照材料样品没有越过金属样品台的周边；1) According to the size of the material sample to be irradiated, the diameter of the metal sample stage is 1.5 cm, and the metal sample stage is installed on the bottom of the metal receiving cylinder to form a boss to ensure good electrical contact between the two; The irradiated material sample is fixed on the metal sample stage, ensuring that the material sample to be irradiated does not cross the periphery of the metal sample stage;
2)将结合为一体的金属样品台和测束金属接收筒筒底安装在测束金属接收筒的底部，确保它们间的连接为良好的电接触；2) Install the integrated metal sample stage and the bottom of the metal beam receiving cylinder on the bottom of the beam metal receiving cylinder to ensure that the connection between them is a good electrical contact;
3)选取抑制电极，抑制电极上的通束孔的孔径为1.5cm，然后将抑制电极与绝缘隔离圈安装在测束尽速接收筒的离子束入口端，确保抑制电极与测束金属接收筒间具有良好的电绝缘；3) Select the suppression electrode, the aperture of the beam hole on the suppression electrode is 1.5cm, and then install the suppression electrode and the insulating isolation ring on the ion beam entrance end of the beam as fast as possible receiving cylinder to ensure that the suppression electrode and the metal receiving cylinder of the measurement beam between has good electrical insulation;
4)通过离子束调控装置对离子束进行调试，使加速器产生的20MeV的C3+离子在离子束入口端形成直径略大于1.5cm的束斑，确保离子束的束斑能完全覆盖抑制电极上的通束孔；4) Debug the ion beam through the ion beam control device, so that the 20MeV C 3+ ions generated by the accelerator form a beam spot with a diameter slightly larger than 1.5cm at the entrance of the ion beam, ensuring that the beam spot of the ion beam can completely cover the suppression electrode the beam hole;
5)将安装有待辐照材料样品的监测装置放置在离子束的通道上，使入射离子束的束斑能完全覆盖抑制电极上的通束孔，并使离子束的入射方向与测束金属接收筒的中心轴线方向一致，为节省样品材料的辐照成本，提高离子束辐照的效率，尽可能使入射离子束束斑的大小接近抑制电极上的通束孔；5) Place the monitoring device with the material sample to be irradiated on the channel of the ion beam, so that the beam spot of the incident ion beam can completely cover the beam passage hole on the suppression electrode, and make the incident direction of the ion beam coincide with the beam receiving metal of the measuring beam. The direction of the central axis of the cylinder is consistent. In order to save the irradiation cost of the sample material and improve the efficiency of ion beam irradiation, the size of the incident ion beam spot is as close as possible to the beam hole on the suppression electrode;
6)施加抑制电源，开始对待辐照材料样品进行辐照，离子束轰击待辐照材料样品的表面，其产生的二次电子在抑制电极产生的电场力的作用下返回到测束金属接收筒中，将泄露电流通过接线柱输出至束流积分仪，对入射离子束的辐照注入剂量进行实时在线准确的积分测量。6) Apply the suppression power supply, start to irradiate the material sample to be irradiated, the ion beam bombards the surface of the material sample to be irradiated, and the secondary electrons generated by it return to the metal receiving cylinder of the beam under the action of the electric field force generated by the suppression electrode , the leakage current is output to the beam integrator through the binding post, and the real-time online and accurate integral measurement of the irradiation implantation dose of the incident ion beam is performed.
最后需要注意的是，公布实施方式的目的在于帮助进一步理解本发明，但是本领域的技术人员可以理解：在不脱离本发明及所附的权利要求的精神和范围内，各种替换和修改都是可能的。因此，本发明不应局限于实施例所公开的内容，本发明要求保护的范围以权利要求书界定的范围为准。Finally, it should be noted that the purpose of publishing the implementation is to help further understand the present invention, but those skilled in the art can understand that various replacements and modifications can be made without departing from the spirit and scope of the present invention and the appended claims. It is possible. Therefore, the present invention should not be limited to the content disclosed in the embodiments, and the protection scope of the present invention is subject to the scope defined in the claims.
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